JP2003088998A - Pressurizing device - Google Patents

Pressurizing device

Info

Publication number
JP2003088998A
JP2003088998A JP2001276819A JP2001276819A JP2003088998A JP 2003088998 A JP2003088998 A JP 2003088998A JP 2001276819 A JP2001276819 A JP 2001276819A JP 2001276819 A JP2001276819 A JP 2001276819A JP 2003088998 A JP2003088998 A JP 2003088998A
Authority
JP
Japan
Prior art keywords
pressure
pressurizing
rubber
flexible layer
circuit element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001276819A
Other languages
Japanese (ja)
Other versions
JP2003088998A5 (en
Inventor
Hisao Matsuno
久雄 松野
Kenjiro Osugi
健治郎 大杉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikkiso Co Ltd
Original Assignee
Nikkiso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikkiso Co Ltd filed Critical Nikkiso Co Ltd
Priority to JP2001276819A priority Critical patent/JP2003088998A/en
Priority to CNB028177886A priority patent/CN1319140C/en
Priority to PCT/JP2002/009342 priority patent/WO2003025997A1/en
Priority to DE60235821T priority patent/DE60235821D1/en
Priority to EP02765504A priority patent/EP1434261B1/en
Priority to US10/489,680 priority patent/US20040238115A1/en
Priority to KR1020047003466A priority patent/KR100889283B1/en
Publication of JP2003088998A publication Critical patent/JP2003088998A/en
Publication of JP2003088998A5 publication Critical patent/JP2003088998A5/ja
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B30PRESSES
    • B30BPRESSES IN GENERAL
    • B30B5/00Presses characterised by the use of pressing means other than those mentioned in the preceding groups
    • B30B5/02Presses characterised by the use of pressing means other than those mentioned in the preceding groups wherein the pressing means is in the form of a flexible element, e.g. diaphragm, urged by fluid pressure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B30PRESSES
    • B30BPRESSES IN GENERAL
    • B30B15/00Details of, or accessories for, presses; Auxiliary measures in connection with pressing
    • B30B15/06Platens or press rams
    • B30B15/065Press rams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/75Apparatus for connecting with bump connectors or layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • H01L2224/7525Means for applying energy, e.g. heating means
    • H01L2224/753Means for applying energy, e.g. heating means by means of pressure
    • H01L2224/75301Bonding head
    • H01L2224/75314Auxiliary members on the pressing surface
    • H01L2224/75315Elastomer inlay
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01006Carbon [C]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Presses And Accessory Devices Thereof (AREA)
  • Press Drives And Press Lines (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide shorten the time for pressurizing and heating of a pressure attachment which holds a workpiece in-between and pressurizes a workpiece by a plurality of pressurizing dies including a pressurizing die having a soft layer and heats the workpiece by heat transfer from the dies simultaneously therewith. SOLUTION: The upper die 30 which is one of the pressurizing dies is provided with a rubber plate 58 forming the soft layer. The material of the rubber plate is formed by incorporating it by 15 to 30%.wt., carbon whiskers into silicon rubber. A prescribed temperature can be attained in about half time compared with that by the silicon rubber alone and the time for heating can be shortened.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、被加圧物を複数の
加圧型で挟持加圧して、同時に加圧型からの伝熱により
加熱を行う加圧装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pressurizing device for sandwiching and pressurizing an object to be pressed by a plurality of pressurizing molds, and simultaneously heating by heat transfer from the pressurizing molds.

