JP2003326455A - Holder for object to be polished - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a holder for an object to be polished with improved productivity. <P>SOLUTION: The holder 1 for the object to be polished is fixed to each of both faces of a rotatively driven plate 2 with an outer circumferential gear, and it is provided with a template 8 provided with a recess hole 7 for arranging the object 6 to be polished and a packing material 9 for the object 6 to be polished. The object 6 is polished between each polishing cloth 11 arranged facing each other on both faces of the plate 2 while driving and rotating the plate 2. <P>COPYRIGHT: (C)2004,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a holder for an object to be polished such as a silicon wafer.

[0002]

2. Description of the Related Art Conventionally, objects to be polished with a polishing machine (semiconductor wafers such as silicon, gallium arsenide, indium phosphide, semiconductor substrates, various substrates, glass, LCD, disks, etc.)
The object holder for polishing is used when performing the precision surface polishing.

That is, an object to be polished, such as a silicon wafer, is attached to an object-to-be-polished holder and attached to a surface plate of a polishing machine.
A polishing cloth is fixed on the surface plate facing the polishing machine. Then, the polishing work is performed by supplying a polishing liquid containing polishing abrasive grains between the object to be polished and the polishing cloth and sliding them together.

By the way, there is a demand for further increasing the amount of polishing treatment to improve productivity.

[0005]

SUMMARY OF THE INVENTION Therefore, the present invention is intended to provide an object-to-be-polished holder which can improve productivity more than ever before.

[0006]

In order to solve the above problems, the present invention takes the following technical means. The object-to-be-polished holder of the present invention is an object-to-be-polished holder that is fixed to each of both surfaces of a peripherally driven plate with an outer peripheral gear, and has a template in which recess holes for arranging the object to be polished are formed. And a backing material for an object to be polished, driving the plate with the outer peripheral gear to rotate the same, and to move the object to be polished with the respective polishing cloths facing each other on both sides of the plate with the outer peripheral gear. It is characterized by being polished.

The workpiece holder is fixed to both sides of the peripheral geared plate that is driven to rotate, and the workpiece is arranged in the recess holes formed in the template of the workpiece holder on both sides. However, since the object to be polished is polished between the polishing cloths arranged on both sides of the plate with outer peripheral gears, the object to be polished is not limited to one side of the plate with outer peripheral gears that is driven to rotate. Both sides can be polished, and the number of objects to be polished can be doubled at the same time. Further, the backing material may be arranged on the lower surface of the template. According to this structure, the life of the constituent material can be divided into the peripheral geared plate and the other materials, and the peripheral geared plate can be reused. Further, the backing material may be disposed in the recess hole of the template. With this configuration, the life of the constituent materials can be divided into a backing material and other materials, and if the backing material has a short life due to polishing conditions, etc., it is possible to continue using it only by replacing the backing material. It is possible.

[0008]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. (Embodiment 1) As shown in FIGS. 1 to 4, an object-to-be-polished holder 1 (template assembly) of this embodiment is fixed to both surfaces of a plate 2 with an outer peripheral gear that is rotationally driven. Is. That is, a total of two workpiece holders 1 to be polished are fixed on both sides of one plate 2 with an outer peripheral gear.

As shown in FIGS. 3 and 4, four plates 2 with outer peripheral gears are arranged in a polishing machine 3 (two pieces of object holders 1 to be polished are fixed on each side). ),
It has a planetary gear 4 on its outer circumference and a central sun gear 5
It is driven to rotate while meshing with.

This polishing object holder 1 has a template 8 (having a diameter of about 300 to 13) having four recess holes 7 for arranging a polishing object 6 such as a silicon wafer.
00 mm) and the backing material 9 for the object 6 to be polished. The backing material 9 is arranged on the entire lower surface of the template 8.

Examples of the material of the template 8 include a laminate of epoxy resin and glass cloth, thermosetting and thermoplastic polyester resin, polyimide resin, polysulfone resin, polyparaphenylene resin, hard polyurethane resin or phenol resin. It can be formed by a single sheet or these FRP sheets.

The backing material 9 can be formed of a foamed sheet made of polyurethane resin or the like, and an adhesive layer 10 for adhering and fixing it to the peripheral geared plate 2 is formed on the back surface thereof.

