JP2003027034A - Adherent cover film - Google Patents

Adherent cover film

Info

Publication number
JP2003027034A
JP2003027034A JP2001217375A JP2001217375A JP2003027034A JP 2003027034 A JP2003027034 A JP 2003027034A JP 2001217375 A JP2001217375 A JP 2001217375A JP 2001217375 A JP2001217375 A JP 2001217375A JP 2003027034 A JP2003027034 A JP 2003027034A
Authority
JP
Japan
Prior art keywords
polyimide
film
adhesive
solvent
cover film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001217375A
Other languages
Japanese (ja)
Inventor
Hiroyuki Tsuji
宏之 辻
Takeshi Kikuchi
剛 菊池
Hiroyuki Furuya
浩行 古谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP2001217375A priority Critical patent/JP2003027034A/en
Publication of JP2003027034A publication Critical patent/JP2003027034A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To prepare an adherent cover film which has an excellent fine- processability and comprises a polyimide film and a polyimide-based adhesive that develop sufficient heat resistance and adhesive properties. SOLUTION: This adherent cover film has a constitution of laminating a 0.5-5 μm bonding layer on a high-modulus very thin polyimide film which has a thickness of 10 μm or less, preferably 3-7.5 μm and contains no inorganic filler, and realizes a fine-processability that has never been experienced by making the total thickness 10 μm or less. Further, by constituting the bonding layer being with a soluble thermoplastic polyimide resin, an epoxy resin and a curing agent thereof, the cover film develops excellent electric reliability, adhesive properties and heat resistance.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、微細加工が求めら
れる薄型接着性フィルムに関する。更に詳しくは、フレ
キシブル印刷回路基板、TAB(Tape Autom
ated bonding)用テープ、複合リードフレ
ーム、積層材料、電子部品等の微細加工性、耐熱性、接
着性が要求される分野で有用な接着性カバーフィルムに
関する。
TECHNICAL FIELD The present invention relates to a thin adhesive film that requires fine processing. More specifically, flexible printed circuit boards, TAB (Tape Autom)
The present invention relates to an adhesive cover film that is useful in fields requiring fine workability, heat resistance, and adhesiveness of tapes for bonded bonding, composite lead frames, laminated materials, electronic parts, and the like.

【0002】[0002]

【従来の技術】近年、電子機器の高機能化、高性能化、
小型化が進んでおり、それらに伴って用いられる電子部
品に対する小型化、軽量化が求められてきている。その
ため半導体素子パッケージ方法やそれらを実装する配線
材料または配線部品も、より高密度、高機能かつ高性能
なものが求められるようになってきた。特に、半導体パ
ッケージ、COLおよびLOCパッケージ、MCM(M
ulti Chip Module)等の高密度実装材
料や多層FPC等のプリント配線板材料に好適に用いる
ことのできる、微細加工が可能で良好な接着性を示すカ
バーフィルム材料が求められている。しかしながら、従
来これらの分野で用いられるカバーフィルム材料は接着
信頼性及び電気信頼性の面から50μm以上の厚みのも
のが用いられていた。アスペクト比が大きいと加工しに
くいことから10μm以上の厚みの厚い接着性カバーフ
ィルムは5μm以下の微細加工が求められる用途には適
していない。また、この分野においては、これまでポリ
イミドフィルムの片面もしくは両面にフェノール系およ
びエポキシ系の接着剤、アクリル系の接着剤を積層した
接着フィルムが用いられていた。接着層についても耐熱
性、電気特性等の信頼性の点からからポリイミド系接着
剤が次第に用いられるようになっている。
2. Description of the Related Art In recent years, electronic devices have become more sophisticated, have higher performance,
The miniaturization is progressing, and the miniaturization and the weight reduction of the electronic components used in association with them are demanded. Therefore, semiconductor device packaging methods and wiring materials or wiring components for mounting them have been required to have higher density, higher functionality and higher performance. In particular, semiconductor packages, COL and LOC packages, MCM (M
There is a demand for a cover film material that can be finely processed and has good adhesiveness, which can be suitably used for a high-density mounting material such as a multi-chip module) and a printed wiring board material such as a multi-layer FPC. However, conventionally, a cover film material used in these fields has a thickness of 50 μm or more from the viewpoint of adhesion reliability and electrical reliability. Since a thick aspect ratio makes it difficult to process, a thick adhesive cover film having a thickness of 10 μm or more is not suitable for applications requiring fine processing of 5 μm or less. Further, in this field, an adhesive film in which a phenolic or epoxy adhesive or an acrylic adhesive is laminated on one or both sides of a polyimide film has been used so far. Also for the adhesive layer, a polyimide adhesive is gradually used from the viewpoint of reliability such as heat resistance and electric characteristics.

【0003】ポリイミドは、種々の有機ポリマーの中で
も耐熱性に優れているため、宇宙、航空分野まで幅広く
用いられ、接着材料としても用いられている。しかし、
耐熱性の高いポリイミド系接着剤は接着するために30
0℃前後の高温と高圧力を要し、接着力もそれほど高い
とはいえない。
Since polyimide has excellent heat resistance among various organic polymers, it is widely used in the fields of space and aviation, and is also used as an adhesive material. But,
It is necessary to use a polyimide adhesive with high heat resistance for bonding.
It requires high temperature around 0 ° C and high pressure, and the adhesive strength is not so high.

【0004】[0004]

【発明が解決しようとする課題】そこで本発明者らは、
上記課題を解決し、耐熱性と接着性を保ちつつ、微細加
工が容易な接着性カバーフィルムを提供することを目的
とし、鋭意研究を行った結果、本発明を完成するに至っ
た。
Therefore, the present inventors have found that
The present invention has been completed as a result of intensive studies aimed at solving the above problems and providing an adhesive cover film that is easy to be microfabricated while maintaining heat resistance and adhesiveness.

【0005】[0005]

【課題を解決するための手段】本発明は、以下の構成を
有する新規な接着性カバーフィルムを提供するものであ
り、これにより上記目的が達成される。 1)10μm以下でありかつ平均粒径1μm以上の粉体
が100個/mm以下である薄型ポリイミドフィルム
の少なくとも片面に、溶媒可溶性熱可塑性ポリイミド,
エポキシ樹脂および硬化剤を含有する接着剤を0.5〜
5μmの厚みで積層する構成を有し、総厚みが10μm
以下である接着性カバーフィルム。 2)3〜7.5μmでありかつ平均粒径1μm以上の粉
体が100個/mm以下である薄型ポリイミドフィル
ムの少なくとも片面に、溶媒可溶性熱可塑性ポリイミ
ド,エポキシ樹脂および硬化剤からなる接着剤を0.5
〜5μmの厚みで積層する構成を有し、総厚みが10μ
m以下である接着性カバーフィルム。 3)前記溶媒可溶性熱可塑性ポリイミドのガラス転移温
度が200℃以下であり、該溶媒可溶性熱可塑性ポリイ
ミドに含まれる酸二無水物残基の50モル%以上が一般
式(1)
The present invention provides a novel adhesive cover film having the following constitution, which achieves the above object. 1) A solvent-soluble thermoplastic polyimide, on at least one surface of a thin polyimide film having a particle size of 10 μm or less and an average particle size of 1 μm or more and 100 particles / mm 2 or less,
The adhesive containing the epoxy resin and the curing agent is 0.5 to
It has a structure of stacking with a thickness of 5 μm, and the total thickness is 10 μm.
An adhesive cover film that is: 2) An adhesive composed of a solvent-soluble thermoplastic polyimide, an epoxy resin, and a curing agent on at least one surface of a thin polyimide film having a particle size of 3 to 7.5 μm and an average particle size of 1 μm or more of 100 particles / mm 2 or less. 0.5
It has a structure of stacking with a thickness of ~ 5 μm, and the total thickness is 10 μm
An adhesive cover film having a thickness of m or less. 3) The glass transition temperature of the solvent-soluble thermoplastic polyimide is 200 ° C. or lower, and 50 mol% or more of the acid dianhydride residues contained in the solvent-soluble thermoplastic polyimide is represented by the general formula (1).

【0006】[0006]

【化3】 で表されるエステル酸二無水物残基であることを特徴と
する1)または2)に記載の接着性カバーフィルム。 4)前記溶媒可溶性熱可塑性ポリイミドが、該ポリイミ
ドに含まれるジアミン残基の50モル%以上が下記一般
式(2)
[Chemical 3] The adhesive cover film according to 1) or 2), which is an ester dianhydride residue represented by: 4) In the solvent-soluble thermoplastic polyimide, 50 mol% or more of diamine residues contained in the polyimide are represented by the following general formula (2).

