JP2002060620A - Polyimide solution excellent in storage stability, polyimide-based adhesive solution and film-like laminated member obtained using the same - Google Patents

Polyimide solution excellent in storage stability, polyimide-based adhesive solution and film-like laminated member obtained using the same

Info

Publication number
JP2002060620A
JP2002060620A JP2000248797A JP2000248797A JP2002060620A JP 2002060620 A JP2002060620 A JP 2002060620A JP 2000248797 A JP2000248797 A JP 2000248797A JP 2000248797 A JP2000248797 A JP 2000248797A JP 2002060620 A JP2002060620 A JP 2002060620A
Authority
JP
Japan
Prior art keywords
polyimide
solution
film
based adhesive
solution according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000248797A
Other languages
Japanese (ja)
Inventor
Hiroyuki Tsuji
宏之 辻
Takeshi Kikuchi
剛 菊池
Hiroyuki Furuya
浩行 古谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP2000248797A priority Critical patent/JP2002060620A/en
Publication of JP2002060620A publication Critical patent/JP2002060620A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a polyimide solution excellent in storage stability useful in the fields such as flexible printed circuit boards, tapes for TAB(tape automated bonding), composite lead frames, laminated materials and the like, where heat resistance and adhesion properties are required, a polyimide-based adhesive solution excellent in heat resistance and adhesion properties, and a film-like laminated member obtained using the same. SOLUTION: The polyimide solution having storage stability excellent enough to be stored for at least one month at room temperature is obtained by controlling imidization ratio to at least 90% in the soluble thermoplastic polyimide resin solution. Likewise, in the polyimide-based adhesive solution obtained by compounding a thermosetting resin and a curing agent, a high adhesive force can be maintained after a long-term storage.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ポリイミド溶液、
ポリイミド系接着剤溶液およびそれを用いて得られるフ
ィルム状積層部材に関する。更に詳しくは、フレキシブ
ル印刷回路基板、TAB(Tape Automate
d bonding)用テープ、複合リードフレーム、
積層材料等の耐熱性、接着性が要求される分野で有用
な、保存安定性の良いポリイミド溶液、耐熱性と接着性
に優れたポリイミド系接着剤およびそれを用いて得られ
るフィルム状積層部材に関する。
The present invention relates to a polyimide solution,
The present invention relates to a polyimide-based adhesive solution and a film-like laminated member obtained using the same. More specifically, a flexible printed circuit board, TAB (Tape Automate)
d bonding) tape, composite lead frame,
A polyimide solution with good storage stability, a polyimide adhesive having excellent heat resistance and adhesiveness, and a film-like laminated member obtained by using the same, which is useful in fields requiring heat resistance and adhesiveness of laminated materials and the like. .

【0002】[0002]

【従来の技術】近年、電子機器の高機能化、高性能化、
小型化が進んでおり、それらに伴って用いられる電子部
品に対する小型化、軽量化が求められてきている。その
ため半導体素子パッケージ方法やそれらを実装する配線
材料または配線部品も、より高密度、高機能かつ高性能
なものが求められるようになってきた。特に、半導体パ
ッケージ、COLおよびLOCパッケージ、MCM(M
ulti Chip Module)等の高密度実装材
料や多層FPC等のプリント配線板材料、さらには航空
宇宙材料として好適に用いることのできる、良好な接着
性を示す材料が求められている。
2. Description of the Related Art In recent years, electronic devices have become more sophisticated and more sophisticated.
With miniaturization progressing, there has been a demand for miniaturization and weight reduction of electronic components used accordingly. For this reason, a semiconductor element packaging method and a wiring material or a wiring component for mounting the same are required to have higher density, higher function and higher performance. In particular, semiconductor packages, COL and LOC packages, MCM (M
There is a need for a material exhibiting good adhesiveness that can be suitably used as a high-density packaging material such as multi chip module, a printed wiring board material such as a multilayer FPC, and an aerospace material.

【0003】この分野において、フェノール系およびエ
ポキシ系の接着剤に無い柔軟性、アクリル系の接着剤に
無い耐熱性を有する接着剤として、ポリイミド系の接着
剤が次第に用いられるようになっている。
[0003] In this field, polyimide adhesives have been gradually used as adhesives having flexibility not found in phenolic and epoxy adhesives and heat resistance not found in acrylic adhesives.

【0004】ポリイミドは、種々の有機ポリマーの中で
も耐熱性に優れているため、宇宙、航空分野まで幅広く
用いられ、接着材料としても用いられている。しかし、
耐熱性の高いポリイミド系接着剤は接着するために30
0℃前後の高温と高圧力を要し、接着力もそれほど高い
とはいえない。そこで、有機溶媒可溶な熱可塑性ポリイ
ミドに対してエポキシ樹脂等の熱硬化性樹脂を配合し、
接着力の向上させた接着剤がでてきている。しかしなが
ら、熱可塑性ポリイミドを製造する際、イミド化が十分
でないと、ポリイミドの前駆体であるポリアミック酸が
存在するため、保存状態により、時間がたつとポリイミ
ドの分子量低下等を引き起こしたり、接着剤を調合した
後、配合する熱硬化性樹脂との反応が生じたりすること
により、接着強度の低下、接着剤の脆化等の特性の悪化
を引き起こす恐れがあった。
Polyimide is excellent in heat resistance among various organic polymers, and is therefore widely used in the fields of space and aviation, and is also used as an adhesive material. But,
Polyimide adhesive with high heat resistance requires 30
A high temperature of about 0 ° C. and a high pressure are required, and the adhesive strength is not so high. Therefore, a thermosetting resin such as an epoxy resin is blended with a thermoplastic polyimide soluble in an organic solvent,
Adhesives with improved adhesion are emerging. However, when producing a thermoplastic polyimide, if imidization is not enough, the presence of polyamic acid, which is a precursor of the polyimide, causes a decrease in the molecular weight of the polyimide over time, depending on the storage state, or an adhesive. After blending, a reaction with the thermosetting resin to be blended may occur, which may cause deterioration in properties such as a decrease in adhesive strength and embrittlement of the adhesive.

【0005】[0005]

【発明が解決しようとする課題】そこで本発明者らは、
上記課題を解決し、保存安定性の良いポリイミド溶液、
それを用いたポリイミド系接着剤溶液、およびその接着
剤溶液を用いて得られるフィルム状積層部材を提供する
ことを目的とし、鋭意研究を行った結果、本発明を完成
するに至った。
SUMMARY OF THE INVENTION Accordingly, the present inventors
Solution to the above problems, polyimide solution with good storage stability,
The present inventors have conducted intensive studies with the aim of providing a polyimide-based adhesive solution using the same and a film-like laminated member obtained using the adhesive solution, and as a result, the present invention has been completed.

【0006】[0006]

【課題を解決するための手段】本発明は以下の構成から
なる新規なポリイミド溶液、それを用いたポリイミド系
接着剤溶液、およびその接着剤溶液を提供するものであ
り、これにより上記目的が達成される。 1) イミド化率が90%以上であり、テトラヒドロフ
ラン、1,4−ジオキサン、ジオキソラン、N,N−ジ
メチルホルムアミド、N,N−ジメチルアセトアミドか
ら選ばれる少なくとも一種の溶媒に対する、20#Cにお
ける溶解度が10%以上である熱可塑性ポリイミドが有
機溶剤に溶解した熱可塑性ポリイミド溶液であって、2
0#C、60%RH環境下で1ヶ月放置後の分子量の低下
が30%以下であることを特徴とする熱可塑ポリイミド
溶液。 2)前記熱可塑性ポリイミドが酸二無水物を原料とする
ポリイミドであって、全酸二無水物の50モル%以上が
一般式(1)
SUMMARY OF THE INVENTION The present invention provides a novel polyimide solution having the following constitution, a polyimide-based adhesive solution using the same, and an adhesive solution thereof, thereby achieving the above object. Is done. 1) The imidation ratio is 90% or more, and the solubility at 20 # C in at least one solvent selected from tetrahydrofuran, 1,4-dioxane, dioxolan, N, N-dimethylformamide, and N, N-dimethylacetamide. A thermoplastic polyimide solution in which 10% or more of a thermoplastic polyimide is dissolved in an organic solvent,
A thermoplastic polyimide solution characterized in that the decrease in molecular weight after leaving it for one month in a 0 # C, 60% RH environment is 30% or less. 2) The thermoplastic polyimide is a polyimide made from an acid dianhydride, and 50 mol% or more of the total acid dianhydride is represented by the general formula (1)