【0002】[0002]

【従来の技術】被加圧物を複数の加圧型で挟持加圧し、
成形したり、圧着を行ったりする装置が知られている。
このような加圧装置において、柔軟層を有する加圧型を
用いたものが知られている。例えば、特開平10−85
996号公報には、セラミックコンデンサを作製するた
めに、セラミックグリーンシートと電極シートを積層し
た積層体を加圧、加熱して成形する加圧成形装置が記載
されている。この公報の装置においては、前記の積層体
の上面下面の傾きや、厚さの不均一を吸収するために、
加圧型の積層体に対向する部分に柔軟性を有するゴムが
用いられている。また、加圧成形対象となる積層体に加
わる熱は、ゴムを介して伝達される。
2. Description of the Related Art An object to be pressed is nipped and pressed by a plurality of press dies,
A device for molding and crimping is known.
In such a pressurizing device, a pressurizing device having a flexible layer is known. For example, JP-A-10-85
Japanese Patent Laid-Open No. 996 describes a pressure molding apparatus that pressurizes and heats a laminated body in which a ceramic green sheet and an electrode sheet are laminated to produce a ceramic capacitor. In the device of this publication, in order to absorb the inclination of the upper and lower surfaces of the laminate and the uneven thickness,
Flexible rubber is used in a portion facing the pressure-type laminate. Further, the heat applied to the laminated body which is the object of pressure molding is transmitted through the rubber.

【0003】[0003]

【発明が解決しようとする課題】前述のような柔軟な層
を設けた加圧装置において、柔軟層の伝熱性が悪いため
に、被加圧対象物を必要な温度まで上昇させるのに時間
を要してしまい生産性が低いという問題があった。
In the pressurizing device provided with the flexible layer as described above, since the heat transfer property of the flexible layer is poor, it takes time to raise the object to be pressurized to a necessary temperature. There was a problem that productivity was low because it was necessary.

【0004】本発明は、前述の問題点を考慮してなされ
たものであり、柔軟層の伝熱性を改善し、生産性を向上
させることを目的とする。
The present invention has been made in consideration of the above problems, and an object of the present invention is to improve the heat conductivity of the flexible layer and improve the productivity.

【0005】[0005]

【課題を解決するための手段】前述の課題を解決するた
めに、本発明にかかる加圧装置においては、加圧型の柔
軟層を、柔軟性を有する基材に、この基材に添加するこ
とによって当該柔軟層の熱伝導性が向上する物質が混合
されているものとしている。
In order to solve the above-mentioned problems, in the pressure device according to the present invention, a pressure-type flexible layer is added to a flexible substrate. It is assumed that a substance that improves the thermal conductivity of the flexible layer is mixed therewith.

【0006】また、柔軟層の基材をゴムとし、これに混
合するものを炭素の微細粒子、または微細繊維とするこ
とができる。
The base material of the flexible layer may be rubber, and the material to be mixed therewith may be carbon fine particles or fine fibers.

【0007】また、本発明にかかる加圧装置は、基板上
に回路素子を実装する際の加圧、加熱を行う装置として
用いることができる。すなわち、回路素子は、熱硬化性
の接着フィルムを間に挟んで基板上に載置され、加圧、
加熱によってこれが硬化され圧着される。また、接着フ
ィルムとして異方性導電膜を用いれば、加圧により所定
の部位を導通させ、回路素子と基板の配線との接続を、
前記の圧着と同時に行うことができる。
The pressure device according to the present invention can be used as a device for applying pressure and heating when mounting a circuit element on a substrate. That is, the circuit element is placed on the substrate with a thermosetting adhesive film sandwiched therebetween, and pressure,
This is hardened and pressed by heating. Further, if an anisotropic conductive film is used as the adhesive film, a predetermined portion is brought into conduction by pressurization, and the connection between the circuit element and the wiring of the substrate is
It can be performed at the same time as the above pressure bonding.

【0008】前述のように、柔軟層の伝熱性の改善によ
り、熱硬化性接着フィルムの熱硬化を短時間で行うこと
ができ、生産性が向上する。
As described above, by improving the heat transfer property of the flexible layer, the thermosetting adhesive film can be thermoset in a short time and the productivity is improved.

【0009】ゴムに混入する微細な炭素粒子などは、炭
素ウィスカとすることが好ましく、その含有率は、重量
比で15〜30パーセントとすることができる。また、
炭素ウィスカは、直径100〜1000nm、長さと直
径の比が100程度のものとすることができる。
The fine carbon particles and the like mixed in the rubber are preferably carbon whiskers, and the content ratio thereof can be 15 to 30% by weight. Also,
The carbon whiskers may have a diameter of 100 to 1000 nm and a ratio of length to diameter of about 100.

