JP3495356B2 - Sterilization and dry cleaning equipment - Google Patents
Sterilization and dry cleaning equipmentInfo
- Publication number
- JP3495356B2 JP3495356B2 JP2001359858A JP2001359858A JP3495356B2 JP 3495356 B2 JP3495356 B2 JP 3495356B2 JP 2001359858 A JP2001359858 A JP 2001359858A JP 2001359858 A JP2001359858 A JP 2001359858A JP 3495356 B2 JP3495356 B2 JP 3495356B2
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- JP
- Japan
- Prior art keywords
- sterilization
- dry cleaning
- plasma
- discharge
- nanometers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Landscapes
- Cleaning In General (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Drying Of Semiconductors (AREA)
Description
【０００１】[0001]
【発明の属する技術分野】この発明は、例えば、電子産
業で使用される基板、あるいは、食品容器等に適する滅
菌及びドライ洗浄装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sterilization and dry cleaning apparatus suitable for substrates, food containers, etc. used in the electronics industry, for example.
【０００２】[0002]
【従来の技術】従来、表面に付着した有機物等の汚れを
取除く手段として、例えば、オゾンと紫外線ランプを用
いる方法の特開平１１−９０３７０号公報や、オゾンに
水蒸気を混合する方法の特開平５−２５９１３９号公報
のものが知られている。2. Description of the Related Art Conventionally, as means for removing dirt such as organic substances adhering to the surface, for example, Japanese Patent Application Laid-Open No. 11-90370, which uses ozone and an ultraviolet lamp, and Japanese Patent Application Laid-Open No. H10-90370, which mixes steam with ozone The one disclosed in Japanese Patent Laid-Open No. 5-259139 is known.
【０００３】[0003]
【発明が解決しようとする課題】オゾンと紫外線ランプ
を用いる手段、あるいは、オゾンに水蒸気を混合する手
段は、いずれも、オゾン自体の化学的反応を用いて滅菌
等の処理を行なうため、化学反応処理に時間がかかる不
具合があり、作業性を考えると作業能率の面で望ましく
ない。The means using ozone and an ultraviolet lamp, or the means for mixing ozone with water vapor, both perform chemical reactions such as sterilization using the chemical reaction of ozone itself. There is a problem that the processing takes time, which is not desirable in terms of work efficiency in view of workability.
【０００４】そこで、この発明は、迅速に滅菌と汚れ落
しが行なえるようにした滅菌及びドライ洗浄装置を提供
することを目的としている。Therefore, an object of the present invention is to provide a sterilization and dry cleaning device which can sterilize and remove dirt quickly.
【０００５】[0005]
【課題を解決するための手段】前記目的を達成するため
に、この発明の請求項１にあっては、被処理物が収容さ
れる処理室と、その処理室内に酸素、あるいは、酸素を
含む混合気体を放電励起し、プラズマを発生させるプラ
ズマ発生装置と、プラズマが発生する前記処理室内へ、
ガス状の水分子を噴射する水噴射装置と、紫外線を照射
する紫外線照射装置とを備えていることを特徴とする。In order to achieve the above object, according to claim 1 of the present invention, a processing chamber in which an object to be processed is accommodated, and oxygen or oxygen is contained in the processing chamber. A plasma generator that excites a mixed gas with discharge to generate plasma, and into the processing chamber where plasma is generated,
It is characterized by comprising a water jetting device for jetting gaseous water molecules and an ultraviolet ray irradiating device for radiating ultraviolet rays.
【０００６】これにより、ガス状の水分子は、プラズマ
によって水分解する時に、同時に紫外線の照射を受ける
ことで、ヒドロキシラジカル（ＯＨ）、パーオキシド
（Ｏ2Ｈ）、酸素原子（Ｏ）等の活性種が多量に発生す
るようになる。これら多量に発生したヒドロキシラジカ
ル、パーオキシド等は汚に対して直接作用し、有機汚染
物質を迅速に燃焼灰化除去する、と同時に滅菌状態が確
保されることで、例えば、滅菌された食品容器等が迅速
に得られるようになる。[0006] As a result, when water molecules in the form of gas are decomposed by water by plasma, they are simultaneously irradiated with ultraviolet rays to activate hydroxyl radicals (OH), peroxides (O 2 H), oxygen atoms (O) and the like. A lot of seeds will be generated. Hydroxyl radicals, peroxides, etc. generated in large quantities directly act on stains to quickly burn and remove organic pollutants, and at the same time ensure a sterilization state, for example, sterilized food containers, etc. Will be obtained quickly.
