JP2003257817A5 - - Google Patents

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Publication number
JP2003257817A5
JP2003257817A5 JP2002054162A JP2002054162A JP2003257817A5 JP 2003257817 A5 JP2003257817 A5 JP 2003257817A5 JP 2002054162 A JP2002054162 A JP 2002054162A JP 2002054162 A JP2002054162 A JP 2002054162A JP 2003257817 A5 JP2003257817 A5 JP 2003257817A5
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JP
Japan
Prior art keywords
mask
light
pattern
exposure apparatus
alignment pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002054162A
Other languages
English (en)
Japanese (ja)
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JP2003257817A (ja
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Publication date
Application filed filed Critical
Priority to JP2002054162A priority Critical patent/JP2003257817A/ja
Priority claimed from JP2002054162A external-priority patent/JP2003257817A/ja
Publication of JP2003257817A publication Critical patent/JP2003257817A/ja
Publication of JP2003257817A5 publication Critical patent/JP2003257817A5/ja
Pending legal-status Critical Current

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JP2002054162A 2002-02-28 2002-02-28 半導体装置の製造方法 Pending JP2003257817A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002054162A JP2003257817A (ja) 2002-02-28 2002-02-28 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002054162A JP2003257817A (ja) 2002-02-28 2002-02-28 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JP2003257817A JP2003257817A (ja) 2003-09-12
JP2003257817A5 true JP2003257817A5 (zh) 2005-08-18

Family

ID=28665393

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002054162A Pending JP2003257817A (ja) 2002-02-28 2002-02-28 半導体装置の製造方法

Country Status (1)

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JP (1) JP2003257817A (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7375795B2 (en) * 2004-12-22 2008-05-20 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP4887958B2 (ja) * 2006-07-27 2012-02-29 凸版印刷株式会社 フォトマスク
JP4978290B2 (ja) * 2007-04-19 2012-07-18 凸版印刷株式会社 フォトマスク及びそれを用いたカラーフィルタの製造方法、カラーフィルタ及び液晶表示装置
CN109901359A (zh) * 2017-12-11 2019-06-18 长鑫存储技术有限公司 用于掩膜的对准图形、掩膜及晶圆

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