JPS61293465A - Sterilizing system by hydrogen peroxide plasma - Google Patents

Sterilizing system by hydrogen peroxide plasma

Info

Publication number
JPS61293465A
JPS61293465A JP61143087A JP14308786A JPS61293465A JP S61293465 A JPS61293465 A JP S61293465A JP 61143087 A JP61143087 A JP 61143087A JP 14308786 A JP14308786 A JP 14308786A JP S61293465 A JPS61293465 A JP S61293465A
Authority
JP
Japan
Prior art keywords
plasma
hydrogen peroxide
chamber
sterilization
sterilized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61143087A
Other languages
Japanese (ja)
Other versions
JPH0262261B2 (en
Inventor
ポール・テイラー・ジャコブズ
スズ−ミン・リン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ethicon Inc
Original Assignee
Surgikos Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Application filed by Surgikos Inc filed Critical Surgikos Inc
Publication of JPS61293465A publication Critical patent/JPS61293465A/en
Publication of JPH0262261B2 publication Critical patent/JPH0262261B2/ja
Granted legal-status Critical Current

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Classifications

    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2/00Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
    • A61L2/02Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
    • A61L2/14Plasma, i.e. ionised gases
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2/00Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
    • A61L2/16Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using chemical substances
    • A61L2/20Gaseous substances, e.g. vapours

Landscapes

  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Veterinary Medicine (AREA)
  • Epidemiology (AREA)
  • General Health & Medical Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Materials For Medical Uses (AREA)
  • External Artificial Organs (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は気体プラズマ中での物品の滅菌に関し、そして
より詳細にはプラズマ中で過酸化水素を用いて、糧々の
表面および医療器具などの物品の微生物を消滅させるこ
とに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to the sterilization of articles in gaseous plasmas, and more particularly to the use of hydrogen peroxide in plasmas to annihilate microorganisms on articles such as food surfaces and medical instruments. Regarding things.

種々の滅菌方法が過去に、使い棄ておよび再使用医療装
置、食品および食品容器を含む異なったタイプの物品の
滅菌に利用されて来た。スチームまたは乾熱による滅菌
が過去には広く利用されていた0湿熱あるいは乾熱によ
る滅菌は、この種の熱またはスチームによって悪影響を
受ける物質を滅菌するためには有用ではない。酸化エチ
レンガスもまた用いられて来たが、滅菌すべき物品上に
毒性残留物を残存させる可能性があり、これが悪影響、
特にこの種の物品と接触することになる患者に対し悪影
響を及ぼす可能性があるという欠点に悩まされている。
Various sterilization methods have been utilized in the past to sterilize different types of articles, including disposable and reusable medical devices, food products, and food containers. Steam or dry heat sterilization, which was widely used in the past, is not useful for sterilizing materials that are adversely affected by this type of heat or steam. Ethylene oxide gas has also been used, but can leave toxic residues on the items to be sterilized, which can lead to
In particular, they suffer from the disadvantage of potentially adverse effects on patients who come into contact with articles of this type.

成る滅菌物品から残存酸化エチレンを除去するのに要す
る長い通気サイクルはまた、酸化エチレン滅菌を非常に
冗長なものとする。
The long aeration cycles required to remove residual ethylene oxide from sterilized articles also make ethylene oxide sterilization very tedious.

容器を滅菌するためにプラズマを使用することが米国特
許第3,383,163号中に示唆された。
The use of plasma to sterilize containers was suggested in US Pat. No. 3,383,163.

プラズマは気体のイオン化体であって、これは異なった
供給源からの電力の印加により発生させることができる
ものである。イオン化気体は、滅菌すべき物品表面上の
微生物と接触することになり、そしてこの微生物を効果
的に破壊することになる。
A plasma is an ionized form of a gas that can be generated by the application of electrical power from different sources. The ionized gas will come into contact with and effectively destroy microorganisms on the surface of the article to be sterilized.

米国特許第3,851,436号は高周波ゼネレータを
用いて、不活性ガス、たとえばアルゴン、ヘリウムまた
はキセノンからこの種プラズマを生成することを開示し
ている。米国特許第3.948,601号もまた、高周
波で発生されたプラズマの使用を開示しており、このプ
ラズマはアルゴン、窒素、酸素、ヘリウムまたはキセノ
ンをイオン化する。
US Pat. No. 3,851,436 discloses the use of a radio frequency generator to generate such a plasma from an inert gas such as argon, helium or xenon. US Pat. No. 3,948,601 also discloses the use of a radiofrequency generated plasma that ionizes argon, nitrogen, oxygen, helium or xenon.

上述の特許において述べられた方法は、滅菌すべき製品
表面のプラズマとの直接接触を要し、この製品は滅菌時
に包装されていてはならない。使い棄て医療品を滅菌す
るために利用される実用滅菌法は、一般に滅菌に先立つ
医療品の包装を要する。それは製品が滅菌に引き続いて
包装される場合、微生物による汚染の可能性があるから
である。
The method described in the above-mentioned patent requires direct contact of the surface of the product to be sterilized with the plasma, which product must not be packaged at the time of sterilization. Practical sterilization methods utilized to sterilize single-use medical items generally require packaging of the medical item prior to sterilization. This is because if the product is packaged following sterilization, there is a possibility of microbial contamination.

米国特許第4,207,286号はグルタルアルデヒド
をガスとして用いる気体プラズマ滅菌システムを開示し
【おり、このガスはプラズマ滅菌システムにおいて利用
されるものである。滅菌すべき物品は非密閉容器あるい
は包装中に配置され、次いで滅菌サイクルを受ける。滅
菌サイクルが終了したとき、その容器はシールされる。
US Pat. No. 4,207,286 discloses a gaseous plasma sterilization system using glutaraldehyde as the gas utilized in the plasma sterilization system. The article to be sterilized is placed in an open container or package and then subjected to a sterilization cycle. When the sterilization cycle is finished, the container is sealed.

この容器は、滅菌サイクルの間開放されてガスをその内
部に流入させ、このガスを滅菌すべき物品の表面上に存
在する可能性ある凡ゆる微生物と接触させるものである
This container is opened during the sterilization cycle to allow gas to flow into its interior, bringing this gas into contact with any microorganisms that may be present on the surfaces of the articles to be sterilized.

米国特許第4,321,232号はプラズマ滅菌システ
ムを開示しており、この場合滅菌すべき物品は多孔性物
質からなる包装中に配置される。この方法で使用される
ガスは酸素であり、そして滅菌が60分以内に多孔質包
装を介して行えることが示されている。
US Pat. No. 4,321,232 discloses a plasma sterilization system in which the articles to be sterilized are placed in a package made of porous material. The gas used in this method is oxygen, and it has been shown that sterilization can be accomplished through porous packaging within 60 minutes.

米国特許第4,348.357号はガスとして酸素、窒
素、ヘリウム、アルゴンまたはフレオンを使用するプラ
ズマ滅菌法を開示している。その圧力は脈動しており、
すなわち容器内の圧力はサイクル的に交互に増大または
減少している。更に、このプラズマは圧力サイクルの圧
力低下部分にある間消勢させて、滅菌すべき物品に対す
る加熱効果を減少させることができる。
US Pat. No. 4,348,357 discloses a plasma sterilization method using oxygen, nitrogen, helium, argon or Freon as the gas. The pressure is pulsating;
That is, the pressure within the container is cyclically increasing or decreasing alternately. Additionally, the plasma can be de-energized during the pressure reduction portion of the pressure cycle to reduce the heating effect on the articles to be sterilized.