【0007】[0007]

【化4】 で表されるジアミン化合物の残基であることを特徴とす
る1)〜3)のいずれか一項に記載の接着性カバーフィ
ルム。
[Chemical 4] The adhesive cover film according to any one of 1) to 3), which is a residue of a diamine compound represented by.

【0008】[0008]

【発明の実施の形態】本発明の接着性カバーフィルムは
ポリイミドフィルムの少なくとも片面に、溶媒可溶性熱
可塑性ポリイミド,エポキシ樹脂および硬化剤からなる
接着剤を積層して得られる。用いるポリイミドフィルム
10μm以下であることが必要である。さらに微細加工
性は薄い方が好ましく、取り扱い性は厚い方が好ましい
ため、3〜7.5μmが好ましい。さらにポリイミドフ
ィルムは弾性率は600kg/mm以上、伸び率5%
以上のフィルムが望ましい。弾性率が低いと取り扱い性
に難があり、伸び率が低いと加工時に破断する恐れがあ
る。ポリイミドは通常無機フィラーなどの粉体を含有す
るが、本発明の接着性カバーフィルムに用いる場合、平
均粒径以上の粉体が多く存在すると、微細加工しにくく
なる傾向にあるため、粒径1μm以上の粉体が100個
/mm以下であるポリイミドフィルムを用いることが
好ましい。フィルム中に存在する粉体の個数は、透過型
顕微鏡で確認することができる。また、接着剤層は0.
5〜5μmが好ましく、接着性の面から1〜5μmがさ
らに好ましい。本発明においては、薄型ポリイミドフィ
ルムに接着剤を積層した後の総厚みを10μm以下にす
ることが重要である。それ以上であると微細加工性に劣
るものとなる。本発明の接着性カバーフィルムに用いる
接着剤は、溶媒可溶性熱可塑性ポリイミド、エポキシ樹
脂および硬化剤を含有する。該接着剤は、各接着剤構成
成分を有機溶媒に溶解させ接着剤溶液を得、離型性のフ
ィルム状にキャストした後、有機溶媒を加熱除去し離型
フィルムから剥離し、ポリイミドフィルムに貼り合わせ
ても良いし、また接着剤溶液を直接ポリイミドフィルム
に塗布し溶媒を除去し目的の接着性カバーフィルムを得
てもかまわない。接着剤溶液は、有機溶媒に溶媒可溶性
熱可塑性ポリイミド、エポキシ樹脂および硬化剤を溶解
させて得られるが、比較的低温で溶媒を乾燥除去できる
ため、環状エーテル系溶媒を含有する有機溶媒を使用す
るのが好ましい。環状エーテル系溶媒としては、テトラ
ヒドロフラン(THF)、1,4−ジオキサン、ジオキ
ソランが好ましく用いられ得る。また、複数の溶媒を混
合した混合有機溶媒を用いる場合には、極性有機溶媒と
組み合わせた方が好ましいが、環状エーテル系溶媒を3
0重量%以上、好ましくは50重量%以上含有するほう
が本発明の効果が発現しやすい。なお環状エーテル系溶
媒と組み合わせる有機極性溶媒としては、ジメチルスル
ホキシド、ジエチルスルホキシド等のスルホキシド系溶
媒、N,N−ジメチルホルムアミド、N,N−ジエチル
ホルムアミド等のホルムアミド系溶媒、N,N−ジメチ
ルアセトアミド、N,N−ジエチルアセトアミド等のア
セトアミド系溶媒が挙げられる。
BEST MODE FOR CARRYING OUT THE INVENTION The adhesive cover film of the present invention is obtained by laminating an adhesive comprising a solvent-soluble thermoplastic polyimide, an epoxy resin and a curing agent on at least one side of a polyimide film. It is necessary that the polyimide film used has a thickness of 10 μm or less. Further, it is preferable that the fine workability is thin, and the handleability is thick, so that it is preferably 3 to 7.5 μm. Further, the polyimide film has an elastic modulus of 600 kg / mm 2 or more and an elongation rate of 5%.
The above films are desirable. If the elastic modulus is low, the handleability is difficult, and if the elongation is low, the material may break during processing. Polyimide usually contains powder such as an inorganic filler, but when used in the adhesive cover film of the present invention, if a large amount of powder having an average particle size or more is present, it tends to be difficult to perform fine processing. It is preferable to use a polyimide film containing 100 or less powders / mm 2 . The number of powders present in the film can be confirmed with a transmission microscope. Further, the adhesive layer has a thickness of 0.
The thickness is preferably 5 to 5 μm, and more preferably 1 to 5 μm from the viewpoint of adhesiveness. In the present invention, it is important that the total thickness after the adhesive is laminated on the thin polyimide film is 10 μm or less. If it is more than that, the fine workability is deteriorated. The adhesive used for the adhesive cover film of the present invention contains a solvent-soluble thermoplastic polyimide, an epoxy resin and a curing agent. The adhesive is prepared by dissolving each adhesive constituent component in an organic solvent to obtain an adhesive solution, casting it into a mold-releasing film, removing the organic solvent by heating and peeling it from the mold-releasing film, and pasting it on a polyimide film. Alternatively, the adhesive solution may be directly applied to the polyimide film and the solvent may be removed to obtain the desired adhesive cover film. The adhesive solution is obtained by dissolving a solvent-soluble thermoplastic polyimide, an epoxy resin and a curing agent in an organic solvent, but since the solvent can be removed by drying at a relatively low temperature, an organic solvent containing a cyclic ether solvent is used. Is preferred. Tetrahydrofuran (THF), 1,4-dioxane and dioxolane can be preferably used as the cyclic ether solvent. When a mixed organic solvent obtained by mixing a plurality of solvents is used, it is preferable to combine it with a polar organic solvent.
The effect of the present invention is more easily exhibited when the content is 0% by weight or more, preferably 50% by weight or more. The organic polar solvent to be combined with the cyclic ether solvent includes sulfoxide solvents such as dimethyl sulfoxide and diethyl sulfoxide, formamide solvents such as N, N-dimethylformamide and N, N-diethylformamide, N, N-dimethylacetamide, An acetamide-based solvent such as N, N-diethylacetamide may be used.

【0009】本発明の溶媒可溶性ポリイミドは、溶媒ジ
オキソランに、25℃で10%以上溶解するものをい
う。
The solvent-soluble polyimide of the present invention refers to a solvent that dissolves in the solvent dioxolane at 25 ° C. by 10% or more.

【0010】これらの溶媒に、殆どの熱可塑性ポリイミ
ドは不溶もしくは難溶であるが、本発明の可溶性熱可塑
性ポリイミドは分子中に含まれる酸二無水物残基の50
モル%以上が一般式(1)
Most of the thermoplastic polyimides are insoluble or sparingly soluble in these solvents, but the soluble thermoplastic polyimide of the present invention contains 50 or more acid dianhydride residues contained in the molecule.
More than mol% is general formula (1)

【0011】[0011]

【化5】 で表されるエステル酸二無水物残基であることを特徴と
しているためこれらの有機溶媒にも溶解可能である。一
般式(1)で表される酸二無水物の好ましい例として
は、2,2−ビス(4−ヒドロキシフェニル)プロパン
ジベンゾエート−3,3’,4,4’−テトラカルボン
酸二無水物、p−フェニレンビス(トリメリット酸モノ
エステル無水物)、4,4’−ビフェニレンビス(トリ
メリット酸モノエステル無水物)、1,4−ナフタレン
ビス(トリメリット酸モノエステル無水物)、1,2−
エチレンビス(トリメリット酸モノエステル無水物)、
1,3−トリメチレンビス(トリメリット酸モノエステ
ル無水物)、1,4−テトラメチレンビス(トリメリッ
ト酸モノエステル無水物)、1,5−ペンタメチレンビ
ス(トリメリット酸モノエステル無水物)、1,6−ヘ
キサメチレンビス(トリメリット酸モノエステル無水
物)等が挙げられるが、式(3)
[Chemical 5] Since it is characterized by being an ester dianhydride residue represented by, it can be dissolved in these organic solvents. Preferred examples of the acid dianhydride represented by the general formula (1) include 2,2-bis (4-hydroxyphenyl) propanedibenzoate-3,3 ′, 4,4′-tetracarboxylic dianhydride. , P-phenylene bis (trimellitic acid monoester anhydride), 4,4'-biphenylene bis (trimellitic acid monoester anhydride), 1,4-naphthalene bis (trimellitic acid monoester anhydride), 1, 2-
Ethylene bis (trimellitic acid monoester anhydride),
1,3-trimethylene bis (trimellitic acid monoester anhydride), 1,4-tetramethylene bis (trimellitic acid monoester anhydride), 1,5-pentamethylene bis (trimellitic acid monoester anhydride) , 1,6-hexamethylene bis (trimellitic acid monoester anhydride) and the like are represented by the formula (3)

【0012】[0012]

【化6】 で表される2,2−ビス(4−ヒドロキシフェニル)プ
ロパンジベンゾエート−3,3’,4,4’−テトラカ
ルボン酸二無水物は特に好ましい。
[Chemical 6] 2,2-bis (4-hydroxyphenyl) propanedibenzoate-3,3 ′, 4,4′-tetracarboxylic dianhydride represented by is particularly preferable.

