JP2003218346A5 - - Google Patents
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- Publication number
- JP2003218346A5 JP2003218346A5 JP2002363419A JP2002363419A JP2003218346A5 JP 2003218346 A5 JP2003218346 A5 JP 2003218346A5 JP 2002363419 A JP2002363419 A JP 2002363419A JP 2002363419 A JP2002363419 A JP 2002363419A JP 2003218346 A5 JP2003218346 A5 JP 2003218346A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/029,583 US20030116531A1 (en) | 2001-12-20 | 2001-12-20 | Method of forming one or more nanopores for aligning molecules for molecular electronics |
| US10/029583 | 2001-12-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003218346A JP2003218346A (ja) | 2003-07-31 |
| JP2003218346A5 true JP2003218346A5 (ja) | 2006-02-09 |
Family
ID=21849787
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002363419A Withdrawn JP2003218346A (ja) | 2001-12-20 | 2002-12-16 | 分子エレクトロニクス用に分子を整列させるために１つまたは複数のナノポアを形成する方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US20030116531A1 (ja) |
| JP (1) | JP2003218346A (ja) |
| GB (1) | GB2387272B (ja) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10161312A1 (de) * | 2001-12-13 | 2003-07-10 | Infineon Technologies Ag | Verfahren zum Herstellen einer Schicht-Anordnung und Schicht-Anordnung |
| US6919002B2 (en) * | 2002-05-17 | 2005-07-19 | Agilent Technologies, Inc. | Nanopore system using nanotubes and C60 molecules |
| JP4418300B2 (ja) * | 2004-05-25 | 2010-02-17 | 株式会社日立製作所 | 記録媒体作製方法とこれを用いた記録媒体及び情報記録再生装置 |
| US20050287523A1 (en) * | 2004-06-01 | 2005-12-29 | The Regents Of The University Of California | Functionalized platform for individual molecule or cell characterization |
| JP4813775B2 (ja) * | 2004-06-18 | 2011-11-09 | 日本電信電話株式会社 | 多孔構造体及びその製造方法 |
| US7102204B2 (en) * | 2004-06-29 | 2006-09-05 | International Business Machines Corporation | Integrated SOI fingered decoupling capacitor |
| US7553730B2 (en) * | 2006-07-14 | 2009-06-30 | Agilent Technologies, Inc. | Methods of fabrication employing nanoscale mandrels |
| US8192600B2 (en) * | 2007-09-27 | 2012-06-05 | The Board Of Trustees Of The University Of Illinois | Solid state device |
| DE102008039798A1 (de) * | 2008-08-15 | 2010-02-25 | NMI Naturwissenschaftliches und Medizinisches Institut an der Universität Tübingen | Verfahren zur Übertragung von Nanostrukturen in ein Substrat |
| JP2010283381A (ja) * | 2010-08-26 | 2010-12-16 | Nippon Telegr & Teleph Corp <Ntt> | ヘテロ構造の製造方法 |
| US8535512B2 (en) | 2010-09-30 | 2013-09-17 | California Institute Of Technology | Devices and methods for sequencing nucleic acids |
| WO2012045016A2 (en) * | 2010-09-30 | 2012-04-05 | California Institute Of Technology | Particulate nanosorting stack |
| US8889562B2 (en) | 2012-07-23 | 2014-11-18 | International Business Machines Corporation | Double patterning method |
| CN104803348A (zh) * | 2015-04-20 | 2015-07-29 | 中国科学院光电技术研究所 | 一种牺牲模板制备高深宽比聚合物纳米柱阵列的方法 |
| EP3343651B1 (en) * | 2015-10-02 | 2019-09-18 | Central Glass Company, Limited | Thermoelectric conversion material and method for producing same |
| CN109072451B (zh) | 2016-03-18 | 2021-08-03 | 麻省理工学院 | 纳米多孔半导体材料及其制造 |
| CN106315505B (zh) * | 2016-08-24 | 2018-11-06 | 深圳先进技术研究院 | 一种增强聚酰亚胺基底和导电金属层之间的粘附力的方法 |
| US10370247B2 (en) | 2016-08-29 | 2019-08-06 | International Business Machines Corporation | Contacting molecular components |
| US10739299B2 (en) * | 2017-03-14 | 2020-08-11 | Roche Sequencing Solutions, Inc. | Nanopore well structures and methods |
| CN111937120A (zh) | 2018-04-05 | 2020-11-13 | 麻省理工学院 | 多孔和纳米多孔半导体材料及其制造 |
| CN110364594B (zh) * | 2019-07-19 | 2020-05-29 | 中原工学院 | 一种氮化镓或氮化铝纳米孔的制备方法 |
| US11674947B2 (en) | 2020-06-13 | 2023-06-13 | International Business Machines Corporation | Nanopore structures |
| US11715640B2 (en) * | 2020-09-30 | 2023-08-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Patterning material including silicon-containing layer and method for semiconductor device fabrication |
| US20220102200A1 (en) * | 2020-09-30 | 2022-03-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Patterning material including carbon-containing layer and method for semiconductor device fabrication |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4407695A (en) * | 1981-12-31 | 1983-10-04 | Exxon Research And Engineering Co. | Natural lithographic fabrication of microstructures over large areas |
| US5393373A (en) * | 1991-07-11 | 1995-02-28 | Goldstar Electron Co., Ltd. | Methods of patterning and manufacturing semiconductor devices |
| US5569355A (en) * | 1995-01-11 | 1996-10-29 | Center For Advanced Fiberoptic Applications | Method for fabrication of microchannel electron multipliers |
| EP0731490A3 (en) * | 1995-03-02 | 1998-03-11 | Ebara Corporation | Ultra-fine microfabrication method using an energy beam |
| US6379572B1 (en) * | 2000-06-02 | 2002-04-30 | Sony Corporation | Flat panel display with spaced apart gate emitter openings |
| US6274396B1 (en) * | 2001-01-29 | 2001-08-14 | Advanced Micro Devices, Inc. | Method of manufacturing calibration wafers for determining in-line defect scan tool sensitivity |
| JP2003053699A (ja) * | 2001-08-10 | 2003-02-26 | Nikon Corp | ピンホール製造方法及び測定装置 |
| US6515325B1 (en) * | 2002-03-06 | 2003-02-04 | Micron Technology, Inc. | Nanotube semiconductor devices and methods for making the same |
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2001
- 2001-12-20 US US10/029,583 patent/US20030116531A1/en not_active Abandoned
-
2002
- 2002-12-16 JP JP2002363419A patent/JP2003218346A/ja not_active Withdrawn
- 2002-12-19 GB GB0229598A patent/GB2387272B/en not_active Expired - Fee Related
-
2007
- 2007-10-03 US US11/906,819 patent/US7922927B2/en not_active Expired - Fee Related