JP2003188366A - Solid-state image pick-up device and solid-state image pick-up camera - Google Patents

Solid-state image pick-up device and solid-state image pick-up camera

Info

Publication number
JP2003188366A
JP2003188366A JP2001388003A JP2001388003A JP2003188366A JP 2003188366 A JP2003188366 A JP 2003188366A JP 2001388003 A JP2001388003 A JP 2001388003A JP 2001388003 A JP2001388003 A JP 2001388003A JP 2003188366 A JP2003188366 A JP 2003188366A
Authority
JP
Japan
Prior art keywords
solid
state imaging
bare chip
imaging device
semiconductor bare
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001388003A
Other languages
Japanese (ja)
Other versions
JP3896586B2 (en
Inventor
Kazuhiro Hoshino
和弘 星野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP2001388003A priority Critical patent/JP3896586B2/en
Publication of JP2003188366A publication Critical patent/JP2003188366A/en
Application granted granted Critical
Publication of JP3896586B2 publication Critical patent/JP3896586B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Transforming Light Signals Into Electric Signals (AREA)
  • Studio Devices (AREA)
  • Solid State Image Pick-Up Elements (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a solid-state image pickup device easy to make itself thin as well as capable of compensating aberration due to curvature of an image plane in an imaging optical type. <P>SOLUTION: A spherical surface type of curvature plane 141 is formed in response to curvature of the image plane produced by the aberration of an image lens of the imaging optical type, to a back plane of a semiconductor bare chip 14 with a flip-chip mounted on a wiring board 12, and constructs a solid-state image device 302 by pasting the back plane of a solid-state image element 16, along the curved formation on a curvature plane 141 of this semiconductor bare chip 14. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、CCD等の固体撮
像素子からなる固体撮像装置及びこの固体撮像装置を用
いた固体撮像カメラに関し、さらに詳しくは、固体撮像
素子及びその信号処理IC用半導体ベアチップの高密度
実装と薄型化を可能にし、かつレンズの像面湾曲の影響
を受けにくい固体撮像装置及びこの固体撮像装置を用い
た固体撮像カメラに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solid-state image pickup device including a solid-state image pickup device such as a CCD and a solid-state image pickup camera using the solid-state image pickup device, and more specifically to a solid-state image pickup device and a semiconductor bare chip for a signal processing IC thereof. The present invention relates to a solid-state imaging device that enables high-density mounting and thinning, and is less susceptible to the field curvature of a lens, and a solid-state imaging camera using the solid-state imaging device.

【0002】[0002]

【従来の技術】従来の固体撮像装置及びこの固体撮像装
置を用いた固体撮像カメラについて、図5を参照して説
明する。図5は従来における固体撮像カメラの概略構成
を示す断面図である。この図5において、固体撮像カメ
ラは、固体撮像装置500及びレンズアッセンブリ−6
00を備えている。固体撮像装置500は、上面に光取
り込み用の開口部501Aが形成され下面が開放された
セラミックパッケージ501を有し、このセラミックパ
ッケージ501の下面には、その開口を閉鎖するように
して配線基板502が固着され、この配線基板502の
パッケージ側内面には信号処理ICを構成する半導体ベ
アチップ503が実装されている。また、セラミックパ
ッケージ501内の開口部501Aと対向する箇所には
平板状の固体撮像素子504がフリップチップ実装さ
れ、さらに、セラミックパッケージ501の上面には、
その開口部501Aを封止するシールガラス505が取
り付けられている。なお、配線基板502とセラミック
パッケージ501は半田接合される。このとき、固体撮
像素子504と信号処理IC用の半導体ベアチップ50
3の間には、0.2mm程度の空間的な隙間が寸法公差の
兼ね合いから必ず発生していた。また、固体撮像素子5
04の厚みとしては、機械的強度を確保するために0.
3mm程度の厚みが必要である。
2. Description of the Related Art A conventional solid-state image pickup device and a solid-state image pickup camera using this solid-state image pickup device will be described with reference to FIG. FIG. 5 is a sectional view showing a schematic configuration of a conventional solid-state imaging camera. In FIG. 5, the solid-state imaging camera includes a solid-state imaging device 500 and a lens assembly-6.
It is equipped with 00. The solid-state imaging device 500 has a ceramic package 501 whose upper surface is provided with an opening portion 501A for taking in light and whose lower surface is opened. The lower surface of the ceramic package 501 has its opening closed so as to close the wiring board 502. , And a semiconductor bare chip 503 forming a signal processing IC is mounted on the inner surface of the wiring substrate 502 on the package side. Further, a flat plate-shaped solid-state image pickup device 504 is flip-chip mounted at a position facing the opening 501A in the ceramic package 501, and further, on the upper surface of the ceramic package 501,
A seal glass 505 that seals the opening 501A is attached. The wiring board 502 and the ceramic package 501 are soldered. At this time, the solid-state imaging device 504 and the semiconductor bare chip 50 for the signal processing IC
Between 3 and 4, a spatial gap of about 0.2 mm was always generated due to the dimensional tolerance. In addition, the solid-state image sensor 5
The thickness of 04 is 0 to secure mechanical strength.
A thickness of about 3 mm is required.

【0003】レンズアッセンブリ−600は、撮影光像
を固体撮像装置500の固体撮像素子504上に結像す
る結像光学系を構成するもので、セラミックパッケージ
501の開口部501A側上面に設けられたレンズ鏡筒
601を備え、このレンズ鏡筒601内には撮像レンズ
602がレンズ支持部材603により装着されている。
また、レンズ支持部材603には絞り孔604が形成さ
れており、さらに、レンズ鏡筒601内の撮像レンズ6
02の光出射側には赤外線カットフィルター605が配
設されている。
The lens assembly 600 constitutes an image forming optical system for forming a photographic light image on the solid-state image pickup device 504 of the solid-state image pickup device 500, and is provided on the upper surface of the ceramic package 501 on the side of the opening 501A. A lens barrel 601 is provided, and an imaging lens 602 is mounted in the lens barrel 601 by a lens support member 603.
A diaphragm hole 604 is formed in the lens support member 603, and the image pickup lens 6 in the lens barrel 601 is further formed.
An infrared cut filter 605 is disposed on the light emission side of 02.

