JP2000103939A - Epoxy resin molding material for sealing and device for electronic part - Google Patents

Epoxy resin molding material for sealing and device for electronic part

Info

Publication number
JP2000103939A
JP2000103939A JP10276344A JP27634498A JP2000103939A JP 2000103939 A JP2000103939 A JP 2000103939A JP 10276344 A JP10276344 A JP 10276344A JP 27634498 A JP27634498 A JP 27634498A JP 2000103939 A JP2000103939 A JP 2000103939A
Authority
JP
Japan
Prior art keywords
group
epoxy resin
formula
molding material
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10276344A
Other languages
Japanese (ja)
Other versions
JP2000103939A5 (en
JP3852221B2 (en
Inventor
Kazuyoshi Tendou
一良 天童
Haruaki To
晴昭 陶
Shinsuke Hagiwara
伸介 萩原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP27634498A priority Critical patent/JP3852221B2/en
Publication of JP2000103939A publication Critical patent/JP2000103939A/en
Publication of JP2000103939A5 publication Critical patent/JP2000103939A5/ja
Application granted granted Critical
Publication of JP3852221B2 publication Critical patent/JP3852221B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain an epoxy resin molding material excellent in dehalogenation, deantimonation and high-temperature releasing characteristics and useful as an electronic device, or the like, by compounding an epoxy resin with a specific cyclic phosphazene as a flame retardant. SOLUTION: This epoxy resin molding material consists essentially of (A) an epoxy resin having two or more epoxy groups in one molecule, (B) a compound having two or more phenolic hydroxyl groups in one molecule, (C) a cyclic phosphazene compound containing formula I and/or formula II [(m) and (n) are each 1-10; R1 to R4 and R5 to R8 are each a (substituted) 1-12C alkyl, aryl or the like; A is a 1-4C alkylene or allylene] as a recurring unit in the main chain skeleton and (D) inorganic filler, and the content of the component D is >=70 wt.% based on total molding material. Furthermore, it is preferable that a molar ratio (m/n) of formula I and/or formula II is (1/0) to (1/4) and the content of the component C is 0.2-5.0% expressed in terms of phosphorus atom amount based on total amount of compounding component excluding the component D.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、封止用エポキシ樹
脂成形材料、特に環境対応の観点から要求されるノンハ
ロゲン系の封止用エポキシ樹脂成形材料で、耐湿性、耐
リフロークラック性、高温放置特性など厳しい信頼性を
要求されるVLSIの封止用に好適な成形材料及びその
成形材料で素子を封止した電子部品装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sealing epoxy resin molding material, particularly a halogen-free sealing epoxy resin molding material required from the viewpoint of environmental friendliness. The present invention relates to a molding material suitable for sealing a VLSI requiring strict reliability such as characteristics, and an electronic component device in which an element is sealed with the molding material.

【0002】[0002]

【従来の技術】従来から、トランジスタ、ICなどの電
子部品装置用素子の封止の分野ではエポキシ樹脂成形材
料が広く用いられている。この理由としては、エポキシ
樹脂が電気特性、耐湿性、耐熱性、機械特性、インサー
ト品との接着性などの諸特性にバランスがとれているた
めである。これらのエポキシ樹脂成形材料の難燃化は主
にテトラブロモビスフェノールAのジグリシジルエーテ
ル等のブロム化樹脂と酸化アンチモンとの組合せにより
行われている。
2. Description of the Related Art Conventionally, epoxy resin molding materials have been widely used in the field of sealing elements for electronic parts such as transistors and ICs. The reason for this is that the epoxy resin is balanced in various properties such as electrical properties, moisture resistance, heat resistance, mechanical properties, and adhesiveness to insert products. Flame retardation of these epoxy resin molding materials is mainly carried out by combining a brominated resin such as diglycidyl ether of tetrabromobisphenol A with antimony oxide.

【0003】[0003]

【発明が解決しようとする課題】近年、環境保護の観点
からダイオキシンの問題に端を発し、デカブロムをはじ
めハロゲン化樹脂についても規制の動きがある。同様に
アンチモン化合物も毒性面から規制の動きがあり、電子
部品封止用エポキシ樹脂成形材料についても脱ハロゲン
化(脱ブロム化)、脱アンチモン化の要求が出てきてい
る。また、プラスチック封止ICの高温放置特性にブロ
ムイオンが悪影響を及ぼすことが知られており、この観
点からもブロム化樹脂量の低減が望まれている。本発明
はかかる状況に鑑みなされたもので、脱ハロゲン化、脱
アンチモン化で、かつ高温放置特性の優れた封止用エポ
キシ樹脂材料を提供しようとするものである。
In recent years, the problem of dioxin originated from the viewpoint of environmental protection, and there has been a movement to regulate halogenated resins such as decabrom. Similarly, antimony compounds are being regulated from the viewpoint of toxicity, and there is a demand for dehalogenation (debromination) and deantimony of epoxy resin molding materials for encapsulating electronic components. It is also known that bromide ions have an adverse effect on the high-temperature storage characteristics of plastic-sealed ICs. From this viewpoint, it is desired to reduce the amount of brominated resin. The present invention has been made in view of such circumstances, and has as its object to provide an epoxy resin material for encapsulation which is dehalogenated and deantimonized and has excellent high-temperature storage characteristics.

【0004】[0004]

【課題を解決するための手段】発明者らは上記の課題を
解決するために鋭意検討を重ねた結果、難燃剤として特
定の環状ホスファゼン化合物を配合することにより上記
の目的を達成し得ることを見い出し、本発明を完成する
に至った。
Means for Solving the Problems As a result of intensive studies to solve the above problems, the inventors have found that the above object can be achieved by blending a specific cyclic phosphazene compound as a flame retardant. They have found and completed the present invention.

【0005】すなわち、本発明は、 (1)(A)1分子中に2個以上のエポキシ基を有する
エポキシ樹脂、(B)1分子中に2個以上のフェノール
性水酸基を有する化合物、(C)主鎖骨格中に次式
(I)及び/又は次式(II)を繰り返し単位として含む
環状ホスファゼン化合物、(D)無機充填剤、を必須成
分とし、(D)成分の含有量が成形材料全体に対して7
0重量%以上であることを特徴とする封止用エポキシ樹
脂成形材料、
That is, the present invention relates to (1) (A) an epoxy resin having two or more epoxy groups in one molecule, (B) a compound having two or more phenolic hydroxyl groups in one molecule, (C) A) a cyclic phosphazene compound containing the following formula (I) and / or the following formula (II) as a repeating unit in the main chain skeleton and (D) an inorganic filler as essential components, and the content of the component (D) is a molding material. 7 for the whole
0% by weight or more of an epoxy resin molding material for sealing,

【化6】 (ここで、式(I)中のmは1〜10の整数で、R1
4は置換基を有しても良い炭素数1〜12のアルキル
基及びアリール基から選ばれ、全て同一でも異なってい
ても良いが少なくとも1つは水酸基を有する基であり、
Aは炭素数1〜4のアルキレン基又はアリレン基を示
す。式(II)中のnは1〜10の整数で、R5〜R8は置
換基を有しても良い炭素数1〜4のアルキル基又はアリ
ール基から選ばれ、全て同一でも異なっていても良く、
Aは炭素数1〜4のアルキレン基又はアリレン基を示
す。) (2)(A)1分子中に2個以上のエポキシ基を有する
エポキシ樹脂、(B)1分子中に2個以上のフェノール
性水酸基を有する化合物、(C)主鎖骨格中に次式(II
I)及び/又は次式(IV)を繰り返し単位として含む環
状ホスファゼン化合物、(D)無機充填剤、を必須成分
とし、(D)成分の含有量が成形材料全体に対して70
重量%以上であることを特徴とする封止用エポキシ樹脂
成形材料、
Embedded image (Here, m in the formula (I) is an integer of 1 to 10, and R 1 to
R 4 is selected from an alkyl group and an aryl group having 1 to 12 carbon atoms which may have a substituent, and all may be the same or different, but at least one is a group having a hydroxyl group;
A represents an alkylene group having 1 to 4 carbon atoms or an arylene group. N in the formula (II) is an integer of 1 to 10, and R 5 to R 8 are selected from an alkyl group or an aryl group having 1 to 4 carbon atoms which may have a substituent. Well,
A represents an alkylene group having 1 to 4 carbon atoms or an arylene group. (2) (A) an epoxy resin having two or more epoxy groups in one molecule, (B) a compound having two or more phenolic hydroxyl groups in one molecule, and (C) a compound having the following formula in the main chain skeleton. (II
A cyclic phosphazene compound containing (I) and / or the following formula (IV) as a repeating unit and (D) an inorganic filler are essential components, and the content of the (D) component is 70% based on the whole molding material.
% By weight or more, an epoxy resin molding material for sealing,

