JP2003213497A - Electronic part and plating tool and plating method using the same - Google Patents

Electronic part and plating tool and plating method using the same

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Publication number
JP2003213497A
JP2003213497A JP2002328036A JP2002328036A JP2003213497A JP 2003213497 A JP2003213497 A JP 2003213497A JP 2002328036 A JP2002328036 A JP 2002328036A JP 2002328036 A JP2002328036 A JP 2002328036A JP 2003213497 A JP2003213497 A JP 2003213497A
Authority
JP
Japan
Prior art keywords
plating
electronic component
negative electrode
plating jig
jig
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002328036A
Other languages
Japanese (ja)
Other versions
JP3620531B2 (en
Inventor
Yasuaki Naito
保昭 内藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2002328036A priority Critical patent/JP3620531B2/en
Publication of JP2003213497A publication Critical patent/JP2003213497A/en
Application granted granted Critical
Publication of JP3620531B2 publication Critical patent/JP3620531B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a plating tool for electronic parts which can plate a multiplicity of the electronic parts at a time by improving current efficiency in a shorter time without the occurrence of deformation and damage and without the occurrence of plating trouble, such as nonuniform plating film thicknesses and a plating method. <P>SOLUTION: The plating method by contact energization with an electrode in an electrolyte cell comprises using a casing of a resin system as a casing to form the negative electrode, installing a magnet into the easing, installing the negative electrode formed of a conductive material to one surface of the casing which surface comes into contact with the electronic parts, bringing the electronic parts into contact at all times with the plating tool having an aligning tool of a resin material type used to align the electronic parts and immersing the electronic parts into the electrolyte cell, then energizing the electronic parts to plate the electronic parts. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、電子部品のめっき
治具およびめっき方法に関する。
TECHNICAL FIELD The present invention relates to a plating jig and a plating method for electronic parts.

【0002】[0002]

【従来の技術】従来の電子部品用めっき治具としては、
略楕円状の貫通孔が多数、整列して形成しているものが
あった(例えば、特許文献1参照)。
2. Description of the Related Art As a conventional plating jig for electronic parts,
In some cases, a large number of substantially elliptical through holes are formed in alignment (see, for example, Patent Document 1).

【0003】図9において、めっき治具101上面およ
び下面の貫通孔102周縁には銅箔層104a、104
bが形成され、この間を接続するように、貫通孔102
の内壁にはスルーホール銅めっき層103を形成してい
る。なお、スルーホール銅めっき層103はスルーホー
ルめっきの性質上、貫通孔102の内壁だけでなくめっ
き治具101の表面にも銅めっき層が形成され、銅箔層
104a、104bを覆うように形成している。図9
(b)に示すように、めっき治具101の下面には、数
カ所(図示は2カ所のみ)の外部電極(図示せず)との
通電領域105と、この通電領域105と貫通孔102
周縁のスルーホール銅めっき層103とを接続する銅箔
層104bのパターンを形成している。貫通孔102は
気密端子Aの2本のリードA2、A2間の長さよりも若
干大きく、気密端子AのベースA1よりも若干小さく形
成され、ベースA1がめっき治具101の上面に引っか
かった状態で保持している。この際、めっき治具101
上面部のスルーホール銅めっき層103がベースA1へ
の通電電極の役割、貫通孔102の内壁のスルーホール
銅めっき層103がリードA2への通電電極の役割を果
たしている。
In FIG. 9, copper foil layers 104a, 104 are formed on the upper and lower surfaces of the plating jig 101 at the periphery of the through holes 102.
b is formed, and the through hole 102 is formed so as to connect between them.
A through-hole copper plating layer 103 is formed on the inner wall of the. Due to the nature of through-hole plating, the through-hole copper plating layer 103 is formed not only on the inner wall of the through hole 102 but also on the surface of the plating jig 101 so as to cover the copper foil layers 104a and 104b. is doing. Figure 9
As shown in (b), on the lower surface of the plating jig 101, there are energized regions 105 with external electrodes (not shown) at several places (only two places are shown), and the energized regions 105 and the through holes 102.
A pattern of a copper foil layer 104b for connecting to the peripheral through-hole copper plating layer 103 is formed. The through hole 102 is formed to be slightly larger than the length between the two leads A2, A2 of the airtight terminal A and slightly smaller than the base A1 of the airtight terminal A, and the base A1 is caught on the upper surface of the plating jig 101. keeping. At this time, the plating jig 101
The through-hole copper plating layer 103 on the upper surface serves as an energizing electrode to the base A1, and the through-hole copper plating layer 103 on the inner wall of the through hole 102 serves as an energizing electrode to the lead A2.

