JPH04216951A - Liquid jet recording head, manufacture thereof and recording apparatus equipped with the same recording head - Google Patents

Abstract

PURPOSE:To manufacture a precise and highly reliable liquid jet recording head by a lithographic technique. CONSTITUTION:A first photosensitive material layer 3 is formed to a substrate 1 having an energy generating element 2 generating ink emitting energy provided thereto and patternwise exposed to form the latent images of ink passages to the material layer 3. Subsequently, a second photosensitive material layer 5 is laminated to the material layer 3 and exposed through patterns for forming ink emitting orifices and an ink supply port to form respective latent image formed parts 8,9. Thereafter, the latent image formed parts are dissolved and removed by a solvent to prepare a recording head having the ink passages, the ink emitting orifices and the ink supply port formed thereto.

Description

[Detailed description of the invention]

0001

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid jet recording head for generating recording liquid droplets used in an ink jet recording system, a method for manufacturing the same, and a recording apparatus equipped with the liquid jet recording head.

0002

[Prior Art] A liquid jet recording head applied to an ink jet recording method (liquid jet recording method) generally has a fine ink discharge opening (hereinafter referred to as an orifice), an ink path, and an ink jet provided in a part of the ink path. During recording, when the energy generating element operates, small droplets of ink are ejected from the orifice and land on the recording paper. Printing and recording are performed. Conventionally, as a method of manufacturing such a liquid jet recording head, for example, a plate of glass or metal is used,
A method is known in which ink channels are formed by forming fine grooves on the plate by processing means such as cutting or etching, and then joining the plate with the grooves formed thereon to another suitable plate.

However, in a liquid jet recording head manufactured by such a conventional method, the inner wall surface of the ink path to be cut may not be sufficiently smooth, or distortion may occur in the ink path due to a difference in etching rate. Therefore, it is difficult to obtain an ink path with constant flow path resistance, and there are problems in that the recording characteristics of the liquid jet recording head after manufacturing tend to vary. Further, there was also a drawback that the plate was easily chipped or cracked during cutting, resulting in a poor manufacturing yield. Further, when etching is performed, there is a disadvantage that there are many manufacturing steps, leading to an increase in manufacturing costs. Furthermore, a common drawback of the above conventional methods is that they require a grooved plate with ink paths formed therein and a drive element such as a piezoelectric element or an electrothermal transducer to generate the ejection energy to eject the ink droplets. When bonding the lid plate with the energy generating element),
There were also problems in that it was difficult to align these plates, and mass production was lacking.

[0004] Furthermore, under the normal usage environment, a liquid jet recording head uses an ink liquid (generally, an ink liquid mainly composed of water and often not neutral, or an ink mainly composed of an organic solvent). liquid, etc.). Therefore, the head structural material constituting the liquid jet recording head is
What is desired is a material that does not cause a decrease in strength due to the influence of the ink liquid, and conversely does not add harmful components to the recording liquid that would reduce the suitability of the ink liquid. However, in the above-mentioned conventional methods, it was not always possible to select materials suitable for these purposes due to constraints such as processing methods.

[0005]

SUMMARY OF THE INVENTION The present invention has been made in view of the above points, and provides a liquid jet recording head that is inexpensive, precise, and highly reliable, a method for manufacturing the same, and a liquid jet recording head that includes the head. The purpose is to provide a recording device with

[0006] Also, a novel liquid jet recording head capable of supplying a liquid jet recording head having a configuration in which the ink path is microfabricated with high accuracy and high yield;
Another object of the present invention is to provide a manufacturing method thereof and a recording device equipped with the present head.

[0007] Also, a new liquid jet recording head capable of supplying a liquid jet recording head that has less mutual influence with ink liquid and has excellent mechanical strength and chemical resistance, a method for manufacturing the same, and a recording device equipped with this head. The purpose is also to provide equipment.

