JPS58200184A - Detecting device for reflected electron - Google Patents

Detecting device for reflected electron

Info

Publication number
JPS58200184A
JPS58200184A JP57084188A JP8418882A JPS58200184A JP S58200184 A JPS58200184 A JP S58200184A JP 57084188 A JP57084188 A JP 57084188A JP 8418882 A JP8418882 A JP 8418882A JP S58200184 A JPS58200184 A JP S58200184A
Authority
JP
Japan
Prior art keywords
sample
plate
electron
hole
backscattered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57084188A
Other languages
Japanese (ja)
Other versions
JPH0449669B2 (en
Inventor
Nobuyoshi Hashimoto
橋本 信義
Masahiro Tomita
正弘 富田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57084188A priority Critical patent/JPS58200184A/en
Publication of JPS58200184A publication Critical patent/JPS58200184A/en
Publication of JPH0449669B2 publication Critical patent/JPH0449669B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/244Detectors; Associated components or circuits therefor

Abstract

PURPOSE:To simplify the structure of the titled device and to enable an operation of high performance for a long time, by using a detecting element formed of a light element member. CONSTITUTION:An irradiation electron beam 9 passes through the hole of a pole piece 10a of an upper object lens above a stop plate 7 and then through the hole of the plate 7 and that of a detecting plate 8, and moves for scanning a sample 11, while irradiating the same. From the sample 11 a reflected electron 12 is generated, and it is detected by the plate 8. A transmission electron 13 which transmits through the sample 11 and advances straight passes through the hole of a pole piece 10b of a lower object lens and forms the image of the sample on a fluorescent plate. In this case, the detecting plate 8 is made of a light element metal such as aluminum or beryllium, and a reflected electron image formed when the sample 11 is scanned by the finely-restricted irradiation electron beam 9 is detected by the plate 8 and displayed by a monitoring device 20.

Description

【発明の詳細な説明】 本発明は透過型電子顕微鏡の試料室に設置した反射電子
検出装置に係り、特に、その検出部の改良に関するもの
である。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a backscattered electron detection device installed in a sample chamber of a transmission electron microscope, and particularly relates to an improvement in its detection section.

試料を照射した電子線の一部は試料を透過し、一部は反
射電子となって散乱する。この試料で反射散乱した反射
電子は試料のすぐ上で電子線通路の周囲に設置された反
射電子検出器で検出している。従来の反、射電子検出器
の検出部は、反射電子の吸収効率の良好な半導体素子を
用いて構成されていた。また、試料の反射電子像を得る
モードでは試料電流は10′″”A以下に減少させてい
るが、試料の透過電子像を得るモードのときは、試料電
流を10−7〜1O−8Aに増加させている。
A portion of the electron beam that irradiates the sample passes through the sample, and a portion becomes reflected electrons and is scattered. The backscattered electrons reflected and scattered by this sample are detected by a backscattered electron detector installed around the electron beam path just above the sample. The detection section of a conventional reflection electron detector is constructed using a semiconductor element that has good absorption efficiency of reflected electrons. In addition, in the mode to obtain a backscattered electron image of the sample, the sample current is reduced to 10''''A or less, but in the mode to obtain a transmitted electron image of the sample, the sample current is reduced to 10-7 to 1O-8A. It is increasing.

この透過電子像を得るモードで多量の電子線が厚膜試料
等で反射させられた場合は、この多量の反射電子で半導
体素子が破壊される。従来はこれを避けるために反射電
子像検出モード以外では反射電子検出器−ht電子線通
路ら外す必要があった。
When a large amount of electron beam is reflected by a thick film sample or the like in this mode for obtaining a transmitted electron image, the semiconductor element is destroyed by this large amount of reflected electrons. Conventionally, in order to avoid this, it was necessary to remove the backscattered electron detector from the electron beam path except in the backscattered electron image detection mode.

