JP2002372784A5 - - Google Patents

Claims (4)

(A) As a resin having an aliphatic cyclic hydrocarbon group in the side chain and increasing the dissolution rate in an alkaline developer by the action of an acid, a repeating unit represented by the following general formula (Ia) and the general formula (Ib) A positive resist composition comprising: a resin containing a repeating unit represented by formula (B); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation.

In formulas (Ia) and (Ib), R ₁ independently represents a hydrogen atom or an alkyl group, and A represents a linking group.
In the formula (Ia), R ₁₁ represents an alkyl group having 1 to 4 carbon atoms, and Z represents an atomic group necessary for forming an alicyclic hydrocarbon group together with a carbon atom.
In formula (Ib), R _{12 to} R ₁₄ each independently represents a hydrocarbon group, provided that at least one of R _{12 to} R ₁₄ represents an alicyclic hydrocarbon group.   The positive resist composition according to claim 1, further comprising (C) a fluorine-based and / or silicon-based surfactant.   The positive resist composition according to claim 1, further comprising (D) an organic basic compound.   A pattern forming method comprising: forming a resist film from the positive resist composition according to claim 1; and exposing and developing the resist film.