[0008]

Means for Solving the Problems In order to achieve the above object, the present invention provides an ink discharge port, an ink supply port, an ink path that communicates the ink discharge port and the ink supply port, and an ink discharge port that communicates with the ink supply port. In a method of manufacturing a liquid jet recording head having an energy generating element disposed corresponding to a path and generating energy used for ejecting ink,
A first photosensitive material layer for forming an ink path is provided on the substrate on which the energy generating element is disposed, and the first photosensitive material layer is exposed to a pattern for forming an ink path.
A second photosensitive material layer is further provided on the photosensitive material layer.
The photosensitive material layer is exposed to a pattern for forming an ink ejection port and an ink supply port, and then the first and second photosensitive material layers are developed, and the ink ejection port communicates with the ink ejection port. and an energy generating element disposed corresponding to the ink passage and generating energy used for ejecting ink, wherein the energy generating element is disposed. A first photosensitive material layer for forming an ink path is provided on the substrate provided with the ink supply port, and the first photosensitive material layer is exposed to a pattern for forming an ink path, and then the first photosensitive material layer A second photosensitive material layer is further provided thereon, the second photosensitive material layer is exposed to a pattern for forming ink ejection ports, and then the first and second photosensitive material layers are developed.
The present invention also relates to a liquid jet recording head manufactured by the above method.

Furthermore, the present invention relates to a recording apparatus equipped with the above head.

The present invention will be explained in detail below with reference to the drawings.

FIGS. 1 to 7 are explanatory diagrams of a manufacturing method according to the present invention, and the head according to the present invention is manufactured on a substrate 1 shown in FIG. This substrate 1 is made of, for example, glass, ceramics, plastics, or metal, and functions as a part of the ink liquid flow path component described later, and also functions as a support for a photosensitive material layer described later. Any material can be used without particular restrictions on its shape, material, etc., as long as it meets the above purpose. On the substrate 1, there is an energy generating element 2, such as an electrothermal transducer or a piezoelectric element, that generates energy used to eject ink.
A predetermined number (two in this figure) are arranged. Such an energy generating element 2 applies ejection energy to the ink liquid for ejecting small droplets of ink liquid, thereby performing recording. For example, when an electrothermal conversion element is used as the energy generating element 2, ejection energy is generated by heating the nearby recording liquid. Further, for example, when a piezoelectric element is used, ejection energy is generated by mechanical vibration of this element.

Note that these elements 2 are connected to control signal input electrodes (not shown) for operating these elements 2. Further, generally, various functional layers such as a protective layer can be provided for the purpose of improving the durability of these energy generating elements.

Next, as shown in FIG. 2, a first photosensitive material layer 3 is deposited on the substrate 1 on which the energy generating element 2 is disposed.
is formed. The photosensitive material layer 3 may be formed by applying a solution containing the photosensitive material by a solvent coating method, or by preparing a dry film coated with the photosensitive material and applying it onto the substrate by a laminating method. It may be laminated.

The solvent coating method is a method in which the photosensitive material solution is applied onto a substrate using a spin coater, roll coater, wire bar, etc., and then the solvent is dried and removed to form a photosensitive material layer.

The material used for the photosensitive material layer 3 includes commonly used photosensitive resins. Generally, photosensitive materials are of negative type, in which the light irradiated area remains after development, positive type, in which the light irradiated area dissolves, and types that are sensitive to ultraviolet or visible light, and types that are sensitive to ultraviolet rays, electron beams, or X-rays.
They can be roughly divided into four types: those that are sensitive to ionizing radiation such as radiation.

As negative resist materials for ionizing radiation, polymer compounds having unsaturated double bonds in their molecular structure,
Examples include compounds having an epoxy group, silicone polymer compounds, and vinyl polymer compounds having a hydrogen atom at the α-position. More specifically, examples of polymer compounds having an unsaturated double bond in the molecular structure include rubber-based polymer compounds such as polybutadiene and polyisoprene, cyclized products thereof, diaryl phthalate resins, alkyl vinyl ethers, etc. Examples include allyl esters of copolymers with maleic anhydride, polyvinyl cinnamate, unsaturated polyesters, and polymer compounds with acrylic or methacrylic unsaturated double bonds introduced into the side chains.

[0017] Introduction of an acrylic or methacrylic unsaturated double bond can be synthesized by reacting a compound having an OH group, an isocyanate group, a hydroxyl group, or an epoxy group with methacrylic acid or acrylic acid. These acrylic compounds are widely used because of their high sensitivity.

Epoxy compounds include phenol novolac resins, cresol novolac resins, epoxy resins synthesized by the reaction of polyvinylphenol and other polymer compounds with epichlorohydrin, epoxidized rubbers such as epoxidized polybutadiene, or hydroxyalkyl ( Examples include epoxy resins synthesized by reacting epichlorohydrin with resins that are copolymers of meth)acrylate, (meth)acrylic acid, and the like.

