JPS5826773B2 - Sample irradiation current detection device for electron microscopes, etc. - Google Patents
Sample irradiation current detection device for electron microscopes, etc.Info
- Publication number
- JPS5826773B2 JPS5826773B2 JP53004040A JP404078A JPS5826773B2 JP S5826773 B2 JPS5826773 B2 JP S5826773B2 JP 53004040 A JP53004040 A JP 53004040A JP 404078 A JP404078 A JP 404078A JP S5826773 B2 JPS5826773 B2 JP S5826773B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- electron beam
- adsorbent
- detection device
- current detection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Description
【発明の詳細な説明】
本発明は電子顕微鏡等における試料照射電流検出装置に
関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a sample irradiation current detection device for an electron microscope or the like.
従来電子顕微鏡等では試料電流を測定する手段としてフ
ァラデーケージが使用され、このファラデーケージは観
察室や試料ホルダーに組込まれている。Conventionally, in electron microscopes and the like, a Faraday cage is used as a means for measuring sample current, and this Faraday cage is built into an observation chamber or a sample holder.
このファラデーケージに電子線を入射せしめるには試料
移動を行なったり或いはファラデーケージを光軸上に挿
入したりする必要があるため、随時試料電流をモニター
しながら試料の観察、分析を続けることは困難であった
。In order to make the electron beam enter the Faraday cage, it is necessary to move the sample or insert the Faraday cage onto the optical axis, so it is difficult to continue observing and analyzing the sample while constantly monitoring the sample current. Met.
またファラデーケージを試料ホルダーに組込む場合ホル
ダー〇構造が複雑になる欠点がある。In addition, when a Faraday cage is incorporated into a sample holder, there is a drawback that the structure of the holder becomes complicated.
本発明は前述した欠点を取り除いて1.随時試料電流を
測定でき測定後の観察、分析の再開が容易な試料電流モ
ニターを得るものである。The present invention eliminates the above-mentioned drawbacks by:1. The present invention provides a sample current monitor that can measure the sample current at any time and allows easy observation and restart of analysis after measurement.
以下図面に示す実施例に基づいて詳説する。A detailed explanation will be given below based on the embodiments shown in the drawings.
第1図は本発明の一実施例を示す構成略図であり、1は
試料である。FIG. 1 is a schematic diagram showing an embodiment of the present invention, and 1 is a sample.
この試料には実線で示すように図示外の電子銃から発生
した電子線2が集束レンズ系により細く集束されて照射
される。This sample is irradiated with an electron beam 2 generated from an electron gun (not shown), which is narrowly focused by a focusing lens system, as shown by a solid line.
該電子線照射により試料からはX線Xが発生し、このX
線Xは非分散型分析装置3により分析される。X-rays X are generated from the sample by the electron beam irradiation, and these X-rays
The line X is analyzed by a non-dispersive analyzer 3.
4は前記試料1を包囲するようにおかれた導電物質から
なる吸着体で、該吸着体は図示外の冷却槽にて冷却され
ることにより試料近傍のガス分子を吸着し、試料の汚染
を防止するためのものである。Reference numeral 4 denotes an adsorbent made of a conductive material that surrounds the sample 1. The adsorbent is cooled in a cooling tank (not shown) to adsorb gas molecules near the sample and prevent contamination of the sample. This is to prevent this.
又該吸着体は対物レンズ(図示せず)等鏡体に電気的且
つ熱的に遮断された状態で固定されており、更に該吸着
体は電流計5を介して接地されている。The adsorbent is fixed to a mirror body such as an objective lens (not shown) in an electrically and thermally insulated state, and furthermore, the adsorbent is grounded via an ammeter 5.
6は該トラップ上方に設置された偏向コイルである。6 is a deflection coil installed above the trap.
しかして今、偏向コイル6に所定の電流を供給すること
により電子線2を偏向させて同図中点線でその状態を示
すように電子線を吸着体4に照射させると、電子線が吸
着体4に吸収されて電流計5に電流が流れるため、電流
計に試料照射用電子線2の電流値が表示される。However, if the electron beam 2 is deflected by supplying a predetermined current to the deflection coil 6 and the electron beam is irradiated onto the adsorbent 4 as shown by the dotted line in the figure, the electron beam will be applied to the adsorbent. 4 and flows through the ammeter 5, the current value of the sample irradiation electron beam 2 is displayed on the ammeter.