【0007】[0007]

【化4】 Embedded image

【0008】(式中、Xは−(CH2)k−、または芳
香環を含む二価の基を示し、kは1以上10以下の整数
である。)で表されるエステル酸二無水物であることを
特徴とする1)記載の熱可塑ポリイミド溶液。 3) 熱可塑性ポリイミドが、前記一般式(1)で表さ
れるエステル酸二無水物と下記一般式(2)
Wherein X represents-(CH 2 ) k-or a divalent group containing an aromatic ring, and k is an integer of 1 or more and 10 or less. The thermoplastic polyimide solution according to 1), wherein: 3) A thermoplastic polyimide is obtained by combining an ester dianhydride represented by the general formula (1) with the following general formula (2)

【0009】[0009]

【化5】 Embedded image

【0010】(式中、Yは同一または異なって、−C
(=O)−、−SO2−、−O−、−S−、−(CH2
m−、−NHCO−、−C(CH32−、−C(CF3
2−、−C(=O)O−、または単結合から選ばれる少
なくとも一種に結合を示す。mおよびnは1以上5以下
の整数である。)で表されるジアミン化合物を原料とし
て得られるポリイミドであることを特徴とする1)また
は2)に記載の熱可塑性ポリイミド溶液。 4) 熱可塑性ポリイミドが、下記式(3)
Wherein Y is the same or different and
(= O) -, - SO 2 -, - O -, - S -, - (CH 2)
m -, - NHCO -, - C (CH 3) 2 -, - C (CF 3)
A bond is shown to at least one selected from 2- , -C (= O) O- and a single bond. m and n are integers of 1 or more and 5 or less. The thermoplastic polyimide solution according to 1) or 2), which is a polyimide obtained using the diamine compound represented by (1) as a raw material. 4) The thermoplastic polyimide is represented by the following formula (3)

【0011】[0011]

【化6】 Embedded image

【0012】で表されるエステル酸二無水物と、前記一
般式(2)で表されるジアミン化合物を原料として得ら
れるポリイミドであることを特徴とする3)に記載のポ
リイミド溶液。 5)1)〜4)に記載のポリイミド溶液に熱硬化性樹脂
と硬化剤を混合して得られるポリイミド系接着剤溶液。 6) 熱硬化性樹脂がエポキシ系樹脂であることを特徴
とする5)記載のポリイミド系接着剤溶液。 7)5)または6)記載のポリイミド系接着剤溶液であ
って、常温で1ヶ月放置後の分子量の低下が30%以下
であることを特徴とするポリイミド系接着剤溶液。 8)5)〜7)のいずれか一項に記載のポリイミド系接
着剤溶液を、支持体上に流延または塗布し、乾燥後の接
着剤塗膜を支持体より引き剥がして得られるフィルム状
積層部材。 9) 5)〜7)に記載のポリイミド系接着剤溶液を、
ポリイミドフィルムの少なくとも片面に流延または塗布
し、その後乾燥して得られるポリイミド系接着剤層を表
面に有するフィルム状積層部材。 10) ポリイミド系接着剤層が5〜30μmである
9)に記載のフィルム状積層部材。
The polyimide solution according to 3), which is a polyimide obtained by using the ester dianhydride represented by the formula and a diamine compound represented by the formula (2) as raw materials. 5) A polyimide adhesive solution obtained by mixing a thermosetting resin and a curing agent with the polyimide solution according to 1) to 4). 6) The polyimide adhesive solution according to 5), wherein the thermosetting resin is an epoxy resin. 7) The polyimide-based adhesive solution according to 5) or 6), wherein the decrease in molecular weight after leaving at room temperature for one month is 30% or less. 8) A film obtained by casting or coating the polyimide adhesive solution according to any one of 5) to 7) on a support, and peeling the dried adhesive coating film from the support. Laminated members. 9) The polyimide adhesive solution according to 5) to 7),
A film-shaped laminated member having on its surface a polyimide-based adhesive layer obtained by casting or coating on at least one surface of a polyimide film and then drying. 10) The film-shaped laminated member according to 9), wherein the polyimide-based adhesive layer has a thickness of 5 to 30 μm.

【0013】[0013]

【発明の実施の形態】本発明の熱可塑性ポリイミド溶液
は、イミド化率が少なくとも90%以上であり、有機溶
剤に対する溶解度が %以上である熱可塑性ポリイミ
ドが有機溶剤に溶解した熱可塑性ポリイミド溶液である
ことが必須であり、常温で1ヶ月放置後の分子量の低下
が30%以下である熱可塑ポリイミド溶液である。この
熱可塑ポリイミド溶液は、ポリアミック酸の残留が少な
く、長期間保存した後も分子量低下や他の配合物との反
応が生じないため、例えば、この溶液にエポキシ樹脂な
どの熱硬化性樹脂を配合して得られるポリイミド系接着
剤や積層部材を用いた場合に、接着力の低下等の接着剤
の特性悪化のない優れた安定性を有する。
BEST MODE FOR CARRYING OUT THE INVENTION The thermoplastic polyimide solution of the present invention is a thermoplastic polyimide solution in which a thermoplastic polyimide having an imidization ratio of at least 90% and a solubility in an organic solvent of at least% is dissolved in the organic solvent. It is essential that the thermoplastic polyimide solution has a decrease in molecular weight of 30% or less after standing at room temperature for one month. Since this thermoplastic polyimide solution has little residual polyamic acid and does not cause a decrease in molecular weight or a reaction with other compounds even after long-term storage, for example, a thermosetting resin such as an epoxy resin is added to this solution. When a polyimide-based adhesive or a laminated member obtained by the above method is used, it has excellent stability without deteriorating adhesive properties such as a decrease in adhesive strength.

【0014】本発明の熱可塑性ポリイミド溶液およびそ
れより得られるポリイミド系接着剤溶液に用いる溶剤と
しては、接着剤として用いたときの加工性の面から、テ
トラヒドロフラン(THF)、1,4−ジオキサン、ジ
オキソラン等の環状エーテル系溶媒が好ましく用いられ
得る。また、複数の溶媒を混合した混合有機溶媒を用い
る場合には、極性有機溶媒と組み合わせた方が好ましい
が、環状エーテル系溶媒を30重量%以上、好ましくは
50重量%以上含有するほうが望ましい。なお環状エー
テル系溶媒と組み合わせる有機極性溶媒としては、ジメ
チルスルホキシド、ジエチルスルホキシド等のスルホキ
シド系溶媒、N,N−ジメチルホルムアミド、N,N−
ジエチルホルムアミド等のホルムアミド系溶媒、N,N
−ジメチルアセトアミド、N,N−ジエチルアセトアミ
ド等のアセトアミド系溶媒が挙げられる。
As the solvent used in the thermoplastic polyimide solution of the present invention and the polyimide adhesive solution obtained therefrom, from the viewpoint of processability when used as an adhesive, tetrahydrofuran (THF), 1,4-dioxane, A cyclic ether solvent such as dioxolane can be preferably used. When a mixed organic solvent obtained by mixing a plurality of solvents is used, it is preferable to combine the solvent with a polar organic solvent. However, it is desirable that the solvent contains 30% by weight or more, preferably 50% by weight or more of a cyclic ether solvent. The organic polar solvent used in combination with the cyclic ether-based solvent includes sulfoxide-based solvents such as dimethyl sulfoxide and diethyl sulfoxide, N, N-dimethylformamide, N, N-
Formamide solvents such as diethylformamide, N, N
-Acetamide solvents such as -dimethylacetamide and N, N-diethylacetamide.

