JP2003131387A - Conveyance arm usable commonly for conveyance of mask and substrate for exposure and exposure device having the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a conveyance arm of a commonly usable type which is capable of holding a mask without damaging a mask and is capable of securing holding a substrate for exposure and an exposure device having the same. SOLUTION: The conveyance arm A has an arm member 1 for conveyance which is commonly used for conveyance of the substrate P for exposure and the mask M. a plurality of suction pads 2a to 2h which are arranged on this arm member and suck and hold the non-exposure surface of the substrate for exposure and mask adapters 3a to 3h which are mask adapters to hold the corner parts of the pattern forming surface of the mask and are arranged in the prescribed positions and hold the corner parts of the mask by being sucked and held by the suction pads corresponding to the corner parts of the mask among a plurality of the suction pads.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a proximity exposure apparatus for forming a pattern on a surface of a glass substrate, a color filter or the like which is a substrate to be exposed in a manufacturing process of a flat panel display such as a liquid crystal display or a plasma display. In particular, the present invention relates to a transfer arm that can also be used to transfer a mask for pattern formation and a substrate to be exposed, and an exposure apparatus including the transfer arm.

[0002]

2. Description of the Related Art Liquid crystal display (LCD)
The stal display) can be thinner and lighter than the CRT (CathodeRay Tube).
It has been adopted as a display device for televisions, office automation equipment, etc., and the screen size has been increased to 10 inches or more, and further high definition and colorization have been promoted.

A liquid crystal display is made by drawing a fine pattern on the surface of a glass substrate by a photolithography technique. The exposure device projects and transfers a fine pattern of a photomask onto a glass substrate. As the exposure apparatus, a projection method in which a mask pattern is projected onto a glass substrate using a lens or a mirror, and a proximity method in which a mask pattern is transferred onto the glass substrate by providing a minute gap between the photomask and the glass substrate There is a method. Proximity type exposure equipment
Although the pattern resolution performance is inferior to the projection method, the irradiation optical system is very simple, the throughput is high, and the cost performance in terms of the equipment cost is excellent, making it suitable for mass-production equipment with high productivity. Is.

Conventionally, as a proximity type exposure apparatus, one having a substrate transfer system for transferring a glass substrate and a mask transfer system for transferring a photomask arranged outside the substrate transfer system is known. ing. The substrate carrying system includes a substrate carry-in unit, an alignment stage unit, a substrate carry-out unit, and the like, and carries a glass substrate into the alignment stage unit by a carrying arm provided in the substrate carry-in unit. The non-exposed surface of this glass substrate is suction-held by an exposure chuck provided on the alignment stage unit. On the other hand, the mask transfer system includes an automatic mask changer, a mask stocker, and the like, and a transfer arm provided in the automatic mask changer transfers the photomask from the mask stocker to the alignment stage unit. The non-patterned surface of this photomask is sucked and held by a mask holder provided in the alignment stage unit. In the alignment stage unit, pre-alignment that corrects the carry-in displacement amount of the glass substrate, proximity gap control that sets the gap between the photomask and the glass substrate to a predetermined minute gap (separation gap), and the photomask and the glass substrate Align with high precision. After the alignment is completed, exposure light is irradiated from the irradiation optical system onto the photomask to transfer the mask pattern onto the glass substrate surface. The exposed glass substrate is unloaded from the alignment stage unit by a transfer arm provided in the substrate unloading unit.

In the above-mentioned conventionally known exposure apparatus, in the substrate transfer system, there is a proposition that the tact operation of loading / unloading the glass substrate with respect to the alignment stage unit must be accelerated in order to improve the throughput. . Therefore, in the substrate transfer system, since the transfer arm is driven at high speed, it is necessary to firmly hold the non-exposed surface of the glass substrate. 2. Description of the Related Art Conventionally, as a transfer arm of a substrate transfer system, there is a transfer arm provided with an arm member for holding a glass substrate by a pair of arms, and a plurality of suction pads for holding the non-exposed surface of the glass substrate by suction on each arm. In this transfer arm, the non-exposed surface of the glass substrate is sucked and held by a plurality of suction pads of each arm to prevent the glass substrate from being displaced due to high-speed driving of the transfer arm, and to stabilize the transfer of the glass substrate. Have secured. On the other hand, in the mask transfer system, there is a proposition that damage to the mask pattern formed on the photomask must be prevented. Conventionally, an arm member for holding a photomask by a pair of arms is provided as a transfer arm of a mask transfer system, and a peripheral part of a pattern formation surface of the photomask, that is, a corner part where a mask pattern is not formed is held on each arm. There is a mask holding part for the purpose. In this transfer arm, the corners of the pattern forming surface of the photomask are held by the mask holding parts of each arm, and the transfer arm is driven slowly and gently so that the photomask does not move. Thus, the transport stability of the photomask is ensured. That is, the transfer arm is driven at a low speed and gently to prevent the mask pattern from contacting the mask holding portion and being damaged.

