JP2002314186A - Package for storing optical semiconductor element and optical semiconductor device - Google Patents

Package for storing optical semiconductor element and optical semiconductor device

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Publication number
JP2002314186A
JP2002314186A JP2001113031A JP2001113031A JP2002314186A JP 2002314186 A JP2002314186 A JP 2002314186A JP 2001113031 A JP2001113031 A JP 2001113031A JP 2001113031 A JP2001113031 A JP 2001113031A JP 2002314186 A JP2002314186 A JP 2002314186A
Authority
JP
Japan
Prior art keywords
optical semiconductor
semiconductor element
plate member
base
input
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001113031A
Other languages
Japanese (ja)
Inventor
Tetsuharu Nagashima
徹治 長島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2001113031A priority Critical patent/JP2002314186A/en
Publication of JP2002314186A publication Critical patent/JP2002314186A/en
Pending legal-status Critical Current

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  • Optical Couplings Of Light Guides (AREA)
  • Semiconductor Lasers (AREA)
  • Light Receiving Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To improve the airtightness of an optical semiconductor element, the light connection efficiency of the optical semiconductor element and an optical fiber, the high frequency transmission characteristic of the optical semiconductor element and an input/output terminal and heat diffusion property at the time of the operation of the optical semiconductor element. SOLUTION: A substrate 1 in a rectangular parallelepiped shape has the installation part 1a of the optical semiconductor element 5 at the base of a recessed part at an upper face, an optical fiber fixing member fitting part 1b formed form one side to the recessed part, and an input/output terminal fitting part 1c formed from the other side to the recessed part. Mo plate members 1A and Cu plate members 1B whose main face shapes are made to be recessed shapes are placed vertically and are alternately arranged in a lateral direction, and the main faces are brazed. When the thickness of the Mo plate member 1A is set to be T1, the thickness of the Cu plate member 1B to be T2 and the thickness of a soldering material layer 1C between the Mo plate member 1A and the Cu plate member 1B to be T3, T1/(T2+T3)=4 to 9.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体レーザ(L
D),フォトダイオード(PD)等の光半導体素子を収
容するための光半導体素子収納用パッケージ、およびそ
の光半導体素子収納用パッケージを用いた光半導体装置
に関する。
The present invention relates to a semiconductor laser (L).
D), an optical semiconductor element housing package for housing an optical semiconductor element such as a photodiode (PD), and an optical semiconductor device using the optical semiconductor element housing package.

【0002】[0002]

【従来の技術】従来の光通信、マイクロ波通信またはミ
リ波通信等の高い周波数で作動する各種半導体素子を収
納する半導体素子収納用パッケージ(以下、半導体パッ
ケージという)のうち、マイクロ波通信またはミリ波通
信等に用いられる半導体パッケージを図3に示す。
2. Description of the Related Art Among conventional semiconductor element housing packages (hereinafter referred to as semiconductor packages) for housing various semiconductor elements operating at a high frequency such as optical communication, microwave communication or millimeter wave communication, microwave communication or millimeter communication are known. FIG. 3 shows a semiconductor package used for wave communication and the like.

【0003】同図に示すように、半導体パッケージは、
一般に上面に電界効果型トランジスタ(FET:Field
Effect Transistor)等の半導体素子115が載置され
る載置部111aが設けられた基体111を有する。ま
た、載置部111aを囲繞するように基体111上面に
銀(Ag)ロウ等のロウ材を介して接合されるととも
に、側部に形成された貫通開口または切欠き部から成る
入出力端子取付部112aを有する、鉄(Fe)−ニッ
ケル(Ni)−コバルト(Co)合金やFe−Ni合金
等の金属材料から成る枠体112を有する。また、入出
力端子取付部112aに嵌着され、半導体パッケージ内
外を導出するように設けられたメタライズ層113aを
有する、アルミナ(Al23)セラミックスや窒化アル
ミニウム(AlN)セラミックス等の絶縁材料から成る
入出力端子113を有する。そして、半導体パッケージ
は、基体111と枠体112および入出力端子113か
ら主に構成される。
[0003] As shown in FIG.
Generally, a field effect transistor (FET: Field:
The substrate 111 has a mounting portion 111a on which a semiconductor element 115 such as an effect transistor is mounted. Also, it is joined to the upper surface of the base 111 via a brazing material such as silver (Ag) brazing so as to surround the mounting portion 111a, and the input / output terminal mounting portion is formed by a through opening or a cutout formed in a side portion. A frame 112 having a portion 112a and made of a metal material such as an iron (Fe) -nickel (Ni) -cobalt (Co) alloy or an Fe-Ni alloy is provided. Further, an insulating material such as alumina (Al 2 O 3 ) ceramics or aluminum nitride (AlN) ceramics having a metallized layer 113 a fitted to the input / output terminal mounting portion 112 a and provided so as to lead inside and outside of the semiconductor package is used. Input / output terminal 113. The semiconductor package mainly includes a base 111, a frame 112, and input / output terminals 113.

【0004】基体111は、半導体素子115の作動時
に発する熱を外部電気回路基板(図示せず)のヒートシ
ンク部に効率良く伝える、所謂放熱板として機能する。
この基体111は、一般に、銅(Cu)−タングステン
(W)合金から成り、または図4に示すようにモリブデ
ン(Mo)板111AとCu板111Bとを交互に縦に
複数層状に積層して圧延等により形成した積層材(クラ
ッド材)等の金属材料から成るものが提案されている
(特開平6−21287号公報参照)。
[0004] The base 111 functions as a so-called heat radiating plate for efficiently transmitting heat generated during operation of the semiconductor element 115 to a heat sink portion of an external electric circuit board (not shown).
The substrate 111 is generally made of a copper (Cu) -tungsten (W) alloy, or as shown in FIG. 4, a molybdenum (Mo) plate 111A and a Cu plate 111B are alternately vertically laminated in a plurality of layers and rolled. A material made of a metal material such as a laminated material (cladding material) formed by the above method has been proposed (see Japanese Patent Application Laid-Open No. Hei 6-21287).

【0005】図4のMo板111AとCu板111Bと
の積層材は、Mo板111AとCu板111Bとの平均
の熱膨張係数が、枠体112や入出力端子113に近似
するように、Mo板111AとCu板111Bとの厚さ
の比率を適宜設定したものである。
[0005] The laminate of the Mo plate 111A and the Cu plate 111B shown in FIG. 4 is made of Mo so that the average thermal expansion coefficient of the Mo plate 111A and the Cu plate 111B is close to that of the frame 112 and the input / output terminals 113. The thickness ratio between the plate 111A and the Cu plate 111B is appropriately set.

【0006】なお、このような半導体パッケージは、図
5に示すように、基体111と同様の基体11を用い、
半導体素子115を半導体レーザ(LD),フォトダイ
オード(PD)等の光半導体素子16とするとともに、
半導体パッケージを光信号が伝送できるようにした、所
謂光半導体パッケージとすることもできる。
As shown in FIG. 5, such a semiconductor package uses a base 11 similar to the base 111,
The semiconductor element 115 is an optical semiconductor element 16 such as a semiconductor laser (LD) or a photodiode (PD).
A so-called optical semiconductor package in which an optical signal can be transmitted through the semiconductor package can also be used.

【0007】即ち、図5の光半導体パッケージは、上面
に光半導体素子16を載置する載置部11aを有すると
ともに、図4に示す構成の基体11と、載置部11aを
囲繞するように基体11上面にAgロウ等のロウ材を介
して接合されるとともに、一側部に形成された貫通孔か
ら成る光ファイバ固定部材取付部12aならびに他の側
部に形成された貫通開口または切欠き部から成る入出力
端子取付部12bを有する枠体12と、光ファイバ固定
部材取付部12aに嵌着された筒状の光ファイバ固定部
材(以下、固定部材という)15と、入出力端子取付部
12bに嵌着された入出力端子13とを具備している。
また、この光半導体パッケージ外側の入出力端子13上
面に形成されたメタライズ層13aには、外部電気回路
基板と電気的に接続されるリード端子14が銀ロウ等の
ロウ材を介して接合される。
That is, the optical semiconductor package shown in FIG. 5 has a mounting portion 11a on which an optical semiconductor element 16 is mounted on the upper surface, and surrounds the base 11 having the configuration shown in FIG. 4 and the mounting portion 11a. An optical fiber fixing member mounting portion 12a formed of a through hole formed on one side and a through opening or notch formed on the other side while being joined to the upper surface of the base 11 through a brazing material such as Ag brazing. A frame 12 having an input / output terminal mounting portion 12b composed of a portion, a cylindrical optical fiber fixing member (hereinafter referred to as a fixing member) 15 fitted to the optical fiber fixing member mounting portion 12a, and an input / output terminal mounting portion 12b.
Further, a lead terminal 14 electrically connected to an external electric circuit board is joined to a metallized layer 13a formed on the upper surface of the input / output terminal 13 outside the optical semiconductor package via a brazing material such as silver brazing. .

【0008】また、このような光半導体パッケージに、
光半導体素子16を収容し、光半導体素子16の電極と
メタライズ層13aをボンディングワイヤ(図示せず)
で電気的に接続した後、蓋体17で封止するとともに、
光ファイバ支持部材(以下、支持部材という)18に固
定された光ファイバ19を、支持部材18を介して固定
部材15に接合することにより、光半導体素子16と光
ファイバ19とが光結合された、所謂光半導体装置とな
る。
Further, such an optical semiconductor package includes:
The optical semiconductor element 16 is accommodated, and an electrode of the optical semiconductor element 16 and the metallized layer 13a are bonded with a bonding wire (not shown).
After being electrically connected by, sealing with the lid 17 and
By joining an optical fiber 19 fixed to an optical fiber support member (hereinafter, referred to as a support member) 18 to the fixing member 15 via the support member 18, the optical semiconductor element 16 and the optical fiber 19 are optically coupled. , A so-called optical semiconductor device.