特開昭58−103460はプラズマ滅菌法であって、
ガスは亜酸化窒素または亜酸化窒素と他のガス、たとえ
ば酸素、ヘリウムまたはアルゴンとの混合物から成って
いる。更K、この方法は包装を介した滅菌、特にポリエ
チレントリフルオライドまたはポリエチレンテトラフル
オライド樹脂あるいはこれら物質で塗布した紙から調製
された包装を介した滅菌に利用し得ることが述べられて
いる。
JP-A-58-103460 is a plasma sterilization method,
The gas consists of nitrous oxide or a mixture of nitrous oxide and other gases, such as oxygen, helium or argon. Furthermore, it is stated that this method can be used for sterilization via packaging, particularly via packaging prepared from polyethylene trifluoride or polyethylene tetrafluoride resins or paper coated with these materials.

特IJ昭58−162276号は、プラズマにおける酸
化窒素ガスまたは酸化窒素ガスとオゾンとの混合物を使
用する食品の滅菌を開示している。
Special IJ No. 58-162276 discloses the sterilization of foods using nitrogen oxide gas or a mixture of nitrogen oxide gas and ozone in a plasma.

これら従来のプラズマ滅菌システムの全ては、広(実用
に供されることはなかった。それは滅菌を行うために要
する時間、滅菌工種において得られる温度に関する制限
あるいは後滅菌包装を要するというような成る橿の工程
に関する特別な要件の故である。
All of these conventional plasma sterilization systems have never been put into widespread use due to limitations such as the time required to perform sterilization, the temperatures available in the sterilization technique, or the need for post-sterilization packaging. This is due to special requirements regarding the process.

過酸化水素は殺菌剤特性を有することが知られていたし
、また溶液において各種表面上のバクテリアを消滅させ
るために用いられて来た。米国特許第4,437,56
7号は過酸化水素水溶液を低濃度、すなわち0.01乃
至0.10重量%で使用して医療または外科用の包装製
品を滅菌するために用いることを開示している。室温に
おける滅菌は少なくとも15日間を要する。より高い温
度では、滅菌は約1日で行うことができるb 米国特許第4,169.123号、第4,169,12
4号および第4.230,663号は、滅菌および消毒
のために1気相における過酸化水素を温度80℃、そし
て濃度0.10乃至75■H2O2蒸気/Lで使用する
ことを開示している。濃度および温度によって、滅菌時
間は30分から4時間まで変化することが報告されてい
る。
Hydrogen peroxide is known to have disinfectant properties and has also been used in solutions to kill bacteria on various surfaces. U.S. Patent No. 4,437,56
No. 7 discloses the use of aqueous hydrogen peroxide solutions at low concentrations, ie 0.01 to 0.10% by weight, to sterilize medical or surgical packaging products. Sterilization at room temperature requires at least 15 days. At higher temperatures, sterilization can be accomplished in about one dayb U.S. Pat.
No. 4 and No. 4.230,663 disclose the use of hydrogen peroxide in one gas phase at a temperature of 80° C. and a concentration of 0.10 to 75 μH2O2 vapor/L for sterilization and disinfection. There is. Depending on concentration and temperature, sterilization times have been reported to vary from 30 minutes to 4 hours.

改良された抗菌力のために、過酸化水素と共に紫外線の
利用が米国特許第4,366,125号および第4.2
89,728号中に開示されている。滅菌すべき物品の
表面下方の紫外線による浸透の欠如が、照射に直接暴嬉
され得る透明な溶液または表面に対するこの効果の作用
を制限する。不透明な包装中の物品または紫外線を吸収
する透明な包装中の物品は滅菌することができない。
U.S. Pat. Nos. 4,366,125 and 4.2, U.S. Pat.
No. 89,728. The lack of penetration by UV radiation below the surface of the article to be sterilized limits the action of this effect on clear solutions or surfaces that can be exposed directly to radiation. Articles in opaque packaging or in transparent packaging that absorb ultraviolet light cannot be sterilized.

過酸化水素で滅菌した食品包装材料は、使用に先立ち、
材料から除去せねばならない過酸化水素  。
Food packaging materials sterilized with hydrogen peroxide should be sterilized prior to use.
Hydrogen peroxide must be removed from the material.

残留物を含有している。米国特許第4,368.() 
81号は、酸化防止剤または還元剤、たとえばL−アス
コルビン酸を用いて滅菌食品包装物から残留過酸化水素
を除去することを開示している。
Contains residue. U.S. Patent No. 4,368. ()
No. 81 discloses the use of antioxidants or reducing agents, such as L-ascorbic acid, to remove residual hydrogen peroxide from sterile food packages.

過酸化水素とプラズマとの組合わせは、これまで滅菌に
用いられたことはない。
The combination of hydrogen peroxide and plasma has never been used for sterilization before.

本発明は、低温プラズマ滅菌システムにおける活性種の
先駆物質として過酸化水素の利用を取り入れている。こ
の滅菌法は、滅菌すべき物質と過酸化水素との初期接触
を、滅菌を行うのに足るパワーレベルでのプラズマの発
生の前に提供するものである。過酸化水素との初期接触
期間の採用が、低温プラズマによる滅菌の達成に必要な
合計時間およびパワーを著しく減少させ得ることが判明
した。更に、過酸化水素による前処理の採用もまた。
The present invention incorporates the use of hydrogen peroxide as a precursor of active species in a low temperature plasma sterilization system. This sterilization method provides initial contact of the material to be sterilized with hydrogen peroxide prior to generation of plasma at a power level sufficient to effect sterilization. It has been found that employing an initial contact period with hydrogen peroxide can significantly reduce the total time and power required to achieve sterilization by cold plasma. Additionally, pretreatment with hydrogen peroxide is also employed.

多くの異なったタイプの包装材料中で滅菌を行わせるこ
とを可能とする。
It allows sterilization to occur in many different types of packaging materials.

プラズマ中のH2O20分解生成物は水、酸素および水
素を含んでいるので、プラズマ処理後の滅菌物品上には
毒性残留物が全(残らない。
Since the H2O20 decomposition products in the plasma contain water, oxygen and hydrogen, no toxic residue remains on the sterilized article after plasma treatment.