【0004】[0004]

【発明が解決しようとする課題】しかし、このような固
体撮像カメラの結像光学系に使用されるレンズにおいて
は、像面湾曲と称される収差が発生する。この場合、図
6に示すように、固体撮像素子504の受光表面の中心
部Aに撮像レンズ602の合焦位置を合わせても、固体
撮像素子504の周辺部では、像面湾曲の影響により撮
像レンズ602の焦点位置は点Bとなり、焦点ずれが発
生してしまう。その結果、画像の中心部と周辺部で画質
が不均一になるなど、撮像特性の劣化が発生していた。
また、携帯電話などに組み込まれる超小型カメラのよう
に固体撮像カメラ全体の厚みを薄くしたいという要求に
対して、薄くなるほど固体撮像カメラのレンズ設計は困
難になり、画面全体に渡り焦点の合った薄型の固体撮像
カメラを実現することは困難であった。
However, in the lens used in the image forming optical system of such a solid-state image pickup camera, aberration called field curvature is generated. In this case, as shown in FIG. 6, even if the focus position of the imaging lens 602 is aligned with the central portion A of the light receiving surface of the solid-state image sensor 504, the peripheral portion of the solid-state image sensor 504 is imaged by the influence of the field curvature. The focal position of the lens 602 is point B, and defocus occurs. As a result, the image pickup characteristics are deteriorated such that the image quality becomes uneven in the central portion and the peripheral portion of the image.
In addition, in response to the demand for thinner overall solid-state imaging cameras such as ultra-small cameras built into mobile phones, the thinner the lens, the more difficult it becomes to design the lens of the solid-state imaging camera. It has been difficult to realize a thin solid-state imaging camera.

【0005】本発明の目的は、結像光学系の像面湾曲に
よる収差を補正できるとともに、薄型化の容易な固体撮
像装置及びこれを使用した薄型で小型化の容易な固体撮
像カメラを提供することにある。
An object of the present invention is to provide a solid-state image pickup device which can correct aberration due to field curvature of an image forming optical system and can be easily thinned, and a thin solid-state image pickup camera using the same which is easily miniaturized. Especially.

【0006】[0006]

【課題を解決するための手段】上記の目的を達成するた
めに本発明の固体撮像装置は、一方の面に結像光学系の
収差により生じる像面湾曲に対応した湾曲面が形成され
た半導体ベアチップと、前記半導体ベアチップの湾曲面
に該湾曲形状に沿わせて貼り合わされた可撓性を有する
固体撮像素子とを備えることを特徴とする。
In order to achieve the above object, a solid-state image pickup device of the present invention is a semiconductor in which a curved surface corresponding to the field curvature caused by the aberration of the imaging optical system is formed on one surface. It is characterized by comprising a bare chip and a flexible solid-state imaging device attached to the curved surface of the semiconductor bare chip along the curved shape.

【0007】本発明の固体撮像装置においては、固体撮
像素子が半導体ベアチップの湾曲面に該湾曲形状に沿わ
せて貼り合わされた構造になっているため、半導体ベア
チップを含めた固体撮像装置全体を薄型化することがで
き、しかも、固体撮像素子の受光面は結像光学系の像面
湾曲に沿って湾曲されているため、結像光学系の像面湾
曲による収差を補正することができ、かつ固体撮像素子
の受光面の全域にわたり焦点の合った固体撮像装置を提
供することができ、周辺ボケの少ない良好な画質が得ら
れる。
In the solid-state image pickup device of the present invention, since the solid-state image pickup element is bonded to the curved surface of the semiconductor bare chip along the curved shape, the entire solid-state image pickup device including the semiconductor bare chip is thin. Further, since the light receiving surface of the solid-state image sensor is curved along the field curvature of the imaging optical system, it is possible to correct the aberration due to the field curvature of the imaging optical system, and It is possible to provide a solid-state imaging device in which the entire light-receiving surface of the solid-state imaging device is in focus, and a good image quality with less peripheral blur can be obtained.

【0008】また、本発明は、固体撮像装置と、前記固
体撮像装置の光入射側に配置され撮影光像を結像させる
結像光学ユニットとを有する固体撮像カメラであって、
前記固体撮像装置は半導体ベアチップと固体撮像素子と
を備え、前記半導体ベアチップは、一方の面に結像光学
系の収差により生じる像面湾曲に対応した湾曲面を有
し、前記固体撮像素子は可撓性を有し、前記半導体ベア
チップの湾曲面に該湾曲形状に沿わせて貼り合わされて
いることを特徴とする。
The present invention also provides a solid-state image pickup camera having a solid-state image pickup device and an image-forming optical unit arranged on the light incident side of the solid-state image pickup device to form a photographic light image.
The solid-state imaging device includes a semiconductor bare chip and a solid-state imaging element, and the semiconductor bare chip has a curved surface corresponding to the field curvature caused by the aberration of the imaging optical system on one surface, and the solid-state imaging element is It has flexibility and is bonded to the curved surface of the semiconductor bare chip along the curved shape.

【0009】本発明の固体撮像カメラにおいては、半導
体ベアチップの一方の面に結像光学系の収差により生じ
る像面湾曲に対応した湾曲面を形成し、この湾曲面に固
体撮像素子を貼り合わせて固体撮像装置を構成するとと
もに、この固体撮像装置を結像光学ユニットに組み付け
ることで固体撮像カメラを構成するようにしたので、固
体撮像装置自体の薄型化に伴い、固体撮像カメラを小型
化及び薄型化することができる。
In the solid-state imaging camera of the present invention, a curved surface corresponding to the field curvature caused by the aberration of the imaging optical system is formed on one surface of the semiconductor bare chip, and the solid-state imaging element is bonded to this curved surface. Since the solid-state image pickup device is configured and the solid-state image pickup device is assembled to the imaging optical unit to form the solid-state image pickup camera, the solid-state image pickup device is made thinner and thinner. Can be converted.

【0010】[0010]

【発明の実施の形態】以下、本発明の実施の形態につい
て、図面を参照して説明する。図1(A),(B)は本
発明の第1の実施の形態における固体撮像装置の製造過
程を示す説明用断面図、図2は第1の実施の形態に示す
固体撮像装置に結像光学ユニットを組み付けて固体撮像
カメラを構成した場合の説明用断面図である。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. 1A and 1B are sectional views for explaining the manufacturing process of the solid-state imaging device according to the first embodiment of the present invention, and FIG. 2 is an image formed on the solid-state imaging device according to the first embodiment. It is an explanatory sectional view when a solid-state imaging camera is constituted by assembling an optical unit.