【0004】次に、従来のめっき方法を図8に示す。多
数の気密端子Aを整列、保持しためっき治具101は、
めっき治具保持具106により気密端子Aが落下しない
ように固定され、ドラム107の側面に着脱自在に装着
される。ドラム107の側面には外部電極棒108が数
本(図示は2本)突出して設けられ、めっき治具101
下面に形成された通電領域(図示せず)にあてがわれ
る。ドラム107はめっき浴109中に浸漬され、電極
棒108には負電圧が、ドラム107の両側に設けられ
た電極板110には正電圧が印加される。そしてめっき
浴109中でドラム107が回転することにより重力で
リードが貫通孔内壁のスルーホール銅めっき層103に
接触し、めっきを行っている。
Next, a conventional plating method is shown in FIG. The plating jig 101 in which a large number of airtight terminals A are aligned and held is
The airtight terminal A is fixed by the plating jig holder 106 so as not to drop, and is detachably attached to the side surface of the drum 107. On the side surface of the drum 107, a plurality of (two in the figure) external electrode rods 108 are provided so as to project.
It is applied to a current-carrying region (not shown) formed on the lower surface. The drum 107 is immersed in the plating bath 109, and a negative voltage is applied to the electrode rod 108 and a positive voltage is applied to the electrode plates 110 provided on both sides of the drum 107. When the drum 107 rotates in the plating bath 109, the leads come into contact with the through-hole copper plating layer 103 on the inner wall of the through-hole due to gravity, and plating is performed.

【0005】[0005]

【特許文献1】特開平10−130894号公報[Patent Document 1] Japanese Unexamined Patent Publication No. 10-130894

【0006】[0006]

【発明が解決しようとする課題】このようなめっき方法
では、なおも全電子部品と電極との接触が十分でない時
もあり、めっき被膜表面にむらが生じたり、めっき膜厚
不均一となる恐れがあるとともに、電流効率が悪くめっ
き時間を短くし難いという問題があった。
In such a plating method, the contact between all electronic components and the electrodes may still be insufficient, which may cause unevenness on the surface of the plating film or uneven plating film thickness. In addition, there is a problem that current efficiency is poor and it is difficult to shorten the plating time.

【0007】そこで、本発明はこの様な問題点を全て解
決するために、電子部品表面のめっきむら発生の防止お
よびめっき厚均一化、ならびに電流効率を良くしてめっ
き時間を短くすることの出来るめっき治具およびめっき
方法を提供することを目的とする。
In order to solve all of these problems, the present invention can prevent the occurrence of uneven plating on the surface of electronic parts, make the plating thickness uniform, and improve the current efficiency to shorten the plating time. An object is to provide a plating jig and a plating method.

【0008】[0008]

【課題を解決するための手段】前記従来の課題を解決す
るために、磁石が取り付けられた負電極と、前記負電極
の少なくとも一面上に着脱自在に取り付けられる、配列
穴または溝を有する整列板とからなる電子部品のめっき
治具であるから、電子部品の各リード線端面を接触させ
て電子部品を立設に整列配置して電子部品に安定した電
流を流せるという作用がある。
In order to solve the above-mentioned conventional problems, a negative electrode having a magnet attached thereto and an alignment plate having an array hole or groove detachably attached to at least one surface of the negative electrode. Since it is a plating jig for electronic components, it has an effect that the end faces of the lead wires of the electronic components are brought into contact with each other and the electronic components are vertically aligned, so that a stable current can be applied to the electronic components.

【0009】また、前記電極板の内部に磁石が埋め込ま
れ密封された電子部品のめっき治具であるから、前記磁
石の劣化を防止するという作用がある。
Further, since it is a plating jig for electronic parts in which a magnet is embedded and sealed inside the electrode plate, it has an effect of preventing deterioration of the magnet.

