JP3078795B1 - Wiring board plating method and plating jig used therefor - Google Patents

Wiring board plating method and plating jig used therefor

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Publication number
JP3078795B1
JP3078795B1 JP11130672A JP13067299A JP3078795B1 JP 3078795 B1 JP3078795 B1 JP 3078795B1 JP 11130672 A JP11130672 A JP 11130672A JP 13067299 A JP13067299 A JP 13067299A JP 3078795 B1 JP3078795 B1 JP 3078795B1
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JP
Japan
Prior art keywords
plating
wiring board
holding
common conductor
conductor layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP11130672A
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Japanese (ja)
Other versions
JP2000328299A (en
Inventor
嘉一朗 佐藤
Original Assignee
日本特殊陶業株式会社
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Priority to JP11130672A priority Critical patent/JP3078795B1/en
Application granted granted Critical
Publication of JP3078795B1 publication Critical patent/JP3078795B1/en
Publication of JP2000328299A publication Critical patent/JP2000328299A/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

【要約】 【課題】 共通導体層を側面に備えたセラミック製の配
線基板の端子等に電解メッキによりメッキ層を形成する
方法で、該配線基板の保持力の低下を招くことなく、被
着するメッキ金属の無駄を低減する。 【解決手段】 メッキ用冶具1によって配線基板100
を保持しかつ共通導体層105と電解メッキのための導
通をとるにあたり、メッキ用冶具1に、配線基板100
を弾性的に保持する絶縁性及びバネ性のある保持部11
と、保持部とは別に、共通導体層105に弾性的に当接
するバネ性のある導通部21とを設けておく。保持部1
1で配線基板100を弾性的に保持する一方、導通部2
1を共通導体層105に弾性的に当接させて電解メッキ
のための導通をとる。
A method of forming a plating layer on a terminal or the like of a ceramic wiring board having a common conductor layer on a side surface by electrolytic plating without causing a decrease in holding power of the wiring board. Reduce waste of plated metal. SOLUTION: A wiring board 100 is formed by a plating jig 1.
In order to maintain the electrical conductivity and establish electrical continuity with the common conductor layer 105 for electrolytic plating, the plating jig 1
And elastic holding part 11 for elastically holding
In addition to the holding portion, a conductive portion 21 having a spring property and elastically contacting the common conductor layer 105 is provided. Holder 1
1 to elastically hold the wiring board 100,
1 is elastically brought into contact with the common conductor layer 105 to establish conduction for electrolytic plating.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、配線基板のメッキ
方法に関し、詳しくは半導体素子等の電子部品の実装
(封止)に用いられるセラミック製の配線基板(ICパ
ッケージ)の端子などの露出する金属層(配線層)に電
解メッキ(電気メッキ)によってメッキ層を形成する方
法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for plating a wiring board, and more particularly, to exposing terminals and the like of a ceramic wiring board (IC package) used for mounting (sealing) electronic components such as semiconductor elements. The present invention relates to a method for forming a plating layer on a metal layer (wiring layer) by electrolytic plating (electroplating).

【0002】[0002]

【従来の技術】この種の配線基板における半導体素子接
続用の端子や外部接続用の端子を含む金属層は、タング
ステンやモリブデン等の高融点金属からなり、同金属ペ
ーストの印刷されたセラミックグリーンシートを積層、
圧着して同時焼成することで形成される。このような各
端子や配線層などの金属層はロウ付けを可能としたり、
酸化(腐食)防止のため、ニッケルメッキ層が形成さ
れ、さらにその上に金メッキ層が形成されるのが普通で
ある。
2. Description of the Related Art A metal layer including terminals for connecting semiconductor elements and terminals for external connection in a wiring board of this kind is made of a high melting point metal such as tungsten or molybdenum, and is a ceramic green sheet on which the same metal paste is printed. Laminated,
It is formed by pressing and simultaneous firing. Metal layers such as each terminal and wiring layer can be brazed,
In order to prevent oxidation (corrosion), a nickel plating layer is usually formed, and a gold plating layer is further formed thereon.