【化7】 (ここで、式(III)中のmは1〜10の整数で、R1
4は置換基を有しても良い炭素数1〜12のアルキル
基及びアリール基から選ばれ、全て同一でも異なってい
ても良いが少なくとも1つは水酸基を有する基であり、
Aは炭素数1〜4のアルキレン基又はアリレン基を示
す。式(IV)中のnは1〜10の整数で、R5〜R8は置
換基を有しても良い炭素数1〜12のアルキル基又はア
リール基から選ばれ、全て同一でも異なっていても良
く、Aは炭素数1〜4のアルキレン基又はアリレン基を
示す。) (3)(C)成分が主鎖骨格中に次式(V)及び/又は
次式(VI)を繰り返し単位として含む環状ホスファゼン
化合物であることを特徴とする上記(1)記載の封止用
エポキシ樹脂成形材料、
Embedded image (Where m in the formula (III) is an integer of 1 to 10, and R 1 to
R 4 is selected from an alkyl group and an aryl group having 1 to 12 carbon atoms which may have a substituent, and all may be the same or different, but at least one is a group having a hydroxyl group;
A represents an alkylene group having 1 to 4 carbon atoms or an arylene group. N in the formula (IV) is an integer of 1 to 10, and R 5 to R 8 are selected from an alkyl group or an aryl group having 1 to 12 carbon atoms which may have a substituent. A represents an alkylene group having 1 to 4 carbon atoms or an arylene group. (3) The encapsulation according to the above (1), wherein the component (C) is a cyclic phosphazene compound containing the following formula (V) and / or the following formula (VI) as a repeating unit in the main chain skeleton. Epoxy resin molding material,

【化8】 (ここで、式(V)中のmは1〜10の整数で、R9
12は水素、炭素数1〜4のアルキル基、アルコキシル
基、アリール基、水酸基、アミノ基、エポキシ基から選
ばれ、全て同一でも異なっていても良いが、少なくとも
1つは水酸基を示す。式(VI)中のnは1〜10の整数
で、R13〜R16は水素、炭素数1〜4のアルキル基、ア
ルコキシル基、アリール基、水酸基、アミノ基、エポキ
シ基から選ばれ、全て同一でも異なっていても良い。) (4)(C)成分が主鎖骨格中に次式(VII)及び/又
は(VIII)を繰り返し単位として含む環状ホスファゼン
化合物であることを特徴とする上記(2)記載の封止用
エポキシ樹脂成形材料、
Embedded image (Here, m in the formula (V) in an integer from 1 to 10, R 9 ~
R 12 is selected from hydrogen, an alkyl group having 1 to 4 carbon atoms, an alkoxyl group, an aryl group, a hydroxyl group, an amino group, and an epoxy group, all of which may be the same or different, but at least one of them represents a hydroxyl group. N in the formula (VI) is an integer of 1 to 10, and R 13 to R 16 are selected from hydrogen, an alkyl group having 1 to 4 carbon atoms, an alkoxyl group, an aryl group, a hydroxyl group, an amino group, and an epoxy group. They may be the same or different. (4) The epoxy for sealing according to the above (2), wherein the component (C) is a cyclic phosphazene compound containing the following formula (VII) and / or (VIII) as a repeating unit in the main chain skeleton. Resin molding materials,

【化9】 (ここで、式(VII)中のmは1〜10の整数で、R9
12は水素、炭素数1〜4のアルキル基、アルコキシル
基、アリール基、水酸基、アミノ基、エポキシ基から選
ばれ、全て同一でも異なっていても良いが、少なくとも
1つは水酸基を示す。式(VIII)中のnは1〜10の整
数で、R13〜R16は水素、炭素数1〜4のアルキル基、
アルコキシル基、アリール基、水酸基、アミノ基、エポ
キシ基から選ばれ、全て同一でも異なっていても良
い。) (5)(C)成分の主鎖骨格中に含まれる式(I)〜式
(IV)中のR1〜R4のうち1個がヒドロキシフェニル
基、他の3個がフェニル基、R5〜R8の全てがフェニル
基、Aがフェニレン基である上記(1)又は上記(2)
記載の電子部品封止用エポキシ樹脂成形材料、 (6)(C)成分の主鎖骨格中に含まれる式(I)〜式
(VIII)のモル比(m/n)が1/0〜1/4である上
記(1)〜上記(5)記載のいずれかの封止用エポキシ
樹脂成形材料、 (7)(C)成分の含有量が無機充填剤(D)を除く配
合成分の合計量に対して燐原子の量が0.2〜5.0重
量%となる量である上記(1)〜上記(6)記載のいず
れかの封止用エポキシ樹脂成形材料、 (8)(A)成分が次式(IX)で示されるエポキシ樹脂
を含むことを特徴とする上記(1)〜上記(7)記載の
いずれかの封止用エポキシ樹脂成形材料、
Embedded image (Here, m in the formula (VII) in an integer from 1 to 10, R 9 ~
R 12 is selected from hydrogen, an alkyl group having 1 to 4 carbon atoms, an alkoxyl group, an aryl group, a hydroxyl group, an amino group, and an epoxy group, all of which may be the same or different, but at least one of them represents a hydroxyl group. N in the formula (VIII) is an integer of 1 to 10, R 13 to R 16 are hydrogen, an alkyl group having 1 to 4 carbon atoms,
It is selected from an alkoxyl group, an aryl group, a hydroxyl group, an amino group, and an epoxy group, and all may be the same or different. (5) One of R 1 to R 4 in formulas (I) to (IV) contained in the main chain skeleton of the component (C) is a hydroxyphenyl group, the other three are phenyl groups, The above (1) or (2), wherein all of 5 to R 8 are phenyl groups and A is a phenylene group.
(6) The molar ratio (m / n) of the formulas (I) to (VIII) contained in the main chain skeleton of the component (C) is 1/0 to 1; The epoxy resin molding material for sealing according to any one of the above (1) to (5), wherein the content of the component (C) is not more than the inorganic filler (D). The epoxy resin molding material for sealing according to any one of the above (1) to (6), wherein the amount of the phosphorus atom is 0.2 to 5.0% by weight with respect to (8) (A) The epoxy resin molding material for sealing according to any one of the above (1) to (7), wherein the component contains an epoxy resin represented by the following formula (IX):

【化10】 (ここで、nは0〜3を示し、R17〜R20は水素、炭素
数1〜10のアルキル基、アルコキシル基、アリール基
及びアラルキル基から選ばれ、全て同一でも異なっても
良い。) (9)上記(1)〜上記(8)記載のいずれかの封止用
エポキシ樹脂成形材料により封止された素子を備える電
子部品装置、である。
Embedded image (Here, n represents 0 to 3, and R 17 to R 20 are selected from hydrogen, an alkyl group having 1 to 10 carbon atoms, an alkoxyl group, an aryl group and an aralkyl group, all of which may be the same or different.) (9) An electronic component device including an element sealed with the sealing epoxy resin molding material according to any one of (1) to (8).

【0006】[0006]

【発明の実施の形態】本発明において用いられる(A)
成分の1分子中に2個以上のエポキシ基を有するエポキ
シ樹脂としては、封止用エポキシ樹脂成形材料で一般に
使用されているものであれば特に限定するものではない
が、例えば、フェノールノボラック型エポキシ樹脂、オ
ルソクレゾールノボラック型エポキシ樹脂をはじめとす
るフェノール類とアルデヒド類のノボラック樹脂をエポ
キシ化したもの、ビスフェノールA、ビスフェノール
F、ビスフェノールS、アルキル置換又は非置換のビフ
ェノールなどのジグリシジルエーテル、ジアミノジフェ
ニルメタン、イソシアヌル酸などのポリアミンとエピク
ロルヒドリンの反応により得られるグリシジルアミン型
エポキシ樹脂、ジシクロペンタジエンとフェノール類の
共縮合樹脂のエポキシ化物、トリメチロールプロパン型
エポキシ樹脂、テルペン変性エポキシ樹脂、オレフィン
結合を過酢酸等の過酸で酸化して得られる線状脂肪族エ
ポキシ樹脂、及び脂環族エポキシ樹脂などが挙げられ、
単独で用いても2種以上併用しても良い。中でも、接着
性、吸湿性の点からは下記一般式(IX)のビフェニル型
ジエポキシ樹脂が好適である。これにより耐リフローク
ラック性及び耐湿性に優れた成形材料が得られる。
DETAILED DESCRIPTION OF THE INVENTION (A) used in the present invention
The epoxy resin having two or more epoxy groups in one molecule of the component is not particularly limited as long as the epoxy resin is generally used in an epoxy resin molding material for sealing. Resins, novolak resins of phenols and aldehydes such as ortho-cresol novolak epoxy resins, epoxidized bisphenol A, bisphenol F, bisphenol S, diglycidyl ethers such as alkyl-substituted or unsubstituted biphenols, diaminodiphenylmethane Glycidylamine type epoxy resin obtained by reaction of polyamine such as isocyanuric acid and epichlorohydrin, epoxidized product of cocondensation resin of dicyclopentadiene and phenol, trimethylolpropane type epoxy resin, ter Down-modified epoxy resins, linear aliphatic epoxy resins obtained by oxidizing with a peracid such as peracetic acid an olefinic bond, and an alicyclic epoxy resins.
They may be used alone or in combination of two or more. Among them, biphenyl diepoxy resins represented by the following general formula (IX) are preferable from the viewpoint of adhesiveness and hygroscopicity. Thereby, a molding material having excellent reflow crack resistance and moisture resistance can be obtained.

