JP2000017148A - Thermosetting resin composition and interlaminar adhesive film for printed wiring board using the same - Google Patents

Thermosetting resin composition and interlaminar adhesive film for printed wiring board using the same

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Publication number
JP2000017148A
JP2000017148A JP18595498A JP18595498A JP2000017148A JP 2000017148 A JP2000017148 A JP 2000017148A JP 18595498 A JP18595498 A JP 18595498A JP 18595498 A JP18595498 A JP 18595498A JP 2000017148 A JP2000017148 A JP 2000017148A
Authority
JP
Japan
Prior art keywords
laminate
printed wiring
thermosetting resin
resin composition
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18595498A
Other languages
Japanese (ja)
Inventor
Kiyotaka Furuta
清敬 古田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ajinomoto Co Inc
Original Assignee
Ajinomoto Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ajinomoto Co Inc filed Critical Ajinomoto Co Inc
Priority to JP18595498A priority Critical patent/JP2000017148A/en
Publication of JP2000017148A publication Critical patent/JP2000017148A/en
Pending legal-status Critical Current

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  • Epoxy Resins (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PROBLEM TO BE SOLVED: To prepare a thermosetting resin composition meeting densification, high thermostability, electric insulation and strength of adhesive bonding to the layer of conductive material at the same time by including an epoxy resin, a phenolic resin, an aromatic diamine compound having an imide group, rubber component and a hardening accelerator. SOLUTION: This thermosetting resin composition contains (A) an epoxy resin (e.g. phenol novolak-type epoxy resin, etc.), (B) a phenolic resin (e.g. phenol novolak resin, etc.), (C) an aromatic diamine having an imide group pref. a compound of the formula [Ar1 and Ar2 are each an aromatic residue; R1 is H or a 1-10C alkyl; R2 is H, a 1-20C alkyl, an alkoxy, a halogen; (n) is 0-30]}, (D) a rubber component (e.g. polybutadiene rubber, etc.), and (E) a hardening accelerator (e.g. imidazole compounds, phosphines, etc.).

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は熱硬化性樹脂組成物
及びこれを用いたプリント配線板用層間接着フィルム、
積層板用プリプレグ、プリント配線板に関する。
TECHNICAL FIELD The present invention relates to a thermosetting resin composition and an interlayer adhesive film for a printed wiring board using the same.
The present invention relates to a prepreg for a laminate and a printed wiring board.

【0002】[0002]

【従来の技術】近年電子機器の小型化、高性能化に伴い
プリント配線板の高密度化、多層化が進行している。こ
のような高密度多層プリント配線板の製造方法として従
来の銅箔とプリプレグ及び内層材を用いた積層プレス法
を用いることなく導体層上に絶縁樹脂層を交互に積層さ
せかつ、配線をビアホールで接続するビルドアップ方式
の多層プリント配線板の開発が活発に行われている。ビ
ルドアップ方式のプリント配線板は半導体パッケージ、
MCM等のサブストレートとしての利用が期待されてい
る。
2. Description of the Related Art In recent years, as electronic devices have become smaller and higher in performance, printed wiring boards have been increasing in density and multilayered. As a method of manufacturing such a high-density multilayer printed wiring board, an insulating resin layer is alternately laminated on a conductor layer without using a conventional copper foil, a prepreg and a laminating press method using an inner layer material, and the wiring is formed by a via hole. The development of build-up type multilayer printed wiring boards for connection is being actively conducted. Build-up type printed wiring boards are semiconductor packages,
It is expected to be used as a substrate for MCM and the like.

【0003】ビルドアップ方式のプリント配線板におけ
るビアホールの形成方法には絶縁樹脂層に感光性樹脂を
用い露光、現像で形成するフォトビア方式と熱硬化性樹
脂を用いレーザー加工等によりビアホールを形成する方
法が検討されている。絶縁樹脂層に感光性樹脂を用いる
方法としては、ビアホール形成を一括で形成できるメリ
ットはあるが、重合開始剤や増感剤等の低分子化合物が
絶縁層中に残存するため後工程の工程中に溶出したり、
長期絶縁信頼性等に問題があった。また導体層と絶縁樹
脂層とピール強度(接着強度)も十分満足されていな
い。これを解決するため酸化剤に可溶な微粒子樹脂粉体
を添加する等が行われているが、酸化剤にクロム酸を使
用するため安全性、作業性の面で問題があった。一方、
絶縁樹脂層に熱硬化性樹脂を用いる方法としては特開平
7−304931などが開示されているが、導体層と絶
縁樹脂層とピール強度(接着強度)を確保するためのフ
ィラーとして炭酸カルシウムなどを配合しており、パッ
ケージ用基板、MCM用基板等の高密度、高信頼性が要
求される基板においては耐熱性、絶縁信頼性の面で十分
満足されていないのが現状である。
A method of forming a via hole in a printed wiring board of a build-up type includes a photo via method in which a photosensitive resin is used for an insulating resin layer and exposure and development, and a method in which a via hole is formed by laser processing using a thermosetting resin. Is being considered. As a method of using a photosensitive resin for the insulating resin layer, there is an advantage that via holes can be formed at once, but since a low molecular compound such as a polymerization initiator or a sensitizer remains in the insulating layer, it may be used during a post-process. To elute,
There was a problem with long-term insulation reliability. Further, the peel strength (adhesive strength) between the conductor layer, the insulating resin layer and the insulating layer is not sufficiently satisfied. In order to solve this problem, addition of fine resin powder soluble in an oxidizing agent has been performed. However, since chromic acid is used as the oxidizing agent, there have been problems in safety and workability. on the other hand,
Japanese Patent Application Laid-Open No. Hei 7-304931 discloses a method of using a thermosetting resin for the insulating resin layer. However, calcium carbonate or the like is used as a filler for securing the peel strength (adhesive strength) between the conductor layer and the insulating resin layer. At present, substrates that require high density and high reliability such as package substrates and MCM substrates are not sufficiently satisfied in terms of heat resistance and insulation reliability.

【0004】また、従来の積層プレス法を用いた銅張り
積層板ではスルーホールメッキ工程が入るため外層導体
は銅箔に銅メッキの銅厚が足され銅の厚さが厚くなりフ
ァインパターンの形成が困難である。特開平05−29
5554にはメッキ触媒を分散し硬化させた樹脂を粉体
とし、この粉体をワニスに混合し基材に含浸させたプリ
プレグを積層成形する方法が提案されているが、メッキ
触媒を使用しているため電気絶縁性等の特性を低下させ
るという問題があり、高密度化された近年のプリント配
線板には適応できない。また、銅張り積層板の銅箔をエ
ッチングで除去した後再度銅メッキを施し導体層を形成
する方法や、プリプレグと内層材を積層プレスした後、
表面を機械的(物理的)方法で処理し銅メッキにより回
路を形成する方法(特開平9−8458)も提案されて
いるが、いずれも樹脂と銅メッキの接着強度は十分でな
くプリント配線板としての使用には問題があった。
Further, in a copper-clad laminate using a conventional lamination press method, a through-hole plating step is included, so that the outer conductor is formed by adding a copper plating copper thickness to a copper foil, thereby increasing the copper thickness and forming a fine pattern. Is difficult. JP 05-29A
No. 5554 proposes a method in which a resin obtained by dispersing and hardening a plating catalyst is powdered, and this powder is mixed with a varnish to laminate and form a prepreg impregnated in a base material. Therefore, there is a problem of deteriorating characteristics such as electric insulation, and cannot be applied to a recent high-density printed wiring board. Also, after removing the copper foil of the copper-clad laminate by etching and then again performing copper plating to form a conductor layer, or after laminating the prepreg and the inner layer material,
A method in which the surface is treated by a mechanical (physical) method to form a circuit by copper plating (Japanese Patent Application Laid-Open No. 9-8458) has also been proposed, but in any case, the adhesive strength between the resin and the copper plating is not sufficient and the printed wiring board is not sufficient. There was a problem with its use.

【0005】[0005]

【発明が解決しようとする課題】上記の情況を鑑み、高
密度化、高耐熱性と電気絶縁特性並びに導体層の接着強
度を同時に満足する熱硬化性樹脂組成物及びこれを用い
たプリント配線板用層間接着フィルム、積層板用プリプ
レグ及び積層板を提供することにある。
In view of the above circumstances, a thermosetting resin composition which simultaneously satisfies high density, high heat resistance, electrical insulation properties and adhesive strength of a conductive layer, and a printed wiring board using the same. An object of the present invention is to provide an interlayer adhesive film, a prepreg for a laminate, and a laminate.