【0003】このようなメッキ層を電解メッキ(以下単
にメッキともいう)で形成するには図4、5に示したよ
うなメッキ用冶具1が用いられる。すなわちメッキ用冶
具1はハシゴ状をなし、その両側の基部3から、配線基
板100の保持と導通のため、バネ性のある保持導通部
(アーム)31がセットする配線基板100の数(図4で
は3)に対応して設けられている。メッキに際してはこ
の保持導通部31にて配線基板100を弾性的に保持す
る。そして、このように配線基板を保持させたメッキ用
冶具1を陰極に接続されたメッキ用ハンガー111に吊
り下げ状とし、メッキ槽115中のメッキ液120に浸
漬して印加することで端子103などにメッキ層を形成
するのである。
In order to form such a plating layer by electrolytic plating (hereinafter simply referred to as plating), a plating jig 1 as shown in FIGS. That is, the plating jig 1 has a ladder shape, and from the bases 3 on both sides thereof, a holding conductive portion having a spring property for holding and conducting the wiring board 100.
(Arms) 31 are provided corresponding to the number of wiring boards 100 to be set (three in FIG. 4). At the time of plating, the wiring board 100 is elastically held by the holding conductive portions 31. Then, the plating jig 1 holding the wiring board in this manner is hung on a plating hanger 111 connected to a cathode, immersed in a plating solution 120 in a plating tank 115 and applied, so that the terminals 103 and the like are applied. Then, a plating layer is formed.

【0004】なお、図5に示した配線基板(以下単に基
板ともいう)100では、その対向する側面に、端子1
03や図示しない内部の配線層に連なる共通導体層(金
属層)105が形成されており、独立した端子103な
どに共通して導通(通電)がとれるようにされている。
因みに、上記のようにしてメッキ層を形成した基板10
0は、後工程で共通導体層105を研磨(研削)などに
より除去することで各配線を独立させることになる。
In the wiring board (hereinafter also simply referred to as a board) 100 shown in FIG.
Further, a common conductor layer (metal layer) 105 is formed so as to be continuous with the internal wiring layer 03 and an internal wiring layer (not shown).
Incidentally, the substrate 10 on which the plating layer was formed as described above was used.
A value of 0 means that each wiring is made independent by removing the common conductor layer 105 by polishing (grinding) or the like in a later step.

【0005】ところで、このようなメッキ用冶具(以下
単に冶具ともいう)1にて安定した導通をとるために
は、保持導通部31と共通導体層105との確実な接触
が得られることが必要である。このため、前記した従来
の冶具1では同保持導通部31に導通の点だけからすれ
ば必要以上の太さの金属線(金属棒)を用いている。
By the way, in order to achieve stable conduction with such a plating jig (hereinafter simply referred to as a jig) 1, it is necessary that reliable contact between the holding conductive portion 31 and the common conductor layer 105 be obtained. It is. For this reason, in the above-mentioned conventional jig 1, a metal wire (metal rod) having a thickness larger than necessary is used for the holding conductive portion 31 only from the point of conduction.

【0006】[0006]

【発明が解決しようとする課題】ところが、このような
従来の冶具1のように保持導通部31が太いと、それに
被着する無駄なメッキ金属が多くなってしまう。したが
ってとくに金メッキのような貴金属のメッキにおいて
は、配線基板のコストアップを招く原因となっている。
一方で保持導通部31を細い金属線で形成すれば、その
保持力の低下により導通の不安定を招き、安定した電
圧、電流の供給ができなくなり、ひいてはメッキのむら
やメッキ不良を発生させる危険性が高くなる。なお、電
解メッキにおいては、メッキの無駄をなくすため、保持
導通部31はその先端寄り部位の共通導体層105に当
接する部位及びその近傍(以下、当接部位ともいう)32
を除いてメッキがかからないように絶縁層35で被覆さ
れることがあるが、それでも保持導通部31が太い分メ
ッキ金属の無駄が多いといった問題があった。
However, if the holding conductive portion 31 is thick as in the conventional jig 1 as described above, the useless plating metal attached to the holding conductive portion 31 increases. Therefore, in particular, plating of a noble metal such as gold plating causes an increase in the cost of the wiring board.
On the other hand, if the holding / conducting portion 31 is formed of a thin metal wire, the holding force is reduced, leading to instability of conduction, making it impossible to supply a stable voltage and current, and further causing a risk of uneven plating and plating failure. Will be higher. In the electroplating, in order to eliminate waste of plating, the holding conductive portion 31 is located at a position near the tip thereof in contact with the common conductor layer 105 and in the vicinity thereof (hereinafter also referred to as a contact portion) 32.
Except for the above, the coating may be covered with the insulating layer 35 so as not to be plated. However, there is still a problem that the holding conductive portion 31 is large and the plating metal is wasted much.