【0011】図1において、固体撮像装置10は、実装
用の配線基板12、半導体ベアチップ14及び固体撮像
素子16等を備えている。半導体ベアチップ14は、固
体撮像装置10の信号処理IC(集積回路)を構成する
ためのもので、例えば固体撮像素子16からのアナログ
信号をYUV8Bitのフォーマットにして出力する機
能、12Cバス通信により外部からカメラ機能の入力信
号を受けて制御を行う機能、または、不揮発性メモリを
搭載して、ホワイトバランスのユーザー設定値、色再現
設定値、欠陥補正パラメータなどの初期設定を行う機能
などを備える。また、半導体ベアチップ14の裏面、す
なわち、信号処理用ICが形成される面と反対の面に
は、図1(A),(B)に示すように、結像光学系の収
差により発生する像面湾曲に対応した球面状の湾曲面1
41が形成されている。また、このような半導体ベアチ
ップ14は、その湾曲面141が上面を向くようにし
て、信号処理用IC形成面側が配線基板12上にフリッ
プチップ実装されている。また、半導体ベアチップ14
の湾曲面141には、固体撮像素子16が湾曲面141
の湾曲形状に沿わせて貼り合わされている。
In FIG. 1, a solid-state image pickup device 10 includes a wiring board 12 for mounting, a semiconductor bare chip 14, a solid-state image pickup element 16 and the like. The semiconductor bare chip 14 is for configuring a signal processing IC (integrated circuit) of the solid-state image pickup device 10. For example, a function of outputting an analog signal from the solid-state image pickup device 16 in a YUV 8 bit format, and 12C bus communication from the outside. It has a function of receiving an input signal of a camera function and performing control, or a function of mounting a non-volatile memory and performing initial setting of user setting values of white balance, color reproduction setting values, defect correction parameters, and the like. Further, as shown in FIGS. 1A and 1B, on the back surface of the semiconductor bare chip 14, that is, the surface opposite to the surface on which the signal processing IC is formed, as shown in FIGS. Spherical curved surface 1 corresponding to surface curvature
41 are formed. In addition, such a semiconductor bare chip 14 is flip-chip mounted on the wiring substrate 12 with the signal processing IC formation surface side so that the curved surface 141 faces the upper surface. In addition, the semiconductor bare chip 14
On the curved surface 141 of the solid-state imaging device 16,
It is attached along the curved shape of.

【0012】以下、本発明の固体撮像装置の製造方法に
ついて、図1を参照して説明する。まず、半導体ベアチ
ップ14の裏面を結像光学系の撮像レンズの像面湾曲率
に沿って、機械的切削工法などにより球面状に加工する
ことにより湾曲面141を形成する。或いは、後退性レ
ジストを用いて、半導体ベアチップ14の中心に微小な
開口部を設け、等方性ドライエッチング技術により、球
面状の湾曲面141を加工するようにしても良い。この
場合、最も薄い中心部の厚さは、200μm程度とする
ことが機械強度的に安全であるが、100μm 程度まで
薄くしても良い。
Hereinafter, a method of manufacturing the solid-state image pickup device of the present invention will be described with reference to FIG. First, a curved surface 141 is formed by processing the back surface of the semiconductor bare chip 14 into a spherical shape by a mechanical cutting method or the like along the field curvature rate of the imaging lens of the imaging optical system. Alternatively, a receding resist may be used to provide a minute opening in the center of the semiconductor bare chip 14, and the spherical curved surface 141 may be processed by an isotropic dry etching technique. In this case, it is safe in terms of mechanical strength to set the thickness of the thinnest center part to about 200 μm, but it may be as thin as about 100 μm.

【0013】次に、コンデンサなどの受動部品18を配
線基板12に実装した後に、半導体ベアチップ14を配
線基板12にフリップチップ実装する。この際、半導体
ベアチップ14のAl電極にAuバンプ20を形成し
て、配線基板12の電極と超音波接合法により実装す
る。また、この時の半導体ベアチップ実装方法として
は、Agペーストによる接合などの方法であっても良
い。また、半導体ベアチップ実装には、ACF(異方性
導電フィルム)による接合なども可能である。半導体ベ
アチップ14を配線基板12に実装した後は、樹脂によ
るアンダーフィルを行い、半導体ベアチップ14と配線
基板12との機械的結合強度を補強する。
Next, after mounting the passive component 18 such as a capacitor on the wiring board 12, the semiconductor bare chip 14 is flip-chip mounted on the wiring board 12. At this time, the Au bumps 20 are formed on the Al electrodes of the semiconductor bare chip 14 and mounted on the electrodes of the wiring board 12 by ultrasonic bonding. Further, the semiconductor bare chip mounting method at this time may be a method such as bonding with Ag paste. Further, for semiconductor bare chip mounting, joining by ACF (anisotropic conductive film) is also possible. After the semiconductor bare chip 14 is mounted on the wiring board 12, resin underfill is performed to reinforce the mechanical coupling strength between the semiconductor bare chip 14 and the wiring board 12.

【0014】次に、固体撮像素子16の裏面、すなわち
受光面と反対の面を研削することにより、固体撮像素子
16を50μm 以下の厚さに加工する。好ましくは、2
0μm程度の厚さに加工する。これにより、固体撮像素
子16に可撓性を持たせる。次に、半導体ベアチップ1
4の湾曲面141、もしくは固体撮像素子16の裏面、
もしくは両方に接着剤を塗布し、圧縮空気にて半導体ベ
アチップ14と固体撮像素子16の裏面同士を接着させ
る。こうすることによって、固体撮像素子16の受光面
を半導体ベアチップ14の湾曲面141に沿って湾曲さ
れた状態、すなわち結像光学系の撮像レンズの像面湾曲
率に湾曲させた状態に実装することができる。次に、固
体撮像素子16のAl電極と配線基板12の電極との間
をボンディングワイヤー22により電気的に接続する。
Next, the back surface of the solid-state image sensor 16, that is, the surface opposite to the light-receiving surface is ground to process the solid-state image sensor 16 to a thickness of 50 μm or less. Preferably 2
Process to a thickness of about 0 μm. As a result, the solid-state image sensor 16 has flexibility. Next, the semiconductor bare chip 1
4 curved surface 141 or the back surface of the solid-state imaging device 16,
Alternatively, an adhesive is applied to both of them, and the back surfaces of the semiconductor bare chip 14 and the solid-state image sensor 16 are bonded to each other by compressed air. By doing so, the light-receiving surface of the solid-state imaging device 16 is mounted in a state of being curved along the curved surface 141 of the semiconductor bare chip 14, that is, in a state of being curved to the field curvature of the imaging lens of the imaging optical system. You can Next, the Al electrode of the solid-state imaging device 16 and the electrode of the wiring board 12 are electrically connected by the bonding wire 22.

