JP2003093982A - Method and apparatus for treating with liquid and method for manufacturing flat panel display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To uniformly treat with liquid the object to be treated by introducing air bubbles into the liquid in which the object to be treated is immersed and reducing localization of the water current to be produced by the introduced air bubbles. SOLUTION: A substrate 110 is cleaned by introducing air bubbles 4 into a cleaning tank 21 from an air bubble introducing instrument 22 for the prescribed time in such a state that the substrate 110 is disposed in the tank 21 in which purified water 3 is housed (step A to introduce air bubbles). The introduction of the bubbles 4 from the instrument 22 is stopped for the prescribed time (step B to stop introducing air bubbles). The substrate 110 is cleaned for the prescribed time by introducing the bubbles 4 from the instrument 22 again (step A).

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid processing method, a liquid processing apparatus, and a method for manufacturing a flat panel display device, and more particularly to a liquid suitable for processing various substrates using a liquid. Regarding processing technology.

[0002]

2. Description of the Related Art Generally, various flat panel display devices such as liquid crystal display devices, electroluminescent display devices, and plasma display devices have been developed. What is common to these flat panel display devices is that they each include at least one substrate arranged in parallel to the display surface. In the manufacturing process of these flat panel display devices, there are various liquid processing steps in which a substrate is immersed in a liquid for processing, such as cleaning, etching and coating of the substrate.

For example, during a manufacturing process of a liquid crystal display device, a step of cleaning a liquid crystal display panel formed by laminating a pair of substrates, or a single substrate made of glass or the like before forming the liquid crystal display panel is used. There is a cleaning process. For example, in the case of the latter substrate cleaning step, as shown in FIG.
As shown in (a), the cleaning tank 1 is mounted in a cleaning cassette (not shown) so that a large number of substrates 1 are arranged in a vertically standing posture and spaced from each other.
It is introduced into the water in 1. Then, a large number of bubbles are generated from the bubble introduction port of the bubble generator 12 by supplying a gas such as air or nitrogen gas into the bubble generator 12 arranged in the cleaning tank 11. In this state, the substrate surface is cleaned by the bubbles coming in and out of the substrate surface in the process of many bubbles rising in water,
The cleaning effect of the substrate is further enhanced by the rising water flow generated by the rising of the bubbles.

[0004]

However, in the conventional substrate cleaning method described above, when the bubbles 2 are introduced into the water as described above, an ascending water flow is generated as the bubbles rise, but this ascending water flow is generated. As a result, a descending water flow also occurs,
As shown in (b), the descending water flow is concentrated between the substrates 1 at a specific place D in the cleaning tank 11,
Since air bubbles are reduced at the location D, there is a problem that unevenness occurs in cleaning the substrate.

The above-mentioned problems are not limited to the cleaning method, and are generally applied to a liquid processing method in which air bubbles are introduced into a liquid and various kinds of processing are performed while the object to be processed is immersed in the liquid. Exists as well.

Therefore, the present invention solves the above-mentioned problems, and when the liquid treatment is performed in which bubbles are introduced while the object to be treated is immersed in the liquid, the deviation of the water flow caused by the bubbles is caused. By reducing the above, it is intended to make the processing uniform.

[0007]

In order to solve the above-mentioned problems, the liquid processing method of the present invention provides a method in which an object to be processed is immersed in a liquid, and in this state, air bubbles are introduced into the liquid. The method is characterized in that an introducing step, a stopping step of stopping the introduction of the bubbles, and a bubble introducing step of introducing the bubbles again are sequentially performed. In other words, the present invention introduces air bubbles into the liquid intermittently.

According to the present invention, the bubbles are introduced into the liquid in the first bubble introducing step, and the treatment of the object to be processed is promoted by the bubbles, but thereafter, the introduction of the bubbles is stopped in the stopping step. , The flow of the liquid caused by the introduction of the bubbles is weakened or eliminated, and then the bubbles are introduced into the liquid by the bubble introduction step again. Therefore, the steadiness of the flow of the liquid caused by the introduction of the bubbles is lost, so that the unevenness of the flow (in particular, the concentration of the downflow) is reduced, and as a result, it is possible to make the liquid treatment uniform for the object to be treated. Become.