【0007】本発明はこうした点に鑑みて成されたもの
で、電解メッキにおいて被メッキ物たる配線基板の保持
力の低下を招くことなく、しかも被着するメッキ金属の
無駄を低減できるようにすることにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and it is possible to reduce the waste of plating metal to be deposited without lowering the holding force of a wiring substrate to be plated in electrolytic plating. It is in.

【0008】[0008]

【課題を解決するための手段】前記の目的を達成するた
めに本発明の配線基板のメッキ方法は、共通導体層を側
面に備えたセラミック製の配線基板の端子等に電解メッ
キによりメッキ層を形成する方法において、メッキ用冶
具によって該配線基板を保持しかつ該共通導体層と電解
メッキのための導通をとるにあたり、該メッキ用冶具
に、前記配線基板を弾性的に保持する絶縁性及びバネ性
のある保持部と、該保持部とは別に、前記共通導体層に
弾性的に当接するバネ性のある導通部とを設けておき、
前記保持部で前記配線基板を弾性的に保持する一方、前
記導通部を前記共通導体層に弾性的に当接させて電解メ
ッキのための導通をとることを特徴とする。ここに共通
導体層とは、配線基板の各端子等へ電解メッキによって
メッキ層を形成するにあたり共通して導通がとれるよう
に形成された導体層(金属層)をいう。
In order to achieve the above object, a method of plating a wiring board according to the present invention is to form a plating layer on a terminal or the like of a ceramic wiring board having a common conductor layer on a side face by electrolytic plating. In the forming method, when the wiring board is held by a plating jig and conduction is established for the electrolytic plating with the common conductor layer, the plating jig includes an insulating property and a spring for elastically holding the wiring board. Holding part having a property, separately from the holding part, a conductive part having a spring property that elastically contacts the common conductor layer is provided,
The wiring portion may be elastically held by the holding portion, and the conductive portion may be elastically contacted with the common conductor layer to establish conduction for electrolytic plating. Here, the common conductor layer refers to a conductor layer (metal layer) that is formed so as to be commonly conductive when forming a plating layer on each terminal or the like of the wiring board by electrolytic plating.

【0009】本発明においては、上記手段のようにメッ
キ用冶具の保持部と導通部とを分けて設けたため、保持
部は太くして表面全体を絶縁処理しておく一方で、導通
部は細くして当接部位を除いて絶縁処理しておくことが
できるから、配線基板の保持力の低下を招くことなく、
しかも被着するメッキ金属の無駄を低減できる。したが
って本発明によれば、メッキ不良を招くことなく金メッ
キなどの貴金属の無駄を低減できる。
In the present invention, the holding portion and the conducting portion of the plating jig are provided separately as in the above-mentioned means. Therefore, the holding portion is made thick and the entire surface is insulated, while the conducting portion is made thin. Since the insulation treatment can be performed except for the contact portion, without lowering the holding power of the wiring board,
Moreover, waste of the plated metal to be deposited can be reduced. Therefore, according to the present invention, it is possible to reduce waste of precious metals such as gold plating without causing plating defects.

【0010】本発明における前記導通部は、前記共通導
体層へ当接する部分及びその近傍を除いて表面に絶縁層
を形成しておき、該導通部に被着する無駄なメッキ金属
ができるだけ少なくなるようにするのが好ましい。この
ような本発明においては、前記保持部が金属線と表面の
絶縁層とからなり、前記導通部が該保持部の金属線より
細い金属線で形成するとよい。
[0010] In the present invention, an insulating layer is formed on the surface of the conductive portion except for a portion in contact with the common conductor layer and the vicinity thereof, and useless plating metal adhered to the conductive portion is reduced as much as possible. It is preferable to do so. In such an aspect of the invention, it is preferable that the holding portion is formed of a metal wire and an insulating layer on the surface, and the conduction portion is formed of a metal wire thinner than the metal wire of the holding portion.

