JP2002346493A - Plasma processing method - Google Patents
Plasma processing methodInfo
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- JP2002346493A JP2002346493A JP2001159097A JP2001159097A JP2002346493A JP 2002346493 A JP2002346493 A JP 2002346493A JP 2001159097 A JP2001159097 A JP 2001159097A JP 2001159097 A JP2001159097 A JP 2001159097A JP 2002346493 A JP2002346493 A JP 2002346493A
- Authority
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- Prior art keywords
- insulating member
- gas
- plasma processing
- processing method
- activated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Cleaning In General (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、箱や袋や管（パイ
プ）など形状を有する部材の内面の表面処理を行うため
のプラズマ処理方法であって、特に、ガラスや合成樹脂
で形成される瓶（ボトル）やトレー等の食品容器や医療
部材の内面及び該部材の中に封入された他の部材の表面
を表面処理又は殺菌処理するために好適に用いることが
できるプラズマ処理方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma processing method for performing a surface treatment on an inner surface of a member having a shape such as a box, a bag, or a pipe, and is particularly formed of glass or a synthetic resin. The present invention relates to a plasma processing method that can be suitably used for performing surface treatment or sterilization treatment on the inner surface of a food container such as a bottle (bottle) or tray or a medical member and the surface of another member sealed in the member. is there.
【０００２】[0002]
【従来の技術】従来より、箱や管など形状を有する部材
の内面を活性化したガス（プラズマ）で表面処理するこ
と、例えば、部材の内面に付着した有機物等の汚染物を
除去することなど行われている。このような表面処理の
一例として、特開昭５７−１２０３２号公報には、活性
化したガスを瓶等の部材の開口から部材の内部に吹き込
むようにすることが開示されている。2. Description of the Related Art Conventionally, the inner surface of a member having a shape such as a box or a tube is subjected to surface treatment with an activated gas (plasma), for example, to remove contaminants such as organic substances attached to the inner surface of the member. Is being done. As an example of such a surface treatment, Japanese Patent Application Laid-Open No. 57-12032 discloses that activated gas is blown into the inside of a member such as a bottle through an opening of the member.
【０００３】また、特開平４−３３４５４３号公報に
は、絶縁体管の外周に複数個のリング状電極を設け、絶
縁体管の内側に希ガス等を流通させながら電極間に電圧
を印加することによって、絶縁体管の内側にグロー放電
プラズマを発生させ、このプラズマで絶縁体管の内面を
表面処理することが開示されている。In Japanese Patent Application Laid-Open No. 4-334543, a plurality of ring-shaped electrodes are provided on the outer periphery of an insulator tube, and a voltage is applied between the electrodes while flowing a rare gas or the like inside the insulator tube. This discloses that a glow discharge plasma is generated inside the insulator tube, and the inner surface of the insulator tube is surface-treated with the plasma.
【０００４】[0004]
【発明が解決しようとする課題】上記特開昭５７−１２
０３２号公報に記載の方法では、内部に小さな空間を有
する部材にあってはその内面全体をほぼ均一（均質）に
表面処理することができる。しかし、内部に大きな空間
を有する部材の内面を表面処理しようとした場合には、
開口部近傍の内面にしか十分な表面処理ができないもの
であった。この原因は、活性化したガスが開口部から部
材の内部に吹き込まれてから部材の内部全体に広がるま
でに時間を要し、その間に活性化したガスが死活して活
性を失い、開口部から離れた箇所の内面に達しても十分
な表面処理を行うことができないためである考えられ
る。従って、部材の内面全体に均一な表面処理を行うこ
とができないという問題があった。SUMMARY OF THE INVENTION The above-mentioned Japanese Patent Application Laid-Open No. 57-12 / 1982
According to the method described in Japanese Patent No. 032, for a member having a small space inside, the entire inner surface can be subjected to a substantially uniform (homogeneous) surface treatment. However, when trying to surface-treat the inner surface of a member having a large space inside,
Sufficient surface treatment could be performed only on the inner surface near the opening. The cause is that it takes time for the activated gas to be blown into the inside of the member from the opening and spread throughout the inside of the member, during which the activated gas is alive and loses its activity, This is because sufficient surface treatment cannot be performed even when the inner surface of the distant portion is reached. Accordingly, there has been a problem that uniform surface treatment cannot be performed on the entire inner surface of the member.