【0015】これらの溶媒に対する溶解性がよいという
点から、本発明における熱可塑性ポリイミドは酸二無水
物を原料とする熱可塑性ポリイミドであって、全酸二無
水物の50モル%以上が一般式(1)
From the viewpoint of good solubility in these solvents, the thermoplastic polyimide of the present invention is a thermoplastic polyimide obtained from an acid dianhydride as a raw material. (1)

【0016】[0016]

【化7】 Embedded image

【0017】(式中、Xは−(CH2)k−、または芳
香環を含む二価の基を示し、kは1以上10以下の整数
である。)で表されるエステル酸二無水物であることが
好ましい。
(Wherein, X represents-(CH 2 ) k-or a divalent group containing an aromatic ring, and k is an integer of 1 or more and 10 or less). It is preferred that

【0018】一般式(1)で表される酸二無水物の好ま
しい例としては、2,2−ビス(4−ヒドロキシフェニ
ル)プロパンジベンゾエート−3,3’,4,4’−テ
トラカルボン酸二無水物、p−フェニレンビス(トリメ
リット酸モノエステル無水物)、4,4’−ビフェニレ
ンビス(トリメリット酸モノエステル無水物)、1,4
−ナフタレンビス(トリメリット酸モノエステル無水
物)、1,2−エチレンビス(トリメリット酸モノエス
テル無水物)、1,3−トリメチレンビス(トリメリッ
ト酸モノエステル無水物)、1,4−テトラメチレンビ
ス(トリメリット酸モノエステル無水物)、1,5−ペ
ンタメチレンビス(トリメリット酸モノエステル無水
物)、1,6−ヘキサメチレンビス(トリメリット酸モ
ノエステル無水物)等が挙げられるが、得られるポリイ
ミドの可溶性が良好であり耐熱性とのバランスがよいと
いう点から式(3)
Preferred examples of the acid dianhydride represented by the general formula (1) include 2,2-bis (4-hydroxyphenyl) propanedibenzoate-3,3 ', 4,4'-tetracarboxylic acid Dianhydride, p-phenylene bis (trimellitic acid monoester anhydride), 4,4′-biphenylene bis (trimellitic acid monoester anhydride), 1,4
-Naphthalene bis (trimellitic acid monoester anhydride), 1,2-ethylene bis (trimellitic acid monoester anhydride), 1,3-trimethylene bis (trimellitic acid monoester anhydride), 1,4- Examples include tetramethylene bis (trimellitic acid monoester anhydride), 1,5-pentamethylene bis (trimellitic acid monoester anhydride), 1,6-hexamethylene bis (trimellitic acid monoester anhydride), and the like. However, from the viewpoint that the obtained polyimide has good solubility and good balance with heat resistance, the formula (3) is used.

【0019】[0019]

【化8】 Embedded image

【0020】で表される2,2−ビス(4−ヒドロキシ
フェニル)プロパンジベンゾエート−3,3’,4,
4’−テトラカルボン酸二無水物は特に好ましい。
2,2-bis (4-hydroxyphenyl) propanedibenzoate-3,3 ', 4
4'-tetracarboxylic dianhydride is particularly preferred.

【0021】また、上記の酸二無水物と反応させるジア
ミン成分としては下記一般式(2)
The diamine component to be reacted with the above acid dianhydride is represented by the following general formula (2):

【0022】[0022]

【化9】 Embedded image

【0023】(式中、Yは同一または異なって、−C
(=O)−、−SO2−、−O−、−S−、−(CH2
m−、−NHCO−、−C(CH32−、−C(CF3
2−、−C(=O)O−、または単結合から選ばれる少
なくとも一種の結合を示す。mおよびnは1以上5以下
の整数である。)で表されるジアミン化合物、特にビス
(アミノフェノキシフェニル)スルフォンや1,3−ビ
ス(3−アミノフェノキシ)ベンゼンが好ましい。な
お、一般式(2)において、複数個のYは各繰り返し単
位間で同一であっても異なっていても良く、各ベンゼン
環の水素は当業者の考え得る範囲内で種々の置換基で適
宜置換され得る。例えば、メチル基、エチル基等の炭化
水素基やBr、Cl等のハロゲン基を挙げることができ
るが、これらの置換基に限定されない。さらに、一般式
(2)で表されるジアミン化合物中、メタ位にアミノ基
を有するジアミン化合物は、それを用いた熱可塑性ポリ
イミドの有機溶媒への溶解性が良好なため加工性に優れ
た接着剤溶液が得られて好ましい。なお、一般式(2)
で表されるジアミン化合物は、2種以上を混合して用い
ても良い。
(Wherein Y is the same or different and
(= O) -, - SO 2 -, - O -, - S -, - (CH 2)
m -, - NHCO -, - C (CH 3) 2 -, - C (CF 3)
It represents at least one kind of bond selected from 2- , -C (= O) O- or a single bond. m and n are integers of 1 or more and 5 or less. ), Particularly, bis (aminophenoxyphenyl) sulfone and 1,3-bis (3-aminophenoxy) benzene. In the general formula (2), a plurality of Ys may be the same or different between each repeating unit, and hydrogen of each benzene ring may be appropriately substituted with various substituents within a range conceivable by those skilled in the art. Can be replaced. For example, a hydrocarbon group such as a methyl group and an ethyl group and a halogen group such as Br and Cl can be exemplified, but the substituent is not limited thereto. Furthermore, among the diamine compounds represented by the general formula (2), a diamine compound having an amino group at the meta position has excellent processability due to good solubility of a thermoplastic polyimide in an organic solvent using the diamine compound. It is preferable to obtain an agent solution. The general formula (2)
May be used in combination of two or more.

【0024】本発明のポリイミド系接着剤溶液に溶解す
る熱可塑性ポリイミドは、その前駆体であるポリアミド
酸重合体を脱水閉環して得られる。このポリアミド酸溶
液は、前記した酸二無水物と前記したジアミン化合物と
が実質的に等モルになるように使用し、有機極性溶媒中
で重合して得られる。
The thermoplastic polyimide dissolved in the polyimide adhesive solution of the present invention can be obtained by dehydrating and ring-closing a polyamic acid polymer as a precursor thereof. This polyamic acid solution is obtained by using the above-mentioned acid dianhydride and the above-mentioned diamine compound in substantially equimolar amounts and polymerizing in an organic polar solvent.

【0025】このポリアミド酸は、まず、アルゴン、窒
素などの不活性雰囲気中において、ジアミン化合物およ
び酸二無水物を有機極性溶媒中に溶解または拡散させて
得られる。
This polyamic acid is obtained by first dissolving or diffusing a diamine compound and an acid dianhydride in an organic polar solvent in an inert atmosphere such as argon or nitrogen.

【0026】各成分の添加順序は特に限定されず、酸二
無水物を有機極性溶媒中に先に加えておき、ジアミン化
合物を添加し、ポリアミド酸重合体の溶液としても良い
し、ジアミン化合物の一部を有機極性溶媒中に先に適量
加えて、次に酸二無水物を加え、最後に残りのジアミン
化合物を加えて、ポリアミド酸重合体の溶液としても良
い。この他にも、当業者に公知の様々な重合方法があ
る。
The order of addition of each component is not particularly limited. An acid dianhydride is first added to an organic polar solvent, and a diamine compound is added to form a solution of a polyamic acid polymer. A suitable amount may be added first to an organic polar solvent, then an acid dianhydride is added, and finally, the remaining diamine compound is added to form a solution of a polyamic acid polymer. There are various other polymerization methods known to those skilled in the art.