【0010】[0010]

【発明の実施の形態】以下、本発明の実施の形態(以下
実施形態という)を、図面に従って説明する。図1は、
本実施形態の集積回路チップなどの回路素子の実装方法
を説明するための図である。図1(a)に示すように、
基板10の表面には、所定のパターンで、配線12が形
成されている。基板10上に、接着用および配線用とし
ての熱硬化性の異方性導電膜14と回路素子16を所定
位置に配置する。回路素子16の基板10に対向する面
(図において下面)には、電気的な接点となるバンプ1
8と呼ばれる隆起が設けられている。配線12とバンプ
18は、異方性導電膜14を挟んで対向する位置にあ
る。言い換えれば、回路素子16の実装位置に基づき配
線12を設ける位置が決定されている。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention (hereinafter referred to as embodiments) will be described below with reference to the drawings. Figure 1
It is a figure for explaining a mounting method of circuit elements, such as an integrated circuit chip of this embodiment. As shown in FIG.
Wirings 12 are formed on the surface of the substrate 10 in a predetermined pattern. On the substrate 10, the thermosetting anisotropic conductive film 14 for bonding and wiring and the circuit element 16 are arranged at predetermined positions. On the surface of the circuit element 16 facing the substrate 10 (the lower surface in the figure), the bumps 1 that serve as electrical contacts are formed.
A ridge called 8 is provided. The wiring 12 and the bump 18 are at positions facing each other with the anisotropic conductive film 14 interposed therebetween. In other words, the position where the wiring 12 is provided is determined based on the mounting position of the circuit element 16.

【0011】次に、図1(b)に示すように、加圧型
の、回路素子16等に接触する部分に設けられた柔軟層
22を、回路素子16の表面に接触させる。そして、加
圧型をさらにストロークさせ、柔軟層22を図中矢印で
示すように、回路素子16や異方性導電膜14の側方へ
と回り込ませる。
Next, as shown in FIG. 1B, the flexible layer 22 provided on the portion of the pressure type that contacts the circuit element 16 or the like is brought into contact with the surface of the circuit element 16. Then, the pressure die is further stroked to cause the flexible layer 22 to wrap around the side of the circuit element 16 and the anisotropic conductive film 14 as indicated by the arrow in the figure.

【0012】図1(c)に示すように、加圧対象となる
回路素子16および異方性導電膜14を一体に、その周
囲、図においては上方および側方より加圧する、いわゆ
る等方加圧を行う。前述のように配線12およびバンプ
18は、各々が配置された面より隆起しており、加圧さ
れることによって、これらの配線12,バンプ18で挟
まれた異方性導電膜14の部分がより圧縮され、この圧
縮された部分が導電性を有するようになり、配線12と
バンプ18の間が導通状態となる。また、加圧型には、
ヒータ54,84(図2参照)が備えられ、これからの
熱により異方性導電膜14が硬化し、回路素子16が圧
着される。
As shown in FIG. 1 (c), the circuit element 16 and the anisotropic conductive film 14 to be pressed are integrally pressed around the periphery thereof, that is, from the upper side and the side in the figure, so-called isotropic loading. Apply pressure. As described above, the wiring 12 and the bump 18 are raised from the surface on which they are arranged, and when pressed, the portion of the anisotropic conductive film 14 sandwiched between the wiring 12 and the bump 18 is removed. It is further compressed, and the compressed portion becomes conductive, so that the wiring 12 and the bump 18 become conductive. In addition, the pressure type,
The heaters 54 and 84 (see FIG. 2) are provided, and the anisotropic conductive film 14 is cured by the heat from this, and the circuit element 16 is pressure-bonded.