【０００７】また、この発明の請求項２にあっては、一
方が陽極、他方が陰極となる放電電極を有するプラズマ
発生装置において、その放電電極の内、少なくともいず
れか一方の放電電極の表面を絶縁物あるいは誘電体で被
覆することを特徴とする。According to a second aspect of the present invention, in a plasma generator having a discharge electrode, one of which serves as an anode and the other of which serves as a cathode, at least one of the discharge electrodes has a surface. It is characterized by being covered with an insulator or a dielectric.
【０００８】これにより、放電電極間の電子の移動によ
ってプラズマ放電が得られるようになる。この時、放電
電極は、絶縁物あるいは誘電体で被覆されることで、誘
電体バリア放電となり、被処理物等に損傷を与えるアー
ク放電の発生が抑えられ、安定したプラズマ放電が長期
間に亘って確保されるようになる。As a result, plasma discharge can be obtained by the movement of electrons between the discharge electrodes. At this time, the discharge electrode becomes a dielectric barrier discharge by being covered with an insulator or a dielectric, and the occurrence of arc discharge that damages the object to be processed is suppressed, and stable plasma discharge is maintained for a long period of time. Will be secured.
【０００９】また、この発明の請求項３にあっては、放
電電極の電源を、パルス電源とすることを特徴とする。According to a third aspect of the present invention, the power source of the discharge electrode is a pulse power source.
【００１０】これにより、放電電極には間欠的にパルス
電圧が印加されるようになるため、被処理物に損傷を与
えるアーク放電の発生が抑えられ、安定したプラズマ放
電が長期間に亘って確保されるようになる。As a result, the pulse voltage is intermittently applied to the discharge electrode, so that the occurrence of arc discharge that damages the object to be processed is suppressed, and stable plasma discharge is secured for a long period of time. Will be done.
【００１１】また、この発明の請求項４にあっては、紫
外線照射装置の紫外線の波長を、１５６ナノメートルか
ら２００ナノメートルの短波長成分と、２００ナノメー
トルから２５６ナノメートルの長波長成分の組合せとす
ることを特徴とする。According to a fourth aspect of the present invention, the wavelength of the ultraviolet rays of the ultraviolet irradiating device is divided into a short wavelength component of 156 nanometers to 200 nanometers and a long wavelength component of 200 nanometers to 256 nanometers. It is characterized by a combination.
【００１２】これにより、プラズマの効果に加え、短波
長成分によるオゾンの生成と、長波長成分によるオゾン
からの酸素原子、水分子と酸素原子からのヒドロキシラ
ジカルおよび、パーオキシドが高効率で生成できるよう
になる。As a result, in addition to the effect of plasma, it is possible to generate ozone with short wavelength components and oxygen atoms from ozone with long wavelength components, hydroxy radicals from water molecules and oxygen atoms, and peroxides with high efficiency. become.
【００１３】[0013]
【発明の実施の形態】以下、図１と図２の図面を参照し
ながらこの発明の実施の形態について具体的に説明す
る。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be specifically described below with reference to the drawings of FIGS. 1 and 2.
【００１４】図１は滅菌及びドライ洗浄装置全体の概要
説明図を示している。滅菌及びドライ洗浄装置１は、例
えば、基板あるいは、食品容器等の被処理物３が収容さ
れる処理室５に、プラズマ発生装置７、水噴射装置９、
紫外線照射装置１１を備える構造となっている。FIG. 1 is a schematic explanatory view of the entire sterilization and dry cleaning apparatus. The sterilization and dry cleaning apparatus 1 includes, for example, a plasma generation device 7, a water injection device 9, a processing chamber 5 in which an object to be processed 3 such as a substrate or a food container is stored.
