JP2002302789A - 電解質 - Google Patents

電解質

Info

Publication number
JP2002302789A
JP2002302789A JP2001316476A JP2001316476A JP2002302789A JP 2002302789 A JP2002302789 A JP 2002302789A JP 2001316476 A JP2001316476 A JP 2001316476A JP 2001316476 A JP2001316476 A JP 2001316476A JP 2002302789 A JP2002302789 A JP 2002302789A
Authority
JP
Japan
Prior art keywords
acid
acids
copper
semiconductor wafer
ion source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001316476A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002302789A5 (enExample
Inventor
Denis Morrissey
デニス・モリッセイ
Robert D Mikkola
ロバート・ディー・ミッコラ
Jeffrey M Calvert
ジェフリー・エム・カルバート
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials International LLC
Original Assignee
Shipley Co LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co LLC filed Critical Shipley Co LLC
Publication of JP2002302789A publication Critical patent/JP2002302789A/ja
Publication of JP2002302789A5 publication Critical patent/JP2002302789A5/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G08SIGNALLING
    • G08BSIGNALLING OR CALLING SYSTEMS; ORDER TELEGRAPHS; ALARM SYSTEMS
    • G08B17/00Fire alarms; Alarms responsive to explosion
    • G08B17/06Electric actuation of the alarm, e.g. using a thermally-operated switch
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • GPHYSICS
    • G08SIGNALLING
    • G08BSIGNALLING OR CALLING SYSTEMS; ORDER TELEGRAPHS; ALARM SYSTEMS
    • G08B25/00Alarm systems in which the location of the alarm condition is signalled to a central station, e.g. fire or police telegraphic systems
    • G08B25/01Alarm systems in which the location of the alarm condition is signalled to a central station, e.g. fire or police telegraphic systems characterised by the transmission medium
    • G08B25/10Alarm systems in which the location of the alarm condition is signalled to a central station, e.g. fire or police telegraphic systems characterised by the transmission medium using wireless transmission systems
    • GPHYSICS
    • G08SIGNALLING
    • G08BSIGNALLING OR CALLING SYSTEMS; ORDER TELEGRAPHS; ALARM SYSTEMS
    • G08B3/00Audible signalling systems; Audible personal calling systems
    • G08B3/10Audible signalling systems; Audible personal calling systems using electric transmission; using electromagnetic transmission
    • G08B3/1008Personal calling arrangements or devices, i.e. paging systems
    • G08B3/1016Personal calling arrangements or devices, i.e. paging systems using wireless transmission
    • G08B3/1025Paging receivers with audible signalling details
    • G08B3/1033Paging receivers with audible signalling details with voice message alert
    • GPHYSICS
    • G08SIGNALLING
    • G08BSIGNALLING OR CALLING SYSTEMS; ORDER TELEGRAPHS; ALARM SYSTEMS
    • G08B5/00Visible signalling systems, e.g. personal calling systems, remote indication of seats occupied
    • G08B5/22Visible signalling systems, e.g. personal calling systems, remote indication of seats occupied using electric transmission; using electromagnetic transmission
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321After treatment
    • H01L21/32115Planarisation
    • H01L21/3212Planarisation by chemical mechanical polishing [CMP]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/532Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
    • H01L23/53204Conductive materials
    • H01L23/53209Conductive materials based on metals, e.g. alloys, metal silicides
    • H01L23/53228Conductive materials based on metals, e.g. alloys, metal silicides the principal metal being copper
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/423Plated through-holes or plated via connections characterised by electroplating method

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Emergency Management (AREA)
  • Electromagnetism (AREA)
  • Business, Economics & Management (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrodes Of Semiconductors (AREA)
JP2001316476A 2000-10-13 2001-10-15 電解質 Pending JP2002302789A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US24014200P 2000-10-13 2000-10-13
US24064300P 2000-10-16 2000-10-16
US60/240643 2000-10-16
US60/240142 2000-10-16

Publications (2)

Publication Number Publication Date
JP2002302789A true JP2002302789A (ja) 2002-10-18
JP2002302789A5 JP2002302789A5 (enExample) 2005-06-30