[0019] Also, as silicone-based polymer compounds,
Examples include linear silicone resins such as polymethylsiloxane, polydiphenylsiloxane, and polyvinylsiloxane, and ladder-type silicone resins such as polymethylsilsesquioxane, polyphenylsilsesquioxane, and polyvinylsilsesquioxane.

Examples of vinyl polymer compounds having a hydrogen atom at the α-position include polyvinyl chloride, polystyrene, polyvinylcarbazole, polyvinylferrocene, polyacrylamide, polyvinylphenol, polystyrene, polyvinylcarbazole, polyvinylnaphthalene, polyhydroxystyrene, etc. Examples include halogens or halogenated alkylated products.

These polymer compounds have a gelling property against ionizing radiation, so they can be used as negative resists as they are, but they can also be used with increased sensitivity by adding azide and bisazide compounds, onium salts, etc., which will be described later. It is possible.

[0022] Also, negative resists for ultraviolet rays and visible light are
This is a material in which a photopolymerization initiator for ultraviolet rays or visible light, and a photocrosslinking agent are added to the negative ionizing radiation material described above.

Sensitivity to ultraviolet rays and visible light can be imparted to a polymer compound having an unsaturated double bond in its molecular structure by adding a photopolymerization initiator or a photocrosslinking agent. As the photopolymerization initiator, diketone compounds such as benzyl, 4,4'-dimethoxybenzyl, 4,4'-dimethylbenzyl, 4,4'-dihydroxybenzyl, thioxanthone, 2-chlorothioxanthone, isopropylthioxanthone, 2, Thioxanthone derivatives such as 4-diethylthioxanthone and 2,4-diisopropylthioxanthone,
Any photosensitive dye such as 7-diethylamino-3,3'-carbonylbiscoumarin, Michler's ketone, etc. may be used.

[0024] Examples of the photocrosslinking agent include azide and bisazide compounds. These azide and bisazide compounds are produced by the hydrogen abstraction reaction of nitrene.
Polymer compounds with unsaturated double bonds in their molecular structures and α
A vinyl polymer compound having a hydrogen atom at the - position can be crosslinked to impart negative tone characteristics. Examples of azide and bisazide compounds include P-azidobenzaldehyde,
P-azidoacetophenone, P-azidobenzoic acid,
P-azidobenzalacetophenone, P-azidobenzalacetone, 4,4'-diazidechalcone, 1,3-bis-4'-azidobenzalacetone, 2,6-bis-4
'-azidobenzalcyclohexanone, 2,6-bis-
Examples include 4'-azidobenzal, 4-4 methylcyclohexanone, and the like.

Further, a polymer compound having an epoxy ring in its molecular structure can be given properties as a negative ultraviolet resist by adding a photocationic polymerization initiator such as an onium salt. Examples of onium salts include diphenyliodonium salts such as diphenyliodonium-hexafluorophosphonate and diphenyliodonium-hexafluoroarsenate.

Examples of positive resist materials include positive photoresists made of a mixture of alkali-soluble resins such as novolac resins and polyvinylphenols, and quinone diazide compounds.

[0027] As a positive resist for ionizing radiation, a resist consisting of a mixture of an alkali-soluble resin such as a novolac resin or polyvinylphenol and an olefin sulfone compound such as 2-methylpenten-1-sulfone, or a resist that resists ionizing radiation decay A positive resist made of mold resin can be mentioned.

Ionizing radiation decay type positive resists include polymethacrylic acid ester polymer compounds such as polymethyl methacrylate, polyphenyl methacrylate, poly-n-butyl methacrylate, and polyhexafluorobutyl methacrylate, polyvinyl ketone, and polyisobutyl methacrylate. Vinyl ketone polymer compounds such as propenyl ketone and polyphenyl ketone, polybutene-1-sulfone, poly-
Olefin sulfone-based polymer compounds such as 2-methylpentene-1-sulfone, polymethacrylamide, poly-α-cyanoacrylate, poly-α-methylstyrene, and other polymers with atoms or molecules other than hydrogen atoms added to the α-position. Mention may be made of molecular compounds.