【0010】また、めっき治具の整列板に設けられた配
列穴または溝に電子部品を挿入し、次にその整列板を電
極板の上に設置して、電子部品のリード線の端面を前記
電極板に接触させて電子部品を立設配置し、次にそのめ
っき治具をめっき液槽に形成されためっき治具保持具に
設置して各めっき治具を保持した後、前記めっき治具を
めっき治具保持具に形成された回転棒の同軸方向に回転
させてめっきする電子部品のめっき方法であるから、め
っき治具をめっき治具保持具に1台以上保持することが
できるので、一度に多数の電子部品にめっきすることも
できる。
Further, the electronic parts are inserted into the arrangement holes or grooves provided in the alignment plate of the plating jig, and then the alignment plate is placed on the electrode plate, and the end faces of the lead wires of the electronic parts are set to the above-mentioned positions. The electronic parts are placed upright in contact with the electrode plate, and then the plating jig is installed in the plating jig holder formed in the plating solution tank to hold each plating jig, Since it is a method of plating an electronic component in which the plating is performed by rotating the rotary rod formed in the plating jig holder in the coaxial direction, it is possible to hold one or more plating jigs in the plating jig holder. It is also possible to plate many electronic components at one time.

【0011】[0011]

【発明の実施の形態】以下、本発明の実施形態を図に示
し詳しく説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described in detail below with reference to the drawings.

【0012】図1(a)は本実施形態の電子部品として
例えば、レーザーダイオード用気密端子を示す断面図で
あり、図1(b)は図1(a)のA部拡大図である。
FIG. 1A is a sectional view showing, for example, an airtight terminal for a laser diode as an electronic component of this embodiment, and FIG. 1B is an enlarged view of a portion A of FIG. 1A.

【0013】(実施例1)図1(a)において、1は
鉄、鉄−ニッケル合金などの板材を金型成型されたベー
ス、2は鉄、鉄−ニッケル合金などからなるアースリー
ド、3はガラス、エポキシ樹脂からなる絶縁物、4は
鉄、鉄−ニッケル合金などからなる絶縁リード、5は
銅、ニッケルなどのめっき層からなる第2金属被膜層、
6は金、パラジウムなどのめっき層からなる第1金属被
膜層である。以下に詳細な構成を説明する。ベース1に
は金型形成の際に貫通孔7が形成されている。また、ベ
ース1およびアースリード2ならびに絶縁リード4には
第2金属被膜層5が形成されている。ベース1には貫通
孔7に絶縁リード4が挿通され絶縁物3を介して封着さ
れ、且つ片面に絶縁リード4と略平行状態でアースリー
ド2が、抵抗溶接、金属ろう材などにより導通接続され
ている。さらに、絶縁リード4には第1金属被膜層6が
形成されたものである。これによれば、第1金属被膜層
6を導電性ワイヤー(図示せず。)を介して半導体素子
(図示せず。)と導通接続を行う絶縁リード4のみに施
されており、第1金属被膜層6のコストを抑えることが
できる。
(Embodiment 1) In FIG. 1A, 1 is a base formed by molding a plate material of iron, iron-nickel alloy or the like, 2 is a ground lead made of iron, iron-nickel alloy or the like, and 3 is Insulator made of glass or epoxy resin, 4 is an insulating lead made of iron, iron-nickel alloy, or the like, 5 is a second metal coating layer made of a plated layer of copper, nickel, or the like,
Reference numeral 6 is a first metal coating layer made of a plated layer of gold, palladium or the like. The detailed configuration will be described below. Through holes 7 are formed in the base 1 when forming a mold. A second metal coating layer 5 is formed on the base 1, the ground lead 2 and the insulating lead 4. The insulating lead 4 is inserted into the through hole 7 in the base 1 and sealed by the insulator 3 and the ground lead 2 is conductively connected to one side in a state substantially parallel to the insulating lead 4 by resistance welding, a metal brazing material or the like. Has been done. Further, the insulating lead 4 has a first metal coating layer 6 formed thereon. According to this, the first metal coating layer 6 is applied only to the insulating lead 4 which is electrically connected to the semiconductor element (not shown) through the conductive wire (not shown). The cost of the coating layer 6 can be suppressed.

【0014】図2は、本実施形態のレーザーダイオード
用気密端子のめっき治具概略を示す斜視図であり、図3
は断面図である。
FIG. 2 is a perspective view showing an outline of a plating jig for the airtight terminal for laser diode of this embodiment.
Is a sectional view.