【0009】この光半導体装置は、光半導体素子16に
外部電気回路基板との高周波信号(電気信号)の入出力
を行わせる機能を有するとともに、光半導体素子16に
光ファイバ19との光信号の入出力を行わせる機能を有
する。即ち、この光半導体装置は光電変換装置として機
能するものであり、光通信分野に多く用いられている。
This optical semiconductor device has a function of causing the optical semiconductor element 16 to input / output a high-frequency signal (electric signal) to / from an external electric circuit board, and the optical semiconductor element 16 to transmit an optical signal to / from the optical fiber 19. It has a function to perform input and output. That is, this optical semiconductor device functions as a photoelectric conversion device, and is widely used in the optical communication field.

【0010】[0010]

【発明が解決しようとする課題】しかしながら、図5の
従来のものにおいて、基体11の上面に接合される枠体
12が基体11の上面の所定の位置に無い場合、即ち枠
体12の接合位置がずれて接合された場合、基体11と
枠体12との間に隙間ができて、光半導体素子16の気
密性が損なわれるという問題点があった。
However, in the prior art shown in FIG. 5, when the frame 12 bonded to the upper surface of the base 11 is not at a predetermined position on the upper surface of the base 11, that is, the bonding position of the frame 12 If they are misaligned, there is a problem that a gap is formed between the base 11 and the frame 12 and the airtightness of the optical semiconductor element 16 is impaired.

【0011】また、基体11と枠体12とが位置ずれを
起こしていると、光半導体素子16を基体11の端面に
平行となるように載置部11aに載置固定した場合、光
半導体素子16と、枠体12の一側部(一側面)に対し
てほぼ垂直方向に伸びるように固定部材15に固定され
る光ファイバ19との光軸の調整が非常に困難となる。
即ち、光半導体素子16と光ファイバ19との光の結合
効率が低くなるため、光半導体素子16が誤作動する等
の問題点を有していた。
When the base 11 and the frame 12 are misaligned, if the optical semiconductor element 16 is mounted and fixed on the mounting portion 11a so as to be parallel to the end face of the base 11, It is very difficult to adjust the optical axis of the optical fiber 19 fixed to the fixing member 15 so as to extend in a direction substantially perpendicular to one side (one side) of the frame 12.
That is, the efficiency of light coupling between the optical semiconductor element 16 and the optical fiber 19 is reduced, so that the optical semiconductor element 16 has a problem such as malfunction.

【0012】さらに、このような従来の構成では、光半
導体素子16の電極と入出力端子13のメタライズ層1
3aとが、ボンディングワイヤで接続されるべき所定の
位置からずれるため、光半導体素子16と入出力端子1
3との電気的接続を行うためのボンディングワイヤの長
さが非常に長くなる部位が生じる。このため、その部位
におけるインピーダンスが大きくなる。その結果、光半
導体素子16と入出力端子13との高周波信号の伝送効
率が損なわれるという問題点を有していた。
Further, in such a conventional configuration, the electrodes of the optical semiconductor element 16 and the metallized layer 1 of the input / output terminal 13 are formed.
3a deviates from a predetermined position to be connected by a bonding wire, so that the optical semiconductor element 16 and the input / output terminal 1
There is a portion where the length of the bonding wire for making an electrical connection with the connection 3 becomes very long. For this reason, the impedance at that portion increases. As a result, there is a problem that the transmission efficiency of the high-frequency signal between the optical semiconductor element 16 and the input / output terminal 13 is impaired.

【0013】なお、このような問題点を解決する手段と
して、枠体12の一側部(一側面)を光半導体素子16
に対するアライメント面として、光半導体素子16の一
側面を枠体12の一側面に平行となるように載置部11
aに載置固定することも考えられるが、枠体12を基体
11の上面に対して正確に垂直に設置することが困難な
ため、基体11の上面に対して光ファイバ19の光軸が
正確に平行とはなり難い。また、そのような光軸がずれ
た光ファイバ19を有する光半導体装置が多数ある場
合、光ファイバ19の光軸を外部電気回路基板上で個々
に調整しようとすると、調整作業が煩雑なものとなる。
As a means for solving such a problem, one side (one side) of the frame 12 is attached to the optical semiconductor element 16.
Of the optical semiconductor element 16 so as to be parallel to one side of the frame 12
Although it is conceivable to mount and fix the optical fiber 19 on the upper surface of the base 11, it is difficult to install the frame body 12 exactly perpendicular to the upper surface of the base 11. It is hard to be parallel to. In addition, when there are many optical semiconductor devices having such optical fibers 19 whose optical axes are shifted, if the optical axes of the optical fibers 19 are individually adjusted on the external electric circuit board, the adjustment work becomes complicated. Become.

【0014】また、光半導体素子16の作動時における
発熱量が非常に大きい場合、図4の構成の基体11の熱
伝導率では、光半導体素子16から外部電気回路基板の
ヒートシンク部への熱伝達が十分なものとならない。即
ち、基体11上面の載置部11aには、Cu板111B
のような熱伝導率の非常に高い部位のみならず、熱伝導
率の低いMo板111Aの部位にも光半導体素子16が
載置固定されるため、光半導体素子16の作動時に発す
る熱が非常に大きいと、基体11のMo板111Aに蓄
熱されることにより、ヒートシンク部に効率良く伝熱し
難くなる。
When the amount of heat generated during the operation of the optical semiconductor element 16 is very large, the heat transfer from the optical semiconductor element 16 to the heat sink portion of the external electric circuit board is determined by the thermal conductivity of the base 11 having the structure shown in FIG. Is not enough. That is, the mounting portion 11a on the upper surface of the base 11 has the Cu plate 111B
The optical semiconductor element 16 is mounted and fixed not only on the part having a very high thermal conductivity like the above but also on the part of the Mo plate 111A having a low thermal conductivity, so that the heat generated when the optical semiconductor element 16 operates is extremely low. When it is too large, heat is stored in the Mo plate 111A of the base 11, so that it is difficult to efficiently transfer heat to the heat sink.

【0015】更には、枠体12は基体11にその熱膨張
係数を近似させるために通常Fe−Ni−Co合金等か
ら成り、これは熱伝導率が約17W/m・K程度と基体
11に比し非常に低いことから、基体11と枠体12と
で構成される空所(内部空間)に蓄熱され大気中に効率
良く放熱し難くなる。また、枠体12の材料として基体
11に熱膨張係数が近似するCu−タングステン(W)
合金を用いることも考えられるが、この合金では熱伝導
率が180〜200W/m・K程度と低く、結果として
大気中に効率良く放熱し難い。
Further, the frame body 12 is usually made of an Fe--Ni--Co alloy or the like in order to approximate the thermal expansion coefficient of the base body 11, which has a thermal conductivity of about 17 W / m.K and Since the temperature is very low, heat is stored in a space (internal space) formed by the base 11 and the frame 12, and it is difficult to efficiently radiate heat to the atmosphere. Further, as a material of the frame 12, Cu-tungsten (W) whose thermal expansion coefficient is close to that of the base 11 is used.
Although it is conceivable to use an alloy, this alloy has a low thermal conductivity of about 180 to 200 W / m · K, and as a result, it is difficult to efficiently radiate heat to the atmosphere.

【0016】そのため、基体11や内部空間に残留する
熱による応力により、基体11が反り変形を起こし、基
体11と枠体12との間や、基体11と入出力端子13
との間が剥がれたり、入出力端子13にクラック等の割
れを発生させる場合がある。
As a result, the substrate 11 and the internal space are warped and deformed by the stress caused by heat remaining in the internal space and the space between the substrate 11 and the frame 12 and between the substrate 11 and the input / output terminals 13.
And the input / output terminal 13 may be cracked.

【0017】また、Mo板111Aは非常に剛性が高い
ため、圧延時に均一にMo板111Aを引き伸ばすこと
ができない場合がある。その場合、Mo板111Aの厚
さが所望の厚さよりも厚い部位が存在したり、逆にCu
板111Bに所望の厚さよりも薄い部位が存在したり、
あるいはMo板111AとCu板111Bとの間にボイ
ド(空孔)等の欠陥が存在することとなる。そのため、
積層後の平均の熱膨張係数が所望のものとならず、基体
11と枠体12との間、基体11と入出力端子13との
間に剥がれを発生させたり、入出力端子13にクラック
等の割れを発生させたり、上記ボイドによる熱伝導の低
下を招来させる。
Further, since the Mo plate 111A has a very high rigidity, it may not be possible to stretch the Mo plate 111A uniformly during rolling. In this case, there is a portion where the thickness of the Mo plate 111A is larger than a desired thickness,
There is a portion thinner than the desired thickness on the plate 111B,
Alternatively, defects such as voids (voids) exist between the Mo plate 111A and the Cu plate 111B. for that reason,
The average thermal expansion coefficient after lamination is not as desired, and peeling may occur between the base 11 and the frame 12, between the base 11 and the input / output terminals 13, or cracks may occur on the input / output terminals 13. Cracks, or a decrease in heat conduction due to the voids.

【0018】そのため、上記割れや剥がれに起因し、光
半導体素子16を気密に封止できなくなることによる光
半導体素子16の酸化腐食や、熱伝導の効率を良好とで
きないことによる光半導体素子16の誤作動が発生する
という問題点を有していた。
As a result, the optical semiconductor element 16 cannot be airtightly sealed due to the cracks or peeling, and the optical semiconductor element 16 cannot be oxidized and corroded. There was a problem that malfunction occurred.

【0019】従って、本発明は上記問題点に鑑み完成さ
れたものであり、その目的は、LD,PD等の光半導体
素子の気密性を確実なものとし、また光半導体素子と光
ファイバとの光の結合効率を良好なものとし、さらに光
半導体素子と入出力端子との高周波伝送特性を良好なも
のとすることである。また、光半導体素子の作動時に発
する熱を効率良く大気中やヒートシンク部に伝えること
により、光半導体素子を長期間にわたり正常かつ安定に
作動させることである。
Accordingly, the present invention has been completed in view of the above problems, and an object of the present invention is to ensure the airtightness of an optical semiconductor device such as an LD and a PD, and to establish a connection between the optical semiconductor device and an optical fiber. It is an object to improve the light coupling efficiency and to improve the high-frequency transmission characteristics between the optical semiconductor element and the input / output terminal. Another object of the present invention is to operate the optical semiconductor element normally and stably for a long period of time by efficiently transmitting heat generated during operation of the optical semiconductor element to the atmosphere or a heat sink.