The structure is provided with the ultraviolet irradiation device 11.
【００１５】処理室５は、透明な石英ガラス１３によっ
て内部が上下に仕切られ、上下に仕切られた下部の部屋
５ａには、一方に排気口１５が、他方に前記プラズマ発
生装置７が設けられると共に、図２に示すようにヒンジ
１９を支点として開閉扉１７を開けることで、被処理物
３の出し入れが可能となっている。下部の部屋５ａの内
部圧力勾配は、外の大気と開放する排気口１５側が低
く、プラズマ発生装置７側が高くなっていて、プラズマ
発生装置７から排気口１５へ向う流れが確保されてい
る。The inside of the processing chamber 5 is vertically divided by a transparent quartz glass 13, and the lower chamber 5a which is vertically divided is provided with an exhaust port 15 on one side and the plasma generator 7 on the other side. At the same time, as shown in FIG. 2, by opening the opening / closing door 17 with the hinge 19 as a fulcrum, the object 3 can be taken in and out. The internal pressure gradient of the lower chamber 5a is low on the side of the exhaust port 15 that is open to the outside atmosphere and high on the side of the plasma generator 7, so that a flow from the plasma generator 7 to the exhaust port 15 is secured.
【００１６】プラズマ発生装置７は、大気圧でプラズマ
を発生させる大気圧プラズマ発生装置となっており、装
置本体２１内には、冷却用のフィン２２を有する一対の
対向し合う放電電極２３，２４と、酸素を含む混合気体
を前記放電電極２３，２４へ向け噴射するガス供給ノズ
ル部２５とを有している。The plasma generator 7 is an atmospheric pressure plasma generator for generating plasma at atmospheric pressure, and a pair of opposed discharge electrodes 23, 24 having fins 22 for cooling are provided in the main body 21 of the device. And a gas supply nozzle portion 25 for injecting a mixed gas containing oxygen toward the discharge electrodes 23, 24.
【００１７】一対の放電電極２３，２４は一方が陽極、
他方が陰極となっていて、陽極となる放電電極２４に
は、パルス電源２７によって間欠的にパルス電圧が印加
されるようになっている。One of the pair of discharge electrodes 23 and 24 is an anode,
A pulse voltage is intermittently applied by the pulse power supply 27 to the discharge electrode 24, which has the other one serving as the cathode and serves as the anode.
【００１８】パルス電源２７としては、±６ｋＶ〜±１
２ｋＶで、周波数が１２ｋＨｚ〜３０ｋＨｚの交番電圧
とすることが望ましい。また、一対の放電電極２３，２
４の内、少なくともいずれか一方は、絶縁材又は誘電体
とで被覆され、間欠的なパルスのパルス電圧の印加と相
俟ってアーク放電の発生が抑えられるようになってい
る。As the pulse power supply 27, ± 6 kV to ± 1
It is desirable that the alternating voltage is 2 kHz and the frequency is 12 kHz to 30 kHz. In addition, the pair of discharge electrodes 23, 2
At least one of the four is covered with an insulating material or a dielectric so as to suppress the occurrence of arc discharge in combination with the application of the pulse voltage of intermittent pulses.