【0027】ポリアミド酸溶液の生成反応に用いられる
有機極性溶媒としては、例えば、ジメチルスルホキシ
ド、ジエチルスルホキシド等のスルホキシド系溶媒、
N,N−ジメチルホルムアミド、N,N−ジエチルホル
ムアミド等のホルムアミド系溶媒、N,N−ジメチルア
セトアミド、N,N−ジエチルアセトアミド等のアセト
アミド系溶媒、N−メチル−2−ピロリドン等のピロリ
ドン系溶媒、フェノール、o−,m−またはp−クレゾ
ール、キシノール、ハロゲン化フェノール、カテコール
等のフェノール系溶媒、あるいはヘキサメチルホスホル
アミド、γ−ブチロラクトン等を挙げることができる。
更に必要に応じて、これらの有機極性溶媒とキシレンあ
るいはトルエン等の芳香族炭化水素とを組み合わせて用
いることもできる。
Examples of the organic polar solvent used in the reaction for producing the polyamic acid solution include sulfoxide solvents such as dimethyl sulfoxide and diethyl sulfoxide.
Formamide solvents such as N, N-dimethylformamide and N, N-diethylformamide; acetamido solvents such as N, N-dimethylacetamide and N, N-diethylacetamide; and pyrrolidone solvents such as N-methyl-2-pyrrolidone Phenol, o-, m- or p-cresol, xinol, halogenated phenols, phenols such as catechol, or hexamethylphosphoramide, γ-butyrolactone.
Further, if necessary, these organic polar solvents can be used in combination with an aromatic hydrocarbon such as xylene or toluene.

【0028】上記で得られたポリアミド酸重合体を、熱
的または化学的方法により、脱水閉環し、熱可塑性ポリ
イミドを得る。イミド化の方法としては、ポリアミド酸
溶液を加熱処理して脱水する熱的方法、脱水剤を用いて
脱水する化学的方法のいずれも用いられるが、イミド化
率が90%以上であることが必須である。化学的方法に
よる脱水剤としては、例えば、無水酢酸等の脂肪族酸無
水物、および芳香族酸無水物が挙げられる。また、触媒
としては、トリエチルアミン等の脂肪族第3級アミン
類、ジメチルアニリン等の芳香族第3級アミン類、ピリ
ジン、イソキノリン等の複素環第3級アミン類等が挙げ
られる。上記のようにして得られた熱可塑性ポリイミド
はそのまま溶液として本発明のポリイミド系接着剤溶液
の調製に用いることができる。あるいはポリアミド酸の
重合に用いた、溶媒を良く溶かすが、ポリイミドが溶解
しにくい貧溶媒中に、ポリイミド溶液を投入して、ポリ
イミド樹脂を析出させて未反応モノマーを取り除いて精
製し、乾燥させ固形のポリイミド樹脂としてから、適
宜、本発明の接着剤溶液に用いることもできる。用いる
貧溶媒としては、アセトン、メタノール、エタノール、
イソプロパノール、ベンゼン、メチルセロソルブ、メチ
ルエチルケトン等が挙げられる。
The polyamic acid polymer obtained above is dehydrated and ring-closed by a thermal or chemical method to obtain a thermoplastic polyimide. As a method for imidation, any of a thermal method of heat-treating a polyamic acid solution and dehydration using a dehydrating agent is used, and an imidization ratio of 90% or more is essential. It is. Examples of the dehydrating agent by a chemical method include aliphatic acid anhydrides such as acetic anhydride, and aromatic acid anhydrides. Examples of the catalyst include aliphatic tertiary amines such as triethylamine, aromatic tertiary amines such as dimethylaniline, and heterocyclic tertiary amines such as pyridine and isoquinoline. The thermoplastic polyimide obtained as described above can be used as it is as a solution for preparing the polyimide adhesive solution of the present invention. Alternatively, the solvent used for the polymerization of the polyamic acid is dissolved well, but the polyimide solution is poured into a poor solvent in which the polyimide is difficult to dissolve, the polyimide resin is precipitated, the unreacted monomer is removed, purified, dried and solidified. Can be used in the adhesive solution of the present invention as appropriate. As poor solvents used, acetone, methanol, ethanol,
Isopropanol, benzene, methyl cellosolve, methyl ethyl ketone and the like.

【0029】熱的方法としては、例えば、ポリアミド酸
を重合した後に真空オーブン中に投入し、減圧下で加熱
することによってイミド化を行い、固形のポリイミド樹
脂として取り出す手法が挙げられる。
As a thermal method, for example, there is a method in which a polyamic acid is polymerized, then put into a vacuum oven, heated under reduced pressure, imidized, and taken out as a solid polyimide resin.

【0030】本発明の熱可塑性ポリイミド溶液に配合し
うるエポキシ樹脂は、ポリイミド溶液に溶解するもので
あれば特に限定はなく、エピコート828(油化シェル
社製)等のビスフェノールA型樹脂、YX4000H
(油化シェル社製)等のビフェノール型樹脂180S6
5(油化シェル社製)等のオルソクレゾールノボラック
樹脂、157S70(油化シェル社製)等のビスフェノ
ールAノボラック樹脂、1032H60(油化シェル社
製)等のトリスヒドロキシフェニルメタンノボラック樹
脂、ESN375等のナフタレンアラルキルノボラック
樹脂、ESN−375(新日鉄化学社製)等のナフタレ
ンアラキルノボラック樹脂、テトラフェニロールエタン
1031S(油化シェル社製)、YGD414S(東都
化成)、トリスヒドロキシフェニルメタンEPPN50
2H(日本化薬)、特殊ビスフェノールVG3101L
(三井化学)、特殊ナフトールNC7000(日本化
薬)、TETRAD−X,TETRAD−C(三菱瓦斯
化学社製)等のグリシジルアミン型樹脂などが代表例と
して挙げられる。
The epoxy resin which can be blended in the thermoplastic polyimide solution of the present invention is not particularly limited as long as it can be dissolved in the polyimide solution. Bisphenol A type resin such as Epicoat 828 (manufactured by Yuka Shell Co., Ltd.), YX4000H
Bisphenol type resin 180S6 such as (manufactured by Yuka Shell)
Orthocresol novolak resin such as No. 5 (manufactured by Yuka Shell), bisphenol A novolak resin such as 157S70 (manufactured by Yuka Shell), trishydroxyphenylmethane novolak resin such as 1032H60 (manufactured by Yuka Shell), ESN375 and the like. Naphthalene aralkyl novolak resin, naphthalene aralkyl novolak resin such as ESN-375 (manufactured by Nippon Steel Chemical), tetraphenylolethane 1031S (manufactured by Yuka Shell), YGD414S (Toto Kasei), trishydroxyphenylmethane EPPN50
2H (Nippon Kayaku), special bisphenol VG3101L
Glycidylamine type resins such as (Mitsui Chemicals), specialty naphthol NC7000 (Nippon Kayaku), TETRAD-X, TETRAD-C (manufactured by Mitsubishi Gas Chemical Co., Ltd.) and the like are mentioned as typical examples.

【0031】エポキシ樹脂の混合割合は、熱可塑性ポリ
イミドの樹脂固形分100重量部に対して、1〜50重
量部、好ましくは5〜30重量部が望ましい。少なすぎ
ると接着強度が低く、多すぎると可撓性、耐熱性に劣る
傾向にある。
The mixing ratio of the epoxy resin is preferably 1 to 50 parts by weight, more preferably 5 to 30 parts by weight, based on 100 parts by weight of the solid content of the thermoplastic polyimide resin. If the amount is too small, the adhesive strength tends to be low. If the amount is too large, flexibility and heat resistance tend to be poor.

【0032】また、本発明の熱可塑性ポリイミド溶液に
配合しうる硬化剤としては、ポリイミド溶液に溶解する
ものであればよく、一般にエポキシ樹脂用の硬化剤とし
て用いられているものであれば何でも良い。硬化剤は、
吸水性、耐熱性、接着性等の向上のために接着剤溶液に
加えられ、代表的には酸二無水物系、アミン系、イミダ
ゾール系等のエポキシ用の一般的な硬化剤、促進剤、あ
るいは種々のカップリング剤が挙げられる。
The curing agent that can be blended with the thermoplastic polyimide solution of the present invention may be any one that is soluble in the polyimide solution, and any one that is generally used as a curing agent for epoxy resins. . The curing agent is
Water absorption, heat resistance, added to the adhesive solution for the purpose of improving the adhesiveness, etc., typically a general curing agent for epoxy such as acid dianhydride type, amine type, imidazole type, accelerator, accelerator, Alternatively, various coupling agents can be used.