【0020】[0020]

【課題を解決するための手段】本発明の光半導体パッケ
ージは、略直方体状とされ、上面に形成された凹部の底
面に光半導体素子を載置するための載置部および一側部
から凹部にかけて形成された貫通孔から成る光ファイバ
固定部材取付部ならびに他の側部から凹部にかけて形成
された貫通開口または切欠き部から成る入出力端子取付
部を有する基体と、光ファイバ固定部材取付部に嵌着さ
れた筒状の光ファイバ固定部材と、入出力端子取付部に
嵌着された入出力端子とを具備した光半導体素子収納用
パッケージにおいて、前記基体は、主面形状が略凹型状
とされたモリブデン板部材と銅板部材とが縦置きにされ
て交互に横方向に配置されるとともにそれらの主面同士
がロウ付けされて成り、前記モリブデン板部材の厚さを
T1、前記銅板部材の厚さをT2、前記モリブデン板部
材と前記銅板部材間のロウ材層の厚さをT3としたとき
に、T1/(T2+T3)=4〜9であることを特徴と
する。
An optical semiconductor package according to the present invention has a substantially rectangular parallelepiped shape, and a mounting portion for mounting an optical semiconductor element on a bottom surface of a concave portion formed on an upper surface and a concave portion from one side. A base having an optical fiber fixing member mounting portion comprising a through hole formed over the entirety thereof and an input / output terminal mounting portion comprising a through opening or a notch formed from the other side to the concave portion; and an optical fiber fixing member mounting portion. In the optical semiconductor element housing package including the fitted cylindrical optical fiber fixing member and the input / output terminal fitted to the input / output terminal mounting portion, the main body has a substantially concave shape. The molybdenum plate member and the copper plate member are arranged vertically and alternately arranged in the horizontal direction, and their main surfaces are brazed. The thickness of the molybdenum plate member is T1, the copper plate portion is The thickness T2, the thickness of the brazing material layer between the copper plate member and the molybdenum plate member when the T3, characterized in that it is a T1 / (T2 + T3) = 4~9.

【0021】本発明は、上記の構成により、光半導体素
子の気密性、光半導体素子と光ファイバとの光の結合効
率、光半導体素子と入出力端子との間の高周波伝送特
性、光半導体素子の作動時に発する熱の伝熱性を良好な
ものとできる。また、モリブデン板部材の厚さをT1、
銅板部材の厚さをT2、モリブデン板部材と銅板部材間
のロウ材層の厚さをT3とした場合、T1/(T2+T
3)=4〜9であることにより、光半導体素子の作動時
に発する熱の伝熱性を、より良好なものとし得る。
According to the present invention, there is provided an airtightness of an optical semiconductor element, a light coupling efficiency between an optical semiconductor element and an optical fiber, a high-frequency transmission characteristic between an optical semiconductor element and an input / output terminal, and an optical semiconductor element. The heat conductivity of the heat generated during the operation can be improved. Further, the thickness of the molybdenum plate member is T1,
When the thickness of the copper plate member is T2 and the thickness of the brazing material layer between the molybdenum plate member and the copper plate member is T3, T1 / (T2 + T
3) By setting 4 to 9, heat conductivity of heat generated during operation of the optical semiconductor element can be further improved.

【0022】また、本発明の光半導体装置は、本発明の
光半導体パッケージと、載置部に載置固定され入出力端
子に電気的に接続された光半導体素子と、基体の上面に
接合された蓋体とを具備したことを特徴とする。
Further, an optical semiconductor device of the present invention is an optical semiconductor package of the present invention, an optical semiconductor element mounted and fixed on a mounting portion and electrically connected to input / output terminals, and joined to an upper surface of a base. And a lid body.

【0023】本発明は、このような構成により、上記半
導体パッケージを用いた信頼性の高い光半導体装置を提
供できる。
The present invention can provide a highly reliable optical semiconductor device using the above-mentioned semiconductor package.

【0024】[0024]

【発明の実施の形態】本発明の光半導体パッケージにつ
いて以下に詳細に説明する。図1は本発明の光半導体パ
ッケージの斜視図、図2は本発明の半導体パッケージに
おける基体の部分拡大断面図である。これらの図におい
て、1は、上面に形成された凹部の底面に光半導体素子
を載置するための載置部および一側部から凹部にかけて
形成された光ファイバ固定部材取付部ならびに他の側部
から凹部にかけて形成された入出力端子取付部を有する
基体である。2は入出力端子取付部に嵌着される入出力
端子、4は光ファイバ固定部材取付部に取着される固定
部材、5はLD,PD等の光半導体素子である。これら
基体1、入出力端子2、固定部材4とで、光半導体素子
5を内部に収容するための容器が主に構成される。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The optical semiconductor package of the present invention will be described in detail below. FIG. 1 is a perspective view of an optical semiconductor package of the present invention, and FIG. 2 is a partially enlarged cross-sectional view of a base in the semiconductor package of the present invention. In these figures, reference numeral 1 denotes a mounting portion for mounting the optical semiconductor element on the bottom surface of the concave portion formed on the upper surface, an optical fiber fixing member attaching portion formed from one side to the concave portion, and another side portion. And a base having an input / output terminal mounting portion formed from the groove to the recess. Reference numeral 2 denotes an input / output terminal fitted to the input / output terminal mounting portion, 4 denotes a fixing member mounted to the optical fiber fixing member mounting portion, and 5 denotes an optical semiconductor element such as an LD or PD. The base 1, the input / output terminals 2, and the fixing member 4 mainly constitute a container for housing the optical semiconductor element 5 therein.

【0025】また、この容器と、基体1の載置部1aに
載置固定される光半導体素子5と、基体1の最上面に接
合され光半導体素子5を封止する蓋体6により光半導体
装置が構成される。
The optical semiconductor device 5 is mounted on the container, the optical semiconductor device 5 mounted and fixed on the mounting portion 1a of the substrate 1, and the lid 6 bonded to the uppermost surface of the substrate 1 and sealing the optical semiconductor device 5. The device is configured.

【0026】本発明の基体1は、光半導体素子5を支持
するための支持板ならびに光半導体素子5の作動時に発
する熱をヒートシンク部や外部(大気中)に伝えるため
の放熱板として機能する。また、基体1の上面に形成さ
れた凹部の底面の略中央部には光半導体素子5が載置さ
れる載置部1aを有している。この載置部1aには、光
半導体素子5が錫(Sn)−鉛(Pb)半田や樹脂,ガ
ラス等の接着材を介して載置固定され、光半導体素子5
の作動時に発する熱を接着剤を介して基体1に伝え、光
半導体素子5の作動性を良好なものとする。
The substrate 1 of the present invention functions as a support plate for supporting the optical semiconductor element 5 and a heat radiating plate for transmitting heat generated during operation of the optical semiconductor element 5 to a heat sink portion or the outside (in the atmosphere). In addition, a mounting portion 1a on which the optical semiconductor element 5 is mounted is provided substantially at the center of the bottom surface of the concave portion formed on the upper surface of the base 1. The optical semiconductor element 5 is mounted and fixed on the mounting portion 1a via an adhesive such as tin (Sn) -lead (Pb) solder, resin, or glass.
The heat generated at the time of the operation is transmitted to the base 1 via the adhesive, and the operability of the optical semiconductor element 5 is improved.

【0027】また、この基体1は、一側部から凹部にか
けて形成された貫通孔から成る光ファイバ固定部材取付
部1bならびに他の側部から凹部にかけて形成された貫
通開口または切欠き部から成る入出力端子取付部1cを
有する。
The base 1 has an optical fiber fixing member mounting portion 1b formed of a through hole formed from one side portion to a concave portion, and a through hole or cutout portion formed from the other side portion to a concave portion. It has an output terminal mounting portion 1c.

【0028】本発明の基体1は、剛性の非常に高いMo
板部材1Aと、熱伝導率の非常に高いCu板部材1Bと
を、熱伝導率の非常に高い銀(Ag)と熱伝導率の非常
に高いCuとから主になるAg−Cuロウ等のロウ材層
1Cを介してロウ付け接合されたものであり、それらの
厚さ比率は、基体1の熱膨張係数が入出力端子2や固定
部材4の熱膨張係数に近似するように設定される。
The substrate 1 of the present invention is made of Mo having a very high rigidity.
The plate member 1A and the Cu plate member 1B having a very high thermal conductivity are formed by combining Ag-Cu brazing or the like mainly composed of silver (Ag) having a very high thermal conductivity and Cu having a very high thermal conductivity. They are brazed and joined via the brazing material layer 1C, and their thickness ratios are set such that the thermal expansion coefficient of the base 1 approximates the thermal expansion coefficients of the input / output terminals 2 and the fixing member 4. .