【0015】このような第1の実施の形態における固体
撮像装置10によれば、配線基板12にフリップチップ
実装された半導体ベアチップ14の裏面に結像光学系の
撮像レンズの像面湾曲に応じた球面状の湾曲面141を
形成し、半導体ベアチップ14の湾曲面141に該湾曲
形状に沿わせて固体撮像素子16が貼り合わされた構造
になっているため、半導体ベアチップ14を含めた固体
撮像装置10全体を薄型化することができ、しかも、固
体撮像素子16の受光面は結像光学系の像面湾曲に沿っ
て湾曲されているため、結像光学系の像面湾曲による収
差を補正することができ、かつ固体撮像素子16の受光
面の全域にわたり焦点の合った固体撮像装置10を提供
することができ、周辺ボケの少ない良好な画質が得られ
る。また、この実施の形態によれば、半導体ベアチップ
14と固体撮像素子16の配線基板12を共用化でき、
固体撮像装置10の薄型化及び小型化を更に促進でき
る。
According to the solid-state image pickup device 10 according to the first embodiment, the back surface of the semiconductor bare chip 14 flip-chip mounted on the wiring board 12 corresponds to the field curvature of the image pickup lens of the image forming optical system. The solid-state imaging device 10 including the semiconductor bare chip 14 has a structure in which the spherical curved surface 141 is formed and the solid-state imaging element 16 is bonded to the curved surface 141 of the semiconductor bare chip 14 along the curved shape. It is possible to reduce the overall thickness, and since the light receiving surface of the solid-state imaging device 16 is curved along the field curvature of the imaging optical system, it is possible to correct the aberration due to the field curvature of the imaging optical system. It is possible to provide the solid-state imaging device 10 in which the entire light-receiving surface of the solid-state imaging device 16 is in focus, and good image quality with less peripheral blurring can be obtained. Further, according to this embodiment, the semiconductor bare chip 14 and the wiring substrate 12 of the solid-state imaging device 16 can be shared,
The solid-state imaging device 10 can be further reduced in thickness and size.

【0016】因みに、図5に示す従来の固体撮像装置に
おける半導体ベアチップ及び固体撮像素子を含む全体の
厚さは、半導体ベアチップの厚み0.3mm+半導体ベア
チップと固体撮像素子チップとの間の空間的隙間0.2
mm+固体撮像素子チップの厚み0.3mm=0.8mmとな
る。これに対して、本発明の実施の形態に示す固体撮像
装置10では、固体撮像素子16が半導体ベアチップ1
4の球面状の湾曲面141内に収容された構造になって
いるため、半導体ベアチップ14及び固体撮像素子16
を含む全体の厚さは、実質的に半導体ベアチップ14の
みの厚み0.3mmとなる。したがって、この実施の形態
に示す半導体ベアチップ及び固体撮像素子を含む固体撮
像装置10の厚さを従来の固体撮像装置の厚さの約1/
3程度にすることができる。
Incidentally, the total thickness including the semiconductor bare chip and the solid-state image pickup device in the conventional solid-state image pickup device shown in FIG. 5 is 0.3 mm of the semiconductor bare chip + the spatial gap between the semiconductor bare chip and the solid-state image pickup device chip. 0.2
mm + thickness of solid-state image sensor chip is 0.3 mm = 0.8 mm. On the other hand, in the solid-state imaging device 10 according to the embodiment of the present invention, the solid-state imaging device 16 has the semiconductor bare chip 1
Since the structure is accommodated in the spherical curved surface 141 of No. 4, the semiconductor bare chip 14 and the solid-state imaging device 16
The total thickness including is substantially 0.3 mm only for the bare semiconductor chip 14. Therefore, the thickness of the solid-state imaging device 10 including the semiconductor bare chip and the solid-state imaging device shown in this embodiment is about 1 / thick of that of the conventional solid-state imaging device.
It can be about 3.

【0017】上記実施の形態では、半導体ベアチップ1
4の裏面を球面状に加工した場合について説明したが、
本発明では円筒面状に加工してもレンズ収差による周辺
ボケを改善できる効果がある。但し、球面状に加工する
場合の方が、画面全体に亘り、レンズ収差による画面周
辺のピンボケは改善される。また、固体撮像素子16と
しては、CCDイメージセンサであってもCMOSイメ
ージセンサであっても同様の効果が得られる。
In the above embodiment, the semiconductor bare chip 1 is used.
Although the case where the back surface of 4 is processed into a spherical shape has been described,
According to the present invention, even if it is processed into a cylindrical surface, there is an effect that peripheral blurring due to lens aberration can be improved. However, in the case of processing into a spherical shape, defocusing around the screen due to lens aberration is improved over the entire screen. Further, as the solid-state image pickup device 16, even if it is a CCD image sensor or a CMOS image sensor, the same effect can be obtained.

【0018】次に、図2により上記第1の実施の形態に
示す固体撮像装置に結像光学ユニットを組み付けた固体
撮像カメラの構成について説明する。図2において、固
体撮像カメラ30は、固体撮像装置10と、この固体撮
像装置10の光入射側に組み付けられ、固体撮像装置1
0の固体撮像素子16に撮影光像を結像させる結像光学
ユニット32とを備える。
Next, the structure of a solid-state image pickup camera in which an image forming optical unit is assembled to the solid-state image pickup device shown in the first embodiment will be described with reference to FIG. In FIG. 2, the solid-state imaging camera 30 is assembled with the solid-state imaging device 10 on the light incident side of the solid-state imaging device 10.
An image forming optical unit 32 for forming a photographing light image on the solid-state image sensor 16 of 0.

