JP2002311565A - 微細構造体の製造方法、２値マスク、および２値マスクの製造方法 - Google Patents
微細構造体の製造方法、２値マスク、および２値マスクの製造方法Info
- Publication number
- JP2002311565A JP2002311565A JP2002027647A JP2002027647A JP2002311565A JP 2002311565 A JP2002311565 A JP 2002311565A JP 2002027647 A JP2002027647 A JP 2002027647A JP 2002027647 A JP2002027647 A JP 2002027647A JP 2002311565 A JP2002311565 A JP 2002311565A
- Authority
- JP
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- Prior art keywords
- processing
- binary mask
- manufacturing
- mask
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 73
- 238000004519 manufacturing process Methods 0.000 title claims description 96
- 230000008569 process Effects 0.000 claims abstract description 13
- 238000012545 processing Methods 0.000 claims description 128
- 230000005540 biological transmission Effects 0.000 claims description 44
- 239000000758 substrate Substances 0.000 claims description 28
- 239000004973 liquid crystal related substance Substances 0.000 claims description 26
- 230000000694 effects Effects 0.000 claims description 13
- 238000003384 imaging method Methods 0.000 claims description 8
- 238000009792 diffusion process Methods 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 4
- 238000004891 communication Methods 0.000 claims description 3
- 238000004377 microelectronic Methods 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 73
- 238000009826 distribution Methods 0.000 description 16
- 230000008859 change Effects 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 8
- 238000005530 etching Methods 0.000 description 7
- 238000000206 photolithography Methods 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 238000003672 processing method Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 210000002858 crystal cell Anatomy 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 230000002250 progressing effect Effects 0.000 description 2
- 210000001747 pupil Anatomy 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 241000167880 Hirundinidae Species 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
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- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- -1 silver ions Chemical class 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002027647A JP2002311565A (ja) | 2001-02-09 | 2002-02-05 | 微細構造体の製造方法、２値マスク、および２値マスクの製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001033687 | 2001-02-09 | ||
| JP2001-33687 | 2001-02-09 | ||
| JP2002027647A JP2002311565A (ja) | 2001-02-09 | 2002-02-05 | 微細構造体の製造方法、２値マスク、および２値マスクの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002311565A true JP2002311565A (ja) | 2002-10-23 |
| JP2002311565A5 JP2002311565A5 (enExample) | 2005-06-23 |
Family
ID=26609198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002027647A Withdrawn JP2002311565A (ja) | 2001-02-09 | 2002-02-05 | 微細構造体の製造方法、２値マスク、および２値マスクの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002311565A (enExample) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004070087A (ja) * | 2002-08-07 | 2004-03-04 | Dainippon Printing Co Ltd | パターンデータの作製方法およびフォトマスク |
| JP2004296590A (ja) * | 2003-03-26 | 2004-10-21 | Dainippon Printing Co Ltd | 撮像装置と撮像装置におけるマイクロレンズの形成方法 |