【0011】また、本発明は前記方法に用いるメッキ用
冶具も含む。すなわち、共通導体層を側面に備えたセラ
ミック製の配線基板の端子等に電解メッキによりメッキ
層を形成するために該配線基板を保持しかつ該共通導体
層と電解メッキのための導通をとるのに使用されるメッ
キ用冶具であって、前記配線基板を弾性的に保持する絶
縁性及びバネ性のある保持部と、該保持部とは別に、前
記共通導体層に弾性的に当接するバネ性のある導通部と
を設けてなるものである。
The present invention also includes a plating jig used in the above method. That is, the wiring board is held for forming a plating layer by electrolytic plating on terminals of a ceramic wiring board having a common conductor layer on the side surface, and the common conductor layer and the conduction for electrolytic plating are taken. A holding part having an insulating property and a spring property for elastically holding the wiring board, and a spring property for elastically contacting the common conductor layer separately from the holding part. And a conductive portion having the same.

【0012】なお本発明のメッキ用冶具においては、前
記導通部が、前記共通導体層へ当接する部分及びその近
傍を除いて表面に絶縁層を形成してなるものがよい。さ
らに、このようなメッキ用冶具においては、前記保持部
が金属線と表面の絶縁層とからなり、前記導通部が該保
持部の金属線より細い金属線で形成されているとよい。
In the plating jig of the present invention, it is preferable that the conductive portion has an insulating layer formed on the surface except for a portion in contact with the common conductor layer and the vicinity thereof. Further, in such a plating jig, it is preferable that the holding portion is formed of a metal wire and a surface insulating layer, and the conduction portion is formed of a metal wire thinner than the metal wire of the holding portion.

【0013】[0013]

【発明の実施の形態】本発明の実施の形態を図1〜図3
を参照しながら詳細に説明する。図1は、本発明にかか
るメッキ用冶具1にて被メッキ物である配線基板100
を保持すると共にその側面の共通導体層105と導通を
とっている状態の要部斜視図である。なお図中の配線基
板100は、略正方形の板状に形成されてなるもので、
一方の主面には実装するICチップの電極と接続する端
子103やダイアタッチ部が形成され、4つの側面には
共通導体層105が形成され、図示しない内部配線層を
介して端子103などに接続されている。
1 to 3 show an embodiment of the present invention.
This will be described in detail with reference to FIG. FIG. 1 shows a wiring board 100 which is an object to be plated by a plating jig 1 according to the present invention.
FIG. 4 is a perspective view of a main part in a state in which the device is held and is electrically connected to the common conductor layer 105 on the side surface. The wiring board 100 in the figure is formed in a substantially square plate shape.
On one main surface, terminals 103 and die attach portions connected to electrodes of the IC chip to be mounted are formed, and on four side surfaces, a common conductor layer 105 is formed. It is connected.

【0014】本形態にかかるメッキ用冶具1は、従来の
メッキ用冶具1と同様に両側の略平行に配置された角棒
からなる基部3相互が適所において連結部5にて連結さ
れてなるハシゴ状に例えばステンレス合金で形成され、
複数の配線基板100を保持するように形成されてい
る。ただし、基部3や連結部5は表面に樹脂がコーティ
ングされ、絶縁層6をなしている。
The plating jig 1 according to the present embodiment, like the conventional plating jig 1, has a ladder formed by connecting bases 3 formed of square bars arranged on both sides substantially in parallel with each other at a proper position by a connecting portion 5. For example, it is formed of a stainless alloy,
It is formed to hold a plurality of wiring boards 100. However, the base 3 and the connecting portion 5 are coated with a resin on the surface to form an insulating layer 6.

【0015】そして本形態では1つの配線基板100を
保持するため、左右両側の基部3から略垂直に、金属線
(例えばステンレス合金製線材)10からなり適度のバ
ネ性のある2対の保持部11が夫々略平行に延びてお
り、その先端部近傍がそれぞれ外側へ凸となす湾曲状に
曲げられている。こうして、上下それぞれ対向する各一
対の保持部11の湾曲部12で配線基板100の側部を
弾性的に挟みつけ可能に形成されている。ただし、保持
部11の全表面には樹脂がコーティングされ、表面に絶
縁層15が形成されている。また保持部11の先端の湾
曲部12の端には外向き傾斜部16が設けられており、
配線基板100の保持(装着)にあたりこれを冶具1の
側へ押し込む際のガイドをなすようにされている。
In this embodiment, in order to hold one wiring board 100, two pairs of holding portions made of a metal wire (for example, a stainless steel wire) 10 and having an appropriate spring property are provided substantially vertically from the left and right bases 3. Numerals 11 extend substantially parallel to each other, and the vicinity of the distal end is bent outward to form a curved shape. In this manner, the side portions of the wiring substrate 100 can be elastically sandwiched by the curved portions 12 of the pair of holding portions 11 opposed to each other in the upper and lower directions. However, the entire surface of the holding unit 11 is coated with a resin, and the insulating layer 15 is formed on the surface. An outwardly inclined portion 16 is provided at the end of the curved portion 12 at the tip of the holding portion 11,
In holding (mounting) the wiring board 100, it serves as a guide when the wiring board 100 is pushed toward the jig 1.