【0019】上記結像光学ユニット32は、撮像レンズ
321及びレンズ鏡筒322などを備えている。レンズ
鏡筒322は撮像レンズ321を装着できるとともに配
線基板12に実装された半導体ベアチップ14をパッケ
ージングするのに必要な長さを有し、このレンズ鏡筒3
22の後端は、レンズ鏡筒322の内側に半導体ベアチ
ップ14が収容されるようにして配線基板12に結合さ
れている。また、このレンズ鏡筒322内の前端寄り箇
所には撮像レンズ321がレンズ支持部材323によっ
て装着されている。上記レンズ支持部材323は、その
外周面に形成した雄ねじ323Aをレンズ鏡筒322の
内周面に形成した雌ねじ322Aに螺合される構造にな
っており、このレンズ支持部材323をレンズ鏡筒32
2に螺合してレンズ鏡筒322の軸線方向に移動するこ
とにより、固体撮像装置10の固体撮像素子16の受光
面に対する撮像レンズ321のピント位置が調節できる
ようになっている。
The image forming optical unit 32 includes an image pickup lens 321 and a lens barrel 322. The lens barrel 322 has a length necessary for mounting the image pickup lens 321 and packaging the semiconductor bare chip 14 mounted on the wiring board 12.
The rear end of 22 is coupled to the wiring board 12 so that the semiconductor bare chip 14 is housed inside the lens barrel 322. An image pickup lens 321 is mounted by a lens support member 323 at a position near the front end in the lens barrel 322. The lens supporting member 323 has a structure in which a male screw 323A formed on the outer peripheral surface of the lens supporting member 323 is screwed into a female screw 322A formed on the inner peripheral surface of the lens barrel 322.
By moving the lens barrel 322 in the axial direction of the lens barrel 322, the focus position of the imaging lens 321 with respect to the light receiving surface of the solid-state imaging device 16 of the solid-state imaging device 10 can be adjusted.

【0020】また、レンズ鏡筒322の前端には視野を
制限する視野絞り部材324が設けられている。また、
固体撮像装置10の固体撮像素子16と対向する撮像レ
ンズ321の光出射側箇所には赤外線カットフィルター
325が配設されている。なお、固体撮像装置10への
塵埃の侵入を防止するために、レンズ鏡筒322の後端
と配線基板12との間の隙間は樹脂材により封止されて
いる。
A field stop member 324 for limiting the field of view is provided at the front end of the lens barrel 322. Also,
An infrared cut filter 325 is arranged at the light emission side of the imaging lens 321 facing the solid-state imaging device 16 of the solid-state imaging device 10. In order to prevent dust from entering the solid-state imaging device 10, the gap between the rear end of the lens barrel 322 and the wiring board 12 is sealed with a resin material.

【0021】このような本実施の形態における固体撮像
カメラ30によれば、配線基板12に実装された半導体
ベアチップ14の裏面に撮像レンズ321の像面湾曲に
応じた湾曲面141を形成し、この湾曲面141に固体
撮像素子16を貼り合わせてなる固体撮像装置10を結
像光学ユニット32に組み付けて固体撮像カメラ30を
構成したので、固体撮像装置10自体を薄型化できるこ
とに伴い、固体撮像カメラ30を小型化及び薄型化する
ことができる。また、この実施の形態によれば、固体撮
像素子16の受光面は結像光学系の像面湾曲に沿って湾
曲されているため、半導体ベアチップ14の曲率を変更
することにより、各種の撮像レンズに対応可能である。
According to the solid-state image pickup camera 30 in this embodiment, the curved surface 141 corresponding to the field curvature of the image pickup lens 321 is formed on the back surface of the semiconductor bare chip 14 mounted on the wiring board 12. Since the solid-state image pickup device 30 in which the solid-state image pickup device 16 is attached to the curved surface 141 is assembled to the image forming optical unit 32 to configure the solid-state image pickup camera 30, the solid-state image pickup device 10 itself can be made thin, and thus the solid-state image pickup camera can be thinned. The 30 can be made smaller and thinner. Further, according to this embodiment, since the light-receiving surface of the solid-state imaging device 16 is curved along the field curvature of the imaging optical system, various curvatures of the semiconductor bare chip 14 can be changed. Is available.

【0022】次に、図3及び図4により本発明の固体撮
像装置及び固体撮像カメラの第2の実施の形態について
説明する。図3は、第2の実施の形態における固体撮像
装置の説明用断面図、図4は第2の実施の形態に示す固
体撮像装置に結像光学ユニットを組み付けて固体撮像カ
メラを構成した場合の説明用断面図である。
Next, a second embodiment of the solid-state image pickup device and the solid-state image pickup camera of the present invention will be described with reference to FIGS. FIG. 3 is a sectional view for explaining the solid-state imaging device according to the second embodiment, and FIG. 4 shows a case where the solid-state imaging device shown in the second embodiment is assembled with an imaging optical unit to form a solid-state imaging camera. It is an explanatory sectional view.

【0023】図3において、固体撮像装置40は、上記
第1の実施の形態に示す場合と同様に構成された半導体
ベアチップ14及び固体撮像素子16と、これらを密封
状態に収容するパッケージ42などを備えている。上記
パッケージ42は、プラスチックまたはセラミックなど
により形成されており、このパッケージ42の底部は半
導体ベアチップ14が実装される配線基板43により気
密に覆われている。また、パッケージ42の上面板42
Aには開口42Bが形成されている。
In FIG. 3, a solid-state image pickup device 40 includes a semiconductor bare chip 14 and a solid-state image pickup device 16 which are constructed in the same manner as in the case of the first embodiment, and a package 42 for hermetically containing them. I have it. The package 42 is formed of plastic, ceramic, or the like, and the bottom of the package 42 is hermetically covered by the wiring board 43 on which the semiconductor bare chip 14 is mounted. In addition, the top plate 42 of the package 42
An opening 42B is formed in A.

【0024】上記半導体ベアチップ14は固体撮像素子
16の信号処理用ICを構成するもので、その裏面に
は、上記第1の実施の形態に示す場合と同様に、結像光
学系の収差により発生する像面湾曲に応じた球面状の湾
曲面141が形成されている。このように加工された半
導体ベアチップ14は、その湾曲面141が上を向くよ
うにしてパッケージ42内の配線基板43上にフリップ
チップ実装される。この実装に際しては、配線基板43
に半導体ベアチップ14と接合するための引き出し電極
パッドが設け、この引き出し電極パッドと半導体ベアチ
ップ14のAl電極をAuバンプ44により接合する。
また、この接合方法には、超音波接合法またはAgペー
ストによる接合などがあり、別の方法であっても良い。
The semiconductor bare chip 14 constitutes a signal processing IC of the solid-state image pickup device 16, and the back surface thereof is generated by the aberration of the image forming optical system as in the case of the first embodiment. A curved surface 141 having a spherical shape corresponding to the curvature of field is formed. The semiconductor bare chip 14 thus processed is flip-chip mounted on the wiring board 43 in the package 42 with the curved surface 141 thereof facing upward. At the time of this mounting, the wiring board 43
A lead-out electrode pad for joining to the semiconductor bare chip 14 is provided on the above, and the lead-out electrode pad and the Al electrode of the semiconductor bare chip 14 are joined by Au bumps 44.
Further, this joining method includes an ultrasonic joining method or a joining method using Ag paste, and another method may be used.