Family

ID=26933186

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001316476A Pending JP2002302789A (ja) 2000-10-13 2001-10-15 電解質

Country Status (3)

Country Link
EP (1) EP1197586A3 (enExample)
JP (1) JP2002302789A (enExample)
KR (2) KR20020029626A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005038088A1 (ja) * 2003-10-20 2005-04-28 Kansai Technology Licensing Organization Co., Ltd. 無電解銅めっき液及びそれを用いた配線基板の製造方法
JP2006510807A (ja) * 2002-12-16 2006-03-30 スリーエム イノベイティブ プロパティズ カンパニー 銅配線および/またはフィルムを研磨および/または洗浄する方法およびそのための組成物
JP2007016265A (ja) * 2005-07-06 2007-01-25 Adeka Corp 電解銅メッキ用添加剤、該添加剤を含有する電解銅メッキ浴及び該メッキ浴を使用する電解銅メッキ方法
JP2008513503A (ja) * 2004-09-21 2008-05-01 バイオニューメリック・ファーマスーティカルズ・インコーポレイテッド 医薬用ジスルフィド塩
WO2011001847A1 (ja) * 2009-07-01 2011-01-06 Jx日鉱日石金属株式会社 Ulsi微細銅配線埋め込み用電気銅めっき液
JP4888913B2 (ja) * 2004-11-12 2012-02-29 エントン インコーポレイテッド マイクロ電子機器における銅電気沈積方法
US11946153B2 (en) 2019-02-01 2024-04-02 Ishihara Chemical Co., Ltd. Copper or copper alloy electroplating bath

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100688766B1 (ko) * 2004-12-08 2007-03-02 삼성전기주식회사 초임계 유체를 이용한 인쇄회로기판의 동도금방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2871173A (en) * 1958-02-04 1959-01-27 Seymour Mfg Company Method of making ductile copper platings
SU1650786A1 (ru) * 1987-05-19 1991-05-23 Волгоградский инженерно-строительный институт Электролит меднени
US5252196A (en) * 1991-12-05 1993-10-12 Shipley Company Inc. Copper electroplating solutions and processes
KR20000057470A (ko) * 1996-12-16 2000-09-15 포만 제프리 엘 집적 회로 칩 상의 전기 도금된 상호 접속 구조체
US6024857A (en) * 1997-10-08 2000-02-15 Novellus Systems, Inc. Electroplating additive for filling sub-micron features
US6113771A (en) * 1998-04-21 2000-09-05 Applied Materials, Inc. Electro deposition chemistry
JP2000269217A (ja) 1999-03-18 2000-09-29 Kobe Steel Ltd 銅配線膜の形成方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006510807A (ja) * 2002-12-16 2006-03-30 スリーエム イノベイティブ プロパティズ カンパニー 銅配線および/またはフィルムを研磨および/または洗浄する方法およびそのための組成物
WO2005038088A1 (ja) * 2003-10-20 2005-04-28 Kansai Technology Licensing Organization Co., Ltd. 無電解銅めっき液及びそれを用いた配線基板の製造方法
JP2008513503A (ja) * 2004-09-21 2008-05-01 バイオニューメリック・ファーマスーティカルズ・インコーポレイテッド 医薬用ジスルフィド塩
JP4888913B2 (ja) * 2004-11-12 2012-02-29 エントン インコーポレイテッド マイクロ電子機器における銅電気沈積方法
JP2007016265A (ja) * 2005-07-06 2007-01-25 Adeka Corp 電解銅メッキ用添加剤、該添加剤を含有する電解銅メッキ浴及び該メッキ浴を使用する電解銅メッキ方法
WO2011001847A1 (ja) * 2009-07-01 2011-01-06 Jx日鉱日石金属株式会社 Ulsi微細銅配線埋め込み用電気銅めっき液
US11946153B2 (en) 2019-02-01 2024-04-02 Ishihara Chemical Co., Ltd. Copper or copper alloy electroplating bath

Also Published As

Publication number Publication date
KR20090031539A (ko) 2009-03-26
KR100971267B1 (ko) 2010-07-20
EP1197586A3 (en) 2002-09-25
EP1197586A2 (en) 2002-04-17
KR20020029626A (ko) 2002-04-19

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