JP2002324666A5 - - Google Patents
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- JP2002324666A5 JP2002324666A5 JP2002042044A JP2002042044A JP2002324666A5 JP 2002324666 A5 JP2002324666 A5 JP 2002324666A5 JP 2002042044 A JP2002042044 A JP 2002042044A JP 2002042044 A JP2002042044 A JP 2002042044A JP 2002324666 A5 JP2002324666 A5 JP 2002324666A5
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Claims (26)
前記第１の基板の上方及び前記第１の電極の端部の上に設けられた、側面を有する第１の絶縁膜と、
前記第１の電極上にあり前記第１の絶縁膜の側面に接する有機化合物膜と、
前記有機化合物膜上に形成された第２の電極とを有し、
前記第１の基板の周縁部の上方に第２の絶縁膜が設けられており、
前記第２の電極、前記第１の絶縁膜及び前記第２の絶縁膜を覆う保護膜を有し、
前記第２の絶縁膜の上方に、前記保護膜と接する第１の接着性を有する層を有し、
前記第１の絶縁膜と前記第２の絶縁膜とは同一の材料からなり、前記第１の接着性を有する層と第２の基板とが接することを特徴とする表示装置。 A first electrode formed on a first substrate;
A first insulating film having a side surface provided above the first substrate and on an end of the first electrode;
An organic compound film on the first electrode and in contact with a side surface of the first insulating film;
A second electrode formed on the organic compound film,
A second insulating film is provided above the peripheral edge of the first substrate;
A protective film covering the second electrode, the first insulating film, and the second insulating film;
A layer having a first adhesive property in contact with the protective film above the second insulating film;
The display device, wherein the first insulating film and the second insulating film are made of the same material, and the first adhesive layer and the second substrate are in contact with each other.
前記第１の基板の上方及び前記第１の電極の端部の上に設けられた、側面を有する第１の絶縁膜と、
前記第１の電極上にあり前記第１の絶縁膜の側面に接する有機化合物膜と、
前記有機化合物膜上に形成されたの第２の電極とを有し、
前記第１の基板の周縁部の上方に第２の絶縁膜が設けられており、
前記第２の電極、前記第１の絶縁膜及び前記第２の絶縁膜を覆う保護膜を有し、
前記第２の絶縁膜及び前記第１の絶縁膜と重なって第２の基板が設けられており、
前記第１の絶縁膜と前記第２の絶縁膜とは同一の材料からなり、前記保護膜と第２の基板との間が接着性を有する層で満たされていることを特徴とする表示装置。 A first electrode formed on a first substrate;
A first insulating film having a side surface provided above the first substrate and on an end of the first electrode;
An organic compound film on the first electrode and in contact with a side surface of the first insulating film;
A second electrode formed on the organic compound film,
A second insulating film is provided above the peripheral edge of the first substrate;
A protective film covering the second electrode, the first insulating film, and the second insulating film;
A second substrate is provided to overlap the second insulating film and the first insulating film;
Made of the same material as said first insulating film and the second insulating film, displayed between the protective film and the second substrate is characterized in that it is filled with a layer having adhesion device .
前記第１の基板の上方及び前記第１の電極の端部を覆って設けられた、側面を有する第１の絶縁膜と、
前記第１の電極上にあり前記第１の絶縁膜の側面に接する有機化合物膜と、
前記有機化合物膜上に形成された前記第２の電極と、
前記第１の基板の周縁部の上方に設けられた第２の絶縁膜と、
前記第１の絶縁膜上及び前記第２の絶縁膜上にそれぞれ設けられた凸状の第３の絶縁膜と、
前記第２の電極、前記第１の絶縁膜、前記第２の絶縁膜及び前記第３の絶縁膜を覆う保護膜と、
前記第２の絶縁膜の上方に、前記保護膜と接する接着性を有する層とを有し、
前記接着性を有する層と第２の基板とが接することを特徴とする表示装置。 A first electrode formed on a first substrate ;
A first insulating film having a side surface provided above the first substrate and covering an end portion of the first electrode;
An organic compound film on the first electrode and in contact with a side surface of the first insulating film;
The second electrode formed on the organic compound film;
A second insulating film provided above the peripheral edge of the first substrate;
A third insulating film convex respectively provided on the first insulating film and the upper second insulating film,
A protective film covering the second electrode, the first insulating film, the second insulating film, and the third insulating film;
An adhesive layer in contact with the protective film above the second insulating film ;
A display device, wherein the adhesive layer and the second substrate are in contact with each other.
