JP2002543381A5 - - Google Patents
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- Publication number
- JP2002543381A5 JP2002543381A5 JP2000614020A JP2000614020A JP2002543381A5 JP 2002543381 A5 JP2002543381 A5 JP 2002543381A5 JP 2000614020 A JP2000614020 A JP 2000614020A JP 2000614020 A JP2000614020 A JP 2000614020A JP 2002543381 A5 JP2002543381 A5 JP 2002543381A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/298,007 US6734968B1 (en) | 1999-02-09 | 1999-04-22 | System for analyzing surface characteristics with self-calibrating capability |
| US09/298,007 | 1999-04-22 | ||
| PCT/US2000/010875 WO2000065331A2 (en) | 1999-04-22 | 2000-04-21 | System for analyzing surface characteristics with self-calibrating capability |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011104901A Division JP5368507B2 (ja) | 1999-04-22 | 2011-05-10 | 自己較正機能を備える表面特性解析用システム |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002543381A JP2002543381A (ja) | 2002-12-17 |
| JP2002543381A5 true JP2002543381A5 (enExample) | 2007-06-14 |
| JP5248722B2 JP5248722B2 (ja) | 2013-07-31 |
Family
ID=23148603
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000614020A Expired - Lifetime JP5248722B2 (ja) | 1999-04-22 | 2000-04-21 | 自己較正機能を備える表面特性解析用システム |
| JP2011104901A Expired - Lifetime JP5368507B2 (ja) | 1999-04-22 | 2011-05-10 | 自己較正機能を備える表面特性解析用システム |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011104901A Expired - Lifetime JP5368507B2 (ja) | 1999-04-22 | 2011-05-10 | 自己較正機能を備える表面特性解析用システム |
Country Status (2)
| Country | Link |
|---|---|
| JP (2) | JP5248722B2 (enExample) |
| WO (1) | WO2000065331A2 (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB0118981D0 (en) * | 2001-08-03 | 2001-09-26 | Renishaw Plc | Electron microscope and spectroscopy system |
| US6515744B2 (en) | 2001-02-08 | 2003-02-04 | Therma-Wave, Inc. | Small spot ellipsometer |
| EP1376100B1 (en) * | 2002-06-17 | 2006-04-05 | Horiba Jobin Yvon S.A.S. | Achromatic spectroscopic ellipsometer with high spatial resolution |
| US7369233B2 (en) | 2002-11-26 | 2008-05-06 | Kla-Tencor Technologies Corporation | Optical system for measuring samples using short wavelength radiation |
| US7577076B2 (en) | 2003-03-14 | 2009-08-18 | Ricoh Company, Ltd. | Tilt sensor using diffraction grating |
| JP2008275632A (ja) * | 2003-05-20 | 2008-11-13 | Dainippon Screen Mfg Co Ltd | 分光エリプソメータ |
| US7564552B2 (en) | 2004-05-14 | 2009-07-21 | Kla-Tencor Technologies Corp. | Systems and methods for measurement of a specimen with vacuum ultraviolet light |
| US7349079B2 (en) | 2004-05-14 | 2008-03-25 | Kla-Tencor Technologies Corp. | Methods for measurement or analysis of a nitrogen concentration of a specimen |
| US7067819B2 (en) | 2004-05-14 | 2006-06-27 | Kla-Tencor Technologies Corp. | Systems and methods for measurement or analysis of a specimen using separated spectral peaks in light |
| US7359052B2 (en) | 2004-05-14 | 2008-04-15 | Kla-Tencor Technologies Corp. | Systems and methods for measurement of a specimen with vacuum ultraviolet light |
| US7408641B1 (en) | 2005-02-14 | 2008-08-05 | Kla-Tencor Technologies Corp. | Measurement systems configured to perform measurements of a specimen and illumination subsystems configured to provide illumination for a measurement system |