【0013】また、上記の酸二無水物と反応させるジア
ミン成分としては下記一般式(2)
The diamine component to be reacted with the acid dianhydride is represented by the following general formula (2)

【0014】[0014]

【化7】 で表されるジアミン化合物、特にビス(アミノフェノキ
シフェニル)スルフォンが好ましい。なお、一般式
(2)において、複数個のYは各繰り返し単位間で同一
であっても異なっていても良く、各ベンゼン環の水素は
当業者の考え得る範囲内で種々の置換基で適宜置換され
得る。例えば、メチル基、エチル基等の炭化水素基やB
r、Cl等のハロゲン基を挙げることができるが、これ
らの置換基に限定されない。さらに、一般式(2)で表
されるジアミン化合物中、メタ位にアミノ基を有するジ
アミン化合物は、それを用いた熱可塑性ポリイミドの有
機溶媒への溶解性が良好なため加工性に優れた接着剤溶
液が得られて好ましい。なお、一般式(2)で表される
ジアミン化合物は、2種以上を混合して用いても良い。
[Chemical 7] A diamine compound represented by, and particularly bis (aminophenoxyphenyl) sulfone is preferable. In the general formula (2), a plurality of Y's may be the same or different in each repeating unit, and the hydrogen of each benzene ring is appropriately substituted with various substituents within the range conceivable to those skilled in the art. Can be replaced. For example, a hydrocarbon group such as a methyl group or an ethyl group, or B
Examples thereof include halogen groups such as r and Cl, but are not limited to these substituents. Further, in the diamine compound represented by the general formula (2), the diamine compound having an amino group at the meta position has excellent solubility in the organic solvent of the thermoplastic polyimide using the same, and thus has excellent processability. A drug solution is obtained, which is preferable. The diamine compound represented by the general formula (2) may be used as a mixture of two or more kinds.

【0015】本発明のポリイミド系接着剤溶液に溶解す
る熱可塑性ポリイミドは、その前駆体であるポリアミド
酸重合体を脱水閉環して得られる。このポリアミド酸溶
液は、前記した酸二無水物と前記したジアミン化合物と
が実質的に等モルになるように使用し、有機極性溶媒中
で重合して得られる。
The thermoplastic polyimide which is soluble in the polyimide adhesive solution of the present invention is obtained by dehydrating and ring-closing a polyamic acid polymer which is a precursor thereof. This polyamic acid solution is obtained by using the above-mentioned acid dianhydride and the above-mentioned diamine compound in substantially equimolar amounts and polymerizing them in an organic polar solvent.

【0016】このポリアミド酸またはポリイミドは、ま
ず、アルゴン、窒素などの不活性雰囲気中において、ジ
アミン化合物および酸二無水物を有機極性溶媒中に溶解
または拡散させて得られるポリアミド酸重合体より得ら
れる。
This polyamic acid or polyimide is obtained from a polyamic acid polymer obtained by dissolving or diffusing a diamine compound and an acid dianhydride in an organic polar solvent in an inert atmosphere such as argon or nitrogen. .

【0017】各成分の添加順序は特に限定されず、酸二
無水物を有機極性溶媒中に先に加えておき、ジアミン化
合物を添加し、ポリアミド酸重合体の溶液としても良い
し、ジアミン化合物の一部を有機極性溶媒中に先に適量
加えて、次に酸二無水物を加え、最後に残りのジアミン
化合物を加えて、ポリアミド酸重合体の溶液としても良
い。この他にも、当業者に公知の様々な重合方法があ
る。
The order of adding each component is not particularly limited, and the acid dianhydride may be added to the organic polar solvent first, and the diamine compound may be added to form a solution of the polyamic acid polymer. It is also possible to first add a suitable amount to an organic polar solvent first, then add the acid dianhydride, and finally add the remaining diamine compound to form a solution of the polyamic acid polymer. There are various other polymerization methods known to those skilled in the art.

【0018】ポリアミド酸溶液の生成反応に用いられる
有機極性溶媒としては、例えば、ジメチルスルホキシ
ド、ジエチルスルホキシド等のスルホキシド系溶媒、
N,N−ジメチルホルムアミド、N,N−ジエチルホル
ムアミド等のホルムアミド系溶媒、N,N−ジメチルア
セトアミド、N,N−ジエチルアセトアミド等のアセト
アミド系溶媒、N−メチル−2−ピロリドン等のピロリ
ドン系溶媒、フェノール、o−,m−またはp−クレゾ
ール、キシノール、ハロゲン化フェノール、カテコール
等のフェノール系溶媒、あるいはヘキサメチルホスホル
アミド、γ−ブチロラクトン等を挙げることができる。
更に必要に応じて、これらの有機極性溶媒とキシレンあ
るいはトルエン等の芳香族炭化水素とを組み合わせて用
いることもできる。
Examples of the organic polar solvent used in the reaction for producing the polyamic acid solution include sulfoxide-based solvents such as dimethyl sulfoxide and diethyl sulfoxide,
Formamide solvents such as N, N-dimethylformamide and N, N-diethylformamide, acetamide solvents such as N, N-dimethylacetamide and N, N-diethylacetamide, pyrrolidone solvents such as N-methyl-2-pyrrolidone , Phenol, o-, m- or p-cresol, xynol, halogenated phenols, phenolic solvents such as catechol, hexamethylphosphoramide, γ-butyrolactone and the like.
Furthermore, if necessary, these organic polar solvents may be used in combination with an aromatic hydrocarbon such as xylene or toluene.

【0019】上記で得られたポリアミド酸重合体を、熱
的または化学的方法により、脱水閉環し、熱可塑性ポリ
イミドを得る。イミド化の方法としては、ポリアミド酸
溶液を加熱処理して脱水する熱的方法、脱水剤を用いて
脱水する化学的方法のいずれも用いられる。化学的方法
による脱水剤としては、例えば、無水酢酸等の脂肪族酸
無水物、および芳香族酸無水物が挙げられる。また、触
媒としては、トリエチルアミン等の脂肪族第3級アミン
類、ジメチルアニリン等の芳香族第3級アミン類、ピリ
ジン、イソキノリン等の複素環第3級アミン類等が挙げ
られる。上記のようにして得られた熱可塑性ポリイミド
はそのまま溶液としてエポキシ樹脂及び硬化剤を配合
し、本発明の接着性カバーフィルムの接着層として用い
ることができる。あるいはポリアミド酸の重合に用い
た、溶媒を良く溶かすが、ポリイミドが溶解しにくい貧
溶媒中に、ポリイミド溶液を投入して、ポリイミド樹脂
を析出させて未反応モノマーを取り除いて精製し、乾燥
させ固形のポリイミド樹脂としてから、再度有機溶媒に
溶解し、エポキシ樹脂及び硬化剤を配合し本発明の接着
性カバーフィルムの接着層に用いることもできる。用い
る貧溶媒としては、アセトン、メタノール、エタノー
ル、イソプロパノール、ベンゼン、メチルセロソルブ、
メチルエチルケトン等が挙げられる。
The polyamic acid polymer obtained above is dehydrated and ring-closed by a thermal or chemical method to obtain a thermoplastic polyimide. As the imidization method, both a thermal method of heat-treating a polyamic acid solution for dehydration and a chemical method of dehydrating with a dehydrating agent are used. Examples of the dehydrating agent by a chemical method include aliphatic acid anhydrides such as acetic anhydride, and aromatic acid anhydrides. Examples of the catalyst include aliphatic tertiary amines such as triethylamine, aromatic tertiary amines such as dimethylaniline, and heterocyclic tertiary amines such as pyridine and isoquinoline. The thermoplastic polyimide obtained as described above can be used as it is as a solution containing an epoxy resin and a curing agent and used as an adhesive layer of the adhesive cover film of the present invention. Or used in the polymerization of polyamic acid, which dissolves the solvent well, but in a poor solvent in which the polyimide is difficult to dissolve, the polyimide solution is added, the polyimide resin is precipitated to remove unreacted monomers, and purified, and dried to obtain a solid. It is also possible to dissolve it in an organic solvent again, mix it with an epoxy resin and a curing agent, and use it as an adhesive layer of the adhesive cover film of the present invention. As the poor solvent used, acetone, methanol, ethanol, isopropanol, benzene, methyl cellosolve,
Methyl ethyl ketone and the like can be mentioned.