【００１９】ガス供給ノズル部２５は、酸素を供給する
酸素供給管２９とヘリウム、あるいはアルゴン等の不活
性ガスを供給する不活性ガス供給管３１とそれぞれ接続
している。酸素供給管２９からの酸素と不活性ガス供給
管３１からのヘリウム、又は、アルゴン等のガスはガス
供給ノズル部２５のガス供給管３３で一緒となり、一緒
となった混合気体はガス供給ノズル部２５へ向けて供給
されるようになっている。酸素と不活性ガスの混合比を
決定する酸素の供給量は、酸素供給管２９に設けられた
流量調整器３５及び開閉弁３７の制御によって、不活性
ガスの供給量は、不活性ガス供給管３１に設けられた流
量調整器３９及び開閉弁４１の制御によってそれぞれ行
なわれるようになっている。The gas supply nozzle section 25 is connected to an oxygen supply pipe 29 for supplying oxygen and an inert gas supply pipe 31 for supplying an inert gas such as helium or argon. Oxygen from the oxygen supply pipe 29 and gas such as helium or argon from the inert gas supply pipe 31 are combined in the gas supply pipe 33 of the gas supply nozzle unit 25, and the combined gas mixture is the gas supply nozzle unit. It is designed to be supplied to 25. The supply amount of oxygen, which determines the mixing ratio of oxygen and the inert gas, is controlled by the flow rate regulator 35 and the opening / closing valve 37 provided in the oxygen supply pipe 29. The flow rate adjuster 39 and the on-off valve 41 provided on the valve 31 are controlled respectively.
【００２０】なお、ガス供給ノズル部２５には、必ずし
も混合気体が供給されなくてもよく、酸素だけであって
もよい。The gas supply nozzle portion 25 does not necessarily need to be supplied with the mixed gas, and may contain only oxygen.
【００２１】水噴射装置９は、ガス状の水分子として下
部の部屋５ａへ噴射する水供給ノズル部４３を有してい
る。The water injection device 9 has a water supply nozzle section 43 for injecting gaseous water molecules into the lower chamber 5a.
【００２２】水供給ノズル部４３は、水蒸気発生装置４
５と接続し、水蒸気発生装置４５によって生成された水
蒸気が水供給ノズル部４３に供給されるようになってい
る。水蒸気発生装置４５は、開閉弁４７及び流量調整器
４９を介して純水が送り込まれるようになっている。The water supply nozzle section 43 is used for the steam generator 4
5, the steam generated by the steam generator 45 is supplied to the water supply nozzle portion 43. Pure water is fed to the steam generator 45 via an on-off valve 47 and a flow rate regulator 49.
【００２３】紫外線照射装置１１は、石英ガラス１３に
よって仕切られた上部の部屋５ｂに配置された紫外線ラ
ンプ５１から石英ガラス１３を介して下部の部屋５ａへ
向けて紫外線を照射するようになっている。The ultraviolet irradiating device 11 irradiates ultraviolet rays from an ultraviolet lamp 51 arranged in an upper chamber 5b partitioned by the quartz glass 13 toward the lower chamber 5a through the quartz glass 13. .
【００２４】紫外線の波長は、２００ナノメートルから
２５６ナノメートルの長波長成分のみを用いてもよい
が、１５６ナノメートルから２００ナノメートルの短波
長成分と、２００ナノメートルから２５６ナノメートル
の長波長成分とを組合わせた手段とすることが望まし
い。これにより、短波長成分によるオゾンの生成と、長
波長成分によるオゾンからの酸素原子及び水分子と酸素
原子からのヒドロキシラジカル及びパーオキシドの生成
が高効率で得られるようになる。As for the wavelength of ultraviolet rays, only the long wavelength component of 200 nm to 256 nm may be used, but the short wavelength component of 156 nm to 200 nm and the long wavelength component of 200 nm to 256 nm are used. It is desirable to use a means that combines the ingredients. As a result, ozone can be generated with a short-wavelength component and hydroxyl radicals and peroxides can be generated with high efficiency from an ozone atom and a water molecule and an oxygen atom from ozone due to a long-wavelength component.
【００２５】紫外線ランプ５１の位置は、被処理物３へ
の悪影響とヒドロキシラジカルによる洗浄及び滅菌の効
果を総合的に判断し設定される。例えば、被処理物が金
属のような紫外線の影響を受けない材料の場合には、被
処理物の表面近傍でヒドロキシラジカルが発生するよう
紫外線ランプ５１の真上に設置する。一方、被処理物が
プラスチックの材料で何回も使用される場合には、紫外
線が被処理物に直接照射されない位置に設置される。The position of the ultraviolet lamp 51 is set by comprehensively judging the adverse effects on the object 3 to be processed and the effects of cleaning and sterilization by the hydroxy radicals. For example, when the object to be processed is a material such as metal that is not affected by ultraviolet rays, it is installed right above the ultraviolet lamp 51 so that hydroxy radicals are generated near the surface of the object to be processed. On the other hand, when the object to be processed is a plastic material and is used many times, it is installed at a position where the object to be processed is not directly irradiated with ultraviolet rays.
