JP2003057550A5 - - Google Patents
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- Publication number
- JP2003057550A5 JP2003057550A5 JP2002137791A JP2002137791A JP2003057550A5 JP 2003057550 A5 JP2003057550 A5 JP 2003057550A5 JP 2002137791 A JP2002137791 A JP 2002137791A JP 2002137791 A JP2002137791 A JP 2002137791A JP 2003057550 A5 JP2003057550 A5 JP 2003057550A5
- Authority
- JP
- Japan
- Prior art keywords
- objective lens
- lens according
- beam splitter
- mount
- antireflection coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 claims 4
- 238000000576 coating method Methods 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 238000010521 absorption reaction Methods 0.000 claims 3
- 239000011521 glass Substances 0.000 claims 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- 239000006096 absorbing agent Substances 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 238000001459 lithography Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10118048.9 | 2001-04-11 | ||
| DE10118048A DE10118048A1 (de) | 2001-04-11 | 2001-04-11 | Katadioptrisches Objektiv, insbesondere Projektionsobjektiv für die Halbleiter-Lithographie |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003057550A JP2003057550A (ja) | 2003-02-26 |
| JP2003057550A5 true JP2003057550A5 (https=) | 2005-09-15 |
Family
ID=7681207
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002137791A Pending JP2003057550A (ja) | 2001-04-11 | 2002-04-05 | カタディオプトリック型対物レンズ |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US6836379B2 (https=) |
| JP (1) | JP2003057550A (https=) |
| DE (1) | DE10118048A1 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1486811A1 (de) * | 2003-06-13 | 2004-12-15 | Leica Microsystems Wetzlar GmbH | Mikroskop mit mindestens einem Strahlteiler und einem streulichtreduzierenden Mittel |
| EP1700163A1 (en) * | 2003-12-15 | 2006-09-13 | Carl Zeiss SMT AG | Objective as a microlithography projection objective with at least one liquid lens |
| USD665437S1 (en) * | 2011-08-29 | 2012-08-14 | Johnson Jr Richard L | Secondary lens for a concentrating photovoltaic system module |
| DE202014010404U1 (de) | 2014-08-06 | 2015-06-30 | Jenoptik Optical Systems Gmbh | Strahlungsführende optische Baueinheit mit Strahlungsfalle |
| CN112099191B (zh) * | 2020-09-14 | 2022-06-07 | 福建福光股份有限公司 | 一种具有抗激光干扰能力的大靶面高清镜头 |
| CN112255761B (zh) * | 2020-10-15 | 2022-06-07 | 福建福光股份有限公司 | 一种具有抗杂光干扰能力的折叠型长焦距高清透雾镜头 |
| US12092959B1 (en) * | 2021-02-05 | 2024-09-17 | Unm Rainforest Innovations | Interferometric lithography grating-mask-based wafer-scale large-area nanopatterning |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5072126A (en) | 1990-10-31 | 1991-12-10 | International Business Machines Corporation | Promixity alignment using polarized illumination and double conjugate projection lens |
| US5223956A (en) * | 1992-03-30 | 1993-06-29 | Holotek Ltd. | Optical beam scanners for imaging applications |
| DE4417489A1 (de) | 1994-05-19 | 1995-11-23 | Zeiss Carl Fa | Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie |
| JPH103041A (ja) * | 1996-06-14 | 1998-01-06 | Nikon Corp | 反射屈折縮小光学系 |
-
2001
- 2001-04-11 DE DE10118048A patent/DE10118048A1/de not_active Withdrawn
-
2002
- 2002-04-05 JP JP2002137791A patent/JP2003057550A/ja active Pending
- 2002-04-08 US US10/117,943 patent/US6836379B2/en not_active Expired - Fee Related
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