JP2003096267A - Roughened surface forming resin composition, and multilayer printed wiring board and prepreg for printed wiring board - Google Patents

Roughened surface forming resin composition, and multilayer printed wiring board and prepreg for printed wiring board

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Publication number
JP2003096267A
JP2003096267A JP2001284983A JP2001284983A JP2003096267A JP 2003096267 A JP2003096267 A JP 2003096267A JP 2001284983 A JP2001284983 A JP 2001284983A JP 2001284983 A JP2001284983 A JP 2001284983A JP 2003096267 A JP2003096267 A JP 2003096267A
Authority
JP
Japan
Prior art keywords
group
resin
resin composition
printed wiring
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001284983A
Other languages
Japanese (ja)
Other versions
JP4880841B2 (en
Inventor
Akira Hayashi
亮 林
Naoki Yoneda
直樹 米田
Yuji Tada
祐二 多田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Otsuka Chemical Co Ltd
Taiyo Holdings Co Ltd
Original Assignee
Otsuka Chemical Co Ltd
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Otsuka Chemical Co Ltd, Taiyo Ink Mfg Co Ltd filed Critical Otsuka Chemical Co Ltd
Priority to JP2001284983A priority Critical patent/JP4880841B2/en
Publication of JP2003096267A publication Critical patent/JP2003096267A/en
Application granted granted Critical
Publication of JP4880841B2 publication Critical patent/JP4880841B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a roughened surface forming resin composition excellent in adhesiveness between a conductor circuit and an interlayer resin insulating layer, less suffering from the occurrence of cracks during heat cycle, and having good flexibility, heat resistance, moisture resistance, electrical properties and flame resistance, and to provide a highly reliable multilayer printed wiring board and a prepreg for a printed wiring board. SOLUTION: The resin composition capable of forming a good roughened surface comprising an epoxy resin and/or a phenol resin as a main component of a matrix comprises crosslinkable phenoxyphosphazene resin powders as an easily dissolved organic filler, in which at least one phosphazene compound (a) selected from the group consisting of a cyclic phenoxyphosphazene and a linear phenoxyphosphazene is the compound crosslinked with at least one crosslinking group (b) selected from an o-phenylene group, a m-phenylene group, a p-phenylene group and a bis-phenylene group, and a free hydroxy group is not included in the molecule.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、粗化面形成用樹脂
組成物並びにそれを用いた多層プリント配線板及びプリ
ント配線板用プリプレグに関し、特に、アンカー効果が
大きく、導体回路と層間樹脂絶縁層との接着性に優れ、
ヒートサイクル時のクラック発生が少なく、可撓性が良
好であり、さらに耐熱性、絶縁性、耐衝撃性、耐薬品
性、耐湿性、耐水性及び電気特性に優れた粗化面形成用
樹脂組成物、並びに該樹脂組成物を用いた多層プリント
配線板及びプリント配線板用プリプレグに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin composition for forming a roughened surface, a multilayer printed wiring board using the same, and a prepreg for a printed wiring board. Has excellent adhesiveness with
A resin composition for forming a roughened surface, which has few cracks during heat cycle, has good flexibility, and has excellent heat resistance, insulation properties, impact resistance, chemical resistance, moisture resistance, water resistance, and electrical characteristics. And a multilayer printed wiring board using the resin composition and a prepreg for the printed wiring board.

【0002】[0002]

【従来の技術】電子機器の高性能化のニーズに対応する
ために、LSIやICチップの高集積化が進展し、それ
に伴ってこれら半導体デバイスを実装する配線基板の導
体回路の高密度化、高微細化が要求されている。このよ
うな要求に対応して、導体回路層と層間樹脂絶縁層を交
互に積層した、いわゆる、ビルドアップ多層プリント配
線板が注目を集めている。
2. Description of the Related Art In order to meet the needs for higher performance of electronic equipment, higher integration of LSIs and IC chips has progressed, and accordingly, higher density of conductor circuits of wiring boards for mounting these semiconductor devices, Higher miniaturization is required. In response to such demands, so-called build-up multilayer printed wiring boards, in which conductor circuit layers and interlayer resin insulation layers are alternately laminated, have been attracting attention.

【0003】ビルドアップ多層プリント配線板を製造す
るに当たっては、層間樹脂絶縁層の上に導体回路を信頼
性良く形成することが重要であり、また、高密度化の要
求に応えるために導体回路の微細化や層間樹脂絶縁層の
薄膜化が求められる。しかしながら、導体回路を微細化
すると、層間樹脂絶縁層と導体回路との接触面積が減少
し、密着性の低下という不具合が生じ、これを解決する
ため、アンカー効果の向上、すなわち層間樹脂絶縁層の
凸凹化、いわゆる層間樹脂絶縁層の粗面化に努力が払わ
れている。
In manufacturing a build-up multilayer printed wiring board, it is important to form a conductor circuit on an interlayer resin insulation layer with high reliability, and in order to meet the demand for higher density, the conductor circuit is required. Miniaturization and thinning of the interlayer resin insulation layer are required. However, when the conductor circuit is miniaturized, the contact area between the interlayer resin insulation layer and the conductor circuit is reduced, which causes a problem of poor adhesion. To solve this, the anchor effect is improved, that is, the interlayer resin insulation layer Efforts have been made for unevenness, that is, for roughening the so-called interlayer resin insulation layer.

【0004】現在、層間樹脂絶縁層の粗面化方法として
は、粗化面形成用樹脂組成物中に酸、アルカリ、酸化剤
等の粗化剤に対して難溶性の物質と可溶性の物質を分散
させ、その溶解度の差により表面に微細な凹凸を形成し
ている。ここで、粗化剤に対して可溶性の物質として
は、従来、無機粒子、樹脂粒子、金属粒子、ゴム粒子、
液層粒子などが用いられている。特に、耐湿性、耐薬品
性及び電気特性の点から、耐熱性樹脂粉末として有機フ
ィラーが注目されている。
Currently, as a method of roughening an interlayer resin insulation layer, a substance that is hardly soluble in a roughening agent such as an acid, an alkali or an oxidizing agent and a substance that is soluble in a roughening agent such as an acid, an alkali or an oxidizing agent are contained in a resin composition for forming a roughened surface. Dispersion is performed, and fine unevenness is formed on the surface due to the difference in solubility. Here, as the substance soluble in the roughening agent, conventionally, inorganic particles, resin particles, metal particles, rubber particles,
Liquid layer particles are used. In particular, from the viewpoint of moisture resistance, chemical resistance and electrical characteristics, attention is paid to organic fillers as heat resistant resin powders.

【0005】このような目的に使用されている耐熱性樹
脂粉末、すなわち有機フィラーとしては、例えば特公平
4−55555号公報には、エポキシ樹脂、ポリエステ
ル樹脂、ビスマレイミド/トリアジン樹脂、メラミン樹
脂を用いることが提案されている。また、特開2000
−186217号公報には、カルボキシル基を有し、酸
化剤に可溶な弾性体樹脂粉末、例えば、カルボキシル化
架橋NBR又はカルボキシル化架橋アクリル樹脂を用
い、粗化と同時に耐衝撃性、耐クラック性を向上する方
法が提案されている。また、特開2000−15986
4号公報には、エステル結合を含む脂環式エポキシ樹脂
粉末を用いることで、クロム酸のような強力な酸化剤を
必要としない粗化方法が提案されている。さらに、特開
2000−208889号公報では、加熱分解型の樹脂
粉末、例えばポリ(シアノアクリレート)樹脂を有機フ
ィラーとして用い、層間樹脂絶縁層を加熱硬化する際に
有機フィラーを分解気化させ、表面の粗化と同時に内部
に空孔を生ぜしめ、層間樹脂絶縁層の誘電率を低下させ
ると共に有害な粗化剤を用いない方法が提案されてい
る。
As the heat-resistant resin powder used for such a purpose, that is, as an organic filler, for example, in JP-B-4-55555, an epoxy resin, a polyester resin, a bismaleimide / triazine resin, and a melamine resin are used. Is proposed. In addition, JP 2000
In JP-A-186217, an elastic resin powder having a carboxyl group and soluble in an oxidizing agent, for example, a carboxylated crosslinked NBR or a carboxylated crosslinked acrylic resin is used, and at the same time roughening, impact resistance and crack resistance. Have been proposed. Also, Japanese Patent Laid-Open No. 2000-15986
Japanese Unexamined Patent Publication (Kokai) No. 4 proposes a roughening method using an alicyclic epoxy resin powder containing an ester bond, which does not require a strong oxidizing agent such as chromic acid. Further, in Japanese Patent Laid-Open No. 2000-208889, a heat-decomposable resin powder, for example, poly (cyanoacrylate) resin is used as an organic filler, and the organic filler is decomposed and vaporized when the interlayer resin insulation layer is heat-cured, A method has been proposed in which voids are generated at the same time as roughening, the dielectric constant of the interlayer resin insulating layer is lowered, and a harmful roughening agent is not used.

【0006】一方、プリント配線板を用いた電気・電子
機器部材には、火災に対する安全性を確保するため、高
度の難燃化処理が求められている。それと同時に、プリ
ント配線板においては、様々な条件下で機械的特性(伸
び率、弾性率、ピール強度、耐衝撃性等)、電気的特性
(電気抵抗、誘電率、誘電損失等)、熱的特性(ガラス
転移点(Tg)、膨張係数等)、耐水性、耐湿性及び耐
薬品性などに優れることが求められている。
On the other hand, electric / electronic equipment members using a printed wiring board are required to have a high degree of flame retardant treatment in order to ensure safety against fire. At the same time, in printed wiring boards, under various conditions, mechanical properties (elongation rate, elastic modulus, peel strength, impact resistance, etc.), electrical characteristics (electrical resistance, dielectric constant, dielectric loss, etc.), thermal It is required to have excellent properties (glass transition point (Tg), expansion coefficient, etc.), water resistance, moisture resistance, chemical resistance and the like.

