JP2002292237A - Device to remove harmful matter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve the removing efficiency and to treat a large amount of toxic gas. SOLUTION: A porous plate 2 is disposed in a liquid tank 1. A gas inlet 8 is formed to a gas room in the lower side of the porous plate 2, while a gas-liquid mixing and stirring member 20 is erected in a water supply room 3 on the upper side of the porous plate so that the member 20 opposes to the communicating holes 2a of the plate 2 through a gap where the water flows.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a detoxification apparatus for detoxifying and recovering harmful gases discharged from a semiconductor manufacturing apparatus, a liquid crystal manufacturing apparatus and the like.

[0002]

BACKGROUND OF THE INVENTION Gas exhausted from a semiconductor manufacturing line and LCD production line, because it contains simultaneously harmful gas and fine powders such SiO2 and WO _3, be directly released into the atmosphere Can not. Therefore, conventionally, the harm is removed by the following method. (1) A so-called wet-type method, which passes through the opening of the punching plate and makes it fine, (2) Inertia collision between a water film formed on the surface of the filler and gas, and diffusion of fine particles (3) Filtering or jet scrubbing, in which water is pressurized to clean the supplied gas.

[0003]

However, the above (1)
In the method (2), the abatement efficiency is poor, and particularly in the case of chlorine, an alkali needs to be added. Also, when using such drugs,
It is not preferable because problems occur in safety and environmental properties. It is difficult to treat a large amount of harmful gas by the method (3). Therefore, this method cannot cope with the current situation in which harmful gases discharged from semiconductor manufacturing equipment, liquid crystal manufacturing equipment, and the like increase with the size of substrates.

The present invention has been made in view of the above circumstances, and aims to improve the abatement efficiency and enable a large amount of toxic gas to be treated.

[0005]

According to the present invention, there is provided a perforated plate for partitioning the inside of a liquid tank into upper and lower portions, and a lower plate side formed on the perforated plate,
A gas chamber having a gas inlet, a water supply chamber provided on the upper surface side of the perforated plate, and a gas-liquid that is erected on the perforated plate in the water supply chamber through a flowing water gap and faces a communication hole of the perforated plate. mixture·
A stirring member, and a supply / discharge means for introducing a harmful gas into the gas chamber from the gas introduction port and exhausting the gas from the exhaust port via the communication hole and the gas-liquid mixing / stirring member. .

[0006]

DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, an upper part of a liquid tank is
A perforated plate having a communication hole is provided, the inside of the liquid tank is partitioned into an upper gas chamber and a lower water supply chamber, and a gas-liquid mixing / stirring member facing the communication hole is provided on the perforated plate in the water supply chamber with a flowing water gap. It was erected through The harmful gas is introduced from the gas inlet into the gas chamber, and the harmful gas is introduced into the gas-liquid mixing / stirring member through the communication hole of the perforated plate. At this time, the harmful gas flows through the communication hole at high speed and flows into the member,
The water in the water supply chamber is sucked into the member through the inflow gap, and rises while being mixed and stirred with the gas. Therefore, the harmful gas is removed and becomes a clean gas and is discharged from the exhaust port, and the water falls into the water supply chamber.

[0007]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described with reference to FIGS. A perforated plate 2 having a communication hole 2a is provided in an upper part in the liquid tank 1, and a shower 4 is provided in a water supply chamber 3 on the upper surface side. The shower 4 is connected to the liquid tank 1 via a circulation path 6 having a pump 5.

A gas chamber 9 having a gas inlet 8 is provided on the lower surface side of the porous plate 2, and a storage chamber 10 is provided below the gas chamber 9. An overflow pipe 12 as a water supply / drainage mechanism and a water supply line 13 are connected to the storage room 10.

The gas inlet 8 is connected via an intake pipe 15 to an exhaust part of a semiconductor manufacturing apparatus. This intake pipe 15
Is provided with an inverter (not shown) for adjusting the amount of exhaust gas introduced from the device, and a cleaning device 16. The cleaning device 16 is for cleaning the deposits in the pipe wall of the intake pipe 15. The cleaning device 16 is connected to the water supply line 13 via a water supply pipe 17.

A gas-liquid mixing / stirring member 20 is provided on the upper surface of the porous plate 2. As shown in FIG. 3, the member 20 includes a cylindrical casing 21, a pair of split elliptical discs 23 and 24 provided below the cylindrical casing 21,
Projection group 2 projecting from inner surface 21a of cylindrical casing 21
5 is provided.

