JP2003057550A - カタディオプトリック型対物レンズ - Google Patents

カタディオプトリック型対物レンズ

Info

Publication number
JP2003057550A
JP2003057550A JP2002137791A JP2002137791A JP2003057550A JP 2003057550 A JP2003057550 A JP 2003057550A JP 2002137791 A JP2002137791 A JP 2002137791A JP 2002137791 A JP2002137791 A JP 2002137791A JP 2003057550 A JP2003057550 A JP 2003057550A
Authority
JP
Japan
Prior art keywords
objective lens
beam splitter
mount
lens according
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002137791A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003057550A5 (https=
Inventor
Michael Dr Gerhard
ゲールハルト ミヒャエル
Hans-Jochen Paul
パウル ハンス−ヨヘン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of JP2003057550A publication Critical patent/JP2003057550A/ja
Publication of JP2003057550A5 publication Critical patent/JP2003057550A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polarising Elements (AREA)
JP2002137791A 2001-04-11 2002-04-05 カタディオプトリック型対物レンズ Pending JP2003057550A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10118048.9 2001-04-11
DE10118048A DE10118048A1 (de) 2001-04-11 2001-04-11 Katadioptrisches Objektiv, insbesondere Projektionsobjektiv für die Halbleiter-Lithographie

Publications (2)

Publication Number Publication Date
JP2003057550A true JP2003057550A (ja) 2003-02-26
JP2003057550A5 JP2003057550A5 (https=) 2005-09-15

Family

ID=7681207

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002137791A Pending JP2003057550A (ja) 2001-04-11 2002-04-05 カタディオプトリック型対物レンズ

Country Status (3)

Country Link
US (1) US6836379B2 (https=)
JP (1) JP2003057550A (https=)
DE (1) DE10118048A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007516613A (ja) * 2003-12-15 2007-06-21 カール・ツアイス・エスエムテイ・アーゲー 少なくとも１つの液体レンズを備えるマイクロリソグラフィー投影対物レンズとしての対物レンズ

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1486811A1 (de) * 2003-06-13 2004-12-15 Leica Microsystems Wetzlar GmbH Mikroskop mit mindestens einem Strahlteiler und einem streulichtreduzierenden Mittel
USD665437S1 (en) * 2011-08-29 2012-08-14 Johnson Jr Richard L Secondary lens for a concentrating photovoltaic system module
DE202014010404U1 (de) 2014-08-06 2015-06-30 Jenoptik Optical Systems Gmbh Strahlungsführende optische Baueinheit mit Strahlungsfalle
CN112099191B (zh) * 2020-09-14 2022-06-07 福建福光股份有限公司 一种具有抗激光干扰能力的大靶面高清镜头
CN112255761B (zh) * 2020-10-15 2022-06-07 福建福光股份有限公司 一种具有抗杂光干扰能力的折叠型长焦距高清透雾镜头
US12092959B1 (en) * 2021-02-05 2024-09-17 Unm Rainforest Innovations Interferometric lithography grating-mask-based wafer-scale large-area nanopatterning

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5072126A (en) 1990-10-31 1991-12-10 International Business Machines Corporation Promixity alignment using polarized illumination and double conjugate projection lens
US5223956A (en) * 1992-03-30 1993-06-29 Holotek Ltd. Optical beam scanners for imaging applications
DE4417489A1 (de) 1994-05-19 1995-11-23 Zeiss Carl Fa Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
JPH103041A (ja) * 1996-06-14 1998-01-06 Nikon Corp 反射屈折縮小光学系

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007516613A (ja) * 2003-12-15 2007-06-21 カール・ツアイス・エスエムテイ・アーゲー 少なくとも１つの液体レンズを備えるマイクロリソグラフィー投影対物レンズとしての対物レンズ

Also Published As

Publication number Publication date
US6836379B2 (en) 2004-12-28
US20020196550A1 (en) 2002-12-26
DE10118048A1 (de) 2002-10-17

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