JP2003158089A5 - - Google Patents

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Publication number
JP2003158089A5
JP2003158089A5 JP2002238143A JP2002238143A JP2003158089A5 JP 2003158089 A5 JP2003158089 A5 JP 2003158089A5 JP 2002238143 A JP2002238143 A JP 2002238143A JP 2002238143 A JP2002238143 A JP 2002238143A JP 2003158089 A5 JP2003158089 A5 JP 2003158089A5
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JP
Japan
Prior art keywords
laser
optical system
irradiated surface
laser irradiation
irradiation apparatus
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Application number
JP2002238143A
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English (en)
Japanese (ja)
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JP4566504B2 (ja
JP2003158089A (ja
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Priority to JP2002238143A priority Critical patent/JP4566504B2/ja
Priority claimed from JP2002238143A external-priority patent/JP4566504B2/ja
Publication of JP2003158089A publication Critical patent/JP2003158089A/ja
Publication of JP2003158089A5 publication Critical patent/JP2003158089A5/ja
Application granted granted Critical
Publication of JP4566504B2 publication Critical patent/JP4566504B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002238143A 2001-08-17 2002-08-19 レーザ照射装置およびレーザ照射方法、並びに半導体装置の作製方法 Expired - Fee Related JP4566504B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002238143A JP4566504B2 (ja) 2001-08-17 2002-08-19 レーザ照射装置およびレーザ照射方法、並びに半導体装置の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001247778 2001-08-17
JP2001-247778 2001-08-17
JP2002238143A JP4566504B2 (ja) 2001-08-17 2002-08-19 レーザ照射装置およびレーザ照射方法、並びに半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JP2003158089A JP2003158089A (ja) 2003-05-30
JP2003158089A5 true JP2003158089A5 (https=) 2005-10-27
JP4566504B2 JP4566504B2 (ja) 2010-10-20

Family

ID=26620612

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002238143A Expired - Fee Related JP4566504B2 (ja) 2001-08-17 2002-08-19 レーザ照射装置およびレーザ照射方法、並びに半導体装置の作製方法

Country Status (1)

Country Link
JP (1) JP4566504B2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5448315B2 (ja) * 2006-08-31 2014-03-19 株式会社半導体エネルギー研究所 結晶性半導体膜の作製方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS623089A (ja) * 1985-06-27 1987-01-09 Nippon Kogaku Kk <Nikon> 半導体製造装置
JP4131752B2 (ja) * 1997-03-14 2008-08-13 東芝松下ディスプレイテクノロジー株式会社 多結晶半導体膜の製造方法
JP2002280323A (ja) * 2001-03-16 2002-09-27 Semiconductor Energy Lab Co Ltd レーザ照射装置

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