【0025】半導体ベアチップ14が基板42Aに実装
された後は、半導体ベアチップ14と配線基板43との
間にアンダーフィル材を充填して、半導体ベアチップ1
4とパッケージ42との機械的結合強度を補強する。次
に、固体撮像素子16の裏面を上記第1の実施の形態に
示す場合と同様に研磨して50μm以下、好ましくは2
0μm程度の厚さに加工し、固体撮像素子16可撓性を持
たせる。
After the semiconductor bare chip 14 is mounted on the substrate 42A, an underfill material is filled between the semiconductor bare chip 14 and the wiring board 43 to form the semiconductor bare chip 1
4 and the mechanical strength of the package 42 are strengthened. Next, the back surface of the solid-state imaging device 16 is polished in the same manner as in the case of the first embodiment, and is polished to 50 μm or less, preferably 2 μm.
The solid-state imaging device 16 is made flexible by processing it to a thickness of about 0 μm.

【0026】次に、半導体ベアチップ14の湾曲面14
1、もしくは固体撮像素子16の裏面、もしくは両方に
接着剤を塗布し、圧縮空気にて半導体ベアチップ14と
固体撮像素子16の裏面同士を接着させる。こうするこ
とによって、固体撮像素子16の受光面を半導体ベアチ
ップ14の湾曲面141に沿って湾曲された状態、すな
わち結像光学系の撮像レンズの収差による像面湾曲を補
正する曲面に湾曲された状態に実装することができる。
次いで、固体撮像素子16のAl電極と配線基板43の
電極との間をボンディングワイヤー45により電気的に
接続する。次に、上記パッケージ42の上面開口42B
を透明なシールガラス46により気密に封止する。ま
た、シールガラス44の外表面には、赤外線カットフィ
ルター膜47が蒸着などにより形成されている。以上に
より、半導体ベアチップ14の湾曲面141に固体撮像
素子16が湾曲して貼り合わされ、かつパッケージ42
でパッケージングされた固体撮像装置40が構成され
る。
Next, the curved surface 14 of the semiconductor bare chip 14
1, an adhesive is applied to the back surface of the solid-state image sensor 16, or both, and the semiconductor bare chip 14 and the back surfaces of the solid-state image sensor 16 are bonded to each other by compressed air. By doing so, the light-receiving surface of the solid-state image sensor 16 is curved along the curved surface 141 of the semiconductor bare chip 14, that is, a curved surface that corrects the field curvature due to the aberration of the imaging lens of the imaging optical system. Can be implemented in a state.
Next, the Al electrode of the solid-state imaging device 16 and the electrode of the wiring board 43 are electrically connected by the bonding wire 45. Next, the upper surface opening 42B of the package 42
Is hermetically sealed by a transparent seal glass 46. An infrared cut filter film 47 is formed on the outer surface of the seal glass 44 by vapor deposition or the like. As described above, the solid-state image sensor 16 is curved and bonded to the curved surface 141 of the semiconductor bare chip 14, and the package 42
The solid-state imaging device 40 packaged by

【0027】次に、図4により上記第2の実施の形態に
示す固体撮像装置に結像光学ユニットを組み付けた固体
撮像カメラの構成について説明する。図4において、固
体撮像カメラ50は、パッケージングされた固体撮像装
置40と、この固体撮像装置40の光入射側に組み付け
られ、固体撮像装置40の固体撮像素子16に撮影光像
を結像させる結像光学ユニット52とを備える。
Next, the structure of the solid-state image pickup camera in which the image-forming optical unit is assembled to the solid-state image pickup device shown in the second embodiment will be described with reference to FIG. In FIG. 4, a solid-state imaging camera 50 is assembled with the packaged solid-state imaging device 40 and the light incident side of the solid-state imaging device 40, and forms a photographing light image on the solid-state imaging device 16 of the solid-state imaging device 40. The imaging optical unit 52.

【0028】上記結像光学ユニット52は、撮像レンズ
521及びレンズ鏡筒522などを備えている。レンズ
鏡筒522は撮像レンズ521を装着するのに必要な長
さを有し、このレンズ鏡筒522内の前端寄り箇所には
撮像レンズ521がレンズ支持部材523によって装着
されている。上記レンズ支持部材523は、その外周面
に形成した雄ねじ523Aをレンズ鏡筒522の内周面
に形成した雌ねじ522Aに螺合される構造になってお
り、このレンズ支持部材523をレンズ鏡筒522に螺
合してレンズ鏡筒522の軸線方向に移動することによ
り、固体撮像装置40の固体撮像素子16の受光面に対
する撮像レンズ521のピント位置が調節できるように
なっている。また、レンズ鏡筒522の前端には視野を
制限する視野絞り部材524が設けられている。このよ
うな結像光学ユニット52は、そのレンズ鏡筒322の
後端をパッケージ42の上端面に結合することにより固
体撮像装置40にマウントされている。
The image forming optical unit 52 includes an image pickup lens 521 and a lens barrel 522. The lens barrel 522 has a length required to mount the imaging lens 521, and the imaging lens 521 is mounted by a lens support member 523 at a position near the front end in the lens barrel 522. The lens supporting member 523 has a structure in which a male screw 523A formed on the outer peripheral surface thereof is screwed into a female screw 522A formed on the inner peripheral surface of the lens barrel 522. The lens supporting member 523 is attached to the lens barrel 522. By moving the lens barrel 522 in the axial direction of the lens barrel 522, the focus position of the imaging lens 521 with respect to the light receiving surface of the solid-state imaging device 16 of the solid-state imaging device 40 can be adjusted. A field stop member 524 that limits the field of view is provided at the front end of the lens barrel 522. Such an imaging optical unit 52 is mounted on the solid-state imaging device 40 by connecting the rear end of the lens barrel 322 to the upper end surface of the package 42.