【0007】このような観点から見ると、従来から酸、
アルカリ及び酸化剤などの粗化剤に可溶性を示す物質と
して用いられてきた樹脂粒子やゴム粒子を粗化面形成用
樹脂組成物中に分散させると、耐衝撃性、クラック耐性
などの機械的特性や、熱的特性、電気特性の低下を惹起
する。また、無機粒子や金属粒子などを用いると、耐水
性、耐湿性、耐薬品性及び電気特性の低下などの不具合
が生じ、様々な無機粒子や有機粒子の配合調整を行なっ
ても、全ての特性を満足するに充分な粗化面形成用樹脂
組成物を得ることは困難であった。
From this point of view, conventionally, acid,
Mechanical properties such as impact resistance and crack resistance can be obtained by dispersing resin particles or rubber particles, which have been used as substances exhibiting solubility in roughening agents such as alkalis and oxidizing agents, in a resin composition for forming a roughened surface. It also causes deterioration of thermal characteristics and electrical characteristics. Moreover, when inorganic particles or metal particles are used, problems such as deterioration of water resistance, moisture resistance, chemical resistance and electrical characteristics occur, and even if various inorganic particles or organic particles are blended and adjusted, all properties It was difficult to obtain a resin composition for forming a roughened surface sufficient to satisfy the above condition.

【0008】[0008]

【発明が解決しようとする課題】本発明は、前述したよ
うな課題を解決し、層間樹脂絶縁層を形成したときに粗
化処理により良好な粗化面を形成でき、導体回路との接
着性に優れ、ヒートサイクル時のクラック発生が少な
く、可撓性が良好で、耐熱性、耐湿性、電気特性、難燃
性等に優れた粗化面形成用樹脂組成物を提供しようとす
るものである。本発明の他の目的は、このような樹脂組
成物を用いることによって、導体回路の高微細化及び高
密度化の要求に応えることができる高信頼性の多層プリ
ント配線板を提供することにある。本発明のさらに他の
目的は、上記のような樹脂組成物を用い、耐熱衝撃性、
可撓性、耐熱性、耐湿性、電気特性、難燃性等に優れた
プリント配線板用プリプレグを提供することにある。
SUMMARY OF THE INVENTION The present invention solves the above-mentioned problems, and when an interlayer resin insulation layer is formed, a roughened surface can be formed by a roughening treatment, and the adhesiveness to a conductor circuit can be improved. Excellent, less cracking during heat cycle, good flexibility, heat resistance, moisture resistance, electrical characteristics, flame retardant resin composition for forming a roughened surface. is there. Another object of the present invention is to provide a highly reliable multilayer printed wiring board that can meet the demand for higher miniaturization and higher density of conductor circuits by using such a resin composition. . Still another object of the present invention is to use the resin composition as described above, to obtain thermal shock resistance,
Another object of the present invention is to provide a prepreg for a printed wiring board, which is excellent in flexibility, heat resistance, moisture resistance, electric characteristics, flame retardancy and the like.

【0009】[0009]

【課題を解決するための手段】前記目的を達成するため
に、本発明の第一の側面によれば、エポキシ樹脂及び/
又はフェノール樹脂をマトリックスの主成分とする樹脂
組成物において、下記一般式(1)で表わされる環状フ
ェノキシホスファゼン及び下記一般式(2)で表わされ
る直鎖状フェノキシホスファゼンよりなる群から選ばれ
る少なくとも1種のホスファゼン化合物(a)が、o−
フェニレン基、m−フェニレン基、p−フェニレン基及
び下記一般式(3)で表わされるビスフェニレン基より
なる群から選ばれる少なくとも1種の架橋基(b)によ
り架橋された化合物であって、上記ホスファゼン化合物
(a)のフェニル基が脱離した2個の酸素原子間に上記
架橋基(b)が介在した構造を有すると共に、フェニル
基の含有割合が上記ホスファゼン化合物(a)中の全フ
ェニル基の総数を基準に50〜99.9%であり、且つ
分子内にフリーの水酸基を有しない架橋フェノキシホス
ファゼン樹脂粉末を、有機フィラーとして含有すること
を特徴とする粗化面形成用の樹脂組成物が提供される。
In order to achieve the above object, according to the first aspect of the present invention, an epoxy resin and / or
Alternatively, in a resin composition containing a phenol resin as a main component of a matrix, at least one selected from the group consisting of a cyclic phenoxyphosphazene represented by the following general formula (1) and a linear phenoxyphosphazene represented by the following general formula (2). The phosphazene compound (a) of the species is o-
A compound crosslinked with at least one crosslinkable group (b) selected from the group consisting of a phenylene group, an m-phenylene group, a p-phenylene group and a bisphenylene group represented by the following general formula (3): The phosphazene compound (a) has a structure in which the bridging group (b) is interposed between two oxygen atoms eliminated from the phenyl group, and the phenyl group content is all phenyl groups in the phosphazene compound (a). A resin composition for forming a roughened surface, characterized in that the crosslinked phenoxyphosphazene resin powder having a free hydroxyl group in the molecule is contained as an organic filler in an amount of 50 to 99.9% based on the total number of Will be provided.

【化2】 [式中、Phはフェニル基を表わし、Xは基−N=P
(OPh)3又は基−N=P(=O)OPhを表わし、
Yは基−P(=O)(OPh)又は基−P(OPh)3
を表わし、Aは−C(CH32−、−SO2−、−S−
又は−O−を表わし、mは3〜25の整数であり、nは
3〜10,000の整数であり、aは0又は1であ
る。] 好ましくは、架橋フェノキシホスファゼン樹脂粉末を樹
脂組成物全体の1〜40wt%の割合で含有させる。上
記粗化面形成用樹脂組成物は、液状(ペースト状)の形
態であってもよく、また、ドライフィルムの形態であっ
てもよい。
[Chemical 2] [In the formula, Ph represents a phenyl group, and X represents a group -N = P.
(OPh) 3 or a group —N═P (═O) OPh,
Y is a group -P (= O) (OPh) or a group -P (OPh) 3.
The expressed, A is -C (CH 3) 2 -, - SO 2 -, - S-
Or represents -O-, m is an integer of 3 to 25, n is an integer of 3 to 10,000, and a is 0 or 1. ] Preferably, the crosslinked phenoxyphosphazene resin powder is contained in a proportion of 1 to 40 wt% of the entire resin composition. The roughened surface forming resin composition may be in the form of a liquid (paste), or may be in the form of a dry film.

【0010】また、本発明の第二の側面によれば、導体
回路層間に層間樹脂絶縁層が形成されている多層プリン
ト配線板において、上記層間樹脂絶縁層が前記樹脂組成
物を用いて形成され、且つ粗化処理されたものであるこ
とを特徴とする多層プリント配線板が提供される。さら
に本発明の第三の側面によれば、繊維質シート状基材
に、前記樹脂組成物を含浸させてなることを特徴とする
プリント配線板用プリプレグが提供される。
According to the second aspect of the present invention, in a multilayer printed wiring board in which an interlayer resin insulation layer is formed between conductor circuit layers, the interlayer resin insulation layer is formed by using the resin composition. A multilayer printed wiring board characterized by being roughened is also provided. Further, according to a third aspect of the present invention, there is provided a prepreg for a printed wiring board, which is obtained by impregnating a fibrous sheet-shaped substrate with the resin composition.

【0011】[0011]

【発明の実施の形態】本発明者らは、前述した課題を解
決するため、数多くの耐熱性樹脂粉末について研究を行
なった結果、特殊構造をもつ架橋フェノキシホスファゼ
ン樹脂粉末が、耐熱性に優れ、低弾性率、低膨張率及び
低吸水率など数々の優れた特性を有し、多層プリント配
線板の層間樹脂絶縁層として用いられる粗化面形成用樹
脂組成物中に配合する易溶性有機フィラーとして最適で
あることを見出し、本発明を完成するに至ったものであ
る。さらに本発明者らの研究によると、このような特殊
構造をもつ架橋フェノキシホスファゼン樹脂粉末は、ハ
ロゲンフリーであるにも拘らず樹脂組成物に充分な難燃
効果を付与し、しかも前記したような優れた特性を付与
するため、これを含有する硬化性樹脂組成物は、プリン
ト配線板用プリプレグに用いられる繊維質シート状基材
に含浸させる樹脂組成物として最適であることが見出さ
れた。
BEST MODE FOR CARRYING OUT THE INVENTION In order to solve the above-mentioned problems, the present inventors have studied a number of heat resistant resin powders, and as a result, a crosslinked phenoxyphosphazene resin powder having a special structure has excellent heat resistance, As a highly soluble organic filler that has a number of excellent properties such as low elastic modulus, low expansion coefficient and low water absorption rate, and is mixed in the roughened surface forming resin composition used as the interlayer resin insulation layer of the multilayer printed wiring board. The inventors have found that it is optimal and have completed the present invention. Further, according to the research conducted by the present inventors, the crosslinked phenoxyphosphazene resin powder having such a special structure imparts a sufficient flame retardant effect to the resin composition in spite of being halogen-free, and as described above. In order to impart excellent properties, a curable resin composition containing the same has been found to be optimal as a resin composition for impregnating a fibrous sheet-like base material used in a prepreg for a printed wiring board.