In the present invention, as shown in FIG. 3, an ink path forming mask 4 is superimposed on the upper surface of the first photosensitive resin layer 3 formed by the above method, and light is emitted from the direction of arrow A in FIG. Irradiation is performed, which results in, as shown in FIG.
A pattern latent image forming portion 6 of an ink path is formed in the first photosensitive resin layer 3 . The exposure means may be one-shot exposure through a photomask, or direct drawing using an electron beam, ion beam, or the like. As an exposure light source, not only the conventionally used ultraviolet light but also Deep-U light can be used.
Any device that can pattern a photosensitive material, such as V light, excimer laser, electron beam, or X-ray, may be used.

As shown in FIG. 4, a second photosensitive material layer 5 is further formed on the photosensitive material layer 3 on which the latent image of the ink path has been patterned.

As the material that can be used for the second photosensitive material layer 5, basically any of the photosensitive materials mentioned above can be used. However, the photosensitive materials used for the first and second layers need to be selected so as not to affect each other during the formation and exposure steps of the photosensitive material layers. for example,
When forming the second photosensitive material layer 5 on the first photosensitive material layer 3, a means for not affecting the first photosensitive material layer 3 is required. For example, if the second photosensitive material layer 5 is formed by a dry film lamination method, the effect on the first photosensitive material layer 3 is extremely small. Further, even when using a solvent coating method, it is possible to form the first and second photosensitive material layers by changing the dissolution characteristics of the materials even slightly. For example, the first photosensitive material layer 3
A material that dissolves in highly polar solvents such as water or alcohol is used as the material, and a material that dissolves in less polar solvents such as aromatics is selected as the resin material for the photosensitive material layer 5 to be solvent coated thereon. and the first photosensitive material layer 3
There are methods such as coating it so that it does not dissolve.

Furthermore, a method of thinly coating the surface of the first photosensitive material layer 3 with a silane coupling agent or the like, a method of subjecting the first photosensitive material layer 3 to an appropriate heat treatment, or a method of applying a silicon compound to the surface of the first photosensitive material layer 3, If a method such as heat-treating the first photosensitive material layer 3 in an atmosphere is used, even if the first and second photosensitive material layers are the same or resin materials having similar characteristics, It is possible to form a two-layer configuration.

The two-layer photosensitive material layers 3 and 5 formed by the above method are further subjected to pattern exposure to form ink discharge ports and ink supply ports, as shown in FIG. It will be done. That is, a mask is placed on the photosensitive material layer 5, and the mask is directed upward (in the direction of arrow B in FIG. 5).
Light irradiation is performed from As a result, as shown in FIG. 6, pattern latent image forming portions 8 of the ink discharge ports and pattern latent image forming portions 9 of the ink supply ports are formed on the photosensitive material layer 5. This pattern exposure can be performed in the same manner as the exposure of the first photosensitive material layer 3. In this case, it is important to note that the irradiation light during exposure of the second photosensitive material layer 5 does not affect the first photosensitive material layer 3, or even if it does, it does not substantially affect the manufacturing of the head according to the present invention. The aim is to ensure that there are no hindrances. To explain this point in more detail, since the pattern exposure of the ink ejection opening is performed as a smaller part than the pattern exposure of the ink path, the resin materials of the second and first photosensitive material layers 5 and 3 are made of positive type. For example, there is no problem even if the first photosensitive material layer 3 is exposed to the light irradiated onto the exposed portion of the ejection port. On the other hand, combinations other than the above, for example, the first photosensitive material layer 3 is positive type and the second photosensitive material layer 5 is negative type, the first photosensitive material layer 3 is negative type and the second photosensitive material layer 5 is When is a positive or negative type, so that the pattern exposure of the ink ejection port does not affect the first photosensitive material layer 3,
It is necessary to take measures such as making the photosensitive wavelength range different or using materials with extremely different sensitivities to light. In addition, in FIG. 5, it is shown as an example that both the first and second photosensitive material layers 3 and 5 are of positive type.