【0029】即ち、Mo板部材1Aの厚さをT1、Cu
板部材1Bの厚さをT2、ロウ材層1Cの厚さをT3と
した場合、その厚さの比率は、T1/(T2+T3)=
4〜9である。T1/(T2+T3)が4未満の場合、
基体1の熱膨張係数が入出力端子2や固定部材4の熱膨
張係数に比し非常に大きくなるため、基体1と入出力端
子2,固定部材4とのロウ付け後の接合強度が低下し易
くなる。また、Mo板部材1AとCu板部材1Bとの間
の熱膨張差による熱歪みをロウ材層1Cが有効に緩和で
きないため、基体1に大きな反り変形を発生させ光半導
体素子5を強固に載置固定するのが困難になる。また、
基体1の反り変形により、基体1の上面に光半導体素子
5封止用の蓋体6を接合し難くなる。そのため、光半導
体装置と成した際に光半導体素子5の気密性を良好とで
きず、光半導体素子5に酸化腐食等を発生させることと
なる。
That is, the thickness of the Mo plate member 1A is T1, Cu
When the thickness of the plate member 1B is T2 and the thickness of the brazing material layer 1C is T3, the ratio of the thickness is T1 / (T2 + T3) =
4 to 9. When T1 / (T2 + T3) is less than 4,
Since the coefficient of thermal expansion of the base 1 is much larger than the coefficient of thermal expansion of the input / output terminals 2 and the fixing member 4, the bonding strength between the base 1 and the input / output terminals 2 and the fixing member 4 after brazing is reduced. It will be easier. Further, since the brazing material layer 1C cannot effectively reduce the thermal strain due to the difference in thermal expansion between the Mo plate member 1A and the Cu plate member 1B, a large warp deformation is generated in the base 1, and the optical semiconductor element 5 is firmly mounted. It becomes difficult to fix. Also,
Due to the warpage of the base 1, it is difficult to join the lid 6 for sealing the optical semiconductor element 5 to the upper surface of the base 1. Therefore, when the optical semiconductor device is formed, the airtightness of the optical semiconductor element 5 cannot be improved, and the optical semiconductor element 5 is oxidized and corroded.

【0030】一方、T1/(T2+T3)が9を超える
場合、基体1の熱膨張係数を入出力端子2や固定部材4
のそれに近似させることが困難となるとともに、基体1
の熱伝導率が低下する。そのため、光半導体素子5が作
動時に発する熱を効率良くヒートシンク部や大気中に伝
えることが困難となり、更には基体1と入出力端子2,
固定部材4とのロウ接合後の接合強度が低下したり、基
体1に大きな反り変形を発生させ光半導体素子5を強固
に載置固定できなくなる。また、この基体1の反り変形
により、基体1の最上面に蓋体6を接合し難くなる。そ
のため、光半導体装置と成した際に光半導体素子5の気
密性を良好とできず、光半導体素子5に酸化腐食等が発
生し易くなる。
On the other hand, when T1 / (T2 + T3) exceeds 9, the thermal expansion coefficient of the base 1
It is difficult to approximate to that of
Has a reduced thermal conductivity. For this reason, it is difficult to efficiently transmit the heat generated by the optical semiconductor element 5 during operation to the heat sink portion and the atmosphere.
The bonding strength after the brazing with the fixing member 4 is reduced, or a large warp deformation is generated in the base 1, so that the optical semiconductor element 5 cannot be firmly mounted and fixed. In addition, the warpage of the base 1 makes it difficult to join the lid 6 to the uppermost surface of the base 1. Therefore, when the optical semiconductor device is formed, the airtightness of the optical semiconductor element 5 cannot be improved, and the optical semiconductor element 5 is liable to be oxidized and corroded.

【0031】具体的には、Mo板部材1Aの厚さT1は
0.8〜7.2mmが好ましい。0.8mm未満では、
厚さが薄すぎるため、基体1の保形性が損なわれやすく
なる。7.2mmを超える場合、熱伝導性が比較的低い
部位の面積が大きくなるため、半導体素子5が作動時に
発する熱を効率よく伝達することが困難になる。
Specifically, the thickness T1 of the Mo plate member 1A is preferably 0.8 to 7.2 mm. If less than 0.8mm,
Since the thickness is too thin, the shape retention of the substrate 1 is easily impaired. If the thickness exceeds 7.2 mm, the area of a portion having relatively low thermal conductivity becomes large, so that it becomes difficult to efficiently transfer heat generated when the semiconductor element 5 operates.

【0032】また、Cu板部材1Bの厚さT2は0.2
〜0.8mmが好ましい。0.2mm未満では、半導体
素子5が作動時に発する熱を効率よく伝達することが困
難になる。また、ロウ材層1Cが溶融した時に、ロウ材
層1CとCu板部材1Bとの間に共晶をつくりやすくな
り、共晶ができるとロウ材層1C中にボイドが発生し、
熱伝導性が劣化する。0.8mmを超えると、熱膨張係
数の大きな部位の面積が大きくなるため、基体1と入出
力端子3との間に発生する熱膨張差による剥がれが生じ
たり、半導体素子5の載置部1aに対する接合性が低下
し易くなる。
The thickness T2 of the Cu plate member 1B is 0.2
~ 0.8 mm is preferred. If the thickness is less than 0.2 mm, it becomes difficult to efficiently transfer heat generated when the semiconductor element 5 operates. Further, when the brazing material layer 1C is melted, it becomes easy to form a eutectic between the brazing material layer 1C and the Cu plate member 1B, and when the eutectic is formed, voids are generated in the brazing material layer 1C,
Thermal conductivity deteriorates. If it exceeds 0.8 mm, the area of the portion having a large thermal expansion coefficient becomes large, so that peeling occurs due to a difference in thermal expansion generated between the base 1 and the input / output terminal 3 or the mounting portion 1a of the semiconductor element 5 The bondability with respect to becomes easy to fall.

【0033】また、ロウ材層1Cは、Mo板部材1Aや
Cu板部材1Bの厚さが設定した厚と異なる部位がある
場合であっても、基体1の平均の熱膨張係数を所望のも
のとできたり、光半導体素子5の作動時における熱をヒ
ートシンク部や大気中に効率良く伝達させ得、更には光
半導体素子5作動時の熱が基体1に反り変形を及ぼそう
とする応力を緩和する。
The brazing material layer 1C has a desired average thermal expansion coefficient of the base 1 even when there is a portion where the thickness of the Mo plate member 1A or the Cu plate member 1B is different from the set thickness. Heat can be efficiently transmitted to the heat sink portion and the atmosphere during the operation of the optical semiconductor element 5, and further, the stress at which the heat during the operation of the optical semiconductor element 5 tends to cause the substrate 1 to warp can be reduced. I do.

【0034】即ち、ロウ材層1Cは、非常に軟質であ
り、かつCu板部材1Bと同一材質であるCuと、Cu
板部材1Bに熱伝導率や熱膨張係数が近似するAgとか
ら主に構成されるため、たとえMo板部材1AやCu板
部材1Bに設定した厚さと異なる部位がある場合であっ
ても、その部位をロウ材層1CがCu板部材1Bの熱伝
達や熱膨張整合の機能を代替したり、基体1の反り変形
を有効に防止する機能を有することとなる。
That is, the brazing material layer 1C is made of Cu and Cu, which are very soft and the same material as the Cu plate member 1B.
Since the plate member 1B is mainly composed of Ag whose thermal conductivity and coefficient of thermal expansion are close to each other, even if there is a portion different from the thickness set for the Mo plate member 1A or the Cu plate member 1B, In the portion, the brazing material layer 1C has a function of replacing the function of heat transfer and thermal expansion matching of the Cu plate member 1B and a function of effectively preventing the base 1 from warping.

【0035】なお、ロウ材層1Cの厚さT3は5〜40
μmであることが好ましい。5μm未満の場合、Mo板
部材1AとCu板部材1Bとをロウ材層1Cを介して接
合した際、ロウ材層1C内部に多数のボイドが形成さ
れ、基体1の熱伝導率を低下させたり、熱応力の緩和機
能が損なわれる。40μmを超えると、基体1自体の軟
性が高くなり、基体1が変形し易くなる。その場合、基
体1からヒートシンク部への熱伝達が損なわれたり、取
付部2aへの入出力端子2の嵌着が困難になる。より好
ましくは、ロウ材層1Cの厚さT3は20〜40μmが
よい。
The thickness T3 of the brazing material layer 1C is 5-40.
μm is preferred. When the thickness is less than 5 μm, when the Mo plate member 1A and the Cu plate member 1B are joined via the brazing material layer 1C, a number of voids are formed inside the brazing material layer 1C, and the thermal conductivity of the base 1 is reduced. In addition, the function of relieving thermal stress is impaired. If it exceeds 40 μm, the softness of the base 1 itself increases, and the base 1 is easily deformed. In this case, heat transfer from the base 1 to the heat sink portion is impaired, and it becomes difficult to fit the input / output terminal 2 to the mounting portion 2a. More preferably, the thickness T3 of the brazing material layer 1C is preferably 20 to 40 μm.

【0036】また、ロウ材層1Cは基体1の上面および
下面に対して面一であることが好ましい。ロウ材層1C
が基体1の凹部の底面よりも上側(載置部1a側)に突
出している場合、光半導体素子5を載置部1aに密着性
よく平坦にして載置固定するのが困難になる。また、ロ
ウ材層1Cが基体1の最上面(蓋体6が接合される面)
よりも上側に突出している場合、蓋体6を基体1に密着
性よく平坦にして接合するのが困難になる。一方、ロウ
材層1Cが基体1の下面よりも下側(ヒートシンク部
側)に突出している場合、基体1をヒートシンク部に密
着性良く平坦に接合するのが困難になる。即ち、これら
の場合、光半導体素子5の気密性が損なわれたり、光半
導体素子5の作動時における熱を効率良く基体1やヒー
トシンク部に伝達するのが困難になる。
The brazing material layer 1C is preferably flush with the upper and lower surfaces of the substrate 1. Brazing material layer 1C
When the optical semiconductor element 5 projects above the bottom surface of the concave portion of the base 1 (on the mounting portion 1a side), it is difficult to flatten and fix the optical semiconductor element 5 to the mounting portion 1a with good adhesion. Further, the brazing material layer 1C is the uppermost surface of the base 1 (the surface to which the lid 6 is bonded).
If it protrudes upward, it becomes difficult to bond the lid 6 to the base 1 with good adhesion and flatness. On the other hand, if the brazing material layer 1C protrudes below the lower surface of the base 1 (toward the heat sink), it becomes difficult to join the base 1 to the heat sink with good adhesion and flatness. That is, in these cases, the airtightness of the optical semiconductor element 5 is impaired, and it is difficult to efficiently transfer heat during operation of the optical semiconductor element 5 to the base 1 and the heat sink.