【0015】(実施例2)図2、図3において、負電極
板10内部に磁石11が耐食性に優れた部材により埋め
込み密封され、負電極9が装着されている。さらに負電
極9と整列板12との嵌合用ピン13が形成されてい
る。次に整列板12はレーザーダイオード用気密端子1
4が一定間隔で整列するようスルーホールまたはスリッ
ト15が設けられ、また負電極板10との嵌合用ホール
16が形成され、レーザーダイオード用気密端子14が
多数個立設整列した整列板12を負電極板10に取り付
ける。さらに整列板12は負電極板10と嵌合後は、レ
ーザーダイオード用気密端子14と接触することはな
い。またこの際、負電極9上面を一定間隔で整列するよ
う形成されたスルーホールまたはスリット15以外の個
所を覆うよう設置され、負電極9へのめっき析出を抑え
るマスキングの役割を果たす。
(Embodiment 2) In FIGS. 2 and 3, a magnet 11 is embedded and sealed in a negative electrode plate 10 by a member having excellent corrosion resistance, and a negative electrode 9 is mounted. Furthermore, a pin 13 for fitting the negative electrode 9 and the alignment plate 12 is formed. Next, the alignment plate 12 is the airtight terminal 1 for the laser diode.
Through holes or slits 15 are provided so that 4 are aligned at regular intervals, a hole 16 for fitting with the negative electrode plate 10 is formed, and the aligning plate 12 in which a large number of laser diode airtight terminals 14 are vertically arranged is provided. It is attached to the electrode plate 10. Further, the alignment plate 12 does not come into contact with the laser diode airtight terminal 14 after fitting with the negative electrode plate 10. Further, at this time, the negative electrode 9 is installed so as to cover the upper surface of the negative electrode 9 except for through holes or slits 15 formed so as to be aligned at regular intervals, and plays a role of masking for suppressing plating deposition on the negative electrode 9.

【0016】(実施例3)図4、図5において、負電極
板10内部に磁石11が耐食性に優れた部材により埋め
込み密封し負電極9が装着されている。さらに負電極板
10と整列板12との嵌合用ピン13が形成されてい
る。負電極9には、スチールウール、導電性不織布、導
電性ゴム、導電性発泡体などからなる柔軟性を有する導
電性物として例えば、導電性不織布17が装着されてい
る。これによれば、負電極9とレーザーダイオード用気
密端子14との接触性がより向上するものである。次に
整列板12はレーザーダイオード用気密端子14が一定
間隔で整列するようスルーホールまたはスリット15が
設けられ、また負電極板10との嵌合用ホール16が形
成され、レーザーダイオード用気密端子14が多数個立
設整列した整列板12を負電極板10に取り付ける。さ
らに整列板12は負電極板10と嵌合後は、レーザーダ
イオード用気密端子14と接触することはない。またこ
の際、負電極9上面を一定間隔で整列するよう形成され
たスルーホールまたはスリット15以外の個所を覆うよ
う設置され、負電極9へのめっき析出を抑えるマスキン
グの役割を果たす。
(Embodiment 3) In FIGS. 4 and 5, a negative electrode 9 is mounted by sealing a magnet 11 inside a negative electrode plate 10 with a member having excellent corrosion resistance. Furthermore, a pin 13 for fitting the negative electrode plate 10 and the alignment plate 12 is formed. The negative electrode 9 is equipped with, for example, a conductive non-woven fabric 17 as a flexible conductive substance such as steel wool, a conductive non-woven fabric, conductive rubber, and a conductive foam. According to this, the contact property between the negative electrode 9 and the laser diode hermetic terminal 14 is further improved. Next, the aligning plate 12 is provided with through holes or slits 15 so that the laser diode airtight terminals 14 are aligned at regular intervals, and a hole 16 for fitting with the negative electrode plate 10 is formed. A large number of vertically arranged alignment plates 12 are attached to the negative electrode plate 10. Further, the alignment plate 12 does not come into contact with the laser diode airtight terminal 14 after fitting with the negative electrode plate 10. Further, at this time, the negative electrode 9 is installed so as to cover the upper surface of the negative electrode 9 except for through holes or slits 15 formed so as to be aligned at regular intervals, and plays a role of masking for suppressing plating deposition on the negative electrode 9.