The block body 10 formed by sequentially laminating the first photosensitive material 3 and the second photosensitive material 5 on the substrate 1 as described above is then subjected to a development treatment, whereby the latent image is removed. The forming portions 6, 8, and 9 are dissolved and removed, and as shown in FIG.
2. An ink supply port 13 is formed, thereby obtaining the liquid jet recording head of the present invention. The phenomenon is the first and second
When the photosensitive materials of the photosensitive material layers 3 and 5 can be developed with the same solvent, they can be developed all at once, but when they cannot be developed with the same solvent, they can be developed sequentially with suitable solvents. In the case of the liquid jet recording head shown in FIG. 7, since the droplet ejection direction and the ink supply port are both on the same side of the substrate 1, development is performed on the upper second photosensitive material layer 5. It is desirable to develop the lower first photosensitive material layer 3 after the first photosensitive material layer 3 is developed.

In the liquid jet recording head shown in FIG. 7, it is possible to supply ink by providing a bonding member 14 for ink supply.

On the other hand, in the liquid jet recording head shown in FIG. 8, the ink supply port 13 is formed penetrating through the substrate 1, and when this configuration is adopted, the ink supply port 13 is formed in advance. On the substrate on which the energy generating element is formed, the first
After forming a photosensitive material layer and exposing an ink path connecting the ink supply port and the energy generating element in the photosensitive material layer in a pattern, a second photosensitive material layer is formed, and the second photosensitive material layer is formed. It can be manufactured by subjecting the ink ejection ports to pattern exposure and finally developing the first and second photosensitive material layers. At this time, it is desirable to carry out pattern exposure so that the ink ejection ports are located approximately on the energy generating element.

In this recording head, it is possible to supply ink by providing an ink supply member 15 as shown in FIG. 9, making it possible to manufacture the liquid jet recording head more easily. Of course, it is also possible to supply ink using other means and shapes.

In this example, a liquid jet recording head having two ejection ports is shown, but of course a high-density multi-array liquid jet recording head with a larger number of ejection ports arranged in parallel can also be used. It can be manufactured in the same manner.

The present invention provides excellent effects particularly in bubble jet type recording heads and recording apparatuses among liquid jet recording (ink jet recording) types.

For its typical configuration and principle, see, for example, US Pat. Nos. 4,723,129 and 4,740.
No. 796. This method can be applied to both the so-called on-demand type and continuous type, but especially in the case of the on-demand type, it is necessary to arrange the liquid (ink) in accordance with the sheet and liquid path that hold it. By applying at least one drive signal corresponding to the recording information to the electrothermal transducer element, thermal energy is generated that causes the electrothermal transducer to rapidly rise in temperature beyond nucleate boiling, thereby reducing the heat of the recording head. This is effective because it causes film boiling on the action surface, resulting in the formation of bubbles in the liquid (ink) that correspond one-to-one to this drive signal. The growth and contraction of the bubble causes liquid (ink) to be ejected through the ejection hole to form at least one drop. It is more preferable to use this drive signal in a pulse form, since the growth and contraction of bubbles can be carried out immediately and appropriately, so that ejection of liquid (ink) with particularly excellent responsiveness can be achieved. As this pulse-shaped drive signal, those described in US Pat. No. 4,463,359 and US Pat. No. 4,345,262 are suitable. Further, if the conditions described in US Pat. No. 4,313,124 are adopted as the invention regarding the temperature increase rate of the heat acting surface, even more excellent recording can be performed.

[0041] The configuration of the recording head includes a combination configuration of an ejection port, a liquid flow path, and an electrothermal transducer element (a straight liquid flow path or a right-angled liquid flow path) as disclosed in each of the above-mentioned specifications. The present invention also includes configurations using US Pat. No. 4,558,333 and US Pat. No. 4,459,600, which disclose configurations in which the heat acting portion is disposed in a bending region. In addition, Japanese Patent Application Laid-open No. 123670 of 1982 discloses a configuration in which a common slit is used as a discharge part for a plurality of electrothermal transducer elements, and a method for absorbing pressure waves of thermal energy is disclosed. The present invention is also effective with a configuration based on Japanese Patent Application Laid-Open No. 138461 of 1981, which discloses a configuration in which the openings correspond to the discharge ports.

Furthermore, as a full-line type recording head that can simultaneously record across the entire width of recording paper, there is a configuration that satisfies the length by a combination of a plurality of recording heads as disclosed in the above-mentioned specification, Either configuration as a single recording head formed in a pair may be used, but the present invention can more effectively exhibit the above-mentioned effects.

In addition, a replaceable chip-type recording head that is attached to the apparatus main body enables electrical connection to the apparatus main body and ink supply from the apparatus main body, or a print head that is integrated into the print head itself. The present invention is also effective in a cartridge-type recording head that is provided in a conventional manner.