本発明の方法は、先行技術に係るガスプラズマ滅菌法と
は2つの重要な特徴において異なっている。その第1点
は、不活性ガス、たとえば酸素、窒素等ではなくて、反
応性種の先駆物質として過酸化水素蒸気を使用すること
である。第2の主要相違点は、滅菌を行うのに要するレ
ベルにおけるパワーの印加に先立って、過酸化水素蒸気
を滅菌すべき物品と接触させる前処理時間の採用である
0本方法において、滅菌すべき物品はプラズマ・チャン
バ内に配置され、チャンバは閉塞され、かつチャンバを
真空に引いてチャンバ内に存在するガスを除去する。次
に過酸化水素の水溶液をチャンバ内に噴射して、その圧
力を約0.1乃至10 ) −ルのレベルに上昇させる
。過酸化水素は、滅菌を達成するのに十分なパワーレベ
ルでプラズマが発生する以前にそれを、滅菌すべき物品
と緊密に接触させるのに足る時間、通常5乃至30分間
に亘りチャンバ内に残留する。次に、そのパワーを完全
な滅菌を行わせるために50分間以内の時間保持する◇
もっとも滅菌は、チャンバ内の過酸化水素の濃度および
チャンバ内に印加されるパワーによって、最初のプラズ
マ発生から5分程度の短時間で有効にすることが可能で
ある。また、前処理工程をプラズマ・チャンバの外部で
行うことも可能である。滅菌すべき物品を、プラズマを
発生させることができない真空室内に配置することも可
能である◇その室内を真空とし、そして過酸化水素を真
空室内に噴射することになる。滅菌すべき物品は真空室
内に所望前処理時間に亘り保持され、次いでプラズマ・
チャンバ内に配置され、そしてプラズマが発生されるこ
とになる。
The method of the present invention differs from prior art gas plasma sterilization methods in two important features. The first is the use of hydrogen peroxide vapor as a precursor of reactive species, rather than inert gases such as oxygen, nitrogen, etc. The second major difference is the adoption of a pretreatment period in which hydrogen peroxide vapor is brought into contact with the article to be sterilized prior to the application of power at the level required to effect sterilization. The article is placed within a plasma chamber, the chamber is closed, and a vacuum is applied to the chamber to remove any gas present within the chamber. An aqueous solution of hydrogen peroxide is then injected into the chamber, raising its pressure to a level of about 0.1 to 10)-L. The hydrogen peroxide remains in the chamber for a sufficient period of time, typically 5 to 30 minutes, to bring it into intimate contact with the article to be sterilized before the plasma is generated at a power level sufficient to achieve sterilization. do. Next, hold the power for no more than 50 minutes to achieve complete sterilization◇
However, sterilization can be effected in as little as 5 minutes after initial plasma generation, depending on the concentration of hydrogen peroxide in the chamber and the power applied within the chamber. It is also possible to perform the pretreatment step outside the plasma chamber. It is also possible to place the articles to be sterilized in a vacuum chamber where plasma cannot be generated.The chamber is evacuated and hydrogen peroxide is injected into the vacuum chamber. The articles to be sterilized are held in a vacuum chamber for the desired pretreatment time and then exposed to plasma.
is placed in a chamber and a plasma will be generated.

本方法により滅菌すべき物質または物品は、滅菌製品に
使用される各種の一般に利用されている包装材料中に包
装されていてもよい。好ましい材料は、通常商標[タイ
ヴエック(TYVBK ’)Jの下に入手可能なスパン
結合したポリエチレン包装材料、もしくは「タイヴエッ
ク」と通常商標「マイラー」の下で入手可能なポリエチ
レンテレフタレート包装材料とから成る複合材料である
。その他の類似の包装材料もまた、使用可能である。更
に、紙包装材料も利用できる。紙包装材料に関しては、
滅菌を達成するためにより長い処理時間を要する可能性
がある。それは過酸化水素および他の反応性種と9紙と
の相互作用の可能性があるからである。
The materials or articles to be sterilized by this method may be packaged in a variety of commonly available packaging materials used for sterile products. A preferred material is a spunbonded polyethylene packaging material commonly available under the trademark TYVBK'J, or a composite consisting of ``TYVBK'' and a polyethylene terephthalate packaging material commonly available under the trademark ``Mylar.'' It is the material. Other similar packaging materials can also be used. Additionally, paper packaging materials can also be used. Regarding paper packaging materials,
Longer processing times may be required to achieve sterilization. This is because of the possible interaction of hydrogen peroxide and other reactive species with the 9 paper.

プラズマは一般にガス中の放電によって発生する。大気
圧またはこれより高圧で発生するプラズマは「アーク」
または高温プラズマと呼ばれ、そして1000℃を超え
る温度を伴う可能性がある0減圧、すなわち10−5乃
至102トールにおいて発生するプラズマは「グロー放
電」または低温プラズマと呼ばれ、そして摂氏数十度乃
至数百度の温度を伴う。本発明の低温プラズマは好まし
くは10トール未満の圧力で発生され、そして一般に1
00℃未満の温度を伴う。
Plasma is generally generated by an electrical discharge in a gas. Plasma generated at atmospheric pressure or higher pressure is an "arc"
or high-temperature plasma, and plasma generated at 0 reduced pressure, i.e. 10-5 to 102 Torr, which may involve temperatures exceeding 1000 degrees Celsius, is called "glow discharge" or low-temperature plasma, and may involve temperatures exceeding 1000 degrees Celsius. Accompanied by temperatures ranging from several hundred degrees. The low temperature plasma of the present invention is preferably generated at a pressure of less than 10 Torr, and generally 1
with temperatures below 00°C.

本出願において用いられるとき、用語「プラズマ」は、
印加された電界により生成される電子、イオン、遊離基
、解離および/または励起原子あ石いは分子を含有する
気体または蒸気の凡ゆる部分であって、生成される可能
性ある凡ゆる随伴電離放射線を含むものを包含すること
を意図している。適用される電界は広い周波数域をカバ
ーするが、高周波が一般に使用される。
As used in this application, the term "plasma"
Electrons, ions, free radicals, dissociated and/or excited atoms produced by an applied electric field are any part of a gas or vapor containing molecules and any concomitant ionization that may be produced. Intended to include those involving radiation. The applied electric field covers a wide frequency range, but high frequencies are commonly used.

プラズマ滅菌は、図に示されるよう罠通常、チャンバ2
0内で行われる。このチャンバは扉または開口10を含
み、これを介して滅菌すべき物品を導入することができ
る。チャンバはまた、ガスをチャンバ内に噴射するため
の入口11および真空ボンダに連結される管路12を含
み、これによってチャンバを真空とし得る。ガス入口管
路11には管接続口14が設けられていて、過酸化水素
の水溶液をチャンバ20中へ導入する。チャンバは高周
波電極13を含み、これはチャンバ全体の周囲に巻回す
るか、チャンバおよび高周波ゼネレータの側面上に配置
して、必要な高周波信号を発生させることができる。整
合ネットワークの出力から放電へのRFパワーの結合は
、コイルまたはコンデンサーフ″レートのセクトによっ
て行われる。
Plasma sterilization usually involves trapping chamber 2 as shown in the figure.
It is done within 0. This chamber includes a door or opening 10 through which the articles to be sterilized can be introduced. The chamber also includes an inlet 11 for injecting gas into the chamber and a line 12 connected to a vacuum bonder, thereby allowing the chamber to be evacuated. The gas inlet line 11 is provided with a pipe connection 14 for introducing an aqueous solution of hydrogen peroxide into the chamber 20 . The chamber includes a radio frequency electrode 13, which can be wrapped around the entire chamber or placed on the sides of the chamber and the radio frequency generator to generate the necessary radio frequency signal. Coupling of the RF power from the output of the matching network to the discharge is done by sections of coils or capacitor plates.