【0017】また、負電極板10のレーザーダイオード
用気密端子14との接触面に絶縁層からなるパターンを
形成し、レーザーダイオード用気密端子14の一部との
導通を制限することにより絶縁リード4への部分めっき
を可能とする。
The insulating lead 4 is formed by forming a pattern of an insulating layer on the contact surface of the negative electrode plate 10 with the laser diode airtight terminal 14 and limiting the conduction with a part of the laser diode airtight terminal 14. It enables partial plating on.

【0018】(実施例4)次に、このめっき治具18を
用いためっき方法について図6を参照しながら説明す
る。多数のレーザーダイオード用気密端子14を整列、
保持しためっき治具18は、電解液槽8に形成されため
っき治具保持具19によりめっき治具18が複数個、電
解液面22と垂直方向に保持され、めっき治具保持具1
9中央部に形成した回転棒20の同軸方向に回転し負電
極9に負電圧が正電極21に正電圧が印加される。そし
て、レーザーダイオード用気密端子14のアウターリー
ドと負電極9が常時接触通電している。まためっき治具
保持具19の回転の作用によりめっき治具18間の電解
作用のバラツキを低減することができ、次にめっき終了
後は整列板12を取り外すことで整列したままの状態で
レーザーダイオード用気密端子14を取り出す。
(Embodiment 4) Next, a plating method using the plating jig 18 will be described with reference to FIG. Align a large number of laser diode airtight terminals 14,
The held plating jig 18 is held by the plating jig holder 19 formed in the electrolytic solution tank 8 in a direction perpendicular to the electrolytic solution surface 22.
The rotary rod 20 formed in the central portion of the shaft 9 rotates in the coaxial direction, and a negative voltage is applied to the negative electrode 9 and a positive voltage is applied to the positive electrode 21. The outer lead of the hermetic terminal 14 for the laser diode and the negative electrode 9 are always in contact with each other and energized. Further, the variation of the electrolytic action between the plating jigs 18 can be reduced by the action of rotation of the plating jig holder 19, and after the plating is completed, the alignment plate 12 is removed to keep the laser diode aligned. The airtight terminal 14 is taken out.

【0019】(実施例5)次に、このめっき治具18を
用いためっき方法について図7を参照しながら説明す
る。多数のレーザーダイオード用気密端子14を整列、
保持しためっき治具18をめっき治具保持具19により
めっき治具18を複数個、電解液面22と垂直方向に一
定間隔で保持してめっき液中に浸漬し、負電極9に負電
圧が正電極21に正電圧が印加される。そして、レーザ
ーダイオード用気密端子14のアウターリードと負電極
9が常時接触通電している。さらにめっき液中に一定間
隔に設けられた2列以上の正電極21とレーザーダイオ
ード用気密端子14が立設配置されためっき治具18を
交互に配置しめっきを行う。これによれば、電解液槽8
内のスペースを効率よく使用することができ、一度に多
数のレーザーダイオード用気密端子14にめっきを施す
ことを可能とする。次に接触通電後、整列板12を取り
外し整列状態でレーザーダイオード用気密端子14を取
り出す。
(Fifth Embodiment) Next, a plating method using the plating jig 18 will be described with reference to FIG. Align a large number of laser diode airtight terminals 14,
The held plating jig 18 is immersed in the plating solution by holding a plurality of plating jigs 18 at a constant interval in the direction perpendicular to the electrolytic solution surface 22 by the plating jig holder 19 and applying a negative voltage to the negative electrode 9. A positive voltage is applied to the positive electrode 21. The outer lead of the hermetic terminal 14 for the laser diode and the negative electrode 9 are always in contact with each other and energized. Further, plating is performed by alternately arranging two or more rows of positive electrodes 21 and the laser jig hermetically-sealed terminals 14 provided upright at regular intervals in the plating solution. According to this, the electrolytic solution tank 8
It is possible to efficiently use the internal space, and it is possible to plate a large number of laser diode airtight terminals 14 at one time. Next, after the contact energization, the aligning plate 12 is removed, and the hermetic terminal 14 for the laser diode is taken out in the aligned state.