【0037】一方、ロウ材層1Cが基体1の凹部の底面
よりも下側(基体1内部側)に、あるいはロウ材層1C
が基体1の下面よりも上側(基体1内部側)に突出して
いる場合においても、半導体素子5の熱をヒートシンク
部に効率良く伝達し難い。
On the other hand, the brazing material layer 1C is located below the bottom surface of the concave portion of the base 1 (inside the base 1) or the brazing material layer 1C
Is protruding above the lower surface of the base 1 (inside of the base 1), it is difficult to efficiently transfer the heat of the semiconductor element 5 to the heat sink.

【0038】従って、ロウ材層1Cが基体1の上面や下
面から突出している場合、その突出高さは上記の理由か
ら−2μm〜2μm程度がよい。
Therefore, when the brazing material layer 1C protrudes from the upper surface or the lower surface of the base 1, the protruding height is preferably about -2 μm to 2 μm for the above reason.

【0039】本発明のMo板部材1AとCu板部材1B
は、図2に示すような断面形状(長手方向に垂直な断面
における形状)が四角形のもの以外に、断面形状が三角
形、台形であってもよい。断面形状が三角形の場合、M
o板部材1AとCu板部材1Bの一方が三角形の底辺が
下になり、他方が三角形の底辺が上になるようにして交
互に配置すればよく、略直方体の基体1を構成できる。
また、断面形状が台形の場合、Mo板部材1AとCu板
部材1Bの一方が台形の下底が下になり、他方が台形の
下底が上になるようにすればよく、略直方体の基体1を
構成できる。さらには、Mo板部材1AとCu板部材1
Bの一方の断面形状が三角形で、他方の断面形状が台形
であってもよい。
The Mo plate member 1A and the Cu plate member 1B of the present invention
May have a triangular or trapezoidal cross section in addition to a square cross section as shown in FIG. 2 (a cross section perpendicular to the longitudinal direction). If the cross-sectional shape is triangular, M
The o-plate members 1A and the Cu plate members 1B may be alternately arranged so that one of the triangles has the bottom side of the triangle facing down and the other has the bottom side of the triangle facing up, and the substantially rectangular parallelepiped base 1 can be configured.
When the cross-sectional shape is a trapezoid, one of the Mo plate member 1A and the Cu plate member 1B may have a trapezoidal lower base facing down, and the other may have a trapezoidal lower base facing up. 1 can be configured. Further, the Mo plate member 1A and the Cu plate member 1
One cross-sectional shape of B may be triangular, and the other cross-sectional shape may be trapezoidal.

【0040】Mo板部材1AとCu板部材1Bの断面形
状が三角形や台形の場合に、Mo板部材1AとCu板部
材1BのうちMo板部材1Aの方が、基体1の上面とな
る面が下面となる面より大きくなるように配置されるの
がよい。それは、Mo板部材1Aの基体1の上面となる
面が小さいと、基体1と枠体2,入出力端子3とのロウ
付け後の接合強度が低下したり、基体1に大きな反り変
形を発生させ半導体素子5を強固に載置固定するのが困
難になる。また、半導体素子5の熱膨張係数とCu板部
材1Bの熱膨張係数が大きく異なることにより、半導体
素子5の載置部1aへの接合性が劣化し易くなる。
When the cross-sectional shapes of the Mo plate member 1A and the Cu plate member 1B are triangular or trapezoidal, the Mo plate member 1A of the Mo plate member 1A and the Cu plate member 1B has It is preferable to arrange so as to be larger than the surface serving as the lower surface. That is, if the surface of the Mo plate member 1A serving as the upper surface of the base 1 is small, the bonding strength between the base 1 and the frame 2 and the input / output terminals 3 after brazing is reduced, or the base 1 is greatly warped. This makes it difficult to firmly mount and fix the semiconductor element 5. Further, since the coefficient of thermal expansion of the semiconductor element 5 is largely different from the coefficient of thermal expansion of the Cu plate member 1B, the bonding property of the semiconductor element 5 to the mounting portion 1a is easily deteriorated.

【0041】また、Mo板部材1AとCu板部材1Bの
断面形状は、図4のような長方形とするのがよく、基体
1を容易に構成し得るとともに、応力の偏在を抑制で
き、また熱伝導特性を基体1全体で均一化しやすくな
る。
The cross-sectional shapes of the Mo plate member 1A and the Cu plate member 1B are preferably rectangular as shown in FIG. 4, so that the base 1 can be easily formed, uneven distribution of stress can be suppressed, and heat It is easy to make the conduction characteristics uniform throughout the substrate 1.

【0042】本発明においては、載置部1aを囲繞する
枠状部となる部位も、載置部1aを有する基体1と全く
同一の材料から成るため、光半導体素子1の発する熱が
載置部1aの周辺部から枠状部に伝わっても、枠状部か
ら効率良く大気中に放散される。即ち、光半導体素子5
が作動時に発する熱量が非常に大きい場合であっても、
載置部1aを有する部位からヒートシンク部に伝わる経
路と、載置部1aを有する部位から載置部1aを囲繞す
る枠状部を介して大気中に伝わる経路との2経路により
効率良く熱を放散させ得る。
In the present invention, the frame-shaped portion surrounding the mounting portion 1a is also made of exactly the same material as the substrate 1 having the mounting portion 1a. Even if it is transmitted from the peripheral portion of the portion 1a to the frame-shaped portion, it is efficiently radiated from the frame-shaped portion to the atmosphere. That is, the optical semiconductor element 5
Even if the amount of heat generated during operation is very large,
Efficient heat is generated by two paths: a path transmitted from the portion having the mounting portion 1a to the heat sink portion, and a path transmitted from the portion having the mounting portion 1a to the atmosphere through the frame surrounding the mounting portion 1a. May dissipate.

【0043】具体的には、光半導体素子5が作動時に発
する熱は、載置部1aからヒートシンク部にかけて、M
o板部材1AとCu板部材1Bとロウ材層1Cとにより
垂直下方に伝わる熱伝導路と、Mo板部材1AとCu板
部材1Bとロウ材層1Cとを順次介してヒートシンク部
まで略水平方向においてなだらかに伝わる熱伝導路との
第1の経路で伝熱される。また、載置部1aや内部空間
から載置部1aを囲繞する枠状部にかけて、Mo板部材
1AとCu板部材1Bとロウ材層1Cとを順次介して大
気中に放熱される第2の経路で伝熱される。よって、第
1の経路と第2の経路の2経路により効率良く放散させ
得る。
Specifically, the heat generated when the optical semiconductor element 5 operates is transmitted from the mounting portion 1a to the heat sink portion,
A heat conduction path vertically transmitted by the o-plate member 1A, the Cu-plate member 1B, and the brazing material layer 1C, and a substantially horizontal direction to the heat sink portion through the Mo-plate member 1A, the Cu-plate member 1B, and the brazing material layer 1C in order. In the first path with the heat conduction path that is gently transmitted. In addition, the second portion that is radiated to the atmosphere through the Mo plate member 1A, the Cu plate member 1B, and the brazing material layer 1C sequentially from the mounting portion 1a or the internal space to the frame portion surrounding the mounting portion 1a. Heat is transferred in the path. Therefore, it is possible to efficiently dissipate the light by the two paths of the first path and the second path.

【0044】また、載置部1aを有する部位と載置部1
aを囲繞する枠状部とが一体的に作製されているため、
従来のように、それらの間に隙間ができて光半導体素子
5の気密性が損なわれるという懸念が全くない。また、
光半導体素子5の光入出力端面が載置部1aを囲繞する
枠状部の一側部(一側面)に平行となるように載置部1
aに載置固定すると、光半導体素子5と、枠状部の一側
部(一側面)にほぼ垂直に伸びるように固定部材4に固
定される光ファイバ8との光軸の調整が非常に容易にな
る。即ち、光半導体素子5の光入出力端面と枠状部の一
側部とが常に平行となるため、光半導体素子5と光ファ
イバ8との光の結合効率を常に良好とし得る。
The portion having the mounting portion 1a and the mounting portion 1
a and the frame-shaped portion surrounding a
As in the related art, there is no concern that a gap is formed between them and the airtightness of the optical semiconductor element 5 is impaired. Also,
The mounting section 1 such that the light input / output end face of the optical semiconductor element 5 is parallel to one side (one side face) of the frame-shaped section surrounding the mounting section 1a.
a, the optical axis of the optical semiconductor element 5 and the optical fiber 8 fixed to the fixing member 4 so as to extend almost perpendicularly to one side (one side surface) of the frame-shaped portion are extremely adjusted. It will be easier. That is, since the light input / output end face of the optical semiconductor element 5 and one side of the frame-shaped part are always parallel, the light coupling efficiency between the optical semiconductor element 5 and the optical fiber 8 can always be improved.

【0045】さらに、本発明では、載置部1aを有する
部位と枠状部とが一体的に作製されているため、光半導
体素子5の電極は入出力端子2のメタライズ層2aに対
して常に接続されるべき所定位置にあるため、それらを
電気的に接続するボンディングワイヤの長さを極端に長
くしなければならない部位を発生させることがなくな
る。従って、ボンディングワイヤの長さをいずれの部位
においても常に一定とできるため、インピーダンスが常
に一定となる光半導体素子5となる。そのため、光半導
体素子5と入出力端子2との高周波信号の伝送特性が常
に良好となる。
Further, in the present invention, since the portion having the mounting portion 1a and the frame portion are integrally formed, the electrode of the optical semiconductor element 5 is always in contact with the metallized layer 2a of the input / output terminal 2. Since it is at a predetermined position to be connected, there is no need to generate a portion where the length of the bonding wire for electrically connecting them must be extremely long. Therefore, since the length of the bonding wire can be always constant at any part, the optical semiconductor element 5 has an impedance that is always constant. Therefore, the transmission characteristics of the high-frequency signal between the optical semiconductor element 5 and the input / output terminal 2 are always good.