【０００５】また、上記特開平４−３３４５４３号公報
に記載の方法では、電極を設けた部分にしかプラズマが
生成されないので、表面処理される部分（エリア）が電
極を設けた部分に限定されてしまい、絶縁体管の内面全
体に均一な表面処理を行うことができないという問題が
あった。In the method described in Japanese Patent Application Laid-Open No. Hei 4-334543, plasma is generated only in a portion where an electrode is provided. Therefore, a portion (area) to be surface-treated is limited to a portion where an electrode is provided. As a result, there is a problem that uniform surface treatment cannot be performed on the entire inner surface of the insulator tube.
【０００６】本発明は上記の点に鑑みてなされたもので
あり、部材の内面全体に均一な表面処理を施すことがで
きるプラズマ処理方法を提供することを目的とするもの
である。The present invention has been made in view of the above points, and has as its object to provide a plasma processing method capable of performing a uniform surface treatment on the entire inner surface of a member.
【０００７】[0007]
【課題を解決するための手段】本発明の請求項１に係る
プラズマ処理方法は、ガスバリア性を有する絶縁性部材
１の内部をガス２で充満した後、絶縁性部材１を密閉
し、この絶縁性部材１に電磁波４を照射することにより
絶縁性部材１の内部に充満したガス２を活性化すること
を特徴とするものである。According to a first aspect of the present invention, there is provided a plasma processing method comprising: filling an inside of an insulating member having a gas barrier property with a gas; By irradiating the insulating member 1 with the electromagnetic wave 4, the gas 2 filled in the insulating member 1 is activated.
【０００８】また、本発明の請求項２に係るプラズマ処
理方法は、請求項１の構成に加えて、絶縁性部材１の内
面を殺菌することを特徴とするものである。[0008] A plasma processing method according to a second aspect of the present invention is characterized in that, in addition to the configuration of the first aspect, the inner surface of the insulating member 1 is sterilized.
【０００９】また、本発明の請求項３に係るプラズマ処
理方法は、請求項１又は２の構成に加えて、絶縁性部材
１の内部に他の部材３を配置することを特徴とするもの
である。According to a third aspect of the present invention, there is provided a plasma processing method in which, in addition to the configuration of the first or second aspect, another member 3 is disposed inside the insulating member 1. is there.
【００１０】また、本発明の請求項４に係るプラズマ処
理方法は、請求項１乃至３のいずれかの構成に加えて、
絶縁性部材１が合成樹脂で形成されていることを特徴と
するものである。According to a fourth aspect of the present invention, there is provided a plasma processing method in addition to any one of the first to third aspects.
The insulating member 1 is made of a synthetic resin.
【００１１】また、本発明の請求項５に係るプラズマ処
理方法は、請求項１乃至４のいずれかの構成に加えて、
絶縁性部材１がペットボトル６であることを特徴とする
ものである。According to a fifth aspect of the present invention, there is provided a plasma processing method comprising the steps of:
The insulating member 1 is a plastic bottle 6.
【００１２】また、本発明の請求項６に係るプラズマ処
理方法は、請求項１乃至５のいずれかの構成に加えて、
絶縁性部材１の内部に揮発性物質７を配置することを特
徴とするものである。According to a sixth aspect of the present invention, there is provided a plasma processing method in addition to any one of the first to fifth aspects.
It is characterized in that a volatile substance 7 is arranged inside the insulating member 1.
【００１３】また、本発明の請求項７に係るプラズマ処
理方法は、請求項６の構成に加えて、揮発性物質が過酸
化水素であることを特徴とするものである。According to a seventh aspect of the present invention, there is provided the plasma processing method according to the sixth aspect, wherein the volatile substance is hydrogen peroxide.
【００１４】[0014]
【発明の実施の形態】以下、本発明の実施の形態を説明
する。Embodiments of the present invention will be described below.