【0029】このような第2の実施形態における固体撮
像装置40によれば、上記第1の実施の形態に示す場合
と同様に半導体ベアチップ14の裏面に結像光学系の撮
像レンズの像面湾曲に応じた球面状の湾曲面141を形
成し、半導体ベアチップ14の湾曲面141に該湾曲形
状に沿わせて固体撮像素子16が貼り合わされた構造に
なっているため、半導体ベアチップ14を含めた固体撮
像装置40全体を薄型化することができ、しかも、固体
撮像素子16の受光面は結像光学系の像面湾曲に沿って
湾曲されているため、結像光学系の像面湾曲による収差
を補正することができ、かつ固体撮像素子16の受光面
の全域にわたり焦点の合った固体撮像装置10を提供す
ることができ、周辺ボケの少ない良好な画質が得られ
る。また、この実施の形態によれば、半導体ベアチップ
14と固体撮像素子16の配線基板43を共用化できる
とともに、パッケージ42も共用化することができる。
これにより、固体撮像装置40の薄型化及び小型化を更
に促進できる。また、半導体ベアチップ14を含む固体
撮像素子16をパッケージ42でパッケージングするこ
とにより、固体撮像素子表面へのゴミの侵入を完全に防
ぐことができ、製造歩留まりを向上できる。
According to the solid-state image pickup device 40 in the second embodiment, the field curvature of the image pickup lens of the image forming optical system is formed on the back surface of the semiconductor bare chip 14 as in the case of the first embodiment. Since the solid-state imaging device 16 is bonded to the curved surface 141 of the semiconductor bare chip 14 along the curved shape, the solid-state image pickup device 16 including the semiconductor bare chip 14 is formed. The entire imaging device 40 can be made thin, and the light receiving surface of the solid-state imaging device 16 is curved along the field curvature of the imaging optical system. It is possible to provide the solid-state imaging device 10 that can be corrected and is in focus over the entire light-receiving surface of the solid-state imaging device 16, and a good image quality with less peripheral blurring can be obtained. Further, according to this embodiment, the semiconductor bare chip 14 and the wiring board 43 of the solid-state imaging device 16 can be shared, and the package 42 can also be shared.
Accordingly, it is possible to further reduce the thickness and size of the solid-state imaging device 40. In addition, by packaging the solid-state image sensor 16 including the semiconductor bare chip 14 in the package 42, it is possible to completely prevent dust from entering the surface of the solid-state image sensor and improve the manufacturing yield.

【0030】また、この第2の実施の形態による固体撮
像装置40を結像光学ユニット52に組み付けることで
固体撮像カメラ50を構成するようにしたので、固体撮
像装置40自体の薄型化に伴い、固体撮像カメラ50を
小型化及び薄型化することができる。
Further, since the solid-state image pickup device 50 according to the second embodiment is assembled to the image forming optical unit 52 to form the solid-state image pickup camera 50, as the solid-state image pickup device 40 itself becomes thinner, The solid-state imaging camera 50 can be made smaller and thinner.

【0031】[0031]

【発明の効果】以上説明したように、本発明の固体撮像
装置によれば、信号処理系、駆動系などの機能を有する
半導体ベアチップと固体撮像素子とを貼り合せることに
よって、薄型の固体撮像装置を実現できる。また、半導
体ベアチップの裏面を球面状もしくは円筒状に加工し、
その曲面形状に沿って、薄く加工した固体撮像素子を接
着することで、固体撮像素子の素子面をレンズの収差を
吸収するように湾曲させることができ、薄型で且つ、画
面の全領域に渡って焦点が合った固体撮像装置を得るこ
とができる。
As described above, according to the solid-state image pickup device of the present invention, a thin solid-state image pickup device is obtained by bonding a semiconductor bare chip having a function such as a signal processing system and a drive system and a solid-state image pickup device. Can be realized. Also, the back surface of the semiconductor bare chip is processed into a spherical shape or a cylindrical shape,
By adhering a thinly processed solid-state image sensor along the curved shape, the element surface of the solid-state image sensor can be curved so as to absorb the aberration of the lens, and it is thin and covers the entire area of the screen. It is possible to obtain a solid-state imaging device that is in focus.

【0032】また、本発明の固体撮像カメラによれば、
半導体ベアチップの一方の面に結像光学系の収差により
生じる像面湾曲に対応した湾曲面を形成し、この湾曲面
に固体撮像素子を貼り合わせて固体撮像装置を構成する
とともに、この固体撮像装置を結像光学ユニットに組み
付けることで固体撮像カメラを構成するようにしたの
で、固体撮像装置自体の薄型化に伴い、固体撮像カメラ
を小型化及び薄型化することができる。
According to the solid-state image pickup camera of the present invention,
A curved surface corresponding to the field curvature caused by the aberration of the imaging optical system is formed on one surface of the semiconductor bare chip, and a solid-state imaging device is bonded to this curved surface to form a solid-state imaging device. Since the solid-state image pickup camera is configured by assembling the solid-state image pickup optical unit, the solid-state image pickup camera can be made smaller and thinner as the solid-state image pickup device itself is made thinner.

【図面の簡単な説明】[Brief description of drawings]

【図1】(A),(B)は本発明の第1の実施の形態に
おける固体撮像装置の製造過程を示す説明用断面図であ
る。
1A and 1B are cross-sectional views for explaining a manufacturing process of a solid-state imaging device according to a first embodiment of the present invention.

【図2】本発明の第1の実施の形態に示す固体撮像装置
に結像光学ユニットを組み付けて固体撮像カメラを構成
した場合の説明用断面図である。
FIG. 2 is a cross-sectional view for explaining a case where a solid-state imaging camera is configured by assembling an imaging optical unit with the solid-state imaging device according to the first embodiment of the present invention.

【図3】本発明の第2の実施の形態における固体撮像装
置の説明用断面図である。
FIG. 3 is a sectional view for explaining a solid-state imaging device according to a second embodiment of the present invention.

【図4】本発明の第2の実施の形態に示す固体撮像装置
に結像光学ユニットを組み付けて固体撮像カメラを構成
した場合の説明用断面図である。
FIG. 4 is an explanatory cross-sectional view of a case where a solid-state image pickup camera according to a second embodiment of the present invention is assembled with an imaging optical unit to form a solid-state image pickup camera.

【図5】従来における固体撮像カメラの概略構成を示す
断面図である。
FIG. 5 is a sectional view showing a schematic configuration of a conventional solid-state imaging camera.

【図6】撮像レンズの収差により生じる像面湾曲の説明
図である。
FIG. 6 is an explanatory diagram of field curvature caused by aberration of the imaging lens.