【0006】[0006]

【課題を解決するための手段】上記問題点を解決するた
め本発明者らは鋭意研究の結果、次に示す熱硬化性樹脂
組成物及びこれを用いたプリント配線板用層間接着フィ
ルム、積層板用プリプレグ及び積層板、プリント配線
板、多層プリント配線板が極めて優れた性能を有するこ
とを見いだし本発明を完成させるに至った。すなわち本
発明は(A)エポキシ樹脂、(B)フェノール樹脂
(C)イミド基を有する芳香族ジアミン化合物(D)ゴ
ム成分及び(E)硬化促進剤を必須成分としてなる熱硬
化性樹脂組成物及びこれを用いたプリント配線板用層間
接着フィルム、積層板用プリプレグ及び積層板である。
Means for Solving the Problems In order to solve the above problems, the present inventors have conducted intensive studies and found that the following thermosetting resin compositions, interlayer adhesive films for printed wiring boards using the same, and laminates The present inventors have found that prepregs and laminates, printed wiring boards, and multilayer printed wiring boards for use have extremely excellent performance, and have completed the present invention. That is, the present invention relates to a thermosetting resin composition comprising (A) an epoxy resin, (B) a phenolic resin, (C) an aromatic diamine compound having an imide group, (D) a rubber component, and (E) a curing accelerator as essential components. They are interlayer adhesive films for printed wiring boards, prepregs for laminated boards, and laminated boards using the same.

【0007】さらには該熱硬化性樹脂組成物において、
(C)イミド基を有する芳香族ジアミン化合物が下記一
般式(1)で示される熱硬化性樹脂組成物である。
Further, in the thermosetting resin composition,
(C) An aromatic diamine compound having an imide group is a thermosetting resin composition represented by the following general formula (1).

【化2】 (式中、Ar1、Ar2はそれぞれ独立に芳香族残基、R
1は水素原子あるいは炭素数1から10のアルキル基、
2は水素原子、炭素数1から20のアルキル基、アル
コキシ基、ハロゲン基を表し、nは0から30の整数を
表す。)
Embedded image (Wherein, Ar 1 and Ar 2 each independently represent an aromatic residue, R
1 is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms,
R 2 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an alkoxy group, or a halogen group, and n represents an integer of 0 to 30. )

【0008】又、(1)内層回路形成された内層材の少
なくとも片面上に、プリント配線板用層間接着フィルム
を加圧かつ加熱条件下でラミネート後、支持ベースフィ
ルムを剥離除去後し、必要により層間接着フィルムを熱
硬化させ、(2)該硬化面に粗化剤処理により凹凸状の
粗化面を形成し、(3)粗化面上に導体層を形成して得
ることを特徴とする多層プリント配線板である。
(1) An interlayer adhesive film for a printed wiring board is laminated on at least one surface of an inner layer material formed with an inner layer circuit under pressure and heating conditions, and a support base film is peeled off and removed, if necessary. The interlayer adhesive film is cured by heat, (2) a roughened surface is formed on the cured surface by a roughening agent treatment, and (3) a conductor layer is formed on the roughened surface. It is a multilayer printed wiring board.

【0009】さらには、(1)回路形成された内層材に
積層板用プリプレグが表面になるように積層して多層積
層板を得、(2)該多層積層板の表面に粗化剤処理によ
り凹凸状の粗化面を形成し、(3)該多層積層板の粗化
された表面に導体層を形成することを特徴とする多層プ
リント配線板である。
Further, (1) a prepreg for a laminate is laminated on the inner layer material on which a circuit is formed so that the surface thereof becomes a surface to obtain a multilayer laminate, and (2) the surface of the multilayer laminate is treated with a roughening agent. (3) A multilayer printed wiring board characterized by forming a roughened surface in an uneven shape and (3) forming a conductor layer on the roughened surface of the multilayer laminate.

【0010】[0010]

【発明の実施の形態】本発明に用いる熱硬化性樹脂組成
物の配合は(A)エポキシ樹脂、(B)フェノール樹脂
(C)イミド基を有する芳香族ジアミン化合物(D)ゴ
ム成分及び(E)硬化促進剤を必須成分として構成され
る。各成分について以下に説明する。(A)成分のエポ
キシ樹脂の具体例としてはフェノールノボラック型エポ
キシ樹脂(例:油化シェルエポキシ(株)製エピコート
152、154)、クレゾールノボラック型エポキシ樹
脂(例:大日本インキ化学(株)製エピクロンNー67
3、N−695)、ビスフェノールA型エポキシ樹脂、
ビスフェノールF型エポキシ樹脂、(例:油化シェルエ
ポキシ(株)製エピコート828EL、807)ビスフ
ェノールS型エポキシ樹脂(例:大日本インキ化学
(株)製エピクロンEXA−1514)、ビフェニル型
エポキシ樹脂(例:油化シェルエポキシ(株)製エピコ
ートYX−4000)ナフタレン型エポキシ樹脂(例:
大日本インキ化学(株)製HP−4032)、ジシクロ
ペンタジエン型エポキシ樹脂(例:大日本インキ化学
(株)製HP−7200)N−グリシジル型エポキシ樹
脂、脂環式エポキシ樹脂等のエポキシ樹脂、トリグリシ
ジルイソシアヌレート、また可とう性付与の観点からフ
ェノキシ樹脂(例:東都化成(株)製YP−50S)、
ウレタン変性エポキシ樹脂、ゴム変性エポキシ樹脂、臭
素化エポキシ樹脂(例:東都化成(株)製YDBー50
0、日本化薬(株)製BREN)など公知のエポキシ樹
脂が使用できる。
BEST MODE FOR CARRYING OUT THE INVENTION The thermosetting resin composition used in the present invention comprises (A) an epoxy resin, (B) a phenolic resin, (C) an aromatic diamine compound having an imide group, (D) a rubber component, and (E) ) A curing accelerator is constituted as an essential component. Each component is described below. Specific examples of the epoxy resin (A) include a phenol novolak type epoxy resin (eg, Epicoat 152, 154 manufactured by Yuka Shell Epoxy Co., Ltd.) and a cresol novolak type epoxy resin (eg, manufactured by Dainippon Ink and Chemicals, Inc.) Epicron N-67
3, N-695), bisphenol A type epoxy resin,
Bisphenol F type epoxy resin, (eg, Yuka Shell Epoxy Co., Ltd. Epicoat 828EL, 807) Bisphenol S type epoxy resin (eg, Dainippon Ink & Chemicals, Inc. Epicron EXA-1514), biphenyl type epoxy resin (example) : Eicoat Shell Epoxy Co., Ltd. Epicoat YX-4000) naphthalene type epoxy resin (Example:
Epoxy resin such as HP-4032 manufactured by Dainippon Ink and Chemicals, dicyclopentadiene type epoxy resin (eg, HP-7200 manufactured by Dainippon Ink and Chemicals, Inc.) N-glycidyl type epoxy resin, alicyclic epoxy resin, etc. , Triglycidyl isocyanurate, and a phenoxy resin from the viewpoint of imparting flexibility (eg, YP-50S manufactured by Toto Kasei Co., Ltd.),
Urethane-modified epoxy resin, rubber-modified epoxy resin, brominated epoxy resin (Example: YDB-50 manufactured by Toto Kasei Co., Ltd.)
A known epoxy resin such as Nippon Kayaku Co., Ltd. BREN) can be used.

【0011】(B)成分のフェノール樹脂としては、フ
ェノールノボラック樹脂、(例:大日本インキ化学
(株)製TDー2090、昭和高分子(株)製BRG−
556)クレゾールノボラック樹脂、(例:三菱油化
(株)レジンX)、 ポリビニルフェノール樹脂(例:
丸善石油化学(株)製マルカリンカー)、ビスフェノー
ルA樹脂、ビスフェノールF樹脂、ビスフェノールS型
樹脂、ビフェノール樹脂、レゾール型フェノール樹脂、
トリアジン骨格含有フェノールノボラック樹脂(例:大
日本インキ化学工業製フェノライト7052)、シクロ
ペンタジエンとフェノールの付加化合物、液状ポリブタ
ジエンとフェノールの付加化合物(日本石油化学(株)
製特殊フェノール樹脂PP−1000−180 、DP
P−M、DPA−155)特殊ノボラックフェノール樹
脂(三井石油化学(株)製Xylok)など公知のフェ
ノール樹脂を用いるができる。
As the phenol resin of the component (B), phenol novolak resin (for example, TD-2090 manufactured by Dainippon Ink and Chemicals, BRG- manufactured by Showa Polymer Co., Ltd.)
556) Cresol novolak resin, (Example: Resin X, Mitsubishi Yuka Co., Ltd.), polyvinylphenol resin (Example:
Maruza Linker manufactured by Maruzen Petrochemical Co., Ltd.), bisphenol A resin, bisphenol F resin, bisphenol S type resin, biphenol resin, resol type phenol resin,
Triazine skeleton-containing phenol novolak resin (eg, phenolite 7052 manufactured by Dainippon Ink and Chemicals, an addition compound of cyclopentadiene and phenol, an addition compound of liquid polybutadiene and phenol (Nippon Petrochemical Co., Ltd.)
Special phenolic resin PP-1000-180, DP
A known phenol resin such as PM, DPA-155) special novolak phenol resin (Xylok manufactured by Mitsui Petrochemical Co., Ltd.) can be used.