【0016】一方、配線基板100に対応する上下の保
持部11の略中間には保持部11よりも細い金属線(ス
テンレス合金製線材)からなり、保持部11と同様に基
部(金属)3から略垂直で平行に延びる導通部21が突
出状に形成されている。ただし、導通部21の先端は保
持部11と逆に内側に凸となすように湾曲する湾曲部2
2とされ、図1、3に示したように配線基板100が上
下2対の保持部11にて保持された状態において、その
先端の湾曲部22の最内側寄り部位が配線基板100の
側面の共通導体層105に弾性的に当接するように形成
されている。なお、本形態では導通部21は、先端の湾
曲部22を除いて基部3などと同様にその表面が樹脂で
コーティングされて絶縁層25を備えている。
On the other hand, a metal wire (stainless-alloy wire) thinner than the holding portion 11 is provided substantially at the center of the upper and lower holding portions 11 corresponding to the wiring board 100, like the holding portion 11, from the base (metal) 3. A conductive portion 21 extending substantially vertically and parallel is formed in a protruding shape. However, the leading end of the conducting portion 21 is curved so as to project inward, opposite to the holding portion 11.
In the state where the wiring board 100 is held by the upper and lower holding parts 11 as shown in FIGS. It is formed so as to elastically contact the common conductor layer 105. In the present embodiment, the surface of the conductive portion 21 is coated with resin in the same manner as the base 3 and the like except for the curved portion 22 at the distal end, and the insulating portion 25 is provided.

【0017】このような本形態のメッキ用冶具1を用い
て配線基板100の端子103などにメッキ層を形成す
るに当たっては、冶具1に対して所定数の配線基板10
0を、それぞれ図2、3中に2点鎖線で示した自由状態
にある各保持部11と導通部21の湾曲部12、22相
互間に臨ませて冶具1の基部3側に押し込む。すると、
保持部11と導通部21はそのバネ性によって外側へ撓
み変形して広がると共に、配線基板100の側面が保持
部11の湾曲部12にはまり込んで冶具1に保持(装
着)される。同時に導通部21の湾曲部22が配線基板
100の共通導体層105に弾性的に当接する。こうし
て、配線基板100はメッキ用冶具1に導通がとられて
保持される。
When a plating layer is formed on the terminals 103 of the wiring board 100 using the plating jig 1 of the present embodiment, a predetermined number of wiring boards 10
2 is pressed between the holding portion 11 and the curved portions 12 and 22 of the conducting portion 21 in the free state shown by the two-dot chain line in FIGS. Then
The holding portion 11 and the conducting portion 21 are bent outward and expanded by their spring properties, and the side surface of the wiring board 100 is fitted into the curved portion 12 of the holding portion 11 and held (mounted) on the jig 1. At the same time, the curved portion 22 of the conductive portion 21 elastically contacts the common conductor layer 105 of the wiring board 100. In this way, the wiring board 100 is held in conduction with the plating jig 1.

【0018】以後は、その状態の冶具1を従来と同様に
陰極に接続されたハンガーに引っ掛けて吊り下げ状とし
てメッキ槽のメッキ液中に浸漬して印加することで、配
線基板の端子103や共通導体層105など露出し、共
通導体層105に導通が保持された金属層にメッキ層が
形成される。
Thereafter, the jig 1 in that state is hooked on a hanger connected to the cathode in the same manner as in the prior art, and is suspended and dipped in a plating solution in a plating tank and applied. A plating layer is formed on the metal layer exposed such as the common conductor layer 105 and the conduction of the common conductor layer 105 is maintained.