[0006]

The conventional exposure apparatus described above is provided with a substrate transfer system and a mask transfer system, and each of the transfer systems is driven by an independent drive unit. That is, in the substrate transfer system, the transfer arm of the substrate loading unit is driven by the drive device for loading the substrate, and the transfer arm of the substrate unloading unit is driven by the drive device for loading the substrate. In the mask transfer system, the transfer arm of the automatic mask changer is driven by a mask transfer drive device. Thus, since the two transfer arms of the substrate transfer system and the transfer arm of the mask transfer system are driven by independent drive devices, respectively, there is a problem that the device structure becomes complicated and the device cost becomes high. Therefore, it is conceivable that either one of the substrate transfer system and the mask transfer system is used for transfer of the glass substrate and the photomask, and the transfer arm is driven by a single drive device. However, if the transfer arm of the substrate transfer system is also used to transfer the photomask, the suction pads of the arms may be located in the mask pattern area of the pattern formation surface depending on the size of the photomask. In this case, since the suction pad sucks and holds the inside of the mask pattern area, there arises a problem that the mask pattern of the photomask is damaged. on the other hand,
When an attempt is made to also use the transfer arm of the mask transfer system to transfer a glass substrate, the mask holding section of each arm section holds the corners of the non-exposed surface of the glass substrate in a mounted state, so that the glass substrate is firmly fixed. Therefore, there is a problem in that the glass substrate cannot be held at a high temperature, and the glass substrate cannot be stably transported.

The present invention has been made in view of the above points, and is provided with a dual-purpose transfer arm capable of holding the mask without damaging it and firmly holding the substrate to be exposed, and the transfer arm. It is intended to provide an exposure apparatus.

[0008]

A transfer arm according to the present invention is an exposure apparatus which irradiates a mask for pattern formation with light to form a predetermined pattern on a substrate surface of a substrate to be exposed. A transfer arm that is also used to transfer an exposure target substrate, and is a transfer arm member that is commonly used to transfer the exposure target substrate and the mask, and the transfer target substrate is disposed on the arm member. A plurality of suction pads for suction holding and a mask adapter for holding a corner portion of the pattern forming surface of the mask, which is arranged at a predetermined position and corresponds to a corner portion of the mask among the plurality of suction pads. A mask adapter that holds the corner portion of the mask by being sucked and held by a suction pad. According to this, since the exposure target substrate is suction-held on the arm member by the plurality of suction pads, the exposure target substrate can be firmly held, and among the plurality of suction pads, the suction target substrate corresponding to the corner portion of the mask is held. Since the corners of the pattern forming surface of the mask are held by the pads, it is possible to prevent the mask pattern from being damaged during transportation.

Further, the exposure apparatus according to the present invention is an exposure apparatus for irradiating a mask for pattern formation with light to form a predetermined pattern on the substrate surface of the exposure target substrate. And a plurality of transfer arms that are commonly used to transfer the exposure target substrate and the mask, and a plurality of transfer arms that are arranged on the arm member and that suction-hold the exposure target substrate. A suction pad and a mask adapter for holding a corner portion of the pattern forming surface of the mask, which is arranged at a predetermined position and is sucked by a suction pad corresponding to the corner portion of the mask among the plurality of suction pads. A carrier arm including a mask adapter that holds a corner portion of the mask by being held, and when carrying the exposure target substrate,
Adsorption air for adsorbing the substrate to be exposed is supplied to the plurality of adsorption pads, and when the mask is transported, adsorption air for adsorbing the mask adapter is supplied to the adsorption pad corresponding to the corner portion of the mask. It is provided with a supply means and a drive control means for driving the arm member to move to a predetermined position depending on the case of carrying the substrate to be exposed and the case of carrying the mask. According to this, the arm member can be driven to be moved to a predetermined position by the drive control means depending on whether the substrate to be exposed is transported or the mask is transported, so that the apparatus configuration can be simplified. At the same time, the cost of the device can be reduced.

[0010]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described with reference to the accompanying drawings. FIG. 1 is a perspective view showing a schematic configuration of an embodiment of a transfer arm A according to the present invention. In FIG. 1, the transport arm A includes an arm member 1 commonly used for transporting the photomask M and the glass substrate P indicated by a chain double-dashed line. The arm member 1 includes a flat base 1a,
A pair of arms 1b extending parallel to the same direction from the base 1a
Are formed so that the planar shape thereof is a substantially U-shape. In the pair of arms 1b, a plurality of suction pads 2a to 2h are arranged on the upper surface facing the non-exposed surface of the glass substrate P (the lower surface of the glass substrate P in the illustrated example) along the longitudinal direction of the arms 1b. ing. In this example, one suction pad 2a and two suction pads 2b are arranged on the front end side and the rear end side of the pair of arms 1b, and between the suction pads 2a and 2b,
The three adjacent suction pads 2c to 2e and 2f to 2h are arranged at substantially equal intervals. In addition, the pair of arms 1b includes suction pads 2a, 2 on the front end side and the rear end side, respectively.
Positioning holes 4a to 4d for receiving the pair of pins 3a1 to 3d1 provided on the lower surfaces of the mask adapters 3a to 3d are provided around b.