【００１５】本発明のプラズマ処理方法で表面処理され
る絶縁性部材１としては、ガスの通過がほとんどないガ
スバリア性を有し、且つ電気的な絶縁性を有する材料で
形成されたものであれば何でも良く、ポリエチレン、ポ
リプロピレン、ポリカーボネート、ポリエチレンテレフ
タレート、塩化ビニル樹脂、フッ素樹脂、シリコーン樹
脂等の合成樹脂やガラスなど材料を例示することができ
る。また、絶縁性部材１は箱状、袋状、管状（筒状）、
瓶状などの内部に空間を有している形状に形成したもの
であれば何でも良い。As the insulating member 1 to be surface-treated by the plasma processing method of the present invention, any material having a gas barrier property that hardly allows gas to pass therethrough and formed of a material having electrical insulation properties can be used. Any material may be used, and examples thereof include materials such as polyethylene, polypropylene, polycarbonate, polyethylene terephthalate, synthetic resin such as vinyl chloride resin, fluorine resin, and silicone resin, and glass. The insulating member 1 is box-shaped, bag-shaped, tubular (tubular),
Any material may be used as long as it has a shape having a space inside such as a bottle.
【００１６】ガス２としては、希ガス、窒素ガス、空気
などをそれぞれ単独で用いたりあるいは併用したりする
ことができる。また、希ガス、窒素ガス、空気の少なく
とも一つを主体とし、これに必要に応じて一つあるいは
複数種の反応性を有する反応性ガスを添加した混合ガス
を用いても良く、反応性ガスを含有するガス２を用いる
ことによって、例えば、絶縁性部材１の内面に存在する
有機物のクリーニングや金属酸化物の還元効果を実現す
ることができる。希ガスとしては、ヘリウム、アルゴ
ン、ネオン、クリプトンなどを使用することができる
が、放電の安定性や経済性を考慮すると、アルゴンやヘ
リウムを用いるのが好ましい。また、反応性ガスの種類
は処理の内容によって任意に選択することができ、例え
ば、酸素、空気、ＣＯ2、Ｎ2Ｏなどの酸化性ガス、ＣＦ
4などのフッ素系ガス、水素、アンモニアなどの還元性
ガスを用いることができる。反応性ガスの添加量は主体
の全量に対して１０体積％以下、好ましくは０．１〜５
体積％の範囲である。反応性ガスの添加量が０．１体積
％未満であれば、目的とするプラズマ処理の効果が低く
なる恐れがあり、反応性ガスの添加量が１０体積％を超
えると、グロー状の放電が不安定になる恐れがある。As the gas 2, a rare gas, a nitrogen gas, air or the like can be used alone or in combination. Alternatively, a mixed gas mainly containing at least one of a rare gas, a nitrogen gas, and air, and further adding one or more types of reactive gases as needed, may be used. By using the gas 2 containing, for example, it is possible to realize an effect of cleaning organic substances existing on the inner surface of the insulating member 1 and reducing metal oxides. As the rare gas, helium, argon, neon, krypton, or the like can be used, but it is preferable to use argon or helium in consideration of discharge stability and economy. Further, the type of the reactive gas can be arbitrarily selected depending on the content of the treatment, for example, oxidizing gas such as oxygen, air, CO 2 , N 2 O, CF
For example, a fluorine-based gas such as 4 or a reducing gas such as hydrogen or ammonia can be used. The amount of the reactive gas added is 10% by volume or less, preferably 0.1 to 5%, based on the total amount of the main component.
% By volume. If the added amount of the reactive gas is less than 0.1% by volume, the effect of the target plasma treatment may be reduced. If the added amount of the reactive gas exceeds 10% by volume, a glow-like discharge occurs. There is a risk of becoming unstable.
【００１７】また、該絶縁性部材１の内部に揮発性物質
を配置することもできる。これは例えば、布状物質（例
えば、脱脂綿など）やシリカゲル、ゼオライトモレキュ
ラーシーブのような多孔体に揮発性物質をしみこませ、
これを該絶縁性部材１の内部に配置する。そして、この
揮発性物質に電磁波を照射すると、一部揮発した物質が
放電により活性な状態になり、処理効果が大きくなるも
のである。揮発性物質としては特に限定しないが、過酸
化水素水は殺菌に効果がある。また、エタノールやアセ
トンなどの有機物質を用いることによっても表面処理効
果が向上する。Further, a volatile substance can be arranged inside the insulating member 1. This impregnates volatile substances into porous materials such as cloth-like substances (eg, cotton wool), silica gel, and zeolite molecular sieves.
This is arranged inside the insulating member 1. When the volatile substance is irradiated with an electromagnetic wave, the partially volatilized substance is activated by discharge, and the treatment effect is enhanced. The volatile substance is not particularly limited, but the hydrogen peroxide solution is effective for sterilization. The surface treatment effect is also improved by using an organic substance such as ethanol or acetone.
