|
IL132639A
(en)
*
|
1999-10-28 |
2003-11-23 |
Nova Measuring Instr Ltd |
Optical measurements of patterned structures
|
|
EP1309849A2
(en)
*
|
2000-08-10 |
2003-05-14 |
Therma-Wave, Inc. |
Database interpolation method for optical measurement of diffractive microstructures
|
|
US6947135B2
(en)
*
|
2002-07-01 |
2005-09-20 |
Therma-Wave, Inc. |
Reduced multicubic database interpolation method for optical measurement of diffractive microstructures
|
|
US7869057B2
(en)
*
|
2002-09-09 |
2011-01-11 |
Zygo Corporation |
Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis
|
|
US7139081B2
(en)
*
|
2002-09-09 |
2006-11-21 |
Zygo Corporation |
Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures
|
|
US6623995B1
(en)
*
|
2002-10-30 |
2003-09-23 |
Taiwan Semiconductor Manufacturing Company |
Optimized monitor method for a metal patterning process
|
|
US7006222B2
(en)
*
|
2003-01-08 |
2006-02-28 |
Kla-Tencor Technologies Corporation |
Concurrent measurement and cleaning of thin films on silicon-on-insulator (SOI)
|
|
US7106454B2
(en)
|
2003-03-06 |
2006-09-12 |
Zygo Corporation |
Profiling complex surface structures using scanning interferometry
|
|
WO2004079294A2
(en)
*
|
2003-03-06 |
2004-09-16 |
Zygo Corporation |
Characterizing and profiling complex surface structures using scanning interferometry
|
|
WO2004079295A2
(en)
*
|
2003-03-06 |
2004-09-16 |
Zygo Corporation |
Profiling complex surface structures using scanning interferometry
|
|
US7271918B2
(en)
*
|
2003-03-06 |
2007-09-18 |
Zygo Corporation |
Profiling complex surface structures using scanning interferometry
|
|
WO2005029193A2
(en)
|
2003-09-15 |
2005-03-31 |
Zygo Corporation |
Interferometric analysis of surfaces.
|
|
TWI335417B
(en)
*
|
2003-10-27 |
2011-01-01 |
Zygo Corp |
Method and apparatus for thin film measurement
|
|
US20060012582A1
(en)
*
|
2004-07-15 |
2006-01-19 |
De Lega Xavier C |
Transparent film measurements
|
|
US7884947B2
(en)
*
|
2005-01-20 |
2011-02-08 |
Zygo Corporation |
Interferometry for determining characteristics of an object surface, with spatially coherent illumination
|
|
US7179665B1
(en)
|
2005-02-17 |
2007-02-20 |
Midwest Research Institute |
Optical method for determining the doping depth profile in silicon
|
|
TWI394930B
(zh)
*
|
2005-05-19 |
2013-05-01 |
Zygo Corp |
取得薄膜結構資訊之低同調干涉信號的分析方法及裝置
|
|
US20060266743A1
(en)
*
|
2005-05-30 |
2006-11-30 |
National Chiao Tung University |
Laser-ablated fiber devices and method of manufacturing the same
|
|
US7636168B2
(en)
*
|
2005-10-11 |
2009-12-22 |
Zygo Corporation |
Interferometry method and system including spectral decomposition
|
|
US7469164B2
(en)
*
|
2006-06-26 |
2008-12-23 |
Nanometrics Incorporated |
Method and apparatus for process control with in-die metrology
|
|
WO2008011510A2
(en)
*
|
2006-07-21 |
2008-01-24 |
Zygo Corporation |
Compensation of systematic effects in low coherence interferometry
|
|
US7924435B2
(en)
*
|
2006-12-22 |
2011-04-12 |
Zygo Corporation |
Apparatus and method for measuring characteristics of surface features
|
|
US7889355B2
(en)
*
|
2007-01-31 |
2011-02-15 |
Zygo Corporation |
Interferometry for lateral metrology
|
|
US7619746B2
(en)
*
|
2007-07-19 |
2009-11-17 |
Zygo Corporation |
Generating model signals for interferometry
|
|
DE102007034289B3
(de)
*
|
2007-07-20 |
2009-01-29 |
Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh |
Verfahren zur in-situ-Bestimmung der stofflichen Zusammensetzung von optisch dünnen Schichten, Anordnungen zur Durchführung und Anwendungen des Verfahrens
|
|
US8072611B2
(en)
*
|
2007-10-12 |
2011-12-06 |
Zygo Corporation |
Interferometric analysis of under-resolved features
|
|
KR101274517B1
(ko)
*
|
2007-11-13 |
2013-06-13 |
지고 코포레이션 |
편광 스캐닝을 이용한 간섭계
|
|
JP5290322B2
(ja)
|
2007-12-14 |
2013-09-18 |
ザイゴ コーポレーション |
走査干渉法を使用した表面構造の解析
|
|
US8120781B2
(en)
|
2008-11-26 |
2012-02-21 |
Zygo Corporation |
Interferometric systems and methods featuring spectral analysis of unevenly sampled data
|
|
US8115932B2
(en)
*
|
2009-05-28 |
2012-02-14 |
Corning Incorporated |
Methods and apparatus for measuring ion implant dose
|
|
KR101939406B1
(ko)
*
|
2010-05-03 |
2019-01-16 |
오로라 솔라 테크놀로지스 (캐나다) 인크. |
반도체 층의 도펀트 함유량의 비접촉 측정
|
|
US8804106B2
(en)
*
|
2011-06-29 |
2014-08-12 |
Kla-Tencor Corporation |
System and method for nondestructively measuring concentration and thickness of doped semiconductor layers
|
|
US9400172B2
(en)
*
|
2011-10-26 |
2016-07-26 |
Mitsubishi Electric Corporation |
Film thickness measurement method
|
|
US9140542B2
(en)
|
2012-02-08 |
2015-09-22 |
Honeywell Asca Inc. |
Caliper coating measurement on continuous non-uniform web using THz sensor
|
|
US10215696B2
(en)
*
|
2013-11-15 |
2019-02-26 |
Picometrix, Llc |
System for determining at least one property of a sheet dielectric sample using terahertz radiation
|
|
US10156476B2
(en)
*
|
2014-11-13 |
2018-12-18 |
Bae Systems Information And Electronic Systems Integration Inc. |
Solid state wideband fourier transform infrared spectrometer
|
|
KR20220128342A
(ko)
*
|
2019-12-05 |
2022-09-20 |
오로라 솔라 테크놀로지스 (캐나다) 인크. |
반도체 물질의 특성화 시스템 및 방법
|
|
US20250349623A1
(en)
*
|
2024-05-09 |
2025-11-13 |
Kla Corporation |
Measurement Condition Dependent, Multi-Dimensional Model Of Optical Dispersion Of Semiconductor Structures
|
|
CN121675075B
(zh)
*
|
2026-02-06 |
2026-04-10 |
上海车仪田科技有限公司 |
半导体工艺参数的调整方法、系统、设备及存储介质
|