JP2002301362A - 反応装置及びそれを用いたヨウ化水素の製造方法 - Google Patents
反応装置及びそれを用いたヨウ化水素の製造方法Info
- Publication number
- JP2002301362A JP2002301362A JP2001105979A JP2001105979A JP2002301362A JP 2002301362 A JP2002301362 A JP 2002301362A JP 2001105979 A JP2001105979 A JP 2001105979A JP 2001105979 A JP2001105979 A JP 2001105979A JP 2002301362 A JP2002301362 A JP 2002301362A
- Authority
- JP
- Japan
- Prior art keywords
- solid
- valve
- reactor
- hydrogen iodide
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 title claims abstract description 56
- 229910000043 hydrogen iodide Inorganic materials 0.000 title claims abstract description 56
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 239000007787 solid Substances 0.000 claims abstract description 75
- 238000006243 chemical reaction Methods 0.000 claims abstract description 60
- 239000007789 gas Substances 0.000 claims abstract description 57
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims abstract description 44
- 229910052740 iodine Inorganic materials 0.000 claims abstract description 44
- 239000011630 iodine Substances 0.000 claims abstract description 44
- 239000007788 liquid Substances 0.000 claims abstract description 18
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims description 36
- 239000011261 inert gas Substances 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 9
- 150000004678 hydrides Chemical class 0.000 claims description 7
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims description 5
- 239000011343 solid material Substances 0.000 claims 1
- -1 naphthalene hydride Chemical compound 0.000 abstract description 3
- 239000007858 starting material Substances 0.000 abstract 1
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 49
- 125000006850 spacer group Chemical group 0.000 description 16
- 238000000034 method Methods 0.000 description 12
- 229920000915 polyvinyl chloride Polymers 0.000 description 9
- 239000004800 polyvinyl chloride Substances 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 239000001307 helium Substances 0.000 description 5
- 229910052734 helium Inorganic materials 0.000 description 5
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 238000009835 boiling Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002808 molecular sieve Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- 238000007872 degassing Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 101100116283 Arabidopsis thaliana DD11 gene Proteins 0.000 description 1
- 101001024616 Homo sapiens Neuroblastoma breakpoint family member 9 Proteins 0.000 description 1
- 102100037013 Neuroblastoma breakpoint family member 9 Human genes 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 241000838698 Togo Species 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012450 pharmaceutical intermediate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001105979A JP2002301362A (ja) | 2001-04-04 | 2001-04-04 | 反応装置及びそれを用いたヨウ化水素の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001105979A JP2002301362A (ja) | 2001-04-04 | 2001-04-04 | 反応装置及びそれを用いたヨウ化水素の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002301362A true JP2002301362A (ja) | 2002-10-15 |
| JP2002301362A5 JP2002301362A5 (enExample) | 2007-08-23 |
Family
ID=18958573
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001105979A Withdrawn JP2002301362A (ja) | 2001-04-04 | 2001-04-04 | 反応装置及びそれを用いたヨウ化水素の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002301362A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105664800A (zh) * | 2014-12-19 | 2016-06-15 | 程叶红 | 用于化工生产的反应釜 |
| CN114653307A (zh) * | 2022-03-09 | 2022-06-24 | 东营威联化学有限公司 | 一种连续重整注剂装置 |
-
2001
- 2001-04-04 JP JP2001105979A patent/JP2002301362A/ja not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105664800A (zh) * | 2014-12-19 | 2016-06-15 | 程叶红 | 用于化工生产的反应釜 |
| CN105664800B (zh) * | 2014-12-19 | 2018-03-02 | 盐城市春竹香料有限公司 | 用于化工生产的反应釜 |
| CN114653307A (zh) * | 2022-03-09 | 2022-06-24 | 东营威联化学有限公司 | 一种连续重整注剂装置 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20050830 |
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| RD05 | Notification of revocation of power of attorney |
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| A521 | Written amendment |
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| A621 | Written request for application examination |
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| A761 | Written withdrawal of application |
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