JP2003127399A - Ink jet recording head and method for manufacturing the same - Google Patents

Ink jet recording head and method for manufacturing the same

Info

Publication number
JP2003127399A
JP2003127399A JP2002216166A JP2002216166A JP2003127399A JP 2003127399 A JP2003127399 A JP 2003127399A JP 2002216166 A JP2002216166 A JP 2002216166A JP 2002216166 A JP2002216166 A JP 2002216166A JP 2003127399 A JP2003127399 A JP 2003127399A
Authority
JP
Japan
Prior art keywords
ink
recording head
movable member
substrate
flow path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002216166A
Other languages
Japanese (ja)
Other versions
JP2003127399A5 (en
JP4095368B2 (en
Inventor
Hirokazu Komuro
博和 小室
Masahiko Kubota
雅彦 久保田
Hiroyuki Sugiyama
裕之 杉山
Ryoji Inoue
良二 井上
Yoshinori Misumi
義範 三隅
Masashi Miyagawa
昌士 宮川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2002216166A priority Critical patent/JP4095368B2/en
Priority to US10/214,105 priority patent/US6663229B2/en
Priority to AT02255582T priority patent/ATE399645T1/en
Priority to DE60227322T priority patent/DE60227322D1/en
Priority to CNB021285659A priority patent/CN1187195C/en
Priority to KR10-2002-0046971A priority patent/KR100435020B1/en
Priority to EP02255582A priority patent/EP1283109B1/en
Publication of JP2003127399A publication Critical patent/JP2003127399A/en
Priority to US10/645,582 priority patent/US6971171B2/en
Publication of JP2003127399A5 publication Critical patent/JP2003127399A5/ja
Application granted granted Critical
Publication of JP4095368B2 publication Critical patent/JP4095368B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1645Manufacturing processes thin film formation thin film formation by spincoating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/335Structure of thermal heads
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14016Structure of bubble jet print heads
    • B41J2/14032Structure of the pressure chamber
    • B41J2/1404Geometrical characteristics
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14016Structure of bubble jet print heads
    • B41J2/14032Structure of the pressure chamber
    • B41J2/14048Movable member in the chamber
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1601Production of bubble jet print heads
    • B41J2/1603Production of bubble jet print heads of the front shooter type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • B41J2/1628Manufacturing processes etching dry etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • B41J2/1629Manufacturing processes etching wet etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1631Manufacturing processes photolithography
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1637Manufacturing processes molding
    • B41J2/1639Manufacturing processes molding sacrificial molding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2002/14387Front shooter
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49082Resistor making
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49082Resistor making
    • Y10T29/49083Heater type
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/4913Assembling to base an electrical component, e.g., capacitor, etc.
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • Y10T29/49158Manufacturing circuit on or in base with molding of insulated base
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49169Assembling electrical component directly to terminal or elongated conductor
    • Y10T29/49171Assembling electrical component directly to terminal or elongated conductor with encapsulating
    • Y10T29/49172Assembling electrical component directly to terminal or elongated conductor with encapsulating by molding of insulating material
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49401Fluid pattern dispersing device making, e.g., ink jet

Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing an ink jet recording head by which a movable member is formed in a nozzle channel between an ink inlet and an outlet to thereby provide a high-density, high-accuracy, and high- reliability ink recording head which can improve a frequency response while maintaining proper discharge performance, and to provide the ink recoding head. SOLUTION: The method for manufacturing the ink jet recording head utilizing ink bubbling by heating of a heating resistor to thereby eject ink includes the steps of: preparing a substrate provided with the resistor; applying such first resin on the substrate as to provide a first mold shape for forming the nozzle channel and movable member; forming the first mold shape using the first resin; applying, on the substrate, second resin over the first mold shape for forming the nozzle channel and the movable member; and removing the first mold shape.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、液体をオリフィス
(吐出口)から噴射して液滴を形成するインクジェット
記録ヘッドの作成方法及びインクジェット記録ヘッドに
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ink jet recording head manufacturing method and an ink jet recording head for ejecting liquid from an orifice (ejection port) to form droplets.

【0002】[0002]

【従来の技術】液体をオリフィスから噴射して液滴を形
成するこの種のインクジェット記録ヘッドに関し、例え
ば特開昭54−51837号公報に記載されているイン
クジェット記録法は、熱エネルギーを液体に作用させ
て、液滴吐出の原動力を得るという点において、他のイ
ンクジェット記録方法とは異なる特徴を有している。
2. Description of the Related Art An ink jet recording head of this type in which a liquid is ejected from an orifice to form droplets is disclosed in, for example, Japanese Patent Laid-Open No. 54-51837, wherein an ink jet recording method applies thermal energy to the liquid. Thus, it has a feature different from other ink jet recording methods in that the driving force for droplet ejection is obtained.

【0003】即ち、上述の公報に開示されている記録法
は、熱エネルギーの作用を受けた液体が過熱されて気泡
を発生し、この気泡発生に基づく作用力によって、記録
ヘッド部先端のオリフィスから液滴が形成され、この液
滴が被記録部材に付着して情報の記録が行われるという
ことを特徴としている。
That is, in the recording method disclosed in the above-mentioned publication, the liquid which has been subjected to the action of thermal energy is overheated to generate bubbles, and the action force based on the generation of the bubbles causes an orifice at the tip of the recording head portion. A feature is that droplets are formed and the droplets adhere to the recording member to record information.

【0004】この記録法に適用される記録ヘッドは、一
般に液体を吐出するために設けられたオリフィスと、こ
のオリフィスに連通して液滴を吐出するための熱エネル
ギーが液体に作用する部分である熱作用部を構成の一部
とする液流路とを有する液吐出部及び熱エネルギーを発
生する手段である熱変換体としての発熱抵抗層とそれを
インクから保護する上部保護層と蓄熱するための下部層
を具備している。
A recording head applied to this recording method is an orifice which is generally provided for ejecting a liquid, and a portion which is in communication with this orifice and which has thermal energy for ejecting a droplet to act on the liquid. In order to store heat with a liquid discharge part having a liquid flow path having a heat acting part as a part, and a heat generating resistance layer as a heat converter which is means for generating heat energy and an upper protective layer for protecting it from ink Of the lower layer.

【0005】[0005]

【発明が解決しようとする課題】上記のような熱エネル
ギーを液体に作用させて、液滴吐出の原動力を得るイン
クジェット記録ヘッドにおいて、その印字スピードの向
上のため、インクジェット記録ヘッドに求められる性能
として周波数特性の向上がある。この周波数特性を向上
するためには、液滴を吐出した後のインクのリフィル性
能を上げる必要がある。インクのリフィル性能を上げる
ためにはインク供給口から吐出口までの流抵抗を低減す
ることが必要となる。
In the ink jet recording head which obtains the driving force for droplet ejection by applying the above thermal energy to the liquid, the performance required for the ink jet recording head is to improve the printing speed. There is an improvement in frequency characteristics. In order to improve this frequency characteristic, it is necessary to improve the refill performance of the ink after ejecting the droplet. In order to improve the ink refill performance, it is necessary to reduce the flow resistance from the ink supply port to the ejection port.

【0006】しかしながら、流抵抗の低減をすると発泡
圧力がインク供給口側へ逃げてしまい、吐出速度の低下
及び安定性が無くなり吐出性能が悪くなり印字が悪くな
ることとなる。このため、吐出性能を維持し周波数特性
を向上することは非常に困難であった。
However, when the flow resistance is reduced, the bubbling pressure escapes to the ink supply port side, the ejection speed is lowered and the stability is lost, the ejection performance is deteriorated, and the printing is deteriorated. Therefore, it is very difficult to maintain the ejection performance and improve the frequency characteristic.

【0007】更には、近年の高画質に対する市場の要望
に答えるために、高解像度、且つ、小液滴による印字物
を達成するために、インクジェットプリントヘッドは、
高密度に配列され、且つ、吐出口からは、微小な液滴を
飛翔させる必要がある。
Further, in order to meet the market demand for high image quality in recent years, in order to achieve a printed matter with high resolution and small droplets, an ink jet print head is
It is necessary that the droplets are arranged at a high density and that minute droplets are ejected from the ejection port.

【0008】一方、インク供給口と吐出口の間における
ノズル流路内にいわゆる流体ダイオードとなる可動部材
を設けることにより、吐出性能を維持しつつ周波数特性
を向上させることが提案されている。しかし、そのよう
な従来のインクジェット記録ヘッドでは、可動部材が剥
がれたり破壊されたりしてしまう場合があった。
On the other hand, it has been proposed to improve the frequency characteristic while maintaining the ejection performance by providing a movable member, which is a so-called fluid diode, in the nozzle channel between the ink supply port and the ejection port. However, in such a conventional inkjet recording head, the movable member may be peeled off or destroyed.

【0009】そこで、本発明は、上記課題を解決し、イ
ンク供給口と吐出口の間におけるノズル流路に可動部材
を形成し、吐出性能を維持し周波数特性を向上すること
を可能とした高密度、高精度、高信頼性のインクジェッ
ト記録ヘッドの作成方法及びインクジェット記録ヘッド
を提供することを目的とする。
Therefore, the present invention solves the above problems and forms a movable member in a nozzle flow path between an ink supply port and an ejection port to maintain ejection performance and improve frequency characteristics. An object of the present invention is to provide a method for producing an inkjet recording head having high density, high accuracy, and high reliability, and an inkjet recording head.

【0010】[0010]