【0007】[0007]

【化11】 (ここで、nは0〜3を示し、R17〜R20は水素、炭素
数1〜10のアルキル基、アルコキシル基、アリール基
及びアラルキル基から選ばれ、全て同一でも異なっても
良い。) これを例示すると、4,4’−ビス(2,3−エポキシ
プロポキシ)ビフェニルや4,4’−ビス(2,3−エ
ポキシプロポキシ)−3,3’,5,5’−テトラメチ
ルビフェニルを主成分とするエポキシ樹脂等が挙げら
れ、中でも4,4’−ビス(2,3−エポキシプロポキ
シ)−3,3’,5,5’−テトラメチルビフェニルを
主成分とするエポキシ樹脂が好ましい。このビフェニル
型ジエポキシ樹脂を使用する場合、その配合量はエポキ
シ樹脂全量に対し60重量%以上とすることが好まし
い。60重量%未満では当該エポキシ樹脂の低吸湿性、
高接着性の特長が発揮されず、耐はんだ性に対して効果
が小さいためである。
Embedded image (Here, n represents 0 to 3, and R 17 to R 20 are selected from hydrogen, an alkyl group having 1 to 10 carbon atoms, an alkoxyl group, an aryl group and an aralkyl group, all of which may be the same or different.) For example, 4,4'-bis (2,3-epoxypropoxy) biphenyl and 4,4'-bis (2,3-epoxypropoxy) -3,3 ', 5,5'-tetramethylbiphenyl An epoxy resin containing a main component is exemplified, and among them, an epoxy resin containing 4,4′-bis (2,3-epoxypropoxy) -3,3 ′, 5,5′-tetramethylbiphenyl as a main component is preferable. When this biphenyl type diepoxy resin is used, its blending amount is preferably at least 60% by weight based on the total amount of the epoxy resin. If it is less than 60% by weight, the epoxy resin has low moisture absorption,
This is because the feature of high adhesiveness is not exhibited, and the effect on solder resistance is small.

【0008】本発明において用いられる(B)成分の1
分子中に2個以上のフェノール性水酸基を有する化合物
としては、フェノール、クレゾール、キシレノール、レ
ゾルシン、カテコール、ビスフェノールA、ビスフェノ
ールF等のフェノール類又はα−ナフトール、β−ナフ
トール、ジヒドロキシナフタレン等のナフトール類とホ
ルムアルデヒド、アセトアルデヒド、プロピオンアルデ
ヒド、ベンズアルデヒド、サリチルアルデヒド等のアル
デヒド類とを酸性触媒下で縮合又は共縮合させて得られ
る樹脂、ポリパラビニルフェノール樹脂、フェノール類
とジメトキシパラキシレンから合成されるキシリレン基
を有するフェノールアラルキル樹脂などがあり、単独又
は2種類以上併用しても良い。
[0008] One of the components (B) used in the present invention
Compounds having two or more phenolic hydroxyl groups in the molecule include phenols such as phenol, cresol, xylenol, resorcinol, catechol, bisphenol A, bisphenol F and naphthols such as α-naphthol, β-naphthol and dihydroxynaphthalene. And a resin obtained by condensing or co-condensing aldehydes such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde and salicylaldehyde under an acidic catalyst, a polyparavinylphenol resin, a xylylene group synthesized from phenols and dimethoxyparaxylene And a phenol aralkyl resin having the formula (1), which may be used alone or in combination of two or more.

【0009】(A)成分のエポキシ樹脂と(B)成分の
フェノール化合物及び(C)成分の環状ホスファゼン化
合物の当量比((B)成分中の水酸基数と(C)の水酸
基数との合計/(A)のエポキシ基数)は、特に限定は
されないが、それぞれの未反応分を少なく抑えるために
0.7〜1.3の範囲に設定することが好ましい。
The equivalent ratio of the epoxy resin of the component (A) to the phenol compound of the component (B) and the cyclic phosphazene compound of the component (C) (the sum of the number of hydroxyl groups in the component (B) and the number of hydroxyl groups in the component (C) / The number of epoxy groups (A) is not particularly limited, but is preferably set in the range of 0.7 to 1.3 in order to reduce the amount of unreacted components.

【0010】また、エポキシ樹脂とフェノール樹脂の硬
化反応を促進する硬化促進剤を必要に応じて使用するこ
とができる。この硬化促進剤としては、例えば、1,8
−ジアザビシクロ(5,4,0)ウンデセン−7等のジ
アザビシクロアルケン及びその誘導体、トリエチレンジ
アミン、ベンジルジメチルアミン、トリエタノールアミ
ン、ジメチルアミノエタノール、トリス(ジメチルアミ
ノメチル)フェノール等の三級アミン類、2−メチルイ
ミダゾール、2−フェニルイミダゾール、2−フェニル
−4−メチルイミダゾール、2−ヘプタデシルイミダゾ
ール等のイミダゾール類、トリブチルホスフィン、メチ
ルジフェニルホスフィン、トリフェニルホスフィン等の
有機ホスフィン類、テトラフェニルホスホニウム・テト
ラフェニルボレート等のテトラ置換ホスホニウム・テト
ラ置換ボレート、2−エチル−4−メチルイミダゾール
・テトラフェニルボレート、N−メチルモルホリン・テ
トラフェニルボレート等のテトラフェニルボロン塩など
がある。
[0010] A curing accelerator for accelerating the curing reaction between the epoxy resin and the phenol resin can be used as required. As this curing accelerator, for example, 1,8
-Diazabicycloalkenes and derivatives thereof such as diazabicyclo (5,4,0) undecene-7 and tertiary amines such as triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol and tris (dimethylaminomethyl) phenol Imidazoles such as 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole and 2-heptadecylimidazole; organic phosphines such as tributylphosphine, methyldiphenylphosphine and triphenylphosphine; and tetraphenylphosphonium. Tetra-substituted phosphonium / tetra-substituted borate such as tetraphenyl borate, 2-ethyl-4-methylimidazole / tetraphenyl borate, N-methylmorpholine / tetraphenyl borate And the like tetraphenyl boron salts bets like.

【0011】本発明において難燃剤として用いられる
(C)成分の環状ホスファゼン化合物は、主鎖骨格中に
次式(I)及び/又は次式(II)、あるいはファゼン環
中の燐原子に対する置換位置が異なる次式(III)及び
/又は次式(IV)を繰り返し単位として含む化合物であ
る。
The cyclic phosphazene compound of the component (C) used as a flame retardant in the present invention has the following formula (I) and / or the following formula (II) in the main chain skeleton or the substitution position with respect to the phosphorus atom in the fazene ring. Is a compound containing different formulas (III) and / or (IV) as repeating units.

【化12】 Embedded image

【化13】 ここで、式(I)及び式(III)中のmは1〜10の整
数で、R1〜R4は置換基を有しても良い炭素数1〜12
のアルキル基及びアリール基から選ばれ、全て同一でも
異なっていても良いが少なくとも1つは水酸基を有する
基であり、Aは炭素数1〜4のアルキレン基又はアリレ
ン基を示す。式(II)及び式(IV)中のnは1〜10の
整数で、R5〜R8は置換基を有しても良い炭素数1〜1
2のアルキル基又はアリール基から選ばれ、全て同一で
も異なっていても良く、Aは炭素数1〜4のアルキレン
基又はアリレン基を示す。また、式中m個のR1、R2
3、R4はm個全てが同一でも異なっていても良く、n
個のR5、R6、R7、R8はn個全てが同一でも異なって
いても良い。
Embedded image Here, m in the formulas (I) and (III) is an integer of 1 to 10, and R 1 to R 4 have 1 to 12 carbon atoms which may have a substituent.
And all may be the same or different, but at least one is a group having a hydroxyl group, and A represents an alkylene group having 1 to 4 carbon atoms or an arylene group. In the formulas (II) and (IV), n is an integer of 1 to 10, and R 5 to R 8 have 1 to 1 carbon atoms which may have a substituent.
2 alkyl groups or aryl groups, all of which may be the same or different, and A represents an alkylene group having 1 to 4 carbon atoms or an arylene group. In the formula, m R 1 , R 2 ,
R 3 and R 4 may all be the same or different, and n
R 5 , R 6 , R 7 , and R 8 may all be the same or different.