【0013】図2は、集積回路チップの圧着を行う加圧
装置の概略構成を示す図である。本装置は、上型30、
下型32およびサイド型34によって、加圧対象となる
基板10、回路素子16等がその中に載置されるキャビ
ティ36を形成している。上型30を下型32に向けて
移動することによって、キャビティ36内の加圧対象に
圧力を付与する。すなわち、上型30と下型32とで基
板10およびそれに重ねて載置された異方性導電膜1
4、回路素子16を挟持、加圧する。
FIG. 2 is a diagram showing a schematic structure of a pressurizing device for crimping an integrated circuit chip. This device is composed of an upper mold 30,
The lower mold 32 and the side mold 34 form a cavity 36 in which the substrate 10, the circuit element 16 and the like to be pressed are placed. By moving the upper mold 30 toward the lower mold 32, pressure is applied to the object to be pressurized in the cavity 36. That is, the upper mold 30 and the lower mold 32 are used to form the substrate 10 and the anisotropic conductive film 1 placed thereon.
4. The circuit element 16 is clamped and pressed.

【0014】上型30は、図示しない流体圧ピストンに
結合される上型本体46を含み、上型本体46の先端に
は、さらに加熱板48および加圧パッド50が固定され
ている。加熱板48は、穴付きボルト52によって上型
本体46に固定されている。また、その内部には、ヒー
タ54が設けられている。ヒータ54の加熱により加熱
板48の温度が上昇し、これが加圧パッド50を介し
て、加圧対象物に伝達される。
The upper die 30 includes an upper die body 46 which is connected to a fluid pressure piston (not shown), and a heating plate 48 and a pressure pad 50 are further fixed to the tip of the upper die body 46. The heating plate 48 is fixed to the upper mold body 46 by bolts 52 with holes. Further, a heater 54 is provided inside thereof. The heating of the heater 54 raises the temperature of the heating plate 48, and this is transmitted to the object to be pressed through the pressing pad 50.

【0015】加圧パッド50は、互いに接着工程されて
いる背板56およびゴム板58を含む多層構造を有す
る。背板56には、つり下げピン62がねじ結合してお
り、つり下げピン62は、上型本体46に形成された穴
64に挿入され、側方からのボルト66により固定され
ている。背板56の側面のサイド型34に接する部分に
は、キャビティ36内を減圧するために、型どうしのシ
ールを行うためのOリング63が配置されている。ゴム
板58は、図1に示した柔軟層22に対応し、回路素子
16や異方性導電膜14を周囲より加圧することができ
るような柔軟性を有している。また、ゴム板58は、そ
の弾性により、回路素子圧着後、加圧状態から開放され
ると、図示するような平板状に戻り、次回の加圧も同様
に行うことができる。
The pressure pad 50 has a multi-layer structure including a back plate 56 and a rubber plate 58 which are bonded to each other. A suspension pin 62 is screwed to the back plate 56, and the suspension pin 62 is inserted into a hole 64 formed in the upper mold body 46 and fixed by a bolt 66 from the side. An O-ring 63 for sealing between the molds is arranged at a portion of the side surface of the back plate 56 in contact with the side mold 34 so as to reduce the pressure inside the cavity 36. The rubber plate 58 corresponds to the flexible layer 22 shown in FIG. 1 and has flexibility so that the circuit element 16 and the anisotropic conductive film 14 can be pressed from the surroundings. Further, due to its elasticity, the rubber plate 58 returns to the flat plate shape as shown when released from the pressed state after the circuit element is pressure-bonded, and the next pressing can be similarly performed.

