JP2003100703A - Method and apparatus for treating liquid, and method for manufacturing flat panel display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To equalize treating by reducing the deviation of water flows caused by air bubbles when a liquid treatment introducing air bubbles is performed in a state wherein an object to be treated is immersed in a liquid. SOLUTION: Substrates 110 are arranged in a treatment region A in a cleaning bath 21 containing pure water 3, and when bubbles 4 are introduced by a bubble generator 22, rising water flows are generated in the treatment region A. The rising water flows go over the sidewalls 2a of a cassette 2 to flow into liquid return paths B arranged outside the sidewalls 2a, and go down through the liquid return paths B and the bottom of the treatment bath 21, and return to the treatment region A. Since downstream water flows are generated in the liquid return paths B, it becomes hard that downstream water flows are generated in the treatment region A. Therefore, since the bubbles 4 are evenly dispersed in the whole treatment region A, the uniformity of a cleaning effect to the substrates 110 is improved.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid processing method, a liquid processing apparatus, and a method for manufacturing a flat panel display device, and more particularly to a liquid suitable for processing various substrates using a liquid. Regarding processing technology.

[0002]

2. Description of the Related Art Generally, various flat panel display devices such as liquid crystal display devices, electroluminescent display devices, and plasma display devices have been developed. What is common to these flat panel display devices is that they each include at least one substrate arranged in parallel to the display surface. In the manufacturing process of these flat panel display devices, there are various liquid processing steps in which a substrate is immersed in a liquid for processing, such as cleaning, etching and coating of the substrate.

For example, during a manufacturing process of a liquid crystal display device, a step of cleaning a liquid crystal display panel formed by laminating a pair of substrates, or a single substrate made of glass or the like before forming the liquid crystal display panel is used. There is a cleaning process. For example, in the case of the latter substrate cleaning step, as shown in FIG.
As shown in (a), the cleaning tank 1 is mounted in a cleaning cassette (not shown) so that a large number of substrates 1 are arranged in a vertically standing posture and spaced from each other.
It is introduced into the water in 1. Then, a large number of bubbles are generated from the bubble introduction port of the bubble generator 12 by supplying a gas such as air or nitrogen gas into the bubble generator 12 arranged in the cleaning tank 11. In this state, the substrate surface is cleaned by the bubbles coming in and out of the substrate surface in the process of many bubbles rising in water,
The cleaning effect of the substrate is further enhanced by the rising water flow generated by the rising of the bubbles.

[0004]

However, in the conventional substrate cleaning method described above, when bubbles are introduced into water as described above, a rising water flow is generated as the bubbles rise. Precipitation flow also occurred, and Fig. 8
As shown in (b), the descending water flow is concentrated between the substrates 1 at a specific place D in the cleaning tank 11,
Since air bubbles are reduced at the location D, there is a problem that unevenness occurs in cleaning the substrate.

The above-mentioned problems are not limited to the cleaning method, and are generally applied to a liquid processing method in which air bubbles are introduced into a liquid and various kinds of processing are performed while the object to be processed is immersed in the liquid. Exists as well.

Therefore, the present invention solves the above-mentioned problems, and when the liquid treatment is performed in which bubbles are introduced while the object to be treated is immersed in the liquid, the deviation of the water flow caused by the bubbles is caused. By reducing the above, it is intended to make the processing uniform.

[0007]

In order to solve the above problems, a liquid processing method of the present invention is a liquid processing method in which an object to be processed is placed in a liquid and bubbles are introduced into the liquid to perform the processing. Then, the liquid is taken in from the upper part of the region in which the object to be processed is placed, and the liquid is discharged toward the lower part of the region, and the process is performed in a state where the liquid return path is configured.

According to the present invention, the upward flow of the liquid is generated by the introduction of the bubbles, and the downward flow is also generated by the upward flow. However, the liquid is taken in from the upper part of the region where the object to be treated is arranged and the lower part of the region is formed. Since the liquid return path is configured to send the liquid toward, the downward flow corresponding to the upward flow will pass through the liquid return path. Is less likely to occur, and as a result, it is less likely to generate a place where bubbles are eliminated in the area. Therefore, the variation in the treatment effect due to the bubbles in the region is reduced, so that the object to be treated can be treated more uniformly.