これら281類の結合はそれぞれ誘導結合および容量結
合と称される。関数発生器、RFパワー増幅器、電力計
および整合ネットワークを含む、高周波信号の発生を制
御する各種の制御装置もまた使用されており、かつ図に
示されている。整合ネットワークは増幅したRF傷信号
入力をコイルに整合させる。プラズマは、チャンバを真
空にし、ガスまたは蒸発させた液体を導入し、そしてパ
ワーを電極にターンオンすることにより発生される。
These 281 types of coupling are called inductive coupling and capacitive coupling, respectively. Various control devices for controlling the generation of high frequency signals are also used and shown in the figures, including function generators, RF power amplifiers, power meters and matching networks. A matching network matches the amplified RF flaw signal input to the coil. A plasma is generated by evacuating a chamber, introducing a gas or vaporized liquid, and turning on power to the electrodes.

このプラズマは本方法において、先に述べた先行技術罠
係るプラズマ滅菌システムにおけるのと同一の方法によ
り発生される。
This plasma is generated in the present method in the same manner as in the prior art plasma sterilization systems described above.

本方法において用いられるプラズマは連続的であっても
よいし、あるいは脈動的であってもよい。
The plasma used in the method may be continuous or pulsatile.

すなわち、そのパワーは連続的に適用してもよいし、あ
るいはプラズマの圧力を一定に保持しながら周期的なや
り方でパワーを活動化させてもよいのである。脈動プラ
ズマの利用は、チャンバ内のガスの過熱を阻止し、同様
に滅菌するのが望ましいであろう物品の過熱をも防止す
る。脈動シーケンスは、凡ゆる物品の過熱の危険を伴う
ことな(、可成り広い範囲に亘り変化させることができ
る。
That is, the power may be applied continuously, or the power may be activated in a periodic manner while maintaining the plasma pressure constant. The use of a pulsating plasma prevents overheating of the gas within the chamber, as well as overheating of the articles that may be desired to be sterilized. The pulsation sequence can be varied over a fairly wide range (without risking overheating of any article).

一般に脈動シーケンスは、パワーオン対パワーオフの割
合である。たとえば、1:2脈動プラズマによって、パ
ワーは帆5ミリ秒印加され、次いでターンオフされ、そ
してその稜再び1.0ミリ秒印加されることになる。特
定の脈動シーケンスが決定的という訳ではない。このパ
ワーは秒というよりはむしろ分の単位で測定される時間
に亘り印加される。脈動の目的は、滅菌すべき物品の過
熱を回避することであり、従って如何なる脈動シーケン
スであっても、過熱を回避し、かつ妥当な時間内に滅菌
を行うものであれは、利用可能である。
Generally, the pulsation sequence is a ratio of power on to power off. For example, with a 1:2 pulsating plasma, power would be applied for 5 milliseconds, then turned off, and then applied again for 1.0 milliseconds at the edge. No particular pulsation sequence is definitive. This power is applied over a period of time measured in minutes rather than seconds. The purpose of pulsation is to avoid overheating of the article to be sterilized, so any pulsation sequence that avoids overheating and achieves sterilization within a reasonable time may be used. .

滅菌すべき物品の過熱の危険が殆ど無ければ、連続的プ
ラズマも使用可能である。
Continuous plasma can also be used, provided there is little risk of overheating the articles to be sterilized.

先に示したように、本方法においては、滅菌に必要なパ
ワーの印加に先立って過酸化水素がプラズマ・チ丁ンバ
内に噴射される。過酸化水素は、約3乃至20重量%の
過酸化水素を含有する過酸化水素水溶液の形で噴射され
る。チャンバ内の過酸化水素蒸気の濃度は、讐ヤンバ容
量の1リットル当たり過酸化水素0.05乃至10■の
範囲内圧あればよい。過酸化水素のより高い濃度は、よ
り短い滅菌時間をもたらすことKなる。1リットル当た
り0.125mgの濃度が、過酸化水素の最低好適濃度
である。過酸化水素と共に空気または不活性ガス、たと
えばアルゴン、ヘリウム、窒素、ネオンまたはキセノン
を添加してチャンバ内の圧力を所望レベルに保持しても
よい。過酸化水素溶液は2回以上に分割噴射してもよい
。たとえば、時間「ゼロ」において使用すべき過酸化水
素溶液の合計量のV2をチャンバ中に噴射し、そして5
分後の過酸化水素溶液の残部を噴射することができる。
As previously indicated, in the present method hydrogen peroxide is injected into the plasma chamber prior to application of the power necessary for sterilization. The hydrogen peroxide is injected in the form of an aqueous hydrogen peroxide solution containing about 3 to 20% by weight hydrogen peroxide. The concentration of hydrogen peroxide vapor in the chamber may be within the range of 0.05 to 10 μm of hydrogen peroxide per liter of volume. Higher concentrations of hydrogen peroxide will result in shorter sterilization times. A concentration of 0.125 mg per liter is the lowest preferred concentration of hydrogen peroxide. Air or an inert gas such as argon, helium, nitrogen, neon or xenon may be added along with the hydrogen peroxide to maintain the pressure within the chamber at the desired level. The hydrogen peroxide solution may be injected in two or more parts. For example, at time "zero" the total amount of hydrogen peroxide solution to be used, V2, is injected into the chamber, and 5
After a few minutes, the remainder of the hydrogen peroxide solution can be sprayed out.

その後、パワーが更に5乃至10分間印加される前まで
過酸化水素はチャンバ内圧残留することになる。明らか
に、前処理時間は包装材料を介して過酸化水素を拡散さ
せ、そして滅菌すべき物品の表面と、もし接触しない場
合には、ごく接近させるためのものである。高周波発生
器へのパワー適用の結果、殺胞子活性種が、過酸化水素
およびプラズマの組合わせにより生成され、それによっ
て滅菌を行うために要する時間は先行技術の方法におけ
るよりも短くなる。前処理サイクルの間に低パワーレベ
ルにおいてプラズマを発生させることが可能であるが、
前処理サイクルの間にパワーを適用しても何ら特別な利
点は無い。
Thereafter, the hydrogen peroxide will remain in the chamber until power is applied for an additional 5 to 10 minutes. Clearly, the pretreatment time is intended to allow the hydrogen peroxide to diffuse through the packaging material and into close proximity, if not contact, with the surfaces of the articles to be sterilized. As a result of the application of power to the radio frequency generator, sporicidal active species are produced by a combination of hydrogen peroxide and plasma, whereby the time required to effect sterilization is shorter than in prior art methods. Although it is possible to generate plasma at low power levels during the pretreatment cycle,
There is no particular advantage to applying power during the pretreatment cycle.