【0046】このように本発明の基体1は、載置部1a
を有する部位と枠状部とが一体的に作製された構成であ
るとともに、剛性が非常に高く基体1の保形性を良好に
し得るMo板部材1Aと、熱伝導率が非常に高く光半導
体素子5の作動時に発する熱を良好に伝達し得るCu板
部材1Bと、Mo板部材1AとCu板部材1Bとの間に
接合され、それらの間の熱膨張差による熱応力を緩和す
るとともにCu板部材1Bと同様に熱伝達の機能を有す
るロウ材層1Cとが交互に縦に複数層状に積層された構
成である。また、Mo板部材1Aの厚さをT1、Cu板
部材1Bの厚さをT2、ロウ材層1Cの厚さT3とした
場合、その厚さの比率は、T1/(T2+T3)=4〜
9であり、ロウ材層1Cの厚さは好ましくは5〜40μ
m以上である。
As described above, the base 1 of the present invention is
A Mo plate member 1A, which has a structure in which a portion having a shape and a frame-shaped portion are integrally formed, has extremely high rigidity and can improve the shape retention of the base 1, and an optical semiconductor having a very high thermal conductivity. The Cu plate member 1B, which can transmit heat generated during the operation of the element 5 satisfactorily, is joined between the Mo plate member 1A and the Cu plate member 1B to reduce thermal stress due to a difference in thermal expansion between the Cu plate member 1A and the Cu plate member 1B. This is a configuration in which a brazing material layer 1C having a heat transfer function like the plate member 1B is alternately vertically stacked in a plurality of layers. When the thickness of the Mo plate member 1A is T1, the thickness of the Cu plate member 1B is T2, and the thickness of the brazing material layer 1C is T3, the ratio of the thickness is T1 / (T2 + T3) = 4 to
9, and the thickness of the brazing material layer 1C is preferably 5 to 40 μm.
m or more.

【0047】この構成により、光半導体素子5の気密
性、光半導体素子5と光ファイバ8との光の結合効率、
光半導体素子5と入出力端子2との高周波伝送特性、光
半導体素子5の作動時に発する熱の伝熱性を良好なもの
とできる。
With this configuration, the airtightness of the optical semiconductor device 5, the coupling efficiency of light between the optical semiconductor device 5 and the optical fiber 8,
The high-frequency transmission characteristics between the optical semiconductor element 5 and the input / output terminal 2 and the heat transfer of heat generated when the optical semiconductor element 5 operates can be improved.

【0048】また、基体1の表面に耐蝕性に優れかつ接
着材との濡れ性に優れる金属、具体的には厚さ0.5〜
9μmのNi層と厚さ0.5〜9μmの金(Au)層を順
次メッキ法により被着させておくのがよく、基体1が酸
化腐食するのを有効に防止できるとともに、基体1上面
の凹部の底面に光半導体素子5を強固に載置固定でき
る。更には、基体1の最上面に蓋体6をAu−Sn合金
等の低融点ロウ材を介して良好に接合させ得る。
A metal having excellent corrosion resistance and excellent wettability with an adhesive on the surface of the substrate 1, specifically, a metal having a thickness of 0.5 to
It is preferable that a 9 μm Ni layer and a 0.5 to 9 μm thick gold (Au) layer are sequentially deposited by a plating method, so that oxidation and corrosion of the substrate 1 can be effectively prevented, and the upper surface of the substrate 1 can be effectively prevented. The optical semiconductor element 5 can be firmly placed and fixed on the bottom surface of the concave portion. Further, the lid 6 can be satisfactorily bonded to the uppermost surface of the base 1 via a low melting point brazing material such as an Au-Sn alloy.

【0049】このような基体1の枠状部の一側部には、
貫通孔から成り光信号経路と成る光ファイバ固定部材取
付部1bが形成されるとともに、他の側部には、外部電
気回路基板と高周波信号の入出力を行う機能を有する入
出力端子2を嵌着するための貫通開口または切欠き部か
ら成る入出力端子取付部1cが形成される。
On one side of the frame-shaped portion of such a base 1,
An optical fiber fixing member mounting portion 1b formed of a through hole and serving as an optical signal path is formed, and an input / output terminal 2 having a function of inputting / outputting a high-frequency signal to / from an external electric circuit board is fitted on the other side. An input / output terminal mounting portion 1c formed of a through opening or a notch for attachment is formed.

【0050】光ファイバ固定部材取付部1bの内周面ま
たは基体1の外面側開口の周辺部には、光ファイバ8を
挿通し樹脂接着剤等で接着された支持部材7を固定する
ための固定部材4が、Agロウ等のロウ材で接合され
る。この固定部材4は、Fe−Ni−Co合金やFe−
Ni合金等の金属材料から成り、例えばFe−Ni−C
o合金から成る場合、この合金のインゴットに圧延加工
やプレス加工等の金属加工を施すことにより所定の形状
に作製される。また、その表面には酸化腐食を有効に防
止するために、0.5〜9μmのNi層や0.5〜5μm
のAu層等の金属層をメッキ法により被着させておくと
良い。
A fixing member for fixing the supporting member 7 through which the optical fiber 8 is inserted and adhered with a resin adhesive or the like is provided on the inner peripheral surface of the optical fiber fixing member attaching portion 1b or the peripheral portion of the opening on the outer surface side of the base 1. The member 4 is joined with a brazing material such as Ag brazing. This fixing member 4 is made of an Fe—Ni—Co alloy or an Fe—Ni—Co alloy.
Made of a metal material such as a Ni alloy, for example, Fe-Ni-C
In the case of an o-alloy, an ingot of this alloy is formed into a predetermined shape by subjecting the ingot to metal working such as rolling or pressing. Further, in order to effectively prevent oxidative corrosion, a 0.5-9 μm Ni layer or a 0.5-5 μm
It is preferable to apply a metal layer such as an Au layer by a plating method.

【0051】なお、固定部材4の内周面には、集光レン
ズとして機能するとともに光半導体パッケージの内部を
塞ぐ非晶質ガラス等から成る透光性部材9が、その接合
部の表面に形成されたメタライズ層を介して、200〜
400℃の融点を有するAu−Sn合金等の低融点ロウ
材で接合される。この透光性部材9は、熱膨張係数が4
〜12ppm/℃(×10-6/℃)(室温〜400℃)
のサファイア(単結晶アルミナ)や非晶質ガラス等から
成り、球状,半球状,凸レンズ状,ロッドレンズ状等の
形状とされる。そして、光ファイバ8を伝わってきた外
部のレーザ光等の光を光半導体素子5に入力させる、ま
たは光半導体素子5で出力したレーザ光等の光を光ファ
イバ8に入力させるための集光用部材として用いられ
る。透光性部材9が結晶軸の存在しない非晶質ガラスの
場合、酸化珪素(SiO2),酸化鉛(PbO)を主成
分とする鉛系、またはホウ酸やケイ砂を主成分とするホ
ウケイ酸系のものを用いるのがよい。
A translucent member 9 made of amorphous glass or the like, which functions as a condenser lens and closes the inside of the optical semiconductor package, is formed on the inner peripheral surface of the fixing member 4 on the surface of the joint. 200- through the metallized layer
It is joined with a low melting point brazing material such as an Au-Sn alloy having a melting point of 400 ° C. This translucent member 9 has a coefficient of thermal expansion of 4
1212 ppm / ° C. (× 10 -6 / ° C.) (room temperature to 400 ° C.)
Made of sapphire (single crystal alumina), amorphous glass, or the like, and has a spherical, hemispherical, convex lens shape, rod lens shape, or the like. Then, a light such as an external laser beam transmitted through the optical fiber 8 is input to the optical semiconductor element 5, or a condensing light for inputting the laser light or the like output from the optical semiconductor element 5 to the optical fiber 8. Used as a member. When the translucent member 9 is an amorphous glass having no crystal axis, a lead-based material containing silicon oxide (SiO 2 ) or lead oxide (PbO) as a main component, or a borosilicate material containing boric acid or silica sand as a main component It is preferable to use an acid type.

【0052】また、透光性部材9は、その熱膨張係数が
基体1のそれと異なっていても、固定部材4が熱膨張差
による応力を吸収し緩和するので、結晶軸が応力のため
にある方向に揃うことにより光の屈折率の変化を起こす
ようなことは発生しにくい。従って、このような透光性
部材9を用いることにより、光半導体素子5と光ファイ
バ8との間の光の結合効率を高くできる。
Even if the translucent member 9 has a different coefficient of thermal expansion from that of the base 1, the fixing member 4 absorbs and relaxes the stress due to the difference in thermal expansion, so that the crystal axis is due to the stress. It is unlikely that a change in the refractive index of light due to the alignment in the direction will occur. Therefore, by using such a translucent member 9, the coupling efficiency of light between the optical semiconductor element 5 and the optical fiber 8 can be increased.

【0053】また、支持部材7は、固定部材4にYAG
レーザ溶接等で接合されるため、固定部材4と同様に金
属材料から成る方が良い。更には、支持部材7の熱膨張
係数は、光半導体素子5と光ファイバ8との光軸がずれ
ることが無いように、固定部材4と同様の材質であるこ
とが良い。従って、支持部材7の材料は、固定部材4が
Fe−Ni−Co合金であればFe−Ni−Co合金が
良く、固定部材4がFe−Ni合金であればFe−Ni
合金であることが良い。
The supporting member 7 is provided with a YAG
Since it is joined by laser welding or the like, it is better to be made of a metal material like the fixing member 4. Further, the thermal expansion coefficient of the support member 7 is preferably made of the same material as that of the fixing member 4 so that the optical axis of the optical semiconductor element 5 and the optical fiber 8 do not shift. Therefore, the material of the support member 7 is preferably an Fe—Ni—Co alloy if the fixing member 4 is an Fe—Ni—Co alloy, and is a Fe—Ni alloy if the fixing member 4 is an Fe—Ni alloy.
It is good to be an alloy.