【課題を解決するための手段】本発明は、上記課題を解
決するために、つぎの(1)〜(12)のように構成し
たインクジェット記録ヘッドの作成方法及びインクジェ
ット記録ヘッドを提供するものである。 (1)発熱抵抗体と、該発熱抵抗体に対応して設けられ
たインク吐出口と、該インク吐出口に連通するノズル流
路と、を有し、該ノズル流路内の、前記発熱抵抗体と、
前記ノズル流路内にインクを供給するためのインク供給
口と、の間に可動部材が形成されており、前記発熱抵抗
体の発熱によりノズル流路内のインク中に発生させた気
泡を利用して前記インク吐出口からインクを吐出するイ
ンクジェット記録ヘッドの作成方法において、前記発熱
抵抗体を備えた基板を準備する工程と、該基板上に、前
記ノズル流路及び前記可動部材を形成するための第1の
型材となる第1の樹脂を塗布する工程と、該第1の樹脂
により前記第1の型材を形成する工程と、前記第1の型
材を覆うように、前記基板上に前記ノズル流路及び前記
可動部材を形成するための第2の樹脂を塗布する工程
と、前記第1の型材を除去する工程と、を有することを
特徴とするインクジェット記録ヘッドの作成方法。 (2)前記第1の樹脂はフォトレジストであって、前記
第1の型材を形成する工程では、前記フォトレジストの
解像度限界以下の幅を有するマスクパターンを用いて前
記第1の型材の、前記可動部材を形成するための部分を
形成する工程を含むことを特徴とする上記(1)に記載
のインクジェット記録ヘッドの作成方法。 (3)前記第1の樹脂を塗布する工程の前に、前記基板
上に、前記ノズル流路を形成するための第2の型材とな
る第3の樹脂を塗布する工程を、さらに有し、前記第1
の樹脂を塗布する工程は、前記第2の型材を前記第1の
樹脂で覆うように前記基板上に前記第1の樹脂を塗布す
る工程であることを特徴とする上記(1)に記載のイン
クジェット記録ヘッドの作成方法。 (4)前記基板上に、前記第1の樹脂を塗布する前に、
前記基板上の、前記可動部材と前記供給口との間に対応
する位置に突状障壁を形成する工程をさらに有すること
を特徴とする上記(1)に記載のインクジェット記録ヘ
ッドの作成方法。 (5)発熱抵抗体の発熱によりノズル流路内のインク中
に発生させた気泡を利用してインク吐出口からインクを
吐出するインクジェット記録ヘッドにおいて、前記発熱
抵抗体を備えた基板と、該基板上に設けられた前記ノズ
ル流路と、を有し、該ノズル流路内には、前記発熱抵抗
体と、前記ノズル流路内にインクを供給するためのイン
ク供給口と、の間に可動部材が形成されており、該可動
部材は、前記ノズル流路の、前記基板と対向する壁に支
点を有するとともに前記基板側に自由端を有し、前記基
板と対向する前記壁と一体に形成されていることを特徴
とするインクジェット記録ヘッド。 (6)前記壁及び前記可動部材が樹脂により形成されて
いることを特徴とする上記(5)に記載のインクジェッ
ト記録ヘッド。 (7)前記ノズル流路内の前記可動部材と前記インク供
給口との間に、前記可動部材が前記インク供給口側へ変
位することを制限する制限部を有することを特徴とする
上記(5)に記載のインクジェット記録ヘッド。 (8)前記制限部は前記基板上に設けられている突起形
状障壁であることを特徴とする上記(5)に記載のイン
クジェット記録ヘッド。 (9)前記制限部は前記ノズル流路内の側壁を構成する
部材の一部であることを特徴とする上記(5)に記載の
インクジェット記録ヘッド。 (10)発熱抵抗体と、該発熱抵抗体に対応して設けら
れたインク吐出口と、該インク吐出口に連通するノズル
流路と、を有し、該ノズル流路内の、前記発熱抵抗体
と、前記ノズル流路内にインクを供給するためのインク
供給口と、の間に可動部材が形成されており、前記発熱
抵抗体の発熱によりノズル流路内のインク中に発生させ
た気泡を利用して前記インク吐出口からインクを吐出す
るインクジェット記録ヘッドにおいて、前記可動部材
は、前記発熱抵抗体を備えた基板の前記ノズル流路側の
面に対して垂直方向に配されており、かつ、前記可動部
材の支点を前記ノズル流路の、前記基板と対向する側の
面に有し、前記可動部材の自由端を前記ノズル流路の前
記基板側に有することを特徴とするインクジェット記録
ヘッド。 (11)前記ノズル流路内の前記可動部材と前記インク
供給口との間に、前記可動部材が前記インク供給口側へ
変位することを制限する制限部を有することを特徴とす
る上記(10)に記載のインクジェット記録ヘッド。 (12)前記可動部材は、前記インク供給口側へ変位す
る量よりも前記インク吐出口側へ変位する量の方が大き
いことを特徴とする上記(11)に記載のインクジェッ
ト記録ヘッド。
In order to solve the above problems, the present invention provides a method for producing an ink jet recording head and an ink jet recording head having the following constitutions (1) to (12). is there. (1) A heat generating resistor, an ink discharge port provided corresponding to the heat generating resistor, and a nozzle flow path communicating with the ink discharge port, and the heat generating resistance in the nozzle flow path. Body and
A movable member is formed between the ink supply port for supplying ink into the nozzle channel, and the bubbles generated in the ink in the nozzle channel by the heat generation of the heating resistor are used. In a method for producing an ink jet recording head that ejects ink from the ink ejection port, a step of preparing a substrate provided with the heating resistor, and forming the nozzle channel and the movable member on the substrate A step of applying a first resin as a first mold material, a step of forming the first mold material with the first resin, and a nozzle flow on the substrate so as to cover the first mold material. A method for producing an inkjet recording head, comprising: a step of applying a second resin for forming a path and the movable member; and a step of removing the first mold material. (2) The first resin is a photoresist, and in the step of forming the first mold material, a mask pattern having a width equal to or less than a resolution limit of the photoresist is used to form the first mold material The method for producing an ink jet recording head according to (1) above, which includes a step of forming a portion for forming a movable member. (3) Prior to the step of applying the first resin, the method further includes the step of applying a third resin, which serves as a second mold material for forming the nozzle channel, on the substrate. The first
Item (1) is characterized in that the step of applying the resin is a step of applying the first resin on the substrate so as to cover the second mold material with the first resin. Method of making inkjet recording head. (4) Before applying the first resin on the substrate,
The method for producing an inkjet recording head according to (1) above, further comprising the step of forming a projecting barrier at a position corresponding to between the movable member and the supply port on the substrate. (5) In an inkjet recording head that ejects ink from an ink ejection port by utilizing bubbles generated in ink in a nozzle flow path by heat generation of a heating resistor, a substrate provided with the heating resistor, and the substrate. The nozzle flow path provided above, and movable in the nozzle flow path between the heating resistor and an ink supply port for supplying ink into the nozzle flow path. A member is formed, and the movable member has a fulcrum on a wall of the nozzle channel facing the substrate and has a free end on the substrate side, and is integrally formed with the wall facing the substrate. Inkjet recording head characterized by being provided. (6) The ink jet recording head according to the above (5), wherein the wall and the movable member are made of resin. (7) A limiter is provided between the movable member and the ink supply port in the nozzle flow path to limit the displacement of the movable member toward the ink supply port. ) Inkjet recording head as described in 1). (8) The inkjet recording head according to the above (5), wherein the limiting portion is a protrusion-shaped barrier provided on the substrate. (9) The inkjet recording head according to the above (5), wherein the limiting portion is a part of a member forming a side wall in the nozzle flow path. (10) The heating resistor includes a heating resistor, an ink ejection port provided corresponding to the heating resistor, and a nozzle flow path communicating with the ink ejection port. A movable member is formed between the body and an ink supply port for supplying ink into the nozzle channel, and bubbles generated in the ink in the nozzle channel due to heat generation of the heating resistor. In the ink jet recording head that ejects ink from the ink ejection port by using the movable member, the movable member is arranged in a direction perpendicular to a surface of the substrate having the heating resistor on the nozzle channel side, and An inkjet recording head having a fulcrum of the movable member on a surface of the nozzle channel facing the substrate, and a free end of the movable member on a substrate side of the nozzle channel. . (11) The above-mentioned (10), characterized in that a limiting portion is provided between the movable member and the ink supply port in the nozzle flow path for limiting the displacement of the movable member toward the ink supply port. ) Inkjet recording head as described in 1). (12) The ink jet recording head according to (11), wherein the movable member has a larger displacement amount toward the ink ejection port side than a displacement amount toward the ink supply port side.

【0011】[0011]

【発明の実施の形態】上記構成を適用したインクジェッ
ト記録ヘッドの作成方法によれば、可動部材がノズル型
材のパターニング時に型を形成できるので、可動部材と
ノズル流路がフォトリソグラフィ法で高密度、高精度に
形成することができ、高密度、高精度のインクジェット
記録ヘッドの作成が可能となる。さらに、可動部材を形
成する方法として、前記第1の樹脂の解像度限界以下の
幅を有するマスクパターンを用いて前記第1の型材の、
前記可動部材を形成するための部分を形成し、その部分
に後に塗布する樹脂によって可動部材を形成すれば、ノ
ズル流路と可動部材の形成部分の型材を同一のマスクで
形成することが可能となる。したがって、ノズル流路と
可動部材がマスク作成精度で形成することができる。ま
た、パターニング工程を一つ省略することが出来、コス
トの低減化を図ることができる。また、上記構成を適用
したインクジェット記録ヘッドによれば、インク流路を
構成する材料と同じ材料によって可動部材を形成するこ
とができ、可動部材とインク流路が一体に形成されるこ
とから、可動部材を別部品として付ける方法と比較し
て、可動部材の剥がれや破壊が生じ難く、信頼性が高い
インクジェットヘッドを提供することができる。
According to the method of manufacturing an ink jet recording head to which the above-mentioned structure is applied, since the movable member can form a mold at the time of patterning the nozzle mold material, the movable member and the nozzle channel can be densely formed by photolithography. The ink jet recording head can be formed with high accuracy and high density and high accuracy can be produced. Further, as a method of forming the movable member, a mask pattern having a width equal to or less than the resolution limit of the first resin is used to form the first mold member,
By forming a portion for forming the movable member and forming the movable member with a resin to be applied later on the portion, it is possible to form the nozzle flow path and the mold material of the movable member forming portion with the same mask. Become. Therefore, the nozzle flow path and the movable member can be formed with the mask forming accuracy. Further, one patterning step can be omitted, and the cost can be reduced. Further, according to the inkjet recording head to which the above configuration is applied, the movable member can be formed of the same material as the material forming the ink flow path, and since the movable member and the ink flow path are integrally formed, It is possible to provide an inkjet head having high reliability, in which peeling or breakage of the movable member is less likely to occur as compared with the method of attaching the member as a separate component.

【0012】[0012]

【実施例】以下に、本発明の実施例について説明する。
なお、図22は本発明実施例におけるインクジェット記
録ヘッドの模式的な斜視図を示している。発熱抵抗体3
及びインク供給口5を備えた基板1上にインク流路を構
成する部材12及び吐出口7が形成されている。なお、
以下で本発明の各実施例におけるインクジェット記録ヘ
ッドの作成方法を説明するための、図1〜5(実施例
1),図6〜9(実施例2),図12〜14(実施例
3)及び図15〜17(実施例4)に示す断面図は、図
22のA−A’線における断面図に相当する。
EXAMPLES Examples of the present invention will be described below.
22 shows a schematic perspective view of the ink jet recording head in the embodiment of the present invention. Heating resistor 3
A member 12 forming an ink flow path and a discharge port 7 are formed on the substrate 1 having the ink supply port 5. In addition,
1 to 5 (Embodiment 1), FIGS. 6 to 9 (Embodiment 2), and FIGS. 12 to 14 (Embodiment 3) for explaining a method for producing an ink jet recording head in each embodiment of the present invention. The cross-sectional views shown in FIGS. 15 to 17 (Example 4) correspond to the cross-sectional view taken along the line AA ′ in FIG.

【0013】[実施例1]本発明の実施例1におけるイ
ンクジェット記録ヘッドの作成方法を、図1〜図5を用
いて説明する。まず、シリコン基板上101に蓄熱層1
02を形成し、25μm角のヒータ(発熱抵抗体)10
3を600dpiに配列し、その上に保護層104を形
成する(図1(a)及び図1(b))。次に、第一の型
レジスト108を3μm塗布する(図1(c)及び図1
(d))。次に、第一の型レジスト108をノズル流路
の形状に露光、現像によりパターニングする(図2
(a)及び図2(b))。
[Embodiment 1] A method of manufacturing an ink jet recording head in Embodiment 1 of the present invention will be described with reference to FIGS. First, the heat storage layer 1 is formed on the silicon substrate 101.
02 to form a 25 μm square heater (heating resistor) 10
3 are arranged at 600 dpi, and the protective layer 104 is formed thereon (FIGS. 1A and 1B). Next, a first mold resist 108 is applied in a thickness of 3 μm (FIG. 1C and FIG. 1).
(D)). Next, the first type resist 108 is exposed in the shape of the nozzle flow path and patterned by development (FIG. 2).
(A) and FIG.2 (b)).