The arm member 1 includes, in the pair of arms 1b, a first air supply passage 5a communicating with the suction pads 2a, 2b on the front end side and the rear end side, and three suction pads 2c-2e, 2f- A second air supply passage 5b communicating with 2h is provided inside. A pressure sensor PS1 and a solenoid valve V1 are connected to the first air supply passage 5a. A pressure sensor PS2 and a solenoid valve V2 are connected to the second air supply passage 5b. Solenoid valve V
1, V2 are connected to a vacuum source (not shown) such as a vacuum pump. The solenoid valve V1 has an air supply passage 5a inside thereof.
A valve body (not shown) for opening and closing is provided. Further, the electromagnetic valve V2 is provided with a valve body (not shown) for opening and closing the air supply passage 5b therein. The solenoid valves V1 and V2 are controlled by the control unit 15 (see FIGS. 2 and 3), which will be described later, to open the air supply passages 5a and 5b when the glass substrate P is transported by the arm member 1. To be done. At this time, negative pressure suction air is supplied from the vacuum source to all the suction pads 2a to 2h of the arm member 1 through the solenoid valves V1 and V2 and the air supply passages 5a and 5b. The non-exposed surface of the substrate P can be suction-held. Further, the solenoid valve V1 is controlled by the control unit 15 so that the valve body opens the air supply passage 5a when the photomask M is conveyed by the arm member 1. At this time,
Negative pressure suction air is supplied from the vacuum source to the suction pads 2a and 2b on the front and rear ends of the arm member 1 through the solenoid valve V1 and the air supply passage 5a, so that the suction pads 2a and 2b are used to mask the mask adapter 3a. ~ 3d can be adsorbed and held. The pressure sensor PS1 detects the suction air pressure in the first air supply passage 5a. That is, the pressure sensor PS1 detects the suction air pressure in the air supply passage 5a when the suction pads 2a and 2b suction-hold the mask adapters 3a to 3d by the suction air supplied through the electromagnetic valve V1 and the air supply passage 5a. It detects and outputs the detection signal to the control unit 15. The pressure sensor PS2 has a second air supply passage 5b.
The suction air pressure inside is detected. That is, the pressure sensor PS2 includes the solenoid valve V2 and the air supply passage 5b.
Suction pad 2c by suction air supplied through
˜2h detects the suction air pressure in the air supply passage 5b when the glass substrate P is suction-held, and outputs the detection signal to the control unit 15. The pressure sensor PS
1, PS2 and the solenoid valves V1, V2 may be arranged inside or outside the arm member 1 as required.

Further, the arm member 1 is provided with a detection sensor S for detecting whether the object to be conveyed is the glass substrate P or the photomask M. In this example, the detection sensor S
For example, a photoelectric sensor is used. The photoelectric sensor S, which is a detection sensor, on the one arm 1b,
It is arranged close to the suction pad 2a on the tip side. The photoelectric sensor S includes, for example, a light emitting element such as an LED,
It is configured to include a light receiving element such as a CCD linear sensor. By the way, when the conveyance target is the glass substrate P,
The glass substrate P is suction-held on the pair of arms 1b by all the suction pads 2a to 2h. However, when the object to be conveyed is the photomask M, the photomask M
Is a pair of arms 1 via the mask adapters 3a to 3d.
held on b. Therefore, the glass substrate P and the arm 1
The gap formed between b, the photomask M and the arm 1b
The gap formed between the glass substrate P and the arm 1
The gap formed between b is the mask adapter 3a-3
Since d is not present, it is smaller than the gap formed between the photomask M and the arm 1b. As described above, the gap formed with the arm 1b differs depending on whether the object to be transported is the glass substrate P or the photomask M. Therefore, in the photoelectric sensor S, the non-exposed surface of the glass substrate P or the non-patterned area of the pattern-formed surface of the photomask M is irradiated with light from the light emitting element, and the non-exposed surface of the glass substrate P or the photomask is exposed. The reflected light reflected by the non-pattern formation region of the pattern formation surface of M is received at different positions of the light receiving element. Therefore, in the photoelectric sensor S, the reflected light obtained from the glass substrate P or the photomask M is detected at different positions of the light receiving element, and each detection signal is output to the control unit 15.

The mask adapters 3a to 3d are respectively
The side surface is formed into a substantially L shape, and the corner portion of the pattern forming surface is held on the upper surface facing the pattern forming surface of the photomask M (the lower surface of the photomask M in the illustrated example). The convex holding portions 3a2 to 3d2 are provided. The mask adapters 3a to 3d are used for the arm member 1
Is detachably held by a mask adapter holder (not shown) so as to correspond individually to the positions of the suction pads 2a and 2b on the front and rear ends of the mask pad. This mask adapter 3a
3 to 3d are arranged above the substrate transport unit 11 that transports the glass substrate P, for example, as shown in FIG.

FIG. 2 is a perspective view showing a schematic configuration of an embodiment of an exposure apparatus B to which the transfer arm A shown in FIG. 1 is applied. In FIG. 2, an exposure apparatus B includes a substrate transfer unit 11 that transfers a glass substrate P, and the substrate transfer unit 1
1, a mask adapter 3a to 3d arranged above 1, a mask stocker 12 that removably stores the photomask M, an arm drive unit 13 including the arm member 1 of the transfer arm A, and an alignment stage unit 14.
A control unit 15 for controlling the entire exposure apparatus, an exposure unit (not shown) including an irradiation optical system, and the like. The substrate transport unit 11 transports the glass substrate P in the Y direction indicated by the arrow by, for example, a roller conveyor method. In the substrate transfer unit 11, a space 11a into which the pair of arms 1a of the transfer arm A enters is provided at the substrate supply position where the glass substrate P is supplied to the arm drive unit 13. Mask adapter 3a-3b
Is detachably held above the space 11a of the substrate transfer unit 11 by a mask adapter holder (not shown). The mask stocker 12, the arm drive unit 13, and the alignment stage unit 14 are arranged outside the substrate transfer unit 11, respectively. For example, the mask stocker 12 and the arm drive unit 13 are
The alignment stage units 14 are arranged in parallel along the substrate transfer unit 11, and are arranged so as to face the arm drive unit 13 on the opposite side of the substrate transfer unit 11.

The arm drive unit 13 includes the arm member 1
And an X-axis for driving the arm member 1 and Z
Axis drive table 13a including three axes, the θ axis,
It is configured to include a drive unit 13b including a drive motor that individually rotationally drives each shaft. Here, the X-axis is a drive shaft for moving the arm member 1 forward and backward with respect to each of the substrate transport unit 11, the mask stocker 12, and the alignment stage unit 14. Also, Z
The axis means the substrate transfer unit 11, the mask stocker 12,
It is a drive shaft that moves the arm member 1 up and down with respect to each of the alignment stage units 14. Further, the θ axis is a drive shaft that rotates the arm member 1 around the Z axis. This arm drive unit 13
When carrying the glass substrate P, and the photomask M
When the sheet is conveyed, the drive motor of the drive unit 13b is drive-controlled by the control unit 15c of the control unit 15 shown in FIG.