【0016】ゴム板58は、基板10上に載置された回
路素子16の上面が基板に対して平行でない場合など、
この歪みを吸収して全体に均一な加圧を行うために機能
する。例えば、回路素子16の上面が、上型30の先端
面と平行でなかった場合、ゴム板58がなく、上型30
が剛に形成されていれば、回路素子16の最も高い部分
に大きな圧力が加わることになる。ゴム板58を設ける
ことによって、回路素子16の傾きを吸収することがで
きる。すなわち、ゴム板58は、回路素子16の傾きを
吸収できる程度に柔軟な層として機能する。したがっ
て、この柔軟な層は、要求される柔軟性を有するもので
あれば、ゴムに代えて、他の材料で構成することができ
る。本実施形態では、特に、耐熱性を考慮してシリコン
ゴムによりゴム板58を形成しているが、他の種類のゴ
ム、および前述のように他の材料を用いることも可能で
ある。
The rubber plate 58 is used when the upper surface of the circuit element 16 mounted on the substrate 10 is not parallel to the substrate.
It functions to absorb this strain and apply uniform pressure to the whole. For example, when the upper surface of the circuit element 16 is not parallel to the tip surface of the upper mold 30, the rubber plate 58 is not provided and the upper mold 30 is not provided.
Is rigidly formed, a large pressure is applied to the highest part of the circuit element 16. By providing the rubber plate 58, the inclination of the circuit element 16 can be absorbed. That is, the rubber plate 58 functions as a flexible layer that can absorb the inclination of the circuit element 16. Therefore, this flexible layer can be made of another material instead of rubber as long as it has the required flexibility. In this embodiment, in particular, the rubber plate 58 is formed of silicon rubber in consideration of heat resistance, but it is also possible to use other types of rubber and other materials as described above.

【0017】ゴム板58の背板56に接する面の縁に
は、バックアップリング68が配置される。バックアッ
プリング68は、ゴム板58の縁に形成された環状の肩
部を埋めるような形状を有する。バックアップリングの
外周面は、サイド型34の内側面に当接する。これによ
って、ゴム板58が圧力によって型どうしの隙間から漏
れ出すことを阻止している。また、ゴム板58の縁の部
分を窪ませて肩部を形成し、この肩部を埋めるようにバ
ックアップリング68を配置したことにより、圧力が加
えられたゴム板58自体が、バックアップリング68の
背後から、これをサイド型34の方向へ押しつける力を
加えるようになる。これによって、より強固にシールす
ることができる。
A backup ring 68 is arranged at the edge of the surface of the rubber plate 58 that contacts the back plate 56. The backup ring 68 has a shape that fills an annular shoulder formed on the edge of the rubber plate 58. The outer peripheral surface of the backup ring contacts the inner surface of the side mold 34. This prevents the rubber plate 58 from leaking from the gap between the molds due to pressure. Further, the edge portion of the rubber plate 58 is recessed to form a shoulder portion, and the backup ring 68 is arranged so as to fill the shoulder portion. From behind, a force is applied to push this toward the side mold 34. As a result, a stronger seal can be achieved.

【0018】サイド型34は、4個の流体圧シリンダ7
2を介して上型30につり下げ支持されている。サイド
型34は、加圧パッド50およびキャビティ36の側方
を取り囲むような環形状を有している。流体圧シリンダ
72は、加圧成形時において、サイド型34を下型32
に向けて押し、これらを密着させる。このとき、流体圧
シリンダ72は、反作用として上型30を押し上げよう
とするが、上型30を下方に押すプレス力は、流体圧シ
リンダ72の力に対して十分大きく、プレス力が実質的
に減少することはない。サイド型34の内部には、ガス
などをキャビティ36外に排出するための排気孔74が
形成されている。サイド型34の外周に沿って、環形状
のシール枠76が固定されている。このシール枠76
は、当接片79と共に、キャビティ36を含む、型によ
り略囲まれた空間を外部からシールするシール構造を形
成する。
The side mold 34 comprises four fluid pressure cylinders 7.
It is hung and supported by the upper mold 30 via 2. The side mold 34 has an annular shape that surrounds the lateral sides of the pressure pad 50 and the cavity 36. The fluid pressure cylinder 72 allows the side mold 34 to move from the side mold 34 to the lower mold 32 during pressure molding.
Push towards and stick them together. At this time, the fluid pressure cylinder 72 tries to push up the upper die 30 as a reaction, but the pressing force that pushes the upper die 30 downward is sufficiently larger than the force of the fluid pressure cylinder 72, and the pressing force is substantially the same. It never decreases. Inside the side mold 34, an exhaust hole 74 for discharging gas or the like to the outside of the cavity 36 is formed. A ring-shaped seal frame 76 is fixed along the outer periphery of the side mold 34. This seal frame 76
Together with the contact piece 79 form a seal structure for sealing the space, which includes the cavity 36 and is substantially enclosed by the mold, from the outside.

