JP2002539472A5 - - Google Patents

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Publication number
JP2002539472A5
JP2002539472A5 JP2000604256A JP2000604256A JP2002539472A5 JP 2002539472 A5 JP2002539472 A5 JP 2002539472A5 JP 2000604256 A JP2000604256 A JP 2000604256A JP 2000604256 A JP2000604256 A JP 2000604256A JP 2002539472 A5 JP2002539472 A5 JP 2002539472A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2000604256A
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Japanese (ja)
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JP2002539472A (ja
JP4640743B2 (ja
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Publication date
Priority claimed from US09/491,427 external-priority patent/US6392775B1/en
Application filed filed Critical
Publication of JP2002539472A publication Critical patent/JP2002539472A/ja
Publication of JP2002539472A5 publication Critical patent/JP2002539472A5/ja
Application granted granted Critical
Publication of JP4640743B2 publication Critical patent/JP4640743B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000604256A 1999-03-08 2000-03-08 微細加工ミラーの改良型光レフレクタ Expired - Fee Related JP4640743B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US12351499P 1999-03-08 1999-03-08
US60/123,514 1999-03-08
US09/491,427 2000-01-26
US09/491,427 US6392775B1 (en) 1998-01-13 2000-01-26 Optical reflector for micro-machined mirrors
PCT/US2000/005995 WO2000054090A1 (en) 1999-03-08 2000-03-08 Improved optical reflector for micro-machined mirrors

Publications (3)

Publication Number Publication Date
JP2002539472A JP2002539472A (ja) 2002-11-19
JP2002539472A5 true JP2002539472A5 (enExample) 2007-05-24
JP4640743B2 JP4640743B2 (ja) 2011-03-02

Family

ID=26821640

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000604256A Expired - Fee Related JP4640743B2 (ja) 1999-03-08 2000-03-08 微細加工ミラーの改良型光レフレクタ

Country Status (8)

Country Link
US (1) US6392775B1 (enExample)
JP (1) JP4640743B2 (enExample)
KR (1) KR100673675B1 (enExample)
CN (1) CN1160586C (enExample)
AU (1) AU3730100A (enExample)
DE (1) DE10084337T1 (enExample)
GB (1) GB2368070B (enExample)
WO (1) WO2000054090A1 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6937398B2 (en) 2001-04-26 2005-08-30 Intel Corporation Highly reflective optical components
JP4582380B2 (ja) * 2001-05-11 2010-11-17 ソニー株式会社 光変調素子とそれを用いた光学装置、および光変調素子の製造方法
JP4575628B2 (ja) * 2001-08-23 2010-11-04 株式会社リコー 光偏向器及びその製造方法、光走査モジュール、光走査装置、画像形成装置、画像表示装置
US7593029B2 (en) 2001-08-20 2009-09-22 Ricoh Company, Ltd. Optical scanning device and image forming apparatus using the same
US7145143B2 (en) * 2002-03-18 2006-12-05 Honeywell International Inc. Tunable sensor
CN100394214C (zh) * 2002-11-21 2008-06-11 台达电子工业股份有限公司 膜应力平衡镀膜方法以及应用该方法制造的光学组件
CN100410891C (zh) * 2002-12-09 2008-08-13 联想(北京)有限公司 计算机应用软件自纠错自重起方法
JP4251054B2 (ja) 2003-10-01 2009-04-08 株式会社デンソー 半導体装置の製造方法
KR100542559B1 (ko) * 2003-10-29 2006-01-11 삼성전자주식회사 반사기 및 이를 구비하는 화상형성장치의 광주사장치
WO2005112014A1 (ja) * 2004-05-14 2005-11-24 Fujitsu Limited 光照射ヘッド、情報記憶装置、光照射ヘッド設計装置、および光照射ヘッド設計プログラム
JP4860268B2 (ja) * 2006-01-13 2012-01-25 富士フイルム株式会社 プリズムの製造方法、プリズム、光ピックアップ及び液晶プロジェクタ
US20100246036A1 (en) * 2007-07-27 2010-09-30 Lagana Paolo Preliminary Controlled Pre-Deformation Treatment for the Production of Mirrors
JP5655365B2 (ja) * 2009-08-04 2015-01-21 セイコーエプソン株式会社 光偏向器、光偏向器の製造方法および画像表示装置
JP2012042584A (ja) * 2010-08-17 2012-03-01 Seiko Epson Corp 光フィルター、光フィルターモジュール、分光測定器および光機器
CN103620481A (zh) * 2011-06-03 2014-03-05 Hoya株式会社 塑料透镜
CN103777266A (zh) * 2014-01-24 2014-05-07 大连波能激光光学有限公司 一种反射相位延迟镜及其制备方法
JP2016081054A (ja) * 2014-10-13 2016-05-16 台達電子工業股▲ふん▼有限公司Delta Electronics,Inc. 光波長変換デバイス及びこれを用いた照明システム
JP7068660B2 (ja) * 2016-09-12 2022-05-17 ソニーグループ株式会社 光学補償素子、液晶ライトバルブ組立体及び液晶プロジェクタ装置
CN108149197B (zh) * 2017-12-22 2020-06-09 武汉大学 一种激光发生器反射板制作方法
DE102018211325A1 (de) * 2018-07-10 2020-01-16 Robert Bosch Gmbh Fabry-Perot-Interferometer-Einheit und Verfahren zur Herstellung einer Fabry-Perot-Interferometer-Einheit
JP7563261B2 (ja) * 2021-03-19 2024-10-08 株式会社リコー 光偏向素子、画像投影装置、ヘッドアップディスプレイ、レーザヘッドランプ、ヘッドマウントディスプレイ、物体認識装置および移動体
WO2025197615A1 (ja) * 2024-03-18 2025-09-25 パナソニックIpマネジメント株式会社 光学反射素子