【0020】熱的方法としては、例えば、ポリアミド酸
を重合した後に真空オーブン中に投入し、減圧下で加熱
することによってイミド化を行い、固形のポリイミド樹
脂として取り出す手法が挙げられる。
As a thermal method, for example, a method of polymerizing a polyamic acid, then placing it in a vacuum oven, heating it under reduced pressure to imidize, and taking out as a solid polyimide resin can be mentioned.

【0021】本発明の接着剤に用いるエポキシ樹脂は特
に限定はなく、エピコート828(油化シェル社製)等
のビスフェノールA型樹脂、180S65(油化シェル
社製)等のオルソクレゾールノボラック樹脂、157S
70(油化シェル社製)等のビスフェノールAノボラッ
ク樹脂、1032H60(油化シェル社製)等のトリス
ヒドロキシフェニルメタンノボラック樹脂、ESN37
5等のナフタレンアラルキルノボラック樹脂、テトラフ
ェニロールエタン1031S(油化シェル社製)、YG
D414S(東都化成)、トリスヒドロキシフェニルメ
タンEPPN502H(日本化薬)、特殊ビスフェノー
ルVG3101L(三井化学)、特殊ナフトールNC7
000(日本化薬)、ビフェニル型エポキシNC300
0(日本化薬)、TETRAD−X,TETRAD−C
(三菱瓦斯化学社製)等のグリシジルアミン型樹脂など
が代表例として挙げられる。
The epoxy resin used in the adhesive of the present invention is not particularly limited, and bisphenol A type resin such as Epicoat 828 (manufactured by Yuka Shell Co.), orthocresol novolak resin such as 180S65 (manufactured by Yuka Shell Co., Ltd.), 157S.
70 (manufactured by Yuka Shell Co., Ltd.) and other bisphenol A novolac resins, 1032H60 (manufactured by Yuka Shell Co., Ltd.) and other trishydroxyphenylmethane novolac resins, ESN37
5, naphthalene aralkyl novolac resin, tetraphenylolethane 1031S (made by Yuka Shell Co., Ltd.), YG
D414S (Tohto Kasei), Trishydroxyphenylmethane EPPN502H (Nippon Kayaku), special bisphenol VG3101L (Mitsui Chemicals), special naphthol NC7
000 (Nippon Kayaku), biphenyl type epoxy NC300
0 (Nippon Kayaku), TETRAD-X, TETRAD-C
Typical examples are glycidyl amine type resins such as those manufactured by Mitsubishi Gas Chemical Co., Inc.

【0022】エポキシ樹脂の混合割合は、熱可塑性ポリ
イミド100重量部に対して、1〜50重量部、好まし
くは5〜40重量部が望ましい。少なすぎると接着強度
が低く、多すぎると可撓性、耐熱性に劣ることがある。
The mixing ratio of the epoxy resin is 1 to 50 parts by weight, preferably 5 to 40 parts by weight, based on 100 parts by weight of the thermoplastic polyimide. If it is too small, the adhesive strength will be low, and if it is too large, the flexibility and heat resistance will be poor.

【0023】硬化剤は、一般にエポキシ樹脂用の硬化剤
として用いられているものであれば何でも良い。硬化剤
は、吸水性、耐熱性、接着性等の向上のために接着剤に
加えられ、代表的には酸二無水物系、アミン系、イミダ
ゾール系等のエポキシ用の一般的な硬化剤、促進剤、あ
るいは種々のカップリング剤が挙げられる。
The curing agent may be any one generally used as a curing agent for epoxy resins. The curing agent is added to the adhesive to improve water absorption, heat resistance, adhesiveness, etc., and is typically a general curing agent for epoxy such as acid dianhydride type, amine type, and imidazole type, Examples include accelerators and various coupling agents.

【0024】以上、本発明の接着性カバーフィルムに用
いる接着剤の各組成についての説明をしたが、接着層を
形成する際の接着剤溶液の濃度は溶液重量を分母とする
固形分(熱可塑性ポリイミド+エポキシ樹脂+硬化剤)
量で5〜50重量%、好ましくは10〜40重量%、特
に好ましくは15〜30重量%である。また、溶解の手
順等は作業性等を考慮し適宜決めればよい。
The composition of the adhesive used in the adhesive cover film of the present invention has been described above. The concentration of the adhesive solution when forming the adhesive layer is determined by the solid content (thermoplasticity) with the solution weight as the denominator. (Polyimide + epoxy resin + curing agent)
The amount is 5 to 50% by weight, preferably 10 to 40% by weight, particularly preferably 15 to 30% by weight. Further, the dissolution procedure and the like may be appropriately determined in consideration of workability and the like.

【0025】上記のようにして得られる本発明にかかる
接着性カバーフィルムは、TAB用テープ、複合リード
フレーム、積層材料等に好適に用いられ得る特性を有す
る。具体的には、薄い構成であるため微細加工性に優
れ、耐熱性、接着性ともに優れており、200℃以下の
低温で接着しうる等、使用に際し加工性に優れる。この
場合の接着条件の一例を挙げると、加熱温度150℃〜
200℃、圧力0.1〜10MPaで加熱時間5〜20
分程度の条件である。
The adhesive cover film according to the present invention obtained as described above has characteristics that it can be suitably used for TAB tapes, composite lead frames, laminated materials and the like. Specifically, since it has a thin structure, it has excellent fine workability, heat resistance and adhesiveness, and can be bonded at a low temperature of 200 ° C. or less. An example of the bonding conditions in this case is a heating temperature of 150 ° C.
200 ° C., pressure 0.1 to 10 MPa, heating time 5 to 20
The condition is about a minute.

【0026】[0026]