The alignment stage unit 14 comprises a mask holder 14a, an exposure chuck 14b, a tilting Z stage 14c, a glass substrate alignment stage 14d and the like. Mask holder 14
a sucks and holds the peripheral portion of the non-pattern forming surface of the photomask M conveyed by the arm member 1. The exposure chuck 14b sucks and holds the non-exposed surface of the glass substrate P conveyed by the arm member 1. The tilting Z stage 14c includes a coarse movement stage that vertically moves the exposure chuck 14b in parallel, and a three-point contact type tilt drive motor that tilts the glass substrate P on the exposure chuck 14b to perform proximity gap control. Composed. The glass substrate alignment stage 14d includes an X-axis stage that moves the exposure chuck 14b in the X direction, a Y-axis stage that moves the exposure chuck 14b in the Y direction, and a θ-axis stage that moves the exposure chuck 14b in the θ direction. To be done. Alignment stage unit 1 above
In 4, the transfer arm A is used as pre-exposure processing before the glass substrate P is exposed to the mask pattern of the photomask M by the exposure light emitted from the irradiation optical system of the exposure unit.
The pre-alignment for correcting the carry-in displacement amount of the glass substrate P due to, the proximity gap control for setting the gap between the photomask M and the glass substrate P to a predetermined minute gap (separation gap), the photomask M and the glass substrate P Although alignment and the like for superimposing with high accuracy are performed, this pre-exposure processing is the same as that of the above-described conventional exposure apparatus, and therefore description thereof will be omitted.

FIG. 3 is a control block diagram showing an embodiment of a drive control system of the arm drive unit 13 of the exposure apparatus B shown in FIG. In FIG. 3, the control unit 15
Is an input / output circuit 15a, a memory unit 15b, and a control unit 1.
5c and the like. The input / output circuit 15a is a pressure sensor P.
S1, PS2, A / D conversion circuit for A / D conversion (analog-digital conversion) of detection signals from the photoelectric sensor S, solenoid valves V1, V2, and a predetermined value necessary for controlling the drive unit 13b of the arm drive unit 13. It is configured to include the circuit of. Memory unit 15 including ROM and RAM
In b, a program and various reference data (setting data) required for drive control of the drive unit 13b of the arm drive unit 13 are stored. The control unit 15c is an MPU.
And the like, and executes a program stored in the memory unit 15b to drive the drive motor of the drive unit 13b of the arm drive unit 13 and control the solenoid valve V.
Various processes such as a determination process required for opening / closing control of 1 and V2, a drive control of the drive motor and an opening / closing control of the solenoid valves V1 and V2 are performed.

With reference to FIGS. 3, 4 and 5, an embodiment of the operation of transporting the glass substrate P by the arm member 1 of the arm drive unit 13 will be described. FIG. 4 is a diagram showing an example of the operation of transporting the glass substrate P by the arm member 1, FIG.
FIG. 6 is a diagram showing a state in which the arm member 1 holds the glass substrate P by suction. In FIG. 4A, the arm drive unit 13 is the control unit 1 of the control unit 15 shown in FIG.
The drive control of the X-axis drive motor of the drive unit 13b is performed by 5c so as to rotate in the forward rotation direction. The arm drive table 13a moves the arm member 1 from the standby position indicated by the solid line toward the substrate transfer unit 11 in the X direction indicated by the arrow by the drive control of the X-axis drive motor. As a result, the arm member 1 moves from the standby position to the position indicated by the alternate long and short dash line, that is, the position where the pair of arms 1b enter the space 11a of the substrate transport unit 11. At this time, the arm 1b faces the non-exposed surface of the glass substrate P. Next, the arm drive unit 13 is drive-controlled by the control unit 15c so that the Z-axis drive motor of the drive unit 13b rotates in the forward rotation direction. In addition, the control unit 1
5c, the solenoid valves V1 and V2 shown in FIG. 5 are controlled so that the internal valve bodies open the air suction passages 5a and 5b. The arm drive table 13a is controlled by the drive motor for the Z-axis, so that the substrate transfer unit 1 is driven.
1 to the predetermined position in the Z direction indicated by the arrow in FIG. For example, the arm drive table 13a is provided at a predetermined position between the substrate transfer unit 11 and the mask adapters 3a to 3d shown in FIG. 2 (the position shown by the alternate long and short dash line in FIG. 4A, that is, shown in FIG. 4B). Exposure chuck 14b of the alignment stage unit 14
To the upper position). The solenoid valves V1 and V2 are
The internal valve body is the air suction passages 5a, 5b of the arm member 1.
Is opened, negative suction air is supplied from the vacuum source to the air suction passages 5a and 5b. During the process of raising the arm drive table 13a, the arm 1b of the arm member 1 contacts the non-exposed surface of the glass substrate P. At that time,
As shown in FIG. 5, the exposed surface of the glass substrate P is suction-held by all the suction pads 2a to 2h of the arm member 1 by the suction air. When the glass substrate P is sucked and held by the suction pads 2a to 2h, the pressure sensor PS2 and the photoelectric sensor S shown in FIG.
The detection signal is output to 5. The control unit 15c receives the detection signal from the pressure sensor PS2, compares the detection value of the detection signal with a predetermined determination reference value (for example, the atmospheric pressure value), and the detection value is higher than the determination reference value. When it is small, it is determined that the glass substrate P is suction-held by all the suction pads 2a to 2h. In the control unit 15c, the detection signal from the photoelectric sensor S is input, and the detection value of the detection signal is compared with a predetermined determination reference value corresponding to the gap between the glass substrate P and the arm 1b, and the detection value is detected. And the determination reference value are substantially equal to each other, it is determined that the glass substrate P is suction-held as the object to be conveyed. Next, the arm drive unit 13
The control unit 15c controls the drive of the θ-axis drive motor of the drive unit 13b so as to rotate in the forward rotation direction. The arm drive table 13a is driven and controlled by the θ-axis drive motor to move from the predetermined position indicated by the alternate long and short dash line to the θ direction indicated by the arrow in FIG. In the illustrated example, it rotates by about 180 degrees.