Further, according to another liquid processing method of the present invention, a substrate row formed by arranging a plurality of substrates at intervals with their surfaces facing each other is arranged in the liquid as an object to be processed, A liquid processing method of introducing bubbles to perform processing, comprising a liquid return path in which the liquid is taken in from an upper portion of a region where the substrate rows are arranged and the liquid is sent out toward a lower portion of the region. The liquid inlet and the liquid outlet of the liquid return path are arranged laterally in a direction orthogonal to the parallel direction of the substrates when viewed from the substrate row.

According to the present invention, when processing is performed on a substrate row in which a plurality of substrates are arranged in parallel, the liquid intake port and the liquid delivery port of the liquid return path are in a direction orthogonal to the parallel direction of the substrates when viewed from the substrate row. By arranging it laterally, the liquid can flow toward the liquid intake port of the liquid return path without being obstructed by the substrate even at a place sandwiched by the substrates inside the substrate row, It becomes possible for the liquid to flow out from the liquid delivery port of the return path toward the place sandwiched by the substrates without being substantially disturbed by the substrates. Therefore, the liquid can be smoothly made to flow in the region where the substrate rows are arranged without being retained, and the downward flow can be circulated through the liquid return path. Therefore, the processing can be made uniform.

In the present invention, it is preferable that a liquid flow from the upper part to the lower part of the region is forcibly formed in the liquid return path.

According to the present invention, by forcibly forming the liquid flow from the upper part to the lower part of the area in the liquid return path, the downward flow generated in the area can be further reduced, or the liquid can be lowered into the area. Since it is possible to prevent the flow, it is possible to perform a more uniform treatment on the object to be treated.

In the present invention, it is preferable that the liquid is taken into the liquid return path from a position higher than the upper end of the object to be processed.

According to the present invention, by taking the liquid into the liquid return path from a position higher than the upper end of the object to be processed, the flow of the liquid from the region into the liquid return path affects the upper part of the object to be processed. Since it becomes difficult to do so, it becomes possible to perform more uniform treatment on the object to be treated.

In the present invention, it is preferable that the liquid is sent out from the liquid return path at a position lower than the lower end of the object to be processed.

According to the present invention, by sending the liquid from the liquid return path at a position lower than the lower end of the object to be processed, the flow of the liquid from the liquid return path into the region is less likely to affect the lower part of the object to be processed. Therefore, it becomes possible to perform a more uniform treatment on the object to be treated.

In each of the above inventions, it is preferable to introduce bubbles only in the area where the object to be treated is arranged, and in particular, to introduce bubbles below the object to be treated in the area. It is desirable to do.

Next, the liquid processing apparatus of the present invention has a processing tank for containing a liquid and a bubble introducing means having a bubble introducing port inside the processing tank, and the bubble is introduced into the processing tank. A liquid return path configured to connect the upper part and the lower part of the region is provided at a position planarly separated from the region above the bubble introduction port of the means.

According to the present invention, the liquid is contained in the processing tank, and the bubbles rise in the liquid by introducing the bubbles from the bubble introducing port. Therefore, an ascending flow is generated in the region, and the ascending flow is generated. Along with this, a downward flow is generated in the liquid return path provided outside the area. As described above, since the downflow is less likely to occur in the area by the amount of the downflow generated in the liquid return path, and the bubbles can be raised more uniformly in the area, the object to be processed is arranged in the area. As a result, it becomes possible to improve the uniformity of processing on the object to be processed.

In the present invention, it is preferable to have a liquid flow forming means for forcibly forming the flow of the liquid from the upper part to the lower part of the region in the liquid return path.

According to the present invention, the liquid flow forming means forcibly forms the liquid flow in the liquid return path, so that the downflow is less likely to occur in the region, so that the processing of the object to be processed can be performed. The uniformity can be further improved.

In the present invention, the upper communication port of the liquid return path is preferably higher than the upper end of the object to be treated.

According to the present invention, the liquid is introduced from the inside of the region into the liquid return path by taking the liquid into the liquid return path from the upper communication port (liquid intake port) located at a position higher than the upper end of the object to be processed. Since it is less likely that the above flow will affect the upper part of the object to be processed, it becomes possible to perform more uniform processing on the object to be processed.

In the present invention, the lower communication port of the liquid return path is preferably lower than the lower end of the object to be treated.