前記第３の絶縁膜の厚さは、０．２μｍ以上１０μｍ以下であることを特徴とする表示装置。In claim 3 ,
The thickness of the third insulating film, a display device which is a 10μm hereinafter more 0.2 [mu] m.
前記第１の接着性を有する層は０．０５μｍ以上０．５μｍ以下の厚さであることを特徴とする表示装置。The display device, wherein the first adhesive layer has a thickness of 0.05 μm to 0.5 μm.
前記第１の基板の一部と前記接着性を有する層の一部と前記第２の基板の一部に接するように第２の接着性を有する層を有し、Having a second adhesive layer so as to be in contact with a part of the first substrate, a part of the adhesive layer, and a part of the second substrate;
前記第２の接着性を有する層の一部に接するように、金属板が設けられていることを特徴とする表示装置。A display device, wherein a metal plate is provided so as to be in contact with a part of the second adhesive layer.
前記第１の基板の上方及び前記第１の電極の端部を覆って設けられた、側面を有する第１の絶縁膜と、
前記第１の電極上にあり前記第１の絶縁膜の側面に接する有機化合物膜と、
前記有機化合物膜上の第２の電極とを有し、
前記第１の基板の周縁部の上方に第２の絶縁膜が設けられており、
前記第２の絶縁膜に沿って設けられた第３の絶縁膜を有し、
前記第２の電極、前記第１の絶縁膜、前記第２の絶縁膜及び前記第３の絶縁膜を覆う保護膜を有し、
前記第３の絶縁膜は前記第１の絶縁膜と前記第２の絶縁膜との間にあり、前記第２の絶縁膜と前記第３の絶縁膜との間に乾燥剤が設けられていることを特徴とする表示装置。A first electrode formed on a first substrate;
A first insulating film having a side surface provided above the first substrate and covering an end portion of the first electrode;
An organic compound film on the first electrode and in contact with a side surface of the first insulating film;
A second electrode on the organic compound film,
A second insulating film is provided above the peripheral edge of the first substrate;
A third insulating film provided along the second insulating film;
A protective film covering the second electrode, the first insulating film, the second insulating film, and the third insulating film;
The third insulating film is between the first insulating film and the second insulating film, and a desiccant is provided between the second insulating film and the third insulating film. A display device characterized by that.
前記第２の絶縁膜の上方に、前記保護膜と接する接着性を有する層を有し、前記接着性を有する層と前記第２の基板とが接することを特徴とする表示装置。In claim 7 ,
A display device having an adhesive layer in contact with the protective film above the second insulating film, wherein the adhesive layer and the second substrate are in contact with each other.
前記第１の絶縁膜、前記第２の絶縁膜及び前記第３の絶縁膜は同一の材料からなることを特徴とする表示装置。In claim 7 or claim 8 ,
The display device, wherein the first insulating film, the second insulating film, and the third insulating film are made of the same material.
前記保護膜は外部入力端子と接していることを特徴とする表示装置。In any one of Claims 1 thru | or 9 ,
The display device, wherein the protective film is in contact with an external input terminal.
前記保護膜は、窒化珪素膜又はＤＬＣ膜からなることを特徴とする表示装置。The display device, wherein the protective film is made of a silicon nitride film or a DLC film.
前記第２の絶縁膜の幅は、１００μｍ以上５０００μｍ以下であることを特徴とする表示装置。The width of the second insulating film is not less than 100 μm and not more than 5000 μm.
前記第１の基板及び前記第２の基板はガラスからなる基板であることを特徴とする表示装置。In any one of Claims 1 to 12 ,
The display device, wherein the first substrate and the second substrate are substrates made of glass.
前記第１の基板と前記第２の基板との間に不活性ガス又は窒素ガスで満たされていることを特徴とする表示装置。In any one of Claims 1 thru / or Claim 13 ,
The display device is characterized in that a space between the first substrate and the second substrate is filled with an inert gas or a nitrogen gas.
前記第１の絶縁膜の厚さは、１．０μｍ以上１０μｍ以下であることを特徴とする表示装置。The display device, wherein the thickness of the first insulating film is 1.0 μm or more and 10 μm or less.
前記第２の絶縁膜の厚さは、１．０μｍ以上１０μｍ以下であることを特徴とする表示装置。The display device, wherein the thickness of the second insulating film is 1.0 μm or more and 10 μm or less.