In FIG. 4B, when the arm drive table 13a is rotated by a predetermined angle together with the arm member 1 in the θ direction shown in FIG. 4A, the arm member 1 is positioned at the true position of the exposure chuck 14b of the alignment stage unit 14. Move up. The arm drive unit 13 is drive-controlled by the control unit 15c so that the Z-axis drive motor of the drive unit 13b rotates in the reverse rotation direction. Arm drive table 13
a is the drive control of the Z-axis drive motor,
The arm member 1 descends in the -Z direction indicated by the arrow in FIG.

In FIG. 4 (c), when the arm driving table 13a descends together with the transfer arm A in the -Z direction shown in FIG. 4 (b), the pair of arms 1b, 1b of the arm member 1 is moved.
Is a pair of groove portions 14b provided on the exposure chuck 14b.
1,14b1 enters. At this time, the solenoid valves V1 and V2 shown in FIG.
The internal valve body is controlled to block the air suction passages 5a and 5b. As a result, the supply of suction air to all the suction pads 2a to 2h of the arm member 1 is stopped, so that the glass substrate P is placed on the exposure chuck 14b. This completes the transportation of the glass substrate P by the arm member 1. The glass substrate P is suction-held on the exposure chuck 14b. When the transportation of the glass substrate A is completed, the arm drive unit 13 is controlled by the control unit 15c.
Therefore, drive control is performed so that the X-axis drive motor of the drive unit 13b rotates in the reverse rotation direction. Arm drive table 1
3a, the arm member 1 is moved in the -X direction indicated by the arrow in FIG. 4C by the drive control of the X-axis drive motor.
To move.

In FIG. 4D, when the arm member 1 moves in the -X direction shown in FIG. 4C, the arm member 1 moves to the position shown by the solid line. Arm drive unit 13
Is controlled by the control unit 15c so that the θ-axis drive motor of the drive unit 13b rotates in the reverse rotation direction. The arm drive table 13a rotates together with the arm member 1 in the −θ direction shown by the arrow in FIG. 4D by the drive control of the θ-axis drive motor, and moves to the position shown by the alternate long and short dash line, that is, FIG. Return to the position shown by the solid line in (a).

Next, with reference to FIG. 3, FIG. 4, FIG. 6 and FIG. 7, an embodiment of the operation of transporting the photomask M by the arm member 1 of the arm driving unit 13 will be described. Figure 6
FIG. 7 is a diagram showing an example of a transport operation of the photomask M by the arm member 1, and FIG. 7 is a diagram showing a state in which the arm member 1 holds the photomask M by the mask adapters 3a to 3d. In FIG. 6A, the arm drive unit 1
3 is a control unit 15c of the control unit 15 shown in FIG.
Therefore, the drive control is performed so that the Z-axis drive motor of the drive unit 13b rotates in the forward rotation direction. Arm drive table 1
3a rises in the Z direction indicated by the arrow together with the arm member 1 by the drive control of the Z-axis drive motor. As a result, the arm drive table 13a rises from the position indicated by the solid line to the position indicated by the alternate long and short dash line, that is, in the vicinity of the mask adapters 3a to 3d. Next, the arm drive unit 13 is driven by the control unit 15c by the drive unit 13b.
The X-axis drive motor is controlled to rotate in the forward rotation direction. The arm member 1 is moved in the X direction indicated by the arrow in FIG. 3A by driving and controlling the X-axis drive motor. As a result, in the arm member 1, the suction pads 2a and 2b shown in FIG. 7 are mask adapters 3a to 3d.
Move to a position facing.