【0033】以上、本発明のポリイミド系接着剤溶液の
各組成についての説明をしたが、接着剤溶液の濃度は溶
液重量を分母とする固形分(熱可塑性ポリイミド+エポ
キシ樹脂+硬化剤)量で5〜50重量%、好ましくは1
0〜40重量%、特に好ましくは15〜30重量%であ
る。また、溶解の手順等は作業性等を考慮し適宜決めれ
ばよい。
The composition of the polyimide-based adhesive solution of the present invention has been described above. The concentration of the adhesive solution is represented by the solid content (thermoplastic polyimide + epoxy resin + curing agent) whose denominator is the solution weight. 5 to 50% by weight, preferably 1
It is from 0 to 40% by weight, particularly preferably from 15 to 30% by weight. The dissolution procedure and the like may be appropriately determined in consideration of workability and the like.

【0034】本発明のフィルム状積層部材を得る方法と
しては、上記のポリイミド接着剤溶液を高分子フィルム
や金属製の支持体上に流延または塗布し、乾燥後の接着
剤塗膜を支持体より引き剥がして得る方法、或いはポリ
イミド系接着剤溶液をポリイミドフィルムの少なくとも
片面に流延または塗布し、その後乾燥してポリイミド系
接着剤層を表面に有するポリイミドフィルムベースのフ
ィルム状積層部材として得る方法が挙げられる。前者の
場合に得られるフィルム状積層部材はポリイミド系接着
剤の単層フィルムであり、これをポリイミドフィルムと
ラミネートして後者と同様の構成のフィルム状積層部材
にすることも出来るが、いずれにせよポリイミドフィル
ムベースのフィルム状積層部材表面のポリイミド系接着
剤層の厚みとしては5〜30μmが適当である。厚みが
薄すぎると接着性が低下することがあり、厚みが厚すぎ
ると有機溶媒の乾燥除去が困難になったり発泡が生じた
りする。
As a method of obtaining the film-like laminated member of the present invention, the above-mentioned polyimide adhesive solution is cast or applied on a polymer film or a metal support, and the dried adhesive coating is dried on the support. A method of obtaining a polyimide-based adhesive film by peeling or applying a polyimide-based adhesive solution to at least one surface of a polyimide film, followed by drying to obtain a polyimide-film-based film-like laminated member having a polyimide-based adhesive layer on the surface. Is mentioned. The film-like laminated member obtained in the former case is a single-layer film of a polyimide-based adhesive, which can be laminated with a polyimide film to form a film-like laminated member having the same configuration as the latter, but in any case. The thickness of the polyimide-based adhesive layer on the surface of the polyimide-film-based laminated member is suitably 5 to 30 μm. If the thickness is too small, the adhesiveness may be reduced. If the thickness is too large, it is difficult to remove and dry the organic solvent or foaming may occur.

【0035】上記のようにして得られる本発明にかかる
フィルム状積層部材は、TAB用テープ、複合リードフ
レーム、積層材料等に好適に用いられ得る特性を有す
る。具体的には、低吸水率を示し、また半田耐熱性に優
れ、且つ耐熱性、接着性ともに優れており、接着剤とし
て使用する際に約250℃以下の温度で接着可能であ
る。
The film-like laminated member according to the present invention obtained as described above has characteristics that can be suitably used for TAB tapes, composite lead frames, laminated materials and the like. Specifically, it shows a low water absorption, has excellent solder heat resistance, and is excellent in both heat resistance and adhesiveness, and can be bonded at a temperature of about 250 ° C. or less when used as an adhesive.

【0036】本発明のフィルム状積層部材は、上記フィ
ルム状積層部材に金属箔や別のフィルム、印刷回路基板
等を加熱加圧して接着することで得られる。金属箔とし
ては、例えば銅箔・アルミ箔・42合金等が挙げられ
る。フィルムの種類は特に限定されず、例えばポリイミ
ドフィルムやポリエステルフィルム等が挙げられる。従
来のポリイミド系接着剤は、銅箔等の金属やポリイミド
等の樹脂フィルムに対して接着性が十分でなく、またエ
ポキシ樹脂との混合は、その難溶性により困難であった
が、本発明にかかるフィルム状積層部材は、銅箔等の金
属箔やポリイミドフィルムとの接着性が良好であり、さ
らに低温で接着しうる等、使用に際し加工性に優れる。
この場合の接着条件の一例を挙げると、加熱温度150
℃〜250℃、圧力0.1〜10MPaで加熱時間5〜
20分程度の条件である。
The film-shaped laminated member of the present invention can be obtained by bonding a metal foil, another film, a printed circuit board or the like to the above-mentioned film-shaped laminated member by heating and pressing. Examples of the metal foil include a copper foil, an aluminum foil, and a 42 alloy. The type of the film is not particularly limited, and examples thereof include a polyimide film and a polyester film. Conventional polyimide adhesives have insufficient adhesion to metals such as copper foil and resin films such as polyimide, and mixing with epoxy resin has been difficult due to its poor solubility. Such a film-like laminated member has excellent workability in use, such as good adhesion to a metal foil such as a copper foil or a polyimide film, and adhesion at a low temperature.
An example of the bonding condition in this case is as follows.
℃ ~ 250 ℃, pressure 0.1 ~ 10MPa, heating time 5 ~
The condition is about 20 minutes.

【0037】[0037]

【実施例】(実施例1) 容量1000mlのガラス製
フラスコにジメチルホルムアミド(以下、DMFとい
う)263gに3,3’−ビス(アミノフェノキシフェ
ニル)スルフォン(以下、BAPS−Mという)0.1
12molを加え、窒素雰囲気下で攪拌しながら、2,
2−ビス(4−ヒドロキシフェニル)プロパンジベンゾ
エート−3,3’,4,4’−テトラカルボン酸二無水
物(以下、ESDAという)0.112molを徐々に
添加した。氷浴下で30分間攪拌し、粘度が1500p
oiseに達したところで攪拌をやめ、ポリアミド酸溶
液を得た。このポリアミド酸溶液にDMF113g、β
−ピコリン26g、無水酢酸45gを加え30分間撹拌
した後、さらに100℃下で1時間撹拌し、イミド化さ
せた。その後、高速で撹拌したメタノール中にこの溶液
を少しづつ垂らした。メタノール中に析出した糸状のポ
リイミドをミキサーで粉砕し、メタノールでソックスレ
ー洗浄を行い、110℃で2時間乾燥させ、ポリイミド
粉末を得た。このポリイミド粉末のイミド化率は94%
であった。また、得られたポリイミドの20℃における
ジオキソランに対する溶解度が10%以上であることを
確認した。
(Example 1) In a glass flask having a capacity of 1000 ml, 263 g of dimethylformamide (hereinafter referred to as DMF) and 3,3'-bis (aminophenoxyphenyl) sulfone (hereinafter referred to as BAPS-M) 0.1 were added.
12 mol, and stirring under a nitrogen atmosphere.
0.112 mol of 2-bis (4-hydroxyphenyl) propanedibenzoate-3,3 ′, 4,4′-tetracarboxylic dianhydride (hereinafter referred to as ESDA) was gradually added. Stir for 30 minutes in an ice bath, viscosity 1500p
When the oil reached oise, the stirring was stopped to obtain a polyamic acid solution. 113 g of DMF and β
After adding 26 g of picoline and 45 g of acetic anhydride and stirring for 30 minutes, the mixture was further stirred at 100 ° C. for 1 hour to imidize. The solution was then dripped little by little into methanol stirred at high speed. The filamentous polyimide precipitated in methanol was pulverized with a mixer, washed with Soxhlet with methanol, and dried at 110 ° C. for 2 hours to obtain a polyimide powder. The imidation ratio of this polyimide powder is 94%
Met. In addition, it was confirmed that the solubility of the obtained polyimide in dioxolane at 20 ° C. was 10% or more.