【００１８】そして、上記のような絶縁性部材１の内面
をプラズマ処理にて表面処理するにあたっては次によう
にして行う。まず、絶縁性部材１の内部にガス２を注入
して充満させる。この時、絶縁性部材１が開口部を有す
るものであれば、その開口部からガス２を注入すればよ
いが、絶縁性部材１に開口部が無い場合はガス注入用の
孔あけをあけて、ここからガス２を絶縁性部材１の内部
に注入する。また、絶縁性部材１の内部に充満させるガ
スは未活性であっても良いし、活性化されているもので
あっても良い。The surface treatment of the inner surface of the insulating member 1 by the plasma treatment is performed as follows. First, the gas 2 is injected into the inside of the insulating member 1 to fill it. At this time, if the insulating member 1 has an opening, the gas 2 may be injected through the opening. However, if the insulating member 1 has no opening, a hole for gas injection is formed. From here, gas 2 is injected into the insulating member 1. Further, the gas filling the inside of the insulating member 1 may be inactive or activated.
【００１９】次に、絶縁性部材１の上記の開口部を閉塞
して絶縁性部材１の内部を密閉することにより、ガス２
が漏れないように絶縁性部材１の内部にガス２を封入す
る。この時、合成樹脂製の袋のように絶縁性部材１が保
形性の小さいものである場合はその開口部をゴムバンド
等の締結具１２で縛って閉塞することができ、また、絶
縁性部材１がある程度保形性を有するものであればその
開口部に合成樹脂等の絶縁性材料を詰めて閉塞すること
ができる。さらに、絶縁性部材１が箱状（容器）に形成
されている場合はその開口部に蓋等を取着して閉塞する
ことができる。Next, by closing the opening of the insulating member 1 and sealing the inside of the insulating member 1, the gas 2
The gas 2 is sealed inside the insulating member 1 so that no gas leaks. At this time, if the insulating member 1 has a small shape-retaining property, such as a bag made of synthetic resin, its opening can be closed and closed with a fastener 12 such as a rubber band. If the member 1 has a certain shape-retaining property, its opening can be closed by filling it with an insulating material such as a synthetic resin. Further, when the insulating member 1 is formed in a box shape (container), it can be closed by attaching a lid or the like to its opening.
【００２０】この後、大気圧近傍の圧力下（９３．３〜
１０６．７ｋＰａ（７００〜８００Ｔｏｒｒ））におい
て、ガス２を充満させて封入した絶縁性部材１に電磁波
４を照射する。電磁波４としては例えば１０ＭＨｚ〜３
ＧＨｚの周波数を有する高周波やマイクロ波を用いるこ
とができるが、これに限定されるものではなく、電磁波
４の周波数などの照射条件はガスの組成等に応じて絶縁
性部材１の内部に放電を発生させることができるように
設定すればよい。図１に本発明で使用するプラズマ処理
装置の一例を示す。このプラズマ処理装置は、電気的に
シールドされた処理容器１０の内部に電磁波発生器１１
を備えて形成されるものである。そして、処理容器１０
内にガス２を充満させた絶縁性部材１を入れた後、矢印
で示すように、電磁波発生器１１から絶縁性部材１に電
磁波４を照射し、このエネルギーで絶縁性部材１の内部
でグロー状の放電を発生させてガス２を活性化させる。
これにより、絶縁性部材１の内部で活性化したガス２、
すなわち、ラジカルやイオン等を含むプラズマが絶縁性
部材１の内面と接触することになり、絶縁性部材１の内
面をプラズマ処理により表面処理（クリーニングや殺菌
処理）することができるものである。尚、このように絶
縁性部材１の内面を表面処理する時に、処理容器１０の
内部に活性化したガスを充満させることにより、絶縁性
部材１の外面を内面と同時に表面処理してもよい。ま
た、絶縁性部材１の内面を表面処理する時に、処理容器
１０の内部に未活性のガスを充満させ、この未活性のガ
スを電磁波発生器１１から発生させた電磁波により活性
化し、活性化したガスにより絶縁性部材１の外面を内面
と同時に表面処理してもよい。Thereafter, under a pressure close to the atmospheric pressure (93.3 to
At 106.7 kPa (700 to 800 Torr), the insulating member 1 filled with the gas 2 and sealed is irradiated with the electromagnetic wave 4. As the electromagnetic wave 4, for example, 10 MHz to 3
High-frequency waves having a frequency of GHz or microwaves can be used, but the present invention is not limited to this. Irradiation conditions such as the frequency of the electromagnetic wave 4 are such that discharge is caused inside the insulating member 1 according to the composition of the gas and the like. What is necessary is just to set so that it can be generated. FIG. 1 shows an example of a plasma processing apparatus used in the present invention. This plasma processing apparatus includes an electromagnetic wave generator 11 inside a processing vessel 10 which is electrically shielded.