【0019】このようなメッキ工程においては、冶具1
の配線基板100の保持をなす保持部11が太い金属線
10からなるので配線基板100を安定して保持できる
し、この保持部11は絶縁されていることからメッキ金
属が被着することがない。さらに、導通部21の湾曲部
22は細くしかも共通導体層105に当接している同湾
曲部22のみ金属が露出しているだけのため、メッキ金
属の配線基板100以外への被着を従来のメッキ工程よ
りも低減できる。かくして、金などの貴金属のメッキを
かける場合を含め、メッキ金属の無駄を可及的に低減で
きる。
In such a plating step, the jig 1
Since the holding portion 11 for holding the wiring board 100 is made of the thick metal wire 10, the wiring board 100 can be stably held, and since the holding portion 11 is insulated, the plating metal does not adhere. . Further, since the curved portion 22 of the conductive portion 21 is thin and only the metal is exposed only in the curved portion 22 which is in contact with the common conductor layer 105, the plating metal is not applied to a portion other than the wiring board 100 in the conventional art. It can be reduced compared to the plating process. Thus, the waste of the plated metal can be reduced as much as possible, including the case of plating a noble metal such as gold.

【0020】本形態のメッキ用冶具1では、1つの配線
基板100の保持のための保持部11を2対としたた
め、その保持の安定性に優れるが、本発明において同保
持部11は配線基板100を保持できればよく、その数
や配置は適宜のものとすればよい。また、保持部11は
金属線10の表面に絶縁層15を形成したものとした
が、バネ性及び絶縁性があればよく、したがって、保持
部11全体の材質をプラスチックなどの非金属で形成し
てもよい。また保持部11の形状は配線基板を保持でき
ればよく、前記形態のものに限定されるものではない。
In the plating jig 1 of the present embodiment, the holding parts 11 for holding one wiring board 100 are provided in two pairs, so that the holding stability is excellent. It is sufficient that 100 can be held, and the number and arrangement may be appropriately determined. Further, the holding portion 11 has the insulating layer 15 formed on the surface of the metal wire 10. However, the holding portion 11 only needs to have a spring property and an insulating property. Therefore, the material of the entire holding portion 11 is formed of a nonmetal such as plastic. You may. Further, the shape of the holding portion 11 is only required to be able to hold the wiring board, and is not limited to the above-described embodiment.

【0021】また導通部は本形態のように共通導体層1
05に当接する部位を除いて樹脂などの絶縁材をコーテ
ィングしておくとよい。この場合においては導通の保持
に支障のない限り、露出する金属の表面積を小さくする
のがメッキ金属の無駄を少なくする上で好ましい。さら
に前記においては1つの配線基板100に対応する導通
部11を左右一対として配線基板100の対向する両側
面の共通導体層105に当接するように設けたが、本発
明ではこのように設ける必要は必ずしもない。配線基板
の共通導体層との導通が保持されればよく、したがっ
て、例えば前記形態における配線基板100の共通導体
層105が全部が連なっている場合には導通部は1つと
することも可能である。本発明のメッキ用冶具は、保持
すべき配線基板の数や配線基板の大きさなどに応じて適
宜設計変更して具体化すればよい。
The conductive portion is formed of the common conductor layer 1 as in this embodiment.
It is preferable to coat an insulating material such as a resin except for a portion that comes into contact with the part 05. In this case, it is preferable to reduce the surface area of the exposed metal in order to reduce the waste of the plated metal, as long as it does not hinder the conduction. Further, in the above description, the conductive portions 11 corresponding to one wiring board 100 are provided as a pair of left and right so as to be in contact with the common conductor layer 105 on both opposing side surfaces of the wiring board 100. Not necessarily. It suffices that conduction with the common conductor layer of the wiring board is maintained. Therefore, for example, when all of the common conductor layers 105 of the wiring board 100 in the above-described embodiment are continuous, it is possible to provide one conduction portion. . The plating jig of the present invention may be embodied by appropriately changing the design according to the number of wiring boards to be held, the size of the wiring boards, and the like.