According to the present invention, the liquid is sent from the liquid return path through the lower communication port (liquid delivery port) located at a position lower than the lower end of the object to be processed, so that the liquid flows from the liquid return path into the region. Is less likely to affect the lower part of the object to be processed, so that it is possible to perform more uniform processing on the object to be processed.

Next, a method of manufacturing a flat panel display device of the present invention is a method of manufacturing a flat panel display device having at least one substrate, and in the manufacturing process,
A substrate is placed in a liquid, and a liquid treatment step of introducing bubbles into the liquid to perform treatment is performed. In the liquid treatment step, the liquid is taken in from an upper portion of an area where the substrate is placed, It is performed in a state in which a liquid return path for sending the liquid toward the lower part of is configured.

According to the present invention, the upward flow of the liquid is generated by the introduction of the bubbles, and the downward flow is also generated by the upward flow. However, the liquid is taken in from the upper part of the region where the substrate is arranged and is directed to the lower part of the region. By configuring the liquid return path through which the liquid is sent out, the downward flow corresponding to the upward flow passes through the liquid return path, and the downward flow is less likely to occur in the area where the substrate is arranged. ,as a result,
It becomes difficult to generate a place where bubbles are eliminated in the above area. Therefore, the variation in the treatment effect due to the bubbles in the region is reduced, so that the object to be treated can be treated more uniformly.

Another method of manufacturing a flat panel display device according to the present invention is a method of manufacturing a flat panel display device having at least one substrate, and the surfaces of a plurality of substrates are opposed to each other at intervals. Arranging substrate rows arranged in parallel in a posture in a liquid, and having a liquid processing step of introducing bubbles into the liquid to perform processing, the liquid is taken in from the upper part of the region where the substrate rows are arranged, A liquid return path for sending the liquid toward the lower part of the region is configured,
The liquid intake port and the liquid outlet port of the liquid return path are arranged laterally in the direction orthogonal to the parallel direction of the substrates when viewed from the substrate row.

According to the present invention, when bubbles are introduced into the liquid, the bubbles rise in the liquid to generate an upward flow, and a downward flow is generated along with the upward flow. It is possible to reduce the downflow generated in the region due to the downflow, or to prevent the downflow from occurring. Here, since the liquid intake port and the liquid outlet port of the liquid return path are arranged laterally with respect to the substrate row in the direction orthogonal to the parallel direction of the substrates, they are sandwiched between the substrates inside the substrate row. Even at a high temperature, the liquid can flow toward the liquid intake port of the liquid return path without being obstructed by the substrate, and the liquid can be flowed from the liquid delivery port of the liquid return path to the substrate without being obstructed by the substrate. It will be possible to flow toward the place where it is sandwiched. Therefore, the liquid can be smoothly made to flow in the region where the substrate rows are arranged without being retained, and the downward flow can be circulated through the liquid return path. Therefore, the processing can be made uniform.

In the present invention, it is preferable to forcibly form a liquid flow from the upper part to the lower part of the region in the liquid return path.

According to the present invention, by forcibly forming the liquid flow from the upper part to the lower part of the area in the liquid return path, the downward flow generated in the area can be further reduced, or the downward flow in the area can be reduced. Since it is possible to prevent the flow from being generated, it becomes possible to perform more uniform treatment on the substrate.

In the present invention, it is preferable that the liquid is taken into the liquid return path from a position higher than the upper end of the substrate.

According to the present invention, by taking the liquid into the liquid return path from a position higher than the upper end of the substrate,
The flow of the liquid from the inside of the region to the inside of the liquid return path hardly affects the upper portion of the substrate, so that the substrate can be subjected to more uniform treatment.

In the present invention, it is preferable that the liquid is sent out from the liquid return path at a position lower than the lower end of the substrate.

According to the present invention, by sending out the liquid from the liquid return path at a position lower than the lower end of the substrate, the flow of the liquid from the liquid return path into the region is less likely to affect the lower part of the substrate. It becomes possible to perform a more uniform treatment.

In each of the above inventions, it is preferable to introduce the bubbles only in the region where the substrate rows are arranged, and particularly, it is preferable to introduce the bubbles in the region below the substrate columns. desirable.

In each of the above inventions, the treatment using the liquid includes a cleaning treatment. Further, it can be applied to etching treatment, plating treatment, coating treatment and the like. Although the liquid varies depending on the content of the treatment, water, alcohol, other solvent or the like can be used especially in the washing treatment.