【0020】尚、本実施形態では、永久磁石を用いめっ
き治具を形成したが、電気磁石を用いる構成とすること
で、さらに電子部品の脱着効率が向上する。
In the present embodiment, the plating jig is formed by using the permanent magnet, but by using the electric magnet, the attachment / detachment efficiency of the electronic component is further improved.

【0021】[0021]

【発明の効果】以上のように本発明の電子部品のめっき
治具によれば、全電子部品が各外部リード線を介し電極
に常時接触しているので、電子部品表面のめっきむらの
発生防止およびめっき厚均一化、ならびに電流効率を良
くしてめっき時間を短くできる。また本発明の電子部品
のめっき方法によれば、一度に複数のめっき治具を保持
することができるので、1バッチで多数の電子部品にめ
っきすることができる。
As described above, according to the electronic component plating jig of the present invention, since all the electronic components are constantly in contact with the electrodes through the respective external lead wires, the occurrence of uneven plating on the surface of the electronic component is prevented. Also, the plating time can be shortened by making the plating thickness uniform and improving the current efficiency. Further, according to the electronic component plating method of the present invention, since a plurality of plating jigs can be held at one time, a large number of electronic components can be plated in one batch.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施の形態の実施例1による (a)は断面図 (b)は図1(a)のA部拡大図FIG. 1 is a first embodiment of the present invention. (A) is a sectional view FIG. 1B is an enlarged view of part A of FIG.

【図2】本発明の実施の形態の実施例2によるめっき治
具の概略斜視図
FIG. 2 is a schematic perspective view of a plating jig according to a second embodiment of the present invention.

【図3】本発明の実施の形態の実施例2によるめっき治
具の断面図
FIG. 3 is a sectional view of a plating jig according to Example 2 of the embodiment of the present invention.

【図4】本発明の実施の形態の実施例3によるめっき治
具の概略斜視図
FIG. 4 is a schematic perspective view of a plating jig according to Example 3 of the embodiment of the present invention.

【図5】本発明の実施の形態の実施例3によるめっき治
具の断面図
FIG. 5 is a sectional view of a plating jig according to Example 3 of the embodiment of the present invention.

【図6】本発明の実施の形態の実施例4によるめっき方
法を説明するための斜視図
FIG. 6 is a perspective view for explaining a plating method according to Example 4 of the embodiment of the present invention.

【図7】本発明の実施の形態の実施例5によるめっき方
法を説明するための斜視図
FIG. 7 is a perspective view for explaining a plating method according to example 5 of the embodiment of the present invention.

【図8】従来のめっき方法を示す概略図FIG. 8 is a schematic view showing a conventional plating method.

【図9】(a)、(b)は従来のめっき治具を示す上面
概略図 (c)は従来のめっき治具を示す断面概略図
9A and 9B are schematic top views showing a conventional plating jig, and FIG. 9C is a schematic cross-sectional view showing the conventional plating jig.

【符号の説明】[Explanation of symbols]

1 ベース 2 アースリード 3 絶縁物 4 絶縁リード 5 第2金属被膜層 6 第1金属被膜層 7 貫通孔 8 電解液槽 9 負電極 10 負電極板 11 磁石 12 整列板 13 嵌合ピン 14 レーザーダイオード用気密端子 15 スルーホールまたはスリット 16 嵌合用ホール 17 導電性不織布 18 めっき治具 19 めっき治具保持具 20 回転棒 21 正電極 22 電解液面 101 めっき治具 102 貫通孔 103 銅めっき層 104a 銅箔層 104b 銅箔層 105 通電領域 106 めっき治具保持具 107 ドラム 108 電極棒 109 めっき浴 110 電極板 1 base 2 Earth lead 3 insulator 4 insulated leads 5 Second metal coating layer 6 First metal coating layer 7 through holes 8 Electrolyte tank 9 Negative electrode 10 Negative electrode plate 11 magnets 12 Alignment plate 13 Mating pin 14 Airtight terminal for laser diode 15 through holes or slits 16 mating holes 17 Conductive non-woven fabric 18 Plating jig 19 Plating jig holder 20 rotating rod 21 Positive electrode 22 Electrolyte surface 101 plating jig 102 through hole 103 Copper plating layer 104a copper foil layer 104b Copper foil layer 105 energized area 106 Plating jig holder 107 drums 108 electrode rod 109 plating bath 110 electrode plate