【0012】上記式(I)〜式(IV)において、R1
8で示される置換基を有しても良い炭素数1〜12の
アルキル基又はアリール基としては特に制限はないが、
例えばメチル基、エチル基、プロピル基、イソプロピル
基、ブチル基、イソブチル基、sec−ブチル基、te
rt−ブチル基等のアルキル基、フェニル基、1−ナフ
チル基、2−ナフチル基等のアリール基、o−トリル
基、m−トリル基、p−トリル基、2,3−キシリル
基、2,4−キシリル基、o−クメニル基、m−クメニ
ル基、p−クメニル基、メシチル基等のアルキル基置換
アリール基、ベンジル基、フェネチル基等のアリール基
置換アルキル基などが挙げられ、さらにこれらに置換す
る置換基としては、アルキル基、アルコキシル基、アリ
ール基、水酸基、アミノ基、エポキシ基、ビニル基、ヒ
ドロキシアルキル基、アルキルアミノ基等が挙げられ
る。これらの中で、エポキシ樹脂成形材料の耐熱性、耐
湿性の観点からはアリール基が好ましく、より好ましく
はフェニル基もしくはヒドロキシフェニル基である。中
でも、R1〜R4のうち少なくとも1つはヒドロキシフェ
ニル基であることが好ましく、R1〜R8全てがヒドロキ
シフェニル基でも良いが、R1〜R4の1つがヒドロキシ
フェニル基の場合がより好ましい。R1〜R8が全てヒド
ロキシフェニル基の場合はエポキシ樹脂硬化物が脆くな
りやすく、R1〜R8が全てフェニル基の場合にはエポキ
シ樹脂の架橋構造に取り込まれないため、エポキシ樹脂
硬化物の耐熱性が低下しやすい。また、上記式(I)〜
式(IV)中のAで示される炭素数1〜4のアルキレン基
又はアリレン基としては特に制限はないが、例えばメチ
レン基、エチレン基、プロピレン基、イソプロピレン
基、ブチレン基、イソブチレン基、フェニレン基、トリ
レン基、キシリレン基、ナフチレン基等が挙げられ、エ
ポキシ樹脂成形材料の耐熱性、耐湿性の観点からはアリ
レン基が好ましく、中でもフェニレン基がより好まし
い。
In the above formulas (I) to (IV), R 1 to
The alkyl or aryl group having 1 to 12 carbon atoms which may have a substituent represented by R 8 is not particularly limited,
For example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, te
alkyl group such as rt-butyl group, phenyl group, 1-naphthyl group, aryl group such as 2-naphthyl group, o-tolyl group, m-tolyl group, p-tolyl group, 2,3-xylyl group, 2, 4-xylyl group, o-cumenyl group, m-cumenyl group, p-cumenyl group, alkyl-substituted aryl groups such as mesityl group, benzyl group, aryl-substituted alkyl groups such as phenethyl group, and the like. Examples of the substituent to be substituted include an alkyl group, an alkoxyl group, an aryl group, a hydroxyl group, an amino group, an epoxy group, a vinyl group, a hydroxyalkyl group, and an alkylamino group. Among them, an aryl group is preferable from the viewpoint of heat resistance and moisture resistance of the epoxy resin molding material, and a phenyl group or a hydroxyphenyl group is more preferable. Among them, at least one of R 1 to R 4 is preferably a hydroxyphenyl group, and all of R 1 to R 8 may be a hydroxyphenyl group, but one of R 1 to R 4 may be a hydroxyphenyl group. More preferred. When all of R 1 to R 8 are hydroxyphenyl groups, the cured epoxy resin tends to be brittle, and when all of R 1 to R 8 are phenyl groups, they are not incorporated into the crosslinked structure of the epoxy resin. Is likely to have reduced heat resistance. Further, the above formulas (I) to
The alkylene group having 1 to 4 carbon atoms or the arylene group represented by A in the formula (IV) is not particularly limited. Examples thereof include a methylene group, an ethylene group, a propylene group, an isopropylene group, a butylene group, an isobutylene group, and a phenylene group. Groups, a tolylene group, a xylylene group, a naphthylene group and the like. From the viewpoint of heat resistance and moisture resistance of the epoxy resin molding material, an allylene group is preferable, and a phenylene group is more preferable.

【0013】(C)成分の環状ホスファゼン化合物は、
上記式(I)〜上記式(IV)のいずれかの重合物、上記
式(I)と上記式(II)との共重合物、又は上記式(II
I)と上記式(IV)との共重合物であるが、共重合物の
場合、ランダム共重合物でも、ブロック共重合物でも、
交互共重合物のいずれでも良い。その共重合モル比m/
nは特に限定するものではないが、エポキシ樹脂硬化物
の耐熱性や強度向上の観点から1/0〜1/4が好まし
く、1/0〜1/1.5がより好ましい。また、重合度
m+nは1〜20であり、好ましくは2〜8、より好ま
しくは3〜6である。
The cyclic phosphazene compound of the component (C) is
A polymer of any of the above formulas (I) to (IV), a copolymer of the above formula (I) and the above formula (II), or a polymer of the above formula (II)
It is a copolymer of I) and the above formula (IV). In the case of a copolymer, even a random copolymer or a block copolymer,
Any of alternating copolymers may be used. Its copolymer molar ratio m /
n is not particularly limited, but is preferably 1/0 to 1/4, more preferably 1/0 to 1 / 1.5 from the viewpoint of improving the heat resistance and strength of the cured epoxy resin. Further, the degree of polymerization m + n is 1 to 20, preferably 2 to 8, and more preferably 3 to 6.

【0014】本発明の(C)成分の環状ホスファゼン化
合物として好ましいものを例示すると、次式(X)の重
合物、次式(XI)の共重合物等が挙げられる。
Preferred examples of the cyclic phosphazene compound as the component (C) of the present invention include a polymer represented by the following formula (X) and a copolymer represented by the following formula (XI).

【化14】 (ここで、式(X)中のmは、0〜9の整数で、R1
4はそれぞれ独立に水素又は水酸基を示す。)
Embedded image (Here, m in the formula (X) is an integer of 0 to 9, and R 1 to
R 4 each independently represents hydrogen or a hydroxyl group. )

【化15】 ここで、上記式(XI)中のm、nは、0〜9の整数で、
1〜R4はそれぞれ独立に水素または水酸基から選ばれ
少なくとも1つは水酸基であり、R5〜R8はそれぞれ独
立に水素または水酸基から選ばれる。また、上記式(X
I)で示される環状フォスファゼン化合物は、次に示す
m個の繰り返し単位(a)とn個の繰り返し単位(b)
を交互に含むもの、ブロック状に含むもの、ランダムに
含むもののいずれであってもかまわないが、ランダムに
含むものが好ましい。
Embedded image Here, m and n in the above formula (XI) are integers of 0 to 9,
R 1 to R 4 are each independently selected from hydrogen or a hydroxyl group and at least one is a hydroxyl group, and R 5 to R 8 are each independently selected from hydrogen or a hydroxyl group. In addition, the above formula (X
The cyclic phosphazene compound represented by I) has the following m repeating units (a) and n repeating units (b)
May be included alternately, in a block, or randomly, but is preferably included at random.

【化16】 中でも、上記式(X)でR1〜R4のうちの1つが水酸基
でmが3〜6の重合体を主成分とするものや、上記式
(XI)でR1〜R4のうち1つが水酸基で、R5〜R8が全
て水素又は1つが水酸基であり、m/nが1/2〜1/
3で、m+nが3〜6の共重合体を主成分とするものが
好ましい。
Embedded image Among them, one having one of R 1 to R 4 in the above formula (X) and a polymer having m of 3 to 6 as a main component or one of R 1 to R 4 in the above formula (XI). One is a hydroxyl group, R 5 to R 8 are all hydrogen or one is a hydroxyl group, and m / n is 1/2 to 1/1 /
3, those having a copolymer in which m + n is 3 to 6 as a main component are preferable.

【0015】(C)成分の環状ホスファゼン化合物の配
合量は、(D)成分の無機充填剤を除く他の全配合成分
に対して、燐原子の量が0.2〜5.0重量%の範囲内
であることが好ましく、より好ましくは1.0〜3.0
重量%である。0.2重量%より少ないと難燃効果が発
揮されず、5.0重量%を超えると耐湿性の低下を引き
起こしやすい。
The amount of the cyclic phosphazene compound of the component (C) is 0.2 to 5.0% by weight based on all the other components except the inorganic filler of the component (D). It is preferably within the range, more preferably 1.0 to 3.0.
% By weight. When the amount is less than 0.2% by weight, the flame retardant effect is not exhibited, and when the amount is more than 5.0% by weight, the moisture resistance tends to be lowered.