殺胞子活性の精確なメカニズムは普遍妥当性をもって知
られてはいないが、放電に際して過酸化水素は遊離基、
すなわちOH+02H,Hに解離する可能性がある〔エ
ム、グエニエゴボ2ンおよびニー、シー(M、 Ven
ugopalan and A、 5hih)著「プラ
ズマ化学およびプラズマ処理(plasma Chem
is−try and plasma process
ing)J第1巻、第2号、第191−199頁、19
81年〕。単独または過酸化水素との組合わせにおける
これら遊離基は、多分殺胞子活性を有する初期の供給源
である。紫外線もまた、低温プラズマを生成し、そして
殺胞子活性の役割を、%に過酸化水素の存在下で果たす
ことができる。
The exact mechanism of sporicidal activity is not known with universal validity, but upon discharge hydrogen peroxide releases free radicals,
That is, there is a possibility of dissociating into OH+02H,H [M, Ven.
``Plasma Chemistry and Plasma Processing'' by Ugopalan and A, 5hih)
is-try and plasma process
ing) J Vol. 1, No. 2, pp. 191-199, 19
1981]. These free radicals, alone or in combination with hydrogen peroxide, are likely the primary source of sporicidal activity. Ultraviolet light also generates a cold plasma and can play a role in sporicidal activity in the presence of % hydrogen peroxide.

本発明の一般的な操作は以下の通りである。The general operation of the invention is as follows.

1)滅菌すべき対象物乃至物品を真空室またはプラズマ
・チャンバ内に配置する。
1) Place the object or article to be sterilized in a vacuum chamber or plasma chamber.

2)そのチャンバを圧力約0.05 ) −ルに減圧す
る。
2) Evacuate the chamber to a pressure of approximately 0.05 - liters.

3)過酸化水素の水溶液をチャンバ内に、蒸気化させた
水および過酸化水素の圧力帆5乃至10トールとして噴
射する。好ましい圧力は1乃至2トールである。チャン
バ内へ噴射される過酸化水素の濃度は、約帆05乃至1
0■/チヤンバ容量リットルであればよい。好ましい濃
度は0.208mg/リットルである。
3) Inject an aqueous solution of hydrogen peroxide into the chamber as a pressure sail of 5 to 10 torr of vaporized water and hydrogen peroxide. The preferred pressure is 1 to 2 torr. The concentration of hydrogen peroxide injected into the chamber is approximately 0.5 to 1.
It is sufficient if it is 0 ■/chamber volume liter. The preferred concentration is 0.208 mg/liter.

4)滅菌すべき対象物は、滅菌するのに足るパワーを有
するプラズマが生成される前にチャンバ内で約5乃至3
0分の期間保持される。この期間を、ここでは前処理時
間と称する。30分以上の前処理時間も利用可能である
・。前処理の持続時間は、用いる包装のタイプ、滅菌す
べき物品の数、およびチャンバ内の物品の配置に左右さ
れる。
4) The object to be sterilized is placed in the chamber for approximately 5 to 3 hours before a plasma with sufficient power to sterilize is generated.
Retained for a period of 0 minutes. This period is referred to herein as pre-processing time. Pretreatment times of 30 minutes or more are also available. The duration of pretreatment depends on the type of packaging used, the number of articles to be sterilized, and the placement of the articles within the chamber.

5)滅菌すべき対象物は、前処理チャンバまたは別個の
プラズマ・チャンバ内でプラズマに)される。
5) The objects to be sterilized are exposed to plasma in a pretreatment chamber or a separate plasma chamber.

6ノ プラズマを発生させるために利用されるRFエネ
ルギーは連続的でありてもよいし、或はそれは脈動的で
あってもよい。前記対象物はプラズマ中に5乃至60分
間残留して、完全な滅菌を行う。
6. The RF energy utilized to generate the plasma may be continuous or it may be pulsatile. The object remains in the plasma for 5 to 60 minutes to achieve complete sterilization.

プラズマ処理の間に、過酸化水素は非毒性生成物に分解
されるので、前記対象物の使用に先立って、滅菌対象物
またはその包装から残留過酸化水素を除去するために何
らの付加的な工程をも必要としない。
During plasma treatment, hydrogen peroxide is decomposed into non-toxic products and therefore no additional hydrogen peroxide is required to remove residual hydrogen peroxide from the object to be sterilized or its packaging prior to use of said object. No process is required.

下記の実施例において、滅菌サイクルの効力は、試験(
So)に先立って試験片上に配置された細菌の最初の数
に対する試験(S)に耐えた細菌の数の比率として表現
される。これら実施例の全てにおいて、試験された細菌
は枯草菌[Bacillussubtilis (Gl
obigii変種)]胞子であって、これらはベーパー
ディスク上に配置され、かつスパン結合したポリエチレ
ン包装体中に包装された。
In the examples below, the efficacy of the sterilization cycle is tested (
It is expressed as the ratio of the number of bacteria that survived the test (S) to the initial number of bacteria placed on the specimen prior to So). In all of these examples, the bacteria tested were Bacillus subtilis (Gl
var. obigii)] spores, which were placed on a vapor disk and packaged in a spun-bonded polyethylene package.

全実施例は、3−89MHzの周波数で行われた実施例
Vを除き、2・49 MHzの周波数で操作される5・
5リツ)/l/のプラズマ・チャンバ内で行われた。
All examples were operated at a frequency of 2.49 MHz with the exception of Example V, which was conducted at a frequency of 3-89 MHz.
The experiments were carried out in a plasma chamber of 5 L/l/l.

(実施例I) 第1表は、本発明のプラズマ・サイクルにおける、他の
従来のガスに対する本発明の過酸化水素/プラズマ・シ
ステムの殺胞子活性の比較を含んでいる。全ての試験は
、同一の反応条件下、すなわち15分間に亘る0・5ミ
リ秒のプラズマ、オン。
Example I Table 1 contains a comparison of the sporicidal activity of the hydrogen peroxide/plasma system of the present invention versus other conventional gases in the plasma cycle of the present invention. All tests were conducted under the same reaction conditions: 0.5 ms plasma on for 15 min.

そして1.0 ミリ秒のプラズマ、オフにおける150
ワツトの脈動プラズマ下で行った。全試験は、表中に掲
げたガスによる10分間の前処理サイクルを用いた。全
ての前処理およびプラズマ処理は1.5トールの圧力で
行われた。グルタルアルデヒドおよび過酸化水素前処理
サイクルは、グルタルアルデヒドおよび過酸化水素をそ
れぞれ0.208mg/IJットル含有し曵いた。結果
はS/Soとして表され、この場合Sは生き残りの細菌
数、そしてSOは最初の細菌数である。
and 1.0 ms plasma, 150 at off.
It was carried out under Watsuto's pulsating plasma. All tests used a 10 minute pretreatment cycle with the gases listed in the table. All pre-treatments and plasma treatments were performed at a pressure of 1.5 Torr. The glutaraldehyde and hydrogen peroxide pretreatment cycles contained 0.208 mg/IJ liter of glutaraldehyde and hydrogen peroxide each. The results are expressed as S/So, where S is the number of surviving bacteria and SO is the initial number of bacteria.

第  ■  表 他のガス/プラズマ・システムと比較したH2O2/プ
ラズマ・システムの殺胞子活性Q29.lX10 /1
.3X10 −0.72N20       4.9X
1011/1.6X105−0.31りklkアにテヒ
)”   5.7X10’/1.lX10’ −0,5
2H2020/3.4X105−0 過酸化水素/プラズマ・システムのみが良好な殺胞子活
性を示し、かつ処理物品を滅菌した。
Table ■ Sporicidal activity of H2O2/plasma system compared to other gas/plasma systems Q29. lX10 /1
.. 3X10 -0.72N20 4.9X
1011/1.6X105-0.31 5.7X10'/1.1X10' -0,5
Only the 2H2020/3.4X105-0 hydrogen peroxide/plasma system showed good sporicidal activity and sterilized the treated articles.

