JP2002511190A5 - - Google Patents

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Publication number
JP2002511190A5
JP2002511190A5 JP1998548416A JP54841698A JP2002511190A5 JP 2002511190 A5 JP2002511190 A5 JP 2002511190A5 JP 1998548416 A JP1998548416 A JP 1998548416A JP 54841698 A JP54841698 A JP 54841698A JP 2002511190 A5 JP2002511190 A5 JP 2002511190A5
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JP
Japan
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JP1998548416A
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JP2002511190A (ja
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Priority claimed from US09/072,411 external-priority patent/US6180869B1/en
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Figure 2002511190
Figure 2002511190
Figure 2002511190
Figure 2002511190
Figure 2002511190
Figure 2002511190
Figure 2002511190
Figure 2002511190
Figure 2002511190
Figure 2002511190
JP54841698A 1997-05-06 1998-05-05 シリコン太陽電池および他のデバイス用の自己ドーピング陰極および陽極のための方法および装置 Pending JP2002511190A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US4567397P 1997-05-06 1997-05-06
US60/045,673 1997-05-06
US09/072,411 US6180869B1 (en) 1997-05-06 1998-05-04 Method and apparatus for self-doping negative and positive electrodes for silicon solar cells and other devices
US09/072,411 1998-05-04
PCT/US1998/009190 WO1998050944A2 (en) 1997-05-06 1998-05-05 Method and apparatus for self-doping negative and positive electrodes for silicon solar cells and other devices

Publications (2)

Publication Number Publication Date
JP2002511190A JP2002511190A (ja) 2002-04-09
JP2002511190A5 true JP2002511190A5 (ja) 2005-05-12

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JP54841698A Pending JP2002511190A (ja) 1997-05-06 1998-05-05 シリコン太陽電池および他のデバイス用の自己ドーピング陰極および陽極のための方法および装置

Country Status (10)

Country Link
US (1) US6180869B1 (ja)
EP (3) EP2149916A2 (ja)
JP (1) JP2002511190A (ja)
KR (1) KR20010012327A (ja)
CN (1) CN1230920C (ja)
AU (1) AU7288498A (ja)
BR (1) BR9809237A (ja)
CA (1) CA2287834C (ja)
TW (1) TW418543B (ja)
WO (1) WO1998050944A2 (ja)