【0014】次に、前記パターニングされた上に、第二
の型レジスト109を12μm塗布する(図2(c)及
び図2(d))。次に、第二の型レジスト109をノズ
ル流路形状と可動部材形状111(5μm×25μm)
に露光、現像によりパターニングする(図3(a)及び
図3(b))。次に、ノズル流路、吐出口、可動部材を
形成するための感光性エポキシ材112を塗布する(図
3(c)及び図3(d))。
Next, a second resist 109 having a thickness of 12 μm is applied on the patterned layer (FIGS. 2C and 2D). Next, the second mold resist 109 is formed on the nozzle flow path shape and the movable member shape 111 (5 μm × 25 μm).
Then, patterning is performed by exposure and development (FIGS. 3 (a) and 3 (b)). Next, a photosensitive epoxy material 112 for forming the nozzle flow path, the discharge port, and the movable member is applied (FIGS. 3C and 3D).

【0015】次に、吐出口107を露光、現像によって
直径18μmの形状にパターニングによって形成する
(図4(a)及び図4(b))。次に、基板裏面からド
ライエッチング法によってインク供給口105を形成す
る(図4(c)及び図4(d))。
Next, the ejection port 107 is formed by patterning into a shape having a diameter of 18 μm by exposure and development (FIGS. 4A and 4B). Next, the ink supply port 105 is formed from the back surface of the substrate by the dry etching method (FIGS. 4C and 4D).

【0016】最後に、型材となったレジストを、剥離液
を用いて除去し、可動部材110の形成されたノズル1
06付きのヘッドチップが完成する(図5(a)及び図
5(b))。このようにしてノズル流路内に形成された
可動部材は、発熱抵抗体が設けられた側の基板面に対向
するノズル流路の壁面に支点を有するとともに、該基板
面側に自由端を有する。そして、インク供給するための
チューブとヒータを発熱するための電気を供給するため
の電気実装をしてインクジェット記録ヘッドが完成す
る。
Finally, the resist used as the mold material is removed by using a stripping solution, and the nozzle 1 having the movable member 110 is formed.
A head chip with 06 is completed (FIGS. 5 (a) and 5 (b)). The movable member thus formed in the nozzle channel has a fulcrum on the wall surface of the nozzle channel facing the substrate surface on the side where the heating resistor is provided, and has a free end on the substrate surface side. . Then, an ink jet recording head is completed by electrically mounting a tube for supplying ink and electricity for supplying heat to the heater.

【0017】このようにして完成されたヘッドは周波数
応答性が高く、吐出性能が良い。したがって、高速に良
好な印字が可能になった。また、可動部材を形成するた
めのパターニングがフォトリソグラフィ法であることか
ら、可動部材を高精度で形成できるうえ、ヒータ、ノズ
ル、及び吐出口に対して高精度で可動部材を配置するこ
とが出来る。したがって、今後の小液滴化、高密度化に
十分対応が可能である。
The head thus completed has high frequency response and good ejection performance. Therefore, good printing can be performed at high speed. Further, since the patterning for forming the movable member is the photolithography method, the movable member can be formed with high accuracy, and the movable member can be arranged with high accuracy with respect to the heater, the nozzle, and the ejection port. . Therefore, it is possible to sufficiently cope with the future trend toward smaller droplets and higher densities.

【0018】さらに、ノズル、吐出口を形成するエポキ
シ材と一体で形成できることから、長期使用時の剥がれ
破壊などが生じ難く、また耐インク性があるエポキシ材
を選定することによってエポキシ材からの溶質及び膨れ
など発生しない。したがって、信頼性の高いヘッドを提
供することができる。
Further, since it can be formed integrally with the epoxy material for forming the nozzle and the discharge port, peeling damage or the like is unlikely to occur during long-term use, and a solute from the epoxy material is selected by selecting an epoxy material having ink resistance. And swelling does not occur. Therefore, a highly reliable head can be provided.

【0019】[実施例2]本発明の実施例2におけるイ
ンクジェット記録ヘッドの作成方法を、図6〜図9を用
いて説明する。まず、実施例1と同様にして25μm角
のヒータを600dpiに配列したヒータ203付き基
板201を作成する(図6(a)及び図6(b))。
[Embodiment 2] A method for manufacturing an ink jet recording head in Embodiment 2 of the present invention will be described with reference to FIGS. First, a substrate 201 with a heater 203 in which heaters of 25 μm square are arranged at 600 dpi is prepared in the same manner as in Example 1 (FIGS. 6A and 6B).

【0020】次に、型材となるフォトレジスト208を
20μm塗布する(図6(c)及び図6(d))。次
に、図10に示すようなノズル流路形状と可動部材形状
(2μm×25μm)のマスクパターンを有するマスク
を用いて露光、現像しパターンを形成する。本実施例で
用いているフォトレジスト208は、厚さ20μmにお
いて解像度は4μmであるので、マスクパターンの可動
部材の厚さに対応する部分の幅Wを解像度限界以下の2
μmとしたマスクを用いてパターニングした。
Next, a photoresist 208 serving as a mold material is applied to a thickness of 20 μm (FIGS. 6 (c) and 6 (d)). Next, a pattern having a nozzle flow path shape and a movable member shape (2 μm × 25 μm) mask pattern as shown in FIG. 10 is used for exposure and development to form a pattern. Since the photoresist 208 used in this embodiment has a resolution of 4 μm at a thickness of 20 μm, the width W of the portion of the mask pattern corresponding to the thickness of the movable member is 2 or less than the resolution limit.
Patterning was performed using a mask having a thickness of μm.

【0021】このように解像度限界以下のマスクで形成
すると図7(a)及び図7(b)に示すようにレジスト
の途中までパターニングされる。したがって、基板まで
パターンが到達しないので、可動が可能な可動部材の型
材として機能することができる。次に、ノズル流路20
6、吐出口207、可動部材210を形成するための感
光性エポキシを塗布する(図7(c)及び図7
(d))。次に、吐出口を露光、現像によって直径18
μmの形状にパターニングによって形成する(図8
(a)及び図8(b))。
When the mask is formed with the resolution below the limit, the resist is patterned halfway as shown in FIGS. 7 (a) and 7 (b). Therefore, since the pattern does not reach the substrate, it can function as a mold member for a movable member that is movable. Next, the nozzle channel 20
6, a discharge port 207, and a photosensitive epoxy for forming the movable member 210 are applied (FIGS. 7C and 7C).
(D)). Next, the discharge port is exposed and developed to have a diameter of 18
It is formed by patterning in the shape of μm (FIG. 8).
(A) and FIG.8 (b)).

【0022】次に、基板裏面からドライエッチ法によっ
てインク供給口205を形成する(図8(c)及び図8
(d))。最後に、型材となったレジストを、剥離液を
用いて除去し、ノズル付きの基板が完成する(図9
(a)及び図9(b))。そして、インク供給するため
のチューブ(不図示)を接続しヒータ203を発熱する
ための電気を供給するための電気配線基板(不図示)を
接続してインクジェット記録ヘッドが完成する。このよ
うにして完成されたヘッドは周波数応答性が高く、吐出
性能が良い。したがって、高速に良好な印字が可能にな
った。
Next, the ink supply port 205 is formed from the back surface of the substrate by the dry etching method (FIGS. 8C and 8).
(D)). Finally, the resist used as the mold material is removed using a stripping solution to complete the substrate with nozzles (FIG. 9).
(A) and FIG.9 (b)). Then, an ink jet recording head is completed by connecting a tube (not shown) for supplying ink and an electric wiring board (not shown) for supplying electricity for heating the heater 203. The head thus completed has high frequency response and good ejection performance. Therefore, good printing can be performed at high speed.

【0023】実施例1の効果に加えさらに型レジストの
塗布、露光、現像の工程を一つ省略できることによっ
て、コストを削減することが可能になった。また、ノズ
ル流路206と可動部材210を同一のマスクで作成す
ることができるので、アライメント精度をさらに向上さ
せることが可能となる。また、このようにしてノズル流
路206内に形成された可動部材210は、実施例1の
場合と同様にノズル流路206を構成する壁と一体に形
成されているうえ、可動部材210の支点側の厚みt1
が可動部材の自由端側の厚みt2よりも厚い構造となる
ため、一層、剥がれ破壊などが生じ難い。これのため、
より信頼性の高いインクジェット記録ヘッドを提供する
ことができる。
In addition to the effects of the first embodiment, one step of coating, exposing and developing the mold resist can be omitted, so that the cost can be reduced. Moreover, since the nozzle flow path 206 and the movable member 210 can be formed by the same mask, the alignment accuracy can be further improved. Further, the movable member 210 thus formed in the nozzle flow passage 206 is formed integrally with the wall forming the nozzle flow passage 206 as in the case of the first embodiment, and the fulcrum of the movable member 210 is formed. Side thickness t 1
Is thicker than the thickness t 2 on the free end side of the movable member, so that peeling breakage is less likely to occur. Because of this
A more reliable ink jet recording head can be provided.

【0024】また、図11に示すように、可動部材21
0と供給口205との間のノズル流路206の一部が可
動部材210の幅よりも狭く絞られた形状となるように
ノズルパターンを形成しノズル流路を形成して、可動部
材210が供給口側に変位することを制限することがで
きるようにすれば、発泡圧力が供給口側へ逃げることを
より抑制して、さらに吐出性能を高めたヘッドを、製造
工程を増やすことなく製造することができる。
Further, as shown in FIG. 11, the movable member 21
The nozzle pattern is formed such that a part of the nozzle flow path 206 between the nozzle 0 and the supply port 205 has a narrower width than the width of the movable member 210, and the nozzle flow path is formed. By making it possible to limit displacement to the supply port side, it is possible to further suppress the bubbling pressure from escaping to the supply port side, and manufacture a head with further improved ejection performance without increasing the number of manufacturing processes. be able to.

【0025】[実施例3]本発明の実施例3におけるイ
ンクジェット記録ヘッド(インクジェットプリントヘッ
ド)の作成方法の別の一例を図12〜図14を参照して
説明する。まず、図12(a)に示すように、例えばS
iチップ上にパターニング処理等により複数のヒータ3
03およびこれらヒータ303に電圧を印加するための
所定の配線(不図示)を設けることにより素子基板30
1を形成する。次に、図12(b)に示すように、前記
素子基板301上に、前記可動部材310が、供給口3
05側に変位することを制限するための突起状障壁31
3’を形成するために、オリフィス基板312と同じ組
成である透明なネガ型樹脂層313を約5.0μm塗布
する。
[Embodiment 3] Another example of a method for producing an ink jet recording head (ink jet print head) in Embodiment 3 of the present invention will be described with reference to FIGS. First, as shown in FIG.
A plurality of heaters 3 are formed on the i-chip by patterning or the like.
03 and these heaters 303 are provided with a predetermined wiring (not shown) for applying a voltage to the element substrate 30.
1 is formed. Next, as shown in FIG. 12B, the movable member 310 is attached to the supply port 3 on the element substrate 301.
05-shaped barrier 31 for limiting the displacement
In order to form 3 ', a transparent negative resin layer 313 having the same composition as the orifice substrate 312 is applied by about 5.0 μm.

