JP2002302789A - 電解質 - Google Patents
電解質Info
- Publication number
- JP2002302789A JP2002302789A JP2001316476A JP2001316476A JP2002302789A JP 2002302789 A JP2002302789 A JP 2002302789A JP 2001316476 A JP2001316476 A JP 2001316476A JP 2001316476 A JP2001316476 A JP 2001316476A JP 2002302789 A JP2002302789 A JP 2002302789A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- acids
- copper
- semiconductor wafer
- ion source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G08—SIGNALLING
- G08B—SIGNALLING OR CALLING SYSTEMS; ORDER TELEGRAPHS; ALARM SYSTEMS
- G08B17/00—Fire alarms; Alarms responsive to explosion
- G08B17/06—Electric actuation of the alarm, e.g. using a thermally-operated switch
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- G—PHYSICS
- G08—SIGNALLING
- G08B—SIGNALLING OR CALLING SYSTEMS; ORDER TELEGRAPHS; ALARM SYSTEMS
- G08B25/00—Alarm systems in which the location of the alarm condition is signalled to a central station, e.g. fire or police telegraphic systems
- G08B25/01—Alarm systems in which the location of the alarm condition is signalled to a central station, e.g. fire or police telegraphic systems characterised by the transmission medium
- G08B25/10—Alarm systems in which the location of the alarm condition is signalled to a central station, e.g. fire or police telegraphic systems characterised by the transmission medium using wireless transmission systems
-
- G—PHYSICS
- G08—SIGNALLING
- G08B—SIGNALLING OR CALLING SYSTEMS; ORDER TELEGRAPHS; ALARM SYSTEMS
- G08B3/00—Audible signalling systems; Audible personal calling systems
- G08B3/10—Audible signalling systems; Audible personal calling systems using electric transmission; using electromagnetic transmission
- G08B3/1008—Personal calling arrangements or devices, i.e. paging systems
- G08B3/1016—Personal calling arrangements or devices, i.e. paging systems using wireless transmission
- G08B3/1025—Paging receivers with audible signalling details
- G08B3/1033—Paging receivers with audible signalling details with voice message alert
-
- G—PHYSICS
- G08—SIGNALLING
- G08B—SIGNALLING OR CALLING SYSTEMS; ORDER TELEGRAPHS; ALARM SYSTEMS
- G08B5/00—Visible signalling systems, e.g. personal calling systems, remote indication of seats occupied
- G08B5/22—Visible signalling systems, e.g. personal calling systems, remote indication of seats occupied using electric transmission; using electromagnetic transmission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/53204—Conductive materials
- H01L23/53209—Conductive materials based on metals, e.g. alloys, metal silicides
- H01L23/53228—Conductive materials based on metals, e.g. alloys, metal silicides the principal metal being copper
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/423—Plated through-holes or plated via connections characterised by electroplating method
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Emergency Management (AREA)
- Electromagnetism (AREA)
- Business, Economics & Management (AREA)
- Computer Networks & Wireless Communication (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US24014200P | 2000-10-13 | 2000-10-13 | |
| US24064300P | 2000-10-16 | 2000-10-16 | |
| US60/240643 | 2000-10-16 | ||
| US60/240142 | 2000-10-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002302789A true JP2002302789A (ja) | 2002-10-18 |
| JP2002302789A5 JP2002302789A5 (enExample) | 2005-06-30 |
Family
ID=26933186