Families Citing this family (77)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6632730B1 (en) * 1999-11-23 2003-10-14 Ebara Solar, Inc. Method for self-doping contacts to a semiconductor
AUPR174800A0 (en) * 2000-11-29 2000-12-21 Australian National University, The Semiconductor processing
US7828983B2 (en) * 2001-11-29 2010-11-09 Transform Solar Pty Ltd Semiconductor texturing process
FR2854497B1 (fr) * 2003-04-29 2005-09-02 Commissariat Energie Atomique Procede de realisation d'un dispositif semi-conducteur a metallisations auto-alignees
US7170001B2 (en) * 2003-06-26 2007-01-30 Advent Solar, Inc. Fabrication of back-contacted silicon solar cells using thermomigration to create conductive vias
US7649141B2 (en) * 2003-06-30 2010-01-19 Advent Solar, Inc. Emitter wrap-through back contact solar cells on thin silicon wafers
JP4232597B2 (ja) * 2003-10-10 2009-03-04 株式会社日立製作所 シリコン太陽電池セルとその製造方法
JP2005135942A (ja) * 2003-10-28 2005-05-26 Canon Inc 電極配設方法
US20050172996A1 (en) * 2004-02-05 2005-08-11 Advent Solar, Inc. Contact fabrication of emitter wrap-through back contact silicon solar cells
US7335555B2 (en) * 2004-02-05 2008-02-26 Advent Solar, Inc. Buried-contact solar cells with self-doping contacts
US7144751B2 (en) * 2004-02-05 2006-12-05 Advent Solar, Inc. Back-contact solar cells and methods for fabrication
US20060060238A1 (en) * 2004-02-05 2006-03-23 Advent Solar, Inc. Process and fabrication methods for emitter wrap through back contact solar cells
WO2006031798A2 (en) * 2004-09-10 2006-03-23 Jx Crystals Inc. Solar photovoltaic mirror modules
DE102004060363B4 (de) * 2004-12-15 2010-12-16 Austriamicrosystems Ag Halbleitersubstrat mit pn-Übergang und Verfahren zur Herstellung
US7790574B2 (en) 2004-12-20 2010-09-07 Georgia Tech Research Corporation Boron diffusion in silicon devices
FR2880989B1 (fr) * 2005-01-20 2007-03-09 Commissariat Energie Atomique Dispositif semi-conducteur a heterojonctions et a structure inter-digitee
JP2006310368A (ja) * 2005-04-26 2006-11-09 Shin Etsu Handotai Co Ltd 太陽電池の製造方法及び太陽電池
TWI334649B (en) * 2005-09-27 2010-12-11 Lg Chemical Ltd Method for forming buried contact electrode of semiconductor device having pn junction and optoelectronic semiconductor device using the same
US20070169806A1 (en) * 2006-01-20 2007-07-26 Palo Alto Research Center Incorporated Solar cell production using non-contact patterning and direct-write metallization
US20070107773A1 (en) * 2005-11-17 2007-05-17 Palo Alto Research Center Incorporated Bifacial cell with extruded gridline metallization
EP1964165B1 (en) * 2005-12-21 2018-03-14 Sunpower Corporation Fabrication processes of back side contact solar cells
DE102006041424A1 (de) * 2006-09-04 2008-03-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur simultanen Dotierung und Oxidation von Halbleitersubstraten und dessen Verwendung
WO2008060874A1 (en) * 2006-11-10 2008-05-22 Evergreen Solar, Inc. Substrate with two sided doping and method of producing the same
CA2568136C (en) * 2006-11-30 2008-07-29 Tenxc Wireless Inc. Butler matrix implementation
US7928015B2 (en) * 2006-12-12 2011-04-19 Palo Alto Research Center Incorporated Solar cell fabrication using extruded dopant-bearing materials
WO2008080160A1 (en) * 2006-12-22 2008-07-03 Advent Solar, Inc. Interconnect technologies for back contact solar cells and modules
EP2654089A3 (en) * 2007-02-16 2015-08-12 Nanogram Corporation Solar cell structures, photovoltaic modules and corresponding processes
US7954449B2 (en) * 2007-05-08 2011-06-07 Palo Alto Research Center Incorporated Wiring-free, plumbing-free, cooled, vacuum chuck
DE102007032285A1 (de) * 2007-07-11 2009-01-15 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung von dotierten Halbleiterbauelementen, insbesondere für die Solartechnik
US8304062B2 (en) * 2007-07-20 2012-11-06 Fry's Metals, Inc. Electrical conductors and methods of making and using them
WO2009064870A2 (en) * 2007-11-13 2009-05-22 Advent Solar, Inc. Selective emitter and texture processes for back contact solar cells
TWI426615B (zh) * 2007-12-21 2014-02-11 Jusung Eng Co Ltd 薄膜型太陽能電池及其製造方法
