JP2002526363A - 溶融シリカガラスのブールを製造するためのバーナ - Google Patents
溶融シリカガラスのブールを製造するためのバーナInfo
- Publication number
- JP2002526363A JP2002526363A JP2000574032A JP2000574032A JP2002526363A JP 2002526363 A JP2002526363 A JP 2002526363A JP 2000574032 A JP2000574032 A JP 2000574032A JP 2000574032 A JP2000574032 A JP 2000574032A JP 2002526363 A JP2002526363 A JP 2002526363A
- Authority
- JP
- Japan
- Prior art keywords
- burner
- region
- oxygen
- mixture
- soot
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000005350 fused silica glass Substances 0.000 title description 10
- 239000007789 gas Substances 0.000 claims abstract description 35
- 238000000034 method Methods 0.000 claims abstract description 26
- 239000001301 oxygen Substances 0.000 claims description 62
- 229910052760 oxygen Inorganic materials 0.000 claims description 62
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 61
- 239000002245 particle Substances 0.000 claims description 52
- 239000004071 soot Substances 0.000 claims description 51
- 239000000203 mixture Substances 0.000 claims description 36
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 33
- 239000000567 combustion gas Substances 0.000 claims description 26
- 238000010943 off-gassing Methods 0.000 claims description 20
- 239000000377 silicon dioxide Substances 0.000 claims description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 12
- 229910052710 silicon Inorganic materials 0.000 claims description 12
- 239000010703 silicon Substances 0.000 claims description 12
- 239000011261 inert gas Substances 0.000 claims description 9
- 238000002485 combustion reaction Methods 0.000 claims 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 abstract description 13
- 239000011521 glass Substances 0.000 abstract description 9
- 239000003517 fume Substances 0.000 description 18
- 239000007858 starting material Substances 0.000 description 18
- 238000000151 deposition Methods 0.000 description 13
- 238000013461 design Methods 0.000 description 12
- 230000008021 deposition Effects 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 10
- 150000004820 halides Chemical class 0.000 description 9
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 230000006872 improvement Effects 0.000 description 5
- 238000009825 accumulation Methods 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 241001023788 Cyttus traversi Species 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000007596 consolidation process Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C03B19/1423—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/04—Multi-nested ports
- C03B2207/06—Concentric circular ports
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/04—Multi-nested ports
- C03B2207/10—Split ports
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/04—Multi-nested ports
- C03B2207/12—Nozzle or orifice plates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/04—Multi-nested ports
- C03B2207/14—Tapered or flared nozzles or ports angled to central burner axis
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
- C03B2207/22—Inert gas details
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
- C03B2207/24—Multiple flame type, e.g. double-concentric flame
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/42—Assembly details; Material or dimensions of burner; Manifolds or supports
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/46—Comprising performance enhancing means, e.g. electrostatic charge or built-in heater
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/50—Multiple burner arrangements
- C03B2207/52—Linear array of like burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/70—Control measures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10140398P | 1998-09-22 | 1998-09-22 | |
| US60/101,403 | 1998-09-22 | ||
| PCT/US1999/021658 WO2000017115A1 (en) | 1998-09-22 | 1999-09-17 | Burners for producing boules of fused silica glass |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002526363A true JP2002526363A (ja) | 2002-08-20 |
Family
ID=22284473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000574032A Withdrawn JP2002526363A (ja) | 1998-09-22 | 1999-09-17 | 溶融シリカガラスのブールを製造するためのバーナ |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1140715A4 (ko) |
| JP (1) | JP2002526363A (ko) |
| KR (1) | KR20010079889A (ko) |
| WO (1) | WO2000017115A1 (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020054861A1 (ja) * | 2018-09-14 | 2020-03-19 | 住友電気工業株式会社 | ガラス微粒子堆積体の製造方法及びガラス母材の製造方法 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6410192B1 (en) | 1999-11-15 | 2002-06-25 | Corning Incorporated | Photolithography method, photolithography mask blanks, and method of making |
| US6403508B1 (en) * | 2000-05-31 | 2002-06-11 | Corning Incorporated | Fused silica with constant induced absorption |
| KR100414668B1 (ko) | 2001-07-21 | 2004-01-07 | 삼성전자주식회사 | 화염가수분해증착 공정용 버너의 화염 안정화 장치 |
| US6735981B2 (en) | 2001-09-27 | 2004-05-18 | Corning Incorporated | High heat capacity burners for producing fused silica boules |
| US7053017B2 (en) | 2002-03-05 | 2006-05-30 | Corning Incorporated | Reduced striae extreme ultraviolet elements |
| US8567218B2 (en) | 2002-12-20 | 2013-10-29 | Prysmian Cavi E Sistemi Energia S.R.L. | Burner for chemical vapour deposition of glass |
| US20220098084A1 (en) * | 2020-05-20 | 2022-03-31 | Corning Incorporated | Methods for increasing deposition in a flame hydrolysis deposition process |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60215515A (ja) * | 1984-04-10 | 1985-10-28 | Mitsubishi Metal Corp | 合成石英素塊の製造法及びその装置 |
| US5043002A (en) * | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
| US5152819A (en) * | 1990-08-16 | 1992-10-06 | Corning Incorporated | Method of making fused silica |
| JP3133392B2 (ja) * | 1991-06-28 | 2001-02-05 | 古河電気工業株式会社 | 光ファイバ用スート母材の製造方法 |
| US5699183A (en) * | 1993-02-10 | 1997-12-16 | Nikon Corporation | Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production |
| JPH07133131A (ja) * | 1993-11-04 | 1995-05-23 | Fujikura Ltd | 光ファイバ母材の製法 |
| JP3520541B2 (ja) * | 1993-12-27 | 2004-04-19 | 株式会社ニコン | 石英ガラス製バーナー、これを用いて製造される石英ガラス、石英ガラスバーナーを用いた石英ガラスの製造方法 |
| US5599371A (en) * | 1994-12-30 | 1997-02-04 | Corning Incorporated | Method of using precision burners for oxidizing halide-free, silicon-containing compounds |
| JP3322538B2 (ja) * | 1995-09-25 | 2002-09-09 | 信越化学工業株式会社 | 球状シリカ微粒子製造用バーナー |
-
1999
- 1999-09-17 JP JP2000574032A patent/JP2002526363A/ja not_active Withdrawn
- 1999-09-17 WO PCT/US1999/021658 patent/WO2000017115A1/en not_active Application Discontinuation
- 1999-09-17 EP EP99969400A patent/EP1140715A4/en not_active Withdrawn
- 1999-09-17 KR KR1020017003641A patent/KR20010079889A/ko not_active Application Discontinuation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020054861A1 (ja) * | 2018-09-14 | 2020-03-19 | 住友電気工業株式会社 | ガラス微粒子堆積体の製造方法及びガラス母材の製造方法 |
| JPWO2020054861A1 (ja) * | 2018-09-14 | 2021-08-30 | 住友電気工業株式会社 | ガラス微粒子堆積体の製造方法及びガラス母材の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2000017115A1 (en) | 2000-03-30 |
| EP1140715A1 (en) | 2001-10-10 |
| EP1140715A4 (en) | 2005-10-05 |
| KR20010079889A (ko) | 2001-08-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Application deemed to be withdrawn because no request for examination was validly filed |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20061205 |