JP2003244927A - リニアモータ及びそれを有するステージ装置 - Google Patents

リニアモータ及びそれを有するステージ装置

Info

Publication number
JP2003244927A
JP2003244927A JP2002039621A JP2002039621A JP2003244927A JP 2003244927 A JP2003244927 A JP 2003244927A JP 2002039621 A JP2002039621 A JP 2002039621A JP 2002039621 A JP2002039621 A JP 2002039621A JP 2003244927 A JP2003244927 A JP 2003244927A
Authority
JP
Japan
Prior art keywords
yoke
coil
groove
magnetic
linear motor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002039621A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003244927A5 (enExample
Inventor
Ryuichiro Tominaga
竜一郎 富永
Masashi Tamai
真史 玉井
Keiichi Tanaka
慶一 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Yaskawa Electric Corp
Original Assignee
Nikon Corp
Yaskawa Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Yaskawa Electric Corp filed Critical Nikon Corp
Priority to JP2002039621A priority Critical patent/JP2003244927A/ja
Priority to US10/367,379 priority patent/US6750571B2/en
Publication of JP2003244927A publication Critical patent/JP2003244927A/ja
Publication of JP2003244927A5 publication Critical patent/JP2003244927A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K11/00—Structural association of dynamo-electric machines with electric components or with devices for shielding, monitoring or protection
    • H02K11/01—Structural association of dynamo-electric machines with electric components or with devices for shielding, monitoring or protection for shielding from electromagnetic fields, i.e. structural association with shields
    • H02K11/014—Shields associated with stationary parts, e.g. stator cores
    • H02K11/0141—Shields associated with casings, enclosures or brackets
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical & Material Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Linear Motors (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Motor Or Generator Frames (AREA)
  • Connection Of Motors, Electrical Generators, Mechanical Devices, And The Like (AREA)
  • Details Of Measuring And Other Instruments (AREA)
JP2002039621A 2002-02-18 2002-02-18 リニアモータ及びそれを有するステージ装置 Pending JP2003244927A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002039621A JP2003244927A (ja) 2002-02-18 2002-02-18 リニアモータ及びそれを有するステージ装置
US10/367,379 US6750571B2 (en) 2002-02-18 2003-02-14 Magnetically shielded linear motors, and stage apparatus comprising same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002039621A JP2003244927A (ja) 2002-02-18 2002-02-18 リニアモータ及びそれを有するステージ装置

Publications (2)

Publication Number Publication Date
JP2003244927A true JP2003244927A (ja) 2003-08-29
JP2003244927A5 JP2003244927A5 (enExample) 2005-08-25

Family

ID=27678261

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002039621A Pending JP2003244927A (ja) 2002-02-18 2002-02-18 リニアモータ及びそれを有するステージ装置

Country Status (2)

Country Link
US (1) US6750571B2 (enExample)
JP (1) JP2003244927A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010158156A (ja) * 2008-12-31 2010-07-15 Asml Holding Nv リニアモータの磁気シールド装置
US7932646B2 (en) 2007-01-15 2011-04-26 Canon Kabushiki Kaisha Exposure apparatus with a stage, driving unit,and force applying unit having a separate magnetic shield

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003178958A (ja) * 2001-12-13 2003-06-27 Nikon Corp ステージ装置及び露光装置
JP4216046B2 (ja) * 2002-11-05 2009-01-28 株式会社ソディック コアレス交流リニアモータ
EP1524556A1 (en) * 2003-10-17 2005-04-20 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method and positioning system
TWI288306B (en) * 2003-11-05 2007-10-11 Asml Netherlands Bv Lithographic apparatus and method for manufacturing a lithographic device
US7956499B2 (en) * 2005-06-02 2011-06-07 Seagate Technology Llc Motor magnetic force attenuator
DE102005047451A1 (de) * 2005-09-30 2007-04-12 Siemens Ag Synchronmaschine
FR2895594B1 (fr) * 2005-12-22 2008-03-07 Sagem Defense Securite Dispositif de deplacement lineaire d'un corps entre deux positions predeterminees
US7348752B1 (en) * 2006-09-20 2008-03-25 Asml Netherlands B.V. Stage apparatus and lithographic apparatus
TWI414129B (zh) * 2009-12-14 2013-11-01 Fang Fu Chang Manufacturing method of shaded motor
JP5140103B2 (ja) * 2010-03-17 2013-02-06 株式会社日立ハイテクノロジーズ リニアモータ対、移動ステージ、及び電子顕微鏡
CN103228404B (zh) * 2010-11-29 2016-02-24 Thk株式会社 对准载物台
EP2469339B1 (en) * 2010-12-21 2017-08-30 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2008696A (en) * 2011-05-25 2012-11-27 Asml Netherlands Bv A multi-stage system, a control method therefor, and a lithographic apparatus.
JP5417380B2 (ja) * 2011-06-06 2014-02-12 株式会社日立ハイテクノロジーズ リニアモータ，可動ステージおよび電子顕微鏡
JP2015032609A (ja) * 2013-07-31 2015-02-16 キヤノン株式会社 駆動装置、荷電粒子線照射装置、及びデバイスの製造方法
IL277957B2 (en) 2018-05-02 2025-08-01 Asml Netherlands Bv E-beam facility
CN109474160B (zh) * 2018-12-30 2023-08-22 中国科学院沈阳自动化研究所 一种在轨发射装置
EP3712462A1 (de) * 2019-03-19 2020-09-23 Integrated Dynamics Engineering GmbH Schwingungsisolationssystem mit einem magnetaktor
CN112987512B (zh) * 2021-03-08 2023-05-30 上海隐冠半导体技术有限公司 一种六自由度微动装置及电子束装备

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3215362B2 (ja) * 1997-10-20 2001-10-02 キヤノン株式会社 リニアモータ、ステージ装置および露光装置
EP1189018B1 (de) * 2000-09-15 2009-02-25 Vistec Electron Beam GmbH Sechsachsiges Positioniersystem mit magnetfeldfreiem Raum

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7932646B2 (en) 2007-01-15 2011-04-26 Canon Kabushiki Kaisha Exposure apparatus with a stage, driving unit,and force applying unit having a separate magnetic shield
JP2010158156A (ja) * 2008-12-31 2010-07-15 Asml Holding Nv リニアモータの磁気シールド装置
KR101104865B1 (ko) * 2008-12-31 2012-01-17 에이에스엠엘 홀딩 엔.브이. 선형 모터 자기 실드 장치
US9130443B2 (en) 2008-12-31 2015-09-08 Asml Holding N.V. Linear motor magnetic shield apparatus
US9136751B2 (en) 2008-12-31 2015-09-15 Asml Holding N.V. Linear motor magnetic shield apparatus for lithographic systems

Also Published As

Publication number Publication date
US6750571B2 (en) 2004-06-15
US20030155820A1 (en) 2003-08-21

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