JP2002323768A5 - - Google Patents
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- Publication number
- JP2002323768A5 JP2002323768A5 JP2002043492A JP2002043492A JP2002323768A5 JP 2002323768 A5 JP2002323768 A5 JP 2002323768A5 JP 2002043492 A JP2002043492 A JP 2002043492A JP 2002043492 A JP2002043492 A JP 2002043492A JP 2002323768 A5 JP2002323768 A5 JP 2002323768A5
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- JP
- Japan
- Prior art keywords
- group
- substituent
- general formula
- hydrogen atom
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002253 acid Substances 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 2
- 125000001424 substituent group Chemical group 0.000 claims 2
- 125000002723 alicyclic group Chemical group 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 125000004432 carbon atoms Chemical group C* 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002043492A JP3992993B2 (ja) | 2001-02-21 | 2002-02-20 | ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001-45214 | 2001-02-21 | ||
| JP2001045214 | 2001-02-21 | ||
| JP2002043492A JP3992993B2 (ja) | 2001-02-21 | 2002-02-20 | ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002323768A JP2002323768A (ja) | 2002-11-08 |
| JP2002323768A5 true JP2002323768A5 (pt) | 2005-04-07 |
| JP3992993B2 JP3992993B2 (ja) | 2007-10-17 |
Family
ID=26609825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002043492A Expired - Lifetime JP3992993B2 (ja) | 2001-02-21 | 2002-02-20 | ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3992993B2 (pt) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20050094828A (ko) | 2002-12-26 | 2005-09-28 | 도오꾜오까고오교 가부시끼가이샤 | 포지티브형 레지스트 조성물 및 레지스트 패턴 형성 방법 |
| JP4121396B2 (ja) | 2003-03-05 | 2008-07-23 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4115322B2 (ja) | 2003-03-31 | 2008-07-09 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| ATE446530T1 (de) | 2003-03-31 | 2009-11-15 | Fujifilm Corp | Positiv arbeitende resistzusammensetzung |
| JP2004333548A (ja) | 2003-04-30 | 2004-11-25 | Tokyo Ohka Kogyo Co Ltd | ポジ型ホトレジスト組成物およびレジストパターン形成方法 |
| JP4149306B2 (ja) * | 2003-04-30 | 2008-09-10 | 東京応化工業株式会社 | ポジ型レジスト組成物およびレジストパターン形成方法 |
| JP3981830B2 (ja) | 2003-05-26 | 2007-09-26 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| US7250246B2 (en) | 2004-01-26 | 2007-07-31 | Fujifilm Corporation | Positive resist composition and pattern formation method using the same |
| US7157208B2 (en) | 2004-02-20 | 2007-01-02 | Fuji Photo Film Co., Ltd. | Positive resist composition and pattern forming method using the same |
| US7504193B2 (en) | 2004-09-02 | 2009-03-17 | Fujifilm Corporation | Positive resist composition and pattern forming method using the same |
| JP4368282B2 (ja) | 2004-09-24 | 2009-11-18 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| US7851130B2 (en) | 2006-09-19 | 2010-12-14 | Fujifilm Corporation | Photosensitive composition, compound for use in the photosensitive composition, and pattern-forming method using the photosensitive composition |
| WO2009022681A1 (ja) | 2007-08-10 | 2009-02-19 | Fujifilm Corporation | ポジ型レジスト組成物、該組成物を用いたパターン形成方法及び該組成物に用いられる化合物 |
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2002
- 2002-02-20 JP JP2002043492A patent/JP3992993B2/ja not_active Expired - Lifetime