[0044] Furthermore, by adding recovery means and preliminary auxiliary means for the recording head to the recording apparatus, the effect of the recording head obtained by the present invention can be further stabilized.
This is preferable. Specifically, these include capping means, cleaning means, pressurizing or suction means, electrothermal transducer elements, another heating element, or a combination of these for the recording head. It is also effective to add a preheating means, a means for performing a preliminary ejection mode in which ejection is performed other than printing, etc. to perform stable printing.

Furthermore, the recording mode of the recording apparatus is not limited to a mode in which only mainstream colors such as black are recorded, but also a recording head configured integrally or a plurality of recording heads combined, but different colors can be used. multiple colors or
The present invention is also extremely effective for a recording head of an apparatus having at least one full color by color mixture.

Further, the recording head obtained according to the present invention has the following features:
Even if the ink is not a liquid, it is an ink that solidifies at room temperature or lower, and becomes soft or liquid at room temperature, or a temperature adjustment range of 30°C or higher and 70°C or lower, which is the temperature adjustment range generally used in inkjet. It can also be applied to materials that become soft or liquid. That is, it is sufficient if the ink is in a liquid state when the recording signal is applied. In addition, ink that actively prevents temperature rise due to thermal energy by absorbing it as energy for the ink's change from a solid state to a liquid state, or that solidifies when left to prevent ink evaporation. In any case, by applying thermal energy according to the recording signal, the ink is liquefied and ejected as liquid ink, or the ink has already begun to solidify by the time it reaches the recording medium. The use of ink that is liquefied only by energy is also applicable to the recording head according to the present invention. In such a case, the ink is held in a liquid or solid state in the recesses or through holes of the porous sheet, as described in JP-A-54-56847 or JP-A-60-71260. It may also be configured to face the electrothermal transducer element. In the present invention,
The most effective method for each of the above-mentioned inks is one that implements the above-mentioned film boiling method.

FIG. 10 is an external perspective view showing an example of an inkjet recording apparatus (IJRA) equipped with a recording head obtained according to the present invention as an inkjet head cartridge (IJC).

In the figure, reference numeral 20 denotes an ink jet head cartridge (IJC) equipped with a nozzle group for ejecting ink toward the recording surface of the recording paper fed onto the platen 24. A carriage HC 16 holds the IJC 20, and is connected to a part of the drive belt 18 that transmits the driving force of the drive motor 17.
By being able to slide on the book guide shafts 19A and 19B, it is possible to reciprocate the IJC 20 over the entire width of the recording paper.

26 is a head recovery device, IJC20
It is disposed at one end of the moving path of the camera, for example, at a position opposite to the home position. The head recovery device 26 is operated by the driving force of the motor 22 via the transmission mechanism 23, and the I
Perform capping of JC20. In connection with the capping of the IJC 20 by the cap portion 26A of the head recovery device 26, ink absorption by an appropriate suction means provided in the head recovery device 26 or appropriate pressure means provided in the ink supply path to the IJC 20 is performed. Ejection recovery processing is performed, such as removing thickened ink within the nozzle by forcefully discharging ink from the ejection port by force feeding the ink. Furthermore, IJC is protected by capping at the end of recording, etc.

Reference numeral 30 denotes a blade as a wiping member, which is disposed on the side surface of the head recovery device 26 and is made of silicone rubber. The blade 30 is a blade holding member 3
The head recovery device 2 is held in cantilever form at 0A.
6, it is operated by a motor 22 and a transmission mechanism 23, and can engage with the discharge surface of the IJC 20. As a result, at an appropriate timing during the recording operation of the IJC 20 or after the ejection recovery process using the head recovery device 26, the blade 30 is projected into the movement path of the IJC 20, and the ejection surface of the IJC 20 is moved along with the movement of the IJC 20. It is used to wipe away condensation, moisture, dust, etc.

[0051]

EXAMPLES The present invention will be explained in more detail by way of examples below. Example 1 A liquid jet recording head having the configuration shown in FIG. 7 was manufactured according to the operating procedure shown in FIGS. 1 to 7.