| JP2006098985A (ja) * | 2004-09-30 | 2006-04-13 | Dainippon Printing Co Ltd | 固体撮像素子レンズ用感光性樹脂組成物、これを用いた固体撮像素子レンズ及び固体撮像素子レンズの形成方法、並びに固体撮像素子 |
| JP2007155927A (ja) * | 2005-12-01 | 2007-06-21 | Dainippon Printing Co Ltd | 回折光学素子作製方法と回折光学素子、および該作製方法に用いられるレチクルマスク |
| JP2009008933A (ja) * | 2007-06-28 | 2009-01-15 | Oki Electric Ind Co Ltd | レジストパターンの形成方法及びフォトマスク |
| JP2010020146A (ja) * | 2008-07-11 | 2010-01-28 | Fujifilm Corp | カラーフィルタ及びその製造方法、並びに液晶表示装置 |
| US8092960B2 (en) | 2003-01-28 | 2012-01-10 | Sony Corporation | Exposing mask and production method therefor and exposing method |
| US9698157B2 (en) | 2015-03-12 | 2017-07-04 | Kabushiki Kaisha Toshiba | Microstructure device and method for manufacturing the same |
| WO2021033937A1 (ko) * | 2019-08-20 | 2021-02-25 | 울산과학기술원 | 디더링 마스크를 이용한 홀로그래픽 패턴 발현 유기젤의 제조방법 |
| KR20220049438A (ko) * | 2020-10-14 | 2022-04-21 | 울산과학기술원 | 디더링 마스크에 기반한 홀로그램 색상 지정 시스템 및 홀로그램 색상 지정 방법 |
| KR20220049439A (ko) * | 2020-10-14 | 2022-04-21 | 울산과학기술원 | 어레이형의 홀로그램을 이용한 암호화 시스템 |
| KR20230038685A (ko) * | 2020-10-14 | 2023-03-21 | 울산과학기술원 | 디더링 마스크에 기반한 홀로그램 색상 지정 시스템 및 홀로그램 색상 지정 방법 |
-
2002
- 2002-02-05 JP JP2002027647A patent/JP2002311565A/ja not_active Withdrawn
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004070087A (ja) * | 2002-08-07 | 2004-03-04 | Dainippon Printing Co Ltd | パターンデータの作製方法およびフォトマスク |
| US8092960B2 (en) | 2003-01-28 | 2012-01-10 | Sony Corporation | Exposing mask and production method therefor and exposing method |
| JP2004296590A (ja) * | 2003-03-26 | 2004-10-21 | Dainippon Printing Co Ltd | 撮像装置と撮像装置におけるマイクロレンズの形成方法 |
| JP2006098985A (ja) * | 2004-09-30 | 2006-04-13 | Dainippon Printing Co Ltd | 固体撮像素子レンズ用感光性樹脂組成物、これを用いた固体撮像素子レンズ及び固体撮像素子レンズの形成方法、並びに固体撮像素子 |
| JP2007155927A (ja) * | 2005-12-01 | 2007-06-21 | Dainippon Printing Co Ltd | 回折光学素子作製方法と回折光学素子、および該作製方法に用いられるレチクルマスク |
| JP2009008933A (ja) * | 2007-06-28 | 2009-01-15 | Oki Electric Ind Co Ltd | レジストパターンの形成方法及びフォトマスク |
| JP2010020146A (ja) * | 2008-07-11 | 2010-01-28 | Fujifilm Corp | カラーフィルタ及びその製造方法、並びに液晶表示装置 |
| US9698157B2 (en) | 2015-03-12 | 2017-07-04 | Kabushiki Kaisha Toshiba | Microstructure device and method for manufacturing the same |
| WO2021033937A1 (ko) * | 2019-08-20 | 2021-02-25 | 울산과학기술원 | 디더링 마스크를 이용한 홀로그래픽 패턴 발현 유기젤의 제조방법 |
| KR20210022384A (ko) * | 2019-08-20 | 2021-03-03 | 울산과학기술원 | 디더링 마스크를 이용한 홀로그래픽 패턴 발현 유기젤의 제조방법 |
| KR102255555B1 (ko) | 2019-08-20 | 2021-05-25 | 울산과학기술원 | 디더링 마스크를 이용한 홀로그래픽 패턴 발현 유기젤의 제조방법 |
| US12038719B2 (en) | 2019-08-20 | 2024-07-16 | Unist (Ulsan National Institute Of Science And Technology) | Method for preparing holographic pattern-expressing organogel using dithering mask |
| KR20220049438A (ko) * | 2020-10-14 | 2022-04-21 | 울산과학기술원 | 디더링 마스크에 기반한 홀로그램 색상 지정 시스템 및 홀로그램 색상 지정 방법 |
| KR20220049439A (ko) * | 2020-10-14 | 2022-04-21 | 울산과학기술원 | 어레이형의 홀로그램을 이용한 암호화 시스템 |
| KR102510926B1 (ko) * | 2020-10-14 | 2023-03-16 | 울산과학기술원 | 디더링 마스크에 기반한 홀로그램 색상 지정 시스템 및 홀로그램 색상 지정 방법 |
| KR20230038685A (ko) * | 2020-10-14 | 2023-03-21 | 울산과학기술원 | 디더링 마스크에 기반한 홀로그램 색상 지정 시스템 및 홀로그램 색상 지정 방법 |
| KR102523616B1 (ko) * | 2020-10-14 | 2023-04-20 | 울산과학기술원 | 어레이형의 홀로그램을 이용한 암호화 시스템 |
| KR102742536B1 (ko) * | 2020-10-14 | 2024-12-16 | 울산과학기술원 | 디더링 마스크에 기반한 홀로그램 색상 지정 시스템 및 홀로그램 색상 지정 방법 |
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