【0026】その後、図12(c)に示すように、UV
光を用いて、突起型形状になるようなパターン(突起状
障壁)313’を形成する。次に、図12(d),図1
2(e)に示すように、前記基板301上に、下樹脂層
308および上樹脂層309を連続して、スピンコート
法によりそれぞれ塗布する。下樹脂層308および上樹
脂層309は、波長が330nm以下の紫外光であるD
eep−UV光(以下、DUV光と称する。)を照射す
ることによって、分子中の結合が破壊されて溶解可能な
樹脂を用いる。
After that, as shown in FIG.
A pattern (projection-like barrier) 313 ′ having a projection shape is formed by using light. Next, FIG. 12D and FIG.
As shown in FIG. 2E, a lower resin layer 308 and an upper resin layer 309 are successively applied on the substrate 301 by spin coating. The lower resin layer 308 and the upper resin layer 309 are UV light having a wavelength of 330 nm or less.
A resin that is soluble by irradiating eep-UV light (hereinafter, referred to as DUV light) is used because the bond in the molecule is broken.

【0027】また、下樹脂層308として、脱水縮合反
応による熱架橋型の樹脂材を用いることで、上樹脂層3
09をスピンコート法によって塗布する際に、下樹脂層
308と上層樹脂309の各樹脂層間で相互に溶融する
ことが防止されている。下樹脂層308としては、例え
ばメタクリル酸メチル(MMA)とメタクリル酸(MA
A)をラジカル重合させて、ポリマー化させた2元共重
合体(P(MMA−MAA)=90:10)をシクロヘ
キサノン溶媒で溶解した液を使用した。
Further, as the lower resin layer 308, by using a heat-crosslinking type resin material by a dehydration condensation reaction, the upper resin layer 3
It is prevented that the resin layers of the lower resin layer 308 and the upper resin layer 309 are mutually melted when 09 is applied by the spin coating method. As the lower resin layer 308, for example, methyl methacrylate (MMA) and methacrylic acid (MA
A solution obtained by dissolving a binary copolymer (P (MMA-MAA) = 90: 10) polymerized by radical polymerization of A) in a cyclohexanone solvent was used.

【0028】また、上樹脂層309としては、例えばポ
リメチルイソプロペニルケトン(PMIPK)をシクロ
ヘキサノン溶媒で溶解した液を使用した。下樹脂層とし
て使用した2元共重合体(P(MMA−MAA))は脱
水縮合反応は、180〜200℃で、30分〜2時間加
熱することにより、脱水縮合反応によって、より強固な
架橋膜を形成することができる。尚、この架橋膜は、溶
媒不溶型になっているが、DUV光などの電子線を照射
することで、分解反応が起こり、低分子化が進み、電子
線が照射した部分のみ、溶媒可溶性となる。
As the upper resin layer 309, for example, a liquid obtained by dissolving polymethylisopropenyl ketone (PMIPK) in a cyclohexanone solvent was used. The binary copolymer (P (MMA-MAA)) used as the lower resin layer is heated at 180 to 200 ° C. for 30 minutes to 2 hours in the dehydration condensation reaction, so that the dehydration condensation reaction causes stronger crosslinking. A film can be formed. Although this crosslinked film is of a solvent insoluble type, when it is irradiated with an electron beam such as DUV light, a decomposition reaction occurs, the molecular weight is reduced, and only the portion irradiated with the electron beam becomes soluble in the solvent. Become.

【0029】その後、図13(a)に示すように、DU
V光を照射する露光装置を用いて、この露光装置に波長
260nm未満のDUV光を遮断するフィルターを装着
することで、260nm以上のみを透過させる波長選択
手段を用いて、波長が260〜330nm付近のNea
r−UV光(以下、NUV光と称する。)を照射させ
て、上樹脂層309を露光および現像することによっ
て、上樹脂層309により所望のノズルパターン30
9’を形成する。上樹脂層309によりノズルパターン
309’を形成する際、上樹脂層309と下樹脂層30
8とは、波長260〜330nm付近のNUV光に対す
る感度比が約40:1以上の差であるため、下樹脂層3
08が感光されることなく、下樹脂層309:P(MM
A−MAA)が分解されることはない。又、下樹脂層3
08は、熱架橋膜であるために、上樹脂層を現像時の現
像液に溶解することもない。
After that, as shown in FIG.
By using an exposure device that irradiates V light and mounting a filter that blocks DUV light having a wavelength of less than 260 nm on the exposure device, a wavelength selection means that transmits only 260 nm or more is used, and a wavelength of around 260 to 330 nm is used. Nea
By irradiating r-UV light (hereinafter referred to as NUV light) to expose and develop the upper resin layer 309, the desired nozzle pattern 30 is formed by the upper resin layer 309.
To form 9 '. When forming the nozzle pattern 309 ′ by the upper resin layer 309, the upper resin layer 309 and the lower resin layer 30
8 has a sensitivity ratio of about 40: 1 or more with respect to NUV light having a wavelength of about 260 to 330 nm, and therefore the lower resin layer 3
08 is not exposed to light, and the lower resin layer 309: P (MM
A-MAA) is not decomposed. Also, the lower resin layer 3
Since 08 is a thermally crosslinked film, the upper resin layer is not dissolved in the developing solution at the time of development.

【0030】その後、図13(b)に示すように、上述
した露光装置で波長210〜330nmのDUV光を照
射させて、下樹脂層を露光および現像することによっ
て、下樹脂層308により所望のノズルパターン30
8’を形成する。下樹脂層308に使用したP(MMA
−MAA)材料は、解像力が高く、5〜20μm程度の
厚さでも、側壁の傾斜角は、0〜5°程度のトレンチ構
造に形成することが可能である。その後、ノズルパター
ン308’,309’が形成されて、DUV光によっ
て、分子中の架橋結合が破壊されて溶解可能な上樹脂層
309および下樹脂層308上に、図13(c)に示す
ように、オリフィス基板となる透明な被覆樹脂層312
を塗布する。
After that, as shown in FIG. 13B, the lower resin layer 308 is exposed and developed by irradiating the above-mentioned exposure device with DUV light having a wavelength of 210 to 330 nm, so that the lower resin layer 308 has a desired shape. Nozzle pattern 30
Forming 8 '. P (MMA used for lower resin layer 308
The -MAA) material has a high resolving power, and even if the material has a thickness of about 5 to 20 m, it is possible to form a trench structure having a sidewall inclination angle of about 0 to 5 °. After that, nozzle patterns 308 ′ and 309 ′ are formed, and the DUV light destroys the cross-linking bond in the molecule to dissolve the upper resin layer 309 and the lower resin layer 308, as shown in FIG. 13 (c). And a transparent coating resin layer 312 that becomes an orifice substrate.
Apply.

【0031】その後、図13(d)に示すように、この
被覆樹脂層312に、露光装置でUV光を照射させて、
吐出口307に相当する部分を露光および現像して除去
することにより、オリフィス基板を形成する。該オリフ
ィス基板に形成する吐出口部の側壁の傾斜は、液滴を前
記素子基板の主面に直交する平面に対し、なるべく0°
付近で形成することが望ましい。又、0〜10°程度で
あれば、液滴の吐出特性について、大きな問題は発生し
ない。
Thereafter, as shown in FIG. 13D, the coating resin layer 312 is irradiated with UV light by an exposure device,
The orifice substrate is formed by exposing, developing, and removing the portion corresponding to the ejection port 307. The side wall of the discharge port formed on the orifice substrate has an inclination of 0 ° with respect to a plane orthogonal to the main surface of the element substrate.
It is desirable to form it in the vicinity. Further, when it is about 0 to 10 °, no major problem occurs in the droplet ejection characteristics.

【0032】その後、図14(a)に示すように、化学
エッチングを行う際のオリフィスプレート面側を保護す
るために、有機系樹脂膜314を塗布する。そして、図
14(b)に示すように、素子基板301の裏面に化学
的なエッチング処理等を行うことによって、素子基板3
01に供給口305を形成する。化学的なエッチング処
理としては、例えば、強アルカリ溶液(KOH,NaO
H,TMAH)を用いた異方性エッチング処理が適用さ
れる。
Thereafter, as shown in FIG. 14A, an organic resin film 314 is applied to protect the orifice plate surface side during chemical etching. Then, as shown in FIG. 14B, a chemical etching process or the like is performed on the back surface of the element substrate 301 to remove the element substrate 3
The supply port 305 is formed at 01. Examples of the chemical etching treatment include a strong alkaline solution (KOH, NaO).
H, TMAH) is applied.

【0033】その後、図14(c)に示すように、波長
330nm以下のDUV光を素子基板301の主面側か
ら被覆樹脂層312を透過させて照射することにより、
素子基板301とオリフィス基板312との間に位置す
るノズル型材である上樹脂層309,下樹脂層308を
それぞれ溶出させる。
Thereafter, as shown in FIG. 14C, DUV light having a wavelength of 330 nm or less is irradiated from the main surface side of the element substrate 301 through the coating resin layer 312 to irradiate it.
The upper resin layer 309 and the lower resin layer 308, which are nozzle mold materials, located between the element substrate 301 and the orifice substrate 312 are eluted.

【0034】したがって、吐出口307および供給口3
05と、これらを連通する供給路(ノズル流路)306
内の、ヒータ303と供給口305との間に可動部材3
10が形成され、該可動部材310と供給口305との
間に該可動部材の供給口側への変位を制限する突起状障
壁が形成されたノズル流路306を備えるチップが得ら
れる。このチップと、ヒータ303を駆動するための配
線基板(図示せず)等とを電気的に接続することによ
り、記録ヘッドが得られる。
Therefore, the discharge port 307 and the supply port 3
05 and a supply path (nozzle flow path) 306 that connects them to each other
The movable member 3 between the heater 303 and the supply port 305
10 is formed, and a chip including a nozzle channel 306 in which a protruding barrier that limits the displacement of the movable member toward the supply port is formed between the movable member 310 and the supply port 305 is obtained. A recording head can be obtained by electrically connecting this chip and a wiring substrate (not shown) for driving the heater 303.

【0035】なお、上述した記録ヘッドの製造方法によ
れば、DUV光によって分子中の架橋結合が破壊されて
溶解可能な上樹脂層309および下樹脂層308を、素
子基板の厚み方向に対して更に階層構造にすることによ
って、ノズル内に3段以上の段差状に形成された制御部
を設けることが可能とされる。例えば、上樹脂層の更に
上層側に、波長400nm以上の光に感度を有する樹脂
材料を用いて、多段階のノズル構造を形成することがで
きる。
According to the above-described method of manufacturing the recording head, the upper resin layer 309 and the lower resin layer 308, which can be dissolved by breaking the crosslinking bond in the molecule by the DUV light, are formed in the thickness direction of the element substrate. Further, by adopting a hierarchical structure, it is possible to provide a control unit formed in a stepped shape with three or more steps in the nozzle. For example, a multi-stage nozzle structure can be formed on the upper layer side of the upper resin layer by using a resin material sensitive to light having a wavelength of 400 nm or more.

【0036】[実施例4]以下に本発明に係るインクジ
ェットプリントヘッドの製造方法の別の一例を図15〜
図17に従って、詳細に示す。まず、図15(a)に示
すように、Siチップ上にパターニング等によって複数
の電気熱変換素子(ヒータ)403およびそれらを駆動
するための必要な配線(不図示)が施された基板401
を用意する。
[Embodiment 4] Another example of a method for manufacturing an ink jet print head according to the present invention will be described below with reference to FIGS.
Details will be described with reference to FIG. First, as shown in FIG. 15A, a substrate 401 on which a plurality of electrothermal conversion elements (heaters) 403 and necessary wirings (not shown) for driving them are provided on a Si chip by patterning or the like.
To prepare.