[0038]

BEST MODE FOR CARRYING OUT THE INVENTION Next, embodiments of a liquid processing method, a liquid processing apparatus and a method for manufacturing a flat panel display device according to the present invention will be described in detail with reference to the accompanying drawings.

[First Embodiment] FIG. 1 is a schematic perspective view schematically showing a main part of a cleaning apparatus 20 which is an embodiment of a liquid processing apparatus of the present invention. The cleaning device 20 has a cleaning tank 21 corresponding to the processing tank and a bubble introducing device 22. The bubble introducing device 22 is arranged on the inner bottom portion of the cleaning tank 21, and a large number of fine bubble introducing ports 22a are formed on the surface thereof. An air supply pipe 22b is connected to the bubble introduction device 22 so that the gas supplied through the air supply pipe 22b becomes fine bubbles from the bubble introduction port 22a and is introduced into the water stored in the cleaning tank 21. Is configured. In addition,
The bubble introducer is not limited to the one shown in the figure, but may have various structures such as one having a large number of holes formed in the peripheral wall of the tube, one using a porous material, and the like.

Liquid flow forming means 28 are attached to the inner surfaces of a pair of opposing outer walls of the cleaning tank 21, and these liquid flow forming means 28 forcibly form a downward water flow. Has a fan 28a.

The cleaning device 20 of this embodiment is for cleaning a large-sized substrate 110 made of glass or the like for manufacturing a liquid crystal display panel which constitutes a liquid crystal display device. The substrate 110 is held in the cassette 2 and placed in the cleaning tank 21. The cassette 2 is configured so that a large number of substrates 110 can be accommodated while maintaining a space between them and vertically supported. This cassette 2
Has a pair of side wall portions 2a on the sides of the mounted substrates 110 in the direction orthogonal to the parallel direction.

FIG. 2A shows the cleaning device 2 of this embodiment.
A cleaning method using 0 is shown. In this embodiment, the cleaning tank 2
1. Put pure water 3 in 1 and put the above cassette 2 in this pure water 3.
The plurality of substrates 110 mounted on the substrate are immersed. When the cassette 2 is arranged in the cleaning tank 21 in this way, the side wall portion 2a of the cassette 2 causes the processing area A in which a plurality of substrates 110 arranged in parallel are arranged in the cleaning tank 21.
And a liquid return path B disposed on both sides of the processing region A (on both sides of the substrate 110 in the direction orthogonal to the parallel direction). Here, the bubble introducing port of the bubble introducing device 22 is limitedly arranged in the processing area A.

Then, as shown in FIG. 2A, the gas (air, nitrogen gas, etc.) is supplied to the bubble introducing device 22 to generate the bubble 4 from the bubble introducing device 22. The bubbles 4 are introduced into the pure water 3 from the bubble introducer 22 and rise in the pure water 3 in the processing area A. At this time, bubbles 4
As a result, a rising water flow is generated, and the surface of the substrate 110 is cleaned by the bubbles 4 themselves and the rising water flow generated thereby.

Here, the fan 2 of the liquid flow forming means 28
When 8a rotates and a downward flow is forcibly formed in the liquid return path B, the rising water flow generated in the processing area A moves left and right near the water surface and is taken into the liquid return path B. It descends and is delivered to the bottom of the processing area A again. As described above, in the present embodiment, since the descending water flow is generated in the liquid return path B, the descending water flow is less likely to occur in the processing area A. In particular, the liquid flow forming means 2
By forcibly forming the descending water flow in the liquid return path B by means of 8, it is possible to prevent the descending water flow from occurring in the processing area A. Therefore, a place where bubbles are removed by the descending water flow is unlikely to occur in the processing area A, and thus the cleaning effect on the plurality of substrates 110 is unlikely to vary depending on the place, and uniform cleaning can be performed.