First, a positive photoresist "LP-1" is placed on the glass substrate 1 on which the electrothermal conversion element (heater made of material HfB2) as the energy generating element 2 is formed.
0" (manufactured by Hoechst) at a thickness of 25 μm and heated at 80°C.
The first photosensitive material layer 3 was formed by baking for 1 hour. The above positive photoresist is commonly used.
This is a resist consisting of a mixed system of novolak resin and naphthoquinone diazide. Next, a mask 4 having a pattern corresponding to the ink path is overlaid on the resist film, and light irradiation is performed by contact exposure using a Canon PLA-520 mask aligner to form a pattern latent image forming portion 6 of the ink path. did. Although the amount of light irradiation was not measured accurately, it was approximately 200 mj/cm2.

Next, on the positive resist film, a 25 μm thick photosensitive material layer made of a positive dry film “OZATEC R255” (manufactured by Hoechst) was laminated to form the second photosensitive material layer 5. did. A mask 7 having a pattern corresponding to the ejection ports 12 and the ink supply ports 13 was placed over this photosensitive material layer 5, and light was irradiated in the same manner as the first photosensitive material layer 3 below. The exposure amount of this layer was about 100 mj/cm2.

Next, the block body 10 thus obtained is immersed in a developer (1% caustic soda aqueous solution) and developed for about 30 minutes while stirring, thereby forming the ink passage 11, the discharge port 12, and the ink supply. A mouth 13 was formed. Although it depends on the resist material selected, positive photoresists are inferior in mechanical strength, solvent resistance, and heat resistance when patterned. Therefore, hardening and heat treatment using deep-UV light of 300 nm or less were performed to improve the above characteristics. Hardening was performed for 20 minutes using a 2 kW Xe-Hg light source manufactured by Ushio Electric, followed by heat treatment at 150° C. for 30 minutes. Finally, the ink supply bonding member 14 was adhered to the ink supply port to produce a liquid jet recording head.

The thus produced liquid jet recording head was mounted on a recording apparatus, and purified water/glycerin/Direct Black 154 (water-soluble black dye) = 65/30/5
When recording was performed using an ink consisting of the following, stable printing was possible. Example 2 An electrothermal conversion element was formed on a glass substrate in the same manner as in Example 1, and an ink supply port was further formed on the substrate using a drill.

[0056] Negative electron beam resist OEB manufactured by Tokyo Ohka Co., Ltd.
R-800 (cyclized polyisoprene resin) was concentrated three times, applied on a polyethylene terephthalate film (PET) with a thickness of 25 μm using a wire bar, and then dried at 80° C. for 30 minutes. The thickness of the resist film was 35 μm. The film coated with the resist was attached to the substrate, and the resist film was transferred to the substrate using a laminator. Note that the lamination temperature was 110°C. By this operation, a resist film that did not cave in at the ink supply port could be formed on the substrate.

[0057] The substrate was placed in an electron beam lithography system E manufactured by Elionix Co., Ltd.
It was attached to LS-3300, and an ink flow path pattern was drawn using electron beam drawing. The electron beam irradiation amount is 10μC/cm2.
Met.

Next, in the same manner as in Example 1, a positive dry film (OZATEC R2) was applied on the first resist film.
55) was laminated, and the ink ejection openings were exposed in a pattern. Exposure: Canon mask aligner PLA-50
1 was used, and the exposure amount was 200 counts.

Next, the substrate was immersed in an alkaline developer (Hoechst: MIF-312) to develop the ink discharge ports, and then immersed in toluene to develop the first layer resist film. The first resist film was developed for 20 minutes while applying ultrasonic waves. Thereafter, the resist film was hardened using Deep-UV light in the same manner as in Example 1.

Finally, the ink tank was bonded to the substrate with an adhesive, and ink was supplied and printing was performed in the same manner as in Example 1. Good printing was possible.

[0061]

Effects of the Invention The effects brought about by the present invention described above include the following items.

1) Since the main process for manufacturing the head is based on lithography technology using photoresist, photosensitive dry film, etc., the detailed parts of the head can be formed in the desired pattern very easily. Moreover, it is also possible to easily process a large number of heads with the same configuration at the same time.

2) There is no need for a cutting process for the ejection port, and the distance between the energy generating element and the ejection port can be controlled by controlling the coating thickness of the resist film, so the distance between the energy generating element and the ejection port can be kept constant. This makes it possible to stably manufacture a head with a smooth inner surface of the ejection port, thereby improving yield and printing quality.