It is formed with. And the processing container 10
After the insulating member 1 filled with the gas 2 is put in the inside, the electromagnetic wave generator 11 irradiates the insulating member 1 with the electromagnetic wave 4 as shown by the arrow, and the energy is used to glow inside the insulating member 1. A gas-like discharge is generated to activate the gas 2.
Thereby, the gas 2 activated inside the insulating member 1,
That is, the plasma containing radicals, ions, and the like comes into contact with the inner surface of the insulating member 1, and the inner surface of the insulating member 1 can be surface-treated (cleaning or sterilizing) by plasma processing. When the inner surface of the insulating member 1 is subjected to the surface treatment as described above, the inside of the processing container 10 may be filled with the activated gas, so that the outer surface of the insulating member 1 may be subjected to the surface treatment simultaneously with the inner surface. When the inner surface of the insulating member 1 is subjected to surface treatment, the inside of the processing container 10 is filled with an inactive gas, and the inactive gas is activated and activated by an electromagnetic wave generated from the electromagnetic wave generator 11. The outer surface of the insulating member 1 may be surface-treated with the gas simultaneously with the inner surface.
【００２１】上記のように本発明では、活性化したガス
を絶縁性部材１の開口部から吹き込んで絶縁性部材１の
内面を表面処理するのではなく、絶縁性部材１にガスを
充満させて封入した後、電磁波を照射することにより絶
縁性部材１の内部で活性化したガスを生成し、この活性
化したガスで絶縁性部材１の内面を表面処理するので、
絶縁性部材１の内部が大きな空間であっても、活性化し
たガス２を絶縁性部材１の内部の全体に亘って発生させ
て、絶縁性部材１の内面全体に活性化したガス２を到達
させて接触させることができ、均一（均質）な表面処理
を行うことができるものである。また、絶縁性部材１が
蛇腹状などの歪な形状に形成されていて絶縁性部材１の
内面が凹凸面で構成されている場合、開口部から活性化
したガスを吹き込む方法では凹面の部分に活性化したガ
スが到達しにくくて十分な表面処理を行うことができな
いが、本発明では絶縁性部材１にガスを充満させて封入
することにより凹面の部分にまでガスを到達させた後、
電磁波を照射することにより絶縁性部材１の内部で活性
化したガスを生成しているので、凹面の部分にも活性化
したガス２を十分に接触させることができ、絶縁性部材
１の内面全体を均一に表面処理することができるもので
ある。また、上記特開平４−３３４５４３号公報に記載
の方法では、ガスを絶縁体管の内側で流通させているた
めに、ガスの流れにより放電が不安定になることがある
が、本発明では絶縁性部材１の内部でガス２の流れがほ
とんど無いので、絶縁性部材１の内部で発生するグロー
状の放電が不安定になることがなく、均一で安定した表
面処理を継続的に行うことができるものである。As described above, in the present invention, the activated gas is not blown from the opening of the insulating member 1 to surface-treat the inner surface of the insulating member 1, but is filled with the gas. After enclosing, by irradiating electromagnetic waves, an activated gas is generated inside the insulating member 1 and the inner surface of the insulating member 1 is surface-treated with the activated gas.
Even if the inside of the insulating member 1 is a large space, the activated gas 2 is generated over the entire inside of the insulating member 1 so that the activated gas 2 reaches the entire inner surface of the insulating member 1. And a uniform (homogeneous) surface treatment can be performed. Further, when the insulating member 1 is formed in a distorted shape such as a bellows shape and the inner surface of the insulating member 1 is formed of an uneven surface, the method of blowing the activated gas from the opening causes the concave portion to be formed. Although the activated gas is difficult to reach and a sufficient surface treatment cannot be performed, in the present invention, the gas is allowed to reach the concave portion by filling and filling the insulating member 1 with the gas.