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001316476A Pending JP2002302789A (ja) | 2000-10-13 | 2001-10-15 | 電解質 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP1197586A3 (enExample) |
| JP (1) | JP2002302789A (enExample) |
| KR (2) | KR20020029626A (enExample) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005038088A1 (ja) * | 2003-10-20 | 2005-04-28 | Kansai Technology Licensing Organization Co., Ltd. | 無電解銅めっき液及びそれを用いた配線基板の製造方法 |
| JP2006510807A (ja) * | 2002-12-16 | 2006-03-30 | スリーエム イノベイティブ プロパティズ カンパニー | 銅配線および/またはフィルムを研磨および/または洗浄する方法およびそのための組成物 |
| JP2007016265A (ja) * | 2005-07-06 | 2007-01-25 | Adeka Corp | 電解銅メッキ用添加剤、該添加剤を含有する電解銅メッキ浴及び該メッキ浴を使用する電解銅メッキ方法 |
| JP2008513503A (ja) * | 2004-09-21 | 2008-05-01 | バイオニューメリック・ファーマスーティカルズ・インコーポレイテッド | 医薬用ジスルフィド塩 |
| WO2011001847A1 (ja) * | 2009-07-01 | 2011-01-06 | Jx日鉱日石金属株式会社 | Ulsi微細銅配線埋め込み用電気銅めっき液 |
| JP4888913B2 (ja) * | 2004-11-12 | 2012-02-29 | エントン インコーポレイテッド | マイクロ電子機器における銅電気沈積方法 |
| US11946153B2 (en) | 2019-02-01 | 2024-04-02 | Ishihara Chemical Co., Ltd. | Copper or copper alloy electroplating bath |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100688766B1 (ko) * | 2004-12-08 | 2007-03-02 | 삼성전기주식회사 | 초임계 유체를 이용한 인쇄회로기판의 동도금방법 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2871173A (en) * | 1958-02-04 | 1959-01-27 | Seymour Mfg Company | Method of making ductile copper platings |
| SU1650786A1 (ru) * | 1987-05-19 | 1991-05-23 | Волгоградский инженерно-строительный институт | Электролит меднени |
| US5252196A (en) * | 1991-12-05 | 1993-10-12 | Shipley Company Inc. | Copper electroplating solutions and processes |
| KR20000057470A (ko) * | 1996-12-16 | 2000-09-15 | 포만 제프리 엘 | 집적 회로 칩 상의 전기 도금된 상호 접속 구조체 |
| US6024857A (en) * | 1997-10-08 | 2000-02-15 | Novellus Systems, Inc. | Electroplating additive for filling sub-micron features |
| US6113771A (en) * | 1998-04-21 | 2000-09-05 | Applied Materials, Inc. | Electro deposition chemistry |
| JP2000269217A (ja) | 1999-03-18 | 2000-09-29 | Kobe Steel Ltd | 銅配線膜の形成方法 |
-
2001
- 2001-10-12 KR KR1020010062915A patent/KR20020029626A/ko not_active Ceased
- 2001-10-12 EP EP01308710A patent/EP1197586A3/en not_active Withdrawn
- 2001-10-15 JP JP2001316476A patent/JP2002302789A/ja active Pending
-
2009
- 2009-02-27 KR KR1020090016864A patent/KR100971267B1/ko not_active Expired - Lifetime
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006510807A (ja) * | 2002-12-16 | 2006-03-30 | スリーエム イノベイティブ プロパティズ カンパニー | 銅配線および/またはフィルムを研磨および/または洗浄する方法およびそのための組成物 |
| WO2005038088A1 (ja) * | 2003-10-20 | 2005-04-28 | Kansai Technology Licensing Organization Co., Ltd. | 無電解銅めっき液及びそれを用いた配線基板の製造方法 |
| JP2008513503A (ja) * | 2004-09-21 | 2008-05-01 | バイオニューメリック・ファーマスーティカルズ・インコーポレイテッド | 医薬用ジスルフィド塩 |
| JP4888913B2 (ja) * | 2004-11-12 | 2012-02-29 | エントン インコーポレイテッド | マイクロ電子機器における銅電気沈積方法 |
| JP2007016265A (ja) * | 2005-07-06 | 2007-01-25 | Adeka Corp | 電解銅メッキ用添加剤、該添加剤を含有する電解銅メッキ浴及び該メッキ浴を使用する電解銅メッキ方法 |
| WO2011001847A1 (ja) * | 2009-07-01 | 2011-01-06 | Jx日鉱日石金属株式会社 | Ulsi微細銅配線埋め込み用電気銅めっき液 |
| US11946153B2 (en) | 2019-02-01 | 2024-04-02 | Ishihara Chemical Co., Ltd. | Copper or copper alloy electroplating bath |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20090031539A (ko) | 2009-03-26 |
| KR100971267B1 (ko) | 2010-07-20 |
| EP1197586A3 (en) | 2002-09-25 |
| EP1197586A2 (en) | 2002-04-17 |
| KR20020029626A (ko) | 2002-04-19 |
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