【符号の説明】[Explanation of symbols]

10……固体撮像装置、12……配線基板、14……半
導体ベアチップ、16……固体撮像素子、141……湾
曲面、30……固体撮像カメラ、32……結像光学ユニ
ット32、40……固体撮像装置、42……パッケー
ジ、43……配線基板、46……シールガラス、50…
…固体撮像カメラ、52……結像光学ユニット。
10 ... Solid-state imaging device, 12 ... Wiring board, 14 ... Semiconductor bare chip, 16 ... Solid-state imaging device, 141 ... Curved surface, 30 ... Solid-state imaging camera, 32 ... Imaging optical unit 32, 40 ... ... Solid-state imaging device, 42 ... Package, 43 ... Wiring board, 46 ... Seal glass, 50 ...
... Solid-state image pickup camera, 52 ... Imaging optical unit.

Claims (11)

【特許請求の範囲】[Claims] 【請求項1】 一方の面に結像光学系の収差により生じ
る像面湾曲に対応した湾曲面が形成された半導体ベアチ
ップと、 前記半導体ベアチップの湾曲面に該湾曲形状に沿わせて
貼り合わされた可撓性を有する固体撮像素子と、 を備えることを特徴とする固体撮像装置。
1. A semiconductor bare chip having a curved surface corresponding to a field curvature caused by aberration of an imaging optical system on one surface, and a semiconductor bare chip bonded to the curved surface of the semiconductor bare chip along the curved shape. A solid-state imaging device comprising: a flexible solid-state imaging device;
【請求項2】 前記半導体ベアチップの他方の面に信号
処理用集積回路が形成され、この他方の面が基板または
パッケージにフリップチップ実装されることを特徴とす
る請求項1記載の固体撮像装置。
2. The solid-state imaging device according to claim 1, wherein a signal processing integrated circuit is formed on the other surface of the semiconductor bare chip, and the other surface is flip-chip mounted on a substrate or a package.
【請求項3】 前記半導体ベアチップの湾曲面は円筒面
状または球面状であることを特徴とする請求項1記載の
固体撮像装置。
3. The solid-state imaging device according to claim 1, wherein the curved surface of the semiconductor bare chip is cylindrical or spherical.
【請求項4】 前記固体撮像素子は受光面と、この受光
面と反対側の面をなす裏面を有し、前記半導体ベアチッ
プの湾曲面に沿わせて貼り合わされる前記固体撮像素子
の面は前記裏面であり、前記固体撮像素子が有する可撓
性は、前記裏面が前記固体撮像素子が所定の厚さになる
まで研削されることにより付与されていることを特徴と
する請求項1記載の固体撮像装置。
4. The solid-state imaging device has a light-receiving surface and a back surface which is a surface opposite to the light-receiving surface, and the surface of the solid-state imaging device bonded along the curved surface of the semiconductor bare chip is the 2. The solid according to claim 1, which is a back surface, and the flexibility of the solid-state imaging device is provided by grinding the back surface until the solid-state imaging device has a predetermined thickness. Imaging device.
【請求項5】 前記半導体ベアチップの他方の面は前記
基板またはパッケージに樹脂によりアンダーフィルされ
ていることを特徴とする請求項2記載の固体撮像装置。
5. The solid-state imaging device according to claim 2, wherein the other surface of the semiconductor bare chip is underfilled with resin on the substrate or the package.
【請求項6】 固体撮像装置と、前記固体撮像装置の光
入射側に配置され撮影光像を結像させる結像光学ユニッ
トとを有する固体撮像カメラであって、 前記固体撮像装置は半導体ベアチップと固体撮像素子と
を備え、 前記半導体ベアチップは、一方の面に結像光学系の収差
により生じる像面湾曲に対応した湾曲面を有し、 前記固体撮像素子は可撓性を有し、前記半導体ベアチッ
プの湾曲面に該湾曲形状に沿わせて貼り合わされてい
る、 ことを特徴とする固体撮像カメラ。
6. A solid-state image pickup camera comprising: a solid-state image pickup device; and an imaging optical unit arranged on a light incident side of the solid-state image pickup device to form a photographic light image, wherein the solid-state image pickup device is a semiconductor bare chip. A solid-state image sensor, the semiconductor bare chip has a curved surface corresponding to the field curvature caused by the aberration of the imaging optical system on one surface, the solid-state image sensor has flexibility, the semiconductor A solid-state imaging camera, which is attached to a curved surface of a bare chip along the curved shape.
【請求項7】 前記半導体ベアチップの他方の面に信号
処理用集積回路が形成され、この他方の面が基板または
パッケージにフリップチップ実装されることを特徴とす
る請求項6記載の固体撮像カメラ。
7. The solid-state imaging camera according to claim 6, wherein an integrated circuit for signal processing is formed on the other surface of the semiconductor bare chip, and the other surface is flip-chip mounted on a substrate or a package.
【請求項8】 前記半導体ベアチップの湾曲面は円筒面
状または球面状であることを特徴とする請求項6記載の
固体撮像カメラ。
8. The solid-state imaging camera according to claim 6, wherein the curved surface of the semiconductor bare chip is cylindrical or spherical.
【請求項9】 前記固体撮像素子は受光面と、この受光
面と反対側の面をなす裏面を有し、前記半導体ベアチッ
プの湾曲面に沿わせて貼り合わされる前記固体撮像素子
の面は前記裏面であり、前記固体撮像素子が有する可撓
性は、前記裏面が前記固体撮像素子が所定の厚さになる
まで研削されることにより付与されていることを特徴と
する請求項6記載の固体撮像カメラ。
9. The solid-state imaging device has a light-receiving surface and a back surface which is a surface opposite to the light-receiving surface, and the surface of the solid-state imaging device bonded along the curved surface of the semiconductor bare chip is the 7. The solid according to claim 6, which is a back surface, and the flexibility of the solid-state imaging device is provided by grinding the back surface until the solid-state imaging device has a predetermined thickness. Imaging camera.
【請求項10】 前記半導体ベアチップの他方の面は前
記基板またはパッケージに樹脂によりアンダーフィルさ
れていることを特徴とする請求項7記載の固体撮像カメ
ラ。
10. The solid-state image pickup camera according to claim 7, wherein the other surface of the semiconductor bare chip is underfilled with resin on the substrate or the package.
【請求項11】 前記固体撮像装置の光入射側に赤外線
カットフィルターが設けられていることを特徴とする請
求項6記載の固体撮像カメラ。
11. The solid-state imaging camera according to claim 6, further comprising an infrared cut filter provided on a light incident side of the solid-state imaging device.
JP2001388003A 2001-12-20 2001-12-20 Solid-state imaging device and solid-state imaging camera Expired - Fee Related JP3896586B2 (en)

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