【0012】一般に芳香族ジアミン化合物をエポキシ樹
脂の硬化剤に用いた熱硬化性樹脂組成物は耐熱性、耐薬
品に優れていることが知られており、ジアミノジフェニ
ルメタン(DDM)、ジアミノジフェニルスルホン(D
DS)などに代表される芳香族ジアミン化合物は、エポ
キシ樹脂や有機溶剤への溶解性が悪いため、保存中の結
晶化の問題や加熱混合などの必要があり取り扱いが困難
である。本発明の(C)イミド基を有する芳香族ジアミ
ン化合物としては無水ピロメリット酸などのテトラカル
ボン酸無水物、1モルにビス(4−アミノフェニル)エ
ーテル、2モルを反応して得られる環化縮合化合物、ビ
スマレイミドとジアミノジフェニルメタン(DDM)と
の付加化合物などを使用できるが、耐熱性、溶解性の観
点から下記一般式(化1)で表せるイミド基を有する芳
香族ジアミン化合物(例:住友化学製ベストレックスS
M−20)を用いることが好ましい。
It is generally known that a thermosetting resin composition using an aromatic diamine compound as a curing agent for an epoxy resin is excellent in heat resistance and chemical resistance. For example, diaminodiphenylmethane (DDM), diaminodiphenylsulfone ( D
An aromatic diamine compound represented by DS) or the like has poor solubility in an epoxy resin or an organic solvent, and thus is difficult to handle due to a problem of crystallization during storage or a need for mixing by heating. The aromatic diamine compound having an imide group (C) of the present invention is a cyclized compound obtained by reacting a tetracarboxylic anhydride such as pyromellitic anhydride, 1 mole of bis (4-aminophenyl) ether and 2 moles. A condensed compound, an addition compound of bismaleimide and diaminodiphenylmethane (DDM) and the like can be used. From the viewpoint of heat resistance and solubility, an aromatic diamine compound having an imide group represented by the following general formula (Formula 1) (eg, Sumitomo) Chemical Vest Rex S
M-20) is preferably used.

【0013】前記(B)、(C)成分の含有量は、
(A)成分に使用するエポキシ樹脂中のエポキシ基1.
0に対して(B)、(C)成分中の活性水素基の合計が
0.3以上1.0以下の範囲であることが望ましい。こ
れ以下の添加量では耐熱性が低下しい。
The contents of the components (B) and (C) are as follows:
(A) Epoxy group in epoxy resin used for component 1.
It is desirable that the sum of the active hydrogen groups in the components (B) and (C) be in the range of 0.3 to 1.0 with respect to 0. If the amount is less than this, the heat resistance is hardly reduced.

【0014】(D)ゴム成分の例としてはポリブタジエ
ンゴム(出光石油化学(株)製R−45HT、日本曹達
(株)製G−1000など)、ウレタン変性、マレイン
化、アクリル化、メタクリル化、エポキシ変性等の各種
ポリブタジエン誘導体(出光石油化学(株)R−45E
PI、日本曹達(株)製BN−1015、GQ−100
0など)、コアシェルゴム微粒子(武田薬品工業(株)
製スタフィロイド、日本ゼオン(株)製F351な
ど)、又は予めエポキシ樹脂中に微粒子ゴムを分散させ
た微粒子ゴム分散エポキシ樹脂(東都化成(株)製YR
−570、YR−528)などがあげられる。
Examples of the rubber component (D) include polybutadiene rubber (R-45HT manufactured by Idemitsu Petrochemical Co., Ltd., G-1000 manufactured by Nippon Soda Co., Ltd.), urethane modification, maleation, acrylation, methacrylation, Various polybutadiene derivatives such as epoxy modified (Idemitsu Petrochemical Co., Ltd. R-45E
PI, Nippon Soda Co., Ltd. BN-1015, GQ-100
0), core-shell rubber fine particles (Takeda Pharmaceutical Co., Ltd.)
Staphyloid, manufactured by Nippon Zeon Co., Ltd., etc.) or a fine particle rubber-dispersed epoxy resin in which fine particle rubber is previously dispersed in an epoxy resin (YR manufactured by Toto Kasei Co., Ltd.)
-570, YR-528) and the like.

【0015】これらゴム成分の含有量は、エポキシ樹脂
100重量部に対して40重量部以下であることが望ま
しい。これ以上の添加量では耐熱性等が低下し好ましく
ない。
The content of these rubber components is desirably 40 parts by weight or less based on 100 parts by weight of the epoxy resin. If the addition amount is more than this, heat resistance and the like are undesirably reduced.

【0016】(E)成分の硬化促進剤の具体例として
は、三級アミン類、四級アンモニウム塩、イミダゾール
化合物類またはこれらの有機酸塩、ホスフィン化合物
類、グアナミン化合物類、三フッ化ホウ素化合物類が挙
げられるが、好ましくはイミダゾール化合物類、ホスフ
ィン化合物類である。
Specific examples of the curing accelerator (E) include tertiary amines, quaternary ammonium salts, imidazole compounds or organic acid salts thereof, phosphine compounds, guanamine compounds, boron trifluoride compounds. , But preferably imidazole compounds and phosphine compounds.

【0017】前記熱硬化性樹脂組成物はスクリーン印
刷、カーテンコート、ロールコート、スプレーコートな
ど公知の方法を用いて基板に塗布することができる。そ
れぞれの塗布方法においては必要に応じて、フィラー、
溶剤、消泡剤、チキソ剤、顔料、染料等の公知公用の充
填剤、添加剤を使用することができる。
The thermosetting resin composition can be applied to a substrate by a known method such as screen printing, curtain coating, roll coating, spray coating and the like. In each application method, filler,
Known and publicly used fillers and additives such as a solvent, an antifoaming agent, a thixotropic agent, a pigment and a dye can be used.

【0018】前記熱硬化性樹脂組成物をプリント配線板
用層間接着フィルムとして使用する場合には機械的強
度、可とう性を向上させ、取り扱いを容易にする成分と
して「重量平均分子量5000〜100000の範囲に
あるバインダーポリマー」が必要となる。重量平均分子
量が5000未満であると機械的強度、可とう性向上の
効果が発揮されないし、100000を超えると有機溶
剤への溶解性、エポキシ樹脂との相溶性が悪くなり使用
できなくなる。添加量は5〜50重量%の範囲にあるの
が好ましい。5重量%未満であると機械的強度、可とう
性向上の効果が発揮されないし、50重量%を超えると
熱流動性が悪くなり好ましくない。バインダーポリマー
には、フィルム製造時の乾燥工程において支持フィルム
へのハジキ防止の効果もある。具体的には、(臭素化)
フェノキシ樹脂、ポリアクリル樹脂、ポリイミド樹脂、
ポリアミドイミド樹脂、ポリシアネート樹脂、ポリエス
テル樹脂、熱硬化型ポリフェニレンエーテル樹脂等が挙
げられ、これらを2種以上組み合わせて使用することも
可能である。
When the above-mentioned thermosetting resin composition is used as an interlayer adhesive film for a printed wiring board, a component for improving mechanical strength and flexibility and facilitating handling is a component having a weight average molecular weight of 5,000 to 100,000. A binder polymer in the range "is required. If the weight average molecular weight is less than 5,000, the effect of improving mechanical strength and flexibility is not exhibited, and if it exceeds 100,000, the solubility in organic solvents and the compatibility with the epoxy resin become poor, so that it cannot be used. The amount added is preferably in the range of 5 to 50% by weight. If the amount is less than 5% by weight, the effect of improving mechanical strength and flexibility is not exhibited, and if it exceeds 50% by weight, the heat fluidity deteriorates, which is not preferable. The binder polymer also has the effect of preventing cissing on the support film in the drying step during film production. Specifically, (bromination)
Phenoxy resin, polyacrylic resin, polyimide resin,
Examples thereof include a polyamide imide resin, a polycyanate resin, a polyester resin, and a thermosetting polyphenylene ether resin. These may be used in combination of two or more.