【0054】また、入出力端子取付部1cには、その内
周面に入出力端子2がAgロウ等のロウ材を介して嵌着
される。この入出力端子2は、光半導体パッケージの内
部と外部との高周波信号の入出力部として機能するとと
もに、光半導体パッケージ内部を塞ぐ機能を有する。こ
の入出力端子2は、アルミナ(Al23)セラミックス
や窒化アルミニウム(AlN)セラミックス等の絶縁体
と、光半導体パッケージ内外を導出するように形成され
た、金属導体としてのメタライズ層2aとから構成され
る。また、光半導体パッケージ内側のメタライズ層2a
には、光半導体素子5の電極がボンディングワイヤを介
して電気的に接続される。
The input / output terminal 2 is fitted to the input / output terminal mounting portion 1c on the inner peripheral surface thereof through a brazing material such as Ag brazing. The input / output terminal 2 functions as an input / output unit for a high-frequency signal between the inside and the outside of the optical semiconductor package, and has a function of closing the inside of the optical semiconductor package. The input / output terminal 2 is composed of an insulator such as alumina (Al 2 O 3 ) ceramics or aluminum nitride (AlN) ceramics, and a metallized layer 2 a as a metal conductor formed so as to extend inside and outside the optical semiconductor package. Be composed. Also, the metallized layer 2a inside the optical semiconductor package
Is electrically connected to the electrode of the optical semiconductor element 5 via a bonding wire.

【0055】この入出力端子2は以下のようにして作製
される。絶縁体となる原料粉末に適当な有機バインダや
溶剤等を添加混合しペースト状と成すとともに、このペ
ーストをドクターブレード法やカレンダーロール法によ
りセラミックグリーンシートを作製する。このセラミッ
クグリーンシートに、メタライズ層2aとなるW,M
o,マンガン(Mn)等の粉末に有機溶剤,溶媒を添加
混合して得た金属ペーストを、予め従来周知のスクリー
ン印刷法により所望の形状に印刷塗布し、約1600℃
の高温で焼結することにより作製される。
The input / output terminal 2 is manufactured as follows. An appropriate organic binder, a solvent and the like are added to and mixed with the raw material powder to be an insulator to form a paste, and the paste is used to form a ceramic green sheet by a doctor blade method or a calender roll method. This ceramic green sheet is provided with W, M serving as a metallized layer 2a.
A metal paste obtained by adding an organic solvent and a solvent to a powder of o, manganese (Mn) or the like is preliminarily printed and coated in a desired shape by a conventionally known screen printing method, and is heated to about 1600 ° C.
It is produced by sintering at a high temperature.

【0056】なお、入出力端子2の絶縁体は、基体1の
載置部1aを有する部位と載置部1aを囲繞する枠状部
とを電気的に絶縁する機能を有し、その材料は誘電率や
熱膨張係数等の特性に応じて適宜選定される。
The insulator of the input / output terminal 2 has a function of electrically insulating the portion of the base 1 having the mounting portion 1a from the frame-like portion surrounding the mounting portion 1a. It is appropriately selected according to characteristics such as a dielectric constant and a coefficient of thermal expansion.

【0057】また、光半導体パッケージ外側のメタライ
ズ層2a上面には、リード端子3がAgロウ等のロウ材
を介して接合される。このリード端子3は入出力端子2
との接合を強固なものとするために、入出力端子2の熱
膨張係数に近似する部材が用いられる。例えばリード端
子3は、入出力端子2の絶縁体がAl23セラミックス
から成る場合は、Fe−Ni−Co合金やFe−Ni合
金から成る。
A lead terminal 3 is bonded to the upper surface of the metallized layer 2a outside the optical semiconductor package via a brazing material such as Ag brazing. This lead terminal 3 is an input / output terminal 2
In order to make the bond with the I / O terminal firm, a member having an approximate thermal expansion coefficient of the input / output terminal 2 is used. For example, when the insulator of the input / output terminal 2 is made of Al 2 O 3 ceramics, the lead terminal 3 is made of an Fe—Ni—Co alloy or an Fe—Ni alloy.

【0058】このように、本発明の光半導体パッケージ
は、略直方体状とされ、上面に形成された凹部の底面に
光半導体素子5を載置するための載置部1aおよび一側
部から凹部にかけて形成された貫通孔から成る光ファイ
バ固定部材取付部1bならびに他の側部から凹部にかけ
て形成された貫通開口または切欠き部から成る入出力端
子取付部1cを有する基体1と、光ファイバ固定部材取
付部1bに嵌着された筒状の固定部材4と、入出力端子
取付部1cに嵌着された入出力端子2とを具備し、基体
1は、それぞれの主面が基体1をその一側面に略平行な
多数の面で分割したような形状とされたMo板部材1A
とCu板部材1Bとが縦置きにされて交互に横方向に配
置されるとともにそれらの主面同士がロウ付けされて成
り、Mo板部材1Aの厚さをT1、Cu板部材1Bの厚
さをT2、Mo板部材1AとCu板部材1B間のロウ材
層1Cの厚さをT3とした場合、T1/(T2+T3)
=4〜9である。
As described above, the optical semiconductor package of the present invention has a substantially rectangular parallelepiped shape, and the mounting portion 1a for mounting the optical semiconductor element 5 on the bottom surface of the concave portion formed on the upper surface and the concave portion from one side. A base member 1 having an optical fiber fixing member mounting portion 1b formed of a through hole formed over the base and an input / output terminal mounting portion 1c formed of a through opening or cutout formed from the other side to the concave portion; The base body 1 includes a cylindrical fixing member 4 fitted to the mounting portion 1b and an input / output terminal 2 fitted to the input / output terminal mounting portion 1c. Mo plate member 1A shaped to be divided by a number of surfaces substantially parallel to the side surface
And the Cu plate member 1B are vertically arranged alternately in the horizontal direction, and their main surfaces are brazed. The thickness of the Mo plate member 1A is T1, the thickness of the Cu plate member 1B is Where T2 is the thickness of the brazing material layer 1C between the Mo plate member 1A and the Cu plate member 1B, and T1 / (T2 + T3)
= 4-9.

【0059】なお、Mo板部材1AおよびCu板部材1
Bのそれぞれの主面形状は、基体1をその一側面に略平
行な多数の面で切断したような形状とされており、図
1,図2から明らかなように略凹型状である。これらの
主面同士を接合することにより基体1が構成される。ま
た、基体1の側面の下端に張出部を形成するために、基
体1の端面の下部に横長の長方形状(短冊状)のものを
接合してもよい。さらには、略凹型状のものにおいて、
その両側辺の下端に側方(面方向)に張り出した張出部
が形成されているとよく、基体1の下面の面積が増大し
て安定度が向上し、また入出力端子2の設置の安定度が
向上する。
The Mo plate member 1A and the Cu plate member 1
Each main surface of B has a shape obtained by cutting the base 1 at a number of surfaces substantially parallel to one side surface thereof, and has a substantially concave shape as is clear from FIGS. The base 1 is formed by joining these main surfaces. Further, in order to form an overhang at the lower end of the side surface of the base 1, a horizontally long rectangular (strip-shaped) member may be joined to the lower part of the end surface of the base 1. Furthermore, in a substantially concave shape,
It is preferable to form a projecting portion projecting laterally (in the plane direction) at the lower end of both sides, so that the area of the lower surface of the base 1 is increased and the stability is improved. Stability is improved.

【0060】また、上記本発明の光半導体パッケージ
と、載置部1aに載置固定され入出力端子2に電気的に
接続された光半導体素子5と、基体1の最上面に接合さ
れた蓋体6とを具備することにより、製品としての光半
導体装置となる。なお、固定部材4に端部が挿着される
光ファイバ8は、一般に光半導体装置の使用時に設けら
れるが、単品としての光半導体装置に付加されていても
よく、または光半導体装置が外部電気回路基板等に固定
されて使用される際に取り付けるようにしてもよい。
The optical semiconductor package of the present invention, an optical semiconductor element 5 mounted and fixed on the mounting portion 1a and electrically connected to the input / output terminal 2, and a lid bonded to the uppermost surface of the base 1 The provision of the body 6 results in an optical semiconductor device as a product. The optical fiber 8 whose end is inserted into the fixing member 4 is generally provided when the optical semiconductor device is used. However, the optical fiber 8 may be added to the optical semiconductor device as a single item, or the optical semiconductor device may be connected to an external electric device. It may be attached when it is used by being fixed to a circuit board or the like.

【0061】具体的には、載置部1aの上面に光半導体
素子5をガラス,樹脂,ロウ材等の接着剤を介して接着
固定するとともに、光半導体素子5の電極をボンディン
グワイヤを介して所定のメタライズ層2aに電気的に接
続させ、しかる後、基体1の最上面に蓋体6をAu−S
n等の低融点ロウ材により接合させることにより、基体
1,入出力端子2,固定部材4,透光性部材9から成る
光半導体パッケージの内部に光半導体素子5を収容した
製品としての光半導体装置となる。
More specifically, the optical semiconductor element 5 is bonded and fixed to the upper surface of the mounting portion 1a with an adhesive such as glass, resin, brazing material and the like, and the electrodes of the optical semiconductor element 5 are bonded with bonding wires. The lid 6 is electrically connected to a predetermined metallized layer 2a.
An optical semiconductor as a product in which the optical semiconductor element 5 is housed inside an optical semiconductor package including the base 1, the input / output terminals 2, the fixing member 4, and the translucent member 9 by joining with a low melting point brazing material such as n. Device.

【0062】このような光半導体装置は、例えば外部電
気回路基板から供給される高周波信号により光半導体素
子5を光励起させ、励起したレーザ光等の光を透光性部
材9を通して光ファイバ8に授受させるとともに光ファ
イバ8内を伝送させることにより、大容量の情報を高速
に伝送できる光電変換装置として機能し、光通信分野等
に多用される。
In such an optical semiconductor device, for example, the optical semiconductor element 5 is optically excited by a high-frequency signal supplied from an external electric circuit board, and the excited light such as laser light is transmitted to and received from the optical fiber 8 through the light transmitting member 9. By transmitting the data through the optical fiber 8, it functions as a photoelectric conversion device capable of transmitting a large amount of information at high speed, and is frequently used in the field of optical communication and the like.