【0019】下型32は、基板10が載置される下型本
体78を有し、下型本体78はテーブル80上に固定さ
れた加熱板82上に載置される。加熱板82の内部に
は、ヒータ84が設けられており、ヒータの84の発生
する熱が、加熱板82と下型本体78を介して基板10
および異方性導電膜14に伝達される。下型本体78の
側方には、シール枠76の内側面に当接する環状の当接
片79が固定されている。
The lower die 32 has a lower die body 78 on which the substrate 10 is placed, and the lower die body 78 is placed on a heating plate 82 fixed on a table 80. A heater 84 is provided inside the heating plate 82, and the heat generated by the heater 84 is applied to the substrate 10 via the heating plate 82 and the lower die main body 78.
And transmitted to the anisotropic conductive film 14. An annular contact piece 79 that contacts the inner surface of the seal frame 76 is fixed to the side of the lower mold body 78.

【0020】下型本体78の四隅には下方に向けて脚部
86が形成されている。下型本体78と脚部86全体と
して、テーブル80の加熱板82をまたぐ形状となって
いる。脚部86には、テーブル80上に形成されたレー
ル88の上面に当接し、下型32の図2における上下位
置を規定する上下ローラ90が回動可能に支持されてい
る。さらに、脚部86には、レール88の側面に当接
し、下型32の図2における左右位置を規定する左右ロ
ーラ92が回動可能に支持されている。
Legs 86 are formed at the four corners of the lower mold body 78 so as to face downward. The lower die body 78 and the legs 86 as a whole are shaped so as to straddle the heating plate 82 of the table 80. An upper and lower roller 90 that contacts the upper surface of a rail 88 formed on the table 80 and defines the upper and lower positions of the lower die 32 in FIG. 2 is rotatably supported by the leg portion 86. Further, the leg portion 86 is rotatably supported by the left and right rollers 92 that contact the side surface of the rail 88 and define the left and right positions of the lower die 32 in FIG.

【0021】前述のように、上型30に備えられた加熱
板48からの熱はゴム板58を介して、加熱対象物に伝
達される。ゴムは、一般的にいって伝熱性が比較的悪い
材料であり、ゴム板58の部分が加熱板48からの伝熱
の障害となる可能性がある。本実施形態においては、ゴ
ム板58の材質として、より良好に伝熱を行うゴム材料
を用いている。
As described above, the heat from the heating plate 48 provided in the upper mold 30 is transferred to the object to be heated via the rubber plate 58. Rubber is generally a material having relatively poor heat conductivity, and the portion of the rubber plate 58 may interfere with heat transfer from the heating plate 48. In the present embodiment, the rubber plate 58 is made of a rubber material that conducts heat better.

【0022】図3は、一般的なゴム材料と、本装置に用
いるゴム材料の伝熱特性を比較した図である。この図
は、細い実線Aで示すように温度変化するテーブル上
に、柔軟性を有する材料として異なるゴム材料を載置
し、その上面の温度変化を示している。太い破線Bは、
一般的なゴム材料であるシリコンゴムの温度変化を示し
ている。太い実線Cは、前記のシリコンゴムに、炭素の
微細粒子または微細繊維として重量比で30%の炭素ウ
ィスカを混入したゴム材料の温度変化を、また、太い一
点鎖線Dは、炭素ウィスカの混入率を15%としたゴム
材料の温度変化を示している。混入した炭素ウィスカ
は、直径数十〜数百nm、平均約200nmで、長さと
直径の比(l/d)が約100のものである。
FIG. 3 is a diagram comparing the heat transfer characteristics of a general rubber material and a rubber material used in this apparatus. In this figure, different rubber materials as flexible materials are placed on a table whose temperature changes as indicated by a thin solid line A, and the temperature change of the upper surface thereof is shown. The thick broken line B is
It shows the temperature change of silicone rubber which is a general rubber material. The thick solid line C shows the temperature change of the rubber material obtained by mixing 30% by weight of carbon whiskers as fine particles or fine fibers of carbon into the above silicon rubber, and the thick dash-dotted line D shows the mixing ratio of carbon whiskers. The change in temperature of the rubber material is shown as 15%. The mixed carbon whiskers have a diameter of several tens to several hundreds nm, an average of about 200 nm, and a ratio of length to diameter (l / d) of about 100.

