JP2003268422A5 - - Google Patents

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JP2003268422A5
JP2003268422A5 JP2002063447A JP2002063447A JP2003268422A5 JP 2003268422 A5 JP2003268422 A5 JP 2003268422A5 JP 2002063447 A JP2002063447 A JP 2002063447A JP 2002063447 A JP2002063447 A JP 2002063447A JP 2003268422 A5 JP2003268422 A5 JP 2003268422A5
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metal powder
plasma flame
gas
refining
raw material
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JP2002063447A
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Japanese (ja)
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JP4042095B2 (en
JP2003268422A (en
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Priority claimed from JP2002063447A external-priority patent/JP4042095B2/en
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Publication of JP2003268422A5 publication Critical patent/JP2003268422A5/ja
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RFプラズマ炎中に原料を供給して金属粉を製造する方法において、プラズマ炎の尾部に水素を含む精錬ガスを導入し、プラズマ炎を発生する動作ガス中の水素量が5vol％以下、動作ガスと精錬ガスを含む混合ガスの水素量が10vol％以上であることを特徴とする高純度金属粉の製造方法。In a method for producing metal powder by supplying raw materials into an RF plasma flame, a refining gas containing hydrogen is introduced into the tail of the plasma flame, the amount of hydrogen in the working gas generating the plasma flame is 5 vol% or less, and the working gas A method for producing a high-purity metal powder , characterized in that the amount of hydrogen in the mixed gas containing smelting gas is 10 vol% or more. 原料の供給位置が精錬ガスの供給位置に対してプラズマ炎の上流側であることを特徴とする請求項１に記載の高純度金属粉の製造方法。The method for producing high-purity metal powder according to claim 1, wherein the raw material supply position is upstream of the plasma flame with respect to the refining gas supply position. 前記高純度金属粉の酸素含有量が500ppm以下であることを特徴とする請求項１または２に記載の高純度金属粉の製造方法。The method for producing high-purity metal powder according to claim 1 or 2, wherein the oxygen content of the high-purity metal powder is 500 ppm or less. 原料は高融点金属を主とすることを特徴とする請求項１乃至３の何れかに記載の高純度金属粉の製造方法。The method for producing a high-purity metal powder according to any one of claims 1 to 3, wherein the raw material is mainly a refractory metal. 動作ガス供給装置を具備しプラズマ炎を発生するRFプラズマトーチと、プラズマ炎中に金属粉の原料を供給する原料供給装置と、プラズマ炎に精錬ガスを供給する精錬ガス供給装置と、プラズマ炎により加熱された金属粉を冷却するチャンバを具備する高純度金属粉の製造装置であって、精錬ガス供給装置の精錬ガス供給位置はプラズマ炎の尾部に位置し、原料供給装置の原料供給位置は精錬ガス供給位置に対してプラズマ炎の上流側に位置しており、動作ガス供給装置と精錬ガス供給装置はそれぞれ、動作ガス中の水素量が5vol％以下、動作ガスと精錬ガスを含む混合ガスの水素量が10vol％以上となる動作ガス、精錬ガスを供給することを特徴とする高純度金属粉の製造装置。RF plasma torch equipped with an operating gas supply device and generating a plasma flame, a raw material supply device for supplying a raw material of metal powder in the plasma flame, a refining gas supply device for supplying a refining gas to the plasma flame, and a plasma flame An apparatus for producing high-purity metal powder comprising a chamber for cooling heated metal powder, wherein the refining gas supply position of the refining gas supply apparatus is located at the tail of the plasma flame, and the raw material supply position of the raw material supply apparatus is refining It is located upstream of the plasma flame with respect to the gas supply position. The working gas supply device and the refining gas supply device each have a hydrogen content of 5 vol% or less in the working gas, and a mixed gas containing the working gas and the refining gas. An apparatus for producing high-purity metal powder , characterized by supplying working gas and refining gas with a hydrogen content of 10 vol% or more.
JP2002063447A 2002-03-08 2002-03-08 High purity metal powder manufacturing method and high purity metal powder manufacturing apparatus Expired - Fee Related JP4042095B2 (en)

Priority Applications (1)

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JP2002063447A JP4042095B2 (en) 2002-03-08 2002-03-08 High purity metal powder manufacturing method and high purity metal powder manufacturing apparatus

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Application Number Priority Date Filing Date Title
JP2002063447A JP4042095B2 (en) 2002-03-08 2002-03-08 High purity metal powder manufacturing method and high purity metal powder manufacturing apparatus

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JP2003268422A JP2003268422A (en) 2003-09-25
JP2003268422A5 true JP2003268422A5 (en) 2005-08-25
JP4042095B2 JP4042095B2 (en) 2008-02-06

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Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100584570B1 (en) 2006-02-28 2006-05-30 한국기계연구원 Apparatus for plasma reaction
EP1942202A3 (en) * 2007-01-08 2010-09-29 Heraeus, Inc. High density, low oxygen Re and Re-based consolidated powder materials for use as deposition sources & methods of making the same
JP5301530B2 (en) * 2008-03-28 2013-09-25 Ｊｘ日鉱日石金属株式会社 Platinum powder for magnetic material target, method for producing the same, method for producing magnetic material target comprising a platinum sintered body, and the same sintered magnetic material target
CN103736435B (en) * 2013-12-27 2015-11-18 中国神华能源股份有限公司 A kind of equipment and system utilizing ac plasma nodularization powder
KR102020314B1 (en) * 2017-12-07 2019-09-11 한국생산기술연구원 Method for manufacturing spherical high purity metal powder
KR102273282B1 (en) * 2020-01-30 2021-07-06 주식회사 나노코리아 Method for producing metal powder
KR102491080B1 (en) * 2021-08-05 2023-01-19 한국핵융합에너지연구원 Powder spheronization device using plasma
KR102467741B1 (en) * 2021-08-05 2022-11-16 한국핵융합에너지연구원 Atomizing system and atomizing method using plasma

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5749937A (en) * 1995-03-14 1998-05-12 Lockheed Idaho Technologies Company Fast quench reactor and method
JP2001020065A (en) * 1999-07-07 2001-01-23 Hitachi Metals Ltd Target for sputtering, its production and high melting point metal powder material

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