JP2002296806A5

JP2002296806A5 -

Info

Publication number: JP2002296806A5
Application number: JP2001101881A
Authority: JP
Filing date: 2001-03-30
Publication date: 2004-12-24
Anticipated expiration: 2021-03-30

Description

【発明の名称】露光装置及びその装置における基板位置決め方法、並びにこれにより製造されたフラットディスプレイパネル及びその製造方法 Patent application title: Exposure apparatus, substrate positioning method in the apparatus , flat display panel manufactured thereby, and manufacturing method thereof

【００１４】
また、本発明に係る露光装置における基板位置決め方法は、マスクホルダに保持されたパターン形成用のマスクよりも大きな露光対象基板を搬入して露光チャックに保持し、該露光チャックを該マスクに対して所定の軸によって所定方向にステップ移動することにより、該露光対象基板を該マスクに対して複数回に分けて所定位置に順次位置決めし、位置決めされた各所定位置でそれぞれ露光処理を行う露光装置において、前記露光チャックを所定の方向に移動して前記マスクに対する前記露光対象基板の位置合わせを行うテーブルを用いて、前記露光対象基板を前記露光チャックに保持する前に、該露光対象基板を前記軸に対して位置決めする基板位置決め方法であって、前記露光チャック上に搬入される前記露光対象基板の位置を検出し、検出信号を出力する工程と、前記検出信号に基づき前記軸に対する前記露光対象基板の位置ずれを求め、該位置ずれに基づいて前記露光チャックを前記軸に対して所定角度に設定するための補正量を算出する工程と、前記補正量に基づき前記露光チャックを前記軸に対して所定角度に位置決めするよう前記テーブルの駆動を制御する工程とを具えたものである。これによれば、露光対象基板が露光チャック上に搬入される前に、テーブルによって軸に対する露光対象基板の変位に応じた位置ずれを補正することができるので、露光対象基板を軸に対して位置ずれを生じることなく露光チャックに保持することができる。これによって、露光チャックに対する露光対象基板の面付け精度を向上でき、露光処理を高精度に行えるようになる。
更に、本発明に係るフラットパネルディスプレイの製造方法は、上記露光装置を用いてフラットパネルディスプレイを製造することを特徴とする。
更に、本発明に係るフラットパネルディスプレイの製造方法は、上記基板位置決め方法を用いてフラットパネルディスプレイを製造することを特徴とする。
また、本発明に係るフラットパネルディスプレイは、上記フラットパネルディスプレイの製造方法を用いて製造されることを特徴とする。 [0014]
Further, in the substrate positioning method in the exposure apparatus according to the present invention, the exposure target substrate larger than the mask for pattern formation held by the mask holder is carried in and held by the exposure chuck, and the exposure chuck is held against the mask. An exposure apparatus which performs step processing in a predetermined direction by a predetermined axis to sequentially position the substrate to be exposed with respect to the mask a plurality of times at predetermined positions, and performs exposure processing at each of the predetermined positions thus positioned. Using the table for moving the exposure chuck in a predetermined direction to align the exposure target substrate with the mask, and holding the exposure target substrate on the exposure chuck using the table; A substrate positioning method for positioning the substrate relative to the exposure chuck, the position of the exposure target substrate carried onto the exposure A step of outputting a detection signal, and a displacement of the exposure target substrate with respect to the axis based on the detection signal, and a correction amount for setting the exposure chuck to a predetermined angle with respect to the axis based on the displacement. And controlling the drive of the table to position the exposure chuck at a predetermined angle with respect to the axis based on the correction amount. According to this, since the positional deviation according to the displacement of the exposure target substrate with respect to the axis can be corrected by the table before the exposure target substrate is carried onto the exposure chuck, the position of the exposure target substrate with respect to the axis can be corrected. It can hold | maintain to an exposure chuck, without producing a shift | offset | difference. As a result, the imposition accuracy of the exposure target substrate on the exposure chuck can be improved, and the exposure processing can be performed with high accuracy.
Furthermore, a method of manufacturing a flat panel display according to the present invention is characterized in that a flat panel display is manufactured using the above-described exposure apparatus.
Furthermore, a method of manufacturing a flat panel display according to the present invention is characterized in that a flat panel display is manufactured using the above-mentioned substrate positioning method.
In addition, a flat panel display according to the present invention is characterized by being manufactured using the above-described method for manufacturing a flat panel display.

Claims

A substrate to be exposed which is larger than the mask for pattern formation held by the mask holder is held on the exposure chuck, and the exposure chuck is stepwise moved in the predetermined direction with respect to the mask by the predetermined axis. An exposure apparatus which divides the mask into a plurality of times with respect to the mask and sequentially positions them at predetermined positions and performs exposure processing at each of the predetermined positions.
Correction means for correcting the position of the mask before the mask is held by the mask holder;
Before the mask is held by the mask holder, alignment marks provided on the mask and the exposure chuck are detected at the predetermined positions, and detection signals corresponding to the positions of the marks are output. Detecting means,
Based on the detection signal, the displacement of the mask relative to the exposure chuck at each of the predetermined positions is determined, and the correction amount for setting the mask at a predetermined angle with respect to the axis at each of the predetermined positions based on the displacement. Operation means for calculating
An exposure apparatus comprising control means for controlling driving of the correction means to set the mask at a predetermined angle with respect to the axis at each predetermined position based on the correction amount.