また、半導体素子を用いた反射電子検出器は構造が複雑
で高価である。即ち、従来の反射電子検出器は測定モー
ドによって移動させる機構が必要であり、かつ、高価で
あるという欠点をもっていた。
Further, a backscattered electron detector using a semiconductor element has a complicated structure and is expensive. That is, the conventional backscattered electron detector requires a mechanism for moving it depending on the measurement mode, and has the disadvantage that it is expensive.

本廃明は従来技術の欠点を解消し、安価で長寿命である
反射電子検出器を提供することを目的とし、その特徴と
するところは、反射電子検出素子として軽元素材よシな
る検出板を用いて構成したことにある。
The purpose of this project is to eliminate the drawbacks of the conventional technology and provide a backscattered electron detector that is inexpensive and has a long life.The main feature of this project is to eliminate the drawbacks of the conventional technology and provide a backscattered electron detector that is inexpensive and has a long life. The reason is that it was configured using .

第1図は本発明の一実施例である反射電子検出装置の説
明図で、透過型電子顕微鏡の試料室付近 5、を断面し
て示している。透過型電子顕微鏡の側壁1に設けた横孔
にはOリング2を介して筒体3が挿入されている。この
筒体3の先端の突起部上面には絶縁体5を介して絞シ板
7と検出板8とが取り付けられ、ねじ6で固定されてい
る。この絞り板7と検出板8の各先端部には照射電子線
9を通過させる小孔が設けられている。
FIG. 1 is an explanatory diagram of a backscattered electron detection apparatus which is an embodiment of the present invention, and shows a cross-section of the vicinity of a sample chamber 5 of a transmission electron microscope. A cylindrical body 3 is inserted through an O-ring 2 into a horizontal hole provided in a side wall 1 of a transmission electron microscope. A diaphragm plate 7 and a detection plate 8 are attached to the upper surface of the projection at the tip of the cylinder 3 via an insulator 5, and are fixed with screws 6. A small hole is provided at each tip of the aperture plate 7 and the detection plate 8 to allow the irradiation electron beam 9 to pass therethrough.

この照射電子線9は絞シ板7の上にある上部対物レンズ
のポールピース10aの孔を通った後、絞り板7の孔と
検出板8の孔を通り試料11を照射し乍ら走査移動する
。試料11よシは反射電子12が発生して検出板8で検
知され、試料11を透過して直進した透過電子13は下
部対物レンズのポールピース10bの孔を通過し、螢光
板上に試料像を作る。
The irradiated electron beam 9 passes through the hole in the pole piece 10a of the upper objective lens located above the aperture plate 7, and then passes through the hole in the aperture plate 7 and the hole in the detection plate 8, irradiating the sample 11 while scanning. do. Reflected electrons 12 are generated in the sample 11 and detected by the detection plate 8, and the transmitted electrons 13 that have passed through the sample 11 and proceeded straight pass through the hole in the pole piece 10b of the lower objective lens and form a sample image on the fluorescent plate. make.

検出板8で検知した試料表面よシの反射電子信号は端子
板14.リード線15a、ハーメチックシール16.リ
ード線15bを介して接続端子18に伝達される。この
接続端子18に入った信号は増幅器19で増幅されて観
察装置20に送られ、観察装置20に表示している。な
お、17はハーメチックシール16の周囲を気密にして
いるOリングであり、このハーメチックシール16を押
えている水金21は止めねじ4で筒体3に固定されると
共に、ねじ22によって側壁1に固定されている。また
、観察装置20のスイッチを切換えると、試料11を透
過した透過電子線15による試料像を螢光板上に生じる
ように構成されている。
The reflected electron signal from the sample surface detected by the detection plate 8 is sent to the terminal plate 14. Lead wire 15a, hermetic seal 16. The signal is transmitted to the connection terminal 18 via the lead wire 15b. The signal input to this connection terminal 18 is amplified by an amplifier 19 and sent to an observation device 20, where it is displayed. Note that 17 is an O-ring that makes the periphery of the hermetic seal 16 airtight, and the water metal 21 that holds the hermetic seal 16 is fixed to the cylinder body 3 with a set screw 4, and is attached to the side wall 1 with a screw 22. Fixed. Furthermore, when the switch of the observation device 20 is switched, a sample image is generated on the fluorescent plate by the transmitted electron beam 15 that has passed through the sample 11.