【００２６】このように構成された滅菌及びドライ洗浄
装置１によれば、一対の放電電極２３，２４によって酸
素を含む混合気体を放電励起し、プラズマを発生させ
る。According to the sterilization and dry cleaning apparatus 1 thus constructed, the pair of discharge electrodes 23 and 24 discharge-excite the mixed gas containing oxygen to generate plasma.
【００２７】この時、放電電極２３，２４は、間欠的に
印加される高周波のパルス電圧と、誘電体バリア放電と
によって、アーク放電が抑えられた安定したプラズマ放
電が得られるようになる。At this time, the discharge electrodes 23 and 24 can obtain stable plasma discharge in which arc discharge is suppressed by the high frequency pulse voltage applied intermittently and the dielectric barrier discharge.
【００２８】一方、水供給ノズル部４３から噴射された
ガス状の水分子は、放電電極２３，２４によって発生し
たプラズマに加えて紫外線ランプ５１からの紫外線を受
けるようになる。On the other hand, the gaseous water molecules ejected from the water supply nozzle 43 receive the ultraviolet rays from the ultraviolet lamp 51 in addition to the plasma generated by the discharge electrodes 23 and 24.
【００２９】この時の紫外線の照射エネルギーは、短波
長成分と長波長成分の組合せとなることで、短波長成分
によるオゾンの生成と、長波長成分によるオゾンからの
酸素原子（Ｏ）と酸素原子と水分子からの、ヒドロキシ
ラジカル（ＯＨ），パーオキシド（Ｏ2 Ｈ）の活性種が
高効率に多量に発生するようになる。The irradiation energy of the ultraviolet rays at this time is a combination of a short-wavelength component and a long-wavelength component, so that ozone is generated by the short-wavelength component and oxygen atoms (O) and oxygen atoms from the ozone by the long-wavelength component are generated. The active species of hydroxy radical (OH) and peroxide (O 2 H) are generated from the water molecules with high efficiency and in large amounts.
【００３０】これは、プラズマ単独に比べてプラズマに
紫外線がプラスされることで、相乗効果が生まれたもの
と考えられる。It is considered that this is because a synergistic effect is produced by adding ultraviolet rays to the plasma as compared with plasma alone.
【００３１】多量に発生したヒドロキシラジカル、パー
オキシド、酸素原子は、被処理物３の表面に付着した汚
れに対して直接作用し、その有機汚染物質を迅速に燃焼
灰化除去する。と同時に滅菌状態が確保される。The hydroxy radicals, peroxides, and oxygen atoms generated in large amounts directly act on the dirt adhering to the surface of the object 3 to be treated, and the organic pollutants are rapidly burned and removed by combustion. At the same time, the sterilized state is secured.
【００３２】したがって、被処理物が電子部品等の基板
であれば、表面の汚れは短時間で汚れが落とせるように
なる。また、食品容器であれば、短時間で汚れが除去さ
れた滅菌状態が得られるようになり、作業能率が大幅に
向上する。Therefore, if the object to be processed is a substrate such as an electronic component, the dirt on the surface can be removed in a short time. Further, in the case of a food container, a sterilized state in which dirt is removed can be obtained in a short time, and work efficiency is significantly improved.