【0022】なお配線基板の共通導体層のパターン(平
面形状)は、導通を確実にとるため、メッキ用冶具の導
通部が当接する部位(図1に例示した基板ではその側面
の中央寄り部位)の幅をできるだけ広くするのが好まし
い。一方、この共通導体層のうち導通部が当接しない部
位は被着するメッキ金属の無駄を低減するため、できる
だけ幅を狭くするのが好ましい。また配線基板の4つの
側面に共通導体層がある場合でもその共通導体層は独立
して設けるのでなく、配線基板の内部の例えば側面のコ
ーナー近傍で互いに接続する設計とするのが好ましい。
さらに、本発明は前記した配線基板に限らず、共通導体
層を備えた各種のICパッケージなどの配線基板の電解
メッキにおいて適用できる。
The pattern (planar shape) of the common conductor layer of the wiring board is a portion where the conductive portion of the plating jig contacts (a portion near the center of the side surface of the substrate illustrated in FIG. 1) in order to ensure conduction. Is preferably as wide as possible. On the other hand, the portion of the common conductor layer where the conductive portion does not contact is preferably made as narrow as possible in order to reduce the waste of the plating metal to be deposited. Even when the common conductor layers are provided on the four side surfaces of the wiring board, it is preferable that the common conductor layers are not provided independently, but are connected to each other inside the wiring board, for example, near the corners of the side surfaces.
Further, the present invention is not limited to the above-described wiring board, and is applicable to electrolytic plating of wiring boards such as various IC packages having a common conductor layer.

【0023】[0023]

【発明の効果】以上の説明から明らかなように、本発明
によれば次の効果がある。すなわち、メッキ用冶具の保
持部と導通部とを分けて設けたため、保持部は太くして
表面全体を絶縁処理しておく一方で、導通部は細くして
当接部位を除いて絶縁処理しておくことができるから、
配線基板の保持力の低下を招くことなく、しかも被着す
るメッキ金属の無駄を低減できる。このように本発明に
よれば、メッキ不良を招くことなく金メッキなどの貴金
属の無駄を低減できるため、配線基板の製造コストの低
減も期待される。
As is apparent from the above description, the present invention has the following effects. That is, since the holding portion and the conducting portion of the plating jig are provided separately, the holding portion is thickened and the entire surface is insulated, while the conducting portion is thinned and the insulating portion is removed except for the contact portion. You can keep
It is possible to reduce the waste of the plating metal to be deposited without lowering the holding power of the wiring board. As described above, according to the present invention, it is possible to reduce the waste of noble metal such as gold plating without causing plating failure, and therefore, it is expected that the manufacturing cost of the wiring board is reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係るメッキ方法の実施形態を説明する
もので、配線基板をメッキ用冶具に保持させた状態の要
部の斜視図。
FIG. 1 is an explanatory view of an embodiment of a plating method according to the present invention, and is a perspective view of a main part in a state where a wiring board is held by a plating jig.

【図2】図1において上から見た拡大図。FIG. 2 is an enlarged view seen from above in FIG.

【図3】図1における配線基板の拡大中央平断面図。FIG. 3 is an enlarged central plan sectional view of the wiring board in FIG. 1;

【図4】従来のメッキ方法を説明するもので、メッキ用
冶具に配線基板を取付けてハンガーに引っ掛けて吊り下
げ、メッキ槽に浸漬している状態の説明図。
FIG. 4 is an explanatory view illustrating a conventional plating method, in which a wiring board is attached to a plating jig, hung and hung on a hanger, and immersed in a plating tank.

【図5】図5における要部の斜視図。FIG. 5 is a perspective view of a main part in FIG. 5;

【符号の説明】[Explanation of symbols]

1 メッキ用冶具 10 保持部をなす金属線 11 保持部 15 保持部の絶縁層 21 導通部(金属線) 22 導通部の共通導体層へ当接する部分及びその近傍 23 導通部の絶縁層 100 セラミック製の配線基板 105 共通導体層 DESCRIPTION OF SYMBOLS 1 Plating jig 10 Metal wire forming a holding portion 11 Holding portion 15 Insulating layer of holding portion 21 Conducting portion (metal wire) 22 Contact portion of contact portion with common conductor layer and its vicinity 23 Insulating layer of conducting portion 100 Ceramic Wiring board 105 common conductor layer