【実施例】◎ベースポリイミドフィルムの作製 (1)無機フィラーを含まないポリイミドフィルム 反応器にジメチルホルムアミド(以下DMFという)を
とり、ODA4.5当量、p−PDA5.5当量とりO
DA,p−PDAが完全に溶解するまで攪拌した。次に
TMHQを4.5当量加え、その後30分間攪拌した。
続いてPMDA5当量加え、120分間攪拌した。そし
てPMDA0.5当量をDMFに溶かした溶液を徐々に
加え60分間冷却攪拌しポリアミド酸のDMF溶液を得
た。尚,DMF使用量は、ジアミン成分と酸二無水物成
分とを合わせた総重量がポリアミド酸有機溶媒溶液重量
の15重量%となるように調整した。次にポリアミド酸
有機溶媒溶液をDMF、無水酢酸,イソキノリンとを混
合しダイより押し出しエンドレスベルト上にキャストし
た。エンドレスベルト上にて揮発性成分が焼成後フィル
ム重量に対し50%になるまで加熱乾燥し、この自己支
持性を有するグリーンシートをエンドレスベルト上から
引き剥がし、続いてシートの両端を連続的に搬送するピ
ンシートに固定し200、400,510℃の加熱炉に
搬送し加熱した。更に、徐冷炉にて室温まで徐々に冷却
した。徐伶炉から搬出したところでピンからフィルムを
引き剥がした。尚、フィルムの厚みが7.5ミクロンに
なるようにした。 (2)無機フィラーを含むポリイミドフィルム (1)と同様にポリアミド酸のDMF溶液を得た。尚,D
MF使用量は、ジアミン成分と酸二無水物成分とを合わ
せた総重量がポリアミド酸有機溶媒溶液重量の15重量
%となるように調整した。次にポリアミド酸有機溶媒溶
液をDMF、AA,IQ、リン酸カルシウム(無機フィ
ラー)とを混合しダイより押し出しエンドレスベルト上
にキャストした。エンドレスベルト上にて揮発性成分が
焼成後フィルム重量に対し50%になるまで加熱乾燥
し、この自己支持性を有するグリーンシートをエンドレ
スベルト上から引き剥がし、続いてシートの両端を連続
的に搬送するピンシートに固定し200、400,51
0℃の加熱炉に搬送し加熱した。更に、徐冷炉にて室温
まで徐々に冷却した。徐伶炉から搬出したところでピン
からフィルムを引き剥がした。尚、フィルムの厚みが
7.5ミクロンになるようにした。得られたフィルムを
透過型顕微鏡で評価したところ、1〜10μの大きさの
粉体が300以上存在した。
Example Preparation of Base Polyimide Film (1) Dimethylformamide (hereinafter referred to as DMF) was placed in a polyimide film reactor containing no inorganic filler, and ODA was 4.5 equivalents and p-PDA was 5.5 equivalents.
The mixture was stirred until DA and p-PDA were completely dissolved. Next, 4.5 equivalents of TMHQ was added and then stirred for 30 minutes.
Then, 5 equivalents of PMDA was added and stirred for 120 minutes. Then, a solution prepared by dissolving 0.5 equivalent of PMDA in DMF was gradually added, and the mixture was cooled and stirred for 60 minutes to obtain a DMF solution of polyamic acid. The amount of DMF used was adjusted so that the total weight of the diamine component and the acid dianhydride component was 15% by weight of the weight of the polyamic acid organic solvent solution. Next, the polyamic acid organic solvent solution was mixed with DMF, acetic anhydride and isoquinoline, extruded from a die and cast on an endless belt. After baking, the volatile components are heated and dried on the endless belt until the weight of the film becomes 50%, the green sheet with self-supporting property is peeled off from the endless belt, and then both ends of the sheet are continuously conveyed. It was fixed to a pin sheet to be heated and conveyed to a heating furnace of 200, 400, 510 ° C. and heated. Further, it was gradually cooled to room temperature in an annealing furnace. The film was peeled off from the pin when it was taken out from the Xu furnace. The thickness of the film was 7.5 μm. (2) A DMF solution of polyamic acid was obtained in the same manner as the polyimide film (1) containing an inorganic filler. Incidentally, D
The amount of MF used was adjusted such that the total weight of the diamine component and the acid dianhydride component combined was 15% by weight of the weight of the polyamic acid organic solvent solution. Next, the polyamic acid organic solvent solution was mixed with DMF, AA, IQ and calcium phosphate (inorganic filler), extruded from a die and cast on an endless belt. After baking, the volatile components on the endless belt are heated and dried to 50% of the weight of the film, the self-supporting green sheet is peeled off from the endless belt, and then both ends of the sheet are continuously conveyed. 200, 400, 51
It was transferred to a heating furnace at 0 ° C. and heated. Further, it was gradually cooled to room temperature in an annealing furnace. The film was peeled off from the pin when it was taken out from the Xu furnace. The thickness of the film was 7.5 μm. When the obtained film was evaluated by a transmission microscope, 300 or more powders having a size of 1 to 10 μ were present.

【0027】(実施例1) 容量1000mlのガラス
製フラスコにジメチルホルムアミド(以下、DMFとい
う)263gに3,3’−ビス(アミノフェノキシフェ
ニル)スルフォン(以下、BAPS−Mという)0.1
12molを加え、窒素雰囲気下で攪拌しながら、2,
2−ビス(4−ヒドロキシフェニル)プロパンジベンゾ
エート−3,3’,4,4’−テトラカルボン酸二無水
物(以下、ESDAという)0.112molを徐々に
添加した。氷浴下で30分間攪拌し、粘度が1500p
oiseに達したところで攪拌をやめ、ポリアミド酸溶
液を得た。
Example 1 In a glass flask having a capacity of 1000 ml, 263 g of dimethylformamide (hereinafter referred to as DMF) and 0.13 of 3,3′-bis (aminophenoxyphenyl) sulfone (hereinafter referred to as BAPS-M) were added.
Add 12 mol and stir in a nitrogen atmosphere while stirring 2.
0.112 mol of 2-bis (4-hydroxyphenyl) propanedibenzoate-3,3 ', 4,4'-tetracarboxylic dianhydride (hereinafter referred to as ESDA) was gradually added. Stir in an ice bath for 30 minutes and the viscosity becomes 1500p
When reaching the oise, the stirring was stopped to obtain a polyamic acid solution.

【0028】このポリアミド酸溶液にDMF113g、
β−ピコリン26g、無水酢酸45gを加え30分間撹
拌した後、さらに100℃下で1時間撹拌し、イミド化
させた。その後、高速で撹拌したメタノール中にこの溶
液を少しづつ垂らした。メタノール中に析出した糸状の
ポリイミドをミキサーで粉砕し、メタノールでソックス
レー洗浄を行い、110℃で2時間乾燥させ、ポリイミ
ド粉末を得た。上記で得たポリイミド粉末を20g、エ
ピコート1032H60(油化シェル社製)を5g、
4,4’−ジアミノジフェニルスルフォン(硬化剤)
1.5gを102gのTHFに添加し、攪拌を行って溶
解させ、ポリイミド系接着剤溶液を得た(固形分濃度:
SC=20%)。
113 g of DMF was added to this polyamic acid solution,
After adding 26 g of β-picoline and 45 g of acetic anhydride and stirring for 30 minutes, the mixture was further stirred at 100 ° C. for 1 hour for imidization. Then, this solution was dripped little by little in the methanol stirred at high speed. The filamentous polyimide precipitated in methanol was crushed with a mixer, washed with Soxhlet in methanol, and dried at 110 ° C. for 2 hours to obtain a polyimide powder. 20 g of the polyimide powder obtained above, 5 g of Epicoat 1032H60 (produced by Yuka Shell Co., Ltd.),
4,4'-diaminodiphenyl sulfone (curing agent)
1.5 g was added to 102 g of THF, and the mixture was stirred and dissolved to obtain a polyimide-based adhesive solution (solid content concentration:
SC = 20%).

【0029】得られたポリイミド系接着剤溶液を7.5
μm厚のポリイミドフィルム(無機フィラーなし)上に
流延し、100℃で10分間乾燥後、150℃で10分
間乾燥し、厚み10μmのフィルム状積層部材を得た。
The resulting polyimide adhesive solution was added to 7.5
It was cast on a polyimide film (without inorganic filler) having a thickness of μm, dried at 100 ° C. for 10 minutes, and then dried at 150 ° C. for 10 minutes to obtain a film-like laminated member having a thickness of 10 μm.

【0030】(実施例2) 酸成分をTMEGにする以
外は実施例1と同様に可溶性熱可塑性ポリイミドを得
た。上記で得たポリイミド粉末を20g、エピコート1
032H60(油化シェル社製)を5g、4,4’−ジ
アミノジフェニルスルフォン(硬化剤)1.5gを10
2gのTHFに添加し、攪拌を行って溶解させ、ポリイ
ミド系接着剤溶液を得た(固形分濃度:SC=20
%)。
Example 2 A soluble thermoplastic polyimide was obtained in the same manner as in Example 1 except that TMEG was used as the acid component. 20 g of the polyimide powder obtained above, Epicoat 1
5 g of 032H60 (produced by Yuka Shell Co., Ltd.) and 10 g of 1.5 g of 4,4′-diaminodiphenyl sulfone (curing agent)
It was added to 2 g of THF and dissolved by stirring to obtain a polyimide-based adhesive solution (solid content concentration: SC = 20.
%).

【0031】得られたポリイミド系接着剤溶液を7.5
μm厚のポリイミドフィルム(無機フィラーなし)上に
流延し、100℃で10分間乾燥後、150℃で10分
間乾燥し、厚み10μmのフィルム状積層部材を得た。
The obtained polyimide adhesive solution was added to 7.5
It was cast on a polyimide film (without inorganic filler) having a thickness of μm, dried at 100 ° C. for 10 minutes, and then dried at 150 ° C. for 10 minutes to obtain a film-like laminated member having a thickness of 10 μm.