【００３３】[0033]
【発明の効果】以上、説明したようにこの発明の請求項
１によれば、プラズマに、紫外線をプラスさせること
で、滅菌作用と汚れを落とすヒドロキシラジカル、パー
オキシド、酸素原子等を多量に発生させることができる
ようになる。この結果、汚れが除去され滅菌された被処
理物が短時間で得られるようになり、作業能率の大幅な
向上を図ることができる。As described above, according to the first aspect of the present invention, by adding ultraviolet rays to the plasma, a large amount of hydroxy radicals, peroxides, oxygen atoms and the like which sterilize and remove dirt are generated. Will be able to. As a result, it becomes possible to obtain a sterilized object to be processed from which dirt has been removed, and it is possible to significantly improve the work efficiency.
【００３４】また、この発明の請求項２によれば、アー
ク放電の発生が抑えられ安定したプラズマの発生が長期
間に亘って確保することができる。According to the second aspect of the present invention, generation of arc discharge is suppressed and stable plasma generation can be secured for a long period of time.
【００３５】また、この発明の請求項３によれば、間欠
的に印加されるパルス電圧によってアーク放電が抑えら
れ、安定したプラズマの発生が長期間にわたって確保す
ることができる。According to the third aspect of the present invention, arc discharge is suppressed by the pulse voltage applied intermittently, and stable plasma generation can be secured for a long period of time.
【００３６】また、この発明の請求項４によれば、短波
長成分と長波長成分の組合せによる照射エネルギーによ
って、高効率で多量のヒドロキシラジカル、パーオキシ
ド、酸素原子等を発生させることができる。According to the fourth aspect of the present invention, a large amount of hydroxy radicals, peroxides, oxygen atoms and the like can be generated with high efficiency by the irradiation energy by the combination of the short wavelength component and the long wavelength component.
【図１】この発明にかかる滅菌及びドライ洗浄装置全体
の概要説明図。FIG. 1 is a schematic explanatory view of an entire sterilization and dry cleaning apparatus according to the present invention.
【図２】処理室の概要平面図。FIG. 2 is a schematic plan view of a processing chamber.
３…被処理物 ５…処理室 ７…プラズマ発生装置 ９…水噴射装置 １１…紫外線照射装置 ２３，２４…放電電極 ２７…パルス電源 3 ... Object to be processed 5 ... Processing room 7 ... Plasma generator 9 ... Water injection device 11 ... Ultraviolet irradiation device 23, 24 ... Discharge electrodes 27 ... Pulse power supply
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ Ｈ０１Ｌ 21/3065 Ｈ０１Ｌ 21/302 Ｎ (72)発明者 秋津 哲也 山梨県甲府市北新１丁目２の６ 北新第 ３住宅104号 (72)発明者 藤井 啓次 千葉県四街道市つくし座１丁目16番７号 (56)参考文献 特開 平５−29285（ＪＰ，Ａ) 特開 昭59−11629（ＪＰ，Ａ) 特開 平５−72519（ＪＰ，Ａ) 特開2000−58292（ＪＰ，Ａ) 特開 平２−299287（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) B08B 7/00 A61L 2/10 A61L 2/14 B01J 19/08 B01J 19/12 H01L 21/3065 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 7 Identification code FI H01L 21/3065 H01L 21/302 N (72) Inventor Tetsuya Akitsu 1-2-6, Kitashin, Kofu City, Yamanashi Prefecture Kitashin 3rd Housing No. 104 (72) Inventor Keiji Fujii 1-16-7 Tsukushiza, Yotsukaido-shi, Chiba (56) Reference JP-A-5-29285 (JP, A) JP-A-59-11629 (JP, A) JP-A-5 -72519 (JP, A) JP 2000-58292 (JP, A) JP 2-299287 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) B08B 7/00 A61L 2 / 10 A61L 2/14 B01J 19/08 B01J 19/12 H01L 21/3065
Claims (4)
理室内に酸素、あるいは、酸素を含む混合気体を放電励
起し、プラズマを発生させるプラズマ発生装置と、プラ
ズマが発生する前記処理室内へ、ガス状の水分子を噴射
する水噴射装置と、紫外線を照射する紫外線照射装置と
を備えていることを特徴とする滅菌及びドライ洗浄装
置。1. A processing chamber in which an object to be processed is housed, a plasma generator for generating plasma by discharge-exciting oxygen or a mixed gas containing oxygen in the processing chamber, and the processing chamber in which plasma is generated. 1. A sterilization and dry cleaning device comprising: a water injection device that injects gaseous water molecules and an ultraviolet irradiation device that irradiates ultraviolet rays.