前記第１の絶縁膜はポリイミド樹脂膜、アクリル樹脂膜、又はポリアミド樹脂膜からなることを特徴とする表示装置。In any one of Claims 1 thru | or 16 ,
The first insulating film is a polyimide resin film, a display device, wherein the acrylic resin film, or a polyamide resin film or Ranaru.
前記第１の基板の上方に絶縁膜を成膜し、
前記絶縁膜をパターニングして、前記第１の電極の端部を覆う第１の絶縁膜と、前記第１の基板の周縁部の上方に設けられた第２の絶縁膜とを形成し、
前記第１の電極上に有機化合物膜を形成し、
前記有機化合物膜上に第２の電極を形成し、
前記第１の絶縁膜、前記第２の絶縁膜及び前記第２の電極を覆う保護膜を形成し、
前記第２の絶縁膜の上方に、前記保護膜と接して接着性を有する層を形成し、
前記第１の基板と第２の基板とを前記接着性を有する層により貼り合せることを特徴とする表示装置の作製方法。The first electrode is selectively formed on the first substrate,
Forming an insulating film on the first substrate ;
The insulating film is patterned to form a first insulating film covering the end portion of the first electrode, a second insulating film provided above the peripheral portion of the first substrate,
The organic compound film is formed on the first electrode,
Forming a second electrode on the organic compound film;
Forming a protective film covering the first insulating film, the second insulating film, and the second electrode;
On sides of the second insulating film, to form a layer having adhesion in contact with the protective film,
The method for manufacturing a display device comprising a cemented Turkey a layer having the adhesive and the first substrate and the second substrate.
前記第１の基板の上方に絶縁膜を成膜し、
前記絶縁膜をパターニングして、前記第１の電極の端部を覆う第１の絶縁膜と、前記第１の基板の周縁部の上方に設けられた第２の絶縁膜とを形成し、
前記第１の電極上に有機化合物膜を形成し、
前記有機化合物膜上に第２の電極を形成し、
前記第１の絶縁膜、前記第２の絶縁膜及び前記第２の電極を覆う保護膜を形成し、
前記第１の絶縁膜、前記第２の絶縁膜及び前記第２の電極の上方に、前記保護膜と接して接着性を有する層を形成し、
前記第１の基板と第２の基板とを前記接着性を有する層により貼り合せることを特徴とする表示装置の作製方法。The first electrode is selectively formed on the first substrate,
Forming an insulating film on the first substrate ;
The insulating film is patterned to form a first insulating film covering the end portion of the first electrode, a second insulating film provided above the peripheral portion of the first substrate,
The organic compound film is formed on the first electrode,
Forming a second electrode on the organic compound film;
Forming a protective film covering the first insulating film, the second insulating film, and the second electrode;
The first insulating film, the upper side of the second insulating film and the second electrode, to form a layer having adhesion in contact with the protective film,
The method for manufacturing a display device comprising a cemented Turkey a layer having the adhesive and the first substrate and the second substrate.
前記第１の基板の上方に層間絶縁膜を成膜し、
前記層間絶縁膜をパターニングして、前記第１の電極の端部上の第１の絶縁膜と、前記第１の基板の周縁部の上方に設けられた第２の絶縁膜とを形成し、
前記第１の絶縁膜と前記第２の絶縁膜上に絶縁膜を成膜し、
前記絶縁膜をパターニングして、前記第１の絶縁膜上及び前記第２の絶縁膜上にそれぞれ凸状の第３の絶縁膜を形成し、
前記第１の電極上に有機化合物膜を形成し、
前記有機化合物膜上に第２の電極を形成し、
前記第１の絶縁膜、前記第２の絶縁膜、前記第３の絶縁膜及び前記第２の電極を覆う保護膜を形成し、
前記第２の絶縁膜の上方に前記保護膜と接して接着性を有する層を形成し、
前記第１の基板と第２の基板とを前記接着性を有する層により貼り合せることを特徴とする表示装置の作製方法。The first electrode is selectively formed on the first substrate,
Forming an interlayer insulating film on the first substrate ;
Patterning the interlayer insulating film, forming a first insulating film on the end of the first electrode, a second insulating film provided above the peripheral portion of the first substrate,
The insulating film is formed on the first insulating film and the upper second insulating film,
Before patterning the Kize' Enmaku, respectively to form a convex third insulating film on the first insulating film and said second insulating film,
The organic compound film is formed on the first electrode,
Forming a second electrode on the organic compound film;
Forming a protective film covering the first insulating film, the second insulating film, the third insulating film, and the second electrode;
The protective film and in contact to form a layer having adhesive property on side of the second insulating film,
The method for manufacturing a display device comprising a cemented Turkey a layer having the adhesive and the first substrate and the second substrate.