The correction means is in contact with the mask at at least two places in the axial direction of the axis, and the first and second position correction mechanisms for correcting the position of the mask, the axial direction of the axis and the direction perpendicular to the axial direction 2. An exposure apparatus according to claim 1, further comprising: a third position correction mechanism for correcting the position of said mask in at least one place in a direction perpendicular to the surface.

A substrate to be exposed which is larger than the mask for pattern formation held by the mask holder is held on the exposure chuck, and the exposure chuck is stepwise moved in the predetermined direction with respect to the mask by the predetermined axis. An exposure apparatus which divides the mask into a plurality of times with respect to the mask and sequentially positions them at predetermined positions and performs exposure processing at each of the predetermined positions.
A correction unit configured to correct the position of the mask holder while the mask is held by the mask holder;
While the mask is held by the mask holder, alignment marks provided on the mask and the exposure chuck are detected at the respective predetermined positions, and detection signals corresponding to the positions of the marks are output. Detecting means,
Based on the detection signal, the displacement of the mask relative to the exposure chuck at each of the predetermined positions is determined, and the correction amount for setting the mask at a predetermined angle with respect to the axis at each of the predetermined positions based on the displacement. Operation means for calculating
An exposure apparatus comprising: control means for controlling driving of the correction means to set the mask holder at a predetermined angle with respect to the axis at each of the predetermined positions based on the correction amount.

The correction means includes a first position correction table for correcting the position of the mask holder in the axial direction of the axis, and a second position correction table for correcting the position of the mask holder in the perpendicular direction perpendicular to the axis. 4. The exposure apparatus according to claim 3, further comprising: a third position correction table for correcting the position of the mask holder in a direction around an intersection where the axial direction of the axis intersects the perpendicular direction.

The substrate to be exposed which is larger than the mask for pattern formation held by the mask holder is carried in and held by the exposure chuck, and the exposure chuck is stepwise moved in the predetermined direction with respect to the mask by a predetermined axis. An exposure apparatus which divides an exposure target substrate into a plurality of times with respect to the mask and sequentially positions them at predetermined positions, and performs exposure processing at each of the positioned predetermined positions.
A table for moving the exposure chuck in a predetermined direction to align the exposure target substrate with the mask;
Detection means for detecting the position of the exposure target substrate carried onto the exposure chuck and outputting a detection signal;
Arithmetic means for obtaining a positional deviation of the exposure target substrate with respect to the axis based on the detection signal, and calculating a correction amount for setting the exposure chuck at a predetermined angle with respect to the axis based on the positional deviation;
An exposure apparatus comprising: control means for controlling the drive of the table to position the exposure chuck at a predetermined angle with respect to the axis before the exposure chuck holds the substrate to be exposed based on the correction amount.

The table is moved in the axial direction of the axis to move the first table for aligning the exposure target substrate with respect to the mask, and is moved in the orthogonal direction perpendicular to the axis to move the exposure to the mask. A second table for aligning the target substrate, and a third table for moving around the intersection point where the axial direction of the axis intersects the perpendicular direction so as to align the exposure target substrate with respect to the mask The exposure apparatus according to claim 5, comprising:

The substrate to be exposed which is larger than the mask for pattern formation held by the mask holder is carried in and held by the exposure chuck, and the exposure chuck is stepwise moved in the predetermined direction with respect to the mask by a predetermined axis. In an exposure apparatus for sequentially positioning an exposure target substrate in a plurality of times with respect to the mask at predetermined positions and performing exposure processing at each of the positioned predetermined positions, the exposure chuck is moved in a predetermined direction to perform the mask A substrate positioning method for positioning a substrate to be exposed relative to the axis before holding the substrate to be exposed on the exposure chuck using a table for aligning the substrate to be exposed relative to the substrate;
Detecting a position of the exposure target substrate carried onto the exposure chuck, and outputting a detection signal;
Determining a positional deviation of the exposure target substrate with respect to the axis based on the detection signal, and calculating a correction amount for setting the exposure chuck at a predetermined angle with respect to the axis based on the positional deviation;
Controlling the drive of the table to position the exposure chuck at a predetermined angle with respect to the axis based on the correction amount.

A method of producing a flat panel display, comprising producing a flat panel display using the exposure apparatus according to any one of claims 1 to 6.

A method of manufacturing a flat panel display, comprising manufacturing a flat panel display using the substrate positioning method according to claim 7.

A flat panel display manufactured using the method of manufacturing a flat panel display according to claim 8.