| JP4779124B2 (ja) * | 2005-03-28 | 2011-09-28 | 国立大学法人東京農工大学 | 光学特性計測装置及び光学特性計測方法 |
| US7277172B2 (en) * | 2005-06-06 | 2007-10-02 | Kla-Tencor Technologies, Corporation | Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals |
| JP4926957B2 (ja) * | 2005-06-13 | 2012-05-09 | 国立大学法人宇都宮大学 | 光学特性計測装置及び光学特性計測方法 |
| US7298480B2 (en) * | 2005-12-23 | 2007-11-20 | Ecole Polytechnique | Broadband ellipsometer / polarimeter system |
| JP2009543092A (ja) * | 2006-07-11 | 2009-12-03 | ジェイ・エイ・ウーラム・カンパニー・インコーポレイテッド | 離散的偏光状態をとる回転可能な補償子型分光エリプソメーターシステム、及び較正方法 |
| WO2008081374A2 (en) * | 2006-12-28 | 2008-07-10 | Koninklijke Philips Electronics N.V. | Reflection or single scattering spectroscopy and imaging |
| JP5156306B2 (ja) * | 2007-09-14 | 2013-03-06 | 大塚電子株式会社 | 光学異方性測定装置および光学異方性測定方法 |
| JP2009103598A (ja) * | 2007-10-24 | 2009-05-14 | Dainippon Screen Mfg Co Ltd | 分光エリプソメータおよび偏光解析方法 |
| WO2009136901A1 (en) * | 2008-05-09 | 2009-11-12 | J.A. Woollam Co., Inc. | Fast sample height, aoi and poi alignment in mapping ellipsometer or the like |
| US8446584B2 (en) * | 2011-05-13 | 2013-05-21 | Kla-Tencor Corporation | Reconfigurable spectroscopic ellipsometer |
| US9400246B2 (en) * | 2011-10-11 | 2016-07-26 | Kla-Tencor Corporation | Optical metrology tool equipped with modulated illumination sources |
| JP6033890B2 (ja) * | 2012-02-21 | 2016-11-30 | エーエスエムエル ネザーランズ ビー．ブイ． | 検査装置及び方法 |
| CN102878940B (zh) * | 2012-09-29 | 2015-08-19 | 中国科学院微电子研究所 | 一种包含相位补偿器的椭圆偏振仪的校准方法 |
| CN102879337B (zh) * | 2012-09-29 | 2015-08-19 | 中国科学院微电子研究所 | 一种椭圆偏振仪的校准方法 |
| JP7136958B1 (ja) | 2021-03-24 | 2022-09-13 | アンリツ株式会社 | 光測定器用光源装置および光スペクトラムアナライザ |
| CN113514400B (zh) * | 2021-04-23 | 2022-10-11 | 长春理工大学 | 一种烟雾粒子穆勒矩阵的偏振测量方法 |
| KR20230030346A (ko) * | 2021-08-25 | 2023-03-06 | 삼성전자주식회사 | 편광 계측 장치 및 편광 계측 장치를 이용한 반도체 소자 제조 방법 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4306809A (en) * | 1979-03-26 | 1981-12-22 | The Board Of Regents Of The University Of Nebraska | Polarimeter |
| US4893932A (en) * | 1986-05-02 | 1990-01-16 | Particle Measuring Systems, Inc. | Surface analysis system and method |
| JP2661913B2 (ja) * | 1986-05-02 | 1997-10-08 | パ−テイクル、メジユアリング、システムズ インコ−ポレ−テツド | 表面分析方法および表面分析装置 |
| JPH07151674A (ja) * | 1993-11-30 | 1995-06-16 | Shimadzu Corp | 消光法式偏光測定装置 |
| US5608526A (en) * | 1995-01-19 | 1997-03-04 | Tencor Instruments | Focused beam spectroscopic ellipsometry method and system |
| US5581350A (en) * | 1995-06-06 | 1996-12-03 | Tencor Instruments | Method and system for calibrating an ellipsometer |
| AU6321298A (en) * | 1997-03-03 | 1998-09-22 | J.A. Woollam Company Incorporated | Regression calibrated spectroscopic rotating compensator ellipsometer system with photo array detector |
| US6184984B1 (en) * | 1999-02-09 | 2001-02-06 | Kla-Tencor Corporation | System for measuring polarimetric spectrum and other properties of a sample |
-
2000
- 2000-04-21 WO PCT/US2000/010875 patent/WO2000065331A2/en not_active Ceased
- 2000-04-21 JP JP2000614020A patent/JP5248722B2/ja not_active Expired - Lifetime
-
2011
- 2011-05-10 JP JP2011104901A patent/JP5368507B2/ja not_active Expired - Lifetime