【0023】図示されるように、炭素ウィスカが混入さ
れていないシリコンゴムに対して、15%、30%の混
入率のいずれの材料も、ある温度に達する時間が半分以
下となっており、伝熱性の改善がなされていることが分
かる。よって、例えば、集積回路チップの実装におい
て、異方性導電膜の硬化に要する時間を短時間にするこ
とができ、生産性の向上が図られる。
As shown in the figure, with respect to the silicon rubber in which the carbon whiskers are not mixed, both materials having a mixing ratio of 15% and 30% have a time to reach a certain temperature less than half. It can be seen that the thermal property is improved. Therefore, for example, in mounting the integrated circuit chip, the time required for curing the anisotropic conductive film can be shortened, and the productivity can be improved.

【0024】また、回路素子の圧着過程など、加圧過程
においてより早い温度の上昇、下降を要求される場合、
柔軟性材料の熱伝導性が良いという本装置を特徴が有効
に機能する。
When a faster temperature rise or fall is required in the pressurizing process such as the pressure bonding process of the circuit element,
The feature of this device that the flexible material has good thermal conductivity works effectively.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本実施形態の集積回路チップの実装方法の説
明図である。
FIG. 1 is an explanatory diagram of a method of mounting an integrated circuit chip of this embodiment.

【図2】 集積回路チップ実装に用いる加圧装置の概略
構成を示す図である。
FIG. 2 is a diagram showing a schematic configuration of a pressure device used for mounting an integrated circuit chip.

【図3】 各種ゴム材料の伝熱特性を示す図である。FIG. 3 is a diagram showing heat transfer characteristics of various rubber materials.

【符号の説明】[Explanation of symbols]

10 基板、12 配線、14 異方性導電膜、16
回路素子、18 バンプ、22 柔軟層、30 上型、
32 下型、34 サイド型、48 加熱板、58 ゴ
ム板(柔軟層)。
10 substrate, 12 wiring, 14 anisotropic conductive film, 16
Circuit element, 18 bumps, 22 flexible layer, 30 upper mold,
32 lower mold, 34 side mold, 48 heating plate, 58 rubber plate (flexible layer).

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4E088 DA07 EA03 4E090 AA01 AB01 BA01 CA01 DA01 HA10 4J002 CP031 DA016 FA066 GM00   ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 4E088 DA07 EA03                 4E090 AA01 AB01 BA01 CA01 DA01                       HA10                 4J002 CP031 DA016 FA066 GM00