In this method, the bubble introducing step and the stopping step may be alternately repeated a plurality of times. The number of repetitions can be appropriately determined in consideration of the degree of liquid treatment.

In order to enhance the above effect by providing the stop step, the duration of the stop step is
It is preferable that at least the time required for all of the bubbles introduced in the previous bubble introduction step to reach the liquid surface is exceeded.

In the present invention, the duration of the bubble introduction step is preferably equal to or less than the time during which the position of the downward flow generated by the bubbles in the liquid is substantially stationary.

According to the present invention, the duration of the bubble introduction step is equal to or less than the time at which the position of the downflow generated by the bubbles in the liquid is substantially stationary, so that the position of the downflow is stationary. Since it is possible to avoid the non-uniformity of processing due to the above, it is possible to further improve the uniformity of liquid processing.

In the present invention, it is preferable that the duration of the stopping step is equal to or longer than the time when the downward flow generated in the liquid by the bubble introduction step substantially disappears.

According to the present invention, due to the presence of the above-mentioned stop step, the downward flow generated by the bubble introduction step disappears substantially once, so that in the subsequent bubble introduction step, the liquid flow by the bubbles is newly added from the beginning. Since the flow is formed, the flow is independently formed at each bubble introduction step without being affected by the flow generated at the previous bubble introduction step, so that the flow deviation is reduced as a whole. Therefore, the uniformity of liquid treatment can be further improved.

In the present invention, the duration of the bubble introducing step is preferably about 7-18 seconds. If the duration of the bubble introduction step is shorter than the above range, it is not possible to obtain a sufficient treatment effect by the bubbles, and if it is longer than the above range, the flow of the liquid due to the bubbles tends to become stationary, The bias reduces the uniformity of processing.

In the present invention, the duration of the stopping step is preferably about 3 to 7 seconds. If the duration of the stop step is shorter than the above range, the flow of liquid generated by the bubbles introduced in the previous bubble introduction step does not weaken sufficiently in the stop step. Since the same flow as in the introduction step is likely to occur in the next bubble introduction step, it becomes difficult to reduce the deviation in the liquid flow. Conversely, if it is longer than the above range, the wasteful time increases and the processing time increases. Comes to take.

Next, in the liquid processing apparatus of the present invention, a treatment tank, a bubble introduction means having a bubble introduction port inside the treatment tank, a bubble introduction step by the bubble introduction means, and a bubble introduction by the bubble introduction means. And a control means for controlling the bubble introducing means for sequentially performing the bubble introducing step.

According to the present invention, by controlling the bubble introducing means by the control means, the bubble introducing step of introducing bubbles from the bubble introducing port in a state where a predetermined liquid is put in the processing tank, and the introduction of bubbles are stopped. It is possible to sequentially perform the stop step and the bubble introduction step, which can reduce the deviation of the liquid flow caused by the introduction of the bubbles, and thus it is possible to make the treatment of the object to be treated uniform. become.

In the present invention, the control means may be configured to be able to set the duration of the bubble introducing step, the duration of the stopping step, or the number of repetitions of the bubble introducing step and the stopping step. preferable.

According to the present invention, the duration of the bubble introducing step, the duration of the stopping step, or the number of repetitions of the bubble introducing step and the stopping step can be set by the control means. It is possible to adjust the degree of bubble introduction action according to the material, the degree of treatment, the size of the treatment tank, the treatment time, and the like.

Next, a method of manufacturing a flat panel display device according to the present invention is a method of manufacturing a flat panel display device having at least one substrate, and in the manufacturing process,
With the substrate immersed in a liquid, in this state,
The substrate is processed by sequentially performing a bubble introducing step of introducing bubbles into the liquid, a stopping step of stopping the introduction of the bubbles, and a bubble introducing step of introducing the bubbles again. .

According to the present invention, the bubbles are introduced into the liquid in the first bubble introducing step, and the treatment of the substrate is promoted by the bubbles, but thereafter, the introduction of the bubbles is stopped in the stopping step. The flow of the liquid caused by the introduction of the liquid is weakened or eliminated, and then the bubbles are introduced into the liquid by the bubble introducing step again. Therefore, the steadiness of the flow of the liquid generated by the introduction of the bubbles is lost, and the deviation of the flow is reduced, and as a result, it is possible to make the liquid processing uniform on the substrate.