上記検出板8はアルミニウム又はベリリウム等の軽元素
金属よりなる板であるので、細く絞った照射電子線9で
試料11を走査したときに生じた反射電子像は検出板8
で検知され観察装置20に増幅表示される。また、透過
試料像の観察モードに切換えるには観察装置20のモー
ド切換スイッチを切換えて反射電子検出装置を休止させ
、電子顕微鏡本体の筒体3の最下部に設置しである螢光
     1板に透過試料像を作る。このときは上記検
出板8に多量の反射電子が衝突するが、反射電子検出装
置の電気系は遮断されて作動しないので、これらを破損
することはない。
Since the detection plate 8 is a plate made of a light element metal such as aluminum or beryllium, the backscattered electron image generated when the sample 11 is scanned with the narrowly focused electron beam 9 is reflected on the detection plate 8.
is detected and amplified and displayed on the observation device 20. In addition, to switch to the observation mode of the transmitted sample image, the mode changeover switch of the observation device 20 is switched to stop the backscattered electron detection device, and the fluorescent light 1 plate installed at the bottom of the barrel 3 of the electron microscope body is set. Create a transmission sample image. At this time, a large amount of backscattered electrons collide with the detection plate 8, but since the electrical system of the backscattered electron detection device is cut off and does not operate, it will not be damaged.

従来の半導体検出素子を用いた反射電子検出装置ではモ
ード切換時には半導体検出素子を電子線通路から外す必
要があったが、本実施例ではモード変化に同等関係なく
検出板8は固定したままでよい。したがって、検出部材
の移動機構は不要となって大幅に製造原価を低減させる
ことができる。
In a conventional backscattered electron detection device using a semiconductor detection element, it was necessary to remove the semiconductor detection element from the electron beam path when switching modes, but in this embodiment, the detection plate 8 can remain fixed regardless of the mode change. . Therefore, a mechanism for moving the detection member is not required, and manufacturing costs can be significantly reduced.

また、モード切換時の検出部材の移動操作がないので操
作は簡略化され、検出板8は1枚のアルミ板であるので
半永久的に使用できる。その結果、従来の反射筒1子検
出装置に比較して約1/100の価格で提供できるとい
う利点が得られる。
Further, since there is no need to move the detection member when switching modes, the operation is simplified, and since the detection plate 8 is a single aluminum plate, it can be used semi-permanently. As a result, an advantage can be obtained that it can be provided at about 1/100th the price of a conventional single reflector tube detector.

本実施例の反射電子検出装置は、アルミニウム等の軽金
属板と試料の上部に近接設置することによって、極めて
安価に構成することが可能となり、かつ、操作も簡単に
なる等の効果が得られる。
By installing the backscattered electron detection device of this embodiment close to a light metal plate such as aluminum above the sample, it can be constructed at an extremely low cost and has advantages such as easy operation.

第2図は本発明の他の実施例である反射電子検出装置の
説明図で、第1図と同じ部分には同一符号を付しである
。この場合は絞り板7と検出板8とを対物レンズのポー
ルピース10a、10bK接続した取付は管23に取り
付けている。
FIG. 2 is an explanatory diagram of a backscattered electron detection device according to another embodiment of the present invention, in which the same parts as in FIG. 1 are given the same reference numerals. In this case, the aperture plate 7 and the detection plate 8 are connected to the tube 23 by the pole pieces 10a, 10bK of the objective lens.

このようにすれば第1図の装置で使用した0リング2や
筒体3が不要となり構造は簡略化されるという利点を生
じている。
In this way, the O-ring 2 and cylinder body 3 used in the apparatus shown in FIG. 1 are not needed, and the structure is advantageously simplified.