In FIG. 6B, the arm drive table 13a is drive-controlled by the control unit 15c so that the Z-axis drive motor of the drive unit 13b rotates in the forward rotation direction. Further, the solenoid valve V1 shown in FIG. 7 is controlled by the control unit 15c so that the internal valve body opens the air suction passage 5a. The solenoid valve V1 has an internal valve body that opens the air suction passage 5a of the arm member 1. Therefore, negative suction air is supplied to the air suction passage 5a from a vacuum source. The arm drive table 13a ascends in the Z direction together with the arm member 1 by the drive control of the Z-axis drive motor. During this ascending process, the mask adapters 3a to 3d are inserted into the holes 4a to 4d of the arm member 1 shown in FIG.
The pins 3a1 to 3d1 of are inserted. As a result, the mask adapters 3a to 3d are positioned on the corresponding suction pads 2a and 2b of the pair of arms 1b and 1b of the arm member 1, and in that state, they are suction-held on the suction pads 2a and 2b by the suction air. It Mask adapter 3a
When ~ 3d is sucked and held by the suction pads 2a and 2b,
The pressure sensor PS1 shown in FIG.
The detection signal is output to. The control unit 15c inputs the detection signal from the pressure sensor PS1, compares the detection value of the detection signal with a predetermined determination reference value (for example, the atmospheric pressure value),
When the detected value is smaller than the determination reference value, it is determined that the suction adapters 2a and 2b suction-hold the mask adapters 3a to 3d. According to this determination result, the arm drive table 13a further rises in the Z direction and stops after removing the mask adapters 3a to 3d from the mask adapter holder. Next, the arm drive unit 13
Is controlled by the control unit 15c so that the X-axis drive motor of the drive unit 13b rotates in the reverse rotation direction. The arm drive table 13a moves the arm member 1 in the −X direction indicated by the arrow in FIG. As a result, the arm member 1 returns to the original position while holding the mask adapters 3a to 3d. Next, the arm drive unit 13 is drive-controlled by the control unit 15c so that the Z-axis drive motor of the drive unit 13b rotates in the reverse rotation direction. The arm drive table 13a descends together with the arm member 1 in the -Z direction indicated by the arrow in the figure by the drive control of the Z-axis drive motor, and moves to the position indicated by the alternate long and short dash line, that is, the arm member 1 stands by. Return to position. Next, the arm drive unit 13 is drive-controlled by the control unit 15c so that the θ-axis drive motor of the drive unit 13b rotates in the forward rotation direction. When the θ-axis drive motor is driven and controlled, the arm drive table 13a moves from the predetermined position indicated by the alternate long and short dash line to the θ direction indicated by the arrow together with the arm member 1 at a predetermined angle (in the illustrated example, approximately 90 °). Rotate only degrees).

In FIG. 6C, when the arm drive table 13a rotates with the arm member 1 by a predetermined angle in the θ direction shown in FIG. 6B, the arm member 1 moves to the front of the mask stocker 12. Arm drive unit 13
Is controlled by the control unit 15c so that the X-axis drive motor of the drive unit 13b rotates in the forward rotation direction. The arm drive table 13a moves the arm member 1 in the X direction indicated by the arrow by the drive control of the X-axis drive motor. As a result, the arm member 1 reaches the position where the mask adapters 3a to 3d shown in FIG. 7 face the corners of the pattern forming surface of the photomask M (the lowermost photomask M in the illustrated example) in the mask stocker 12. Moving. Next, the arm drive unit 13 is connected to the controller 1
By 5c, drive control of the Z-axis drive motor of the drive unit 13b is performed so as to rotate in the forward rotation direction. The arm drive table 13a ascends in the Z direction together with the arm member 1 by the drive control of the Z-axis drive motor. In this rising process, the mask adapters 3a to 3 shown in FIG.
d holds the corner portion of the pattern formation surface of the photomask M. When the photomask M is held by the mask adapters 3 a to 3 d, the photoelectric sensor S shown in FIG. 7 outputs a detection signal to the control unit 15. In the controller 15c,
The detection signal from the photoelectric sensor S is input, and the detection value of the detection signal is compared with a predetermined determination reference value corresponding to the gap between the photomask M and the arm 1b, and the detection value and the determination reference value are almost equal to each other. When they are the same, it is determined that the photomask M is held as the conveyance target. According to this determination result, the arm drive table 13a further rises in the Z direction and stops after removing the photomask M from the mask stocker 12. Next, the arm drive unit 13 includes the control unit 15
The drive control of the X-axis drive motor of the drive unit 13b is performed by c so as to rotate in the reverse rotation direction. The arm drive table 13a moves the arm member 1 in the −X direction in FIG. 3C by the drive control of the X-axis drive motor.
As a result, the arm member 1 returns to the original position indicated by the alternate long and short dash line while the photomask M is held by the mask adapters 3a to 3d.

In FIG. 6D, the arm drive unit 13 is drive-controlled by the control unit 15c so that the Z-axis drive motor of the drive unit 13b rotates in the reverse rotation direction.
The arm drive table 13a descends together with the arm member 1 in the -Z direction indicated by the arrow in the figure by the drive control of the Z-axis drive motor, and moves to the position indicated by the alternate long and short dash line, that is, the arm member 1 stands by. Return to position. Next, the arm drive unit 13 is controlled by the control unit 15c.
The θ-axis drive motor b is controlled to rotate in the forward rotation direction. When the θ-axis drive motor is driven and controlled, the arm drive table 13a moves from the predetermined position indicated by the alternate long and short dash line to the θ direction indicated by the arrow together with the arm member 1 at a predetermined angle (in the illustrated example, approximately 90 °). Rotate only degrees).

In FIG. 6E, when the arm drive table 13a rotates with the arm member 1 by a predetermined angle in the θ direction shown in FIG. 6D, the arm member 1 moves to a position facing the alignment stage unit 14. To do. The arm drive unit 13 includes the drive unit 1 controlled by the control unit 15c.
The Z-axis drive motor 3b is drive-controlled so as to rotate in the forward rotation direction. The arm drive table 13a is controlled by the drive motor for the Z-axis, so that the arm member 1 is driven.
Is moved in the Z direction indicated by the arrow from the position indicated by the solid line. As a result, the arm drive table 13a rises from the position indicated by the solid line to the position indicated by the alternate long and short dash line, that is, near the mask holder 14a. Next, the arm drive unit 13 is drive-controlled by the control unit 15c so that the X-axis drive motor of the drive unit 13b rotates in the forward rotation direction. By controlling the drive of the X-axis drive motor,
The arm member 1 is moved in the X direction indicated by the arrow. As a result, in the arm member 1, the photomask M shown in FIG. 7 moves to just below the mask holder 14a. This completes the transfer of the photomask M by the arm member 1. The photomask M is suction-held by the mask holder 14a. When the transfer of the photomask M is completed, the arm drive unit 13 is drive-controlled by the control unit 15c so that the Z-axis drive motor of the drive unit 13b rotates in the reverse rotation direction. The arm drive table 13a is
When the Z-axis drive motor is drive-controlled, the Z-axis drive motor is lowered to a predetermined position in the −Z direction indicated by an arrow in FIG. For example, the arm transfer table 13a is shown in FIG.
6A and 6B. A predetermined position between the mask holder 14a and the exposure chuck 14b (the same height as the position shown by the dashed line in FIG. 6F, that is, the position where the mask adapters 3a to 3d shown in FIG. Position).