Here, the liquid processing for the above substrate is
The treatment may be performed using a liquid on the substrate alone before forming the flat panel, or may be the treatment on the substrate that is a part of the panel after forming the flat panel. In this method, the bubble introducing step and the stopping step may be alternately repeated a plurality of times. The number of repetitions can be appropriately determined in consideration of the degree of liquid treatment.

In order to enhance the above effect by providing the stop step, the duration of the stop step is
It is preferable that at least the time required for all of the bubbles introduced in the previous bubble introduction step to reach the liquid surface is exceeded.

In the present invention, the duration of the bubble introduction step is preferably equal to or less than the time at which the position of the downward flow generated by the bubbles in the liquid is substantially stationary.

According to the present invention, the duration of the bubble introduction step is equal to or less than the time at which the position of the downflow generated by the bubbles in the liquid is substantially stationary, so that the position of the downflow is stationary. Since it is possible to avoid the non-uniformity of processing due to the above, it is possible to further improve the uniformity of liquid processing.

In the present invention, it is preferable that the duration of the stopping step is equal to or longer than the time when the downward flow generated in the liquid by the bubble introducing step substantially disappears.

According to the present invention, due to the existence of the above-mentioned stop step, the downward flow generated by the bubble introduction step disappears substantially once. Therefore, in the subsequent bubble introduction step, the liquid flow due to the bubbles is newly added from the beginning. Since the flow is formed, the flow is independently formed at each bubble introduction step without being affected by the flow generated at the previous bubble introduction step, so that the flow deviation is reduced as a whole. Therefore, the uniformity of liquid treatment can be further improved.

In the present invention, the duration of the bubble introducing step is preferably about 7-18 seconds. If the duration of the bubble introduction step is shorter than the above range, it is not possible to obtain a sufficient treatment effect by the bubbles, and if it is longer than the above range, the flow of the liquid due to the bubbles tends to become stationary, The bias reduces the uniformity of processing.

In the present invention, the duration of the stopping step is preferably about 3 to 7 seconds. If the duration of the stop step is shorter than the above range, the flow of liquid generated by the bubbles introduced in the previous bubble introduction step does not weaken sufficiently in the stop step. Since it is more likely that the same flow as in the introduction step will occur in the next bubble introduction step, it becomes difficult to reduce the bias in the flow of the liquid, and conversely, if it is longer than the above range, wasteful time increases. It takes time to process.

In each of the above inventions, the treatment using the liquid includes a washing treatment. Further, it can be applied to etching treatment, plating treatment, coating treatment and the like. Although the liquid varies depending on the content of the treatment, water, alcohol, other solvent or the like can be used especially in the washing treatment.

[0032]

BEST MODE FOR CARRYING OUT THE INVENTION Next, embodiments of a liquid processing method, a liquid processing apparatus and a method for manufacturing a flat panel display device according to the present invention will be described in detail with reference to the accompanying drawings.

[First Embodiment] FIG. 1 is a schematic perspective view schematically showing a main part of a cleaning apparatus 20 which is an embodiment of a liquid processing apparatus of the present invention. The cleaning device 20 has a cleaning tank 21 corresponding to the processing tank and a bubble introducing device 22. The bubble introducing device 22 is arranged on the inner bottom portion of the cleaning tank 21, and a large number of fine bubble introducing ports 22a are formed on the surface thereof. An air supply pipe 22b is connected to the bubble introduction device 22 so that the gas supplied through the air supply pipe 22b becomes fine bubbles from the bubble introduction port 22a and is introduced into the water stored in the cleaning tank 21. Is configured. In addition,
The bubble introducer is not limited to the one shown in the figure, but may have various structures such as one having a large number of holes formed in the peripheral wall of the tube, one using a porous material, and the like.

The cleaning device 20 of this embodiment is for cleaning a large-sized substrate 110 made of glass or the like for manufacturing a liquid crystal display panel which constitutes a liquid crystal display device. The substrate 110 is held in the cassette 2 and placed in the cleaning tank 21. The cassette 2 is configured so that a large number of substrates 110 can be accommodated while maintaining a space between them and vertically supported.