【0019】本発明のプリント配線板用層間接着フィル
ムはベースフィルムを支持体として所定の有機溶剤に溶
解した樹脂ワニスを塗布後、加熱及び/又は熱風吹き付
けにより溶剤を乾燥させて常温固形の樹脂組成物とし作
製することができる。支持ベースフィルムとしては、ポ
リエチレン、ポリ塩化ビニル等のポリオレフィン、ポリ
エチレンテレフタレート等のポリエステル、ポリカーボ
ネート、さらには離型紙や銅箔、アルミニウム箔の如き
金属箔などが挙げられる。支持ベースフィルムの厚みと
しては10〜150μmが一般的である。なお、支持フ
ィルムにはマッド処理、コロナ処理の他、離型処理を施
してあってもよい。有機溶剤としては、通常溶剤、例え
ばアセトン、メチルエチルケトン、シクロヘキサノン等
のケトン類、酢酸エチル、酢酸ブチル、セロソルブアセ
テート、プロピレングリコールモノメチルエーテルアセ
テート、カルビトールアセテート等の酢酸エステル類、
セロソルブ、ブチルセロソルブ等のセロソルブ類、カル
ビトール、ブチルカルビトール等のカルビトール類、ト
ルエン、キシレン等の芳香族炭化水素の他、ジメチルホ
ルムアミド、ジメチルアセトアミド、N−メチルピロリ
ドンなどを単独又は2種以上組み合わせて使用すること
ができる。このようにして得られる本発明のプリント配
線板用層間接着フィルムは、そのまま又は樹脂組成物の
他の面に支持フィルムの如き保護フィルムをさらに積層
し、ロール状に巻きとって貯蔵される。
The interlayer adhesive film for a printed wiring board of the present invention is obtained by applying a resin varnish dissolved in a predetermined organic solvent using a base film as a support, and then drying the solvent by heating and / or blowing with hot air to obtain a resin composition which is solid at room temperature. It can be manufactured as a product. Examples of the supporting base film include polyolefins such as polyethylene and polyvinyl chloride, polyesters such as polyethylene terephthalate, polycarbonate, and release paper, metal foils such as copper foil and aluminum foil. The thickness of the supporting base film is generally from 10 to 150 μm. The support film may be subjected to a release treatment in addition to the mud treatment and the corona treatment. As the organic solvent, usually solvents, for example, ketones such as acetone, methyl ethyl ketone, cyclohexanone, ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate, acetic acid esters such as carbitol acetate,
Cellosolves such as cellosolve and butyl cellosolve, carbitols such as carbitol and butyl carbitol, aromatic hydrocarbons such as toluene and xylene, dimethylformamide, dimethylacetamide, N-methylpyrrolidone and the like alone or in combination of two or more Can be used. The thus obtained interlayer adhesive film for a printed wiring board of the present invention is stored as it is or by further laminating a protective film such as a support film on the other surface of the resin composition, winding it up in a roll shape, and storing it.

【0020】次に、本発明のプリント配線板用層間接着
フィルムを用いた多層プリント配線板ついて説明する。
本発明の層間接着フィルムをパターン加工された内層回
路基板に貼り合わせるに際しては、保護フィルムが存在
している場合には保護フィルムを除去後、支持ベースフ
ィルム側から常温固形の樹脂組成物を加圧、加熱しなが
らラミネートする。なお、内層回路基板としては、ガラ
スエポキシや金属基板、ポリエステル基板、ポリイミド
基板、熱硬化型ポリフェニレンエーテル基板等を使用す
ることができ、回路表面は予め粗化処理されてあっても
よい。ラミネートは減圧下、バッチ式であってもロール
での連続式であってもよく、両面同時にラミネートする
ことが好ましい。上記のラミネート条件は、本発明の常
温固形の樹脂組成物の熱時溶融粘度、用いる内層回路基
板により異なるが、一般的に圧着温度が70〜200
℃、圧着圧力が1〜10kgf/cm2であって、20mmH
g以下の減圧下で積層する。ラミネート後は、室温付近
にまで冷却した後支持ベースフィルムを剥離する。その
後必要により熱硬化させ、所定のスルーホール及び/又
はビアホール部にレーザー及び/又はドリルによる穴開
けを行い、該樹脂組成物表面を粗化剤処理し微細な凹凸
を形成する。次いで導体層を乾式及び/又は湿式メッキ
により形成して多層プリント配線板を得ることができ
る。熱硬化の条件は120〜250℃で10〜90分の
範囲で選択される。 粗化剤処理として用いることがで
きる粗化処理剤の具体例としては、重クロム酸塩、過マ
ンガン酸塩、オゾン、過酸化水素/硫酸、硝酸等の酸化
剤、N−メチル−2−ピロリドン、N,N−ジメチルホ
ルムアミド、メトキシプロパノール等の有機溶剤、また
苛性ソーダ、苛性カリ等のアルカリ性水溶液、硫酸、塩
酸なの酸性水溶液、又は各種プラズマ処理などを用いる
ことができる。またこれらの処理は併用して用いてもよ
い。このように必要により樹脂組成物表面に微細凹凸の
アンカーを形成した後、蒸着、スパッタリング、イオン
プレーティング等の乾式メッキ及び/又は無電解、電解
メッキ等の湿式メッキにより導体層を形成する。この時
導体層とは逆パターンのメッキレジストを形成し、無電
解メッキのみで導体層を形成してもよい。このように導
体層が形成された後、該熱硬化性樹脂組成物の硬化物の
ガラス転移温度よりも高い温度で10〜60分アニール
処理することにより、熱硬化性樹脂の硬化が進行し導体
層のピール強度をさらに向上させることもできる。
Next, a multilayer printed wiring board using the interlayer adhesive film for a printed wiring board of the present invention will be described.
When bonding the interlayer adhesive film of the present invention to the patterned inner layer circuit board, after removing the protective film, if present, press the room temperature solid resin composition from the support base film side. Laminate while heating. As the inner circuit board, a glass epoxy, metal board, polyester board, polyimide board, thermosetting polyphenylene ether board, or the like can be used, and the circuit surface may be roughened in advance. The lamination may be a batch type or a continuous type with a roll under reduced pressure, and it is preferable to laminate both surfaces simultaneously. The above lamination conditions vary depending on the hot melt viscosity of the room-temperature solid resin composition of the present invention and the inner-layer circuit board used.
℃, pressure is 1-10kgf / cm2, 20mmH
Laminate under reduced pressure of not more than g. After lamination, the support base film is peeled off after cooling to around room temperature. Thereafter, heat curing is performed if necessary, and a predetermined through-hole and / or via-hole is opened by a laser and / or a drill, and the surface of the resin composition is treated with a roughening agent to form fine irregularities. Next, a conductor layer is formed by dry and / or wet plating to obtain a multilayer printed wiring board. The conditions of the heat curing are selected in the range of 120 to 250 ° C. for 10 to 90 minutes. Specific examples of the roughening agent that can be used as the roughening agent include oxidizing agents such as dichromate, permanganate, ozone, hydrogen peroxide / sulfuric acid, and nitric acid, and N-methyl-2-pyrrolidone. , N, N-dimethylformamide, methoxypropanol and the like; an alkaline aqueous solution such as caustic soda and caustic potassium; an acidic aqueous solution such as sulfuric acid and hydrochloric acid; or various plasma treatments. These processes may be used in combination. After forming an anchor having fine irregularities on the surface of the resin composition as necessary, a conductor layer is formed by dry plating such as vapor deposition, sputtering, or ion plating and / or wet plating such as electroless or electrolytic plating. At this time, a plating resist having a pattern opposite to that of the conductor layer may be formed, and the conductor layer may be formed only by electroless plating. After the conductor layer is thus formed, the thermosetting resin composition is annealed at a temperature higher than the glass transition temperature of the cured product for 10 to 60 minutes, whereby the curing of the thermosetting resin progresses, The peel strength of the layer can be further improved.