In FIG. 6 (f), when the arm drive table 13a descends to a predetermined position in the -Z direction shown in FIG. 6 (e), the arm member 1 moves to a predetermined position between the mask holder 14a and the exposure chuck 14b. To descend. The arm drive unit 13 controls the θ of the drive unit 13b by the control unit 15c.
Drive control is performed so that the shaft drive motor rotates in the reverse rotation direction. When the θ-axis drive motor is drive-controlled, the arm drive table 13a moves from the predetermined position indicated by the solid line to the −θ direction indicated by the arrow together with the arm member 1 at a predetermined angle (in the illustrated example, approximately 180). Rotate only degrees). When the arm transport table 13a rotates in the −θ direction together with the arm member 1 by a predetermined angle, the arm member 1 is moved to the positions shown by the alternate long and short dash line, that is, the mask adapters 3a to 3d.
Move below the position where was placed. Next, the arm drive unit 13 is drive-controlled by the control unit 15c so that the θ-axis drive motor of the drive unit 13b rotates in the forward rotation direction. The arm drive table 13a ascends in the Z direction indicated by the arrow together with the arm member 1 by the drive control of the θ-axis drive motor. During this ascending process, the mask adapters 3a to 3d are held by the mask adapter holder. At this time, the solenoid valve V1 shown in FIG. 5 is controlled by the control unit 15c of the control unit 15 so that the internal valve body closes the air suction passage 5b. As a result, the supply of suction air to the suction pads 2a and 2b on the front end side and the rear end side of the arm member 1 shown in FIG. 5 is stopped. Then, the arm drive table 13a stops after setting the mask adapters 3a to 3d in the mask adapter holder. Next, the arm drive unit 13 is drive-controlled by the control unit 15c so that the Z-axis drive motor of the drive unit 13b rotates in the reverse rotation direction. The arm drive table 13a is controlled by driving the Z-axis drive motor, so that the mask adapters 3a to 3d shown in FIG.
The pins 3a1 to 3d1 of No. 3 are shown together with the arm member 1 to the positions where they are pulled out from the holes 4a to 4b of the arm member 1 by arrows.
It descends in the Z direction. Next, the arm drive unit 13
The control unit 15c controls the drive of the X-axis drive motor of the drive unit 13b so as to rotate in the reverse rotation direction. Although not shown, the arm drive table 13a moves the arm member 1 to the original position by the drive control of the X-axis drive motor. After that, the arm drive unit 13
Is controlled by the control unit 15c so that the Z-axis drive motor of the drive unit 13b rotates in the reverse rotation direction. As a result, the arm drive table 13a returns to the original position together with the arm member 1, that is, the position shown by the solid line in FIG. 6A, by the drive control of the Z-axis drive motor.

According to the transfer arm A shown in this embodiment, in the arm member 1, all of the plurality of suction pads 2 are provided.
Since the non-exposed surface of the glass substrate P is suction-held by a to 2h, the glass substrate P can be firmly held, and the suction pads 2 on the front end side and the rear end side of the arm member 1 can be held.
Mask adapters 3a to 3d sucked and held by a and 2b
Since the corner portion of the pattern forming surface of the photomask M is held by the above, it is possible to prevent the mask pattern from being damaged during the transportation. Further, according to the exposure apparatus B shown in the present embodiment, when the glass substrate P is transported, the control unit 15 drives and controls the arm drive unit 13 so that the arm member 1 is supplied to the substrate transport unit 11. When moving the photomask M to the position and the exposure chuck 14b of the alignment stage unit 14, the arm drive unit 13 is driven and controlled by the control unit 15 to dispose the arm member 1 on the mask adapters 3a to 3d. Position and mask stocker 12
And mask holder 1 for alignment stage unit 14
4a and move to. That is, the arm member 1 is moved to the control unit 15 and the arm drive unit 13 depending on whether the glass substrate P is transported or the photomask M is transported.
Since it can be driven to move to a predetermined position by
The device configuration can be simplified and the device cost can be reduced.

[0029]

As described above, according to the transfer arm of the present invention, the non-exposed surface of the substrate to be exposed is sucked and held by the plurality of suction pads on the arm member. The substrate can be firmly held, and the corner portion of the mask pattern formation surface is held by the suction pad corresponding to the corner portion of the mask among the plurality of suction pads. It has an excellent effect that damage of the can can be prevented. Further, according to the exposure apparatus of the present invention, the arm member can be driven to be moved to a predetermined position by the drive control means depending on whether the exposure target substrate is transported or the mask is transported. It has an excellent effect that the device cost can be reduced and the device cost can be reduced.

[Brief description of drawings]

FIG. 1 is a perspective view showing a schematic configuration of an embodiment of a transfer arm according to the present invention.

FIG. 2 is a perspective view showing a schematic configuration of an embodiment of an exposure apparatus to which a transfer arm according to the present invention is applied.

3 is a control block diagram showing an embodiment of a drive control system of an arm drive unit of the exposure apparatus shown in FIG.

FIG. 4 is a diagram showing an example of a glass substrate transfer operation by an arm member.