3) It is possible to easily and reliably align the main components, and heads with high dimensional accuracy can be manufactured with high yield.

4) At least two resist coating and exposure steps;
The head can be manufactured in one development process, and by shortening the manufacturing process, productivity can be improved and equipment costs can be reduced.

5) A high-density multi-array liquid jet recording head can be obtained by simple means.

6) Since the height of the ink path and the length of the ejection port can be easily and accurately changed by changing the thickness of the resist film, the design can be changed and controlled easily.

7) Since it is not necessary to bond minute parts with an adhesive, the adhesive does not block the ink flow path or the ejection port, and the function of the head does not deteriorate.

[Brief explanation of the drawing]

FIG. 1 is a schematic perspective view of a substrate before ink paths and ejection ports are formed.

FIG. 2 is a schematic perspective view of a substrate on which a first photosensitive material layer is formed.

FIG. 3 is a schematic diagram of pattern exposure applied to the first photosensitive material layer.

FIG. 4 is a schematic diagram showing the state of coating and exposure of a second photosensitive material layer.

FIG. 5 is a schematic diagram showing the state of coating and exposure of a second photosensitive material layer.

FIG. 6 is a schematic perspective view showing a pattern latent image forming portion such as formed ink paths and ejection ports.

FIG. 7 is a schematic diagram of a head provided with ink supply means.

FIG. 8 is a schematic diagram showing the configuration of a head after development, in which ink is supplied from the opposite side of the substrate with respect to the ink ejection direction.

FIG. 9 is a schematic diagram of a head provided with ink supply means.

FIG. 10 is an explanatory diagram of a recording device to which a head according to the present invention can be attached.

[Explanation of symbols] 1 Substrate 2 Energy generating element 3 First photosensitive material layer 4 Mask 5 Second photosensitive material layer 6 Latent image forming section 7 Mask 8 Latent image forming section 9 Latent image forming section 10 Block body 11 Ink path 12 Ink discharge port 13 Ink supply port 16 Carriage 17 Drive motor 18 Drive belts 19A, 19B Guide shaft 20 Inkjet head cartridge 22 Cleaning motor 23 Transmission mechanism 24 Platen 26 Cap member 30 Blade 30A Blade holding member

Claims (6)

[Claims] 1. An ink discharge port, an ink supply port, an ink path that communicates the ink discharge port and the ink supply port, and an ink path disposed corresponding to the ink path and used for discharging ink. In a method of manufacturing a liquid jet recording head having an energy generating element that generates energy, a first photosensitive material layer for forming an ink path is provided on a substrate on which the energy generating element is disposed, and the first photosensitive material layer is provided for forming an ink path. The material layer is exposed to a pattern for forming an ink path, and then a second photosensitive material layer is further provided on the first photosensitive material layer, and a pattern for forming an ink discharge port and an ink supply port is formed on the second photosensitive material layer. A method of manufacturing a liquid jet recording head, comprising exposing the first and second photosensitive material layers to light, and then developing the first and second photosensitive material layers. 2. An inkjet device comprising an ink ejection port, an ink path communicating with the ink ejection port, and an energy generating element disposed corresponding to the ink path and generating energy used for ejecting ink. In the method of manufacturing a liquid jet recording head, a first ink path forming first ink path-forming substrate is provided on a substrate on which the energy generating element is disposed and the ink supply port is provided.
A photosensitive material layer is provided and the first photosensitive material layer is exposed to a pattern for forming ink paths, and then a second photosensitive material layer is further provided on the first photosensitive material layer to form the second photosensitive material. A method for manufacturing a liquid jet recording head, characterized in that the layer is exposed to a pattern for forming ink ejection orifices, and then the first and second photosensitive material layers are developed. 3. A liquid jet recording head manufactured by the manufacturing method according to claim 1 or 2. 4. The liquid jet recording head according to claim 3, wherein the energy generating element is an electrothermal converter that generates thermal energy as the energy. 5. The liquid jet recording head according to claim 3, wherein the liquid jet recording head is of a full line type in which a plurality of ink ejection ports are provided over the entire width of the recording area of the recording medium. 6. A liquid jet recording head comprising at least the liquid jet recording head according to claim 3, wherein the ink ejection orifice is provided opposite to the recording surface of the recording medium, and a member for mounting the head. Characteristic liquid jet recording device.