(実施例■) 殺胞子活性に関するプラズマ・チャンバ内の過酸化水素
濃度の効果は、 1.0 )−ル圧力で10分間におけ
る異なった濃度の過酸化水素蒸気を伴う前処理試験サン
プルにより求めた。次に、処理サンプルを200ワツト
の脈動プラズマに対して、0.5ミリ秒のプラズマ、オ
ン、そして1.0ミリ秒のプラズマ、オフの周期をもっ
て15分間に亘り暴露した。2樵類の対照、すなわち1
種類は過酸化水素のみを用いるもの、そしてもう1&類
はウォーター・プラス−v (water plasm
a)のみを利用するもの、もまた実施した。それらの結
果を第■表中に示す。
Example ■ The effect of hydrogen peroxide concentration in the plasma chamber on sporicidal activity was determined by pretreatment test samples with different concentrations of hydrogen peroxide vapor for 10 minutes at 1.0 μl pressure. . The treated samples were then exposed to a 200 watt pulsating plasma for 15 minutes with a period of 0.5 msec plasma on and 1.0 msec plasma off. 2 woodcutter contrasts, i.e. 1
One type uses only hydrogen peroxide, and the other type uses water plasma.
One utilizing only a) was also implemented. The results are shown in Table 3.

第  「  表 殺胞子活性に関するH2O2濃度の効果0”     
    1.0      1.0.125     
  1.0     7,3X10−2.208   
    1.0     1.4X10”−2・416
       1.0        0★★、625
      9.lX1O−20゜★ 本試験において
は、4.16■H2Q/ +)ットルを含有するプラズ
マを使用した。
Chapter ``Effect of H2O2 concentration on surface sporicidal activity 0''
1.0 1.0.125
1.0 7,3X10-2.208
1.0 1.4X10”-2・416
1.0 0★★, 625
9. 1X1O-20゜★ In this test, plasma containing 4.16■H2Q/+) liters was used.

★★ 2.4X10  個の細菌全滅。★★ 2.4 x 10 bacteria wiped out.

濃度0.625mg/リットル未満においては、ウォー
ター・プラズマ処理のみ、あるいはH20□のみでは何
らの顕著な殺胞子活性も得られなかった。
At concentrations below 0.625 mg/liter, water plasma treatment alone or H20□ alone did not produce any significant sporicidal activity.

しかし、殺胞子活性における著しい強化が、評価した全
H2O2!1度においてH2O2/プラズマ組合わせに
より得られた。
However, a significant enhancement in sporicidal activity was obtained with the H2O2/plasma combination at the total H2O2!1 degrees evaluated.

(実施例I) 殺胞子活性に関する圧力の効果を、過酸化水素濃度0.
208mg/リットルで、そして実施例Hにおけるのと
同一の前処理およびプラズマ周期を用いて求めた。活性
は圧力0.5 、1.0 、1.5および2.0 トー
ルで測定した。エア・プラズマのみ、および過酸化水素
のみもまた、測定した。これら実験の結果は第1表中に
報告する。
(Example I) The effect of pressure on sporicidal activity was investigated at hydrogen peroxide concentrations of 0.
208 mg/liter and using the same pretreatment and plasma cycle as in Example H. Activity was measured at pressures of 0.5, 1.0, 1.5 and 2.0 Torr. Air plasma only and hydrogen peroxide only were also measured. The results of these experiments are reported in Table 1.

第■表 H2O2プラズマの殺胞子活性に関する圧力の効果=1 1.0  6.7X10   1.0      1.
4X10’★3.4X10 個の細菌全滅。
Table ① Effect of pressure on sporicidal activity of H2O2 plasma = 1 1.0 6.7X10 1.0 1.
4X10'★3.4X10 bacteria wiped out.

全圧力において低レベル活性が、プラズマのみ、あるい
はH20□のみによって得られた。H2O2プラスプラ
ズマ・システムによる最適活性が1.5トールの圧力に
おいて得られた0 (実施例■) 殺胞子活性に関するプラズマ・パワーの効果を、1.5
トールの圧力において濃度0.208■H20□/リッ
トルの過酸化水素を用いて求めた。ノ(ワーレベルは5
0,100,150および200ワツトでありた。プラ
ズマは実施例■におけるように脈動させ、そして試料は
実施例■において用いた方法により10分間前処理した
。エア・プラズマのみ、および過酸化水素のみの試験も
また、行ったO結果は第■表に示す◎ 第  ■ 表 エアープラズマおよびH20□プラスプラズマの殺胞子
活性に関するRFパワーレベルの効果0     1.
0        4.oxio−”50     4
.0X10−18.lX1O−11006,7X10−
12.5X10””150     2.4X10−1
0”200     3.9X10−”       
   0”★1.8X10 個の細菌全滅。
Low level activity at all pressures was obtained with plasma alone or H20□ alone. Optimal activity with the H2O2 plus plasma system was obtained at a pressure of 1.5 Torr (Example ■) The effect of plasma power on sporicidal activity was determined at a pressure of 1.5 Torr.
It was determined using hydrogen peroxide at a concentration of 0.208 H20/liter at a pressure of Torr. No (war level is 5
They were 0,100,150 and 200 watts. The plasma was pulsed as in Example ■, and the sample was pretreated for 10 minutes by the method used in Example ■. Air plasma only and hydrogen peroxide only tests were also conducted and the results are shown in Table ■ Table ■ Effect of RF power level on sporicidal activity of air plasma and H20□ plus plasma 0 1.
0 4. oxio-”50 4
.. 0X10-18. lX1O-11006,7X10-
12.5X10''150 2.4X10-1
0”200 3.9X10-”
0”★1.8X10 bacteria wiped out.

評価した全てのパワー負荷において、エア・プラズマの
みにより低レベルの殺胞子活性が得られた。顕著な殺胞
子活性が100ワツトノ(ワーにおいてH2O2プラス
プラズマシステムにより得られ、かつ滅菌は150およ
び200ワツトノ(ワーにおいて達成された0 (実施例V) 過酸化水素前処理時間中の殺胞子活性に関するプラズマ
発生の効果を、圧力1.5トールにお(1て過酸化水素
濃度0.208■H2O2/ リットヤを用いて求めた
。10分間の過酸化水素前処理時間中50.75,10
0,125および150の)(ワーを3.89 M)l
zにおいて印加した。プラズマは0.5ミリ秒のパワー
、オンから1.0ミリ秒のノくワー、オフの周期をもっ
て脈動させた。10分の前処理後、全ての試料を0.5
ミリ秒オンから1.0ミリ秒オフで脈動させた150ワ
ツトのノくワーに15分間暴露した。この試験の結果は
第V表中に示す。
Low levels of sporicidal activity were obtained with air plasma alone at all power loads evaluated. Significant sporicidal activity was obtained with the H2O2 plus plasma system at 100W and sterilization was achieved at 150 and 200W (Example V). The effect of plasma generation was determined using a hydrogen peroxide concentration of 0.208 μH2O2/Litya at a pressure of 1.5 Torr (1.5 Torr) during a 10-minute hydrogen peroxide pretreatment time.
0,125 and 150) (3.89 M)l
applied at z. The plasma was pulsated with a power of 0.5 milliseconds and a cycle of on, whir, and off of 1.0 milliseconds. After 10 minutes of pretreatment, all samples were
Exposure to a 150 watt blower pulsating from milliseconds on to 1.0 milliseconds off for 15 minutes. The results of this test are shown in Table V.

