JP2003044146A - 特定ガスの充填濃度調節器 - Google Patents
特定ガスの充填濃度調節器Info
- Publication number
- JP2003044146A JP2003044146A JP2001231753A JP2001231753A JP2003044146A JP 2003044146 A JP2003044146 A JP 2003044146A JP 2001231753 A JP2001231753 A JP 2001231753A JP 2001231753 A JP2001231753 A JP 2001231753A JP 2003044146 A JP2003044146 A JP 2003044146A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- specific
- concentration
- filling
- unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000011049 filling Methods 0.000 title claims abstract description 69
- 239000007789 gas Substances 0.000 claims abstract description 556
- 238000000926 separation method Methods 0.000 claims abstract description 55
- 238000011084 recovery Methods 0.000 claims description 50
- 239000003085 diluting agent Substances 0.000 claims description 41
- 238000010790 dilution Methods 0.000 claims description 22
- 239000012895 dilution Substances 0.000 claims description 22
- 238000007865 diluting Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 abstract description 22
- 238000002156 mixing Methods 0.000 abstract description 4
- 238000007599 discharging Methods 0.000 abstract 1
- 229910018503 SF6 Inorganic materials 0.000 description 46
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 46
- 238000001179 sorption measurement Methods 0.000 description 31
- 239000003463 adsorbent Substances 0.000 description 27
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 24
- 229910001873 dinitrogen Inorganic materials 0.000 description 24
- 238000001816 cooling Methods 0.000 description 6
- 230000008929 regeneration Effects 0.000 description 5
- 238000011069 regeneration method Methods 0.000 description 5
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 4
- 229910021536 Zeolite Inorganic materials 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 239000002808 molecular sieve Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000010792 warming Methods 0.000 description 3
- 239000010457 zeolite Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000003610 charcoal Substances 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000009965 odorless effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 229960000909 sulfur hexafluoride Drugs 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Control Of Non-Electrical Variables (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001231753A JP2003044146A (ja) | 2001-07-31 | 2001-07-31 | 特定ガスの充填濃度調節器 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001231753A JP2003044146A (ja) | 2001-07-31 | 2001-07-31 | 特定ガスの充填濃度調節器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003044146A true JP2003044146A (ja) | 2003-02-14 |
| JP2003044146A5 JP2003044146A5 (enExample) | 2004-09-09 |
Family
ID=19063766
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001231753A Pending JP2003044146A (ja) | 2001-07-31 | 2001-07-31 | 特定ガスの充填濃度調節器 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003044146A (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009044651A1 (ja) * | 2007-10-05 | 2009-04-09 | Mitsubishi Chemical Corporation | 液化アンモニアの充填方法、窒化物結晶の製造方法、および、窒化物結晶成長用反応容器 |
| JP2009102174A (ja) * | 2007-10-05 | 2009-05-14 | Mitsubishi Chemicals Corp | 液化アンモニアの充填方法、および、窒化物結晶の製造方法 |
| JP2009102175A (ja) * | 2007-10-05 | 2009-05-14 | Mitsubishi Chemicals Corp | 液化アンモニアの充填方法、窒化物結晶の製造方法、および、窒化物結晶成長用反応容器 |
| JP2011230037A (ja) * | 2010-04-26 | 2011-11-17 | Taiyo Nippon Sanso Corp | 残存ガスの回収方法 |
| WO2025077600A1 (zh) * | 2023-10-11 | 2025-04-17 | 国网江苏省电力有限公司电力科学研究院 | 一种将设备内sf6纯气改为sf6-n2混合气的装置及方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000334247A (ja) * | 1999-03-19 | 2000-12-05 | Sanyo Electric Industries Co Ltd | Ｓｆ６ガス回収装置 |
| JP2001129344A (ja) * | 1999-08-23 | 2001-05-15 | Sanyo Electric Industries Co Ltd | Ｓｆ６ガス回収装置 |
-
2001
- 2001-07-31 JP JP2001231753A patent/JP2003044146A/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000334247A (ja) * | 1999-03-19 | 2000-12-05 | Sanyo Electric Industries Co Ltd | Ｓｆ６ガス回収装置 |
| JP2001129344A (ja) * | 1999-08-23 | 2001-05-15 | Sanyo Electric Industries Co Ltd | Ｓｆ６ガス回収装置 |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009044651A1 (ja) * | 2007-10-05 | 2009-04-09 | Mitsubishi Chemical Corporation | 液化アンモニアの充填方法、窒化物結晶の製造方法、および、窒化物結晶成長用反応容器 |
| JP2009102174A (ja) * | 2007-10-05 | 2009-05-14 | Mitsubishi Chemicals Corp | 液化アンモニアの充填方法、および、窒化物結晶の製造方法 |
| JP2009102175A (ja) * | 2007-10-05 | 2009-05-14 | Mitsubishi Chemicals Corp | 液化アンモニアの充填方法、窒化物結晶の製造方法、および、窒化物結晶成長用反応容器 |
| US8721788B2 (en) | 2007-10-05 | 2014-05-13 | Mitsubishi Chemical Corporation | Method for charging with liquefied ammonia, method for producing nitride crystal, and reactor for growth of nitride crystal |
| JP2011230037A (ja) * | 2010-04-26 | 2011-11-17 | Taiyo Nippon Sanso Corp | 残存ガスの回収方法 |
| WO2025077600A1 (zh) * | 2023-10-11 | 2025-04-17 | 国网江苏省电力有限公司电力科学研究院 | 一种将设备内sf6纯气改为sf6-n2混合气的装置及方法 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080724 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110322 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20110823 |