Next, with reference to FIG. 3, the overall structure of the cleaning apparatus 20 for carrying out the above cleaning method will be described. In the cleaning device 20, the cleaning tank 21 has
Drain valve 21a provided in the discharge path for discharging the water in the tank
An overflow tank 21b for receiving and discharging water overflowing from the upper part of the tank, and a water level sensor 21c for detecting the water level in the tank are provided. Further, above the cleaning tank 21, a drive mechanism 23 for raising and lowering the cassette 2 to introduce the substrate 110 into the cleaning tank 21 and pull it up from the cleaning tank 21 is provided. Further, in this apparatus, a water supply source 25 for supplying the pure water 3 into the cleaning tank 21 and a water supply valve 25a capable of controlling whether or not the pure water 3 is supplied from the water supply source 25 to the cleaning tank 21. And are provided. An air supply pipe for supplying gas from the air supply source 26 via the air supply valve 26a and the flow meter 26b is connected to the bubble introduction device 22.

The cleaning device 20 is provided with a control unit 24 composed of a microprocessor unit (MPU) or the like. The control unit 24 receives output signals from the water level sensor 21c and the flow meter 26b, and depending on the situation,
The liquid flow forming means 28, the drain valve 21a, and the water supply valve 25 described above.
a, the air supply valve 26a, and the drive mechanism 23 are appropriately controlled. An input operation unit 27 is connected to the control unit 24, and an operation parameter of the control unit 24 can be input from the input operation unit 27. For example, the operating parameters of the control unit 24 include the drive power amount of the liquid flow forming unit 28 (liquid flow forming capacity), the amount of pure water supplied to the processing tank 21 (water level), and the bubble introducing unit 22. Gas flow rate. As described above, since various operation parameters can be input to the control unit 24 from the input operation unit 27, the cleaning process can be automatically performed in an appropriate operation mode.

[Second Embodiment] Next, a second embodiment according to the present invention will be described with reference to FIG. In this embodiment, a plurality of substrates 110 similar to those described above are mounted in a basket-shaped cassette 2 ′ having no side wall 2a of the cassette 2 and introduced into the cleaning tank 21 ′. Cleaning tank 21 '
Has partition walls 21a 'on both left and right sides of the processing area A for accommodating the cassette 2', and a liquid return path B is formed outside the partition wall 21a '. Further, as in the first embodiment, the liquid flow forming means 28 is attached to the inner surface of the outer wall of the cleaning tank 21 '.

In this embodiment, since the cleaning tank 21 'itself is provided with the liquid return path B separated from the processing area A, whichever cassette the substrate 110 is housed in is the same as in the first embodiment. Can be processed.

The upper end of the partition wall 21a 'is the processing area A.
Is located higher than the upper end of the substrate 110 inside the partition wall 2
Since the lower end of 1a ′ is located lower than the lower end of the substrate 110 in the processing area A, the water flow flowing from the processing area A into the liquid return path B and the liquid return path B from the processing area A.
The upper and lower parts of the substrate 110 are affected by the water flow sent in, and the treatment can be performed so that insufficient cleaning does not occur. More specifically, the above-described horizontally flowing water flow imparts a bias to the distribution of the bubbles 4 discharged from the bubble introducing device 22, so that the cleaning effect due to the bubbles may vary depending on the location. In the form, the water flow flowing horizontally is above the upper end of the substrate 110, or
Since it mainly occurs below the lower end of the substrate 110,
It becomes possible to perform more uniform cleaning.

[Third Embodiment] Next, a third embodiment of the present invention will be described with reference to FIG. In this embodiment, a pipe line 21a ″ is formed so as to communicate between the outer wall upper part and the outer wall lower part of the cleaning tank 21 ″ so as to project to the outside of the outer wall, and the pipe line 21a ″ is provided in the middle thereof. A liquid flow forming means 29 composed of a pump is attached. The liquid inlet of the pipe 21a ″ opens at the upper part of the processing area A formed in the main body of the cleaning tank, and the pipe 21
The liquid outlet of a ″ is opened at the lower part of the processing area A. The liquid flow forming means 29 operates so as to generate a descending water flow in the liquid return path B formed in the pipe line 21a ″.

This embodiment also has the same effects as those of the above embodiments. Here, as in the second embodiment, the liquid intake port of the conduit 21a ″ is connected to the substrate 110 in the processing area A.
Is preferably higher than the upper end of the substrate 21 and the liquid outlet of the conduit 21a ″ is lower than the lower end of the substrate 110 in the processing area A.