【0012】すなわち、本発明の樹脂組成物は、エポキ
シ樹脂及び/又はフェノール樹脂をマトリックスの主成
分とする樹脂組成物中に、架橋フェノキシホスファゼン
樹脂粉末を必須成分として含有することを特徴としてい
る。上記架橋フェノキシホスファゼン樹脂は、前記一般
式(1)で表わされる環状フェノキシホスファゼン及び
前記一般式(2)で表わされる直鎖状フェノキシホスフ
ァゼンよりなる群から選ばれる少なくとも1種のホスフ
ァゼン化合物(a)が、o−フェニレン基、m−フェニ
レン基、p−フェニレン基及び前記一般式(3)で表わ
されるビスフェニレン基よりなる群から選ばれる少なく
とも1種の架橋基(b)により架橋された化合物であっ
て、上記ホスファゼン化合物(a)のフェニル基が脱離
した2個の酸素原子間に上記架橋基(b)が介在した構
造を有すると共に、フェニル基の含有割合が上記ホスフ
ァゼン化合物(a)中の全フェニル基の総数を基準に5
0〜99.9%であり、且つ分子内にフリーの水酸基を
有しない架橋フェノキシホスファゼン樹脂粉末である。
なお、架橋フェノキシホスファゼン樹脂については特開
2000−256551号公報に記載されているので、
詳細については同公報を参照されたい。
That is, the resin composition of the present invention is characterized by containing a crosslinked phenoxyphosphazene resin powder as an essential component in a resin composition containing an epoxy resin and / or a phenol resin as a main component of a matrix. The crosslinked phenoxyphosphazene resin contains at least one phosphazene compound (a) selected from the group consisting of the cyclic phenoxyphosphazene represented by the general formula (1) and the linear phenoxyphosphazene represented by the general formula (2). A compound crosslinked with at least one crosslinking group (b) selected from the group consisting of an o-phenylene group, an m-phenylene group, a p-phenylene group and a bisphenylene group represented by the general formula (3). And has a structure in which the bridging group (b) is interposed between two oxygen atoms from which the phenyl group of the phosphazene compound (a) has been eliminated, and the content ratio of the phenyl group in the phosphazene compound (a) is 5 based on the total number of all phenyl groups
It is a crosslinked phenoxyphosphazene resin powder having 0 to 99.9% and having no free hydroxyl group in the molecule.
Since the crosslinked phenoxyphosphazene resin is described in JP-A-2000-256551,
For details, refer to the publication.

【0013】本発明で用いる前記架橋ホスファゼン樹脂
粉末は、その最大粒径が10μm以下、さらには平均粒
径が2μm以下、好ましくは0.1〜1.0μmの範囲
であることが望ましい。平均粒径が2μmを超えると、
樹脂粉末の組成物中での分散性が低下するため好ましく
なく、粗化面の微細化(ファインパターン回路形成)及
び微細(海/島)構造形成による耐熱衝撃性の向上のた
めには、平均粒径は2μm以下、好ましくは1μm以下
であることが望ましく、また0.1μm以上が好まし
い。
The crosslinked phosphazene resin powder used in the present invention has a maximum particle size of 10 μm or less, and an average particle size of 2 μm or less, preferably 0.1 to 1.0 μm. If the average particle size exceeds 2 μm,
It is not preferable because the dispersibility of the resin powder in the composition is reduced. To improve the thermal shock resistance by making the roughened surface fine (fine pattern circuit formation) and fine (sea / island) structure formation, The particle size is desirably 2 μm or less, preferably 1 μm or less, and preferably 0.1 μm or more.

【0014】本発明において、良好な粗化面形成のため
には、前記架橋フェノキシホスファゼン樹脂粉末の配合
割合は、樹脂組成物全体の1〜40wt%、好ましくは
5〜20wt%が必要である。架橋フェノキシホスファ
ゼン樹脂粉末の配合割合が1wt%未満では充分に粗面
化効果が得られ難く、一方、40wt%を超えると得ら
れる硬化塗膜のガラス転移点が著しく低下するため好ま
しくない。
In the present invention, in order to form a favorable roughened surface, the blending ratio of the crosslinked phenoxyphosphazene resin powder needs to be 1 to 40% by weight, preferably 5 to 20% by weight based on the whole resin composition. If the blending ratio of the crosslinked phenoxyphosphazene resin powder is less than 1 wt%, it is difficult to obtain a sufficient roughening effect, while if it exceeds 40 wt%, the glass transition point of the obtained cured coating film is significantly lowered, which is not preferable.

【0015】本発明の樹脂組成物に用いられる熱硬化性
樹脂としてのエポキシ樹脂としては、ビスフェノールA
型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビ
スフェノールS型エポキシ樹脂、クレゾールノボラック
型エポキシ樹脂、ビフェニル型エポキシ樹脂、ナフタレ
ン型エポキシ樹脂、ジシクロペンタジエン型エポキシ樹
脂、脂環式エポキシ樹脂などが挙げられ、また、フェノ
ール樹脂としては、フェノールノボラック樹脂、クレゾ
ールノボラック樹脂、ビスフェノールA型ノボラック樹
脂、ビスフェノールF型ノボラック樹脂、ナフトールノ
ボラック樹脂などが挙げられる。これらの熱硬化性樹脂
は、単独で又は2種以上を組み合わせて用いることがで
きる。
The epoxy resin as the thermosetting resin used in the resin composition of the present invention includes bisphenol A.
Type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, cresol novolac type epoxy resin, biphenyl type epoxy resin, naphthalene type epoxy resin, dicyclopentadiene type epoxy resin, alicyclic epoxy resin, and the like. Examples of the phenol resin include phenol novolac resin, cresol novolac resin, bisphenol A type novolac resin, bisphenol F type novolac resin, and naphthol novolac resin. These thermosetting resins can be used alone or in combination of two or more kinds.

【0016】本発明の樹脂組成物は、熱硬化反応を促進
するために潜在性硬化触媒を含有することが好ましい。
潜在性硬化触媒としては、イミダゾール化合物、例え
ば、2−エチル−4−メチルイミダゾール、2−フェニ
ルイミダゾール、2−ウンデシルイミダゾール、1−ベ
ンジル−2メチルイミダゾール、2−ヘプタデシルイミ
ダゾール、4,5−ジフェニルイミダゾール、2−イソ
プロピルイミダゾール、2,4−ジメチルイミダゾー
ル、2−フェニル−4−メチルイミダゾールなどが挙げ
られる。また、イミダゾリン化合物、例えば、2−メチ
ルイミダゾリン、2−メチル−4−メチルイミダゾリ
ン、2−フェニルイミダゾリン、2−ウンデシルイミダ
ゾリン、2−ヘプタデシルイミダゾリン、2−エチルイ
ミダゾリン、2−イソプルピルイミダゾリン、2,4−
ジメチルイミダゾリン、2−フェニル−4−メチルイミ
ダゾリンなどが挙げられる。また、ジシアンジアミド、
有機リン化合物等が挙げられる。これらの潜在性硬化触
媒は、単独で又は2種以上を組み合わせて用いることが
できる。潜在性硬化触媒の配合量は、通常の量的割合で
充分であり、一般に、前記エポキシ樹脂及び/又はフェ
ノール樹脂100質量部当り、0.1〜10質量部の割
合で配合される。
The resin composition of the present invention preferably contains a latent curing catalyst in order to accelerate the thermosetting reaction.
As a latent curing catalyst, an imidazole compound, for example, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 1-benzyl-2methylimidazole, 2-heptadecylimidazole, 4,5- Diphenyl imidazole, 2-isopropyl imidazole, 2,4-dimethyl imidazole, 2-phenyl-4-methyl imidazole and the like can be mentioned. In addition, imidazoline compounds, for example, 2-methylimidazoline, 2-methyl-4-methylimidazoline, 2-phenylimidazoline, 2-undecylimidazoline, 2-heptadecylimidazoline, 2-ethylimidazoline, 2-isopurupylimidazoline, 2,4-
Examples thereof include dimethylimidazoline and 2-phenyl-4-methylimidazoline. Also, dicyandiamide,
Examples thereof include organic phosphorus compounds. These latent curing catalysts can be used alone or in combination of two or more. The compounding amount of the latent curing catalyst is sufficient in a usual quantitative ratio, and is generally 0.1 to 10 parts by mass with respect to 100 parts by mass of the epoxy resin and / or the phenol resin.

【0017】本発明の樹脂組成物は、前記架橋フェノキ
シホスファゼン樹脂粉末と共に、その効果を損なわない
量的割合で無機及び/又は有機フィラーを含有すること
ができる。無機フィラーとしては、硫酸バリウム、炭酸
カルシウム、チタン酸バリウム、酸化珪素、無定形シリ
カ、タルク、クレー、雲母粉等が挙げられ、有機フィラ
ーとしては、シリコンパウダー、ナイロンパウダー、フ
ッ素パウダー等が挙げられる。これら無機及び/又は有
機フィラーの配合量は、組成物全体の50wt%以下の
割合が適当である。
The resin composition of the present invention may contain an inorganic and / or organic filler together with the crosslinked phenoxyphosphazene resin powder in a quantitative ratio that does not impair its effect. Examples of the inorganic filler include barium sulfate, calcium carbonate, barium titanate, silicon oxide, amorphous silica, talc, clay and mica powder, and examples of the organic filler include silicon powder, nylon powder and fluorine powder. . The proportion of these inorganic and / or organic fillers is preferably 50 wt% or less of the total composition.

【0018】さらに本発明の樹脂組成物中には、本発明
の効果を損なわない限り、前記成分以外の他の添加剤、
着色剤を添加してもよい。添加剤としては、アスベス
ト、オルベン、ベントンなどの増粘剤、シリコーン系、
フッ素系の消泡剤、レベリング剤などが挙げられ、着色
剤としては、フタロシアニン・ブルー、フタロシアニン
・グリーン、アイオジン・グリーン、ジスアゾイエロ
ー、酸化チタン、カーボンブラックなどが挙げられる。
Further, in the resin composition of the present invention, additives other than the above-mentioned components are added unless the effects of the present invention are impaired.
Colorants may be added. As additives, thickeners such as asbestos, orben, and benton, silicone-based agents,
Fluorine-based defoaming agents, leveling agents and the like can be mentioned, and examples of the coloring agents include phthalocyanine blue, phthalocyanine green, iodin green, disazo yellow, titanium oxide, carbon black and the like.