Since the activated gas is generated inside the insulating member 1 by irradiating the electromagnetic wave, the activated gas 2 can be sufficiently brought into contact with the concave portion, and the entire inner surface of the insulating member 1 can be contacted. Can be uniformly surface-treated. Further, in the method described in JP-A-4-334543, since the gas is circulated inside the insulating tube, the discharge may be unstable due to the gas flow. Since the gas 2 hardly flows inside the insulating member 1, the glow-like discharge generated inside the insulating member 1 does not become unstable, and a uniform and stable surface treatment can be continuously performed. You can do it.
【００２２】図２に他の実施の形態を示す。このプラズ
マ処理方法は絶縁性部材１が飲料水等を入れるためのペ
ットボトル（ポリエチレンテレフタレート製の食品容
器）６であって、その内面を殺菌処理する方法を示すも
のである。この場合、上記と同様にしてペットボトル６
の内部にガス２を注入して充満させるが、これよりも前
に予めペットボトル６の内部に過酸化水素などの揮発性
物質７を適量（少量）入れておくようにする。揮発性物
質７としては上記と同様のものを使用することができ、
例えば、ゼオライト系モレキュラーシーブ等の多孔体に
３４％過酸化水素水を充填したものを絶縁性部材１の内
部に配置するようにする。そして、ペットボトル６の開
口部をキャップ１３で蓋した後、上記と同様にして電磁
波４を照射してプラズマ処理を行うものであるが、これ
と同時に揮発性物質７が揮発して絶縁性部材１の内面に
殺菌などの作用を及ぼすものであり、この揮発性物質７
の作用によっても絶縁性部材１の内面に表面処理を施す
ことができるものである。FIG. 2 shows another embodiment. This plasma treatment method is a method of disinfecting the inner surface of a PET bottle (a food container made of polyethylene terephthalate) 6 in which the insulating member 1 is for holding drinking water or the like. In this case, the PET bottle 6
The gas 2 is injected into the inside of the plastic bottle 6 to fill it. Before this, an appropriate amount (a small amount) of a volatile substance 7 such as hydrogen peroxide is put in the plastic bottle 6 in advance. As the volatile substance 7, the same substance as described above can be used,
For example, a porous body such as a zeolite-based molecular sieve filled with 34% hydrogen peroxide is disposed inside the insulating member 1. After the opening of the PET bottle 6 is covered with the cap 13, plasma treatment is performed by irradiating the electromagnetic wave 4 in the same manner as described above. 1 has an action such as sterilization on the inner surface thereof.
The surface treatment can be performed on the inner surface of the insulating member 1 also by the action of (1).
【００２３】この実施の形態では、絶縁性部材１の内面
を活性化したガス２で表面処理すると同時に、揮発性物
質７により絶縁性部材１の内面を表面処理することがで
き、表面処理を短時間でより効果的に行うことができる
ものである。また、殺菌とは別に、ペットボトル６の内
面に例えばダイヤモンド状炭素やアルミナ、シリカ、チ
タニアなどの無機質薄膜または金属薄膜を形成する前
に、上記のような表面処理を行うことにより、薄膜との
密着力を高める効果もある。その場合、揮発性物質７は
必ずしも必要ではないが、エタノールやアセトンなどを
揮発性物質７として用いることもできる。上記のような
薄膜は、絶縁性部材１のガスバリア性の付与及び向上に
効果がある。尚、従来から紫外線照射による殺菌が行わ
れているが、この場合は、絶縁性部材１が透明である必
要がある。しかし、本発明では不透明の絶縁性部材１で
あってもその内面を表面処理することができるものであ
る。In this embodiment, the inner surface of the insulating member 1 can be surface-treated with the activated gas 2 and at the same time, the inner surface of the insulating member 1 can be surface-treated with the volatile substance 7. It can be done more effectively in time. Further, apart from sterilization, before forming an inorganic thin film or a metal thin film such as diamond-like carbon, alumina, silica, or titania on the inner surface of the PET bottle 6, by performing the above-described surface treatment, It also has the effect of increasing the adhesion. In this case, the volatile substance 7 is not always necessary, but ethanol, acetone or the like can be used as the volatile substance 7. Such a thin film is effective in imparting and improving the gas barrier properties of the insulating member 1. Note that sterilization by ultraviolet irradiation has conventionally been performed, but in this case, the insulating member 1 needs to be transparent. However, in the present invention, even the opaque insulating member 1 can be surface-treated on the inner surface.