Claims (12)

【特許請求の範囲】[Claims] 【請求項1】貫通孔が設けられたベースと、前記ベース
に導通接続されたアースリードと、前記貫通孔に絶縁物
を介して封着された絶縁リードとからなり、前記絶縁リ
ードに第1金属被膜が形成されたことを特徴とする電子
部品。
1. A base having a through hole, an earth lead electrically connected to the base, and an insulating lead sealed in the through hole via an insulating material. An electronic component having a metal coating formed thereon.
【請求項2】貫通孔が設けられたベースと、前記ベース
に導通接続されたアースリードと、前記貫通孔に絶縁物
を介して封着された絶縁リードとからなり、前記ベース
および前記アースリードならびに前記絶縁リードに第2
金属被膜が形成され、前記絶縁リードの第2金属被膜上
に第1金属被膜が形成されたことを特徴とする電子部
品。
2. A base having a through hole, an earth lead electrically connected to the base, and an insulating lead sealed in the through hole via an insulator. And second to the insulated lead
An electronic component, wherein a metal coating is formed, and a first metal coating is formed on the second metal coating of the insulating lead.
【請求項3】前記第1金属被膜が金めっきにより形成さ
れたことを特徴とする請求項1、請求項2記載の電子部
品。
3. The electronic component according to claim 1, wherein the first metal film is formed by gold plating.
【請求項4】電気めっきに用いるめっき治具において、
負電極に磁石が取り付けられたことを特徴とする電子部
品のめっき治具。
4. A plating jig used for electroplating,
A plating jig for electronic parts, wherein a magnet is attached to the negative electrode.
【請求項5】負電極内部に磁石が密封状態に埋め込まれ
たことを特徴とする電子部品のめっき治具。
5. A plating jig for electronic parts, wherein a magnet is embedded in a sealed state inside the negative electrode.
【請求項6】前記負電極の電子部品との非接触部に絶縁
物が施されたことを特徴とする請求項5記載の電子部品
のめっき治具。
6. The plating jig for an electronic component according to claim 5, wherein an insulating material is applied to a non-contact portion of the negative electrode with the electronic component.
【請求項7】負電極と、前記負電極に取り付ける負電極
板とからなり、前記負電極板に磁石が密封状態に埋め込
まれたことを特徴とする電子部品のめっき治具。
7. A plating jig for electronic parts, comprising a negative electrode and a negative electrode plate attached to the negative electrode, wherein a magnet is hermetically embedded in the negative electrode plate.
【請求項8】前記負電極が柔軟性を有する導電体で形成
することを特徴とする請求項4、請求項5、請求項6、
請求項7記載の電子部品のめっき治具。
8. The negative electrode is formed of a conductor having flexibility, claim 4, claim 5, claim 6,
A plating jig for an electronic component according to claim 7.
【請求項9】前記負電極の電子部品との接触面に、絶縁
物からなるパターンを形成し、電子部品の一部との導通
を制限する機能を有することを特徴とする請求項4、請
求項5、請求項6、請求項7、請求項8記載の電子部品
のめっき治具。
9. The method according to claim 4, wherein a pattern made of an insulating material is formed on a contact surface of the negative electrode with the electronic component to have a function of limiting conduction with a part of the electronic component. The plating jig for electronic parts according to claim 5, claim 6, claim 7, and claim 8.
【請求項10】前記負電極の電子部品を保持する少なく
とも一面上に配列穴または溝を有する整列板が着脱自在
に取り付けられることを特徴とする請求項4、請求項
5、請求項6、請求項7、請求項8、請求項9記載の電
子部品のめっき治具。
10. An aligning plate having an array hole or groove on at least one surface for holding an electronic component of the negative electrode, and the aligning plate is detachably attached to the negative electrode. A plating jig for an electronic component according to claim 7, claim 8 or claim 9.
【請求項11】めっき治具の整列板に設けられた配列穴
または溝に電子部品を挿入し、次にその整列板を電極板
の上に設置して、前記電子部品のリード線の端面を前記
電極板に接触させて電子部品を立設配置し、次にそのめ
っき治具をめっき液槽に形成されためっき治具保持具に
設置してそのめっき治具保治具をめっき液槽に浸漬し、
前記めっき治具をめっき治具保持具に形成された回転棒
の同軸方向に回転させてめっきすることを特徴とする電
子部品のめっき方法。
11. An electronic component is inserted into an array hole or groove provided in an alignment plate of a plating jig, the alignment plate is then placed on an electrode plate, and an end face of a lead wire of the electronic component is attached. The electronic parts are placed upright in contact with the electrode plate, then the plating jig is installed on the plating jig holder formed in the plating solution tank, and the plating jig holding jig is immersed in the plating solution tank. Then
A method of plating an electronic component, which comprises rotating the plating jig in a coaxial direction of a rotary rod formed on a plating jig holder to perform plating.
【請求項12】めっき治具の整列板に設けられた配列穴
または溝に電子部品を挿入し、次にその整列板を電極板
の上に設置して、前記電子部品のリード線の端面を前記
電極板に接触させて電子部品を立設配置し、次に、その
めっき治具をめっき治具保持具に一定間隔で保持してめ
っき液中に浸漬し、めっき液中に一定間隔に設けられた
2列以上の陽極と前記電子部品が立設配置されためっき
治具を交互に配置し、めっきすることを特徴とする電子
部品のめっき方法。
12. An electronic component is inserted into an array hole or groove provided in an alignment plate of a plating jig, and then the alignment plate is placed on an electrode plate to fix an end face of a lead wire of the electronic component. The electronic parts are placed upright in contact with the electrode plate, and then the plating jig is held in the plating jig holder at a constant interval and immersed in the plating solution to provide the plating solution at a constant interval. A method of plating an electronic component, characterized by alternately arranging the two or more rows of anodes and a plating jig on which the electronic component is erected.
JP2002328036A 2001-11-14 2002-11-12 Electronic component, plating jig, and plating method using the same Expired - Fee Related JP3620531B2 (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
JP2001-348437 2001-11-14
JP2001348437 2001-11-14
JP2002328036A JP3620531B2 (en) 2001-11-14 2002-11-12 Electronic component, plating jig, and plating method using the same