【0019】本発明の樹脂組成物は、カーテン塗工、ロ
ール塗工、スプレー塗工及びディップ塗工など従来公知
の種々の方法でプリント基板に塗布することができる
他、ドライフィルム又はプリプレグ等様々の形態、用途
に使用することができる。その使用方法や用途により様
々な溶剤を用いることができるが、場合によっては良溶
媒だけでなく貧溶剤を用いることも差し支えない。
The resin composition of the present invention can be applied to a printed circuit board by various conventionally known methods such as curtain coating, roll coating, spray coating and dip coating, as well as dry film or prepreg. It can be used in the form of Various solvents can be used depending on the method of use and application, but depending on the case, not only a good solvent but also a poor solvent may be used.

【0020】次に、本発明の樹脂組成物を用いた多層プ
リント配線板の製造例について説明する。まず、本発明
の樹脂組成物を、内層導体回路を形成した絶縁基材上
に、スクリーン印刷法、カーテンコート法、ロールコー
ト法、スプレーコート法など公知の方法により塗布し、
乾燥硬化して絶縁樹脂層を形成する。コーティング法に
よっては一回のコーティングで所望の膜厚の塗膜が得ら
れない場合があるが、その場合は複数回コーティングを
行なう。複数回コーティングを行なう場合には、本発明
の樹脂組成物のみを用いて行なってもよく、あるいは下
塗りに銅との密着性の良好な他の熱硬化性樹脂組成物を
コーティングし、その後、最上層のコーティングに本発
明の樹脂組成物を用いるようにしてもよい。また、塗膜
の乾燥硬化においては、エポキシ樹脂やフェノール樹脂
の硬化反応のための加熱処理を130〜200℃で15
〜60分間行なう。
Next, a production example of a multilayer printed wiring board using the resin composition of the present invention will be described. First, the resin composition of the present invention is applied onto the insulating base material on which the inner layer conductor circuit is formed by a known method such as a screen printing method, a curtain coating method, a roll coating method, or a spray coating method,
It is dried and cured to form an insulating resin layer. Depending on the coating method, a coating film having a desired film thickness may not be obtained by one coating, but in that case, coating is performed multiple times. When the coating is performed a plurality of times, the resin composition of the present invention may be used alone, or another thermosetting resin composition having good adhesion to copper may be coated on the undercoat, and then the You may make it use the resin composition of this invention for the coating of an upper layer. Further, in the dry curing of the coating film, heat treatment for curing reaction of the epoxy resin or the phenol resin is performed at 130 to 200 ° C. for 15 minutes.
Do ~ 60 minutes.

【0021】このようにして内層回路基板上に形成され
た絶縁樹脂層の所定の位置に、スルーホール及びバイア
ホール部をドリル、レーザー等で穴開けを行なう。次い
で、絶縁樹脂層表面を粗化剤により処理し、微細な凹凸
を形成する。この際、必要に応じて粗化処理前に、接着
性を安定させるためバフによる物理研磨を行なってもよ
い。表面の粗化処理は、絶縁樹脂層が形成された基板を
酸化剤等の溶液中に浸漬するか、酸化剤等の溶液をスプ
レーするなどの手段によって実施することができる。粗
化処理剤の具体例としては、重クロム酸塩、過マンガン
酸塩、オゾン、過酸化水素/硫酸、硝酸等の酸化剤、N
−メチル−2−ピロリドン、N,N−ジメチルホルムア
ミド、メトキシプロパノール等の有機溶剤、また苛性ソ
ーダ、苛性カリ等のアルカリ性水溶液、硫酸、塩酸など
の酸性水溶液、又は各種プラズマ処理などを用いること
ができる。またこれらの処理は併用してもよい。
Through holes and via holes are drilled at predetermined positions of the insulating resin layer thus formed on the inner layer circuit board by a drill, a laser or the like. Then, the surface of the insulating resin layer is treated with a roughening agent to form fine irregularities. At this time, if necessary, before the roughening treatment, physical polishing with a buff may be performed to stabilize the adhesiveness. The surface roughening treatment can be carried out by means such as immersing the substrate on which the insulating resin layer is formed in a solution such as an oxidizing agent or spraying a solution such as an oxidizing agent. Specific examples of the roughening agent include dichromate, permanganate, ozone, oxidizers such as hydrogen peroxide / sulfuric acid and nitric acid, and N.
Organic solvents such as -methyl-2-pyrrolidone, N, N-dimethylformamide and methoxypropanol, alkaline aqueous solutions such as caustic soda and caustic potash, acidic aqueous solutions such as sulfuric acid and hydrochloric acid, and various plasma treatments can be used. Also, these treatments may be used in combination.

【0022】次いで、蒸着、スパッタリング、イオンプ
レーティング等の乾式めっき、又は無電解めつき・電解
めっき等の湿式めっきにより導体層を形成する。この
時、絶縁樹脂層上に、導体層とは逆パターンのめっきレ
ジストを形成し、無電解めっきのみで導体層を形成して
もよい。このように導体層が形成された後、アニール処
理することにより、熱硬化性樹脂の硬化が進行し、導体
層のピール強度をさらに向上させることもできる。次
に、導体層上にドライフルム・めっきレジストを必要に
応じて形成し、エッチングで必要な導体パターンを形成
する。さらに、必要に応じてこれらの工程を数回繰り返
すことにより、所望の層数の多層プリント配線板を得る
ことができる。
Next, a conductor layer is formed by dry plating such as vapor deposition, sputtering, ion plating, or wet plating such as electroless plating and electrolytic plating. At this time, a plating resist having a pattern opposite to that of the conductor layer may be formed on the insulating resin layer, and the conductor layer may be formed only by electroless plating. After the conductor layer is formed in this way, the thermosetting resin is cured by annealing, so that the peel strength of the conductor layer can be further improved. Next, a dry film / plating resist is formed on the conductor layer as required, and a necessary conductor pattern is formed by etching. Furthermore, by repeating these steps several times as needed, a multilayer printed wiring board having a desired number of layers can be obtained.

【0023】次に、本発明の樹脂組成物を用いたビルド
アップ法による多層プリント配線板の製造方法の一例に
ついて、図1を参照しながら説明する。まず、絶縁基板
1の両面に予め内層導体パターン3と樹脂絶縁層4が形
成された積層基板Aの両面に外層導体パターン8を形成
し、その上に、スクリーン印刷法やスプレーコーティン
グ法、カーテンコーティング法等の適当な方法により本
発明の樹脂組成物を塗布した後、加熱硬化させ、樹脂絶
縁層9を形成する。次いで、樹脂絶縁層9及び積層基板
Aを貫通するようなスルーホール孔21を形成する。ス
ルーホール孔21はドリル、金型パンチ、レーザー光な
ど適当な手段によって形成できる。その後、前記したよ
うな粗化剤を用いて各樹脂絶縁層9の粗面化を行う。例
えば、粗化剤として酸化剤を用いた場合、樹脂絶縁層9
を有機溶剤で膨潤させた後、酸化剤によって粗面化処理
を行う。この粗面化処理によって、樹脂絶縁層9の表面
及びスルーホール孔21に凹凸状の表面構造を容易に形
成できる。
Next, an example of a method for producing a multilayer printed wiring board by the build-up method using the resin composition of the present invention will be described with reference to FIG. First, the outer layer conductor pattern 8 is formed on both sides of the laminated substrate A in which the inner layer conductor pattern 3 and the resin insulating layer 4 are previously formed on both sides of the insulating substrate 1, and the screen printing method, the spray coating method, and the curtain coating are formed on the outer layer conductor pattern 8. After the resin composition of the present invention is applied by an appropriate method such as a method, the resin insulating layer 9 is formed by heating and curing. Next, a through hole 21 is formed so as to penetrate the resin insulating layer 9 and the laminated substrate A. The through hole 21 can be formed by a suitable means such as a drill, a die punch, or a laser beam. After that, each of the resin insulation layers 9 is roughened by using the above-mentioned roughening agent. For example, when an oxidizing agent is used as the roughening agent, the resin insulating layer 9
Is swelled with an organic solvent, and then roughened with an oxidizing agent. By this roughening treatment, an uneven surface structure can be easily formed on the surface of the resin insulating layer 9 and the through hole 21.

【0024】次に、樹脂絶縁層9の表面に無電解めっき
や電解めっき、無電解めっきと電解めっきの組合せ等に
より導体層を形成する。このとき導体層は、樹脂絶縁層
9の表面だけでなく、スルーホール孔21やブラインド
孔内の全面に被覆される。次いで、常法に従って、樹脂
絶縁層9の表面の導体層に所定の回路パターンを形成
し、図1に示すように、両側に最外層導体パターン10
を形成する。この時、上記のようにスルーホール孔21
にもめっき層が形成されており、その結果、上記多層プ
リント配線板の最外層導体パターン10のコネクション
部22と内層導体パターン3のコネクション部3aとの
間は電気的に接続されることになり、スルーホール20
が形成される。さらに多層のプリント配線板を製造する
場合には、上記樹脂絶縁層と導体層をさらに交互にビル
ドアップすればよい。
Next, a conductor layer is formed on the surface of the resin insulating layer 9 by electroless plating, electrolytic plating, a combination of electroless plating and electrolytic plating, or the like. At this time, the conductor layer covers not only the surface of the resin insulating layer 9 but also the entire surface inside the through hole 21 and the blind hole. Then, according to a conventional method, a predetermined circuit pattern is formed on the conductor layer on the surface of the resin insulating layer 9, and the outermost layer conductor pattern 10 is formed on both sides as shown in FIG.
To form. At this time, as described above, the through hole 21
A plating layer is also formed on the inner surface of the multilayer printed wiring board so that the connection portion 22 of the outermost layer conductor pattern 10 and the connection portion 3a of the inner layer conductor pattern 3 are electrically connected. , Through hole 20
Is formed. Further, when manufacturing a multilayer printed wiring board, the resin insulating layers and the conductor layers may be further alternately built up.