【0032】(実施例3) アミン成分をAPBにする
以外は実施例1と同様に可溶性熱可塑性ポリイミドを得
た。上記で得たポリイミド粉末を20g、エピコート1
032H60(油化シェル社製)を5g、4,4’−ジ
アミノジフェニルスルフォン(硬化剤)1.5gを10
2gのTHFに添加し、攪拌を行って溶解させ、ポリイ
ミド系接着剤溶液を得た(固形分濃度:SC=20
%)。得られたポリイミド系接着剤溶液を7.5μm厚
のポリイミドフィルム(無機フィラーなし)上に流延
し、100℃で10分間乾燥後、150℃で10分間乾
燥し、厚み10μmのフィルム状積層部材を得た。 (実施例4)酸成分をTMEG、アミン成分をAPBに
する以外は実施例1と同様に可溶性熱可塑性ポリイミド
を得た。上記で得たポリイミド粉末を20g、エピコー
ト1032H60(油化シェル社製)を5g、4,4’
−ジアミノジフェニルスルフォン(硬化剤)1.5gを
102gのTHFに添加し、攪拌を行って溶解させ、ポ
リイミド系接着剤溶液を得た(固形分濃度:SC=20
%)。
(Example 3) A soluble thermoplastic polyimide was obtained in the same manner as in Example 1 except that APB was used as the amine component. 20 g of the polyimide powder obtained above, Epicoat 1
5 g of 032H60 (produced by Yuka Shell Co., Ltd.) and 10 g of 1.5 g of 4,4′-diaminodiphenyl sulfone (curing agent)
It was added to 2 g of THF and dissolved by stirring to obtain a polyimide-based adhesive solution (solid content concentration: SC = 20.
%). The resulting polyimide-based adhesive solution was cast on a polyimide film (without inorganic filler) having a thickness of 7.5 μm, dried at 100 ° C. for 10 minutes, and then dried at 150 ° C. for 10 minutes to obtain a film-like laminated member having a thickness of 10 μm. Got (Example 4) A soluble thermoplastic polyimide was obtained in the same manner as in Example 1 except that TMEG was used as the acid component and APB was used as the amine component. 20 g of the polyimide powder obtained above, 5 g of Epicoat 1032H60 (produced by Yuka Shell Co., Ltd.), 4,4 ′
-1.5 g of diaminodiphenyl sulfone (curing agent) was added to 102 g of THF and dissolved by stirring to obtain a polyimide adhesive solution (solid content concentration: SC = 20.
%).

【0033】得られたポリイミド系接着剤溶液を7.5
μm厚のポリイミドフィルム(無機フィラーなし)上に
流延し、100℃で10分間乾燥後、150℃で10分
間乾燥し、厚み10μmのフィルム状積層部材を得た。 (実施例5)実施例1で得られたポリイミド粉末を20
g、TETRAD−C(三菱瓦斯化学社製)を5g、
4,4’−ジアミノジフェニルスルフォン(硬化剤)
1.5gを102gのTHFに添加し、攪拌を行って溶
解させ、ポリイミド系接着剤溶液を得た(固形分濃度:
SC=20%)。
The obtained polyimide adhesive solution was added to 7.5
It was cast on a polyimide film (without inorganic filler) having a thickness of μm, dried at 100 ° C. for 10 minutes, and then dried at 150 ° C. for 10 minutes to obtain a film-like laminated member having a thickness of 10 μm. (Example 5) The polyimide powder obtained in Example 1 was used as 20
g, TETRAD-C (manufactured by Mitsubishi Gas Chemical Co., Inc.) 5 g,
4,4'-diaminodiphenyl sulfone (curing agent)
1.5 g was added to 102 g of THF, and the mixture was stirred and dissolved to obtain a polyimide-based adhesive solution (solid content concentration:
SC = 20%).

【0034】得られたポリイミド系接着剤溶液を7.5
μm厚のポリイミドフィルム(無機フィラーなし)上に
流延し、100℃で10分間乾燥後、150℃で10分
間乾燥し、厚み10μmのフィルム状積層部材を得た。
The obtained polyimide adhesive solution was added to 7.5
It was cast on a polyimide film (without inorganic filler) having a thickness of μm, dried at 100 ° C. for 10 minutes, and then dried at 150 ° C. for 10 minutes to obtain a film-like laminated member having a thickness of 10 μm.

【0035】(比較例1) 実施例1で得られたポリイ
ミド系接着剤溶液を25μm厚のポリイミドフィルム
(アピカル25AH、鐘淵化学工業社製)上に乾燥後1
5μmになるように流延し、100℃で10分間乾燥
後、150℃で10分間乾燥し、厚み0μmのフィルム
状積層部材を得た。
Comparative Example 1 The polyimide-based adhesive solution obtained in Example 1 was dried on a 25 μm-thick polyimide film (Apical 25AH, manufactured by Kanegafuchi Chemical Industry Co., Ltd.) and then dried.
It was cast to have a thickness of 5 μm, dried at 100 ° C. for 10 minutes and then dried at 150 ° C. for 10 minutes to obtain a film-like laminated member having a thickness of 0 μm.

【0036】(比較例2) 容量1000mlのガラス
製フラスコにジメチルホルムアミド(以下、DMFとい
う)263gに3,3’−ビス(アミノフェノキシフェ
ニル)スルフォン(以下、BAPS−Mという)0.1
12molを加え、窒素雰囲気下で攪拌しながら、ビフ
ェニルテトラカルボン酸二無水物(以下、BPDAとい
う)0.112molを徐々に添加した。氷浴下で30
分間攪拌し、粘度が1500poiseに達したところ
で攪拌をやめ、ポリアミド酸溶液を得た。
Comparative Example 2 3,3′-bis (aminophenoxyphenyl) sulfone (hereinafter, referred to as BAPS-M) was added to 263 g of dimethylformamide (hereinafter, referred to as DMF) in a glass flask having a capacity of 1,000 ml.
12 mol was added, and 0.112 mol of biphenyltetracarboxylic dianhydride (hereinafter referred to as BPDA) was gradually added with stirring under a nitrogen atmosphere. 30 in an ice bath
After stirring for 1 minute, the stirring was stopped when the viscosity reached 1500 poise to obtain a polyamic acid solution.

【0037】このポリアミド酸溶液にDMF113g、
β−ピコリン26g、無水酢酸45gを加え30分間撹
拌した後、さらに100℃下で1時間撹拌し、イミド化
させた。その後、高速で撹拌したメタノール中にこの溶
液を少しづつ垂らした。メタノール中に析出した糸状の
ポリイミドをミキサーで粉砕し、メタノールでソックス
レー洗浄を行い、110℃で2時間乾燥させ、ポリイミ
ド粉末を得た。上記で得たポリイミド粉末はTHFに溶
解させることができなかった。(固形分濃度:SC=2
0%)。
In this polyamic acid solution, 113 g of DMF,
After adding 26 g of β-picoline and 45 g of acetic anhydride and stirring for 30 minutes, the mixture was further stirred at 100 ° C. for 1 hour for imidization. Then, this solution was dripped little by little in the methanol stirred at high speed. The filamentous polyimide precipitated in methanol was crushed with a mixer, washed with Soxhlet in methanol, and dried at 110 ° C. for 2 hours to obtain a polyimide powder. The polyimide powder obtained above could not be dissolved in THF. (Solid content concentration: SC = 2
0%).

【0038】(比較例3)容量1000mlのガラス製
フラスコにジメチルホルムアミド(以下、DMFとい
う)263gにオキシジアニリン(以下、ODAとい
う)0.112molを加え、窒素雰囲気下で攪拌しな
がら、2,2−ビス(4−ヒドロキシフェニル)プロパ
ンジベンゾエート−3,3’,4,4’−テトラカルボ
ン酸二無水物(以下、ESDAという)0.112mo
lを徐々に添加した。氷浴下で30分間攪拌し、粘度が
1500poiseに達したところで攪拌をやめ、ポリ
アミド酸溶液を得た。
Comparative Example 3 In a glass flask having a capacity of 1000 ml, 263 g of dimethylformamide (hereinafter, referred to as DMF) was added with 0.112 mol of oxydianiline (hereinafter, referred to as ODA), and the mixture was stirred under a nitrogen atmosphere while 2-bis (4-hydroxyphenyl) propanedibenzoate-3,3 ', 4,4'-tetracarboxylic dianhydride (hereinafter referred to as ESDA) 0.112mo
1 was added slowly. The mixture was stirred in an ice bath for 30 minutes, and when the viscosity reached 1500 poise, the stirring was stopped to obtain a polyamic acid solution.