【0037】その後、図15(b),図15(c)に示
すように、Deep−UV光(300nm以下の紫外
光)によって、分子中の架橋結合が破壊され、溶解可能
な樹脂層408及び、409を連続で、スピンコート法
により、塗布する。その際、下層となる樹脂層408に
は、熱架橋型樹脂を用いることで、上層の樹脂409を
スピンコート法により、塗布する際に、下層樹脂と上層
の樹脂間で相互に溶融することを防止した。この時、下
層樹脂408としては、P(MMA−MAC=90:1
0)をシクロヘキサノン溶媒で溶解した液を使用した。
又、上層樹脂としては、PMIPKをシクロヘキサノン
溶媒で溶解した液を使用した。その後、Deep−UV
光を用いた露光装置(キヤノン製:PLA521)によ
り、CM290を装着し、290nm近傍のDeep−
UV光のみで、上層樹脂409を露光し現像すること
で、図15(d)に示すようなノズルパターン409’
を形成した。その際、下層樹脂408と上層樹脂409
とでは、290nm近傍のDeep−UV光に対する感
度比が、約50:1以上の差があるために、下層樹脂
が、感光し、パターニングされることは無い。
Then, as shown in FIGS. 15 (b) and 15 (c), the deep-UV light (ultraviolet light of 300 nm or less) destroys the cross-linking bond in the molecule and the soluble resin layer 408 and , 409 are continuously applied by spin coating. At this time, by using a heat-crosslinking resin for the lower resin layer 408, it is possible to prevent the lower resin and the upper resin from melting each other when the upper resin 409 is applied by spin coating. Prevented. At this time, as the lower layer resin 408, P (MMA-MAC = 90: 1)
A solution obtained by dissolving 0) in a cyclohexanone solvent was used.
A liquid obtained by dissolving PMIPK in a cyclohexanone solvent was used as the upper layer resin. After that, Deep-UV
A CM290 is mounted by an exposure device (PLA521 manufactured by Canon Inc.) using light, and a Deep-
By exposing and developing the upper layer resin 409 only with UV light, a nozzle pattern 409 ′ as shown in FIG.
Was formed. At that time, the lower layer resin 408 and the upper layer resin 409
In and, since the sensitivity ratio to Deep-UV light near 290 nm has a difference of about 50: 1 or more, the lower layer resin is not exposed and is not patterned.

【0038】次に、同じ露光装置で、CM250を装着
し、250nm近傍のDeep−UV光のみで、下層樹
脂を露光し現像することで、図16(a)に示すように
ノズルパターンを形成した。更に、このようなノズルパ
ターンが形成され、Deep−UV光によって、分子中
の架橋結合が破壊され、溶解可能な樹脂層408及び、
409上に、被覆樹脂層412を形成させ(図16
(b))、吐出口407に相当する部分を、UV光を用
いた露光装置(キヤノン製:MPA−600)により、
露光して現像し、除去した(図16(c))。次に、図
17(a)に示すように、化学エッチングを行う際に吐
出口面側を保護するために、有機系樹脂膜414を塗布
した。そして、図17(b)に示すように、基板401
を裏面から化学的にエッチングするなどして、供給口を
形成した。より具体的には、強アルカリ溶液(KOH,
NaOH,TMAH)を用いた異方性エッチングによっ
て供給口405を形成した。
Next, CM250 was mounted in the same exposure apparatus, and the lower layer resin was exposed and developed only with Deep-UV light near 250 nm to form a nozzle pattern as shown in FIG. 16 (a). . Further, such a nozzle pattern is formed, and the deep-UV light destroys the cross-linking bond in the molecule, and the soluble resin layer 408 and
A coating resin layer 412 is formed on 409 (see FIG.
(B)), a portion corresponding to the discharge port 407 is exposed by an exposure device using UV light (manufactured by Canon: MPA-600).
It was exposed, developed and removed (FIG. 16 (c)). Next, as shown in FIG. 17A, an organic resin film 414 was applied in order to protect the ejection port side during chemical etching. Then, as shown in FIG.
Then, the supply port was formed by chemically etching the back surface. More specifically, a strong alkaline solution (KOH,
The supply port 405 was formed by anisotropic etching using NaOH, TMAH).

【0039】最後に、基板401の表面から、前記被覆
樹脂層412を透して、Deep−UV光(300nm
以下の紫外光)を照射し、ノズルパターンである樹脂層
408’,409’を溶出させた。これにより、吐出口
407、供給口405とそれらに連通する段差形状を有
するノズル406を備え、該ノズル406内の電気熱変
換素子403と供給口405との間に可動部材410及
び可動部材の供給口側への変位を制限するための制限部
412’を備えたインクジェットヘッドチップを得るこ
とができる。このチップに電気熱変換素子を駆動するた
めの配線基板と電気的接合等を行うことにより、本発明
のインクジェット記録ヘッドを得ることができる。
Finally, from the surface of the substrate 401, the coating resin layer 412 is transmitted, and the Deep-UV light (300 nm) is transmitted.
The resin layers 408 ′ and 409 ′, which are nozzle patterns, were eluted by irradiation with the following ultraviolet light). As a result, the discharge port 407, the supply port 405, and the nozzle 406 having a step shape communicating with them are provided, and the movable member 410 and the supply of the movable member are provided between the electrothermal conversion element 403 and the supply port 405 in the nozzle 406. It is possible to obtain the inkjet head chip including the limiting portion 412 ′ for limiting the displacement toward the mouth side. The ink jet recording head of the present invention can be obtained by electrically connecting this chip to a wiring board for driving the electrothermal conversion element.

【0040】図18は、上記インクジェット記録ヘッド
のノズル部分の平面図を示している(図17(c)は図
18のA−A’線における断面図に対応する。)。前記
可動部材410は、ヒータ面上で気泡が発生した時に、
該可動部材410から吐出口までの部分を略密閉状態に
するために、該可動部材410が、気泡発生時にインク
供給口405側へ変位することを制限できるストッパー
(障壁)がノズル流路406の側壁の一部412’を突
出させることによって形成されている。この障壁は、リ
フィルの際に供給口から吐出口側へのインクの流れをな
るべく妨げないように、寸法的に小さなものが好まし
い。更に、可動部材とノズル壁との間にも、フォトリソ
グラフィープロセス法により作成できる微小な隙間を有
している。この隙間は、可動部材が変位するのに、可能
な量であれば、なるべく微小であることが望ましい。
FIG. 18 is a plan view of the nozzle portion of the ink jet recording head (FIG. 17 (c) corresponds to the sectional view taken along the line AA 'in FIG. 18). The movable member 410, when bubbles are generated on the heater surface,
In order to make the portion from the movable member 410 to the ejection port a substantially sealed state, a stopper (barrier) that can restrict the displacement of the movable member 410 to the ink supply port 405 side when bubbles are generated is the nozzle flow path 406. It is formed by protruding a part 412 'of the side wall. This barrier is preferably small in dimension so as not to disturb the flow of ink from the supply port to the ejection port side as much as possible during refilling. Further, there is a minute gap between the movable member and the nozzle wall that can be created by the photolithography process method. It is desirable that this gap be as small as possible if it is possible to displace the movable member.

【0041】また、図19に示すインクジェット記録ヘ
ッドのように、本実施例のように、可動部材510とイ
ンク供給口505との間の、ノズル流路506の側壁の
一部512’を突出させるばかりでなく、実施例3のよ
うに基板上に突起型障壁513’を形成すれば、気泡の
成長時により効果的に可動部材510によってインク供
給口505側へのインクの流れをより抑制することがで
き、さらに吐出性能を高めることができる。
Further, like the ink jet recording head shown in FIG. 19, as in the present embodiment, a part 512 ′ of the side wall of the nozzle channel 506 between the movable member 510 and the ink supply port 505 is projected. Not only that, when the protrusion-type barrier 513 ′ is formed on the substrate as in the third embodiment, the flow of the ink to the ink supply port 505 side can be more effectively suppressed by the movable member 510 when the bubbles grow. The discharge performance can be further improved.

【0042】上記のように作成された本発明のインクジ
ェット記録ヘッド(液体吐出ヘッド)の動作について、
図20を参照して、簡単に説明する。まず、図20
(a)で示すように、初期状態では、吐出口607の下
方にヒータ403が配され、ヒータから吐出口への吐出
口流路と、ヒータからインク供給口に繋がるノズル60
6とは、L字型になっている。ノズル内には、可動部材
が、ヒータを備えた基板のノズル側の面に対して垂直方
向に配されている。そして、図20(b)で示すよう
に、ヒータ部で気泡615が発生すると同時に、発生す
る圧力波、および、インクの流れに伴って、可動部材6
10が、インク供給口605側に少し傾いて、可動部
材、HB(基板)上に形成した突起型障壁613’、お
よび、該可動部材後方に形成されているストッパー形状
の構造物612’によって、吐出口から該可動部材まで
のノズル内部を略密閉状態に維持する。
Regarding the operation of the ink jet recording head (liquid ejection head) of the present invention produced as described above,
A brief description will be given with reference to FIG. First, FIG.
As shown in (a), in the initial state, the heater 403 is arranged below the ejection port 607, and the ejection port flow path from the heater to the ejection port and the nozzle 60 connected from the heater to the ink supply port.
6 is L-shaped. A movable member is arranged in the nozzle in a direction perpendicular to the nozzle-side surface of the substrate having the heater. Then, as shown in FIG. 20B, when the bubble 615 is generated in the heater portion, the movable member 6 is generated at the same time as the generated pressure wave and the flow of ink.
10 is slightly inclined toward the ink supply port 605, and by the movable member, the protrusion-type barrier 613 ′ formed on the HB (substrate), and the stopper-shaped structure 612 ′ formed behind the movable member, The inside of the nozzle from the discharge port to the movable member is maintained in a substantially sealed state.

【0043】これにより、ヒータ面上の圧力が殆ど吐出
口側へ集中し、吐出するインク滴616を効率良く飛翔
させることができる。尚、可動部材と突起型障壁61
3’との間には、微小の隙間が存在するが、前述の略密
閉状態になるためには、可能な限り微小であることが望
ましい。又、可動部材610とノズル606の側壁との
間にも、微小な隙間が存在する。
As a result, the pressure on the heater surface is mostly concentrated on the ejection port side, and the ejected ink droplet 616 can be efficiently ejected. The movable member and the protrusion-type barrier 61
Although there is a minute gap between 3'and 3 ', it is desirable that the gap be as small as possible in order to achieve the above-mentioned substantially sealed state. Also, a minute gap exists between the movable member 610 and the side wall of the nozzle 606.