US20090173373A1 (en) * 2008-01-07 2009-07-09 Wladyslaw Walukiewicz Group III-Nitride Solar Cell with Graded Compositions
DE102008013446A1 (de) * 2008-02-15 2009-08-27 Ersol Solar Energy Ag Verfahren zur Herstellung monokristalliner n-Silizium-Solarzellen sowie Solarzelle, hergestellt nach einem derartigen Verfahren
KR101631711B1 (ko) * 2008-03-21 2016-06-17 신에쓰 가가꾸 고교 가부시끼가이샤 확산용 인 페이스트 및 그것을 이용한 태양 전지의 제조 방법
US20090239363A1 (en) * 2008-03-24 2009-09-24 Honeywell International, Inc. Methods for forming doped regions in semiconductor substrates using non-contact printing processes and dopant-comprising inks for forming such doped regions using non-contact printing processes
TWI390747B (zh) * 2008-04-29 2013-03-21 Applied Materials Inc 使用單石模組組合技術製造的光伏打模組
KR20110042083A (ko) * 2008-07-28 2011-04-22 데이4 에너지 인코포레이티드 저온 정밀 에칭백 및 패시베이션 공정으로 제조되는 셀렉티브 에미터를 구비한 결정 실리콘 pv 셀
US20100035422A1 (en) * 2008-08-06 2010-02-11 Honeywell International, Inc. Methods for forming doped regions in a semiconductor material
US8053867B2 (en) * 2008-08-20 2011-11-08 Honeywell International Inc. Phosphorous-comprising dopants and methods for forming phosphorous-doped regions in semiconductor substrates using phosphorous-comprising dopants
US7999175B2 (en) * 2008-09-09 2011-08-16 Palo Alto Research Center Incorporated Interdigitated back contact silicon solar cells with laser ablated grooves
TWI389322B (zh) * 2008-09-16 2013-03-11 Gintech Energy Corp 具有差異性摻雜之太陽能電池的製造方法
US7951696B2 (en) * 2008-09-30 2011-05-31 Honeywell International Inc. Methods for simultaneously forming N-type and P-type doped regions using non-contact printing processes
US9150966B2 (en) * 2008-11-14 2015-10-06 Palo Alto Research Center Incorporated Solar cell metallization using inline electroless plating
DE102008055515A1 (de) * 2008-12-12 2010-07-15 Schott Solar Ag Verfahren zum Ausbilden eines Dotierstoffprofils
KR101539047B1 (ko) * 2008-12-24 2015-07-23 인텔렉츄얼 키스톤 테크놀로지 엘엘씨 광기전력 변환 소자 및 그의 제조방법
US8518170B2 (en) * 2008-12-29 2013-08-27 Honeywell International Inc. Boron-comprising inks for forming boron-doped regions in semiconductor substrates using non-contact printing processes and methods for fabricating such boron-comprising inks
DE102009008371A1 (de) * 2009-02-11 2010-08-12 Schott Solar Ag Integraler Prozeß von Waferherstellung bis Modulfertigung zur Herstellung von Wafern, Solarzellen und Solarmodulen
KR101145928B1 (ko) * 2009-03-11 2012-05-15 엘지전자 주식회사 태양 전지 및 태양 전지의 제조 방법
US20100294349A1 (en) * 2009-05-20 2010-11-25 Uma Srinivasan Back contact solar cells with effective and efficient designs and corresponding patterning processes
US8324089B2 (en) * 2009-07-23 2012-12-04 Honeywell International Inc. Compositions for forming doped regions in semiconductor substrates, methods for fabricating such compositions, and methods for forming doped regions using such compositions
US20110114147A1 (en) * 2009-11-18 2011-05-19 Solar Wind Ltd. Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof
DE102009053818A1 (de) * 2009-11-18 2011-05-19 Evonik Degussa Gmbh Dotierung von Siliciumschichten aus flüssigen Silanen für Elektronik- und Solar-Anwendungen
EP2502277A2 (en) 2009-11-18 2012-09-26 Solar Wind Technologies, Inc. Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof
US8586862B2 (en) * 2009-11-18 2013-11-19 Solar Wind Technologies, Inc. Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof
US8796060B2 (en) 2009-11-18 2014-08-05 Solar Wind Technologies, Inc. Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof
US20110132444A1 (en) 2010-01-08 2011-06-09 Meier Daniel L Solar cell including sputtered reflective layer and method of manufacture thereof
US8241945B2 (en) * 2010-02-08 2012-08-14 Suniva, Inc. Solar cells and methods of fabrication thereof
US20110216401A1 (en) * 2010-03-03 2011-09-08 Palo Alto Research Center Incorporated Scanning System With Orbiting Objective
FR2959870B1 (fr) * 2010-05-06 2012-05-18 Commissariat Energie Atomique Cellule photovoltaique comportant une zone suspendue par un motif conducteur et procede de realisation.
CN102468363B (zh) * 2010-11-09 2013-07-10 浚鑫科技股份有限公司 低效太阳能电池处理方法