【0039】このポリアミド酸溶液にDMF113g、
β−ピコリン26g、無水酢酸45gを加え30分間撹
拌した後、さらに100℃下で1時間撹拌し、イミド化
させた。その後、高速で撹拌したメタノール中にこの溶
液を少しづつ垂らした。メタノール中に析出した糸状の
ポリイミドをミキサーで粉砕し、メタノールでソックス
レー洗浄を行い、110℃で2時間乾燥させ、ポリイミ
ド粉末を得た。上記で得たポリイミド粉末はTHFに溶
解させることができなかった(固形分濃度:SC=20
%)。
To this polyamic acid solution, 113 g of DMF,
After adding 26 g of β-picoline and 45 g of acetic anhydride and stirring for 30 minutes, the mixture was further stirred at 100 ° C. for 1 hour for imidization. Then, this solution was dripped little by little in the methanol stirred at high speed. The filamentous polyimide precipitated in methanol was crushed with a mixer, washed with Soxhlet in methanol, and dried at 110 ° C. for 2 hours to obtain a polyimide powder. The polyimide powder obtained above could not be dissolved in THF (solid content concentration: SC = 20).
%).

【0040】(比較例4)実施例1で得られた可溶性熱
可塑性ポリイミド20gをTHFに溶解させ可溶性熱可
塑性ポリイミド溶液を得た。得られた溶液を7.5μm
厚のポリイミドフィルム(アピカル7.5HP、鐘淵化
学工業社製)上に流延し、100℃で10分間乾燥後、
150℃で10分間乾燥し、厚み10μmのフィルム状
積層部材を得た。
(Comparative Example 4) 20 g of the soluble thermoplastic polyimide obtained in Example 1 was dissolved in THF to obtain a soluble thermoplastic polyimide solution. The resulting solution is 7.5 μm
Cast on a thick polyimide film (Apical 7.5 HP, manufactured by Kanegafuchi Chemical Industry Co., Ltd.) and dry at 100 ° C. for 10 minutes.
It was dried at 150 ° C. for 10 minutes to obtain a film-like laminated member having a thickness of 10 μm.

【0041】(比較例5) プラタボンドM1276
(共重合ナイロン、日本リルサン社製)を10g、エピ
コート1032H60(油化シェル社製)を20g、ジ
アミノジフェニルサルフォン1gを83gのTHFに溶
解し、接着剤溶液を得た。得られた溶液を7.5μm厚
のポリイミドフィルム(アピカル7.5HP、鐘淵化学
工業社製)上に流延し、100℃で10分間乾燥後、1
50℃で10分間乾燥し、厚み10μmのフィルム状積
層部材を得た。
(Comparative Example 5) Platabond M1276
(Copolymer nylon, manufactured by Nippon Rilsan Co., Ltd.), 10 g of Epicoat 1032H60 (manufactured by Yuka Shell Co., Ltd.) and 1 g of diaminodiphenyl sulfone were dissolved in 83 g of THF to obtain an adhesive solution. The obtained solution was cast on a 7.5 μm-thick polyimide film (Apical 7.5 HP, manufactured by Kaneka Corporation), dried at 100 ° C. for 10 minutes, and then 1
It was dried at 50 ° C. for 10 minutes to obtain a film-like laminated member having a thickness of 10 μm.

【0042】(比較例6)実施例1と同様に得られたポ
リイミド系接着剤溶液を7.5μm厚のポリイミドフィ
ルム(無機フィラーあり)上に流延し、100℃で10
分間乾燥後、150℃で10分間乾燥し、厚み10μm
のフィルム状積層部材を得た。
(Comparative Example 6) A polyimide adhesive solution obtained in the same manner as in Example 1 was cast on a polyimide film (with an inorganic filler) having a thickness of 7.5 μm and the temperature was maintained at 100 ° C. for 10 minutes.
After drying for 10 minutes, dry at 150 ℃ for 10 minutes, thickness 10μm
The film-like laminated member of was obtained.

【0043】(フィルム状積層部材の特性評価) 1.微細加工性 以下の条件でレーザー加工し、SEMにて形状観察を行
った。テーパーの度合い及び穴のあき具合を三段階で評
価した。 使用機器:UV個体レーザー(YAG第3高調波),λ
=355nm 穴径:40μm 速度:100穴/sec レーザー発振:20kHz ○・・テーパー、穴ともに良好 △・・穴はあいているがバリが残っている ×・・穴があいていない部分がある 2.引剥強度 以下の手順で積層部材と銅箔を接着した
ときの引剥強度の測定を行った。フィルム状積層部材と
18μmの電解銅箔を、温度200℃、圧力3MPaで
20分間加熱加圧し、銅張フレキシブル積層板を得た。
得られた銅張りフレキシブル積層板の引き剥し強度を、
JIS C6481に従って測定した。但し導体幅は3
mmで測定した。 3.耐熱性 2で得られた銅張積層板を用い、150℃×1000時
間後の引き剥し強度を、JIS C6481に従って測
定した。但し導体幅は3mmで測定した。
(Characteristic evaluation of film-like laminated member) 1. Fine machinability Laser processing was performed under the following conditions, and the shape was observed by SEM. The degree of taper and the degree of perforation were evaluated in three levels. Equipment used: UV solid laser (YAG third harmonic), λ
= 355 nm Hole diameter: 40 μm Speed: 100 holes / sec Laser oscillation: 20 kHz ○ ・ ・ Taper and hole are both good △ ・ ・ Burr remains but burr remains × ・ ・ There is a part without hole 2 . Peeling strength The peeling strength when the laminated member and the copper foil were bonded was measured by the following procedure. The film-shaped laminated member and the electrolytic copper foil of 18 μm were heated and pressed at a temperature of 200 ° C. and a pressure of 3 MPa for 20 minutes to obtain a copper-clad flexible laminated plate.
The peel strength of the obtained copper-clad flexible laminate,
It was measured according to JIS C6481. However, the conductor width is 3
It was measured in mm. 3. The peel strength after 150 ° C. × 1000 hours was measured according to JIS C6481 using the copper clad laminate obtained in Heat resistance 2. However, the conductor width was measured at 3 mm.

【0044】実施例および比較例のフィルム状積層部材
の特性評価結果を表1に示す。
Table 1 shows the characteristic evaluation results of the film-like laminated members of Examples and Comparative Examples.

【0045】[0045]

【表1】 [Table 1]

【0046】[0046]

【発明の効果】本発明の接着性カバーフィルムは10μ
m以下、好ましくは3〜7.5μmの厚みの無機フィラ
ーを含有しない高弾性極薄ポリイミドフィルムに0.5
〜5μmの接着層を積層した構成を有し、総厚みを10
μm以下にすることで従来にない微細加工性を実現する
ことができる。また、接着層を可溶性熱可塑性ポリイミ
ド樹脂、エポキシ樹脂及びその硬化剤で構成することに
より、優れた電気信頼性、接着性及び耐熱性を併せ持つ
ことができる。
The adhesive cover film of the present invention has a thickness of 10 μm.
m or less, preferably 0.5 to 0.5 mm for a highly elastic ultrathin polyimide film containing no inorganic filler and having a thickness of 3 to 7.5 μm.
The total thickness is 10
By setting the thickness to be equal to or less than μm, it is possible to realize unprecedented fine workability. Further, by forming the adhesive layer with a soluble thermoplastic polyimide resin, an epoxy resin and a curing agent thereof, it is possible to have excellent electrical reliability, adhesiveness and heat resistance.