[Fourth Embodiment] Next, referring to FIG.
A fourth embodiment according to the present invention will be described. This 4th
The embodiment relates to the cleaning method and the cleaning apparatus for the substrate 110, as described above. In the cleaning device 30 of the present embodiment, as shown in FIG. 5, a bubble introducing device 32 similar to that of the first embodiment is arranged inside a cleaning tank 31. At the inner bottom of the cleaning tank 31, a quick drain valve 31a is provided at the connection with the drain pipe 33, and a water supply valve 31b is provided at the connection with the water supply pipe 34. Further, water level sensors 31c and 31d are attached to the cleaning tank 31.

In the cleaning tank 31, a cassette 2'on which the same substrate 110 as that in the first embodiment is mounted is suspended by a drive mechanism 35 so that it can be moved up and down. A shower nozzle 36 connected to a separately provided water supply system is arranged above the cleaning tank 31.

FIG. 7 shows a plan view of the cleaning tank 31. Figure 7
As shown in FIG. 7, the cleaning tank 31 has partition walls 31s on both sides in the direction orthogonal to the direction in which the plurality of substrates 110 mounted in the cassette 2 ′ are arranged in parallel (the left-right direction in FIG. 7). Liquid return paths B are formed outside the walls 31s, respectively. The partition wall 31s has openings (not shown) in the upper and lower portions of the processing tank 31, and these openings are the substrate 110.
Are the liquid intake port and the liquid outlet port of the liquid return path B with respect to the processing area A in which

When the substrate 110 is cleaned using the cleaning device 30, first, pure water 3 is supplied into the cleaning tank 31 via the water supply valve 31b to set the water level to the high level HL, and thereafter. The cassette 2'on which the substrate 110 is mounted is lowered by the drive mechanism 35 and immersed in the pure water 3 as shown. Then, cleaning is performed while introducing air bubbles as in the first embodiment.

After that, the rapid drain valve 31a is opened, the pure water 3 in the cleaning tank 31 is rapidly drained, the water level becomes the low level LL, and the entire substrate 110 is placed on the water surface. Then, pure water is supplied again through the water supply valve 31b to return the water level in the cleaning tank 31 to the high level HL. Then, again, cleaning is performed while introducing bubbles in the same manner as described above.

As described above, water supply, cleaning and drainage are repeated, and when the cleaning process is completed, the drive mechanism 35 pulls the cassette 2'upward and sprays pure water from the shower nozzle 36 onto the surface of the substrate 110. After washing, the cassette 2'is moved to the next step.

In this embodiment, the same effect as in the above embodiments can be obtained by the liquid return path B constituted by the partition wall 31s, but further, the pure water 3 is rapidly drained after the cleaning so that the substrate Since dust and the like attached to the surface of 110 can be removed together with pure water 3, substrate 110 can be cleaned in a shorter time.

[Manufacturing Method of Liquid Crystal Display Panel] FIG.
An outline of a manufacturing process of a liquid crystal display panel using the substrate 110 will be described. In this manufacturing method, ITO is formed on the inner surfaces of the large-sized substrates 110 and 120 shown in FIG.
An electrode pattern made of a transparent conductor such as (indium tin oxide) is formed by a sputtering method or a photolithography technique, and an alignment film is formed by coating on the electrode pattern. A predetermined alignment process (rubbing process or the like) is performed on the alignment film. Further, a color filter, a reflective layer, or the like is appropriately formed according to the structure of the manufactured liquid crystal panel. For example, when manufacturing a color display liquid crystal panel, a color filter is formed on the surface of the substrate, and then the electrode pattern is formed. When manufacturing a reflective liquid crystal panel (including a reflective transflective liquid crystal panel), a reflective layer is formed, a transparent insulating film is formed on the reflective layer, and then the electrode pattern is formed. in this case,
In some cases, instead of forming an electrode pattern made of a transparent conductor, a reflecting electrode that also serves as a reflecting layer and an electrode is formed.

In the above manufacturing process, the large-sized substrate 1
Various treatments such as a film forming technique such as sputtering and vapor deposition, a coating technique such as printing and spin coating, and an exposure treatment are performed on 10, 120. During such a process, a process of cleaning the large-sized substrates 110 and 120 is required. For example, large-sized substrates 110 and 120
There is a step of cleaning the substrates 110 and 120 in advance before forming the electrode pattern and the like on the surface of the substrate, patterning of the electrode pattern, patterning and peeling of the resist,
After the patterning (development) of the color filter and the patterning of the reflective layer, there is a step of cleaning the surfaces of the substrates 110 and 120 to remove the etching solution, the developing solution, the stripping solution, etc. used for the patterning. In such a cleaning process, in the present embodiment, the cleaning process is performed according to the first embodiment or the second embodiment.