【0016】本発明においては、特定の繰り返し単位を
主鎖骨格中に含む(C)成分の環状ホスファゼン化合物
を用いることで信頼性、成形性の優れ、ノンハロゲン、
ノンアンチモンで難燃性の封止用エポキシ樹脂成形材料
を提供するものである。燐化合物と窒素化合物の併用が
難燃化に良いことは一般的に知られているが、本発明は
優れた信頼性を発揮できる封止用エポキシ樹脂成形材料
の難燃剤成分として、燐原子と窒素原子の双方を構造中
に含む化合物を提供するものである。
In the present invention, the use of the cyclic phosphazene compound of the component (C) containing a specific repeating unit in the main chain skeleton enables excellent reliability and moldability to be achieved,
An object of the present invention is to provide a non-antimony and flame-retardant epoxy resin molding material for sealing. It is generally known that the combined use of a phosphorus compound and a nitrogen compound is good for flame retardancy.However, the present invention relates to the use of a phosphorus atom as a flame retardant component of a sealing epoxy resin molding material capable of exhibiting excellent reliability. It is intended to provide a compound containing both nitrogen atoms in the structure.

【0017】また、充填剤としては吸湿性低減及び強度
向上の観点から無機充填剤を用いることが必要である。
本発明における(D)成分の無機質充填剤としては特に
限定はないが、例えば、溶融シリカ、結晶シリカ、アル
ミナ、ジルコン、珪酸カルシウム、炭酸カルシウム、炭
化珪素、窒化ホウ素、ベリリア、ジルコニア等の粉体、
又はこれらを球形化したビーズ、チタン酸カリウム、炭
化珪素、窒化珪素、アルミナ等の単結晶繊維、ガラス繊
維などを1種類以上配合して用いることができる。さら
に、難燃効果のある無機充填剤としては水酸化アルミニ
ウム、水酸化マグネシウム、硼酸亜鉛等が挙げられ、こ
れらを単独で用いても併用しても良い。上記の無機充填
剤の中で、線膨張係数低減の観点からは溶融シリカが、
高熱伝導性の観点からはアルミナが好ましく、充填剤形
状は成形時の流動性及び金型摩耗性の点から球形が好ま
しい。無機質充填剤の配合量としては、吸湿性、線膨張
係数の低減及び強度向上の観点から70重量%以上であ
ることが必要で、好ましくは80〜95重量%である。
It is necessary to use an inorganic filler as the filler from the viewpoint of reducing the hygroscopicity and improving the strength.
The inorganic filler as the component (D) in the present invention is not particularly limited, and examples thereof include powders of fused silica, crystalline silica, alumina, zircon, calcium silicate, calcium carbonate, silicon carbide, boron nitride, beryllia, zirconia, and the like. ,
Alternatively, one or more kinds of spherical beads, potassium titanate, silicon carbide, silicon nitride, single crystal fiber such as alumina, glass fiber, and the like may be used. Further, examples of the inorganic filler having a flame-retardant effect include aluminum hydroxide, magnesium hydroxide, and zinc borate. These may be used alone or in combination. Among the above inorganic fillers, from the viewpoint of reducing the linear expansion coefficient, fused silica,
Alumina is preferred from the viewpoint of high thermal conductivity, and the shape of the filler is preferably spherical from the viewpoint of fluidity during molding and mold abrasion. The compounding amount of the inorganic filler is required to be 70% by weight or more, and preferably 80 to 95% by weight, from the viewpoints of hygroscopicity, reduction of linear expansion coefficient and improvement of strength.

【0018】その他の添加剤として高級脂肪酸、高級脂
肪酸金属塩、エステル系ワックス、ポリオレフィン系ワ
ックス等の離型剤、カーボンブラック等の着色剤、エポ
キシシラン、アミノシラン、ウレイドシラン、ビニルシ
ラン、アルキルシラン、メルカプトシラン、有機チタネ
ート、アルミニウムアルコレート等のカップリング剤な
どを用いることができる。
Other additives include release agents such as higher fatty acids, higher fatty acid metal salts, ester waxes and polyolefin waxes, coloring agents such as carbon black, epoxy silane, amino silane, ureido silane, vinyl silane, alkyl silane and mercapto. Coupling agents such as silane, organic titanate, and aluminum alcoholate can be used.

【0019】本発明における成形材料は、各種原材料を
均一に分散混合できるのであれば、いかなる手法を用い
ても調製できるが、一般的な手法として、所定の配合量
の原材料をミキサー等によって十分混合した後、ミキシ
ングロール、押出機等によって溶融混練した後、冷却、
粉砕する方法を挙げることができる。
The molding material in the present invention can be prepared by any method as long as various raw materials can be uniformly dispersed and mixed. As a general method, a predetermined amount of raw materials are sufficiently mixed by a mixer or the like. After mixing, melt-kneading with a mixing roll, extruder, etc., cooling,
A pulverizing method can be used.

【0020】リードフレーム、配線済みのテープキャリ
ア、配線板、ガラス、シリコンウエハ等の支持部材に、
半導体チップ、トランジスタ、ダイオード、サイリスタ
等の能動素子、コンデンサ、抵抗体、コイル等の受動素
子などの素子を搭載し、必要な部分を本発明の封止用成
形材料で封止して、電子部品装置を製造することができ
る。このような電子部品装置としては、たとえば、テー
プキャリアにバンプで接続した半導体チップを、本発明
の成形材料で封止したTCPを挙げることができる。ま
た、配線板やガラス上に形成した配線に、ワイヤーボン
ディング、フリップチップボンディング、はんだ等で接
続した半導体チップ、トランジスタ、ダイオード、サイ
リスタ等の能動素子及び/又はコンデンサ、抵抗体、コ
イル等の受動素子を、本発明の成形材料で封止したCO
Bモジュール、ハイブリッドIC、マルチチップモジュ
ールなどを挙げることができる。電子部品装置を封止す
る方法としては、低圧トランスファー成形法が最も一般
的であるが、インジェクション成形法、圧縮成形法等を
用いても良い。
For supporting members such as lead frames, wired tape carriers, wiring boards, glass and silicon wafers,
Electronic components mounted with active elements such as semiconductor chips, transistors, diodes, thyristors, etc., and passive elements such as capacitors, resistors, coils, etc., and sealing necessary parts with the molding material for sealing of the present invention. The device can be manufactured. An example of such an electronic component device is a TCP in which a semiconductor chip connected to a tape carrier by a bump is sealed with the molding material of the present invention. Also, active elements such as semiconductor chips, transistors, diodes, thyristors, and / or passive elements such as capacitors, resistors, and coils are connected to wiring formed on a wiring board or glass by wire bonding, flip chip bonding, soldering, or the like. Is sealed with the molding material of the present invention.
A B module, a hybrid IC, a multi-chip module, and the like can be given. As a method for sealing the electronic component device, a low-pressure transfer molding method is most common, but an injection molding method, a compression molding method, or the like may be used.

【0021】[0021]

【実施例】次に実施例により本発明を説明するが、本発
明の範囲はこれらの実施例に限定されるものではない。
Next, the present invention will be described with reference to examples, but the scope of the present invention is not limited to these examples.

【0022】合成例1(環状ホスファゼン化合物1の合
成) 攪拌装置、コンデンサー、温度計を備えた1リットルの
四つ口フラスコにヘキサクロロシクロトリホスファゼン
15.0g(0.043モル)、フェノール12.1g
(0.13モル)、炭酸カリウム89.0g(0.64
モル)及びアセトン800mlを加え、60〜70℃の
油浴上で48時間還流反応を行なった。その後、ハイド
ロキノン72.0g(0.65モル)、テトラブチルア
ンモニウムブロミド10.0g(0.031モル)を加
えさらに55時間還流反応を行った。反応後、炭酸カリ
ウムをろ過したのち溶媒のアセトンを減圧下で留去し
た。得られた生成物を希塩酸で中和して、水洗後室温で
減圧乾燥して、粉末状で骨格中に次式(XII)と次式(X
III)を繰り返し単位として含む環状ホスファゼン化合
物1を得た。化合物1の収率は88%で、無水酢酸−ピ
リジン法で測定した水酸基当量は676であった。
Synthesis Example 1 (Synthesis of cyclic phosphazene compound 1) 15.0 g (0.043 mol) of hexachlorocyclotriphosphazene and 12.1 g of phenol were placed in a 1-liter four-necked flask equipped with a stirrer, a condenser and a thermometer.
(0.13 mol), 89.0 g of potassium carbonate (0.64
Mol) and 800 ml of acetone, and refluxed for 48 hours on an oil bath at 60 to 70 ° C. Thereafter, 72.0 g (0.65 mol) of hydroquinone and 10.0 g (0.031 mol) of tetrabutylammonium bromide were added, and the mixture was refluxed for 55 hours. After the reaction, potassium carbonate was filtered, and then acetone as a solvent was distilled off under reduced pressure. The obtained product is neutralized with dilute hydrochloric acid, washed with water, and dried at room temperature under reduced pressure. The following formula (XII) and the following formula (X
A cyclic phosphazene compound 1 containing III) as a repeating unit was obtained. The yield of compound 1 was 88%, and the hydroxyl equivalent measured by the acetic anhydride-pyridine method was 676.