以上詳説したように本発明においては試料移動やファラ
デーケージの光軸上への挿入を行うことなしに試料照射
用電子線の電流が測置でき、しかも偏向コイルによる電
子線の偏向を停止すれば、電子線は直ちに元の照射位置
に戻り、分析の再開が可能となる等の効果を有する。As explained in detail above, in the present invention, the current of the electron beam for sample irradiation can be measured without moving the sample or inserting a Faraday cage onto the optical axis, and moreover, by stopping the deflection of the electron beam by the deflection coil. , the electron beam immediately returns to its original irradiation position, making it possible to restart the analysis.
尚前述の実施例は本発明の□1示であり、実施にあたっ
ては種々の変形が考えられる。It should be noted that the above-mentioned embodiment is only an illustration of the present invention, and various modifications may be made in implementation.
列えば第2図にその断面図を示すように吸着体4の電子
線照射部分に開ロアを有した遮蔽板8を一体的に設置す
ることにより吸収電子と共に吸着体4の電子線照射部か
ら発生する2次電子や反射電子を吸収せしめることがで
きる。In other words, as shown in the cross-sectional view of FIG. 2, by integrally installing a shielding plate 8 having an open lower part on the electron beam irradiated part of the adsorbent 4, the absorbed electrons are absorbed from the electron beam irradiated part of the adsorbent 4. It is possible to absorb generated secondary electrons and reflected electrons.
これにより試料照射用電子線の電流値をより正確に測定
することが可能となる。This makes it possible to more accurately measure the current value of the electron beam for irradiating the sample.
第1図は本発明の一実施例を示す構成略図、第2図は本
発明の他の実施例を示す要部断面図である。
図において、1は試料、2は電子線、3は非分散型X線
分析装置、4は吸着体、5は電流計、6は偏向コイルで
ある。FIG. 1 is a schematic structural diagram showing one embodiment of the present invention, and FIG. 2 is a sectional view of essential parts showing another embodiment of the present invention. In the figure, 1 is a sample, 2 is an electron beam, 3 is a non-dispersive X-ray analyzer, 4 is an adsorbent, 5 is an ammeter, and 6 is a deflection coil.
Claims (1)
段と、前記試料を囲むようにおかれ且つ鏡体に対して電
気的、熱的に遮断された状態で取付けられた吸着体と、
該吸着体を冷却する手段と、前記試料を照射する電子線
を偏向させて前記吸着体に照射させる偏向手段及び該偏
向手段により吸着体に吸収される電子線の電流を検出す
る手段とを具備した事を特徴とする電子顕微鏡等におけ
る試料照射電流検出装置。1. A means for focusing the electron beam from the electron gun and irradiating the sample; an adsorbent that surrounds the sample and is attached to the mirror in a state where it is electrically and thermally isolated;
A means for cooling the adsorbent, a deflecting means for deflecting the electron beam irradiating the sample to irradiate the adsorbent, and a means for detecting the current of the electron beam absorbed by the adsorbent by the deflecting means. A sample irradiation current detection device for an electron microscope, etc., characterized by the following.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53004040A JPS5826773B2 (en) | 1978-01-18 | 1978-01-18 | Sample irradiation current detection device for electron microscopes, etc. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53004040A JPS5826773B2 (en) | 1978-01-18 | 1978-01-18 | Sample irradiation current detection device for electron microscopes, etc. |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5497357A JPS5497357A (en) | 1979-08-01 |
JPS5826773B2 true JPS5826773B2 (en) | 1983-06-04 |
Family
ID=11573827
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53004040A Expired JPS5826773B2 (en) | 1978-01-18 | 1978-01-18 | Sample irradiation current detection device for electron microscopes, etc. |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5826773B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0618120B2 (en) * | 1985-07-24 | 1994-03-09 | 株式会社日立製作所 | Charged particle beam device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5141545A (en) * | 1974-08-07 | 1976-04-07 | Rank Organisation Ltd |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5622607Y2 (en) * | 1972-09-06 | 1981-05-27 |
-
1978
- 1978-01-18 JP JP53004040A patent/JPS5826773B2/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5141545A (en) * | 1974-08-07 | 1976-04-07 | Rank Organisation Ltd |
Also Published As
Publication number | Publication date |
---|---|
JPS5497357A (en) | 1979-08-01 |
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