【0025】なお、上記ビルドアップにおいては、積層
基板上に樹脂絶縁層及び導体層を形成する例について説
明したが、積層基板の代わりに片面基板、あるいは両面
基板を用いても同様に本発明を適用できることは言うま
でもない。また、上記多層プリント配線板には、各導体
層のコネクション部間を電気的に接続するブラインドバ
イアホールが設けられており、これらブラインドバイア
ホールも上記スルーホール20と略同様の構造で各コネ
クション部間の電気的接続を図るものであるが、その図
示は省略する。このようなブラインドバイアホールは、
レーザー光、サンドブラストなど従来公知の通常の方法
で開けることができ、特定の方法に限定されるものでは
ない。
In the above build-up, an example in which the resin insulating layer and the conductor layer are formed on the laminated substrate has been described, but the present invention is also applicable to the case where a single-sided substrate or a double-sided substrate is used instead of the laminated substrate. It goes without saying that it can be applied. Further, the multilayer printed wiring board is provided with blind via holes for electrically connecting the connection portions of the respective conductor layers, and these blind via holes have substantially the same structure as the through hole 20 and each connection portion. Although the electrical connection between them is intended, the illustration thereof is omitted. Such blind via holes are
It can be opened by a conventionally known ordinary method such as laser light and sand blast, and is not limited to a specific method.

【0026】以上、本発明の樹脂組成物を用いる多層プ
リント配線板の製造方法の一実施態様について説明した
が、本発明の方法は前記した製造方法に限定されるもの
ではなく、本発明の目的を達成しうる限り種々の変更が
可能である。また、本発明の樹脂組成物は、予めドライ
フィルムの形態に調製して用いることもできるし、ま
た、プレス加工するためのプリプレグとして調製して用
いることもできる。例えば、ガラス繊維、ポリエステル
繊維、アラミド繊維等で構成されたシート状基材に含浸
させてプリプレグを作製でき、またこのプリプレグ又は
その複数枚の加熱加圧成形体である積層板の片面又は両
面に銅箔等の金属箔を一体化してなる金属箔張り積層板
を作製することもできる。
Although one embodiment of the method for producing a multilayer printed wiring board using the resin composition of the present invention has been described above, the method of the present invention is not limited to the above-mentioned production method, and the object of the present invention is not limited to this. Various modifications are possible as long as the above can be achieved. Further, the resin composition of the present invention can be prepared and used in the form of a dry film in advance, or can be prepared and used as a prepreg for press working. For example, it is possible to prepare a prepreg by impregnating a sheet-like base material composed of glass fiber, polyester fiber, aramid fiber or the like, and also on one side or both sides of this prepreg or a laminated plate which is a plurality of heat and pressure-molded articles thereof. It is also possible to produce a metal foil-clad laminate which is obtained by integrating metal foils such as copper foil.

【0027】[0027]

【実施例】以下に実施例及び比較例を示して本発明につ
いてより具体的に説明するが、本発明が以下の実施例に
より制限されるものでないことは言うまでもない。尚、
以下において「部」とあるのは、特に断りのない限り
「質量部」を意味する。
EXAMPLES The present invention will be described more specifically with reference to Examples and Comparative Examples, but it goes without saying that the present invention is not limited to the following Examples. still,
In the following, "part" means "part by mass" unless otherwise specified.

【0028】合成例1(p−フェニレン基による架橋構
造を有するフェノキシホスファゼン化合物の合成) フェノール103.5部(1.1モル)、水酸化ナトリ
ウム44.0部(1.1モル)、水50部及びトルエン
500mlの混合物を加熱還流し、水のみを系外に取り
除くことにより、ナトリウムフェノラートのトルエン溶
液を調製した。前記反応と並行し、2リットルの四ツ口
フラスコにハイドロキノン16.5部(0.15モ
ル)、フェノール94.1部(1.0モル)、水酸化リ
チウム31.1部(1.3モル)、水52部及びトルン
600mlを入れ、加熱還流し、水のみを系外に取り除
くことにより、ハイドロキノンとフェノールのリチウム
塩のトルエン溶液を調製した。このトルエン溶液に、ジ
クロルホスファゼンオリゴマー(3量体62%、4量体
12%、5量体及び6量体11%、7量体3%、8量体
以上12%の混合体)1.0ユニットモル(115.9
部)を含む20%クロルベンゼン溶液580部を、攪拌
下30℃以下で滴下した後、110℃で3時間攪拌反応
させた。次に、先に調製したナトリウムフェノラートの
トルエン溶液を攪拌下で添加した後、110℃で4時間
反応を継続した。反応終了後、反応混合物を3%水酸化
ナトリウム水溶液1.0リットルで3回洗浄し、次に、
水1.0リットルで3回洗浄した後、有機層を減圧下で
濃縮した。得られた生成物を80℃、3mmHg以下で
11時間加熱真空乾燥し、架橋フェノキシホスファゼン
の微黄色粉末211部を得た。得られた架橋フェノキシ
ホスファゼンは、加水分解塩素0.04%、重量平均分
子量(Mw)1100、リン含有率及びCHN元素分析
値による組成は、ほぼ[N=P(−O−p−Ph−O
−)0.15(−O−Ph)1.7]であることが判明した。
Synthesis Example 1 (Synthesis of a phenoxyphosphazene compound having a crosslinked structure with a p-phenylene group) Phenol 103.5 parts (1.1 mol), sodium hydroxide 44.0 parts (1.1 mol), water 50 A toluene solution of sodium phenolate was prepared by heating and refluxing a mixture of 1 part and 500 ml of toluene and removing only water out of the system. In parallel with the reaction, 16.5 parts (0.15 mol) of hydroquinone, 94.1 parts (1.0 mol) of phenol and 31.1 parts (1.3 mol of lithium hydroxide) were placed in a 2-liter four-necked flask. ), 52 parts of water and 600 ml of torun were charged, heated and refluxed, and only water was removed to the outside of the system to prepare a toluene solution of lithium salt of hydroquinone and phenol. In this toluene solution, dichlorophosphazene oligomer (trimer 62%, tetramer 12%, pentamer and hexamer 11%, heptamer 3%, octamer or more 12%) 1. 0 unit mole (115.9
580 parts of a 20% chlorobenzene solution containing 1 part) was added dropwise with stirring at 30 ° C. or lower, and then the mixture was reacted with stirring at 110 ° C. for 3 hours. Next, the toluene solution of sodium phenolate prepared above was added under stirring, and then the reaction was continued at 110 ° C. for 4 hours. After completion of the reaction, the reaction mixture was washed 3 times with 1.0 liter of 3% aqueous sodium hydroxide solution, then
After washing with 1.0 liter of water three times, the organic layer was concentrated under reduced pressure. The obtained product was heated and vacuum dried at 80 ° C. for 3 hours at 3 mmHg or less to obtain 211 parts of a slightly yellow powder of crosslinked phenoxyphosphazene. The obtained crosslinked phenoxyphosphazene had a composition of 0.04% of hydrolyzed chlorine, a weight average molecular weight (Mw) of 1100, a phosphorus content and a CHN elemental analysis value of approximately [N = P (-O-p-Ph-O).
-) 0.15 (-O-Ph) 1.7 ] was found.