が陰極となる放電電極を有し、その放電電極の内、少な
くともいずれか一方の放電電極の表面が絶縁物あるいは
誘電体で被覆されていることを特徴とする請求項１記載
の滅菌及びドライ洗浄装置。2. The plasma generator has a discharge electrode, one of which serves as an anode and the other of which serves as a cathode, and at least one of the discharge electrodes has a surface coated with an insulator or a dielectric. The sterilization and dry cleaning device according to claim 1, wherein
いることを特徴とする請求項２記載の滅菌及びドライ洗
浄装置。3. The sterilization and dry cleaning apparatus according to claim 2, wherein the power source of the discharge electrode is a pulse power source.
６ナノメートルから２００ナノメートルの短波長成分
と、２００ナノメートルから２５６ナノメートルの長波
長成分の組合せから成ることを特徴とする請求項１記載
の滅菌の及びドライ洗浄装置。4. The wavelength of the ultraviolet light of the ultraviolet irradiation device is 15
2. The sterilization and dry cleaning device according to claim 1, which is composed of a combination of a short wavelength component of 6 nanometers to 200 nanometers and a long wavelength component of 200 nanometers to 256 nanometers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001359858A JP3495356B2 (en) | 2001-11-26 | 2001-11-26 | Sterilization and dry cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001359858A JP3495356B2 (en) | 2001-11-26 | 2001-11-26 | Sterilization and dry cleaning equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003159570A JP2003159570A (en) | 2003-06-03 |
| JP3495356B2 true JP3495356B2 (en) | 2004-02-09 |
Family
ID=19170779
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001359858A Expired - Fee Related JP3495356B2 (en) | 2001-11-26 | 2001-11-26 | Sterilization and dry cleaning equipment |
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| Country | Link |
|---|---|
| JP (1) | JP3495356B2 (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101174405B1 (en) | 2004-03-31 | 2012-08-16 | 아키라 미즈노 | Method of sterilization and apparatus therefor |
| JPWO2007049595A1 (en) * | 2005-10-25 | 2009-04-30 | 日本碍子株式会社 | Sterilization sterilizer |
| JP5170509B2 (en) * | 2007-03-26 | 2013-03-27 | 勝 堀 | Insecticide sterilization method and insecticide sterilizer |
| CN101156955B (en) * | 2007-11-21 | 2010-05-19 | 中山大学 | Non-equilibrium plasma type spray disinfection sanitizer generating apparatus |
| DE102008037898B4 (en) | 2008-02-13 | 2022-06-02 | The Coca-Cola Co. | Process and device for sterilizing packaging material and/or containers, use of plasma in this regard, and material or containers treated accordingly |
| EP3162435B1 (en) * | 2014-06-27 | 2020-03-11 | Kyushu Institute of Technology | Method for manufacturing reaction product in which phase interface reaction is employed and phase interface reactor |
| FR3024057B1 (en) * | 2014-07-24 | 2016-08-26 | Adixen Vacuum Products | METHOD AND STATION FOR TREATING A PLASTIC MATERIAL TRANSPORT BOX FOR THE CONVEYANCE AND ATMOSPHERIC STORAGE OF SUBSTRATES |
| CA2970350C (en) | 2014-12-22 | 2023-07-25 | Ivy Creative Labs, Inc. | Plasma treatment device and method of treating items |
| US11007292B1 (en) | 2020-05-01 | 2021-05-18 | Uv Innovators, Llc | Automatic power compensation in ultraviolet (UV) light emission device, and related methods of use, particularly suited for decontamination |
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2001
- 2001-11-26 JP JP2001359858A patent/JP3495356B2/en not_active Expired - Fee Related
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| Publication number | Publication date |
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| JP2003159570A (en) | 2003-06-03 |
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