US8912083B2 (en) 2011-01-31 2014-12-16 Nanogram Corporation Silicon substrates with doped surface contacts formed from doped silicon inks and corresponding processes
US8962424B2 (en) 2011-03-03 2015-02-24 Palo Alto Research Center Incorporated N-type silicon solar cell with contact/protection structures
CN102842640B (zh) * 2011-06-21 2016-12-21 致嘉科技股份有限公司 一种制作硅晶磊晶层的方法及相关的晶硅基板结构
US8629294B2 (en) 2011-08-25 2014-01-14 Honeywell International Inc. Borate esters, boron-comprising dopants, and methods of fabricating boron-comprising dopants
US8975170B2 (en) 2011-10-24 2015-03-10 Honeywell International Inc. Dopant ink compositions for forming doped regions in semiconductor substrates, and methods for fabricating dopant ink compositions
WO2014084795A1 (en) * 2012-11-30 2014-06-05 Trina Solar Energy Development Pte Ltd Selectively doped layer for interdigitated back-contact solar cells and method of fabricating the same
US9413092B2 (en) 2012-11-30 2016-08-09 Electric Power Research Institute, Inc. Electrical power line connector
US9728669B2 (en) * 2013-03-06 2017-08-08 Sino-American Silicon Products Inc. Solar cell and method of manufacturing the same
TW201511296A (zh) 2013-06-20 2015-03-16 Plant PV 用於矽太陽能電池之核-殼型鎳粒子金屬化層
US20150096613A1 (en) * 2013-06-24 2015-04-09 Sino-American Silicon Products Inc. Photovoltaic device and method of manufacturing the same
US20160313388A1 (en) * 2013-12-22 2016-10-27 Lehighton Electronics, Inc. Noncontact sensing of maximum open-circuit voltages
WO2017035103A1 (en) 2015-08-25 2017-03-02 Plant Pv, Inc Core-shell, oxidation-resistant particles for low temperature conductive applications
US10418497B2 (en) 2015-08-26 2019-09-17 Hitachi Chemical Co., Ltd. Silver-bismuth non-contact metallization pastes for silicon solar cells
EP3365920B1 (en) 2015-10-25 2023-02-22 Solaround Ltd. Method of bifacial cell fabrication
US10696851B2 (en) 2015-11-24 2020-06-30 Hitachi Chemical Co., Ltd. Print-on pastes for modifying material properties of metal particle layers
JP6741626B2 (ja) 2017-06-26 2020-08-19 信越化学工業株式会社 高効率裏面電極型太陽電池及びその製造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2998334A (en) 1958-03-07 1961-08-29 Transitron Electronic Corp Method of making transistors
US3112230A (en) 1959-11-27 1963-11-26 Transitron Electronic Corp Photoelectric semiconductor device
US3416979A (en) 1964-08-31 1968-12-17 Matsushita Electric Ind Co Ltd Method of making a variable capacitance silicon diode with hyper abrupt junction
AU419791B2 (en) * 1968-06-20 1971-12-15 Matsushita Electric Industrial Co., Ltd Method of making a switching element
US3772768A (en) * 1970-02-13 1973-11-20 Licentia Gmbh Method of producing a solar cell
US3895975A (en) * 1973-02-13 1975-07-22 Communications Satellite Corp Method for the post-alloy diffusion of impurities into a semiconductor
GB1416964A (en) 1973-07-09 1975-12-10 Akimov J S Contact between an electrode metal and a semiconductor
US3988167A (en) * 1975-03-07 1976-10-26 Rca Corporation Solar cell device having improved efficiency
US4133698A (en) 1977-12-27 1979-01-09 Texas Instruments Incorporated Tandem junction solar cell
DE2939541A1 (de) 1979-09-28 1981-04-16 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von halbleitereigenschaften aufweisendem, mit antimon hochdotiertem silicium
US4315097A (en) 1980-10-27 1982-02-09 Mcdonnell Douglas Corporation Back contacted MIS photovoltaic cell
JPS6249676A (ja) 1985-08-29 1987-03-04 Sharp Corp 太陽電池
US4766471A (en) * 1986-01-23 1988-08-23 Energy Conversion Devices, Inc. Thin film electro-optical devices
US5260604A (en) 1988-09-27 1993-11-09 Mitsubishi Denki Kabushiki Kaisha Semiconductor device with improved immunity to contact and conductor defects
US4927770A (en) 1988-11-14 1990-05-22 Electric Power Research Inst. Corp. Of District Of Columbia Method of fabricating back surface point contact solar cells
JPH0797653B2 (ja) * 1991-10-01 1995-10-18 工業技術院長 光電変換素子
BR9610739A (pt) 1995-10-05 1999-07-13 Ebara Sola Inc Célula solar e processo para sua fabricação
US5641362A (en) 1995-11-22 1997-06-24 Ebara Solar, Inc. Structure and fabrication process for an aluminum alloy junction self-aligned back contact silicon solar cell

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