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 複数の加圧型で被加圧物を挟持、加圧
し、同時に加熱を行う加圧装置であって、 少なくとも一つの加圧型は、その被加圧物に対向する部
分に、柔軟性を有する柔軟層を含む加圧パッドを有し、 前記柔軟層は、柔軟性を有する基材に、この基材に添加
することによって当該柔軟層の熱伝導性が向上する物質
が混合されている、加圧装置。
1. A pressurizing device for sandwiching and pressurizing an object to be pressed by a plurality of pressing dies, and simultaneously heating the at least one pressing die, wherein at least one pressing die is flexible at a portion facing the object to be pressurized. A pressure-sensitive pad including a flexible layer having properties, the flexible layer is a base material having flexibility, and a substance which improves thermal conductivity of the flexible layer by being added to the base material is mixed. There is a pressure device.
【請求項2】 複数の加圧型で被加圧物を挟持、加圧
し、同時に加熱を行う加圧装置であって、 少なくとも一つの加圧型は、その被加圧物に対向する部
分に、柔軟なゴム製の柔軟層を含む加圧パッドを有し、 前記柔軟層のゴムは、微細粒子または微細繊維の炭素が
混合されている、加圧装置。
2. A pressurizing device for sandwiching and pressurizing an object to be pressed by a plurality of pressing dies, and simultaneously heating the at least one pressing die, wherein at least one of the pressing dies is flexible in a portion facing the object to be pressurized. A pressure device including a pressure pad including a flexible layer made of different rubber, wherein the rubber of the flexible layer is mixed with carbon of fine particles or fine fibers.
【請求項3】 請求項2に記載の加圧装置は、基板上に
回路素子を実装する際に、前記基板と前記回路素子の間
に挟まれて配置される接着フィルムに対し、加圧を行う
ものである、加圧装置。
3. The pressing device according to claim 2, when mounting a circuit element on a substrate, applies pressure to an adhesive film sandwiched between the substrate and the circuit element. The pressurizing device that is what you do.
【請求項4】 請求項2または3に記載の加圧装置であ
って、前記混合されている炭素は、炭素ウィスカである
加圧装置。
4. The pressurizing device according to claim 2, wherein the mixed carbon is a carbon whisker.
【請求項5】 請求項4に記載の加圧装置であって、前
記柔軟層のゴムの炭素ウィスカ含有率は、重量比で15
〜30パーセントである、加圧装置。
5. The pressure device according to claim 4, wherein the carbon whisker content of the rubber of the flexible layer is 15 by weight.
~ 30 percent, a pressure device.
【請求項6】 請求項4に記載の加圧装置において、前
記炭素ウィスカは、直径10〜1000nm、長さと直
径の比が100程度のものである、加圧装置。
6. The pressurizing device according to claim 4, wherein the carbon whiskers have a diameter of 10 to 1000 nm and a ratio of length to diameter of about 100.
JP2001276819A 2001-09-12 2001-09-12 Pressurizing device Pending JP2003088998A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2001276819A JP2003088998A (en) 2001-09-12 2001-09-12 Pressurizing device
CNB028177886A CN1319140C (en) 2001-09-12 2002-09-12 Circuit device mounitng method and press
PCT/JP2002/009342 WO2003025997A1 (en) 2001-09-12 2002-09-12 Circuit device mounitng method and press
DE60235821T DE60235821D1 (en) 2001-09-12 2002-09-12 METHOD AND PRESS FOR ASSEMBLING A CIRCUIT
EP02765504A EP1434261B1 (en) 2001-09-12 2002-09-12 Circuit device mounting method and press
US10/489,680 US20040238115A1 (en) 2001-09-12 2002-09-12 Circuit device mounting method and press
KR1020047003466A KR100889283B1 (en) 2001-09-12 2002-09-12 Circuit device mounting method and press

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001276819A JP2003088998A (en) 2001-09-12 2001-09-12 Pressurizing device

Publications (2)

Publication Number Publication Date
JP2003088998A true JP2003088998A (en) 2003-03-25
JP2003088998A5 JP2003088998A5 (en) 2008-10-30

Family

ID=19101465

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001276819A Pending JP2003088998A (en) 2001-09-12 2001-09-12 Pressurizing device

Country Status (1)

Country Link
JP (1) JP2003088998A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007000896A (en) * 2005-06-23 2007-01-11 Nikkiso Co Ltd Pressurizing device, pressurizing method, and heater unit

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08283456A (en) * 1995-04-10 1996-10-29 Otsuka Chem Co Ltd Highly heat conductive resin composition and its film
JP2000068633A (en) * 1998-08-25 2000-03-03 Seiko Epson Corp Pressure-bonding method and pressure-bonding device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08283456A (en) * 1995-04-10 1996-10-29 Otsuka Chem Co Ltd Highly heat conductive resin composition and its film
JP2000068633A (en) * 1998-08-25 2000-03-03 Seiko Epson Corp Pressure-bonding method and pressure-bonding device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007000896A (en) * 2005-06-23 2007-01-11 Nikkiso Co Ltd Pressurizing device, pressurizing method, and heater unit

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