【0021】また、プリント配線板用層間接着フィルム
を内層回路基板上にラミネートした後、必要により熱硬
化させた樹脂組成物のさらにその上層に接着剤付き銅箔
又は銅箔を加熱積層し、一体化させ多層プリント配線板
を得ることができる。加熱硬化の条件は内層回路基板の
材料の種類、接着剤付き銅箔を使用する場合にはその硬
化温度にもよるが、120〜250℃で20〜90分の
範囲で選択される。
After laminating the interlayer adhesive film for printed wiring boards on the inner circuit board, if necessary, heat-curing a resin composition and further laminating a copper foil with an adhesive or a copper foil thereon to form an integrated layer. And a multilayer printed wiring board can be obtained. The conditions for the heat curing depend on the type of the material of the inner layer circuit board and, when a copper foil with an adhesive is used, the curing temperature, but are selected in the range of 120 to 250 ° C. for 20 to 90 minutes.

【0022】以下に本発明における積層板用プリプレグ
及び積層板を用いたプリント配線板の製造方法を述べ
る。
The prepreg for a laminate according to the present invention and a method for manufacturing a printed wiring board using the laminate will be described below.

【0023】本発明の熱硬化性樹脂組成物を用いた積層
板用プリプレグは紙状または布状基材に有機溶剤に溶解
した樹脂ワニスを含浸させた後、加熱及び/又は熱風吹
き付けにより溶剤を乾燥させて作製することができる。
有機溶剤としては、通常溶剤、例えばアセトン、メチル
エチルケトン、シクロヘキサノン等のケトン類、酢酸エ
チル、酢酸ブチル、セロソルブアセテート、プロピレン
グリコールモノメチルエーテルアセテート、カルビトー
ルアセテート等の酢酸エステル類、セロソルブ、ブチル
セロソルブ等のセロソルブ類、カルビトール、ブチルカ
ルビトール等のカルビトール類、トルエン、キシレン等
の芳香族炭化水素の他、ジメチルホルムアミド、ジメチ
ルアセトアミド、N−メチルピロリドンなどを単独又は
2種以上組み合わせて使用することができる。使用され
る紙状または布状基材については,紙またはガラス繊
維、炭素繊維などの無機繊維からなる織布または不織
布、またはポリエステル繊維、アラミド繊維(例:帝人
(株)製テクノーラ)、全芳香族ポリエステル繊維
(例:クラレ(株)製ベクトラン)などの有機繊維から
なる織布または不織布などが使用できる。また、これら
繊維の表面はカップリング剤等の表面処理などを行い用
いてもよい。プリント配線板の軽量化、レーザー照射に
よるビアホール加工の加工性の観点から有機繊維を用い
ることが特に好ましく、表面平滑性改善の観点から不織
布を用いることが好ましい。
A prepreg for a laminate using the thermosetting resin composition of the present invention is obtained by impregnating a paper-like or cloth-like base material with a resin varnish dissolved in an organic solvent and then heating and / or blowing with hot air. It can be made by drying.
Examples of the organic solvent include usually solvents such as ketones such as acetone, methyl ethyl ketone and cyclohexanone, acetates such as ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate and carbitol acetate; cellosolves such as cellosolve and butyl cellosolve. Carbitol, butyl carbitol and the like, carbitols such as toluene and xylene, dimethylformamide, dimethylacetamide, N-methylpyrrolidone and the like can be used alone or in combination of two or more. For the paper-like or cloth-like substrate used, woven or non-woven fabrics made of inorganic fibers such as paper or glass fibers and carbon fibers, or polyester fibers, aramid fibers (eg, Technora manufactured by Teijin Ltd.) A woven or nonwoven fabric made of an organic fiber such as an aromatic polyester fiber (eg, Vectran manufactured by Kuraray Co., Ltd.) can be used. The surface of these fibers may be subjected to a surface treatment such as a coupling agent or the like before use. It is particularly preferable to use organic fibers from the viewpoint of reducing the weight of the printed wiring board and the processability of via hole processing by laser irradiation, and it is preferable to use a nonwoven fabric from the viewpoint of improving surface smoothness.

【0024】本発明の積層板の作製は少なくとも一方の
表面に該積層板用プリプレグが配置されていれば良くそ
の積層枚数、積層構成には限定されない。また本発明の
積層板用プリプレグを一枚のみ単独で硬化させたものも
含むものとする。また、硬化の方法は公知の方法を用い
ることができるが積層板の板厚精度の観点から積層プレ
スが好ましい。このとき、積層プレスの条件は使用する
プリプレグの層構成、ならびに硬化状態をコントロール
するため決定されるが、120から250℃で、20か
ら120分間、20から60kgf/m2の条件である
ことが望ましい。これより低温、短時間の場合には硬化
が不十分となり、スルーホールのドリル加工性、表面の
キズなどの問題が生じる。逆に高温、長時間の場合には
粗化面の形成が困難となる。続いて所定のスルーホール
及び/又はビアホール部にレーザー及び/又はドリルに
よる穴開けを行い、必要に応じて該積層板の表面を粗化
剤処理し微細な凹凸を形成する。次いで導体層を乾式及
び/又は湿式メッキにより形成して多層プリント配線板
を製造することができる。粗化剤処理として用いること
ができる粗化処理剤の具体例としては、重クロム酸塩、
過マンガン酸塩、オゾン、過酸化水素/硫酸、硝酸等の
酸化剤、N−メチル−2−ピロリドン、N,N−ジメチ
ルホルムアミド、メトキシプロパノール等の有機溶剤、
また苛性ソーダ、苛性カリ等のアルカリ性水溶液、硫
酸、塩酸なの酸性水溶液、又は各種プラズマ処理などを
用いることができる。またこれらの処理は併用して用い
てもよい。このように必要により樹脂組成物表面に微細
凹凸のアンカーを形成した後、蒸着、スパッタリング、
イオンプレーティング等の乾式メッキ及び/又は無電
解、電解メッキ等の湿式メッキにより導体層を形成す
る。この時導体層とは逆パターンのメッキレジストを形
成し、無電解メッキのみで導体層を形成してもよい。こ
のように導体層が形成された後、エポキシ樹脂組成物の
硬化物のガラス転移温度よりも高い温度で10〜90分
アニール処理することにより、熱硬化性樹脂の硬化が進
行し導体層のピール強度をさらに向上させることもでき
る。
The laminate of the present invention can be produced as long as the prepreg for the laminate is disposed on at least one surface. In addition, the present invention also includes one obtained by curing only one prepreg for a laminate according to the present invention. In addition, a known method can be used as a curing method, but a lamination press is preferable from the viewpoint of the thickness accuracy of the laminated plate. At this time, the conditions of the laminating press are determined in order to control the layer configuration of the prepreg to be used and the cured state, but it is preferable that the conditions are 120 to 250 ° C., 20 to 120 minutes, and 20 to 60 kgf / m 2. . If the temperature is lower than this for a short time, the curing becomes insufficient, and problems such as drill workability of through holes and surface flaws occur. Conversely, when the temperature is high and the time is long, it is difficult to form a roughened surface. Subsequently, a predetermined through-hole and / or via-hole is perforated by a laser and / or a drill, and if necessary, the surface of the laminate is subjected to a roughening treatment to form fine irregularities. Next, the conductor layer is formed by dry and / or wet plating to produce a multilayer printed wiring board. Specific examples of the roughening agent that can be used as the roughening agent treatment include bichromate,
Oxidizing agents such as permanganate, ozone, hydrogen peroxide / sulfuric acid, and nitric acid; organic solvents such as N-methyl-2-pyrrolidone, N, N-dimethylformamide, methoxypropanol;
Further, an alkaline aqueous solution such as caustic soda or potassium hydroxide, an acidic aqueous solution such as sulfuric acid or hydrochloric acid, or various plasma treatments can be used. These processes may be used in combination. After forming an anchor with fine irregularities on the surface of the resin composition as necessary, evaporation, sputtering,
The conductor layer is formed by dry plating such as ion plating and / or wet plating such as electroless plating and electrolytic plating. At this time, a plating resist having a pattern opposite to that of the conductor layer may be formed, and the conductor layer may be formed only by electroless plating. After the conductor layer is formed in this manner, by annealing for 10 to 90 minutes at a temperature higher than the glass transition temperature of the cured product of the epoxy resin composition, the curing of the thermosetting resin progresses and the peel of the conductor layer is peeled off. The strength can be further improved.