【0063】なお、本発明は上記実施の形態に限定され
ず、本発明の要旨を逸脱しない範囲内において種々の変
更を行うことは何等支障ない。例えば、光半導体装置
は、内部または外部に、例えば固定部材4の基体1内側
または外側に、あるいは基体1外側の光ファイバ8の途
中に、戻り光防止用の光アイソレータを設けても良い。
この場合、光半導体素子5と光ファイバ8との光の結合
効率がさらに良好なものとなる。また、基体1の枠状部
の最外層(最も外側の層)および最内層(最も内部空間
側の層)はCu板部材1Bから成るのがよく、外部やヒ
ートシンク部への放熱性が向上する。
It should be noted that the present invention is not limited to the above embodiment, and that various changes may be made without departing from the scope of the present invention. For example, the optical semiconductor device may be provided with an optical isolator for preventing return light inside or outside, for example, inside or outside the base 1 of the fixing member 4 or in the middle of the optical fiber 8 outside the base 1.
In this case, the light coupling efficiency between the optical semiconductor element 5 and the optical fiber 8 is further improved. Further, the outermost layer (outermost layer) and the innermost layer (layer closest to the inner space) of the frame-shaped portion of the base 1 are preferably made of the Cu plate member 1B, and the heat dissipation to the outside and the heat sink portion is improved. .

【0064】[0064]

【発明の効果】本発明は、略直方体状とされ、上面に形
成された凹部の底面に光半導体素子を載置するための載
置部および一側部から凹部にかけて形成された貫通孔か
ら成る光ファイバ固定部材取付部ならびに他の側部から
凹部にかけて形成された貫通開口または切欠き部から成
る入出力端子取付部を有する基体が、主面形状が略凹型
状とされたMo板部材とCu板部材とが縦置きにされて
交互に横方向に配置されるとともにそれらの主面同士が
ロウ付けされて成り、Mo板部材の厚さをT1、Cu板
部材の厚さをT2、Mo板部材とCu板部材間のロウ材
層の厚さをT3としたときに、T1/(T2+T3)=
4〜9であることから、光半導体素子の気密性、光半導
体素子と光ファイバとの光の結合効率、光半導体素子と
入出力端子との高周波伝送特性、光半導体素子の作動時
に発する熱の伝熱性を非常に良好とし得るという作用効
果を有する。その結果、光半導体素子を長期間にわたり
正常かつ安定に作動させ得る。
The present invention has a substantially rectangular parallelepiped shape and comprises a mounting portion for mounting an optical semiconductor element on the bottom surface of a concave portion formed on the upper surface and a through hole formed from one side to the concave portion. A base having an optical fiber fixing member mounting portion and an input / output terminal mounting portion formed of a through opening or a cutout formed from the other side portion to the concave portion is formed of a Mo plate member having a substantially concave main surface shape and Cu. The plate members are arranged vertically and alternately arranged in the horizontal direction, and their main surfaces are brazed. The thickness of the Mo plate member is T1, the thickness of the Cu plate member is T2, and the Mo plate member is T2. When the thickness of the brazing material layer between the member and the Cu plate member is T3, T1 / (T2 + T3) =
Since it is 4 to 9, the airtightness of the optical semiconductor element, the coupling efficiency of light between the optical semiconductor element and the optical fiber, the high-frequency transmission characteristics between the optical semiconductor element and the input / output terminal, and the heat generated during operation of the optical semiconductor element It has the effect that the heat transfer can be made very good. As a result, the optical semiconductor element can be normally and stably operated for a long time.

【0065】また、本発明の光半導体装置は、本発明の
光半導体パッケージと、載置部に載置固定され入出力端
子に電気的に接続された光半導体素子と、基体の最上面
に接合された蓋体とを具備したことにより、上記作用効
果を有する光半導体パッケージを用いた信頼性の高い光
半導体装置を提供できる。
Further, the optical semiconductor device of the present invention comprises an optical semiconductor package of the present invention, an optical semiconductor element mounted and fixed on a mounting portion and electrically connected to input / output terminals, and joined to the uppermost surface of the base. With such a lid, a highly reliable optical semiconductor device using the optical semiconductor package having the above-described functions and effects can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の光半導体パッケージについて実施の形
態の一例を示す斜視図である。
FIG. 1 is a perspective view showing an example of an embodiment of an optical semiconductor package of the present invention.

【図2】図1の光半導体パッケージにおける基体の部分
拡大断面図である。
FIG. 2 is a partially enlarged sectional view of a base in the optical semiconductor package of FIG. 1;

【図3】従来の半導体パッケージの斜視図である。FIG. 3 is a perspective view of a conventional semiconductor package.

【図4】図3の半導体パッケージにおける基体の部分拡
大断面図である。
FIG. 4 is a partially enlarged sectional view of a base in the semiconductor package of FIG. 3;

【図5】図3の半導体パッケージを光半導体パッケージ
とした場合の斜視図である。
FIG. 5 is a perspective view when the semiconductor package of FIG. 3 is an optical semiconductor package.

【符号の説明】[Explanation of symbols]

1:基体 1a:載置部 1b:光ファイバ固定部材取付部 1c:入出力端子取付部 1A:モリブデン板 1B:銅板 1C:ロウ材層 2:入出力端子 4:光ファイバ固定部材 5:光半導体素子 6:蓋体 1: Base 1a: Mounting section 1b: Optical fiber fixing member mounting section 1c: Input / output terminal mounting section 1A: Molybdenum plate 1B: Copper plate 1C: Brazing material layer 2: Input / output terminal 4: Optical fiber fixing member 5: Optical semiconductor Element 6: Lid

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 略直方体状とされ、上面に形成された凹
部の底面に光半導体素子を載置するための載置部および
一側部から前記凹部にかけて形成された貫通孔から成る
光ファイバ固定部材取付部ならびに他の側部から前記凹
部にかけて形成された貫通開口または切欠き部から成る
入出力端子取付部を有する基体と、前記光ファイバ固定
部材取付部に嵌着された筒状の光ファイバ固定部材と、
前記入出力端子取付部に嵌着された入出力端子とを具備
した光半導体素子収納用パッケージにおいて、前記基体
は、主面形状が略凹型状とされたモリブデン板部材と銅
板部材とが縦置きにされて交互に横方向に配置されると
ともにそれらの主面同士がロウ付けされて成り、前記モ
リブデン板部材の厚さをT1、前記銅板部材の厚さをT
2、前記モリブデン板部材と前記銅板部材間のロウ材層
の厚さをT3としたときに、T1/(T2+T3)=4
〜9であることを特徴とする光半導体素子収納用パッケ
ージ。
1. An optical fiber fixing device having a substantially rectangular parallelepiped shape and comprising a mounting portion for mounting an optical semiconductor element on a bottom surface of a concave portion formed on an upper surface and a through hole formed from one side to the concave portion. A base having an input / output terminal mounting portion comprising a member mounting portion and a through-opening or notch formed from the other side portion to the concave portion, and a cylindrical optical fiber fitted to the optical fiber fixing member mounting portion A fixing member,
In the optical semiconductor device housing package having an input / output terminal fitted to the input / output terminal mounting portion, the base is formed by vertically placing a molybdenum plate member and a copper plate member having a substantially concave main surface shape. The molybdenum plate member has a thickness of T1 and the copper plate member has a thickness of T1.
2. When the thickness of the brazing material layer between the molybdenum plate member and the copper plate member is T3, T1 / (T2 + T3) = 4
A package for storing an optical semiconductor element.
【請求項2】 請求項1記載の光半導体素子収納用パッ
ケージと、前記載置部に載置固定され前記入出力端子に
電気的に接続された光半導体素子と、前記基体の上面に
接合された蓋体とを具備したことを特徴とする光半導体
装置。
2. An optical semiconductor element storage package according to claim 1, wherein the optical semiconductor element is mounted on and fixed to the mounting portion and electrically connected to the input / output terminal, and is bonded to an upper surface of the base. An optical semiconductor device, comprising: a lid;
JP2001113031A 2001-04-11 2001-04-11 Package for storing optical semiconductor element and optical semiconductor device Pending JP2002314186A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001113031A JP2002314186A (en) 2001-04-11 2001-04-11 Package for storing optical semiconductor element and optical semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001113031A JP2002314186A (en) 2001-04-11 2001-04-11 Package for storing optical semiconductor element and optical semiconductor device

Publications (1)

Publication Number Publication Date
JP2002314186A true JP2002314186A (en) 2002-10-25

Family

ID=18964330

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001113031A Pending JP2002314186A (en) 2001-04-11 2001-04-11 Package for storing optical semiconductor element and optical semiconductor device

Country Status (1)

Country Link
JP (1) JP2002314186A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010034396A (en) * 2008-07-30 2010-02-12 Denso Corp Method of manufacturing semiconductor laser device, and semiconductor laser device
US7951467B2 (en) * 2005-10-18 2011-05-31 Eiki Tsushima Cladding material and its manufacturing method, press-forming method, and heat sink using cladding material
CN112444503A (en) * 2020-11-19 2021-03-05 哈尔滨理工大学 Copper ion/bacterium monitoring dual-parameter optical fiber sensing device and implementation method
CN112444502A (en) * 2020-11-19 2021-03-05 哈尔滨理工大学 Lead ion/bacterium monitoring double-parameter optical fiber sensing device and implementation method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7951467B2 (en) * 2005-10-18 2011-05-31 Eiki Tsushima Cladding material and its manufacturing method, press-forming method, and heat sink using cladding material
JP2010034396A (en) * 2008-07-30 2010-02-12 Denso Corp Method of manufacturing semiconductor laser device, and semiconductor laser device
CN112444503A (en) * 2020-11-19 2021-03-05 哈尔滨理工大学 Copper ion/bacterium monitoring dual-parameter optical fiber sensing device and implementation method
CN112444502A (en) * 2020-11-19 2021-03-05 哈尔滨理工大学 Lead ion/bacterium monitoring double-parameter optical fiber sensing device and implementation method
CN112444503B (en) * 2020-11-19 2021-09-24 哈尔滨理工大学 Copper ion/bacterium monitoring dual-parameter optical fiber sensing device and implementation method
CN112444502B (en) * 2020-11-19 2021-09-24 哈尔滨理工大学 Lead ion/bacterium monitoring double-parameter optical fiber sensing device and implementation method

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