【0029】合成例2(2,2−ビス(p−オキシフェ
ニル)イソプロピリデン基による架橋構造を有するフェ
ノキシホスファゼン化合物の合成) フェノール65.9部(0.7モル)及びトルエン50
0mlを1リットルの四ツ口フラスコに入れ、攪拌下、
内部の液温を25℃に保ちつつ、金属ナトリウム0.6
5グラム原子14.9部を細かく裁断して投入した。投
入終了後、77〜113℃で金属ナトリウムが完全に消
失するまで8時問撹絆を続け、ナトリウムフェノラート
溶液を調製した。前記反応と並行し、ビスフェノールA
57.1部(0.25モル)、フェノール103.5部
(1.1モル)及びテトラヒドロフラン(THF)80
0mlを3リットルの四ツ口フラスコに入れ、攪拌下、
内部の液温を25℃以下に保ちつつ、金属リチウム1.
6グラム原子11.1部を細かく裁断して投入した。投
入終了後、61〜68℃で金属リチウムが完全に消失す
るまで、8時間攪拌を続けた。このスラリー溶液にジク
ロルホスファゼンオリゴマー(濃度:37%、クロルベ
ンゼン溶液313部、組成:3量体75%、4量体17
%、5及び6量体6%、7量体1%、8量体以上1%の
混合体)1.0ユニットモル(115.9部)を攪拌
下、内部の液温を20℃以下に保ちつつ、1時間かけて
滴下した後、80℃で2時間反応させた。次いで攪拌
下、内部の液温を20℃に保ちつつ、別途調製したナト
リウムフェノラート溶液を1時間かけて添加した後、8
0℃で5時間反応させた。反応終了後、反応混合物を濃
縮してTHFを除き、新たにトルエン1リットルを添加
した。このトルエン溶液を2%NaOH1リットルで3
回洗浄し、次に、水1.0リットルで3回洗浄した後、
有機層を減圧下で濃縮した。得られた生成物を80℃、
3mmHg以下で11時間加熱真空乾燥し、架橋フェノ
キシホスファゼンの白色粉末229部を得た。得られた
架橋フェノキシホスファゼンは、加水分解塩素0.07
%、重量平均分子量(Mw)1130、リン含有率及び
CHN元素分析値よる組成は[N=P(−O−Ph−C
(CH32−Ph−O−)0.25(−O−Ph)1.50]で
あった。
Synthesis Example 2 (Synthesis of a phenoxyphosphazene compound having a crosslinked structure with a 2,2-bis (p-oxyphenyl) isopropylidene group) 65.9 parts (0.7 mol) of phenol and 50 parts of toluene
0 ml was placed in a 1-liter four-necked flask and stirred,
While keeping the internal liquid temperature at 25 ° C, sodium metal 0.6
14.9 parts of 5 gram atom was finely cut and added. After completion of the addition, stirring was continued for 8 hours at 77 to 113 ° C. until the metallic sodium completely disappeared to prepare a sodium phenolate solution. In parallel with the above reaction, bisphenol A
57.1 parts (0.25 mol), phenol 103.5 parts (1.1 mol) and tetrahydrofuran (THF) 80
Add 0 ml to a 3 liter four-necked flask, and stir,
While keeping the internal liquid temperature at 25 ° C. or lower, metallic lithium 1.
11.1 parts of 6 gram atom was finely cut and added. After completion of the addition, stirring was continued for 8 hours at 61 to 68 ° C. until the metallic lithium completely disappeared. Dichlorophosphazene oligomer (concentration: 37%, 313 parts chlorobenzene solution, composition: 75% trimer, tetramer 17)
%, 5 and 6-mer 6%, 7-mer 1%, 8-mer or more 1% mixture) 1.0 unit mol (115.9 parts) was stirred and the internal liquid temperature was kept at 20 ° C. or lower. While maintaining the temperature, the solution was dropped over 1 hour and then reacted at 80 ° C. for 2 hours. Then, with stirring, while maintaining the internal liquid temperature at 20 ° C., a separately prepared sodium phenolate solution was added over 1 hour, and then 8
The reaction was carried out at 0 ° C for 5 hours. After completion of the reaction, the reaction mixture was concentrated to remove THF, and 1 liter of toluene was newly added. This toluene solution was mixed with 1 liter of 2% NaOH 3 times.
After washing twice, then washing three times with 1.0 liter of water,
The organic layer was concentrated under reduced pressure. The obtained product at 80 ° C.,
It was heated and vacuum-dried at 3 mmHg or less for 11 hours to obtain 229 parts of a white powder of crosslinked phenoxyphosphazene. The obtained crosslinked phenoxyphosphazene had a hydrolyzed chlorine content of 0.07.
%, Weight average molecular weight (Mw) 1130, phosphorus content and composition based on CHN elemental analysis values are [N = P (-O-Ph-C
(CH 3) was 2 -Ph-O-) 0.25 (-O -Ph) 1.50].

【0030】 実施例1 フェノールノボラック型エポキシ樹脂 50.0部 (ジャパンエポキシレジン(株)製エピコート154) ビフェノール型エポキシ樹脂 50.0部 (ジャパンエポキシレジン(株)製YX−4000) フェノールノボラック樹脂 61.1部 (明和化成(株)製HF−1、−OH当量:107) エポキシ硬化剤 0.5部 (四国化成工業(株)製キュアゾール2MZ−A) 軽質炭酸カルシウム 50.0部 架橋フェノキシホスファゼン樹脂粉末 20.0部 (合成例1で得られたもの、平均粒径:2μm) 以上の原料よりなるワニスを作製し、このワニスを、サ
ブトラクティブ法により第1の回路層を形成したガラス
エポキシ銅張積層板にスクリーン塗工により塗布した
後、110℃で20分間乾燥し、次いで150℃で30
分間熱硬化させ、厚さ60μmの絶縁樹脂層を形成した
基板を作製した。上記基板については、膨潤液(シプレ
ー(株)製)にて80℃で10分間浸漬水洗し、過マン
ガン酸系の粗化液(シプレー(株)製)にて80℃で2
0分間浸漬した後、水洗し、さらに、還元液(シプレー
(株)製)にて50℃で5分間浸漬した後、水洗し、絶
縁樹脂層表面を粗化した。この粗面化した基板を、無電
解銅メッキ液(シプレー(株)製)に35℃で10分間
浸漬し、無電解銅メッキを行なった。水洗後、100℃
で30分間アニーリングを行なった、メッキ層の厚みは
0.3μmであった。引き続き、硫酸銅溶液を用いた電
解銅メッキ液(シプレー(株)製)により、厚さ18〜
20μmの電解銅メッキ層を形成し、150℃で60分
間アフターベーキングを行なった。
Example 1 Phenolic novolac type epoxy resin 50.0 parts (Japan Epoxy Resin Co., Ltd. Epicoat 154) Biphenol type epoxy resin 50.0 parts (Japan Epoxy Resin Co., Ltd. YX-4000) Phenol novolac resin 61 1 part (MF-1 manufactured by Meiwa Kasei Co., Ltd., -OH equivalent: 107) Epoxy curing agent 0.5 part (Curazole 2MZ-A manufactured by Shikoku Kasei Co., Ltd.) Light calcium carbonate 50.0 parts Crosslinked phenoxyphosphazene 20.0 parts of resin powder (obtained in Synthesis Example 1, average particle size: 2 μm) A varnish made of the above raw materials was prepared, and the varnish was formed into a glass epoxy having a first circuit layer formed by a subtractive method. After coating the copper-clad laminate by screen coating, dry at 110 ° C for 20 minutes, then at 150 ° C. Thirty
It was heat-cured for a minute to prepare a substrate having an insulating resin layer with a thickness of 60 μm formed. The above-mentioned substrate was immersed in a swelling solution (manufactured by Shipley Co., Ltd.) for 10 minutes at 80 ° C., and washed with permanganate-based roughening solution (manufactured by Shipley Co., Ltd.) at 80 ° C. for 2 minutes.
After dipping for 0 minutes, it was washed with water and further dipped in a reducing solution (manufactured by Shipley Co., Ltd.) at 50 ° C. for 5 minutes and then washed with water to roughen the surface of the insulating resin layer. This roughened substrate was immersed in an electroless copper plating solution (manufactured by Shipley Co., Ltd.) at 35 ° C. for 10 minutes to perform electroless copper plating. After washing with water, 100 ℃
After annealing for 30 minutes, the thickness of the plating layer was 0.3 μm. Subsequently, an electrolytic copper plating solution (manufactured by Shipley Co., Ltd.) using a copper sulfate solution was used to make the
An electrolytic copper plating layer having a thickness of 20 μm was formed, and after-baking was performed at 150 ° C. for 60 minutes.

【0031】実施例2 実施例1において、軽質炭酸カルシウムを配合しない樹
脂組成物を用いた以外は実施例1と同様にして、銅メッ
キ層を形成した基板を作製した。
Example 2 A substrate having a copper plating layer was prepared in the same manner as in Example 1 except that the resin composition containing no light calcium carbonate was used.

【0032】実施例3 実施例2のワニスにメチルエチルケトンを加え、濃度5
5wt%になるように調整した。次に、厚さ0.2mm
のガラス織布(日東紡績(株)製)にワニス固形分が4
4.4wt%となるように含浸させ、130〜150℃
にて乾燥し、プリプレグを作製した。このプリプレグを
6枚重ね、厚さ25μmのポリプロピレンフィルムの間
にサンドウィッチし、170℃で120分間加熱、加圧
し、積層板を作製した。この積層板を用い、実施例1と
同様に銅メッキ層を形成した基板を作製した。
Example 3 Methyl ethyl ketone was added to the varnish of Example 2 to give a concentration of 5
It was adjusted to be 5 wt%. Next, thickness 0.2mm
Glass woven fabric (manufactured by Nitto Boseki Co., Ltd.) with a varnish solid content of 4
Impregnated so as to be 4.4 wt%, 130-150 ℃
And dried to prepare a prepreg. Six sheets of this prepreg were stacked, sandwiched between polypropylene films having a thickness of 25 μm, and heated and pressed at 170 ° C. for 120 minutes to prepare a laminated plate. Using this laminated plate, a substrate on which a copper plating layer was formed was prepared in the same manner as in Example 1.

【0033】 実施例4 ビスフェノールA型エポキシ樹脂 30.0部 (東都化成(株)製YP−50) フェノールノボラック型エポキシ樹脂 30.0部 (ジャパンエポキシレジン(株)製エピコート152) ビフェノール型エポキシ樹脂 30.0部 (ジャパンエポキシレジン(株)製YX−4000) フェノールノボラック樹脂 36.7部 (明和化成(株)製HF−1、水酸基当量:107) エポキシ硬化剤 0.5部 (四国化成工業(株)製キュアゾール2MZ−A) 軽質炭酸カルシウム 50.0部 架橋フェノキシホスファゼン樹脂粉末 20.0部 (合成例2で得られたもの、平均粒径:1μm) 以上の原料を用いたワニスを、厚さ38μmのPETフ
ィルムに乾燥厚みが60μmとなるように塗布し、接着
フィルムを得てから、これを実施例1と同様のガラスエ
ポキシ銅張積層板上に真空ラミネーターにより70℃に
てラミネートした基板に、さらに銅メッキ層を形成した
基板を作製した。
Example 4 Bisphenol A type epoxy resin 30.0 parts (YP-50 manufactured by Tohto Kasei Co., Ltd.) Phenol novolac type epoxy resin 30.0 parts (Epicoat 152 manufactured by Japan Epoxy Resin Co., Ltd.) Biphenol type epoxy resin 30.0 parts (YX-4000 manufactured by Japan Epoxy Resins Co., Ltd.) 36.7 parts of phenol novolac resin (HF-1 manufactured by Meiwa Kasei Co., Ltd., hydroxyl equivalent: 107) Epoxy curing agent 0.5 parts (Shikoku Chemicals) CUREZOL 2MZ-A manufactured by Co., Ltd. Light calcium carbonate 50.0 parts Crosslinked phenoxyphosphazene resin powder 20.0 parts (obtained in Synthesis Example 2, average particle size: 1 μm) A varnish using the above raw materials, It is applied to a PET film with a thickness of 38 μm so that the dry thickness is 60 μm, and an adhesive film is obtained. The same substrate as in Example 1 was laminated on a glass-epoxy copper clad laminate at 70 ° C. with a vacuum laminator, and a copper plating layer was further formed on the substrate.