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4F100 AK49A AK49B AK53B AT00A BA02 CA02B CA02H CB01B DE01A DE01H JB16B JJ03 JL01 JL11 JL11B YY00A 4J004 AA02 AA13 AA16 AA17 AB05 CA06 FA04 FA05 FA08 4J040 EC001 EC061 EC071 EC121 EH031 JA09 KA16 LA02 LA06 LA08 NA20 PA23    ─────────────────────────────────────────────────── ─── Continued front page    F term (reference) 4F100 AK49A AK49B AK53B AT00A                       BA02 CA02B CA02H CB01B                       DE01A DE01H JB16B JJ03                       JL01 JL11 JL11B YY00A                 4J004 AA02 AA13 AA16 AA17 AB05                       CA06 FA04 FA05 FA08                 4J040 EC001 EC061 EC071 EC121                       EH031 JA09 KA16 LA02                       LA06 LA08 NA20 PA23

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 10μm以下でありかつ平均粒径1μm
以上の粉体が100個/mm以下である薄型ポリイミ
ドフィルムの少なくとも片面に、溶媒可溶性熱可塑性ポ
リイミド,エポキシ樹脂および硬化剤を含有する接着剤
を0.5〜5μmの厚みで積層する構成を有し、総厚み
が10μm以下である接着性カバーフィルム。
1. An average particle size of 10 μm or less and an average particle size of 1 μm
A composition in which an adhesive containing a solvent-soluble thermoplastic polyimide, an epoxy resin and a curing agent is laminated to a thickness of 0.5 to 5 μm on at least one surface of a thin polyimide film having 100 or less powders / mm 2 or less. An adhesive cover film having a total thickness of 10 μm or less.
【請求項2】 3〜7.5μmでありかつ平均粒径1μ
m以上の粉体が100個/mm以下である薄型ポリイ
ミドフィルムの少なくとも片面に、溶媒可溶性熱可塑性
ポリイミド,エポキシ樹脂および硬化剤からなる接着剤
を0.5〜5μmの厚みで積層する構成を有し、総厚み
が10μm以下である接着性カバーフィルム。
2. The average particle diameter is 3 μm and the particle size is 3 μm to 7.5 μm.
An adhesive composed of a solvent-soluble thermoplastic polyimide, an epoxy resin, and a curing agent is laminated to a thickness of 0.5 to 5 μm on at least one surface of a thin polyimide film having 100 or more m or more powders / mm 2 or less. An adhesive cover film having a total thickness of 10 μm or less.
【請求項3】前記溶媒可溶性熱可塑性ポリイミドのガラ
ス転移温度が200℃以下であり、該溶媒可溶性熱可塑
性ポリイミドに含まれる酸二無水物残基の50モル%以
上が一般式(1) 【化1】 で表されるエステル酸二無水物残基であることを特徴と
する請求項1または2に記載の接着性カバーフィルム。
3. The glass transition temperature of the solvent-soluble thermoplastic polyimide is 200 ° C. or lower, and 50 mol% or more of the acid dianhydride residues contained in the solvent-soluble thermoplastic polyimide is represented by the general formula (1) 1] The adhesive cover film according to claim 1 or 2, which is an ester dianhydride residue represented by:
【請求項4】前記溶媒可溶性熱可塑性ポリイミドが、該
ポリイミドに含まれるジアミン残基の50モル%以上が
下記一般式(2) 【化2】 で表されるジアミン化合物の残基であることを特徴とす
る請求項1〜3のいずれか一項に記載の接着性カバーフ
ィルム。
4. In the solvent-soluble thermoplastic polyimide, 50 mol% or more of diamine residues contained in the polyimide are represented by the following general formula (2): It is the residue of the diamine compound represented by these, The adhesive cover film as described in any one of Claims 1-3.
JP2001217375A 2001-07-17 2001-07-17 Adherent cover film Pending JP2003027034A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001217375A JP2003027034A (en) 2001-07-17 2001-07-17 Adherent cover film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001217375A JP2003027034A (en) 2001-07-17 2001-07-17 Adherent cover film

Publications (1)

Publication Number Publication Date
JP2003027034A true JP2003027034A (en) 2003-01-29

Family

ID=19051710

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001217375A Pending JP2003027034A (en) 2001-07-17 2001-07-17 Adherent cover film

Country Status (1)

Country Link
JP (1) JP2003027034A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004285284A (en) * 2003-03-25 2004-10-14 Mitsui Chemicals Inc Resin composition and film adhesive material comprising the same
WO2004101701A1 (en) * 2003-05-14 2004-11-25 Mitsui Chemicals, Inc. Adhesive resin composition and adhesive agent in film form, and semiconductor device using the same
WO2006064700A1 (en) * 2004-12-17 2006-06-22 Kaneka Corporation Polyimide multilayered adhesive film and process for proucing the same
WO2008082152A1 (en) * 2007-01-03 2008-07-10 Skc Co., Ltd. Polyimide film with improved adhesiveness

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06287327A (en) * 1993-02-04 1994-10-11 Shin Etsu Chem Co Ltd Production of polyimide film
JPH0897526A (en) * 1993-01-27 1996-04-12 Furukawa Electric Co Ltd:The Metal-based printed circuit board
JPH08333559A (en) * 1995-04-04 1996-12-17 Sekisui Chem Co Ltd Tacky tape for protecting green sheet
JP2000144092A (en) * 1998-11-16 2000-05-26 Kanegafuchi Chem Ind Co Ltd Adhesive for cover lay and cover lay film
JP2000191810A (en) * 1998-12-25 2000-07-11 Kanegafuchi Chem Ind Co Ltd Surface-modified method for thermal resistant film and surface-modified thermal resistant film
WO2000061658A1 (en) * 1999-04-09 2000-10-19 Kaneka Corporation Polyimide resin, resin composition with improved moisture resistance comprising the same, adhesive solution, filmy bonding member, layered adhesive film, and processes for producing these

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0897526A (en) * 1993-01-27 1996-04-12 Furukawa Electric Co Ltd:The Metal-based printed circuit board
JPH06287327A (en) * 1993-02-04 1994-10-11 Shin Etsu Chem Co Ltd Production of polyimide film
JPH08333559A (en) * 1995-04-04 1996-12-17 Sekisui Chem Co Ltd Tacky tape for protecting green sheet
JP2000144092A (en) * 1998-11-16 2000-05-26 Kanegafuchi Chem Ind Co Ltd Adhesive for cover lay and cover lay film
JP2000191810A (en) * 1998-12-25 2000-07-11 Kanegafuchi Chem Ind Co Ltd Surface-modified method for thermal resistant film and surface-modified thermal resistant film
WO2000061658A1 (en) * 1999-04-09 2000-10-19 Kaneka Corporation Polyimide resin, resin composition with improved moisture resistance comprising the same, adhesive solution, filmy bonding member, layered adhesive film, and processes for producing these

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004285284A (en) * 2003-03-25 2004-10-14 Mitsui Chemicals Inc Resin composition and film adhesive material comprising the same
WO2004101701A1 (en) * 2003-05-14 2004-11-25 Mitsui Chemicals, Inc. Adhesive resin composition and adhesive agent in film form, and semiconductor device using the same
US7488532B2 (en) 2003-05-14 2009-02-10 Mitsui Chemicals, Inc. Adhesive resin composition and adhesive agent in film form, and semiconductor device using the same
WO2006064700A1 (en) * 2004-12-17 2006-06-22 Kaneka Corporation Polyimide multilayered adhesive film and process for proucing the same
WO2008082152A1 (en) * 2007-01-03 2008-07-10 Skc Co., Ltd. Polyimide film with improved adhesiveness

Similar Documents

Publication Publication Date Title
JP5232386B2 (en) Thermosetting resin composition and use thereof
JP4221290B2 (en) Resin composition
JP5019874B2 (en) Thermosetting resin composition, laminated body using the same, and circuit board
US20080312383A1 (en) Thermosetting Resin Composition, And Laminate and Circuit Substrate Using Same
JPH06200216A (en) Heat-resistant adhesive film for printed wiring board, method using the same, and production of printed wiring board by using the same
JP2007091799A (en) Thermosetting resin composition and its application
KR20160037793A (en) Polyimide resin composition, adhesive composition, primer composition, laminate, and resin attached copper foil
JP4426774B2 (en) Thermosetting resin composition, laminated body using the same, and circuit board
JP2003027014A (en) Adhesive film
JP4875794B2 (en) Resin composition
JP4109500B2 (en) Thermosetting resin composition, thermosetting resin solution, and thermosetting resin sheet
JP2003027034A (en) Adherent cover film
JP4071958B2 (en) Polyimide resin composition
US20060009615A1 (en) Polyamic acids, polyimide films and polymide-metal laminates and methods for making same
JP2010083958A (en) Adhesive for multilayer flexible substrate, and multilayer flexible substrate material, laminate plate and printed wiring board using the adhesive
JP4976380B2 (en) Metal laminate
JP2006348086A (en) Thermosetting resin composition and its utilization
JPH11228715A (en) Polyimide film having improved adhesiveness and its production
JP4169978B2 (en) Low dielectric adhesive and film-like joining member comprising the same
JP4620834B2 (en) Bonding sheet
JP2009001793A (en) Adhesive
JP2002060620A (en) Polyimide solution excellent in storage stability, polyimide-based adhesive solution and film-like laminated member obtained using the same
JP2002069420A (en) Adhesive film for fpc reinforcing sheet
JP2003011308A (en) Film-shaped laminated member
JP2000143981A (en) Resin composition

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080118

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20110218

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110301

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20110712