【0044】次に、図21(a)で示すように、ノズル
内が、可動部材610と突起型障壁613’とストッパ
ー形状の構造物612’によって、略密閉状態になって
いるので、気泡の成長は、殆ど吐出口側に大きく成長
し、より安定的に、且つ、より効率良くインク滴616
を吐出口から飛翔させることができる。そして、図21
(b)で示すように、ヒータ面上で、気泡が消泡し始め
ると、前記可動部材610が、吐出口607側に変位し
始める。続いて、可動部材610が吐出口側に大きく変
位する。この際、可動部材が吐出口側へ変位する量は、
気泡成長時に可動部材がインク供給口側へ変位する量よ
りも大きい。
Next, as shown in FIG. 21 (a), since the inside of the nozzle is substantially sealed by the movable member 610, the protruding barrier 613 'and the stopper-shaped structure 612', air bubbles are not generated. Most of the growth is large on the ejection port side, and the ink droplets 616 are more stable and more efficient.
Can be ejected from the ejection port. And FIG.
As shown in (b), when bubbles start to disappear on the heater surface, the movable member 610 starts to be displaced toward the ejection port 607. Then, the movable member 610 is largely displaced toward the ejection port. At this time, the amount of displacement of the movable member toward the discharge port is
It is larger than the amount of displacement of the movable member to the ink supply port side during bubble growth.

【0045】これにより、インク供給口605から複数
のインクノズル内へ高速リフィルが行われる。尚、気泡
発生時のインク供給口605側へのインクの流れが、前
記可動部材610、HB(基板)601上に形成した突
起型障壁613’および、該可動部材後方に形成されて
いるストッパー形状の構造物612’によって、阻害さ
れているので、ノズル606内にリフィルされるインク
量を、飛翔したインク体積に近い最低限のインク量とす
ることができる。
As a result, high-speed refill is performed from the ink supply port 605 into the plurality of ink nozzles. The flow of ink to the ink supply port 605 side when bubbles are generated is such that the movable member 610, the protruding barrier 613 'formed on the HB (substrate) 601 and the stopper shape formed behind the movable member. Since it is hindered by the structure 612 ′, the amount of ink refilled in the nozzle 606 can be set to the minimum amount of ink close to the ejected ink volume.

【0046】[0046]

【発明の効果】本発明によれば、インク供給口と吐出口
の間におけるノズル流路に可動部材を形成し、吐出性能
を維持し周波数特性を向上することを可能とした高密
度、高精度、高信頼性のインクジェット記録ヘッドの作
成方法及びインクジェット記録ヘッドを実現することが
できる。
According to the present invention, a movable member is formed in a nozzle flow path between an ink supply port and an ejection port to maintain ejection performance and improve frequency characteristics. It is possible to realize a highly reliable inkjet recording head manufacturing method and an inkjet recording head.

【図面の簡単な説明】[Brief description of drawings]

【図1】図1(a)は、本発明の実施例1におけるイン
クジェット記録ヘッドの作成方法を説明するための模式
的な断面図である。図1(b)は図1(a)のA−A’
線における断面図である。図1(c)は、本発明の実施
例1におけるインクジェット記録ヘッドの作成方法の図
1(a)の工程に続く工程を説明するための模式的な断
面図である。図1(d)は図1(c)のA−A’線にお
ける断面図である。
FIG. 1A is a schematic cross-sectional view for explaining a method of manufacturing an inkjet recording head according to a first embodiment of the present invention. FIG. 1B is AA ′ of FIG.
It is sectional drawing in a line. FIG. 1C is a schematic cross-sectional view for explaining a step that follows the step of FIG. 1A of the method for manufacturing an inkjet recording head according to the first embodiment of the present invention. FIG. 1D is a sectional view taken along the line AA ′ of FIG.

【図2】図2(a)は、本発明の実施例1におけるイン
クジェット記録ヘッドの作成方法の図1(c)の工程に
続く工程を説明するための模式的な断面図である。図2
(b)は図2(a)のA−A’線における断面図であ
る。図2(c)は、本発明の実施例1におけるインクジ
ェット記録ヘッドの作成方法の図2(a)の工程に続く
工程を説明するための模式的な断面図である。図2
(d)は図2(c)のA−A’線における断面図であ
る。
FIG. 2A is a schematic cross-sectional view for explaining a step that follows the step of FIG. 1C of the method for manufacturing the inkjet recording head according to the first embodiment of the present invention. Figure 2
2B is a sectional view taken along the line AA ′ of FIG. FIG. 2C is a schematic cross-sectional view for explaining a step that follows the step of FIG. 2A of the method for manufacturing the inkjet recording head according to the first embodiment of the present invention. Figure 2
2D is a cross-sectional view taken along the line AA ′ of FIG.

【図3】図3(a)は、本発明の実施例1におけるイン
クジェット記録ヘッドの作成方法の図2(c)の工程に
続く工程を説明するための模式的な断面図である。図3
(b)は図3(a)のA−A’線における断面図であ
る。図3(c)は、本発明の実施例1におけるインクジ
ェット記録ヘッドの作成方法の図3(a)の工程に続く
工程を説明するための模式的な断面図である。図3
(d)は図3(c)のA−A’線における断面図であ
る。
FIG. 3A is a schematic cross-sectional view for explaining a step that follows the step of FIG. 2C of the method for manufacturing an inkjet recording head according to the first embodiment of the present invention. Figure 3
3B is a sectional view taken along the line AA ′ of FIG. FIG. 3C is a schematic cross-sectional view for explaining a step that follows the step of FIG. 3A of the method for manufacturing the inkjet recording head according to the first embodiment of the present invention. Figure 3
3D is a sectional view taken along the line AA ′ of FIG.

【図4】図4(a)は、本発明の実施例1におけるイン
クジェット記録ヘッドの作成方法の図3(c)の工程に
続く工程を説明するための模式的な断面図である。図4
(b)は図4(a)のA−A’線における断面図であ
る。図4(c)は、本発明の実施例1におけるインクジ
ェット記録ヘッドの作成方法の図4(a)の工程に続く
工程を説明するための模式的な断面図である。図4
(d)は図4(c)のA−A’線における断面図であ
る。
FIG. 4A is a schematic cross-sectional view for explaining a step that follows the step of FIG. 3C of the method for manufacturing the inkjet recording head in the first embodiment of the present invention. Figure 4
4B is a sectional view taken along the line AA ′ of FIG. FIG. 4C is a schematic cross-sectional view for explaining a step that follows the step of FIG. 4A of the method for manufacturing the inkjet recording head in the first embodiment of the present invention. Figure 4
4D is a sectional view taken along the line AA ′ of FIG.

【図5】図5(a)は、本発明の実施例1におけるイン
クジェット記録ヘッドの作成方法の図4(c)の工程に
続く工程を説明するための模式的な断面図である。図5
(b)は図5(a)のA−A’線における断面図であ
る。
FIG. 5A is a schematic cross-sectional view for explaining a step that follows the step of FIG. 4C of the method for manufacturing the inkjet recording head in the first embodiment of the present invention. Figure 5
5B is a sectional view taken along the line AA ′ of FIG.

【図6】図6(a)は、本発明の実施例2におけるイン
クジェット記録ヘッドの作成方法を説明するための模式
的な断面図である。図6(b)は図6(a)のA−A’
線における断面図である。図6(c)は、本発明の実施
例2におけるインクジェット記録ヘッドの作成方法の図
6(a)の工程に続く工程を説明するための模式的な断
面図である。図6(d)は図6(c)のA−A’線にお
ける断面図である。
FIG. 6A is a schematic cross-sectional view for explaining a method for manufacturing an inkjet recording head according to a second embodiment of the present invention. FIG. 6B shows AA ′ of FIG.
It is sectional drawing in a line. FIG. 6C is a schematic cross-sectional view for explaining a step that follows the step of FIG. 6A of the method for manufacturing the inkjet recording head in the second embodiment of the present invention. FIG. 6D is a sectional view taken along the line AA ′ of FIG.

【図7】図7(a)は、本発明の実施例2におけるイン
クジェット記録ヘッドの作成方法の図6(c)の工程に
続く工程を説明するための模式的な断面図である。図7
(b)は図7(a)のA−A’線における断面図であ
る。図7(c)は、本発明の実施例1におけるインクジ
ェット記録ヘッドの作成方法の図7(a)の工程に続く
工程を説明するための模式的な断面図である。図7
(d)は図7(c)のA−A’線における断面図であ
る。
FIG. 7A is a schematic cross-sectional view for explaining a step that follows the step of FIG. 6C of the method for manufacturing the inkjet recording head in the second embodiment of the present invention. Figure 7
7B is a sectional view taken along the line AA ′ of FIG. FIG. 7C is a schematic cross-sectional view for explaining a step that follows the step of FIG. 7A of the method for manufacturing the inkjet recording head in the first embodiment of the present invention. Figure 7
7D is a sectional view taken along the line AA ′ of FIG.

【図8】図8(a)は、本発明の実施例2におけるイン
クジェット記録ヘッドの作成方法の図7(c)の工程に
続く工程を説明するための模式的な断面図である。図8
(b)は図8(a)のA−A’線における断面図であ
る。図8(c)は、本発明の実施例1におけるインクジ
ェット記録ヘッドの作成方法の図8(a)の工程に続く
工程を説明するための模式的な断面図である。図8
(d)は図8(c)のA−A’線における断面図であ
る。
FIG. 8A is a schematic cross-sectional view for explaining a step that follows the step of FIG. 7C of the method for manufacturing the inkjet recording head in the second embodiment of the present invention. Figure 8
8B is a sectional view taken along the line AA ′ of FIG. FIG. 8C is a schematic cross-sectional view for explaining a step that follows the step of FIG. 8A of the method for manufacturing the inkjet recording head in the first embodiment of the present invention. Figure 8
8D is a sectional view taken along the line AA ′ of FIG.

【図9】図9(a)は、本発明の実施例2におけるイン
クジェット記録ヘッドの作成方法の図8(c)の工程に
続く工程を説明するための模式的な断面図である。図9
(b)は図9(a)のA−A’線における断面図であ
る。
FIG. 9A is a schematic cross-sectional view for explaining a step that follows the step of FIG. 8C of the method for manufacturing the inkjet recording head in the second embodiment of the present invention. Figure 9
9B is a sectional view taken along the line AA ′ of FIG.

【図10】本発明の実施例2における図7(a)の工程
において用いるマスクパターンを示す平面図である。
FIG. 10 is a plan view showing a mask pattern used in the step of FIG. 7A in the second embodiment of the present invention.

【図11】本発明の実施例2の変形例を示すインクジェ
ット記録ヘッドの平面図である。
FIG. 11 is a plan view of an ink jet recording head showing a modified example of the second embodiment of the present invention.

【図12】図12(a)は、本発明の実施例3における
インクジェット記録ヘッドの作成方法を説明するための
模式的な断面図である。図12(b)は、本発明の実施
例3におけるインクジェット記録ヘッドの作成方法の図
12(a)の工程に続く工程を説明するための模式的な
断面図である。図12(c)は、本発明の実施例3にお
けるインクジェット記録ヘッドの作成方法の図12
(b)の工程に続く工程を説明するための模式的な断面
図である。図12(d)は、本発明の実施例3における
インクジェット記録ヘッドの作成方法の図12(c)の
工程に続く工程を説明するための模式的な断面図であ
る。図12(e)は、本発明の実施例3におけるインク
ジェット記録ヘッドの作成方法の図12(d)の工程に
続く工程を説明するための模式的な断面図である。
FIG. 12A is a schematic cross-sectional view for explaining a method for manufacturing an inkjet recording head according to a third embodiment of the present invention. FIG. 12B is a schematic cross-sectional view for explaining a step that follows the step of FIG. 12A of the method for manufacturing the inkjet recording head in the third embodiment of the present invention. FIG. 12C is a diagram illustrating a method of manufacturing an ink jet recording head according to the third embodiment of the present invention.
It is a typical sectional view for explaining the process following the process of (b). FIG. 12D is a schematic cross-sectional view for explaining a step that follows the step of FIG. 12C of the method for manufacturing the inkjet recording head in the third embodiment of the present invention. FIG. 12E is a schematic cross-sectional view for explaining a step that follows the step of FIG. 12D of the method for manufacturing the inkjet recording head in the third embodiment of the present invention.