【化17】 (ここで、R1〜R4のうち1つが水酸基で残り3つが水
素であり、m、nはそれぞれ1〜10の整数である。) 合成例2(環状ホスファゼン化合物2の合成) 攪拌装置、コンデンサー、温度計を備えた1リットルの
四つ口フラスコにヘキサクロロシクロトリホスファゼン
15.0g(0.043モル)、フェノール14.2g
(0.15モル)、炭酸カリウム89.0g(0.64
モル)及びアセトン800mlを加え、60〜70℃の
油浴上で22時間還流反応を行なった。その後、ハイド
ロキノン59.4g(0.54モル)、テトラブチルア
ンモニウムブロミド10.0g(0.031モル)を加
えさらに90時間還流反応を行った。反応後、炭酸カリ
ウムをろ過したのち溶媒のアセトンを減圧下で留去し
た。得られた生成物を希塩酸で中和して、水洗後室温で
減圧乾燥して、粉末状で骨格中に上記式(XII)と上記
式(XIII)を繰り返し単位として含む環状ホスファゼン
化合物2を得た。化合物2の収率は85%で無水酢酸−
ピリジン法で測定した水酸基当量は1300であった。 合成例3(環状ホスファゼン化合物3の合成) 攪拌装置、コンデンサー、温度計を備えた1リットルの
四つ口フラスコにヘキサクロロシクロトリホスファゼン
15.0g(0.043モル)、フェノール20.4g
(0.22モル)、炭酸カリウム89.0g(0.64
モル)及びアセトン800mlを加え、60〜70℃の
油浴上で31時間還流反応を行なった。その後、ハイド
ロキノン23.9g(0.22モル)、テトラブチルア
ンモニウムブロミド10.0g(0.031モル)を加
えさらに55時間還流反応を行った。反応後、炭酸カリ
ウムをろ過したのち溶媒のアセトンを減圧下で留去し、
得られた生成物を希塩酸で中和した。さらに生成物をア
セトンに溶解させてから水で再沈殿させ、得られた生成
物をメタノールで洗浄した後室温で減圧乾燥して、粉末
状で骨格中に上記式(XIII)を繰り返し単位として含む
環状ホスファゼン化合物3を得た。化合物3の収率は2
0%で融点は111℃であった。
Embedded image (Here, one of R 1 to R 4 is a hydroxyl group and the remaining three are hydrogen, and m and n are each an integer of 1 to 10.) Synthesis Example 2 (Synthesis of cyclic phosphazene compound 2) In a 1 liter four-necked flask equipped with a condenser and a thermometer, 15.0 g (0.043 mol) of hexachlorocyclotriphosphazene and 14.2 g of phenol were added.
(0.15 mol), 89.0 g of potassium carbonate (0.64
Mol) and 800 ml of acetone, and refluxed for 22 hours on an oil bath at 60 to 70 ° C. Thereafter, 59.4 g (0.54 mol) of hydroquinone and 10.0 g (0.031 mol) of tetrabutylammonium bromide were added, and a reflux reaction was further performed for 90 hours. After the reaction, potassium carbonate was filtered, and then acetone as a solvent was distilled off under reduced pressure. The obtained product is neutralized with dilute hydrochloric acid, washed with water, and dried under reduced pressure at room temperature to obtain a cyclic phosphazene compound 2 in the form of a powder containing the above formula (XII) and the above formula (XIII) as a repeating unit in a skeleton. Was. The yield of compound 2 was 85% and acetic anhydride-
The hydroxyl equivalent measured by the pyridine method was 1,300. Synthesis Example 3 (Synthesis of cyclic phosphazene compound 3) 15.0 g (0.043 mol) of hexachlorocyclotriphosphazene and 20.4 g of phenol were placed in a 1-liter four-necked flask equipped with a stirrer, a condenser, and a thermometer.
(0.22 mol), 89.0 g of potassium carbonate (0.64 mol)
Mol) and 800 ml of acetone, and refluxed for 31 hours on an oil bath at 60 to 70 ° C. Thereafter, 23.9 g (0.22 mol) of hydroquinone and 10.0 g (0.031 mol) of tetrabutylammonium bromide were added, and the mixture was refluxed for 55 hours. After the reaction, potassium carbonate was filtered, and then acetone as a solvent was distilled off under reduced pressure.
The obtained product was neutralized with dilute hydrochloric acid. Further, the product is dissolved in acetone and then reprecipitated with water. The obtained product is washed with methanol, dried at room temperature under reduced pressure, and contains the above formula (XIII) as a repeating unit in a skeleton in a powder form. The cyclic phosphazene compound 3 was obtained. The yield of compound 3 is 2
At 0%, the melting point was 111 ° C.

【0023】実施例1〜6 エポキシ当量200、軟化点67℃のクレゾールノボラ
ック型エポキシ樹脂、エポキシ当量188、融点106
℃のビフェニル骨格型エポキシ樹脂(油化シェルエポキ
シ製;エピコートYX−4000H)、水酸基当量10
6、軟化点83℃のフェノールノボラック樹脂、水酸基
当量167、軟化点70℃のフェノール・アラルキル樹
脂(三井東圧製;ミレックスXL−225)、トリフェ
ニルホスフィン、カルナバワックス、カーボンブラッ
ク、カップリング剤としてγ−グリシドキシプロピルト
リメトキシシラン、溶融シリカ、及び難燃剤として、本
発明の(C)成分であり上記合成例1〜3で得られた化
合物1〜化合物3を表1に示す重量比で配合し、混練温
度80〜90℃、混練時間10分の条件でロール混練を
行い、実施例1〜6の成形材料を作製した。
Examples 1 to 6 Cresol novolak type epoxy resin having an epoxy equivalent of 200 and a softening point of 67 ° C., an epoxy equivalent of 188 and a melting point of 106
Biphenyl skeleton type epoxy resin (manufactured by Yuka Shell Epoxy; Epicoat YX-4000H), hydroxyl equivalent 10
6. Phenol novolak resin having a softening point of 83 ° C., hydroxyl equivalent 167, phenol aralkyl resin having a softening point of 70 ° C. (manufactured by Mitsui Toatsu; MILEX XL-225), triphenylphosphine, carnauba wax, carbon black, as a coupling agent As the γ-glycidoxypropyltrimethoxysilane, the fused silica, and the flame retardant, the compound (C) of the present invention and the compounds 1 to 3 obtained in the above Synthesis Examples 1 to 3 were added in the weight ratio shown in Table 1. Roll kneading was performed under the conditions of a kneading temperature of 80 to 90 ° C. and a kneading time of 10 minutes to produce molding materials of Examples 1 to 6.

【0024】比較例1、2 難燃剤としてエポキシ当量375、軟化点80℃、臭素
含量48重量%のブロム化ビスフェノールA型エポキシ
樹脂及び三酸化アンチモンを使用した以外は実施例と同
様に、表1に示す配合で比較例1、2の成形材料を作製
した。
Comparative Examples 1 and 2 In the same manner as in Example 1 except that a brominated bisphenol A type epoxy resin having an epoxy equivalent of 375, a softening point of 80 ° C., and a bromine content of 48% by weight and an antimony trioxide were used as flame retardants. The molding materials of Comparative Examples 1 and 2 were produced with the composition shown in Table 1.

