JP2002507836A5 - - Google Patents

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Publication number
JP2002507836A5
JP2002507836A5 JP2000537254A JP2000537254A JP2002507836A5 JP 2002507836 A5 JP2002507836 A5 JP 2002507836A5 JP 2000537254 A JP2000537254 A JP 2000537254A JP 2000537254 A JP2000537254 A JP 2000537254A JP 2002507836 A5 JP2002507836 A5 JP 2002507836A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000537254A
Other versions
JP2002507836A (ja
Filing date
Publication date
Priority claimed from US09/040,511 external-priority patent/US6098867A/en
Application filed filed Critical
Publication of JP2002507836A publication Critical patent/JP2002507836A/ja
Publication of JP2002507836A5 publication Critical patent/JP2002507836A5/ja
Pending legal-status Critical Current

Links

JP2000537254A 1998-03-17 1999-03-17 制御された量の融剤をパッケージに塗布するための自動化したブラシ融剤処理システム Pending JP2002507836A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/040,511 1998-03-17
US09/040,511 US6098867A (en) 1998-03-17 1998-03-17 Automated brush fluxing system for application of controlled amount of flux to packages
PCT/US1999/005924 WO1999048141A1 (en) 1998-03-17 1999-03-17 Automated brush fluxing system for application of controlled amount of flux to packages

Publications (2)

Publication Number Publication Date
JP2002507836A JP2002507836A (ja) 2002-03-12
JP2002507836A5 true JP2002507836A5 (ja) 2006-04-06

Family

ID=21911370

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000537254A Pending JP2002507836A (ja) 1998-03-17 1999-03-17 制御された量の融剤をパッケージに塗布するための自動化したブラシ融剤処理システム

Country Status (5)

Country Link
US (1) US6098867A (ja)
EP (1) EP1064677A1 (ja)
JP (1) JP2002507836A (ja)
KR (1) KR100529746B1 (ja)
WO (1) WO1999048141A1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000053025A1 (en) * 1999-03-10 2000-09-14 Unilever Plc Ice confection
US6333210B1 (en) 2000-05-25 2001-12-25 Advanced Micro Devices, Inc. Process of ensuring detect free placement by solder coating on package pads
US6597444B1 (en) * 2000-06-28 2003-07-22 Advanced Micro Devices, Inc. Determination of flux coverage
US6709963B1 (en) * 2000-07-14 2004-03-23 Advanced Micro Devices, Inc. Method and apparatus for jet printing a flux pattern selectively on flip-chip bumps
US6722553B2 (en) * 2000-08-24 2004-04-20 Advanced Micro Devices, Inc. Controlled and programmed deposition of flux on a flip-chip die by spraying

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3841751A (en) * 1969-06-04 1974-10-15 Xerox Corp Electrostatic color reproduction method
JPS5119710B2 (ja) * 1972-05-19 1976-06-19
JPS5496044A (en) * 1978-01-14 1979-07-30 Toshiba Corp Developing device of electrostatic latent images
JPS5540034A (en) * 1978-09-12 1980-03-21 Citizen Watch Co Ltd Flux coating method and coating device for soldering
JPS6326261A (ja) * 1986-03-17 1988-02-03 Alps Electric Co Ltd プリント基板のフラツクス塗布方法
US4724170A (en) * 1986-09-02 1988-02-09 The Goodyear Tire & Rubber Company Apparatus and method for applying cement to an end portion of a flexible strip
US5065692A (en) * 1990-04-30 1991-11-19 At&T Bell Laboratories Solder flux applicator
US5144711A (en) * 1991-03-25 1992-09-08 Westech Systems, Inc. Cleaning brush for semiconductor wafer
US5328085A (en) * 1992-08-18 1994-07-12 Precision Dispensing Equipment, Inc. Apparatus for applying flux
US5324406A (en) * 1992-09-10 1994-06-28 Tosoh Smd, Inc. Automatic brush plating machine
JPH0758446A (ja) * 1993-08-19 1995-03-03 Toshiba Corp フラックス塗布装置
JPH07183649A (ja) * 1993-12-22 1995-07-21 Matsushita Electric Ind Co Ltd フラックスの塗布装置
US5475889A (en) * 1994-07-15 1995-12-19 Ontrak Systems, Inc. Automatically adjustable brush assembly for cleaning semiconductor wafers

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