2A to 2C show the steps of the cleaning method of this embodiment. In this embodiment, the cleaning tank 2
1. Put pure water 3 in 1 and put the above cassette 2 in this pure water 3.
The plurality of substrates 110 mounted on the substrate are immersed. Then, as shown in FIG. 2A, in the first bubble introducing step A, by supplying a gas (air, nitrogen gas or the like) to the bubble introducing device 22,
To generate bubbles 4. The bubbles 4 are introduced into the pure water 3 from the bubble introducer 22 and rise in the pure water 3. At this time,
A rising water flow is generated as the bubbles 4 rise, and the substrate 110 is generated by the bubbles 4 themselves and the rising water flow generated thereby.
Surface is cleaned. The bubble introduction step A is usually continued for about 10 to 15 seconds, but the duration is appropriately adjusted depending on the size of the cleaning tank 21, the amount of bubbles 4 generated, the amount of pure water 3 and the like. When an ascending water flow is generated as the bubbles 4 rise, a descending water flow also occurs correspondingly. However, the above-mentioned duration is such that the bubbles are introduced before the descending water flow is localized at a certain place in the cleaning tank 21. It is preferable that the step A is set to end.

The bubble introducing step A is terminated by stopping the supply of gas to the bubble introducing device 22, and
The procedure moves to the stop step B shown in (b). In this stopping step B, new bubbles 4 are not generated in the bubble introducer 22, so when all the bubbles 4 already existing in the cleaning tank 21 disappear on the surface of the pure water 3, the pure water 3 rises. The water flow and the descending water flow are gradually weakened until the water flow almost disappears. The duration of the stop step B is usually set to about 5 seconds, but the duration is appropriately adjusted depending on the size of the cleaning tank 21, the amount of bubbles 4, the amount of pure water 3 and the like. To be done. The above continuation time is preferably longer than the time when all the bubbles 4 generated in the previous bubble introduction step A reach the water surface, and in particular, is set longer than the time when the descending water flow substantially disappears. Is desirable.

Next, the gas is again supplied to the bubble introducing device 22, and the bubble introducing step A is performed again. In this bubble introducing step A, the bubbles 4 are again introduced into the pure water 3 from the bubble introducing device 22, and the rising water flow and the descending water flow are generated by the rising of the bubbles 4. At this time, when the ascending water flow and the descending water flow generated in the previous bubble introduction step A shown in FIG. 2 (a) are not sufficiently weakened in the stop step B shown in FIG. 2 (b) and remain, When bubbles 4 are generated in the subsequent bubble introduction step A shown in FIG. 2C, a new rising water flow and a new descending water flow are created so as to follow the rising water flow and the falling water flow generated in the previous bubble introduction step A. Occurs, so
Ascending and descending water flows concentrate in a specific place in a short time,
It becomes easy to become stationary. On the other hand, if the water flow generated in the previous bubble introduction step A is sufficiently weakened in the stop step B, the subsequent bubble introduction step A is not affected by the previous step A and is newly added in the subsequent bubble introduction step A. Since the water flow distribution is formed by following the same time course as the first due to the rise of the bubbles, it is possible to prevent the descending water flow from being concentrated at a specific place and being shortened until it becomes stationary.

In the above washing process, a descending water flow is generated by the ascending water flow generated by the ascending of the bubbles 4, but the bubbles 4 are eliminated at the place where this descending water flow exists, so that the bubbling effect cannot be obtained. The cleaning effect becomes weaker at the location. Generally, at the beginning of introducing bubbles,
Since the precipitation flow is dispersed and changes its location with time, the difference in the cleaning state from location to location does not increase so much, but as the time elapses, the downward flow gradually concentrates at a specific location and remains stationary. Will be transformed. The unevenness of the water flow due to the concentration and the standing of the descending water flow causes a great variation in the cleaning effect.

In this embodiment, the stop step B is provided between the first bubble introduction step A and the second bubble introduction step A as described above, so that the introduction of bubbles is temporarily stopped in the stop step B. As a result, since the water flow generated in the previous bubble introducing step A is weakened, it is configured to move to the subsequent bubble introducing step A,
The concentration and standing of the downward precipitation flow are less likely to occur, and the uneven cleaning effect can be reduced.