第7表 H20□プラスプラズマの殺胞子活性に関する前処理中
のUパワーレベルの効果 50          9.4X10−’75   
       1.2X10−’100       
   1.0 125          0.133150    
      0.94 過酸化水素前処理時間内に、低パワーレベル、すなわち
50および75ワツトを印加したとき、顕著な殺胞子活
性が得られた。過酸化水素が試料に拡散し得る以前に、
より多くのそれが拡散するであろう、より高いパワーレ
ベルにおいては、非常に限定された殺胞子活性が観られ
た。
Table 7 Effect of U power level during pretreatment on sporicidal activity of H20□ plus plasma 50 9.4X10-'75
1.2X10-'100
1.0 125 0.133150
Significant sporicidal activity was obtained when low power levels, 50 and 75 watts, were applied during the 0.94 hydrogen peroxide pretreatment time. Before hydrogen peroxide can diffuse into the sample,
At higher power levels, where more of it would be diffused, very limited sporicidal activity was seen.

(実施例■) 過酸化水素濃度0.208■H2O2/”)ットルおよ
び圧力1.5トールを用いて、殺胞子活性に関するプラ
ズマパワーの脈動効果を求めた。試料は実施例■におけ
るように、10分間に亘り過酸化水素により前処理した
。エアープラズマのみ、および過酸化水素のみの試験も
また行った。先の試験におけるように、過酸化水素のみ
の試験は約4.0×10−1のS/SO値をもたらした
。5分間に亘る連続プラズマ100ワツトによる試験な
らびに0.5ミリ秒のプラズマ、オン、そして1.0ミ
リ秒のプラズマ、オフの周期をもって15分間に亘り脈
動させたプラズマ150ワツトによる試験の結果を第■
表に示す。
(Example ■) The pulsating effect of plasma power on sporicidal activity was determined using a hydrogen peroxide concentration of 0.208 ■H2O2/'') Torr and a pressure of 1.5 Torr.The samples were as in Example ■, Pre-treated with hydrogen peroxide for 10 minutes. Air plasma only and hydrogen peroxide only tests were also performed. As in the previous test, the hydrogen peroxide only test was approximately 4.0 x 10-1 Testing with 100 watts of continuous plasma for 5 minutes and pulsing for 15 minutes with cycles of 0.5 ms plasma, on, and 1.0 ms plasma, off resulted in an S/SO value of The results of the test using 150 watts of plasma are shown below.
Shown in the table.

第  ■  表 殺胞子活性に関するプラズマ脈動の効果★2.2X10
5個の細菌全滅。
Chapter ■ Table Effect of plasma pulsation on sporicidal activity★2.2X10
5 bacteria wiped out.

これら試験の結果は、滅菌が5分間以内に連続プラズマ
処理により達成し得ることを示している。
The results of these tests indicate that sterilization can be achieved by continuous plasma treatment within 5 minutes.

(実施例■) 殺胞子活性に関する反復H2O2/プラズマ処理の効果
を0.125mg/リットルの過酸化水素濃度および1
.5トールの圧力を用いて求めた。各処理周期はH2O
2による10分間の前処理時間および脈動プラズマ20
0ワツトに対する15分間の暴露(0,5ミリ秒のプラ
ズマ、オン、そして1.0ミリ秒のプラズマ、オフ)か
ら構成された。lおよび2回の処理周期による効果を第
■表・中に示す。
(Example ■) The effect of repeated H2O2/plasma treatments on sporicidal activity was evaluated using hydrogen peroxide concentrations of 0.125 mg/liter and 1
.. Determined using a pressure of 5 torr. Each treatment cycle is H2O
2 10 min pretreatment time and pulsating plasma 20
It consisted of a 15 minute exposure to 0 watts (0.5 ms plasma on and 1.0 ms plasma off). The effects of 1 and 2 treatment cycles are shown in Table 3.

第■表 殺胞子活性に関するH2O2/プラズマ周期の回数によ
る効果 1   5.9X10−16.6X10”−18,8X
10−’2   8.2X10″″”   1.8X1
0−10”前2゜5X10  個の細菌全滅。
Table Ⅲ Effect of number of H2O2/plasma cycles on sporicidal activity 1 5.9X10-16.6X10"-18,8X
10-'2 8.2X10'''' 1.8X1
0-10" 2°5 x 10 bacteria wiped out.

これらの結果は、試料を2回のH2O2/プラズマ処理
周期に曝すことにより低H2O2濃度において、滅菌を
成就し得ることを示している。
These results indicate that sterilization can be achieved at low H2O2 concentrations by exposing the sample to two H2O2/plasma treatment cycles.

上記の実施例は、プラズマ滅菌法における反応性種の先
駆物質としての過酸化水素の使用効果を示している。こ
の方法の操作パラメータ、すなわち過酸化水素濃度、前
処理周期、印加パワーおよびプラズマ生成の持続時間は
可成り広い限界内で変化させて、適当な滅菌周期を作り
出すことができる。もしプラズマ生成の持続時間が増大
すれば、印加するパワーまたは過酸化水素濃度は減少さ
せることができ、また同様にもし過酸化水素濃度または
印加パワーが増加すると、プラズマ生成の持続時間を減
少させることができる。
The above examples demonstrate the effectiveness of using hydrogen peroxide as a precursor of reactive species in plasma sterilization methods. The operating parameters of this method, namely hydrogen peroxide concentration, pretreatment period, applied power and duration of plasma generation, can be varied within fairly wide limits to produce a suitable sterilization cycle. If the duration of plasma generation increases, the applied power or hydrogen peroxide concentration can be decreased, and similarly, if the hydrogen peroxide concentration or applied power increases, the duration of plasma generation can be decreased. I can do it.

(実施例■) プラズマに暴露すべき物品は温度が上昇するので、実験
は、過酸化水素と熱によって得られた殺胞子活性を過酸
化水素とプラズマによって得られたものと比較して行り
た。この試験は、プラズマ・チャンバ内のワイヤーケー
ジの内側および外側に試料を配置することにより行った
。金属はRF輻射を有効に遮蔽するので、ワイヤーケー
ジの内の試料はRF輻射およびプラズマ生成から遮蔽さ
れることになったが、過酸化水素蒸気またはプラズマに
より生成される熱に対する暴露から遮蔽された訳ではな
い。試料は、1.5トールの圧力、0゜208■過酸化
水素/リットルによって10分間に亘り処理した。次い
で、処理した試料を帆5ミリ秒のプラズマ、オン、そし
て1.0ミリ秒のプラズマ、オフの周期をもって15分
間に亘り脈動させたプラズマ150ワツ)K暴露した。
(Example ■) Since the temperature of the article to be exposed to plasma increases, experiments were conducted to compare the sporicidal activity obtained with hydrogen peroxide and heat to that obtained with hydrogen peroxide and plasma. Ta. This test was performed by placing samples inside and outside a wire cage within a plasma chamber. Since metal effectively shields RF radiation, the sample inside the wire cage was to be shielded from RF radiation and plasma generation, but not from exposure to hydrogen peroxide vapor or heat generated by the plasma. It's not a translation. The samples were treated with 0.208 μm hydrogen peroxide/liter for 10 minutes at a pressure of 1.5 Torr. The treated samples were then exposed to a pulsed plasma (150 W) for 15 minutes with a period of 5 msec plasma on and 1.0 msec plasma off.