After that, the substrate 110 and the substrate 120 are attached to each other via a seal material (not shown) to form the large-sized panel 100 shown in FIG. 6 (a). Then, scribe grooves 100x extending in the X direction in the drawing are engraved on the outer surfaces of the panel substrates 110 and 120 of the large-sized panel 100, and the panel substrates 110 and 1 extend along the scribe grooves 100x.
20 is broken, and a strip-shaped intermediate panel 130 shown in FIG. 6B is formed. Liquid crystal is injected into the intermediate panel 130 through the exposed opening of the sealing material, and then the opening of the sealing material is closed and the liquid crystal is sealed in the intermediate panel 130. Further, a scribe groove 100y extending in the Y direction in the drawing is formed on the intermediate panel 130, and the intermediate substrate 13 is formed along the scribe groove 100y.
The liquid crystal panel 140 shown in FIG. 6C is formed by breaking the parts 1,132.

The liquid crystal panel 140 formed as shown in FIG. 6C may also be washed before mounting a semiconductor chip or a flexible substrate.
Also in this case, it is preferable to replace the substrate 110 with the liquid crystal panel 140 and perform the cleaning process in the same manner as in the first and second embodiments.

FIG. 4 shows a plan perspective view of the liquid crystal panel 140 configured as described above. LCD panel 140
The substrates 141 and 142 are bonded to each other by a seal material 143, and liquid crystal is sealed between them. Here, the sealing material 143 is provided with an opening 143 a for injecting liquid crystal, and the opening 143 a is closed by a sealing material 145. The substrate 1 is provided on the inner surface of the substrate 141.
The electrodes 111, the wirings 112, and the input terminals 113 provided in the ten electrode patterns are arranged. Electrode 11
An alignment film is formed on the surface of 1. Also, the substrate 1
The electrodes 121, the wirings 122, and the input terminals 123 provided in the electrode pattern of the substrate 120 are arranged also on the inner surface of the substrate 120, and the alignment film is formed on the surface of the electrodes 121. Here, the electrodes 111 and 121 are configured in a liquid crystal enclosing area surrounded by the sealing material 143, and the wirings 112 and 122 are provided in the liquid crystal enclosing area so that the substrate 112 extends.
41T and 142T are pulled out to the surface, and the tips thereof are the input terminal portions 113 and 123.

The liquid processing method, the liquid processing apparatus, and the flat panel display manufacturing method of the present invention are not limited to the above-described illustrated examples, and various modifications can be made without departing from the scope of the present invention. Of course, it is possible to add. For example, in each of the above embodiments, an example in which the method of the present invention is applied in a single processing step (cleaning step) has been shown, but the present invention shows that one processing step in a processing step having a plurality of processing steps. May be applied only to. For example, in the above-described cleaning method, different cleaning tanks are used in a plurality of stages such as the first cleaning stage, the second cleaning stage (first rinse stage), and the third cleaning stage (second rinse stage). In some cases, the present invention may be applied in any of the above steps.

Further, the present invention is applicable not only to the above-mentioned cleaning step but also to the treatment using various liquids such as dipping treatment for stripping the resist, various etching treatments and coating treatments. The same applies.

[0066]

As described above, according to the present invention,
When performing liquid processing such as washing on the object to be processed, the uniformity of processing can be improved.

[Brief description of drawings]

FIG. 1 is a schematic perspective view showing a structure of a main part of a cleaning device according to a first embodiment of the present invention.

2A and 2B are an explanatory view showing a cleaning method of the first embodiment, an explanatory view showing a cleaning method of the second embodiment, and FIG.
9A and 9B are explanatory views (c) showing the cleaning method of the third embodiment.

FIG. 3 is a schematic configuration block diagram showing an overall configuration of the cleaning apparatus of the first embodiment.

FIG. 4 is a schematic perspective plan view of a liquid crystal display panel formed by the method for manufacturing a liquid crystal display device according to the present invention.

FIG. 5 is a schematic perspective view showing a structure of a main part of a cleaning device according to a fourth embodiment of the present invention.