In the above embodiment, the bubble introducing step A,
Although it has been described that the cleaning is performed in the three steps of the stop step B and the bubble introduction step A, the bubble introduction step A and the stop step B may be alternately repeated a plurality of times. Next, with reference to FIG. 3, the overall configuration of the cleaning device 20 for carrying out the cleaning method will be described. In the cleaning device 20, the cleaning tank 21 has
Drain valve 21a provided in the discharge path for discharging the water in the tank
An overflow tank 21b for receiving and discharging water overflowing from the upper part of the tank, and a water level sensor 21c for detecting the water level in the tank are provided. Further, above the cleaning tank 21, a drive mechanism 23 for raising and lowering the cassette 2 to introduce the substrate 110 into the cleaning tank 21 and pull it up from the cleaning tank 21 is provided. Further, in this apparatus, a water supply source 25 for supplying the pure water 3 into the cleaning tank 21 and a water supply valve 25a capable of controlling whether or not the pure water 3 is supplied from the water supply source 25 to the cleaning tank 21. And are provided. An air supply pipe for supplying gas from the air supply source 26 via the air supply valve 26a and the flow meter 26b is connected to the bubble introduction device 22.

The cleaning device 20 is provided with a controller 24 composed of a microprocessor unit (MPU) or the like. The control unit 24 receives output signals from the water level sensor 21c and the flow meter 26b, and depending on the situation,
The drain valve 21a, the water supply valve 25a, the air supply valve 26a, and the drive mechanism 23 are configured to be appropriately controlled. An input operation unit 27 is connected to the control unit 24, and the input operation unit 2
It is configured so that the operating parameters of the control unit 24 can be input from 7. For example, the operating parameters of the control unit 24 include the duration of the bubble introducing step A, the duration of the stopping step B, the number of repetitions of the bubble introducing step A and the stopping step B, and the amount of pure water supplied to the processing tank 21. (Water level), the flow rate of the gas supplied to the bubble introducing device 22, and the like. As described above, since various operation parameters can be input to the control unit 24 from the input operation unit 27, the cleaning process can be automatically performed in an appropriate operation mode.

[Second Embodiment] Next, referring to FIG.
A second embodiment according to the present invention will be described. This second
The embodiment relates to the cleaning method and the cleaning apparatus for the substrate 110, as described above. In the cleaning device 30 of the present embodiment, as shown in FIG. 5, a bubble introducing device 32 similar to that of the first embodiment is arranged inside a cleaning tank 31. At the inner bottom of the cleaning tank 31, a quick drain valve 31a is provided at the connection with the drain pipe 33, and a water supply valve 31b is provided at the connection with the water supply pipe 34. Further, water level sensors 31c and 31d are attached to the cleaning tank 31.

In the cleaning tank 31, the cassette 2 having the same substrate 110 as that of the first embodiment is suspended by a drive mechanism 35 so that the cassette 2 can be moved up and down. A shower nozzle 36 connected to a separately provided water supply system is arranged above the cleaning tank 31.

When the substrate 110 is cleaned using this cleaning device 30, first, pure water 3 is supplied into the cleaning tank 31 via the water supply valve 31b to set the water level to a high level HL, and thereafter. The cassette 2 having the substrate 110 mounted thereon is lowered by the drive mechanism 35 and immersed in pure water 3 as shown in the figure. Then, similarly to the first embodiment, the bubble introducing step and the stopping step are repeatedly performed a predetermined number of times to perform cleaning.

After that, the rapid drain valve 31a is opened, the pure water 3 in the cleaning tank 31 is rapidly drained, the water level becomes the low level LL, and the entire substrate 110 is placed on the water surface. Then, pure water is supplied again through the water supply valve 31b to return the water level in the cleaning tank 31 to the high level HL. Then, again, the bubble introducing step and the stopping step are repeatedly performed in the same manner as described above.

As described above, water supply, cleaning and drainage are repeated, and when the cleaning process is completed, the drive mechanism 35 pulls up the cassette 2 and sprays pure water from the shower nozzle 36 to rinse the surface of the substrate 110. After the cassette 2
To the next step.

In this embodiment, the deionized water 3 can be quickly drained after cleaning to remove dust and the like adhering to the surface of the substrate 110 together with the deionized water 3. Therefore, the substrate 110 can be cleaned in a shorter time. can do.