Claims (6)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 共通導体層を側面に備えたセラミック製
の配線基板の端子等に電解メッキによりメッキ層を形成
する方法において、メッキ用冶具によって該配線基板を
保持しかつ該共通導体層と電解メッキのための導通をと
るにあたり、該メッキ用冶具に、前記配線基板を弾性的
に保持する絶縁性及びバネ性のある保持部と、該保持部
とは別に、前記共通導体層に弾性的に当接するバネ性の
ある導通部とを設けておき、前記保持部で前記配線基板
を弾性的に保持する一方、前記導通部を前記共通導体層
に弾性的に当接させて電解メッキのための導通をとるこ
とを特徴とする配線基板のメッキ方法。
In a method of forming a plating layer on a terminal or the like of a ceramic wiring board having a common conductor layer on a side surface by electrolytic plating, the wiring board is held by a plating jig, and the common conductor layer and the common conductor layer are connected to each other. In order to establish conduction for plating, the plating jig has an insulating and spring-like holding portion for elastically holding the wiring board, and aside from the holding portion, the common conductive layer has an elasticity. A conductive portion having a spring property is provided so as to be in contact therewith, and the wiring portion is elastically held by the holding portion, while the conductive portion is elastically brought into contact with the common conductor layer for electrolytic plating. A plating method for a wiring board, wherein the plating is conducted.
【請求項2】 請求項1において、前記導通部が、前記
共通導体層へ当接する部分及びその近傍を除いて表面に
絶縁層を形成してなることを特徴とする配線基板のメッ
キ方法。
2. The method for plating a wiring board according to claim 1, wherein the conductive portion is formed by forming an insulating layer on the surface except for a portion in contact with the common conductor layer and the vicinity thereof.
【請求項3】 請求項1又は2において、前記保持部が
金属線と表面の絶縁層とからなり、前記導通部が該保持
部の金属線より細い金属線で形成されていることを特徴
とする配線基板のメッキ方法。
3. The holding part according to claim 1, wherein the holding part comprises a metal wire and a surface insulating layer, and the conduction part is formed by a metal wire thinner than the metal wire of the holding part. The plating method of the wiring board to be performed.
【請求項4】 共通導体層を側面に備えたセラミック製
の配線基板の端子等に電解メッキによりメッキ層を形成
するために該配線基板を保持しかつ該共通導体層と電解
メッキのための導通をとるのに使用されるメッキ用冶具
であって、前記配線基板を弾性的に保持する絶縁性及び
バネ性のある保持部と、該保持部とは別に、前記共通導
体層に弾性的に当接するバネ性のある導通部とを設けて
なることを特徴とするメッキ用冶具。
4. A method for forming a plating layer on a terminal of a ceramic wiring board having a common conductor layer on a side surface by electrolytic plating to hold a wiring board, and conducting the electroconductive plating with the common conductor layer. A jig for plating, which is used for removing the wiring board, and a holding portion having an insulating property and a spring property for holding the wiring board elastically; A plating jig provided with a conductive portion having a spring property in contact therewith.
【請求項5】 請求項4において、前記導通部が、前記
共通導体層へ当接する部分及びその近傍を除いて表面に
絶縁層を形成してなることを特徴とする配線基板のメッ
キ用冶具。
5. The jig for plating a wiring board according to claim 4, wherein the conductive portion is formed by forming an insulating layer on the surface except for a portion in contact with the common conductor layer and the vicinity thereof.
【請求項6】 請求項4又は5において、前記保持部が
金属線と表面の絶縁層とからなり、前記導通部が該保持
部の金属線より細い金属線で形成されていることを特徴
とするメッキ用冶具。
6. The holding part according to claim 4, wherein the holding part comprises a metal wire and a surface insulating layer, and the conducting part is formed of a metal wire thinner than the metal wire of the holding part. Jig for plating.
JP11130672A 1999-05-11 1999-05-11 Wiring board plating method and plating jig used therefor Expired - Fee Related JP3078795B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11130672A JP3078795B1 (en) 1999-05-11 1999-05-11 Wiring board plating method and plating jig used therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11130672A JP3078795B1 (en) 1999-05-11 1999-05-11 Wiring board plating method and plating jig used therefor

Publications (2)

Publication Number Publication Date
JP3078795B1 true JP3078795B1 (en) 2000-08-21
JP2000328299A JP2000328299A (en) 2000-11-28

Family

ID=15039863

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3078795B1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100689241B1 (en) 2006-02-10 2007-03-02 주식회사 아바코 Jig for fixing sample
CN101857968B (en) * 2010-05-11 2012-01-04 上海新阳半导体材料股份有限公司 Lead frame rack compressing device and electroplating device
KR101406835B1 (en) 2013-02-06 2014-06-19 에이비엠 주식회사 jig for plating of LED package substrate

Also Published As

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