【００２４】図３には他の実施の形態を示す。このプラ
ズマ処理方法は、箱形に形成される絶縁性部材１の内部
に他の部材３を配置した状態で、上記と同様のプラズマ
処理を行う例を示すものである。その他の構成は上記実
施の形態と同様である。絶縁性部材１の内部に配置する
他の部材３としては、外面に表面処理を施したいもので
あれば任意のものを用いることができ、例えば、半導体
チップなどを実装するためのリードフレームや回路基板
などを挙げることができる。尚、上記のリードフレーム
や回路基板は半導体チップを実装した後、ワイヤボンデ
ィングや樹脂封止されるものであるが、この時にリード
フレームや回路基板の回路のワイヤボンディング性や封
止樹脂との密着性を向上させるために、有機物の除去な
どの表面処理（クリーニング）が必要である。FIG. 3 shows another embodiment. This plasma processing method shows an example in which the same plasma processing as described above is performed in a state where another member 3 is disposed inside the box-shaped insulating member 1. Other configurations are the same as those of the above embodiment. As the other member 3 disposed inside the insulating member 1, any member can be used as long as it is desired to perform a surface treatment on its outer surface. For example, a lead frame or a circuit for mounting a semiconductor chip or the like can be used. Substrates and the like can be mentioned. The above-mentioned lead frame or circuit board is mounted with a semiconductor chip and then wire-bonded or resin-sealed. In order to improve the property, surface treatment (cleaning) such as removal of organic substances is required.
【００２５】この実施の形態では、内面に表面処理が必
要な絶縁性部材１と外面に表面処理が必要な他の部材３
とを同時にプラズマ処理することができ、二つの部材に
対して表面処理を短時間でより効果的に行うことができ
るものである。In this embodiment, an insulating member 1 requiring an inner surface treatment and another member 3 requiring an outer surface treatment are required.
Can be simultaneously subjected to the plasma treatment, and the surface treatment can be more effectively performed on the two members in a short time.
【００２６】[0026]
【発明の効果】上記のように本発明の請求項１の発明
は、ガスバリア性を有する絶縁性部材の内部をガスで充
満した後、絶縁性部材を密閉し、この絶縁性部材１に電
磁波を照射することにより絶縁性部材の内部に充満した
ガスを活性化するので、活性化したガスを絶縁性部材の
内部の全体に亘って発生させて、絶縁性部材の内面全体
に活性化したガスを到達させて接触させることができ、
絶縁性部材１の内部が大きな空間であっても、絶縁性部
材の内面全体に均一な表面処理を行うことができるもの
である。As described above, according to the first aspect of the present invention, after the inside of an insulating member having a gas barrier property is filled with a gas, the insulating member is sealed, and electromagnetic waves are applied to the insulating member 1. Irradiation activates the gas that fills the inside of the insulating member, so that the activated gas is generated over the entire inside of the insulating member, and the gas that has been activated on the entire inner surface of the insulating member is discharged. Can be reached and contacted,
Even if the inside of the insulating member 1 is a large space, a uniform surface treatment can be performed on the entire inner surface of the insulating member.
【００２７】また、本発明の請求項２の発明は、絶縁性
部材の内部を殺菌するので、絶縁性部材の内面全体を均
一に殺菌することができるものである。According to the second aspect of the present invention, since the inside of the insulating member is sterilized, the entire inner surface of the insulating member can be uniformly sterilized.
【００２８】また、本発明の請求項３の発明は、絶縁性
部材の内部に他の部材を配置するので、内面に表面処理
が必要な絶縁性部材と外面に表面処理が必要な他の部材
とを同時にプラズマ処理することができ、二つの部材に
対して表面処理を短時間でより効果的に行うことができ
るものである。According to the third aspect of the present invention, since another member is disposed inside the insulating member, the other insulating member requires a surface treatment on the inner surface and the other member requires a surface treatment on the outer surface. Can be simultaneously subjected to the plasma treatment, and the surface treatment can be more effectively performed on the two members in a short time.