FIG. 5 is a view showing a state in which an arm member sucks and holds a glass substrate.

FIG. 6 is a diagram showing an embodiment of a photomask transporting operation by an arm member.

FIG. 7 is a diagram showing a state in which an arm member holds a photomask by a mask adapter.

[Explanation of symbols]

1 Arm member 2a ~ 2h adsorption pad 3a-3d mask adapter 3a1-3d1 pins 4a-4d holes 5a, 5b Air supply passage 11 Board transfer unit 12 Mask stocker 13 Arm drive unit 13a arm drive table 13b drive unit 14 Alignment stage unit 14a Mask holder 14b Exposure chuck A transfer arm B exposure equipment M photomask P glass substrate PS1, PS2 Pressure sensor S photoelectric sensor V1, V2 solenoid valve

   ─────────────────────────────────────────────────── ─── Continued front page    F term (reference) 2H088 EA12 EA39 FA17 FA30 HA01                       HA06 HA12 MA20                 2H097 GA45 LA12                 3C007 AS24 BS15 DS02 ES17 FS01                       FT11 NS12                 5F031 CA05 CA07 DA17 FA02 FA04                       FA07 FA12 FA14 GA02 GA06                       GA08 GA36 GA47 GA48 GA49                       HA13 HA57 HA58 HA59 JA21                       JA51 KA06 KA07 KA08 LA07                       MA27 NA02 PA20 PA30

Claims (6)

[Claims] 1. An exposure apparatus for irradiating a pattern-forming mask with light to form a predetermined pattern on a substrate surface of an exposure-target substrate, the transport being used also for transporting the mask and the exposure-target substrate. An arm, which is a common arm member for carrying an exposure target substrate and a mask, and a plurality of suction pads arranged on the arm member for suction-holding the exposure target substrate; A mask adapter for holding a corner portion of a pattern forming surface, which is arranged at a predetermined position, and is sucked and held by a suction pad corresponding to a corner portion of the mask among the plurality of suction pads to hold the mask. A transfer arm with a mask adapter that holds the corners. 2. A first air supply passage communicating with a suction pad corresponding to a corner portion of the mask among the plurality of suction pads, and a suction pad other than the suction pad corresponding to the corner portion of the mask. When the substrate to be exposed is suction-held by the second air supply passage communicating with the second suction pad and the plurality of suction pads, suction air is supplied through the first air supply passage and the second air supply passage,
The transfer arm according to claim 1, further comprising a supply unit that supplies suction air through the first air supply passage when suction holding the mask adapter by a suction pad corresponding to a corner portion of the mask. 3. A first detection means for detecting the suction air pressure in the second air supply passage when the exposure target substrate is suction-held, and the first detection means when the mask adapter is suction-held. The transfer arm according to claim 2, further comprising a second detection unit that detects the suction air pressure in the air supply passage. 4. The arm member according to claim 1, further comprising a positioning portion around a suction pad corresponding to a corner portion of the mask, for positioning the mask adapter sucked and held by the suction pad. The transfer arm described in Crab. 5. An exposure apparatus for irradiating a pattern forming mask with light to form a predetermined pattern on a substrate surface of an exposure target substrate, wherein the transfer arm is used to transfer the mask and the exposure target substrate. The exposure target substrate and the mask are commonly used for transporting, a plurality of transporting arm members, a plurality of suction pads arranged on the arm member for suction-holding the exposure target substrate, and the mask of the mask. A mask adapter for holding a corner portion of a pattern forming surface, which is arranged at a predetermined position,
Of the plurality of suction pads, a transport arm including a mask adapter that holds the corner portion of the mask by being suction-held by a suction pad corresponding to the corner portion of the mask, and the substrate to be exposed is transported. To the plurality of suction pads to supply suction air for sucking the substrate to be exposed,
When the mask is transported, a supply unit that supplies suction air that sucks the mask adapter to a suction pad corresponding to a corner portion of the mask, and a case where the exposure target substrate is transported and a case where the mask is transported. An exposure apparatus comprising: drive control means for driving the arm member to move to a predetermined position in accordance with the above. 6. A first detection unit that detects a suction air pressure when the plurality of suction pads suction the substrate to be exposed by the suction air supplied from the supply unit, and outputs a detection signal, Second detection means for detecting the suction air pressure when the suction pad corresponding to the corner portion of the mask has suctioned the mask adapter by the suction air supplied from the supply means, and outputting a detection signal,
Third detection means for detecting the exposure target substrate sucked and held by the plurality of suction pads, outputting a detection signal, detecting the mask held by the mask adapter, and outputting a detection signal; As the drive control means, an arm drive means for moving the arm member to a predetermined position and a control means for controlling the arm drive means and the supply means are provided, and the control is performed when the exposure target substrate is transported. The means drive-controls the arm driving means so as to move the arm member to the supply position of the exposure target substrate, and controls the supply means so as to supply suction air to the plurality of suction pads. It is determined that the exposure target substrate is suction-held based on the detection signal of the first detection unit, and the exposure target substrate is transported based on the detection signal of the third detection unit. When the arm driving means is driven and controlled so as to move the arm member to the position, and the mask is transported, the control means moves the arm member to the position where the mask adapter is arranged. The drive means is drive-controlled, it is determined that the mask adapter is suction-held based on the detection signal of the second detection means, and the arm member is moved to the stocker position of the mask based on the determination result. The arm drive means is driven and controlled, it is determined that the mask is held based on the detection signal of the third detection means, and the arm member is moved to a position where the mask should be transported based on the determination result. The exposure apparatus according to claim 5, wherein the arm drive means is drive-controlled as described above.