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100658305B1 (en) 2003-10-23 2006-12-14 가부시키가이샤 무라타 세이사쿠쇼 Method and device for applying conductive paste
KR100695903B1 (en) * 2005-05-26 2007-03-20 김영준 Electroplating Method Using Magnetism and Manufacturing Method for Electroforming Products
JP2008274320A (en) * 2007-04-26 2008-11-13 Matsushita Electric Ind Co Ltd Plating tool for electronic component
JP2010098112A (en) * 2008-10-16 2010-04-30 Shinko Electric Ind Co Ltd Stem for optical semiconductor, method of electrolytic gold plating semiconductor stem, and optical semiconductor device
KR101153276B1 (en) * 2003-11-05 2012-06-07 신꼬오덴기 고교 가부시키가이샤 Plating jig for electronic parts and electrolysis plating apparatus
KR101153275B1 (en) 2003-11-26 2012-06-07 신꼬오덴기 고교 가부시키가이샤 Plating jig for electronic parts and electrolysis plating apparatus
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100658305B1 (en) 2003-10-23 2006-12-14 가부시키가이샤 무라타 세이사쿠쇼 Method and device for applying conductive paste
KR101153276B1 (en) * 2003-11-05 2012-06-07 신꼬오덴기 고교 가부시키가이샤 Plating jig for electronic parts and electrolysis plating apparatus
KR101153275B1 (en) 2003-11-26 2012-06-07 신꼬오덴기 고교 가부시키가이샤 Plating jig for electronic parts and electrolysis plating apparatus
KR100695903B1 (en) * 2005-05-26 2007-03-20 김영준 Electroplating Method Using Magnetism and Manufacturing Method for Electroforming Products
JP2008274320A (en) * 2007-04-26 2008-11-13 Matsushita Electric Ind Co Ltd Plating tool for electronic component
JP2010098112A (en) * 2008-10-16 2010-04-30 Shinko Electric Ind Co Ltd Stem for optical semiconductor, method of electrolytic gold plating semiconductor stem, and optical semiconductor device
KR200481938Y1 (en) * 2016-05-24 2016-12-01 주식회사 케이피티 Zig device for plating of reflector of lighting lamp and plating method therefor

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