【0034】比較例1 実施例1において、軽質炭酸カルシウムの添加量を70
部とし、架橋フェノキシホスファゼン樹脂粉末を配合し
なかった樹脂組成物を用いた以外は、実施例1と同様に
して銅メッキ層を形成した基板を作製した。
Comparative Example 1 In Example 1, the amount of light calcium carbonate added was 70%.
As a part, a substrate on which a copper plating layer was formed was prepared in the same manner as in Example 1 except that a resin composition containing no crosslinked phenoxyphosphazene resin powder was used.

【0035】比較例2 実施例1において、軽質炭酸カルシウム及び架橋フェノ
キシホスファゼン樹脂粉末に代えて、ポリブタジンゴム
(ダイセル化学工業(株)製エポリードPB3600)
を20.0部とした以外は、実施例1と同様にして銅メ
ッキ層を形成した基板を作製した。
Comparative Example 2 Instead of the light calcium carbonate and the crosslinked phenoxyphosphazene resin powder in Example 1, polybutazine rubber (Eporide PB3600 manufactured by Daicel Chemical Industries Ltd.) was used.
Was prepared in the same manner as in Example 1 except that the amount was 20.0 parts.

【0036】比較例3 比較例2において、さらに軽質炭酸カルシウムを70.
0部添加した以外は、比較例2と同様にして銅メッキ層
を形成した基板を作製した。
Comparative Example 3 In Comparative Example 2, light calcium carbonate of 70.
A substrate on which a copper plating layer was formed was prepared in the same manner as in Comparative Example 2 except that 0 part was added.

【0037】前記実施例1〜4及び比較例1〜3の各樹
脂組成物の組成を表1にまとめて示す。
The compositions of the resin compositions of Examples 1 to 4 and Comparative Examples 1 to 3 are summarized in Table 1.

【表1】 [Table 1]

【0038】試験例 前記実施例1〜4及び比較例1〜3で作製した銅メッキ
層を形成した基板を用い、粗面化形状の観察、ピール強
度、ヒートサイクル試験(耐熱衝撃性)、密着性テスト
(PCT耐性)、絶縁抵抗、可撓性試験及び耐熱性試験
等の試験を行ない、また硬化物のガラス転移点(Tg)
を測定した。結果を表2に示す。
Test Example Using the substrate on which the copper plating layer formed in Examples 1 to 4 and Comparative Examples 1 to 3 was formed, observation of roughened shape, peel strength, heat cycle test (heat shock resistance), adhesion Tests such as heat resistance test (PCT resistance), insulation resistance, flexibility test and heat resistance test, and the glass transition point (Tg) of the cured product.
Was measured. The results are shown in Table 2.

【表2】 なお、表2に示す各特性は、以下のようにして測定、評
価した。
[Table 2] The properties shown in Table 2 were measured and evaluated as follows.

【0039】粗化性:作製した基板の絶縁樹脂層表面
を、電子顕微鏡により3000倍にて観察し、溶出部分
の比較により判定した。判定基準は以下のとおりであ
る。 ◎:凹凸が全体に均一にあり、凹部の径、深度が良好な
もの ○:凹凸は得られるが、凹部の径、深度が小さいもの
Roughness: The surface of the insulating resin layer of the produced substrate was observed with an electron microscope at a magnification of 3000 and judged by comparing the eluted portions. The judgment criteria are as follows. ⊚: The unevenness is uniform throughout, and the diameter and depth of the recess are good. ○: The unevenness is obtained, but the diameter and depth of the recess are small.

【0040】ピ−ル強度:JIS−C6481の規定に
従って測定した。
Peel strength: Measured according to JIS-C6481.

【0041】耐熱衝撃性:作製した基板について、−5
5℃で30分保持し、次いで+125℃で30分保持す
るサイクルを1000サイクル繰り返し、絶縁樹脂層に
おけるクラック発生度を検査した。判定基準は以下のと
おりである。 ○:クラック等の異常なし。 ×:クラックが発生した。
Thermal shock resistance: -5 for the prepared substrate
A cycle of holding at 5 ° C. for 30 minutes and then at + 125 ° C. for 30 minutes was repeated 1000 times, and the degree of crack occurrence in the insulating resin layer was inspected. The judgment criteria are as follows. ◯: No abnormality such as cracks. X: A crack occurred.

【0042】PCT耐性:作製した基板を、121℃、
R.H.100%、2atomの条件で500時間静置
後、絶縁樹脂層の剥離の状態を検査した。判定基準は以
下のとおりである。 ○:異常なし。 ×:膨れ、剥がれ等が発生した。
PCT resistance: The prepared substrate is kept at 121 ° C.
R. H. After standing still at 100% and 2 atom for 500 hours, the state of peeling of the insulating resin layer was inspected. The judgment criteria are as follows. ○: No abnormality. X: Blistering and peeling occurred.

【0043】絶縁抵抗:L(ライン)/S(スペース)
=50/50における初期及び135℃、85%R.
H.、15V印加にて300時間後の試験基板につい
て、DC500V、1分の測定条件で抵抗値を測定し
た。
Insulation resistance: L (line) / S (space)
= 50/50 and 135 ° C, 85% R.S.
H. The resistance value was measured under the measurement condition of DC500V for 1 minute on the test substrate after applying 300V for 15 hours.

【0044】可撓性:エリクセン試験により測定し、以
下の基準で判定した。 良好:5mm以上 不良:5mm以下
Flexibility: Measured by the Erichsen test and judged according to the following criteria. Good: 5 mm or more Poor: 5 mm or less

【0045】はんだ耐熱性:JIS C−6481に記
載の試験方法に準じて、前記基板の絶縁樹脂層にロジン
系フラックスを塗布し、230℃のはんだ槽に10秒間
浸漬する操作を3回繰り返し、絶縁樹脂層の状態を以下
の基準で評価した。 良好:異常なし。 不良:膨れ、剥がれが発生した。
Solder heat resistance: According to the test method described in JIS C-6481, an operation of applying a rosin flux to the insulating resin layer of the substrate and immersing it in a solder bath at 230 ° C. for 10 seconds is repeated 3 times. The state of the insulating resin layer was evaluated according to the following criteria. Good: No abnormality. Bad: Blisters and peeling occurred.

【0046】ガラス転移点(Tg):JIS−K 71
21の規定に従って測定した。
Glass transition point (Tg): JIS-K71
The measurement was performed according to the regulations of 21.

【0047】[0047]

【発明の効果】以上説明したように、本発明の粗化面形
成用樹脂組成物は、粗化剤に可溶性のフィラーとして、
特定構造の架橋フェノキシホスファゼン樹脂粉末を含有
しているため、粗化処理により良好な粗化面が形成で
き、密着性、耐熱衝撃性、PCT耐性、曲げ弾性率など
の特性に優れ、また、耐熱性にも優れた層間樹脂絶縁層
を形成でき、導体回路の高微細化、高密度化に応えるこ
とができる高信頼性のプリント基板を提供することがで
きる。さらに、架橋フェノキシホスファゼン樹脂粉末
は、ハロゲンフリーであるにも拘らず樹脂組成物に充分
な難燃効果を付与し、しかも前記したような優れた特性
を付与するため、本発明の樹脂組成物を用いることによ
り、耐熱衝撃性、可撓性、耐熱性、耐湿性、電気特性、
難燃性等に優れたプリント配線板用プリプレグを提供す
ることができる。
As described above, the resin composition for forming a roughened surface of the present invention, as a filler soluble in the roughening agent,
Since it contains crosslinked phenoxyphosphazene resin powder with a specific structure, it can form a good roughened surface by roughening treatment, and has excellent properties such as adhesion, thermal shock resistance, PCT resistance, and flexural modulus. It is possible to provide a highly reliable printed circuit board which can form an interlayer resin insulation layer having excellent properties and can respond to higher miniaturization and higher density of conductor circuits. Further, the crosslinked phenoxyphosphazene resin powder imparts a sufficient flame retarding effect to the resin composition despite being halogen-free and, in addition, imparts the above-mentioned excellent properties to the resin composition of the present invention. By using it, thermal shock resistance, flexibility, heat resistance, moisture resistance, electrical characteristics,
It is possible to provide a prepreg for a printed wiring board having excellent flame retardancy and the like.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の樹脂組成物を用いてビルドアップ法に
より作製した多層プリント配線板の概略構成を示す部分
断面図である。
FIG. 1 is a partial cross-sectional view showing a schematic configuration of a multilayer printed wiring board produced by a build-up method using a resin composition of the present invention.