ワイヤーケージの内側および外側に配置したナイロンブ
ロックの温度をラフストロンモデル(Luxtrori
Model)100OA、rフルオロブチイック(FL
UOROPTIC)J温度計で監視した。プラズマ処理
の末期において、ワイヤーケージの内外で記録された温
度はそれぞれ52.1℃および56.9℃であった。殺
胞子活性試験の結果は第■■表中に示す。
The temperature of the nylon blocks placed inside and outside the wire cage was measured using the Luxtrori model (Luxtrori model).
Model) 100OA, rfluorobutic (FL)
Monitored with UOROPTIC) J thermometer. At the end of the plasma treatment, the temperatures recorded inside and outside the wire cage were 52.1°C and 56.9°C, respectively. The results of the sporicidal activity test are shown in Table ■■.

過酸化水素蒸気のみによる対照実験もまた実施しプラズ
マによる殺胞子活性の比較 H2O2+プ7ズff     2.4X10−”  
       O”★★3.0X105個の胞子全滅。
A control experiment using only hydrogen peroxide vapor was also carried out to compare sporicidal activity with plasma H2O2 + plasma ff 2.4X10-"
O”★★3.0X 105 spores were completely destroyed.

これらの結果は、より顕著に良好な殺胞子活性がワイヤ
ーケージの外側よりも内側で、過酸化水素とプラズマの
組合わせにより得られたことを示している。ワイヤーケ
ージ内側の殺胞子活性の減少は大部分プラズマ生成の欠
如に基因すべきものである。それは同様な殺胞子活性が
、ケージの内側および外側で過酸化水素のみにより得ら
れ、そしてプラズマ処理の後ワイヤーケージ内外の温度
が同様であったからである。
These results indicate that significantly better sporicidal activity was obtained with the combination of hydrogen peroxide and plasma inside the wire cage than outside. The decrease in sporicidal activity inside the wire cage can be attributed in large part to the lack of plasma production. This is because similar sporicidal activity was obtained with hydrogen peroxide alone inside and outside the cage, and the temperatures inside and outside the wire cage were similar after plasma treatment.

【図面の簡単な説明】[Brief explanation of drawings]

図は本発明において使用されるプラズマ反応装置を示す
概略図である。 10・・・扉または開口、11・・・入口、12・・・
管路、13・・・高周波電極、14・・・管接続口、2
0・・・チャンバ。 特許出願人   サーギコス・インコーホレイテッド(
外2名)−=−・・′
The figure is a schematic diagram showing a plasma reactor used in the present invention. 10...door or opening, 11...entrance, 12...
Pipe line, 13... High frequency electrode, 14... Pipe connection port, 2
0...Chamber. Patent applicant: Surgicos Incorporated (
2 people outside) −=−・・・′

Claims (9)

【特許請求の範囲】[Claims] (1)滅菌すべき物品をチャンバ内に配置する工程と、 前記物品に過酸化水素蒸気を、過酸化水素が該物品とご
く緊密な状態となるに足る時間に亘り接触させる工程と
、 前記物品の周囲にプラズマを発生させる工程と、前記物
品を前記プラズマ中に、滅菌を行うのに足る期間に亘り
保持する工程と、 を備えた滅菌方法。
(1) placing an article to be sterilized in a chamber; contacting the article with hydrogen peroxide vapor for a sufficient time to bring the hydrogen peroxide into intimate contact with the article; and A sterilization method comprising the steps of: generating plasma around the article; and retaining the article in the plasma for a sufficient period of time to effect sterilization.
(2)前記チャンバ内の過酸化水素濃度が、チャンバ容
量の1リットル当たり少なくとも0.05mgである特
許請求の範囲第1項記載の方法。
2. The method of claim 1, wherein the hydrogen peroxide concentration in the chamber is at least 0.05 mg per liter of chamber volume.
(3)プラズマが脈動される特許請求の範囲第1項記載
の方法。
(3) The method according to claim 1, wherein the plasma is pulsated.
(4)プラズマがパワー−オン−パワー−オフ割合1:
2をもって脈動される特許請求の範囲第3項記載の方法
(4) Plasma power-on-power-off ratio 1:
4. A method as claimed in claim 3, wherein the pulses are pulsated at .2.
(5)前記チャンバ内の過酸化水素濃度が、チャンバ容
量に対して0.05乃至10mg/リットルである特許
請求の範囲第1項記載の方法。
(5) The method according to claim 1, wherein the hydrogen peroxide concentration in the chamber is 0.05 to 10 mg/liter based on the chamber capacity.
(6)過酸化水素の濃度が0.208mg/リットルで
ある特許請求の範囲第1項記載の方法。
(6) The method according to claim 1, wherein the concentration of hydrogen peroxide is 0.208 mg/liter.
(7)前処理時間が5乃至30分である特許請求の範囲
第1項記載の方法。
(7) The method according to claim 1, wherein the pretreatment time is 5 to 30 minutes.
(8)プラズマが5乃至60分の期間に亘り発生される
特許請求の範囲第1項記載の方法。
(8) The method according to claim 1, wherein the plasma is generated over a period of 5 to 60 minutes.
(9)過酸化水素およびプラズマ処理周期が反復される
特許請求の範囲第1項記載の方法。
(9) The method of claim 1, wherein the hydrogen peroxide and plasma treatment cycles are repeated.
JP61143087A 1985-06-21 1986-06-20 Sterilizing system by hydrogen peroxide plasma Granted JPS61293465A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/747,209 US4643876A (en) 1985-06-21 1985-06-21 Hydrogen peroxide plasma sterilization system
US747209 1996-11-12

Publications (2)

Publication Number Publication Date
JPS61293465A true JPS61293465A (en) 1986-12-24
JPH0262261B2 JPH0262261B2 (en) 1990-12-25

Family

ID=25004118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61143087A Granted JPS61293465A (en) 1985-06-21 1986-06-20 Sterilizing system by hydrogen peroxide plasma

Country Status (14)

Country Link
US (1) US4643876A (en)
EP (1) EP0207417B1 (en)
JP (1) JPS61293465A (en)
KR (1) KR930003313B1 (en)
AT (1) ATE56881T1 (en)
AU (1) AU592576B2 (en)
BR (1) BR8602867A (en)
CA (1) CA1264217A (en)
DE (1) DE3674482D1 (en)
ES (1) ES8704737A1 (en)
IE (1) IE59218B1 (en)
IN (2) IN163670B (en)
NZ (1) NZ216563A (en)
ZA (1) ZA864630B (en)

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ES556298A0 (en) 1987-04-16

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