FIG. 6 is schematic perspective views (a) to (c) showing the overall schematic steps of the method for manufacturing a liquid crystal display device according to the present invention.

FIG. 7 is a schematic plan view schematically showing the structure of a cleaning tank in the cleaning device of the fourth embodiment.

FIG. 8 is a schematic explanatory cross-sectional view showing a conventional cleaning method (a).
3B is a schematic explanatory cross-sectional view showing a cross section orthogonal to the cross section shown in FIGS.

[Explanation of symbols]

2,2 'cassette 20,30 Cleaning device 21,21 ', 21 ", 31 Cleaning tank 21a 'partition wall 21a "pipeline 22,32 Bubble introducer 28, 29 Liquid flow forming means 28a fan A processing area B Liquid return path 110,120 substrate 140 LCD panel

Claims (14)

[Claims] 1. A liquid processing method in which an object to be processed is placed in a liquid and bubbles are introduced into the liquid to perform processing, wherein the liquid is taken in from an upper portion of a region where the object to be processed is placed. The liquid treatment method, wherein the treatment is performed in a state in which a liquid return path for sending the liquid toward the lower part of the region is configured. 2. A liquid treatment in which a substrate row in which a plurality of substrates are arranged in parallel with a surface facing each other at intervals is placed in a liquid as an object to be treated, and bubbles are introduced into the liquid to perform the treatment. A method, wherein the liquid is taken in from the upper part of the region where the substrate row is arranged, and a liquid return path is formed in which the liquid is sent out toward the lower part of the region, and a liquid intake port of the liquid return path and A liquid processing method, wherein the liquid delivery port is arranged laterally in a direction orthogonal to the parallel direction of the substrates when viewed from the substrate row. 3. The liquid processing method according to claim 1, wherein a liquid flow from the upper part to the lower part of the region is forcibly formed in the liquid return path. 4. The liquid processing method according to claim 1, wherein the liquid is taken into the liquid return path from a position higher than an upper end of the object to be processed. 5. The liquid processing method according to claim 1, wherein the liquid is sent out from the liquid return path at a position lower than a lower end of the object to be processed. 6. A treatment tank containing a liquid, and a bubble introduction means having a bubble introduction port inside the treatment tank, wherein the treatment tank is provided above the bubble introduction port of the bubble introduction means. A liquid processing apparatus, wherein a liquid return path configured to connect an upper portion and a lower portion of the region is provided at a position deviated from a certain region in a plane. 7. The liquid treatment according to claim 6, further comprising a liquid flow forming unit for forcibly forming a flow of the liquid from the upper part to the lower part of the region in the liquid return path. apparatus. 8. The liquid processing apparatus according to claim 6, wherein an upper communication port of the liquid return path is higher than an upper end of the object to be processed. 9. The liquid processing apparatus according to claim 6, wherein a lower communication port of the liquid return path is lower than a lower end of the object to be processed. 10. A method of manufacturing a flat panel display device having at least one substrate, comprising a liquid processing step of placing a substrate in a liquid and introducing bubbles into the liquid to perform processing in the manufacturing process. The liquid treatment step is performed in a state in which a liquid return path is formed in which the liquid is taken in from an upper portion of the region where the substrate is arranged and the liquid is sent out toward a lower portion of the region. And a method for manufacturing a flat panel display device. 11. A method of manufacturing a flat panel display device having at least one substrate, wherein a substrate row formed by arranging a plurality of substrates at a distance with their surfaces facing each other is arranged in a liquid. , A liquid treatment step of introducing a bubble into the liquid to perform treatment, wherein the liquid is taken in from an upper portion of the region where the substrate rows are arranged, and the liquid is discharged toward the lower portion of the region. A flat panel display device, which constitutes a path, and in which the liquid return path liquid inlet and liquid outlet are arranged laterally in a direction orthogonal to the parallel direction of the substrates when viewed from the substrate row. Manufacturing method. 12. The method of manufacturing a flat panel display device according to claim 10, wherein a liquid flow from the upper part to the lower part of the region is forcibly formed in the liquid return path. . 13. The manufacturing of a flat panel display device according to claim 10, wherein the liquid is taken into the liquid return path from a position higher than an upper end of the substrate. Method. 14. The method of manufacturing a flat panel display device according to claim 10, wherein the liquid is sent out from the liquid return path at a position lower than a lower end of the substrate. .