【0025】本発明における、回路形成された内層材と
積層板用プリプレグを用いて積層プレスによる多層プリ
ント配線板の製造方法に関し、本発明の積層板用プリプ
レグが表面になるよう内層材とプリプレグを多層積層板
を作製する。このとき、積層プレスの条件は使用する内
層材、プリプレグ及び目的とする多層プリント配線板の
層構成によって決定されるが、上記プリプレグの硬化状
態をコントロールするため120から250℃で、20
から120分の間であることが望ましい。圧力について
は内層材のパターン間への埋まり込み性に留意し決定す
る。これより低温、短時間の場合には樹脂の硬化が不十
分となり、スルーホールのドリル加工性、表面のキズ等
の問題がある。逆に高温、長時間の場合には粗化面の形
成が困難になる。続いて所定のスルーホール及び/又は
ビアホール部にレーザー及び/又はドリルによる穴開け
を行い、必要に応じて該多層積層板の表面を粗化剤処理
し微細な凹凸を形成する。次いで導体層を乾式及び/又
は湿式メッキにより形成して多層プリント配線板を製造
することができる。粗化剤処理として用いることができ
る粗化処理剤の具体例としては、重クロム酸塩、過マン
ガン酸塩、オゾン、過酸化水素/硫酸、硝酸等の酸化
剤、N−メチル−2−ピロリドン、N,N−ジメチルホ
ルムアミド、メトキシプロパノール等の有機溶剤、また
苛性ソーダ、苛性カリ等のアルカリ性水溶液、硫酸、塩
酸なの酸性水溶液、又は各種プラズマ処理などを用いる
ことができる。またこれらの処理は併用して用いてもよ
い。このように必要により樹脂組成物表面に微細凹凸の
アンカーを形成した後、蒸着、スパッタリング、イオン
プレーティング等の乾式メッキ及び/又は無電解、電解
メッキ等の湿式メッキにより導体層を形成する。この時
導体層とは逆パターンのメッキレジストを形成し、無電
解メッキのみで導体層を形成してもよい。このように導
体層が形成された後、エポキシ樹脂組成物の硬化物のガ
ラス転移温度よりも高い温度で10〜90分アニール処
理することにより、熱硬化性樹脂の硬化が進行し導体層
のピール強度をさらに向上させることもできる。
The present invention relates to a method for producing a multilayer printed wiring board by a lamination press using a circuit-formed inner layer material and a laminate prepreg. Make a multilayer laminate. At this time, the conditions of the laminating press are determined by the inner layer material used, the prepreg, and the intended layer configuration of the multilayer printed wiring board.
To 120 minutes. The pressure is determined in consideration of the embedding property of the inner layer material between the patterns. If the temperature is lower than this for a short time, the curing of the resin becomes insufficient, and there are problems such as drillability of through holes and surface flaws. Conversely, when the temperature is high and the time is long, it is difficult to form a roughened surface. Subsequently, predetermined through-holes and / or via-holes are drilled with a laser and / or a drill, and if necessary, the surface of the multilayer laminate is subjected to a roughening treatment to form fine irregularities. Next, the conductor layer is formed by dry and / or wet plating to produce a multilayer printed wiring board. Specific examples of the roughening agent that can be used as the roughening agent include oxidizing agents such as dichromate, permanganate, ozone, hydrogen peroxide / sulfuric acid, and nitric acid, and N-methyl-2-pyrrolidone. , N, N-dimethylformamide, methoxypropanol and the like; an alkaline aqueous solution such as caustic soda and caustic potassium; an acidic aqueous solution such as sulfuric acid and hydrochloric acid; or various plasma treatments. These processes may be used in combination. After forming an anchor having fine irregularities on the surface of the resin composition as necessary, a conductor layer is formed by dry plating such as vapor deposition, sputtering, or ion plating and / or wet plating such as electroless or electrolytic plating. At this time, a plating resist having a pattern opposite to that of the conductor layer may be formed, and the conductor layer may be formed only by electroless plating. After the conductor layer is formed in this manner, by annealing for 10 to 90 minutes at a temperature higher than the glass transition temperature of the cured product of the epoxy resin composition, the curing of the thermosetting resin progresses and the peel of the conductor layer is peeled off. The strength can be further improved.

【0026】以下本発明を実施例により詳細に説明す
る。
Hereinafter, the present invention will be described in detail with reference to examples.

【0027】[0027]

【実施例1〜5】表1の実施例に示す組成(数値は重量
部)で熱硬化性樹脂組成物を作製した。各実施例の熱硬
化性樹脂組成物の調製については各樹脂及び硬化促進剤
をメチルエチルケトン溶剤中でに均一に混合し樹脂ワニ
スを作成した。樹脂ワニスを回路形成された基板にバー
コートにて乾燥後の厚さが50μmになるように塗布
し、80℃、20分乾燥後、170℃、80分硬化させ
た後、粗化処理剤を用いて粗化剤処理を行った。ここで
は、アルカリ性水溶液と溶剤の混合物にて膨潤させたの
ち、アルカリ性過マンガン酸塩水溶液、続いて還元剤に
て処理し、無電解銅メッキ、電解銅メッキにて35ミク
ロンの銅厚の銅張り積層板を作製した。250℃、60
分アニール処理を行い、銅張り積層板配線板を作製し評
価を行った。
Examples 1 to 5 Thermosetting resin compositions were prepared with the compositions shown in the examples of Table 1 (the numerical values are parts by weight). Regarding the preparation of the thermosetting resin composition of each example, each resin and a curing accelerator were uniformly mixed in a methyl ethyl ketone solvent to prepare a resin varnish. A resin varnish is applied to a circuit-formed substrate by a bar coater so that the thickness after drying becomes 50 μm, dried at 80 ° C. for 20 minutes, and cured at 170 ° C. for 80 minutes. To perform a roughening agent treatment. Here, after swelling with a mixture of an alkaline aqueous solution and a solvent, a treatment with an alkaline permanganate aqueous solution, and subsequently with a reducing agent, electroless copper plating, electrolytic copper plating, and copper plating with a copper thickness of 35 microns. A laminate was prepared. 250 ° C, 60
A minute annealing treatment was performed, and a copper-clad laminate wiring board was prepared and evaluated.

【0028】[0028]

【実施例6】表1の実施例に示す組成(数値は重量部)
で熱硬化性樹脂組成物を作製した。熱硬化性樹脂組成物
の調製については各樹脂及び硬化促進剤をメチルエチル
ケトン溶剤中でに均一に混合し樹脂ワニスを作成した。
そのワニスを厚さ30μmのポリエチレンテレフタレー
ト(以下、PETと記す)フィルム上に、乾燥後の厚み
が50μmとなるようにローラーコーターにて塗布、8
0〜100℃で10分乾燥させ、プリント配線板用層間
接着フィルムを得た。このフィルムを可とう性評価のた
め180度の折り曲げを行ったが、樹脂部にクラック等
の異常は全く無かった。回路形成された内層回路基板
に、プリント配線板用層間接着フィルムを真空ラミネー
ターにより両面同時にラミネートした。170℃で60
分硬化させ積層基板を得た。その後、所定のスルーホー
ル、ビアホール部等にドリル及びレーザーにより穴開け
を行った。この後、粗化処理剤を用いて粗化剤処理を行
った。ここでは、アルカリ性水溶液と溶剤の混合物にて
膨潤させたのち、アルカリ性過マンガン酸塩水溶液、続
いて還元剤にて処理した後、無電解銅メッキ、電解銅メ
ッキにて35ミクロンの銅厚の多層積層板を作製した。
200℃、60分アニール処理を行い、サブトラクティ
ブ法で回路形成を行った4層プリント配線板を作成し評
価を行った。得られたプリント配線板を260℃で60
秒間はんだ浴に浸せき処理し、はんだ耐熱性を観察した
が異常はなかった。また、熱衝撃試験(−65℃〜15
0℃、500サイクル)においてもスルーホール、ビア
ホールの接続に異常は認められなかった。
Example 6 Compositions shown in Examples of Table 1 (numerical parts are parts by weight)
To prepare a thermosetting resin composition. For the preparation of the thermosetting resin composition, each resin and a curing accelerator were uniformly mixed in a methyl ethyl ketone solvent to prepare a resin varnish.
The varnish was applied on a 30 μm-thick polyethylene terephthalate (hereinafter referred to as PET) film using a roller coater so that the thickness after drying was 50 μm.
It dried at 0-100 degreeC for 10 minutes, and obtained the interlayer adhesive film for printed wiring boards. This film was bent at 180 degrees for evaluation of flexibility, but there was no abnormality such as crack in the resin portion. An interlayer adhesive film for a printed wiring board was simultaneously laminated on both sides of the circuit-formed inner layer circuit board by a vacuum laminator. 60 at 170 ° C
And cured to obtain a laminated substrate. Thereafter, predetermined through holes, via holes, and the like were drilled with a drill and a laser. Thereafter, a roughening agent treatment was performed using a roughening agent. Here, after swelling with a mixture of an alkaline aqueous solution and a solvent, a treatment with an alkaline permanganate aqueous solution, and subsequently with a reducing agent, electroless copper plating, electrolytic copper plating, and a 35 micron thick copper multilayer. A laminate was prepared.
Annealing treatment was performed at 200 ° C. for 60 minutes, and a four-layer printed wiring board on which a circuit was formed by a subtractive method was prepared and evaluated. The obtained printed wiring board is heated at 260 ° C. for 60 hours.
It was immersed in a solder bath for 2 seconds, and the solder heat resistance was observed. No abnormality was found. In addition, a thermal shock test (−65 ° C. to 15
(0 ° C., 500 cycles), no abnormality was found in the connection of the through holes and via holes.

