JP2003268422A5 - - Google Patents

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Publication number
JP2003268422A5
JP2003268422A5 JP2002063447A JP2002063447A JP2003268422A5 JP 2003268422 A5 JP2003268422 A5 JP 2003268422A5 JP 2002063447 A JP2002063447 A JP 2002063447A JP 2002063447 A JP2002063447 A JP 2002063447A JP 2003268422 A5 JP2003268422 A5 JP 2003268422A5
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JP
Japan
Prior art keywords
metal powder
plasma flame
gas
refining
raw material
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JP2002063447A
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English (en)
Japanese (ja)
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JP4042095B2 (ja
JP2003268422A (ja
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Priority to JP2002063447A priority Critical patent/JP4042095B2/ja
Priority claimed from JP2002063447A external-priority patent/JP4042095B2/ja
Publication of JP2003268422A publication Critical patent/JP2003268422A/ja
Publication of JP2003268422A5 publication Critical patent/JP2003268422A5/ja
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Publication of JP4042095B2 publication Critical patent/JP4042095B2/ja
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JP2002063447A 2002-03-08 2002-03-08 高純度金属粉の製造方法および高純度金属粉の製造装置 Expired - Fee Related JP4042095B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002063447A JP4042095B2 (ja) 2002-03-08 2002-03-08 高純度金属粉の製造方法および高純度金属粉の製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002063447A JP4042095B2 (ja) 2002-03-08 2002-03-08 高純度金属粉の製造方法および高純度金属粉の製造装置

Publications (3)

Publication Number Publication Date
JP2003268422A JP2003268422A (ja) 2003-09-25
JP2003268422A5 true JP2003268422A5 (de) 2005-08-25
JP4042095B2 JP4042095B2 (ja) 2008-02-06

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JP2002063447A Expired - Fee Related JP4042095B2 (ja) 2002-03-08 2002-03-08 高純度金属粉の製造方法および高純度金属粉の製造装置

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JP (1) JP4042095B2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100584570B1 (ko) 2006-02-28 2006-05-30 한국기계연구원 플라즈마 반응장치
EP1942202A3 (de) * 2007-01-08 2010-09-29 Heraeus, Inc. Hochdichtes Rhenium mit geringem Sauerstoffgehalt und konsolidierte Pulvermaterialien auf Rhenium-Basis zur Verwendung als Abscheidungsquellen sowie Herstellungsverfahren dafür
JP5301530B2 (ja) * 2008-03-28 2013-09-25 Ｊｘ日鉱日石金属株式会社 磁性材ターゲット用白金粉末、同粉末の製造方法、白金焼結体からなる磁性材ターゲットの製造方法及び同焼結磁性材ターゲット
CN103736435B (zh) * 2013-12-27 2015-11-18 中国神华能源股份有限公司 一种利用交流等离子体球化粉体的设备及系统
KR102020314B1 (ko) * 2017-12-07 2019-09-11 한국생산기술연구원 고순도 구형 분말의 제조방법
KR102273282B1 (ko) * 2020-01-30 2021-07-06 주식회사 나노코리아 금속 분말의 제조방법
KR102491080B1 (ko) * 2021-08-05 2023-01-19 한국핵융합에너지연구원 플라즈마를 이용한 분말 구형화 장치
KR102467741B1 (ko) * 2021-08-05 2022-11-16 한국핵융합에너지연구원 플라즈마를 이용한 아토마이징 시스템 및 아토마이징 방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5749937A (en) * 1995-03-14 1998-05-12 Lockheed Idaho Technologies Company Fast quench reactor and method
JP2001020065A (ja) * 1999-07-07 2001-01-23 Hitachi Metals Ltd スパッタリング用ターゲット及びその製造方法ならびに高融点金属粉末材料

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