また、第3図は本発明の更に他の実施例でもる反射電子
検出装置の要部断面図で、この場合は試料支持台24に
試料11の設置場所を形成するとしたリード線15aは
試料支持台24に巻き付けて引き出すようにしている。
FIG. 3 is a cross-sectional view of a main part of a backscattered electron detection device according to still another embodiment of the present invention. It is wound around the stand 24 and pulled out.

即ち、第1図、第2図の装置の場合は試料11は図示し
ていない試料支持台24に別途支持されていたが、この
場合は試料支持台24を共用して簡略化できるという利
点が得られる。
That is, in the case of the apparatuses shown in FIGS. 1 and 2, the sample 11 was supported separately on a sample support stand 24 (not shown), but in this case, there is an advantage that the sample support stand 24 can be shared and simplified. can get.

上記実施例の検出板8はいずれもアルミニウム板を用い
ているが、アルミニウムの代りにベリリウム、カーボン
等の軽元素材も板状に加工して使用することができる。
Although the detection plate 8 of the above-mentioned embodiments uses an aluminum plate, a light material such as beryllium or carbon may be processed into a plate shape and used instead of aluminum.

Claims (1)

【特許請求の範囲】 1、電子線通路の周囲に試料の表面に対向させて設置し
、上記試料より反射した反射電子を検出する反射電子検
出素子を有する電子顕微鏡等の反射電子検出装置におい
て、上記反射電子検出素子として軽元素材よりなる検出
板を用いて構成したことを特徴とする反射電子検出装置
。 2、 上記軽元素部材が、アルミニウム、ベリリウムお
よび炭素のいずれかである特許請求の範囲第1項記載の
反射電子検出装置。
[Claims] 1. In a backscattered electron detection device such as an electron microscope, which has a backscattered electron detection element that is installed around an electron beam path to face the surface of a sample and detects backscattered electrons reflected from the sample, A backscattered electron detection device characterized in that the backscattered electron detection element is constructed using a detection plate made of a light element material. 2. The backscattered electron detection device according to claim 1, wherein the light element member is any one of aluminum, beryllium, and carbon.
JP57084188A 1982-05-18 1982-05-18 Detecting device for reflected electron Granted JPS58200184A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57084188A JPS58200184A (en) 1982-05-18 1982-05-18 Detecting device for reflected electron

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57084188A JPS58200184A (en) 1982-05-18 1982-05-18 Detecting device for reflected electron

Publications (2)

Publication Number Publication Date
JPS58200184A true JPS58200184A (en) 1983-11-21
JPH0449669B2 JPH0449669B2 (en) 1992-08-12

Family

ID=13823496

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57084188A Granted JPS58200184A (en) 1982-05-18 1982-05-18 Detecting device for reflected electron

Country Status (1)

Country Link
JP (1) JPS58200184A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107976458A (en) * 2017-10-10 2018-05-01 中国科学院自动化研究所 low energy back scattering electronic detector
CN115380357A (en) * 2020-04-15 2022-11-22 科磊股份有限公司 Thin pellicle material for protection of solid state electronic detectors

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5049819U (en) * 1973-09-04 1975-05-15
JPS5386722U (en) * 1976-12-16 1978-07-17

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS517072A (en) * 1974-07-08 1976-01-21 Satsuki Kitani
JPS529366A (en) * 1975-07-11 1977-01-24 Hitachi Ltd Sample equipment for electron microscopes, etc

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5049819U (en) * 1973-09-04 1975-05-15
JPS5386722U (en) * 1976-12-16 1978-07-17

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107976458A (en) * 2017-10-10 2018-05-01 中国科学院自动化研究所 low energy back scattering electronic detector
CN115380357A (en) * 2020-04-15 2022-11-22 科磊股份有限公司 Thin pellicle material for protection of solid state electronic detectors

Also Published As

Publication number Publication date
JPH0449669B2 (en) 1992-08-12

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