When performing the polishing operation, the sun gear 5 in the center of the polishing machine 3 is driven to drive the four outer peripheral geared plates 2 for rotational movement, while the outer peripheral geared plates 2 are moved. A plurality of objects 6 to be polished are provided between the polishing cloths 11 (disposed on the upper surface plate 12 and the lower surface plate 13 respectively) facing the objects 6 to be polished of the object holders 1 on both sides. Is uniformly polished.

Next, the usage state of the object-to-be-polished holder 1 of this embodiment will be described.

The workpiece holder 1 is fixed to both sides of a plate 2 with an outer peripheral gear that is driven to rotate,
The objects to be polished 6 are arranged in the recess holes 7 formed in the template 8 of the object to be polished holder 1 on both sides, and the polishing cloth 11 is arranged so as to face both sides of the plate 2 with outer peripheral gears. Since the object to be polished 6 is polished between the two, the object to be polished 6 can be polished not only on one side of the rotationally driven plate 2 with outer peripheral gears but also on both sides, and can be simultaneously polished. There is an advantage that the number of polishing objects 6 can be doubled and productivity can be improved (double the amount of polishing processing per unit time) compared with the conventional one.

In this embodiment, four plates 2 with outer peripheral gears are arranged on the polishing machine 3, and the object-to-be-polished 1 is fixed on both front and back surfaces of each of the four plates 2 with outer peripheral gears. Since four silicon wafers are arranged in the object-to-be-polished holder 1, 4 (object-to-be-polished object) × 4 (object-to-be-polished) × 2 (both front and back surfaces) in one working step of the polishing machine 3. With 32), 32 single-sided silicon wafers can be uniformly precisely polished.

Further, since the backing material 9 of the workpiece holder 1 is arranged on the entire lower surface of the template 8, the life of the constituent materials is divided into the peripheral geared plate 2 and other materials. And the plate 2 with outer peripheral gears can be reused. (Embodiment 2) Next, Embodiment 2 will be described focusing on the differences from Embodiment 1.

As shown in FIG. 5, in this embodiment, the backing material 9 of the object-to-be-polished holder 1 is arranged not in the entire lower surface of the template 8 but in the recess holes 7 formed at four positions of the template 8. ing.

That is, like the backing material 9, the template 8 itself is also attached and fixed to the plate 2 with outer peripheral gears via the adhesive layer 10.

With such a structure, the life of the constituent materials can be divided into the backing material 9 and other materials, and when the life of the backing material 9 is short due to polishing conditions etc., this backing material 9 only needs to be replaced. It has the advantage that it can be used continuously.

[0021]

The present invention having the above-mentioned structure has the following effects.

Since the object to be polished can be polished not only on one side of the rotationally driven plate with outer peripheral gear but also on both sides thereof, the number of objects to be polished which can be simultaneously polished can be doubled. It is also possible to provide an object-to-be-polished holder that can improve productivity.

[Brief description of drawings]

FIG. 1 is a plan view illustrating a first embodiment of a workpiece holder (a state in which it is fixed to both sides of a plate with an outer peripheral gear) of the present invention.

FIG. 2 is a central cross-sectional view for explaining the object-to-be-polished holder of FIG. 1 (in a state of being fixed to both surfaces of a plate with an outer peripheral gear).

FIG. 3 is a central cross-sectional view illustrating a step of mounting the object-to-be-polished tool of FIG. 1 (fixed on both sides of a plate with peripheral gears) in a polishing machine and polishing.

FIG. 4 is a perspective view showing a state in which an upper surface plate is removed in order to explain a process of mounting the object-to-be-polished holder (fixed on both sides of a plate with outer peripheral gears) of FIG. 1 in a polishing machine.

FIG. 5 is a central cross-sectional view for explaining the second embodiment of the object-to-be-polished holder of the present invention (in a state of being fixed to both surfaces of the plate with the outer peripheral gear).

[Explanation of symbols]

1 Polishing object holder 2 Plate with peripheral gears 6 Object to be polished 7 recess holes 8 templates 9 backing material 11 polishing cloth

Claims (3)

[Claims] 1. A holder for an object to be polished, which is fixed to each of both surfaces of a plate with an outer peripheral gear that is driven to rotate,
A backing material for the object to be polished and a template in which a recess hole for arranging the object to be polished is provided; An object-to-be-polished holder characterized in that an object to be polished is polished between each of the arranged polishing cloths. 2. The object to be polished holder according to claim 1, wherein the backing material is arranged on a lower surface of the template. 3. The object-to-be-polished holder according to claim 1, wherein the backing material is arranged in a recess hole of a template.