[Manufacturing Method of Liquid Crystal Display Panel] FIG.
An outline of a manufacturing process of a liquid crystal display panel using the substrate 110 will be described. In this manufacturing method, ITO is formed on the inner surfaces of the large-sized substrates 110 and 120 shown in FIG.
An electrode pattern made of a transparent conductor such as (indium tin oxide) is formed by a sputtering method or a photolithography technique, and an alignment film is formed by coating on the electrode pattern. A predetermined alignment process (rubbing process or the like) is performed on the alignment film. Further, a color filter, a reflective layer, or the like is appropriately formed according to the structure of the manufactured liquid crystal panel. For example, when manufacturing a color display liquid crystal panel, a color filter is formed on the surface of the substrate, and then the electrode pattern is formed. When manufacturing a reflective liquid crystal panel (including a reflective transflective liquid crystal panel), a reflective layer is formed, a transparent insulating film is formed on the reflective layer, and then the electrode pattern is formed. in this case,
In some cases, instead of forming an electrode pattern made of a transparent conductor, a reflecting electrode that also serves as a reflecting layer and an electrode is formed.

In the above manufacturing process, the large-sized substrate 1
Various treatments such as a film forming technique such as sputtering and vapor deposition, a coating technique such as printing and spin coating, and an exposure treatment are performed on 10, 120. During such a process, a process of cleaning the large-sized substrates 110 and 120 is required. For example, large-sized substrates 110 and 120
There is a step of cleaning the substrates 110 and 120 in advance before forming the electrode pattern and the like on the surface of the substrate, patterning of the electrode pattern, patterning and peeling of the resist,
After the patterning (development) of the color filter and the patterning of the reflective layer, there is a step of cleaning the surfaces of the substrates 110 and 120 to remove the etching solution, the developing solution, the stripping solution, etc. used for the patterning. In such a cleaning process, in the present embodiment, the cleaning process is performed according to the first embodiment or the second embodiment.

After that, the substrate 110 and the substrate 120 are attached to each other via a sealing material (not shown) to form the large panel 100 shown in FIG. 6 (a). Then, scribe grooves 100x extending in the X direction in the drawing are engraved on the outer surfaces of the panel substrates 110 and 120 of the large-sized panel 100, and the panel substrates 110 and 1 extend along the scribe grooves 100x.
20 is broken, and a strip-shaped intermediate panel 130 shown in FIG. 6B is formed. Liquid crystal is injected into the intermediate panel 130 through the exposed opening of the sealing material, and then the opening of the sealing material is closed and the liquid crystal is sealed in the intermediate panel 130. Further, a scribe groove 100y extending in the Y direction in the drawing is formed on the intermediate panel 130, and the intermediate substrate 13 is formed along the scribe groove 100y.
The liquid crystal panel 140 shown in FIG. 6C is formed by breaking the parts 1,132.

Note that the liquid crystal panel 140 formed as shown in FIG. 6C may also be subjected to a cleaning process before mounting a semiconductor chip, a flexible substrate, or the like.
Also in this case, it is preferable to replace the substrate 110 with the liquid crystal panel 140 and perform the cleaning process in the same manner as in the first and second embodiments.

FIG. 4 shows a plan perspective view of the liquid crystal panel 140 configured as described above. LCD panel 140
The substrates 141 and 142 are bonded to each other by a seal material 143, and liquid crystal is sealed between them. Here, the sealing material 143 is provided with an opening 143 a for injecting liquid crystal, and the opening 143 a is closed by a sealing material 145. The substrate 1 is provided on the inner surface of the substrate 141.
The electrodes 111, the wirings 112, and the input terminals 113 provided in the ten electrode patterns are arranged. Electrode 11
An alignment film is formed on the surface of 1. Also, the substrate 1
The electrodes 121, the wirings 122, and the input terminals 123 provided in the electrode pattern of the substrate 120 are arranged also on the inner surface of the substrate 120, and the alignment film is formed on the surface of the electrodes 121. Here, the electrodes 111 and 121 are configured in a liquid crystal enclosing area surrounded by the sealing material 143, and the wirings 112 and 122 are provided in the liquid crystal enclosing area so that the substrate 112 extends.
41T and 142T are pulled out to the surface, and the tips thereof are the input terminal portions 113 and 123.