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4309075A (en) 1979-10-05 1982-01-05 Optical Coating Laboratory, Inc. Multilayer mirror with maximum reflectance
US4441791A (en) * 1980-09-02 1984-04-10 Texas Instruments Incorporated Deformable mirror light modulator
US4963012A (en) * 1984-07-20 1990-10-16 The United States Of America As Represented By The United States Department Of Energy Passivation coating for flexible substrate mirrors
US4547432A (en) * 1984-07-31 1985-10-15 The United States Of America As Represented By The United States Department Of Energy Method of bonding silver to glass and mirrors produced according to this method
US5835255A (en) * 1986-04-23 1998-11-10 Etalon, Inc. Visible spectrum modulator arrays
JP2620712B2 (ja) * 1988-11-08 1997-06-18 株式会社 トプコン 2波長反射防止多層膜
JPH02287301A (ja) * 1989-04-27 1990-11-27 Copal Co Ltd 入射角非依存性高反射率誘電体多層膜反射鏡
JPH02297501A (ja) * 1989-05-12 1990-12-10 Copal Co Ltd 反射鏡
US5216551A (en) * 1990-02-16 1993-06-01 Asahi Kogaku Kogyo K.K. Surface reflector
JP3120882B2 (ja) * 1991-10-31 2000-12-25 旭光学工業株式会社 表面高反射鏡
GB2261079B (en) * 1991-10-31 1995-06-14 Asahi Optical Co Ltd Surface reflecting mirror
US5311360A (en) 1992-04-28 1994-05-10 The Board Of Trustees Of The Leland Stanford, Junior University Method and apparatus for modulating a light beam
US6219015B1 (en) * 1992-04-28 2001-04-17 The Board Of Directors Of The Leland Stanford, Junior University Method and apparatus for using an array of grating light valves to produce multicolor optical images
FR2712990B1 (fr) 1993-11-22 1996-04-05 Commissariat Energie Atomique Miroir à large bande et à haute réflectivité et procédé de réalisation d'un tel miroir.
US5500761A (en) * 1994-01-27 1996-03-19 At&T Corp. Micromechanical modulator
US5936159A (en) 1994-03-09 1999-08-10 Nippondenso Co., Ltd. Semiconductor sensor having multi-layer movable beam structure film
US5619059A (en) * 1994-09-28 1997-04-08 National Research Council Of Canada Color deformable mirror device having optical thin film interference color coatings
JP3691544B2 (ja) 1995-04-28 2005-09-07 アジレント・テクノロジーズ・インク 面発光レーザの製造方法
US5841579A (en) * 1995-06-07 1998-11-24 Silicon Light Machines Flat diffraction grating light valve
US5922212A (en) 1995-06-08 1999-07-13 Nippondenso Co., Ltd Semiconductor sensor having suspended thin-film structure and method for fabricating thin-film structure body
US6142642A (en) * 1995-06-29 2000-11-07 Cardinal Ig Company Bendable mirrors and method of manufacture
FR2737019B1 (fr) 1995-07-19 1997-08-22 Commissariat Energie Atomique Microelements de balayage pour systeme optique
US5739945A (en) 1995-09-29 1998-04-14 Tayebati; Parviz Electrically tunable optical filter utilizing a deformable multi-layer mirror
US5825528A (en) 1995-12-26 1998-10-20 Lucent Technologies Inc. Phase-mismatched fabry-perot cavity micromechanical modulator
US5636051A (en) * 1996-01-03 1997-06-03 Daewoo Electronics Co., Ltd Thin film actuated mirror array having dielectric layers
US5850309A (en) * 1996-03-27 1998-12-15 Nikon Corporation Mirror for high-intensity ultraviolet light beam
US5872880A (en) * 1996-08-12 1999-02-16 Ronald S. Maynard Hybrid-optical multi-axis beam steering apparatus
GB2324882B (en) * 1997-04-29 2001-05-23 Daewoo Electronics Co Ltd Array of thin film actuated mirrors and method for the manufacture thereof
KR19990004774A (ko) * 1997-06-30 1999-01-25 배순훈 박막형 광로 조절 장치의 제조 방법
US6075639A (en) * 1997-10-22 2000-06-13 The Board Of Trustees Of The Leland Stanford Junior University Micromachined scanning torsion mirror and method
US5998906A (en) * 1998-01-13 1999-12-07 Seagate Technology, Inc. Electrostatic microactuator and method for use thereof
US6011646A (en) * 1998-02-20 2000-01-04 The Regents Of The Unviersity Of California Method to adjust multilayer film stress induced deformation of optics

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