【符号の説明】[Explanation of symbols]

1 絶縁基板 3 内層導体パターン 4,9 樹脂絶縁層 8 外層導体パターン 10 最外層導体パターン 20 スルーホール A 積層基板 1 Insulation board 3 Inner layer conductor pattern 4,9 Resin insulation layer 8 Outer layer conductor pattern 10 Outermost layer conductor pattern 20 through holes A laminated substrate

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05K 3/46 H05K 3/46 T (72)発明者 米田 直樹 埼玉県比企郡嵐山町大字大蔵388番地 太 陽インキ製造株式会社嵐山事業所内 (72)発明者 多田 祐二 徳島県徳島市川内町加賀須野463 大塚化 学株式会社徳島研究所内 Fターム(参考) 4F072 AA07 AB09 AB28 AD13 AD15 AD16 AD26 AD27 AD28 AF16 AK05 AL13 4J002 BD123 CC041 CC061 CD021 CD041 CD051 CD061 CL003 CP033 CQ012 DE186 DE236 DG046 DJ016 DJ036 DJ046 DJ056 FD013 GF00 GQ00 4J030 CA02 CB43 CB48 CD11 CE02 CG21 5E346 AA12 CC09 HH08 HH13 HH18─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) H05K 3/46 H05K 3/46 T (72) Inventor Naoki Yoneda 388, Okura, Okura, Arakiyama-cho, Hiki-gun, Saitama Prefecture Yo Ink Manufacturing Co., Ltd. Arashiyama Plant (72) Inventor Yuji Tada 463, Kagasuno, Tokushima City, Tokushima Prefecture Otsuka Chemical Co., Ltd. Tokushima Laboratory Co., Ltd. F Term (reference) 4F072 AA07 AB09 AB28 AD13 AD15 AD16 AD26 AD27 AD28 AF16 AK05 AL13 4J002 BD123 CC041 CC061 CD021 CD041 CD051 CD061 CL003 CP033 CQ012 DE186 DE236 DG046 DJ016 DJ036 DJ046 DJ056 FD013 GF00 GQ00 4J030 CA02 CB43 CB48 CD11 CE02 CG21 5E346 AA12 CC09 HH08 HH13 HH18

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 エポキシ樹脂及び/又はフェノール樹脂
をマトリックスの主成分とする樹脂組成物において、下
記一般式(1)で表わされる環状フェノキシホスファゼ
ン及び下記一般式(2)で表わされる直鎖状フェノキシ
ホスファゼンよりなる群から選ばれる少なくとも1種の
ホスファゼン化合物(a)が、o−フェニレン基、m−
フェニレン基、p−フェニレン基及び下記一般式(3)
で表わされるビスフェニレン基よりなる群から選ばれる
少なくとも1種の架橋基(b)により架橋された化合物
であって、上記ホスファゼン化合物(a)のフェニル基
が脱離した2個の酸素原子間に上記架橋基(b)が介在
した構造を有すると共に、フェニル基の含有割合が上記
ホスファゼン化合物(a)中の全フェニル基の総数を基
準に50〜99.9%であり、且つ分子内にフリーの水
酸基を有しない架橋フェノキシホスファゼン樹脂粉末
を、有機フィラーとして含有することを特徴とする粗化
面形成用の樹脂組成物。 【化1】 [式中、Phはフェニル基を表わし、Xは基−N=P
(OPh)3又は基−N=P(=O)OPhを表わし、
Yは基−P(=O)(OPh)又は基−P(OPh)3
を表わし、Aは−C(CH32−、−SO2−、−S−
又は−O−を表わし、mは3〜25の整数であり、nは
3〜10,000の整数であり、aは0又は1であ
る。]
1. A resin composition containing an epoxy resin and / or a phenol resin as a main component of a matrix, which comprises a cyclic phenoxyphosphazene represented by the following general formula (1) and a linear phenoxy group represented by the following general formula (2). At least one phosphazene compound (a) selected from the group consisting of phosphazenes is an o-phenylene group, m-
Phenylene group, p-phenylene group and the following general formula (3)
A compound which is crosslinked by at least one kind of a crosslinkable group (b) selected from the group consisting of bisphenylene groups represented by the following formula, wherein the phenyl group of the phosphazene compound (a) is between two oxygen atoms eliminated. The phenyl group content is 50 to 99.9% based on the total number of all phenyl groups in the phosphazene compound (a), while having a structure in which the crosslinking group (b) is interposed, and is free in the molecule. A resin composition for forming a roughened surface, comprising the crosslinked phenoxyphosphazene resin powder having no hydroxyl group as described above as an organic filler. [Chemical 1] [In the formula, Ph represents a phenyl group, and X represents a group -N = P.
(OPh) 3 or a group —N═P (═O) OPh,
Y is a group -P (= O) (OPh) or a group -P (OPh) 3.
The expressed, A is -C (CH 3) 2 -, - SO 2 -, - S-
Or represents -O-, m is an integer of 3 to 25, n is an integer of 3 to 10,000, and a is 0 or 1. ]
【請求項2】 ドライフィルムの形態であることを特徴
とする請求項1に記載の樹脂組成物。
2. The resin composition according to claim 1, which is in the form of a dry film.
【請求項3】 導体回路層間に層間樹脂絶縁層が形成さ
れている多層プリント配線板において、上記層間樹脂絶
縁層が請求項1又は2に記載の樹脂組成物を用いて形成
され、且つ粗化処理されたものであることを特徴とする
多層プリント配線板。
3. In a multilayer printed wiring board in which an interlayer resin insulation layer is formed between conductor circuit layers, the interlayer resin insulation layer is formed by using the resin composition according to claim 1 and is roughened. A multilayer printed wiring board characterized by being processed.
【請求項4】 繊維質シート状基材に、請求項1に記載
の樹脂組成物を含浸させてなることを特徴とするプリン
ト配線板用プリプレグ。
4. A prepreg for a printed wiring board, which is obtained by impregnating a fibrous sheet-like base material with the resin composition according to claim 1.
JP2001284983A 2001-09-19 2001-09-19 Multilayer printed wiring board using resin composition for forming roughened surface Expired - Lifetime JP4880841B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Application Number Priority Date Filing Date Title
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Publication Number Publication Date
JP2003096267A true JP2003096267A (en) 2003-04-03
JP4880841B2 JP4880841B2 (en) 2012-02-22

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Country Link
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Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52153987A (en) * 1976-06-15 1977-12-21 Du Pont Ignition delayed polymer composition
JPS6462333A (en) * 1987-09-02 1989-03-08 Nitto Kasei Co Ltd Production of flame-retardant phenolic resin laminate
JPH0455555A (en) * 1990-06-25 1992-02-24 Misawa Homes Co Ltd Mounting construction of hand-rail post of building
JPH0782482A (en) * 1993-09-10 1995-03-28 Fujitsu Ltd Polymer complex and its production
JPH11181429A (en) * 1997-02-14 1999-07-06 Otsuka Chem Co Ltd Flame-retardant, flame-retardant resin composition and flame-retardant resin molded product
JP2000103939A (en) * 1998-09-30 2000-04-11 Hitachi Chem Co Ltd Epoxy resin molding material for sealing and device for electronic part
JP2000256551A (en) * 1999-03-04 2000-09-19 Otsuka Chem Co Ltd Flame-retardant polyphenylene ether-based resin composition
JP2000336252A (en) * 1999-06-01 2000-12-05 Toshiba Chem Corp Flame-retarded epoxy resin composition, prepreg and laminate product
JP2001181375A (en) * 1999-10-13 2001-07-03 Ajinomoto Co Inc Epoxy resin composition, adhesive film and pre-preg thereby, multilayer printed circuit board using same and its producing method
JP2001261792A (en) * 2000-01-14 2001-09-26 Otsuka Chem Co Ltd Epoxy resin composition and electronic part using the same
JP2001335676A (en) * 2000-03-21 2001-12-04 Otsuka Chem Co Ltd Flame-retardant epoxy resin composition, molded article thereof, and electronic parts
JP2001335703A (en) * 2000-03-21 2001-12-04 Otsuka Chem Co Ltd Flame retardant, flame retardant resin composition, molded article and electronic part
JP2002040633A (en) * 2000-07-24 2002-02-06 Toshiba Chem Corp Halogen-free photosensitive resin composition

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52153987A (en) * 1976-06-15 1977-12-21 Du Pont Ignition delayed polymer composition
JPS6462333A (en) * 1987-09-02 1989-03-08 Nitto Kasei Co Ltd Production of flame-retardant phenolic resin laminate
JPH0455555A (en) * 1990-06-25 1992-02-24 Misawa Homes Co Ltd Mounting construction of hand-rail post of building
JPH0782482A (en) * 1993-09-10 1995-03-28 Fujitsu Ltd Polymer complex and its production
JPH11181429A (en) * 1997-02-14 1999-07-06 Otsuka Chem Co Ltd Flame-retardant, flame-retardant resin composition and flame-retardant resin molded product
JP2000103939A (en) * 1998-09-30 2000-04-11 Hitachi Chem Co Ltd Epoxy resin molding material for sealing and device for electronic part
JP2000256551A (en) * 1999-03-04 2000-09-19 Otsuka Chem Co Ltd Flame-retardant polyphenylene ether-based resin composition
JP2000336252A (en) * 1999-06-01 2000-12-05 Toshiba Chem Corp Flame-retarded epoxy resin composition, prepreg and laminate product
JP2001181375A (en) * 1999-10-13 2001-07-03 Ajinomoto Co Inc Epoxy resin composition, adhesive film and pre-preg thereby, multilayer printed circuit board using same and its producing method
JP2001261792A (en) * 2000-01-14 2001-09-26 Otsuka Chem Co Ltd Epoxy resin composition and electronic part using the same
JP2001335676A (en) * 2000-03-21 2001-12-04 Otsuka Chem Co Ltd Flame-retardant epoxy resin composition, molded article thereof, and electronic parts
JP2001335703A (en) * 2000-03-21 2001-12-04 Otsuka Chem Co Ltd Flame retardant, flame retardant resin composition, molded article and electronic part
JP2002040633A (en) * 2000-07-24 2002-02-06 Toshiba Chem Corp Halogen-free photosensitive resin composition

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