The liquid processing method, the liquid processing apparatus, and the flat panel display manufacturing method of the present invention are not limited to the above-described illustrated examples, and various modifications can be made without departing from the scope of the present invention. Of course, it is possible to add. For example, in each of the above embodiments, an example in which the method of the present invention is applied in a single processing step (cleaning step) has been shown, but the present invention shows that one processing step in a processing step having a plurality of processing steps. May be applied only to. For example, in the above-described cleaning method, different cleaning tanks are used in a plurality of stages such as the first cleaning stage, the second cleaning stage (first rinse stage), and the third cleaning stage (second rinse stage). In some cases, the present invention may be applied in any of the above steps.

[0054]

As described above, according to the present invention,
When performing liquid processing such as washing on the object to be processed, the uniformity of processing can be improved.

[Brief description of drawings]

FIG. 1 is a schematic perspective view showing a structure of a main part of a cleaning device according to a first embodiment of the present invention.

FIG. 2 is a step explanatory view (a) to (c) showing the cleaning method of the first embodiment.

FIG. 3 is a schematic configuration block diagram showing an overall configuration of the cleaning apparatus of the first embodiment.

FIG. 4 is a schematic perspective plan view of a liquid crystal display panel formed by the method for manufacturing a liquid crystal display device according to the present invention.

FIG. 5 is a schematic perspective view showing a structure of a main part of a cleaning device according to a second embodiment of the present invention.

FIG. 6 is schematic perspective views (a) to (c) showing the overall schematic steps of the method for manufacturing a liquid crystal display device according to the present invention.

FIG. 7 is a schematic explanatory cross-sectional view showing a conventional cleaning method (a).
3B is a schematic explanatory cross-sectional view showing a cross section orthogonal to the cross section shown in FIGS.

[Explanation of symbols]

2 cassettes 20,30 Cleaning device 21,31 Washing tank 22,32 Bubble introducer A bubble introduction step B Stop step 110,120 substrate 140 LCD panel

Claims (12)

[Claims] 1. An object to be treated is immersed in a liquid, and in this state, a bubble introducing step of introducing bubbles into the liquid, a stopping step of stopping introduction of the bubbles, and a step of removing the bubbles again. A liquid treatment method comprising sequentially performing a step of introducing bubbles. 2. The bubble-introducing step has a duration that is equal to or less than a time at which the position of the downward flow generated by the bubbles in the liquid is substantially stationary. Liquid treatment method. 3. The method according to claim 1, wherein the duration of the stopping step is equal to or longer than the time during which the downward flow generated in the liquid by the bubble introduction step substantially disappears. Liquid treatment method. 4. The liquid processing method according to claim 1, wherein the duration of the bubble introducing step is about 7 to 18 seconds. 5. The duration of the stopping step is about 3 to.
It is 7 seconds, The liquid processing method of Claim 1 or Claim 4 characterized by the above-mentioned. 6. A treatment tank, a bubble introducing means having a bubble introducing port inside the treatment tank, a bubble introducing step by the bubble introducing means, a stopping step of stopping the bubble introduction by the bubble introducing means, the bubble introducing And a control means for controlling the bubble introducing means for sequentially performing the steps. 7. The control means is configured to be able to set the duration of the bubble introducing step, the duration of the stopping step, or the number of repetitions of the bubble introducing step and the stopping step. The liquid processing apparatus according to claim 6. 8. A method of manufacturing a flat panel display device having at least one substrate, wherein in the manufacturing process, the substrate is immersed in a liquid, and bubbles are introduced into the liquid in this state. A step of introducing a bubble, a step of stopping the introduction of the bubble, and a step of introducing the bubble to introduce the bubble again to process the substrate to process the substrate. . 9. The bubble introduction step according to claim 8, wherein the duration of the bubble introduction step is equal to or less than the time during which the position of the downward flow generated by the bubbles in the liquid is substantially stationary. Method of manufacturing flat panel display device. 10. The method according to claim 8 or 9, wherein the duration of the stopping step is equal to or longer than the time during which the downward flow generated in the liquid by the bubble introduction step substantially disappears. Of manufacturing flat panel display device of. 11. The duration of the bubble introduction step is
The method for manufacturing a flat panel display device according to claim 8, wherein the manufacturing time is about 7 to 18 seconds. 12. The duration of the stopping step is about 3
It is ~ 7 seconds, The claim 8 or Claim 11 characterized by the above-mentioned.
A method for manufacturing the flat panel display device according to.