【0025】[0025]

【表1】 [Table 1]

【0026】実施例及び比較例で得られた成形材料の特
性を、次に示す方法で評価した。 (1)熱時硬度 直径100mm、厚さ3mmの円板を成形する金型を使
用し、トランスファプレスにて180±3℃、6.9±
0.17MPa、90秒の条件で成形材料を成形し、成
形直後の成形品の熱時硬度をショア硬度計(Dタイプ)
により求めた。なお、熱時硬度の値は数値が高いほど良
いと評価する。 (2)吸水率 JIS−K−6911に準拠した、直径50mm厚さ3
mmの円板を作製し、85℃、85%RHの条件で72
時間加湿を行い、加湿前後の重量変化から求めた。 (3)接着性 30μmのアルミ箔上に成形材料をトランスファプレス
にて180±3℃、6.9±0.17MPa、90秒の
条件で成形し、その後、アルミ箔の90度方向へのピー
ル強度を測定した。 (4)難燃性 厚さ1/16インチの試験片を成形する金型を使用し、
トランスファプレスにて180±3℃、6.9±0.1
7MPa、90秒の条件で成形材料を成形し、その後1
80±5℃、5時間後硬化を行った。評価はUL94試
験法に従った。 (5)高温放置特性 外形サイズ5×9(mm)で5μmの酸化膜を有するシ
リコンサブストレート上にライン/スペースが10μm
のアルミ配線を形成したテスト素子を使用して、部分銀
メッキを施した42アロイのリードフレームに銀ペース
トで接続し、サーモソニック型ワイヤボンダにより20
0℃で素子のボンディングパッドとインナリードをAu
線にて接続した。その後、トランスファ成形により16
ピン型DIP(Dual Inline Package)を作製し、得ら
れた試験用ICを200℃の高温槽に保管し、所定時間
毎に取り出して導通試験を行い、不良数を調べた。な
お、評価用ICパッケージの成形はトランスファプレス
にて180±3℃、6.9±0.17MPa、90秒の
条件で成形材料を成形し、その後180±5℃、5時間
後硬化を行った。得られた評価結果を表2に示す。
The properties of the molding materials obtained in Examples and Comparative Examples were evaluated by the following methods. (1) Hot hardness Using a mold for forming a disk having a diameter of 100 mm and a thickness of 3 mm, using a transfer press at 180 ± 3 ° C and 6.9 ±.
A molding material is molded under the conditions of 0.17 MPa and 90 seconds, and the hardness of the molded product immediately after molding is measured by a Shore hardness tester (D type).
Determined by In addition, it is evaluated that the higher the value of the hardness at the time of heating, the better. (2) Water absorption 50 mm in diameter and 3 in thickness according to JIS-K-6911
mm disc, and prepared at 85 ° C. and 85% RH for 72 hours.
Humidification was performed for a period of time, and the weight was determined before and after humidification. (3) Adhesiveness A molding material was molded on a 30 μm aluminum foil by a transfer press under the conditions of 180 ± 3 ° C., 6.9 ± 0.17 MPa, 90 seconds, and then the aluminum foil was peeled in a 90 ° direction. The strength was measured. (4) Flame retardancy Using a mold for molding a test piece 1/16 inch thick,
180 ± 3 ° C, 6.9 ± 0.1 with transfer press
The molding material is molded under the conditions of 7 MPa and 90 seconds.
Post-curing was performed at 80 ± 5 ° C. for 5 hours. The evaluation followed the UL94 test method. (5) High temperature storage characteristics Line / space is 10 μm on a silicon substrate having an outer size of 5 × 9 (mm) and an oxide film of 5 μm.
Using a test element having an aluminum wiring formed thereon, it was connected to a 42-alloy lead frame partially plated with silver with a silver paste, and a thermosonic wire bonder was used to connect the alloy.
At 0 ° C, the bonding pads and inner leads of the device are Au
Connected by wire. After that, transfer molding
A pin-type DIP (Dual Inline Package) was prepared, and the obtained test IC was stored in a high-temperature bath at 200 ° C., taken out every predetermined time, and subjected to a continuity test to determine the number of defects. The IC package for evaluation was molded by a transfer press under the conditions of 180 ± 3 ° C., 6.9 ± 0.17 MPa, 90 seconds, and then cured at 180 ± 5 ° C. for 5 hours. . Table 2 shows the obtained evaluation results.

【0027】[0027]

【表2】 [Table 2]

【0028】本発明の実施例1〜6は、ブロム化樹脂及
びアンチモン化合物を含む比較例1、2と比較して高温
放置特性が格段に向上している。特に、実施例4〜6は
ビフェニル骨格型エポキシ樹脂を使用しているために接
着性も良好である。本発明の難燃剤を用いた実施例はい
ずれも高温放置特性が良好で、難燃性にも優れている
が、化合物3はエポキシ基と反応可能な官能基を持たな
いため、これを難燃剤として用いた場合は実施例3及び
6に示すように接着性は向上するものの熱時硬度がやや
低下する。また、化合物1及び化合物2はエポキシ基と
反応可能なヒドロキシフェニル基を有するため、これを
用いた実施例1、2及び4、5は熱時硬度と接着性のバ
ランスに特に優れる。
In Examples 1 to 6 of the present invention, high-temperature storage characteristics are remarkably improved as compared with Comparative Examples 1 and 2 containing a brominated resin and an antimony compound. In particular, in Examples 4 to 6, the adhesiveness is good because the biphenyl skeleton type epoxy resin is used. All of the examples using the flame retardant of the present invention have good high-temperature storage characteristics and excellent flame retardancy, but compound 3 has no functional group capable of reacting with an epoxy group. In the case where it is used, as shown in Examples 3 and 6, the adhesiveness is improved, but the hardness when heated is slightly lowered. In addition, since Compound 1 and Compound 2 have a hydroxyphenyl group capable of reacting with an epoxy group, Examples 1, 2, 4, and 5 using the compound are particularly excellent in the balance between hardness when heated and adhesiveness.

【0029】[0029]

【発明の効果】本発明によって得られる電子部品封止用
エポキシ樹脂成形材料は実施例で示したようにノンハロ
ゲン、ノンアンチモンで難燃化を達成でき、これを用い
てIC、LSIなどの電子部品を封止すれば成形性が良
好であり、耐湿性、高温放置特性などの信頼性に優れた
製品を得ることができ、その工業的価値は大である。
The epoxy resin molding material for encapsulating electronic parts obtained by the present invention can achieve flame retardancy with non-halogen and non-antimony as shown in the examples, and is used for electronic parts such as ICs and LSIs. Is sealed, the product is excellent in moldability, and a product having excellent reliability such as moisture resistance and high-temperature storage characteristics can be obtained, and its industrial value is great.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01L 23/29 H01L 23/30 R 23/31 (72)発明者 萩原 伸介 茨城県つくば市和台48 日立化成工業株式 会社筑波開発研究所内 Fターム(参考) 4J002 BC12X BQ00X CC03X CC04X CC05X CD01W CD02W CD04W CD05W CD06W CD13W CD20W CE00X CQ01Y DE077 DE097 DE147 DE187 DJ007 DJ017 DK007 DL007 EW156 FA047 FA067 FA087 FD017 FD13Y FD136 FD14X FD14Y FD146 GJ02 GQ00 4J036 AB02 AB07 AD03 AD04 AD07 AD08 AD21 AF06 AF08 AH07 AH19 AJ07 AJ08 AK06 DA01 DA04 DC43 FA01 FA02 FA05 FA06 FB08 JA07 4M109 AA01 BA01 BA03 CA21 EA03 EB03 EB04 EB06 EB07 EB08 EB09 EB12 EC01 EC03 EC05──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H01L 23/29 H01L 23/30 R 23/31 (72) Inventor Shinsuke Hagiwara 48 Wadai, Tsukuba, Ibaraki, Hitachi F term in Tsukuba Development Laboratory, Kasei Kogyo Co., Ltd. (Reference) AB07 AD03 AD04 AD07 AD08 AD21 AF06 AF08 AH07 AH19 AJ07 AJ08 AK06 DA01 DA04 DC43 FA01 FA02 FA05 FA06 FB08 JA07 4M109 AA01 BA01 BA03 CA21 EA03 EB03 EB04 EB06 EB07 EB08 EB09 EB12 EC01 EC03 EC05