【0038】上記で得たポリイミド粉末を20g、エピ
コート1032H60(油化シェル社製)を5g、4,
4’−ジアミノジフェニルスルフォン(硬化剤)1.5
gを102gのTHFに添加し、攪拌を行って溶解さ
せ、ポリイミド系接着剤溶液を得た(固形分濃度:SC
=20%)。 (実施例2) ジアミンとして1,3−ビス(3−アミ
ノフェノキシ)ベンゼンを用いる以外は実施例1と同様
にしてポリイミド粉末を得た。このポリイミド粉末のイ
ミド化率は93%であった。また、得られたポリイミド
の20℃におけるジオキソランに対する溶解度が10%
以上であることを確認した。得られたポリイミド粉末を
用い実施例1と同様にポリイミド系接着剤溶液を得た。 (実施例3) 実施例1と同様にポリアミック酸溶液を
得た。このポリアミド酸溶液300gを、テフロン(登
録商標)コートしたバットにとり、真空オーブンで、1
50℃1時間、180℃1時間、200℃で3時間、5
mmHgの圧力で減圧加熱した。得られたポリイミド樹
脂のイミド化率は97%であった。得られたポリイミド
粉末を用い実施例1と同様にポリイミド系接着剤溶液を
得た。 (実施例4) 有機溶媒としてTHFの代わりに1,4
−ジオキサンを使用した以外は実施例1と同じ手順でポ
リイミド系接着剤溶液を得た(固形分濃度:SC=20
%)。 (実施例5) 有機溶媒としてTHFの代わりにジオキ
ソランを使用した以外は実施例1と同じ手順でポリイミ
ド系接着剤溶液を得た(固形分濃度:SC=20%)。 (実施例6) 実施例1で得たポリイミド粉末を20
g、ナフタレンアラキルノボラック樹脂ESN−375
(新日鉄化学社製)を5g、4,4’−ジアミノジフェ
ニルスルフォン(硬化剤)1.5gを102gのTHF
に添加し、攪拌を行って溶解させ、ポリイミド系接着剤
溶液を得た(固形分濃度:SC=20%)。 (実施例7) 実施例1で得たポリイミド粉末を20
g、ビフェノールタイプエポキシ樹脂YX4000H
(油化シェル社製)を5g、4,4’−ジアミノジフェ
ニルスルフォン(硬化剤)1.5gを102gのTHF
に添加し、攪拌を行って溶解させ、ポリイミド系接着剤
溶液を得た(固形分濃度:SC=20%)。 (比較例1) 実施例1で得たポリアミック酸溶液30
0gを、テフロンコートしたバットにとり、真空オーブ
ンで、150℃、1時間、180℃で1時間、5mmH
gの圧力で減圧加熱した。得られたポリイミド樹脂のイ
ミド化率は75%であった。得られたポリイミド粉末を
用い実施例1と同様にポリイミド系接着剤溶液を得た。 (比較例2) 実施例1で得たポリアミック酸溶液30
0gを、テフロンコートしたバットにとり、真空オーブ
ンで、150℃1時間、180℃1時間、200℃で1
時間、5mmHgの圧力で減圧加熱した。得られたポリ
イミド樹脂のイミド化率は82%であった。得られたポ
リイミド粉末を用い実施例1と同様にポリイミド系接着
剤溶液を得た。 (比較例3) 酸二無水物成分をベンゾフェノンテトラ
カルボン酸二無水物(BTDA)にする以外は実施例1
と同様にポリイミド粉末を得た。このポリイミド粉末の
イミド化率は92%であった。このポリイミド粉末はT
HF、1,4−ジオキサン、1,3−ジオキソランに溶
解しなかった。 (比較例4) 酸二無水物成分をピロメリット酸二無水
物(PMDA)、ジアミン成分をジアミノジフェニルエ
ーテル(ODA)にする以外は実施例1と同様にポリイ
ミド粉末を得た。このポリイミド粉末のイミド化率は9
4%であった。このポリイミド粉末はTHF、1,4−
ジオキサン、1,3−ジオキソランに溶解しなかった。
20 g of the polyimide powder obtained above, 5 g of Epicoat 1032H60 (manufactured by Yuka Shell Co., Ltd.),
4'-diaminodiphenylsulfone (curing agent) 1.5
g was added to 102 g of THF, and dissolved by stirring. A polyimide-based adhesive solution was obtained (solid content concentration: SC
= 20%). (Example 2) A polyimide powder was obtained in the same manner as in Example 1 except that 1,3-bis (3-aminophenoxy) benzene was used as the diamine. The imidation ratio of this polyimide powder was 93%. Further, the solubility of the obtained polyimide in dioxolane at 20 ° C. is 10%.
It was confirmed that it was above. A polyimide-based adhesive solution was obtained in the same manner as in Example 1 using the obtained polyimide powder. (Example 3) A polyamic acid solution was obtained in the same manner as in Example 1. 300 g of this polyamic acid solution is placed in a vat coated with Teflon (registered trademark) and placed in a vacuum oven for 1 hour.
50 ° C for 1 hour, 180 ° C for 1 hour, 200 ° C for 3 hours, 5
It was heated under reduced pressure at a pressure of mmHg. The imidation ratio of the obtained polyimide resin was 97%. A polyimide-based adhesive solution was obtained in the same manner as in Example 1 using the obtained polyimide powder. (Example 4) 1,4 instead of THF as an organic solvent
A polyimide-based adhesive solution was obtained in the same procedure as in Example 1 except that dioxane was used (solid concentration: SC = 20)
%). Example 5 A polyimide-based adhesive solution was obtained in the same procedure as in Example 1 except that dioxolan was used instead of THF as the organic solvent (solid concentration: SC = 20%). (Example 6) The polyimide powder obtained in Example 1 was used for 20 times.
g, naphthalene aralkyl novolak resin ESN-375
5 g of Nippon Steel Chemical Co., Ltd. and 1.5 g of 4,4′-diaminodiphenylsulfone (curing agent) in 102 g of THF
To obtain a polyimide adhesive solution (solid content concentration: SC = 20%). (Example 7) The polyimide powder obtained in Example 1 was used for 20 times.
g, biphenol type epoxy resin YX4000H
5 g (manufactured by Yuka Shell Co.) and 1.5 g of 4,4′-diaminodiphenylsulfone (curing agent) in 102 g of THF
To obtain a polyimide adhesive solution (solid content concentration: SC = 20%). (Comparative Example 1) Polyamic acid solution 30 obtained in Example 1
0 g is placed on a Teflon-coated vat and placed in a vacuum oven at 150 ° C. for 1 hour, 180 ° C. for 1 hour, 5 mmH
Heated under reduced pressure at a pressure of g. The imidation ratio of the obtained polyimide resin was 75%. A polyimide-based adhesive solution was obtained in the same manner as in Example 1 using the obtained polyimide powder. (Comparative Example 2) Polyamic acid solution 30 obtained in Example 1
0 g was placed on a Teflon-coated vat and placed in a vacuum oven at 150 ° C. for 1 hour, 180 ° C. for 1 hour, and 200 ° C.
The mixture was heated under reduced pressure for 5 hours at a pressure of 5 mmHg. The imidation ratio of the obtained polyimide resin was 82%. A polyimide-based adhesive solution was obtained in the same manner as in Example 1 using the obtained polyimide powder. (Comparative Example 3) Example 1 except that the acid dianhydride component was changed to benzophenonetetracarboxylic dianhydride (BTDA).
In the same manner as above, a polyimide powder was obtained. The imidation ratio of this polyimide powder was 92%. This polyimide powder is T
It did not dissolve in HF, 1,4-dioxane, 1,3-dioxolane. (Comparative Example 4) A polyimide powder was obtained in the same manner as in Example 1, except that pyromellitic dianhydride (PMDA) was used as the acid dianhydride component and diaminodiphenyl ether (ODA) was used as the diamine component. The imidation ratio of this polyimide powder is 9
4%. This polyimide powder is THF, 1,4-
Dioxane did not dissolve in 1,3-dioxolane.