【図13】図13(a)は、本発明の実施例3における
インクジェット記録ヘッドの作成方法の図12(e)の
工程に続く工程を説明するための模式的な断面図であ
る。図13(b)は、本発明の実施例3におけるインク
ジェット記録ヘッドの作成方法の図13(a)の工程に
続く工程を説明するための模式的な断面図である。図1
3(c)は、本発明の実施例3におけるインクジェット
記録ヘッドの作成方法の図13(b)の工程に続く工程
を説明するための模式的な断面図である。図13(d)
は、本発明の実施例3におけるインクジェット記録ヘッ
ドの作成方法の図13(c)の工程に続く工程を説明す
るための模式的な断面図である。
FIG. 13A is a schematic cross-sectional view for explaining a step that follows the step of FIG. 12E of the method for manufacturing the inkjet recording head in the third embodiment of the present invention. FIG. 13B is a schematic cross-sectional view for explaining a step that follows the step of FIG. 13A of the method for manufacturing the inkjet recording head in the third embodiment of the present invention. Figure 1
3C is a schematic cross-sectional view for explaining a step that follows the step of FIG. 13B of the method for manufacturing the inkjet recording head in the third embodiment of the present invention. FIG. 13 (d)
FIG. 13A is a schematic cross-sectional view for explaining a step that follows the step of FIG. 13C of the method for manufacturing an inkjet recording head in Example 3 of the present invention.

【図14】図14(a)は、本発明の実施例3における
インクジェット記録ヘッドの作成方法の図13(d)の
工程に続く工程を説明するための模式的な断面図であ
る。図14(b)は、本発明の実施例3におけるインク
ジェット記録ヘッドの作成方法の図14(a)の工程に
続く工程を説明するための模式的な断面図である。図1
4(c)は、本発明の実施例3におけるインクジェット
記録ヘッドの作成方法の図14(b)の工程に続く工程
を説明するための模式的な断面図である。
FIG. 14A is a schematic cross-sectional view for explaining a step that follows the step of FIG. 13D of the method for manufacturing an inkjet recording head according to the third embodiment of the present invention. FIG. 14B is a schematic cross-sectional view for explaining a step that follows the step of FIG. 14A of the method for manufacturing the inkjet recording head in the third embodiment of the present invention. Figure 1
4C is a schematic cross-sectional view for explaining a step that follows the step of FIG. 14B of the method for manufacturing the inkjet recording head in the third embodiment of the present invention.

【図15】図15(a)は、本発明の実施例4における
インクジェット記録ヘッドの作成方法を説明するための
模式的な断面図である。図15(b)は、本発明の実施
例3におけるインクジェット記録ヘッドの作成方法の図
15(a)の工程に続く工程を説明するための模式的な
断面図である。図15(c)は、本発明の実施例3にお
けるインクジェット記録ヘッドの作成方法の図15
(b)の工程に続く工程を説明するための模式的な断面
図である。図15(d)は、本発明の実施例3における
インクジェット記録ヘッドの作成方法の図15(c)の
工程に続く工程を説明するための模式的な断面図であ
る。
FIG. 15A is a schematic cross-sectional view for explaining a method for manufacturing an inkjet recording head according to a fourth embodiment of the present invention. FIG. 15B is a schematic cross-sectional view for explaining a step that follows the step of FIG. 15A of the method for manufacturing the inkjet recording head in the third embodiment of the present invention. FIG. 15C shows a method of manufacturing an inkjet recording head according to the third embodiment of the present invention.
It is a typical sectional view for explaining the process following the process of (b). FIG. 15D is a schematic cross-sectional view for explaining a step that follows the step of FIG. 15C of the method for manufacturing the inkjet recording head in the third embodiment of the present invention.

【図16】図16(a)は、本発明の実施例4における
インクジェット記録ヘッドの作成方法の図15(d)の
工程に続く工程を説明するための模式的な断面図であ
る。図16(b)は、本発明の実施例3におけるインク
ジェット記録ヘッドの作成方法の図16(a)の工程に
続く工程を説明するための模式的な断面図である。図1
6(c)は、本発明の実施例3におけるインクジェット
記録ヘッドの作成方法の図16(b)の工程に続く工程
を説明するための模式的な断面図である。
FIG. 16A is a schematic cross-sectional view for explaining a step that follows the step of FIG. 15D of the method for manufacturing the inkjet recording head in the fourth embodiment of the present invention. FIG. 16B is a schematic cross-sectional view for explaining a step that follows the step of FIG. 16A of the method for manufacturing the inkjet recording head according to the third embodiment of the present invention. Figure 1
6C is a schematic cross-sectional view for explaining a step that follows the step of FIG. 16B of the method for manufacturing the inkjet recording head in the third embodiment of the present invention.

【図17】図17(a)は、本発明の実施例4における
インクジェット記録ヘッドの作成方法の図16(c)の
工程に続く工程を説明するための模式的な断面図であ
る。図17(b)は、本発明の実施例3におけるインク
ジェット記録ヘッドの作成方法の図17(a)の工程に
続く工程を説明するための模式的な断面図である。図1
7(c)は、本発明の実施例3におけるインクジェット
記録ヘッドの作成方法の図17(b)の工程に続く工程
を説明するための模式的な断面図である。
FIG. 17A is a schematic cross-sectional view for explaining a step that follows the step of FIG. 16C of the method for manufacturing the inkjet recording head according to the fourth embodiment of the present invention. FIG. 17B is a schematic cross-sectional view for explaining a step that follows the step of FIG. 17A of the method for manufacturing the inkjet recording head in the third embodiment of the present invention. Figure 1
7C is a schematic cross-sectional view for explaining a step that follows the step of FIG. 17B of the method for manufacturing the inkjet recording head in the third embodiment of the present invention.

【図18】図18は、本発明の実施例4におけるインク
ジェット記録ヘッドのノズル部分を示す平面図である。
FIG. 18 is a plan view showing a nozzle portion of an inkjet recording head according to a fourth embodiment of the present invention.

【図19】図19(a)は、本発明の実施例4の変形例
におけるインクジェット記録ヘッドの模式的な断面図で
ある。図19(b)は、本発明の実施例4の変形例によ
って得られたヘッドチップの模式的な断面図である。
FIG. 19A is a schematic cross-sectional view of an inkjet recording head according to a modified example of the fourth embodiment of the present invention. FIG. 19B is a schematic sectional view of a head chip obtained by a modification of the fourth embodiment of the present invention.

【図20】図20は、本発明のインクジェット記録ヘッ
ドを用いてインク滴を吐出する吐出動作を説明するため
の模式的な断面図である。
FIG. 20 is a schematic cross-sectional view for explaining an ejection operation for ejecting ink droplets using the inkjet recording head of the present invention.

【図21】図21は、図20に引き続き、本発明のイン
クジェット記録ヘッドを用いてインク滴を吐出する吐出
動作を説明するための模式的な断面図である。
FIG. 21 is a schematic cross-sectional view for explaining the ejection operation for ejecting ink droplets using the inkjet recording head of the present invention, following FIG. 20.

【図22】図22は、本発明のインクジェット記録ヘッ
ドを示す模式的な斜視図である。
FIG. 22 is a schematic perspective view showing an inkjet recording head of the present invention.

【符号の説明】[Explanation of symbols]

1:基板 3:発熱抵抗体 5:インク供給口 7:吐出口 12:インク流路を構成する部材 101:基板 102:蓄熱層 103:ヒータ(発熱抵抗部) 104:保護層 105:インク供給口 106:ノズル 107:吐出口 108:第一の型レジスト 109:第二の型レジスト 110:弁 111:型レジストによる弁形状形成部 112:感光性エポキシ材 201:基板 202:蓄熱層 203:ヒータ(発熱抵抗部) 204:保護層 205:インク供給口 206:ノズル 207:吐出口 208:フォトレジスト 210:可動部材 301:素子基板 303:ヒータ 305:供給口 306:供給路 307:吐出口 308:下樹脂層 308’:ノズルパターン 309:上樹脂層 309’:ノズルパターン 310:可動部材 312:オリフィス基板 313:ネガ型樹脂層 313’:突起状障壁 401:基板 403:電気熱変換素子(ヒータ) 405:供給口 406:ノズル 408:下樹脂層 409:上樹脂層 410:可動部材 505:インク供給口 506:ノズル流路 605:インク供給口 606:ノズル 610:可動部材 612’:ストッパー形状の構造物 613’:突起型障壁 615:気泡 1: substrate 3: Heating resistor 5: Ink supply port 7: Discharge port 12: member forming ink flow path 101: substrate 102: heat storage layer 103: Heater (heat generating resistance part) 104: protective layer 105: Ink supply port 106: nozzle 107: discharge port 108: First type resist 109: Second type resist 110: valve 111: Valve shape forming part by mold resist 112: Photosensitive epoxy material 201: substrate 202: heat storage layer 203: Heater (heat generating resistance part) 204: protective layer 205: Ink supply port 206: Nozzle 207: Discharge port 208: Photoresist 210: movable member 301: Element substrate 303: Heater 305: Supply port 306: Supply path 307: Discharge port 308: Lower resin layer 308 ': Nozzle pattern 309: Upper resin layer 309 ': Nozzle pattern 310: movable member 312: Orifice substrate 313: Negative resin layer 313 ': protruding barrier 401: substrate 403: Electrothermal conversion element (heater) 405: Supply port 406: Nozzle 408: Lower resin layer 409: Upper resin layer 410: movable member 505: Ink supply port 506: Nozzle flow path 605: Ink supply port 606: Nozzle 610: movable member 612 ': stopper-shaped structure 613 ': Protrusion-type barrier 615: bubbles

───────────────────────────────────────────────────── フロントページの続き (72)発明者 杉山 裕之 東京都大田区下丸子3丁目30番2号 キヤ ノン株式会社内 (72)発明者 井上 良二 東京都大田区下丸子3丁目30番2号 キヤ ノン株式会社内 (72)発明者 三隅 義範 東京都大田区下丸子3丁目30番2号 キヤ ノン株式会社内 (72)発明者 宮川 昌士 東京都大田区下丸子3丁目30番2号 キヤ ノン株式会社内 Fターム(参考) 2C057 AF37 AF93 AG30 AP32 AP34 AP47 AP57 AQ02 BA04 BA13   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Hiroyuki Sugiyama             3-30-2 Shimomaruko, Ota-ku, Tokyo             Non non corporation (72) Inventor Ryoji Inoue             3-30-2 Shimomaruko, Ota-ku, Tokyo             Non non corporation (72) Inventor Yoshinori Misumi             3-30-2 Shimomaruko, Ota-ku, Tokyo             Non non corporation (72) Inventor Masakawa Miyakawa             3-30-2 Shimomaruko, Ota-ku, Tokyo             Non non corporation F-term (reference) 2C057 AF37 AF93 AG30 AP32 AP34                       AP47 AP57 AQ02 BA04 BA13

