JP2003185920A - 結像光学系及び投影露光装置 - Google Patents

結像光学系及び投影露光装置

Info

Publication number
JP2003185920A
JP2003185920A JP2001384465A JP2001384465A JP2003185920A JP 2003185920 A JP2003185920 A JP 2003185920A JP 2001384465 A JP2001384465 A JP 2001384465A JP 2001384465 A JP2001384465 A JP 2001384465A JP 2003185920 A JP2003185920 A JP 2003185920A
Authority
JP
Japan
Prior art keywords
optical system
refraction
imaging optical
srf
birefringence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001384465A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003185920A5 (enExample
Inventor
Yutaka Suenaga
豊 末永
Kotaro Yamaguchi
弘太郎 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2001384465A priority Critical patent/JP2003185920A/ja
Priority to PCT/JP2002/012999 priority patent/WO2003052482A1/ja
Priority to AU2002354213A priority patent/AU2002354213A1/en
Priority to TW091136479A priority patent/TW200304548A/zh
Publication of JP2003185920A publication Critical patent/JP2003185920A/ja
Publication of JP2003185920A5 publication Critical patent/JP2003185920A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2001384465A 2001-12-18 2001-12-18 結像光学系及び投影露光装置 Withdrawn JP2003185920A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2001384465A JP2003185920A (ja) 2001-12-18 2001-12-18 結像光学系及び投影露光装置
PCT/JP2002/012999 WO2003052482A1 (en) 2001-12-18 2002-12-12 Imaging optical system and projection aligner
AU2002354213A AU2002354213A1 (en) 2001-12-18 2002-12-12 Imaging optical system and projection aligner
TW091136479A TW200304548A (en) 2001-12-18 2002-12-18 Image optical system and projection aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001384465A JP2003185920A (ja) 2001-12-18 2001-12-18 結像光学系及び投影露光装置

Publications (2)

Publication Number Publication Date
JP2003185920A true JP2003185920A (ja) 2003-07-03
JP2003185920A5 JP2003185920A5 (enExample) 2005-08-25

Family

ID=19187727

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001384465A Withdrawn JP2003185920A (ja) 2001-12-18 2001-12-18 結像光学系及び投影露光装置

Country Status (4)

Country Link
JP (1) JP2003185920A (enExample)
AU (1) AU2002354213A1 (enExample)
TW (1) TW200304548A (enExample)
WO (1) WO2003052482A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7495840B2 (en) 2002-03-08 2009-02-24 Karl-Heinz Schuster Very high-aperture projection objective

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
WO2005111689A2 (en) 2004-05-17 2005-11-24 Carl Zeiss Smt Ag Catadioptric projection objective with intermediate images

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3856265B2 (ja) * 1998-03-12 2006-12-13 株式会社ニコン 光学素子の製造方法、光学素子の複屈折算出方法及び複屈折判定方法
KR20000034967A (ko) * 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
JP2000281493A (ja) * 1999-03-30 2000-10-10 Canon Inc 結晶処理方法および結晶並びに光学部品及び露光装置
JP3466950B2 (ja) * 1999-03-30 2003-11-17 キヤノン株式会社 フッ化物結晶の熱処理方法及び光学部品の作製方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7495840B2 (en) 2002-03-08 2009-02-24 Karl-Heinz Schuster Very high-aperture projection objective

Also Published As

Publication number Publication date
WO2003052482A1 (en) 2003-06-26
TW200304548A (en) 2003-10-01
AU2002354213A1 (en) 2003-06-30

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