【0039】(フィルム状積層部材の作製) 各例で得
たポリイミド系接着剤溶液を25μm厚のポリイミドフ
ィルム(アピカル25AH、鐘淵化学工業社製)上に流
延し、100℃で10分間乾燥後、180℃で10分間
乾燥し、厚み30μmのフィルム状積層部材を得た。
(Preparation of Film Laminated Member) The polyimide adhesive solution obtained in each example was cast on a 25 μm-thick polyimide film (Apical 25AH, manufactured by Kaneka Corporation) and dried at 100 ° C. for 10 minutes. Thereafter, the film was dried at 180 ° C. for 10 minutes to obtain a film-shaped laminated member having a thickness of 30 μm.

【0040】なお、溶解しなかった比較例2、比較例3
に対応するフィルム状積層部材は作成しなかった。 (ポリイミドのイミド化率の評価)イミド化率は、赤外
線吸光分析法を用いて、式1から算出される。 (A/B)×100/(C/D)…・式1 式1中、A,B,C,Dは以下のものを表す。 A:対象物の1780cm-1の吸収ピーク高さ B:対象物の1500cm-1の吸収ピーク高さ C:化学イミド化ポリイミドの1780cm-1の吸収ピ
ーク高さ D:化学イミド化ポリイミドの1500cm-1の吸収ピ
ーク高さ 化学イミド化ポリイミド;対象とする熱可塑ポリイミ
ドを化学キュア法にて120℃、150℃、200℃、
300#C、350℃で各3分イミド化反応させたポリイ
ミド(この状態をイミド化率100%とする)。 (ポリイミド溶液の保存安定性評価)ポリイミド樹脂を
THFに固形分濃度20%で溶解させた後、20#C、6
0%RH環境下で1ヶ月放置したときの分子量変化を評
価した。 ●分子量評価 GPC条件: カラム:SHODEX KF−G 移動相:THF カラム温度:40℃ 流量:1.0ml/min. 検出器:RI (ポリイミド系接着剤溶液の保存安定性評価)ポリイミ
ド系接着剤を調合した後、1ヶ月放置した後、これを用
い銅張フレキシブル積層板を作製した。得られた銅張り
フレキシブル積層板の引き剥し強度を、JIS C64
81に従って測定し、放置前後の接着強度の変化をオー
トグラフS−110−C(島津製作所(株)製)にて評
価した。但し導体幅は3mmで測定した。
Comparative Examples 2 and 3 which did not dissolve
Was not prepared. (Evaluation of imidation rate of polyimide) The imidation rate is calculated from equation 1 using an infrared absorption spectroscopy. (A / B) × 100 / (C / D) Formula 1 In Formula 1, A, B, C, and D represent the following. A: absorption peak height of the object 1780 cm -1 B: absorption peak height of 1500 cm -1 of the object C: absorption peak height D of the chemical imidization of polyimide of 1780 cm -1: chemical imidization of polyimide 1500 cm - Absorption peak height of 1 * Chemically imidized polyimide; target thermoplastic polyimide by chemical curing method at 120 ° C, 150 ° C, 200 ° C,
A polyimide subjected to an imidization reaction at 300 ° C. and 350 ° C. for 3 minutes each (this state is defined as an imidation ratio of 100%). (Evaluation of storage stability of polyimide solution) After dissolving a polyimide resin in THF at a solid content concentration of 20%, 20 # C, 6
The change in molecular weight when left for 1 month in a 0% RH environment was evaluated. ● Molecular weight evaluation GPC conditions: Column: SHOdex KF-G Mobile phase: THF Column temperature: 40 ° C. Flow rate: 1.0 ml / min. Detector: RI (Evaluation of storage stability of polyimide-based adhesive solution) After preparing a polyimide-based adhesive and leaving it for one month, a copper-clad flexible laminate was prepared using this. The peel strength of the obtained copper-clad flexible laminate was measured according to JIS C64.
81, and the change in adhesive strength before and after standing was evaluated by Autograph S-110-C (manufactured by Shimadzu Corporation). However, the conductor width was measured at 3 mm.

【0041】(フィルム状積層部材の特性評価) ●引剥強度測定 以下の手順で積層部材と銅箔を接着し
たときの引剥強度の測定を行った。
(Evaluation of Characteristics of Film Laminated Member) Peel Strength Measurement The peel strength when the laminated member and the copper foil were adhered was measured in the following procedure.

【0042】フィルム状積層部材と18μmの電解銅箔
を、温度200℃、圧力3MPaで20分間加熱加圧
し、銅張フレキシブル積層板を得た。得られた銅張りフ
レキシブル積層板の引き剥し強度を、JIS C648
1に従って測定した。但し導体幅は3mmで測定した。
The film-like laminated member and the 18 μm electrolytic copper foil were heated and pressed at a temperature of 200 ° C. and a pressure of 3 MPa for 20 minutes to obtain a copper-clad flexible laminate. The peel strength of the obtained copper-clad flexible laminate was measured according to JIS C648.
Measured according to 1. However, the conductor width was measured at 3 mm.

【0043】実施例および比較例のフィルム状積層部材
の特性評価結果を表1に示す。
Table 1 shows the results of evaluating the characteristics of the film-like laminated members of the examples and comparative examples.

【0044】[0044]

【表1】 [Table 1]

【0045】[0045]

【発明の効果】本発明のポリイミド溶液は保存安定性に
優れ、常温放置下においても、分子量低下を生じない。
また、このポリイミド溶液を用いたポリイミド系接着剤
溶液も長期保存後でも優れた接着力を発現する。
The polyimide solution of the present invention has excellent storage stability and does not cause a decrease in molecular weight even at room temperature.
In addition, a polyimide-based adhesive solution using this polyimide solution also exhibits excellent adhesive strength even after long-term storage.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C08K 5/00 C08K 5/00 C09J 163/00 C09J 163/00 179/08 179/08 Z // B29K 79:00 B29K 79:00 B29L 7:00 B29L 7:00 Fターム(参考) 4F100 AK49B AK53B AL05B AT00A BA02 CA02B CA02H CB03B GB41 JB16B JJ03 JK13B JL11 JL12B 4F205 AA39 AA40K AG01 GA07 GB02 GE24 GF24 GN29 4J002 CM041 EL066 EL106 EP016 FD206 GJ01 HA03 4J040 EC002 EH031 KA16 KA23 LA01 LA06 LA08 NA19 4J043 PA02 PA04 PA19 QB15 QB26 RA35 SA06 SB01 SB02 TA22 TA32 TB01 TB02 UA132 UA141 UA151 UA152 UA262 UB011 UB012 UB021 UB022 UB061 UB121 UB151 UB161 UB162 UB221 UB281 UB301 UB402 VA031 VA032 VA061 VA062 VA101 VA102 XA16 XA17 XA19 YA06 YA08 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C08K 5/00 C08K 5/00 C09J 163/00 C09J 163/00 179/08 179/08 Z // B29K 79 : 00 B29K 79:00 B29L 7:00 B29L 7:00 F term (reference) 4F100 AK49B AK53B AL05B AT00A BA02 CA02B CA02H CB03B GB41 JB16B JJ03 JK13B JL11 JL12B 4F205 AA39 AA40K AG01 GA07 GB02 GE24 EL01 GF24 EG24 EG24 GF24 HA03 4J040 EC002 EH031 KA16 KA23 LA01 LA06 LA08 NA19 4J043 PA02 PA04 PA19 QB15 QB26 RA35 SA06 SB01 SB02 TA22 TA32 TB01 TB02 UA132 UA141 UA151 UA152 UA262 UB01 VA UB012 UB02A 101 UB121 UB211 XA19 YA06 YA08