Claims (12)

【特許請求の範囲】[Claims] 【請求項1】発熱抵抗体と、該発熱抵抗体に対応して設
けられたインク吐出口と、該インク吐出口に連通するノ
ズル流路と、を有し、該ノズル流路内の、前記発熱抵抗
体と、前記ノズル流路内にインクを供給するためのイン
ク供給口と、の間に可動部材が形成されており、前記発
熱抵抗体の発熱によりノズル流路内のインク中に発生さ
せた気泡を利用して前記インク吐出口からインクを吐出
するインクジェット記録ヘッドの作成方法において、 前記発熱抵抗体を備えた基板を準備する工程と、 該基板上に、前記ノズル流路及び前記可動部材を形成す
るための第1の型材となる第1の樹脂を塗布する工程
と、 該第1の樹脂により前記第1の型材を形成する工程と、
前記第1の型材を覆うように、前記基板上に前記ノズル
流路及び前記可動部材を形成するための第2の樹脂を塗
布する工程と、 前記第1の型材を除去する工程と、を有することを特徴
とするインクジェット記録ヘッドの作成方法。
1. A heating resistor, an ink discharge port provided corresponding to the heating resistor, and a nozzle flow path communicating with the ink discharge port, wherein the nozzle flow path includes: A movable member is formed between the heat generating resistor and an ink supply port for supplying ink into the nozzle channel, and is generated in the ink in the nozzle channel by the heat generated by the heat generating resistor. In a method for producing an ink jet recording head that ejects ink from the ink ejection port by using bubbles, a step of preparing a substrate provided with the heating resistor, the nozzle flow path and the movable member on the substrate. A step of applying a first resin which is a first mold material for forming the first mold material, and a step of forming the first mold material with the first resin,
A step of applying a second resin for forming the nozzle flow path and the movable member on the substrate so as to cover the first mold material; and a step of removing the first mold material. A method for producing an ink jet recording head, which is characterized by the above.
【請求項2】前記第1の樹脂はフォトレジストであっ
て、前記第1の型材を形成する工程では、前記フォトレ
ジストの解像度限界以下の幅を有するマスクパターンを
用いて前記第1の型材の、前記可動部材を形成するため
の部分を形成する工程を含むことを特徴とする請求項1
に記載のインクジェット記録ヘッドの作成方法。
2. The first resin is a photoresist, and in the step of forming the first mold material, a mask pattern having a width equal to or less than a resolution limit of the photoresist is used to form the first mold material. And a step of forming a portion for forming the movable member.
The method for producing an ink jet recording head according to 1.
【請求項3】前記第1の樹脂を塗布する工程の前に、前
記基板上に、前記ノズル流路を形成するための第2の型
材となる第3の樹脂を塗布する工程を、さらに有し、 前記第1の樹脂を塗布する工程は、前記第2の型材を前
記第1の樹脂で覆うように前記基板上に前記第1の樹脂
を塗布する工程であることを特徴とする請求項1に記載
のインクジェット記録ヘッドの作成方法。
3. Before the step of applying the first resin, the method further comprises the step of applying a third resin, which serves as a second mold material for forming the nozzle flow path, on the substrate. Then, the step of applying the first resin is a step of applying the first resin on the substrate so as to cover the second mold material with the first resin. 1. The method for producing an inkjet recording head described in 1.
【請求項4】前記基板上に、前記第1の樹脂を塗布する
前に、前記基板上の、前記可動部材と前記供給口との間
に対応する位置に突状障壁を形成する工程をさらに有す
ることを特徴とする請求項1に記載のインクジェット記
録ヘッドの作成方法。
4. A step of forming a projecting barrier at a position corresponding to between the movable member and the supply port on the substrate before applying the first resin on the substrate. The method for producing an inkjet recording head according to claim 1, further comprising:
【請求項5】発熱抵抗体の発熱によりノズル流路内のイ
ンク中に発生させた気泡を利用してインク吐出口からイ
ンクを吐出するインクジェット記録ヘッドにおいて、 前記発熱抵抗体を備えた基板と、該基板上に設けられた
前記ノズル流路と、を有し、該ノズル流路内には、前記
発熱抵抗体と、前記ノズル流路内にインクを供給するた
めのインク供給口と、の間に可動部材が形成されてお
り、該可動部材は、前記ノズル流路の、前記基板と対向
する壁に支点を有するとともに前記基板側に自由端を有
し、前記基板と対向する前記壁と一体に形成されている
ことを特徴とするインクジェット記録ヘッド。
5. An ink jet recording head for ejecting ink from an ink ejection port by utilizing bubbles generated in ink in a nozzle flow path by heat generation of a heating resistor, a substrate provided with the heating resistor, The nozzle flow path provided on the substrate, and in the nozzle flow path, between the heating resistor and an ink supply port for supplying ink into the nozzle flow path. A movable member is formed on the wall of the nozzle channel that has a fulcrum on the wall facing the substrate and has a free end on the substrate side, and is integral with the wall facing the substrate. An ink jet recording head, characterized in that it is formed on.
【請求項6】前記壁及び前記可動部材が樹脂により形成
されていることを特徴とする請求項5に記載のインクジ
ェット記録ヘッド。
6. The ink jet recording head according to claim 5, wherein the wall and the movable member are made of resin.
【請求項7】前記ノズル流路内の前記可動部材と前記イ
ンク供給口との間に、前記可動部材が前記インク供給口
側へ変位することを制限する制限部を有することを特徴
とする請求項5に記載のインクジェット記録ヘッド。
7. A limiting portion is provided between the movable member and the ink supply port in the nozzle flow path to limit the displacement of the movable member toward the ink supply port. Item 5. The inkjet recording head according to item 5.
【請求項8】前記制限部は前記基板上に設けられている
突起形状障壁であることを特徴とする請求項5に記載の
インクジェット記録ヘッド。
8. The ink jet recording head according to claim 5, wherein the limiting portion is a protrusion-shaped barrier provided on the substrate.
【請求項9】前記制限部は前記ノズル流路内の側壁を構
成する部材の一部であることを特徴とする請求項5に記
載のインクジェット記録ヘッド。
9. The ink jet recording head according to claim 5, wherein the limiting portion is a part of a member forming a side wall in the nozzle flow path.
【請求項10】発熱抵抗体と、該発熱抵抗体に対応して
設けられたインク吐出口と、該インク吐出口に連通する
ノズル流路と、を有し、該ノズル流路内の、前記発熱抵
抗体と、前記ノズル流路内にインクを供給するためのイ
ンク供給口と、の間に可動部材が形成されており、前記
発熱抵抗体の発熱によりノズル流路内のインク中に発生
させた気泡を利用して前記インク吐出口からインクを吐
出するインクジェット記録ヘッドにおいて、前記可動部
材は、前記発熱抵抗体を備えた基板の前記ノズル流路側
の面に対して垂直方向に配されており、かつ、前記可動
部材の支点を前記ノズル流路の、前記基板と対向する側
の面に有し、前記可動部材の自由端を前記ノズル流路の
前記基板側に有することを特徴とするインクジェット記
録ヘッド。
10. A heating resistor, an ink discharge port provided corresponding to the heating resistor, and a nozzle flow path communicating with the ink discharge port, wherein the nozzle flow path is provided with the nozzle flow path. A movable member is formed between the heat generating resistor and an ink supply port for supplying ink into the nozzle channel, and is generated in the ink in the nozzle channel by the heat generated by the heat generating resistor. In the ink jet recording head that ejects ink from the ink ejection port by using bubbles, the movable member is arranged in a direction perpendicular to a surface of the substrate having the heating resistor on the nozzle channel side. And an fulcrum of the movable member on the surface of the nozzle channel facing the substrate, and a free end of the movable member on the substrate side of the nozzle channel. Recording head.
【請求項11】前記ノズル流路内の前記可動部材と前記
インク供給口との間に、前記可動部材が前記インク供給
口側へ変位することを制限する制限部を有することを特
徴とする請求項10に記載のインクジェット記録ヘッ
ド。
11. A restricting portion for restricting displacement of the movable member toward the ink supply port is provided between the movable member and the ink supply port in the nozzle flow path. Item 10. The inkjet recording head according to Item 10.
【請求項12】前記可動部材は、前記インク供給口側へ
変位する量よりも前記インク吐出口側へ変位する量の方
が大きいことを特徴とする請求項11に記載のインクジ
ェット記録ヘッド。
12. The ink jet recording head according to claim 11, wherein the movable member has a larger displacement amount toward the ink ejection port side than a displacement amount toward the ink supply port side.
JP2002216166A 2001-08-10 2002-07-25 Method for producing ink jet recording head Expired - Fee Related JP4095368B2 (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2002216166A JP4095368B2 (en) 2001-08-10 2002-07-25 Method for producing ink jet recording head
US10/214,105 US6663229B2 (en) 2001-08-10 2002-08-08 Ink jet recording head having movable member and restricting section for restricting displacement of movable member, and method for manufacturing the same
DE60227322T DE60227322D1 (en) 2001-08-10 2002-08-09 Ink jet recording head and method of manufacture
CNB021285659A CN1187195C (en) 2001-08-10 2002-08-09 Ink-jet recording head and method for mfg. same
AT02255582T ATE399645T1 (en) 2001-08-10 2002-08-09 INK JET RECORDING HEAD AND METHOD FOR MANUFACTURING
KR10-2002-0046971A KR100435020B1 (en) 2001-08-10 2002-08-09 Ink Jet Recording Head and Method for Manufacturing the Same
EP02255582A EP1283109B1 (en) 2001-08-10 2002-08-09 Ink jet recording head and method for manufacturing the same
US10/645,582 US6971171B2 (en) 2001-08-10 2003-08-22 Method for manufacturing an ink jet recording head

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JP2001243299 2001-08-10
JP2001-243299 2001-08-10
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EP (1) EP1283109B1 (en)
JP (1) JP4095368B2 (en)
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AT (1) ATE399645T1 (en)
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JP2002046271A (en) * 2000-07-31 2002-02-12 Canon Inc Liquid ejection head and liquid ejector
JP2002046273A (en) * 2000-07-31 2002-02-12 Canon Inc Liquid ejection head, its manufacturing method and liquid ejector
JP2002144570A (en) 2000-11-10 2002-05-21 Canon Inc Method of ejecting liquid drop, method of forming image, liquid jet apparatus and head
JP4532785B2 (en) 2001-07-11 2010-08-25 キヤノン株式会社 Structure manufacturing method and liquid discharge head manufacturing method

Cited By (1)

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US8376522B2 (en) 2007-12-06 2013-02-19 Canon Kabushiki Kaisha Liquid ejection head and printing apparatus

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US6663229B2 (en) 2003-12-16
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US20040056928A1 (en) 2004-03-25
EP1283109B1 (en) 2008-07-02
CN1187195C (en) 2005-02-02
KR100435020B1 (en) 2004-06-11
US20030030702A1 (en) 2003-02-13
CN1401483A (en) 2003-03-12
KR20030014142A (en) 2003-02-15
JP4095368B2 (en) 2008-06-04
DE60227322D1 (en) 2008-08-14
ATE399645T1 (en) 2008-07-15
US6971171B2 (en) 2005-12-06

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