【0029】[0029]

【実施例7】表1の実施例2に示す組成(数値は重量
部)で熱硬化性樹脂組成物を調製し、樹脂ワニスを全芳
香族ポリエステル(クラレ社製、ベクトラン繊維製不織
布)に含浸させ、150℃、5分間乾燥し、0.1mm
厚の積層板用プリプレグを作製した。積層板用プリプレ
グを6枚積層し、170℃、80分、40kgf/m2
のプレス条件にて積層板を作製した。この後、ドリルに
て貫通スルーホールを形成し、粗化処理剤を用いて積層
板表面に粗化面を形成し、表面粗化積層板を得た。ここ
では、アルカリ性水溶液と溶剤の混合物にて膨潤させた
のち、アルカリ性過マンガン酸塩水溶液、続いて還元剤
にて処理し、無電解銅メッキ、電解銅メッキにて35ミ
クロンの銅厚の銅張り積層板を作製した。200℃、6
0分アニール処理を行い、続いて通常サブトラクティブ
法で回路形成を行った両面プリント配線板を作製し評価
を行った。得られたプリント配線板を260℃で60秒
間はんだ浴に浸せき処理し、はんだ耐熱性を観察したが
異常はなかった。また、熱衝撃試験(−65℃〜150
℃、500サイクル)においてもスルーホール、ビアホ
ールの接続に異常は認められなかった。
Example 7 A thermosetting resin composition having the composition shown in Example 2 in Table 1 (numerical parts by weight) was prepared, and a resin varnish was impregnated into a wholly aromatic polyester (Kuraray, Vectran fiber nonwoven fabric). And dried at 150 ° C. for 5 minutes, 0.1 mm
A thick prepreg for a laminate was produced. Six prepregs for a laminated board are laminated, and 170 ° C., 80 minutes, 40 kgf / m 2
A laminate was produced under the following pressing conditions. Thereafter, through-holes were formed with a drill, and a roughened surface was formed on the surface of the laminate using a roughening agent to obtain a surface-roughened laminate. Here, after swelling with a mixture of an alkaline aqueous solution and a solvent, a treatment with an alkaline permanganate aqueous solution, and subsequently with a reducing agent, electroless copper plating, electrolytic copper plating, and copper plating with a copper thickness of 35 microns. A laminate was prepared. 200 ° C, 6
A double-sided printed wiring board on which an annealing treatment was performed for 0 minutes and a circuit was formed by a normal subtractive method was manufactured and evaluated. The obtained printed wiring board was immersed in a solder bath at 260 ° C. for 60 seconds, and the solder heat resistance was observed. No abnormality was found. In addition, a thermal shock test (−65 ° C. to 150
(500 ° C., 500 cycles), no abnormality was found in the connection of the through holes and via holes.

【0030】[0030]

【実施例8】表1の実施例3に示す組成(数値は重量
部)で熱硬化製樹脂組成物を調製し、実施例7と同様に
して0.1mm厚の積層板用プリプレグを作製した。回
路形成された内層回路基板に、積層板用プリプレグをを
真空プレスに170℃、80分、40kgf/m2のプ
レス条件にて積層板を作製した。その後、所定のスルー
ホール、ビアホール部等にドリル及びレーザーにより穴
開けを行った。この後、粗化処理剤を用いて粗化剤処理
を行った。ここでは、アルカリ性水溶液と溶剤の混合物
にて膨潤させたのち、アルカリ性過マンガン酸塩水溶
液、続いて還元剤にて処理した後、無電解銅メッキ、電
解銅メッキにて35ミクロンの銅厚の多層積層板を作製
した。200℃、60分アニール処理を行い、サブトラ
クティブ法で回路形成を行った4層プリント配線板を作
成し評価を行った。得られたプリント配線板を260℃
で60秒間はんだ浴に浸せき処理し、はんだ耐熱性を観
察したが異常はなかった。また、熱衝撃試験(−65℃
〜150℃、500サイクル)においてもスルーホー
ル、ビアホールの接続に異常は認められなかった。
Example 8 A thermosetting resin composition was prepared with the composition shown in Example 3 in Table 1 (the numerical values are parts by weight), and a prepreg for a laminate having a thickness of 0.1 mm was prepared in the same manner as in Example 7. . A prepreg for a laminate was placed on a circuit-formed inner layer circuit board in a vacuum press at 170 ° C. for 80 minutes under a press condition of 40 kgf / m 2. Thereafter, predetermined through holes, via holes, and the like were drilled with a drill and a laser. Thereafter, a roughening agent treatment was performed using a roughening agent. Here, after swelling with a mixture of an alkaline aqueous solution and a solvent, a treatment with an alkaline permanganate aqueous solution, and subsequently with a reducing agent, electroless copper plating, electrolytic copper plating, and a 35 micron thick copper multilayer. A laminate was prepared. Annealing treatment was performed at 200 ° C. for 60 minutes, and a four-layer printed wiring board on which a circuit was formed by a subtractive method was prepared and evaluated. 260 ° C.
Immersion treatment in a solder bath for 60 seconds, and the solder heat resistance was observed, but no abnormality was found. The thermal shock test (-65 ° C
(Up to 150 ° C., 500 cycles), no abnormality was found in the connection of the through holes and via holes.

【0031】[0031]

【比較例1〜3】表1の比較例に示す組成で熱硬化性樹
脂組成物を作製した。各実施例の熱硬化性樹脂組成物の
調製については各樹脂及び硬化促進剤をメチルエチルケ
トン溶剤中でに均一に混合し樹脂ワニスを作成した。各
比較例の熱硬化製樹脂組成物の調製及び評価サンプルに
ついては実施例1〜5に準拠した。
Comparative Examples 1 to 3 Thermosetting resin compositions having the compositions shown in Comparative Examples in Table 1 were prepared. Regarding the preparation of the thermosetting resin composition of each example, each resin and a curing accelerator were uniformly mixed in a methyl ethyl ketone solvent to prepare a resin varnish. Preparation and evaluation samples of the thermosetting resin composition of each comparative example were based on Examples 1 to 5.

【0032】[0032]

【表1】 [Table 1]

【0033】結果を表2に示す。実施例1〜5から明ら
かなように本発明の熱硬化製樹脂組成物を用いた場合に
は、耐熱性、絶縁特性に問題はなく、アニール後の膨れ
もなく良好なピール強度が得られ、はんだ耐熱試験にお
いても膨れ等の問題はなかった。これに対して比較例1
〜3の場合には、アニール後の膨れやはんだ耐熱試験で
の膨れが発生しピール強度も不十分であった。比較例3
ではピール強度は確保できるものの絶縁特性上問題があ
った。
Table 2 shows the results. As is clear from Examples 1 to 5, when the thermosetting resin composition of the present invention was used, there was no problem in heat resistance and insulation properties, and good peel strength without swelling after annealing was obtained. There was no problem such as blistering in the soldering heat test. On the other hand, Comparative Example 1
In the cases of Nos. 1 to 3, swelling after annealing and swelling in a soldering heat test occurred, and the peel strength was insufficient. Comparative Example 3
However, although peel strength can be ensured, there is a problem in insulation properties.