前記第１の基板の上方に絶縁膜を成膜し、
前記絶縁膜をパターニングして、前記第１の電極の端部を覆う第１の絶縁膜と、前記第１の基板の周縁部の上方に設けられた第２の絶縁膜と、前記第１の絶縁膜と前記第２の絶縁膜との間に設けられた第３の絶縁膜とを形成し、
前記第１の電極上に有機化合物膜を形成し、
前記有機化合物膜上に第２の電極を形成し、
前記第１の絶縁膜、前記第２の絶縁膜、前記第３の電極及び前記第２の電極を覆う保護膜を形成し、
前記第２の絶縁膜と前記第３の絶縁膜との間に乾燥剤を充填し、
前記第２の絶縁膜上に接着性を有する層を形成し、
前記第１の基板と第２の基板とを前記接着性を有する層により貼り合せることを特徴とする表示装置の作製方法。The first electrode is selectively formed on the first substrate,
Forming an insulating film on the first substrate ;
Said insulating film is patterned and a first insulating film covering the end portion of the first electrode, a second insulating film provided above the peripheral portion of the first substrate, the first forming a third insulating film provided between the and the insulating film a second insulating film,
The organic compound film is formed on the first electrode,
Forming a second electrode on the organic compound film;
Forming a protective film covering the first insulating film, the second insulating film, the third electrode, and the second electrode;
Filled with desiccant between the third insulating film and the second insulating film,
Forming an adhesive layer on the second insulating film;
The method for manufacturing a display device comprising a cemented Turkey a layer having the adhesive and the first substrate and the second substrate.
前記第２の絶縁膜の幅は１００μｍ以上５０００μｍ以下であることを特徴とする表示装置の作製方法。In any one of Claims 18 to 21 ,
A method for manufacturing a display device, wherein the width of the second insulating film is greater than or equal to 100 μm and less than or equal to 5000 μm.
前記第２の絶縁膜の厚さは１．０μｍ以上１０μｍ以下であることを特徴とする表示装置の作製方法。In any one of Claims 18 to 22 ,
A manufacturing method of a display device, wherein the thickness of the second insulating film is 1.0 μm or more and 10 μm or less.
前記第２の絶縁膜はポリイミド樹脂膜、アクリル樹脂膜、ポリアミド樹脂膜のうちいずれか一つからなることを特徴とする表示装置の作製方法。24. In any one of claims 18 to 23 ,
The method for manufacturing a display device , wherein the second insulating film is made of any one of a polyimide resin film, an acrylic resin film, and a polyamide resin film.
前記第１の基板及び前記第２の基板をＣＯ2レーザーにより分断することを特徴とする表示装置の作製方法。 Any one smell of claim 18 through claim 24 Te,
The method for manufacturing a display device characterized by dividing the pre-Symbol first substrate and the second substrate by a CO 2 laser.
前記第１の基板と前記第２の基板とを不活性ガス又は窒素雰囲気下で貼り合せることを特徴とする表示装置の作製方法。 Any one smell of claim 18 through claim 25 Te,
The method for manufacturing a display device, characterized in that pre-Symbol bonded to the first substrate and the second substrate in an inert gas or nitrogen atmosphere.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| JP2002042044A JP4101529B2 (en) | 2001-02-22 | 2002-02-19 | Display device and manufacturing method thereof |
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| JP2001045925 | 2001-02-22 | ||
| JP2001-45925 | 2001-02-22 | ||
| JP2002042044A JP4101529B2 (en) | 2001-02-22 | 2002-02-19 | Display device and manufacturing method thereof |
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| JP2002324666A JP2002324666A (en) | 2002-11-08 |
| JP2002324666A5 true JP2002324666A5 (en) | 2005-08-25 |
| JP4101529B2 JP4101529B2 (en) | 2008-06-18 |
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| JP2002042044A Expired - Lifetime JP4101529B2 (en) | 2001-02-22 | 2002-02-19 | Display device and manufacturing method thereof |
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