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】 イミド化率が90%以上であり、テトラ
ヒドロフラン、1,4−ジオキサン、ジオキソラン、
N,N−ジメチルホルムアミド、N,N−ジメチルアセ
トアミドから選ばれる少なくとも一種の溶媒に対する、
20#Cにおける溶解度が10%以上である熱可塑性ポリ
イミドが有機溶剤に溶解した熱可塑性ポリイミド溶液で
あって、20#C、60%RH環境下で1ヶ月放置後の分
子量の低下が30%以下であることを特徴とする熱可塑
ポリイミド溶液。
1. The method according to claim 1, wherein the imidation ratio is 90% or more, and tetrahydrofuran, 1,4-dioxane, dioxolan,
For at least one solvent selected from N, N-dimethylformamide and N, N-dimethylacetamide,
A thermoplastic polyimide solution in which a thermoplastic polyimide having a solubility at 20 # C of 10% or more is dissolved in an organic solvent, and a decrease in molecular weight after leaving for 1 month in an environment of 20 # C and 60% RH is 30% or less. A thermoplastic polyimide solution, characterized in that:
【請求項2】前記熱可塑性ポリイミドが酸二無水物を原
料とするポリイミドであって、全酸二無水物の50モル
%以上が一般式(1) 【化1】 (式中、Xは−(CH2)k−、または芳香環を含む二
価の基を示し、kは1以上10以下の整数である。)で
表されるエステル酸二無水物であることを特徴とする請
求項1記載の熱可塑ポリイミド溶液。
2. The thermoplastic polyimide is a polyimide made from an acid dianhydride, wherein 50 mol% or more of the total acid dianhydride is represented by the general formula (1): ## STR1 ## (Wherein, X represents — (CH 2 ) k — or a divalent group containing an aromatic ring, and k is an integer of 1 or more and 10 or less). The thermoplastic polyimide solution according to claim 1, wherein:
【請求項3】 熱可塑性ポリイミドが、前記一般式
(1)で表されるエステル酸二無水物と下記一般式
(2) 【化2】 (式中、Yは同一または異なって、−C(=O)−、−
SO2−、−O−、−S−、−(CH2m−、−NHC
O−、−C(CH32−、−C(CF32−、−C(=
O)O−、または単結合から選ばれる少なくとも一種に
結合を示す。mおよびnは1以上5以下の整数であ
る。)で表されるジアミン化合物を原料として得られる
ポリイミドであることを特徴とする請求項1または請求
項2に記載の熱可塑性ポリイミド溶液。
3. A thermoplastic polyimide comprising an ester dianhydride represented by the above general formula (1) and the following general formula (2): (Wherein Y is the same or different, and -C (= O)-,-
SO 2 —, —O—, —S—, — (CH 2 ) m —, —NHC
O -, - C (CH 3 ) 2 -, - C (CF 3) 2 -, - C (=
O) A bond is shown to at least one selected from O- or a single bond. m and n are integers of 1 or more and 5 or less. The thermoplastic polyimide solution according to claim 1 or 2, which is a polyimide obtained using a diamine compound represented by the formula (1) as a raw material.
【請求項4】 熱可塑性ポリイミドが、下記式(3) 【化3】 で表されるエステル酸二無水物と、前記一般式(2)で
表されるジアミン化合物を原料として得られるポリイミ
ドであることを特徴とする請求項3に記載のポリイミド
溶液。
4. The thermoplastic polyimide is represented by the following formula (3): 4. The polyimide solution according to claim 3, wherein the polyimide solution is obtained by using an ester dianhydride represented by the following formula and a diamine compound represented by the general formula (2) as raw materials. 5.
【請求項5】 請求項1〜4に記載のポリイミド溶液に
熱硬化性樹脂と硬化剤を混合して得られるポリイミド系
接着剤溶液。
5. A polyimide adhesive solution obtained by mixing a thermosetting resin and a curing agent with the polyimide solution according to claim 1.
【請求項6】 熱硬化性樹脂がエポキシ系樹脂であるこ
とを特徴とする請求項5記載のポリイミド系接着剤溶
液。
6. The polyimide adhesive solution according to claim 5, wherein the thermosetting resin is an epoxy resin.
【請求項7】請求項5または6記載のポリイミド系接着
剤溶液であって、常温で1ヶ月放置後の分子量の低下が
30%以下であることを特徴とするポリイミド系接着剤
溶液。
7. The polyimide-based adhesive solution according to claim 5, wherein the decrease in molecular weight after leaving at room temperature for one month is 30% or less.
【請求項8】請求項5〜7のいずれか一項に記載のポリ
イミド系接着剤溶液を、支持体上に流延または塗布し、
乾燥後の接着剤塗膜を支持体より引き剥がして得られる
フィルム状積層部材。
8. The polyimide-based adhesive solution according to any one of claims 5 to 7, which is cast or coated on a support,
A film-like laminated member obtained by peeling a dried adhesive coating film from a support.
【請求項9】 請求項5〜7に記載のポリイミド系接着
剤溶液を、ポリイミドフィルムの少なくとも片面に流延
または塗布し、その後乾燥して得られるポリイミド系接
着剤層を表面に有するフィルム状積層部材。
9. A film-like laminate having on its surface a polyimide-based adhesive layer obtained by casting or applying the polyimide-based adhesive solution according to claim 5 on at least one surface of a polyimide film and then drying. Element.
【請求項10】 ポリイミド系接着剤層が5〜30μm
である請求項9に記載のフィルム状積層部材。
10. The polyimide adhesive layer has a thickness of 5 to 30 μm.
The film-shaped laminated member according to claim 9, which is:
JP2000248797A 2000-08-18 2000-08-18 Polyimide solution excellent in storage stability, polyimide-based adhesive solution and film-like laminated member obtained using the same Pending JP2002060620A (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004094499A1 (en) * 2003-04-18 2004-11-04 Kaneka Corporation Thermosetting resin composition, multilayer body using same, and circuit board
JP2005047995A (en) * 2003-07-30 2005-02-24 Kaneka Corp Heat-resistant resin composition having improved flame retardancy and its utilization
JP2006137102A (en) * 2004-11-12 2006-06-01 Kaneka Corp Method for producing polyimide laminate excellent in surface properties
JP2006291179A (en) * 2005-03-18 2006-10-26 Daicel Chem Ind Ltd Solution composition including polyether-imide resin
JP2012162680A (en) * 2011-02-08 2012-08-30 Hitachi Chemical Co Ltd Adhesive film for semiconductor, adhesive sheet, semiconductor wafer, and semiconductor device
JP2020001393A (en) * 2015-03-31 2020-01-09 旭化成株式会社 Manufacturing method of polyimide film

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001329246A (en) * 2000-05-25 2001-11-27 Kanegafuchi Chem Ind Co Ltd Curable resin composition for adhesive improved in moisture resistance, cured item obtained therefrom, and production method thereof
JP2002053818A (en) * 2000-08-04 2002-02-19 Kanegafuchi Chem Ind Co Ltd Adhesive composition

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001329246A (en) * 2000-05-25 2001-11-27 Kanegafuchi Chem Ind Co Ltd Curable resin composition for adhesive improved in moisture resistance, cured item obtained therefrom, and production method thereof
JP2002053818A (en) * 2000-08-04 2002-02-19 Kanegafuchi Chem Ind Co Ltd Adhesive composition

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004094499A1 (en) * 2003-04-18 2004-11-04 Kaneka Corporation Thermosetting resin composition, multilayer body using same, and circuit board
KR100797689B1 (en) * 2003-04-18 2008-01-23 가부시키가이샤 가네카 Thermosetting Resin Composition, Multilayer Body Using Same, and Circuit Board
US7521511B2 (en) 2003-04-18 2009-04-21 Kaneka Corporation Thermosetting resin composition, multilayer body using same, and circuit board
US8501874B2 (en) 2003-04-18 2013-08-06 Kaneka Corporation Thermosetting resin composition, multilayer body using same, and circuit board
JP2005047995A (en) * 2003-07-30 2005-02-24 Kaneka Corp Heat-resistant resin composition having improved flame retardancy and its utilization
JP2006137102A (en) * 2004-11-12 2006-06-01 Kaneka Corp Method for producing polyimide laminate excellent in surface properties
JP2006291179A (en) * 2005-03-18 2006-10-26 Daicel Chem Ind Ltd Solution composition including polyether-imide resin
JP2012162680A (en) * 2011-02-08 2012-08-30 Hitachi Chemical Co Ltd Adhesive film for semiconductor, adhesive sheet, semiconductor wafer, and semiconductor device
JP2020001393A (en) * 2015-03-31 2020-01-09 旭化成株式会社 Manufacturing method of polyimide film

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