【００２９】また、本発明の請求項６の発明は、絶縁性
部材の内部に揮発性物質を配置するので、活性化したガ
スによる絶縁性部材の内面の表面処理と同時に、揮発し
た揮発性物質によっても絶縁性部材の内面の表面処理を
行うことができ、表面処理を短時間でより効果的に行う
ことができるものである。According to the invention of claim 6 of the present invention, since the volatile substance is disposed inside the insulating member, the volatile substance is volatilized simultaneously with the surface treatment of the inner surface of the insulating member with the activated gas. The surface treatment can also be performed on the inner surface of the insulating member, and the surface treatment can be performed more effectively in a short time.
【図１】本発明の実施の形態の一例を示す断面図であ
る。FIG. 1 is a cross-sectional view illustrating an example of an embodiment of the present invention.
【図２】同上の他の実施の形態を示す断面図である。FIG. 2 is a cross-sectional view showing another embodiment of the above.
【図３】同上の他の実施の形態を示す断面図である。FIG. 3 is a cross-sectional view showing another embodiment of the same.
【符号の説明】 １ 絶縁性部材 ２ ガス ３ 他の部材 ４ 電磁波 ６ ペットボトル ７ 揮発性物質[Description of Signs] 1 Insulating member 2 Gas 3 Other member 4 Electromagnetic wave 6 PET bottle 7 Volatile substance
Claims (7)
をガスで充満した後、絶縁性部材を密閉し、この絶縁性
部材に電磁波を照射することにより絶縁性部材の内部に
充満したガスを活性化することを特徴とするプラズマ処
理方法。After the inside of an insulating member having a gas barrier property is filled with a gas, the insulating member is sealed, and the insulating member is irradiated with electromagnetic waves to activate the gas filled inside the insulating member. A plasma processing method comprising:
とする請求項１に記載のプラズマ処理方法。2. The plasma processing method according to claim 1, wherein the inner surface of the insulating member is sterilized.
ことを特徴とする請求項１又２に記載のプラズマ処理方
法。3. The plasma processing method according to claim 1, wherein another member is disposed inside the insulating member.
ことを特徴とする請求項１乃至３のいずれかに記載のプ
ラズマ処理方法。4. The plasma processing method according to claim 1, wherein the insulating member is formed of a synthetic resin.
特徴とする請求項１乃至４のいずれかに記載のプラズマ
処理方法。5. The plasma processing method according to claim 1, wherein the insulating member is a PET bottle.
ることを特徴とする請求項１乃至５のいずれかに記載の
プラズマ処理方法。6. The plasma processing method according to claim 1, wherein a volatile substance is disposed inside the insulating member.
徴とする請求項６に記載のプラズマ処理方法。7. The plasma processing method according to claim 6, wherein the volatile substance is hydrogen peroxide.
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| JP2001159097A JP4348877B2 (en) | 2001-05-28 | 2001-05-28 | Plasma processing method |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012506123A (en) * | 2008-10-17 | 2012-03-08 | ネーデルランドセ・オルガニサティ・フォール・トゥーヘパスト−ナトゥールウェテンスハッペライク・オンデルズーク・テーエヌオー | Method and apparatus for cleaning and / or sterilizing objects provided in a sealed enclosure |
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| JP2000316954A (en) * | 1999-04-13 | 2000-11-21 | Ruediger Haaga Gmbh | Method for exhausting in plasma sterilizing reactor |
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2001
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| JPS61293465A (en) * | 1985-06-21 | 1986-12-24 | サ−ギコス・インコ−ポレイテツド | Sterilizing system by hydrogen peroxide plasma |
| JPH05269370A (en) * | 1992-03-25 | 1993-10-19 | Ii C Kagaku Kk | Method for treating inner face of vessel with plasma and device using the method |
| JPH05326416A (en) * | 1992-05-15 | 1993-12-10 | Fuji Electric Co Ltd | Method for cleaning vapor growth apparatus with plasma |
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| JP2000316954A (en) * | 1999-04-13 | 2000-11-21 | Ruediger Haaga Gmbh | Method for exhausting in plasma sterilizing reactor |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2012506123A (en) * | 2008-10-17 | 2012-03-08 | ネーデルランドセ・オルガニサティ・フォール・トゥーヘパスト−ナトゥールウェテンスハッペライク・オンデルズーク・テーエヌオー | Method and apparatus for cleaning and / or sterilizing objects provided in a sealed enclosure |
Also Published As
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|---|---|
| JP4348877B2 (en) | 2009-10-21 |
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