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】(A)1分子中に2個以上のエポキシ基を
有するエポキシ樹脂、(B)1分子中に2個以上のフェ
ノール性水酸基を有する化合物、(C)主鎖骨格中に次
式(I)及び/又は次式(II)を繰り返し単位として含
む環状ホスファゼン化合物、 【化1】 (ここで、式(I)中のmは1〜10の整数で、R1
4は置換基を有しても良い炭素数1〜12のアルキル
基及びアリール基から選ばれ、全て同一でも異なってい
ても良いが少なくとも1つは水酸基を有する基であり、
Aは炭素数1〜4のアルキレン基又はアリレン基を示
す。式(II)中のnは1〜10の整数で、R5〜R8は置
換基を有しても良い炭素数1〜12のアルキル基又はア
リール基から選ばれ、全て同一でも異なっていても良
く、Aは炭素数1〜4のアルキレン基又はアリレン基を
示す。)(D)無機充填剤、を必須成分とし、(D)成
分の含有量が成形材料全体に対して70重量%以上であ
ることを特徴とする封止用エポキシ樹脂成形材料。
1. An epoxy resin having two or more epoxy groups in one molecule, (B) a compound having two or more phenolic hydroxyl groups in one molecule, and (C) a compound having two or more phenolic hydroxyl groups in one molecule. A cyclic phosphazene compound containing the formula (I) and / or the following formula (II) as a repeating unit: (Here, m in the formula (I) is an integer of 1 to 10, and R 1 to
R 4 is selected from an alkyl group and an aryl group having 1 to 12 carbon atoms which may have a substituent, and all may be the same or different, but at least one is a group having a hydroxyl group;
A represents an alkylene group having 1 to 4 carbon atoms or an arylene group. N in the formula (II) is an integer of 1 to 10, and R 5 to R 8 are selected from an alkyl group or an aryl group having 1 to 12 carbon atoms which may have a substituent. A represents an alkylene group having 1 to 4 carbon atoms or an arylene group. (D) an inorganic filler, which is an essential component, wherein the content of the component (D) is 70% by weight or more based on the whole molding material;
【請求項2】(A)1分子中に2個以上のエポキシ基を
有するエポキシ樹脂、(B)1分子中に2個以上のフェ
ノール性水酸基を有する化合物、(C)主鎖骨格中に次
式(III)及び/又は次式(IV)を繰り返し単位として
含む環状ホスファゼン化合物、 【化2】 (ここで、式(III)中のmは1〜10の整数で、R1
4は置換基を有しても良い炭素数1〜12のアルキル
基及びアリール基から選ばれ、全て同一でも異なってい
ても良いが少なくとも1つは水酸基を有する基であり、
Aは炭素数1〜4のアルキレン基又はアリレン基を示
す。式(IV)中のnは1〜10の整数で、R5〜R8は置
換基を有しても良い炭素数1〜12のアルキル基又はア
リール基から選ばれ、全て同一でも異なっていても良
く、Aは炭素数1〜4のアルキレン基又はアリレン基を
示す。)(D)無機充填剤、を必須成分とし、(D)成
分の含有量が成形材料全体に対して70重量%以上であ
ることを特徴とする封止用エポキシ樹脂成形材料。
(A) an epoxy resin having two or more epoxy groups in one molecule; (B) a compound having two or more phenolic hydroxyl groups in one molecule; and (C) a compound having two or more phenolic hydroxyl groups in one molecule. A cyclic phosphazene compound containing the formula (III) and / or the following formula (IV) as a repeating unit: (Where m in the formula (III) is an integer of 1 to 10, and R 1 to
R 4 is selected from an alkyl group and an aryl group having 1 to 12 carbon atoms which may have a substituent, and all may be the same or different, but at least one is a group having a hydroxyl group;
A represents an alkylene group having 1 to 4 carbon atoms or an arylene group. N in the formula (IV) is an integer of 1 to 10, and R 5 to R 8 are selected from an alkyl group or an aryl group having 1 to 12 carbon atoms which may have a substituent. A represents an alkylene group having 1 to 4 carbon atoms or an arylene group. (D) an inorganic filler, which is an essential component, wherein the content of the component (D) is 70% by weight or more based on the whole molding material;
【請求項3】(C)成分が主鎖骨格中に次式(V)及び
/又は次式(VI)を繰り返し単位として含む環状ホスフ
ァゼン化合物であることを特徴とする請求項1記載の封
止用エポキシ樹脂成形材料。 【化3】 (ここで、式(V)中のmは1〜10の整数で、R9
12は水素、炭素数1〜4のアルキル基、アルコキシル
基、アリール基、水酸基、アミノ基、エポキシ基から選
ばれ、全て同一でも異なっていても良いが、少なくとも
1つは水酸基を示す。式(VI)中のnは1〜10の整数
で、R13〜R16は水素、炭素数1〜4のアルキル基、ア
ルコキシル基、アリール基、水酸基、アミノ基、エポキ
シ基から選ばれ、全て同一でも異なっていても良い。)
3. The encapsulation according to claim 1, wherein the component (C) is a cyclic phosphazene compound containing the following formula (V) and / or (VI) as a repeating unit in the main chain skeleton. Epoxy resin molding material. Embedded image (Here, m in the formula (V) in an integer from 1 to 10, R 9 ~
R 12 is selected from hydrogen, an alkyl group having 1 to 4 carbon atoms, an alkoxyl group, an aryl group, a hydroxyl group, an amino group, and an epoxy group, all of which may be the same or different, but at least one of them represents a hydroxyl group. N in the formula (VI) is an integer of 1 to 10, and R 13 to R 16 are selected from hydrogen, an alkyl group having 1 to 4 carbon atoms, an alkoxyl group, an aryl group, a hydroxyl group, an amino group, and an epoxy group. They may be the same or different. )
【請求項4】(C)成分が主鎖骨格中に次式(VII)及
び/又は次式(VIII)を繰り返し単位として含む環状ホ
スファゼン化合物であることを特徴とする請求項2記載
の封止用エポキシ樹脂成形材料。 【化4】 (ここで、式(VII)中のmは1〜10の整数で、R9
12は水素、炭素数1〜4のアルキル基、アルコキシル
基、アリール基、水酸基、アミノ基、エポキシ基から選
ばれ、全て同一でも異なっていても良いが、少なくとも
1つは水酸基を示す。式(VIII)中のnは1〜10の整
数で、R13〜R16は水素、炭素数1〜4のアルキル基、
アルコキシル基、アリール基、水酸基、アミノ基、エポ
キシ基から選ばれ、全て同一でも異なっていても良
い。)
4. The encapsulation according to claim 2, wherein the component (C) is a cyclic phosphazene compound containing the following formula (VII) and / or (VIII) as a repeating unit in the main chain skeleton. Epoxy resin molding material. Embedded image (Here, m in the formula (VII) in an integer from 1 to 10, R 9 ~
R 12 is selected from hydrogen, an alkyl group having 1 to 4 carbon atoms, an alkoxyl group, an aryl group, a hydroxyl group, an amino group, and an epoxy group, all of which may be the same or different, but at least one of them represents a hydroxyl group. N in the formula (VIII) is an integer of 1 to 10, R 13 to R 16 are hydrogen, an alkyl group having 1 to 4 carbon atoms,
It is selected from an alkoxyl group, an aryl group, a hydroxyl group, an amino group, and an epoxy group, and all may be the same or different. )
【請求項5】(C)成分の主鎖骨格中に含まれる式
(I)〜式(IV)中のR1〜R4のうち1個がヒドロキシ
フェニル基、他の3個がフェニル基、R5〜R8の全てが
フェニル基、Aがフェニレン基である請求項1又は請求
項2記載の封止用エポキシ樹脂成形材料。
5. One of R 1 to R 4 in formulas (I) to (IV) contained in the main chain skeleton of the component (C), one is a hydroxyphenyl group, the other three are phenyl groups, R 5 all to R 8 is a phenyl group, a is an epoxy resin molding material for sealing according to claim 1 or claim 2, wherein a phenylene group.
【請求項6】(C)成分の主鎖骨格中に含まれる式
(I)〜式(VIII)のモル比(m/n)が1/0〜1/
4である請求項1〜請求項5各項記載のいずれかの封止
用エポキシ樹脂成形材料。
6. The molar ratio (m / n) of the formulas (I) to (VIII) contained in the main chain skeleton of the component (C) is 1/0 to 1/1.
The epoxy resin molding material for sealing according to any one of claims 1 to 5, which is 4.
【請求項7】(C)成分の含有量が無機充填剤(D)を
除く配合成分の合計量に対して燐原子の量が0.2〜
5.0重量%となる量である請求項1〜請求項6各記載
のいずれかの封止用エポキシ樹脂成形材料。
7. The content of the component (C) is from 0.2 to 0.2% of the total amount of the components except the inorganic filler (D).
The epoxy resin molding material for sealing according to any one of claims 1 to 6, wherein the amount is 5.0% by weight.
【請求項8】(A)成分が次式(IX)で示されるエポキ
シ樹脂を含むことを特徴とする請求項1〜請求項7各項
記載のいずれかの封止用エポキシ樹脂成形材料。 【化5】 (ここで、nは0〜3を示し、R17〜R20は水素、炭素
数1〜10のアルキル基、アルコキシル基、アリール基
及びアラルキル基から選ばれ、全て同一でも異なっても
良い。)
8. An epoxy resin molding material for sealing according to claim 1, wherein the component (A) contains an epoxy resin represented by the following formula (IX). Embedded image (Here, n represents 0 to 3, and R 17 to R 20 are selected from hydrogen, an alkyl group having 1 to 10 carbon atoms, an alkoxyl group, an aryl group and an aralkyl group, all of which may be the same or different.)
【請求項9】請求項1〜請求項8各項記載のいずれかの
封止用エポキシ樹脂成形材料により封止された素子を備
える電子部品装置。
9. An electronic component device comprising an element sealed with the sealing epoxy resin molding material according to any one of claims 1 to 8.
JP27634498A 1998-09-30 1998-09-30 Epoxy resin molding material for sealing and electronic component device Expired - Fee Related JP3852221B2 (en)

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