【0034】[0034]

【表2】 [Table 2]

【0035】[0035]

【発明の効果】以上のように本発明の熱硬化性樹脂組成
物すなわち(A)エポキシ樹脂、(B)フェノール樹脂
(C)イミド基を有する芳香族ジアミン化合物(D)ゴ
ム成分(E)硬化促進剤を必須成分としてなる熱硬化性
樹脂組成物を用いることにより高耐熱性、電気絶縁性に
優れた層間絶縁層を形成する事ができる。また、本発明
の熱硬化性樹脂組成物を用いてプリント配線板用層間接
着フィルム、積層板用プリプレグ及び積層板が得られ
る。さらにこれらを用いて配線の高密度化に対応でき高
耐熱性、電気絶縁性に優れた高信頼性の多層プリント配
線板を得ることができる。
As described above, the thermosetting resin composition of the present invention, that is, (A) an epoxy resin, (B) a phenolic resin, (C) an aromatic diamine compound having an imide group, (D) a rubber component, and (E) curing. By using a thermosetting resin composition containing a promoter as an essential component, an interlayer insulating layer having high heat resistance and excellent electrical insulation can be formed. Further, an interlayer adhesive film for a printed wiring board, a prepreg for a laminate, and a laminate can be obtained by using the thermosetting resin composition of the present invention. Further, by using these, it is possible to obtain a highly reliable multilayer printed wiring board which can cope with an increase in wiring density and has high heat resistance and excellent electrical insulation.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05K 3/38 H05K 3/38 E 3/46 3/46 T Fターム(参考) 4F100 AB17 AK33B AK47B AK49B AK53B AL05B AN00B AR00C AS00C AT00A BA01 BA02 BA03 BA04 DD07 DG10D DG15D DH01 EJ082 EJ172 EJ303 EJ422 EJ642 EJ82D GB43 HB00C JB13B JG04 JJ03 4J002 AC034 BL014 CC042 CC052 CC062 CC082 CD041 CD051 CD061 CD071 CD121 CD181 CD184 CD191 CD201 CK041 CM023 EU026 EU117 EU187 EW137 GF00 GQ05 4J036 AB17 AD07 AD08 AD21 AF06 AF07 AJ02 AJ08 AJ14 AJ18 AK02 CD04 CD09 DC05 DC19 DC26 DC41 DC42 DD07 FB05 FB07 FB08 FB14 GA02 GA06 JA08 5E343 AA07 AA13 AA15 AA16 AA17 AA18 BB24 BB67 CC02 CC03 CC04 CC43 CC45 CC47 CC48 DD22 DD32 EE37 GG08 GG14 GG16 5E346 AA16 CC04 CC08 CC09 CC10 CC32 DD12 DD22 EE04 EE06 EE08 EE09 EE12 EE19 HH08 HH18 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification code FI Theme coat ゛ (Reference) H05K 3/38 H05K 3/38 E 3/46 3/46 TF term (Reference) 4F100 AB17 AK33B AK47B AK49B AK53B AL05B AN00B AR00C AS00C AT00A BA01 BA02 BA03 BA04 DD07 DG10D DG15D DH01 EJ082 EJ172 EJ303 EJ422 EJ642 EJ82D GB43 HB00C JB13B JG04 JJ03 4J002 AC034 BL014 CC042 CC052 CD06 CD04 CD04 CD04 CD04 CD04 CD04 CD04 CD04 CD04 CD04 CD04 CD04 CD04 CD04 CD04 CD04 CD041 AD07 AD08 AD21 AF06 AF07 AJ02 AJ08 AJ14 AJ18 AK02 CD04 CD09 DC05 DC19 DC26 DC41 DC42 DD07 FB05 FB07 FB08 FB14 GA02 GA06 JA08 5E343 AA07 AA13 AA15 AA16 AA17 AA18 BB24 BB67 CC02 CC03 CC04 CC43 CC45 CC47 CC04 CC43 CC45 CC04 CC43 CC45 CC47 CC08 CC09 CC10 CC32 DD12 DD22 EE04 EE06 EE08 EE09 EE12 EE19 HH08 HH18

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】(A)エポキシ樹脂、(B)フェノール樹
脂(C)イミド基を有する芳香族ジアミン化合物(D)
ゴム成分及び(E)硬化促進剤を必須成分としてなる熱
硬化性樹脂組成物
1. An epoxy resin (A), a phenolic resin (B) and an aromatic diamine compound having an imide group (D).
Thermosetting resin composition comprising rubber component and (E) curing accelerator as essential components
【請求項2】(C)イミド基を有する芳香族ジアミン化
合物が下記一般式(1)で示される請求項1記載の熱硬
化性樹脂組成物 【化1】 (式中、Ar1、Ar2はそれぞれ独立に芳香族残基、R
1は水素原子あるいは炭素数1から10のアルキル基、
2は水素原子、炭素数1から20のアルキル基、アル
コキシ基、ハロゲン基を表し、nは0から30の整数を
表す。)
2. The thermosetting resin composition according to claim 1, wherein the (C) aromatic diamine compound having an imide group is represented by the following general formula (1). (Wherein, Ar 1 and Ar 2 each independently represent an aromatic residue, R
1 is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms,
R 2 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an alkoxy group, or a halogen group, and n represents an integer of 0 to 30. )
【請求項3】支持体ベースフィルム上に請求項1又は2
に記載の熱硬化性樹脂組成物を膜形成してなるプリント
配線板用層間接着フィルム
3. The method according to claim 1, wherein the support base film is formed on a base film.
Interlayer adhesive film for printed wiring boards formed by forming a film of the thermosetting resin composition according to claim
【請求項4】(1)内層回路形成された内層材の少なく
とも片面上に、請求項3記載のプリント配線板用層間接
着フィルムを加圧かつ加熱条件下でラミネート後、支持
ベースフィルムを剥離除去後し、必要により層間接着フ
ィルムを熱硬化させ、(2)該硬化面に粗化剤処理によ
り凹凸状の粗化面を形成し、(3)粗化面上に導体層を
形成して得ることを特徴とする多層プリント配線板
(1) The interlayer adhesive film for a printed wiring board according to claim 3 is laminated on at least one surface of the inner layer material on which the inner layer circuit is formed under pressure and heating conditions, and then the support base film is peeled off. Thereafter, if necessary, the interlayer adhesive film is heat-cured, (2) a roughened surface is formed on the hardened surface by a roughening agent treatment, and (3) a conductor layer is formed on the roughened surface. Multilayer printed wiring board characterized by the following:
【請求項5】請求項1又は2に記載の熱硬化性樹脂を紙
状又は布状基材に含浸してなることを特徴とする積層板
用プリプレグ
5. A prepreg for a laminate, wherein the thermosetting resin according to claim 1 or 2 is impregnated in a paper-like or cloth-like base material.
【請求項6】請求項5記載の積層板用プリプレグを少な
くとも一方の表面に積層プレスして得られる積層板
6. A laminate obtained by laminating and pressing the prepreg according to claim 5 on at least one surface.
【請求項7】(1)請求項6記載の積層板の表面に粗化
剤処理により凹凸状の粗化面を形成し、(2)該積層板
の粗化面に導体層を形成させて得られることを特徴とす
るプリント配線板
(1) A roughened surface is formed on the surface of the laminate according to claim 6 by a roughening agent treatment, and (2) a conductor layer is formed on the roughened surface of the laminate. Printed wiring board characterized by being obtained
【請求項8】(1)回路形成された内層材に請求項5記
載の積層板用プリプレグが表面になるように積層して多
層積層板を得、(2)該多層積層板の表面に粗化剤処理
により凹凸状の粗化面を形成し、(3)該多層積層板の
粗化された表面に導体層を形成することを特徴とする多
層プリント配線板
8. A multilayer laminate is obtained by laminating the prepreg for laminate according to claim 5 on the surface of the inner layer material on which the circuit is formed, and (2) roughening the surface of the multilayer laminate. And (3) forming a conductor layer on the roughened surface of the multilayer laminate, wherein the conductive layer is formed on the roughened surface of the multilayer laminate.
JP18595498A 1998-07-01 1998-07-01 Thermosetting resin composition and interlaminar adhesive film for printed wiring board using the same Pending JP2000017148A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18595498A JP2000017148A (en) 1998-07-01 1998-07-01 Thermosetting resin composition and interlaminar adhesive film for printed wiring board using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18595498A JP2000017148A (en) 1998-07-01 1998-07-01 Thermosetting resin composition and interlaminar adhesive film for printed wiring board using the same

Publications (1)

Publication Number Publication Date
JP2000017148A true JP2000017148A (en) 2000-01-18

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Country Status (1)

Country Link
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