The chord side edges 23a of the elliptical discs 23, 24,
24a cross each other and have their arc side edges 23b, 2b
4b is in contact with the inner wall 21a of the cylindrical casing 21. The member 20 is fixed at a position slightly away from the upper surface of the perforated plate 2 by four pillars 27, and communicates with the communication hole 2a. The running water gap S between the member 20 and the perforated plate 2
Is determined as necessary. This gap S
Since water flows from the outside to the inside of the member, it is not always necessary to provide the water around the lower end of the member. The perforated plate 2 and the member 20 are one set (1
Is provided, but a plurality of stages may be provided in consideration of the fan F capacity and the processing amount.

The water supply chamber 3 communicates with the storage chamber 10 via an overflow pipe 29. A mist separator 30 is provided above the water supply chamber 3, and an exhaust fan 31 is provided downstream of the mist separator 30. The fan 31 is connected to an exhaust pipe of a production line via an exhaust port 32.

Next, the operation of this embodiment will be described.
When a start button (not shown) is turned on, the pump 5 is started, and the liquid (water) Wo in the storage chamber 10 of the liquid tank 1 starts to be circulated to the circulation path 6, and the flow rate in the circulation path 6 becomes substantially constant.

Next, when the fan 31 is started, the harmful gas G generated in the semiconductor manufacturing apparatus passes through the intake pipe 15 and enters the gas chamber 9 through the gas inlet 8. The harmful gas G entering the gas chamber 9 enters the gas-liquid mixing / stirring member 20 through the communication hole 2a. At this time, the gas G generates a suction force, so that the water Wo in the water supply chamber 3 enters the member 20 from the flowing water gap S and rises together with the gas.

The harmful gas G and water rising in the member 20
Since Wo is mixed and stirred while forming a spiral flow by the projection group 25 and the split elliptical disks 23 and 24, the water component in the harmful gas G and the powder in the gas are mixed and melted in the liquid Wo. Therefore, the liquid Wo becomes a mixed liquid (a mixed liquid of water and a harmful component) W1 and is discharged from the member 20 into the water supply chamber 3.

The clean gas G0, which has passed through the member 20 and from which detoxification and powder have been removed, passes through the mist separator 30 and is discharged from the exhaust port 32 to the outside of the machine.

The PH value in the storage chamber 10 is monitored by a PH meter 15, and when the measured value exceeds a set PH value, a solenoid valve (not shown) provided in the water supply line 13 is turned on, and the storage chamber 10 is turned on. Water is supplied inside. Then, the PH value in the storage chamber 10 decreases and reaches the set value. At this stage, the solenoid valve is turned off and the water supply is stopped.

When the liquid level in the storage chamber 10 rises above a design value due to the water supply from the water supply line 13, the water is automatically drained from the overflow pipe 12.

The storage chamber 10 is provided with a liquid level lower limit sensor 35. When the sensor 35 is operated, the solenoid valve of the water supply line 13 is turned on, and the water supply into the storage chamber 10 is started. Therefore, the amount of liquid in the storage chamber 10 always exceeds the minimum level amount, and the pump 5 does not run idle.

When a predetermined amount or more of the liquid Wo accumulates in the water supply chamber 3,
Excess liquid Wo is stored in the storage chamber 10 through the overflow pipe 29.
Drained to

In addition, the cleaning device 16 periodically supplies the water supply pipe 1.
Since the water flows from 7, the powder adhering to the pipe wall is washed out and flows down to the storage chamber 10, so even if the harmful gas contains fine powder, clogging of the pipe occurs. Never. Since the gas-liquid mixing / stirring member 20 traps the powder, the powder flowing into the exhaust port 32 is minimized.

A second embodiment of the present invention will be described with reference to FIG. 4. The difference between this embodiment and the first embodiment (FIGS. 1 to 3) is that the gas-liquid mixing / stirring member is an elliptical disk. Instead, a spiral guide vane 40 is used. Of course, the guide vane 40 functions similarly to the elliptical disk.

The embodiment of the present invention is not limited to the above. For example, in the above embodiment, the water supply and drainage is limited by the PH value, but if the amount of gas to be treated is known in advance, the liquid may be replaced by setting a timer.

The mechanism of water supply and drainage is not limited to the one disclosed here, but a solenoid valve or a waste liquid pipe via a drainage pump is provided at the lower part of the liquid tank 1 and controlled by a liquid level sensor. Liquid supply may be performed after drainage.

[0025]

According to the present invention, there are provided a perforated plate for partitioning a liquid tank up and down, a gas chamber formed on a lower surface side of the perforated plate and having a gas inlet, and a water supply provided on an upper surface side of the perforated plate. Chamber, standing on a perforated plate in the water supply chamber via a flowing water gap,
A gas-liquid mixing / stirring member facing the communication hole of the perforated plate,
Is provided, the harmful gas removal efficiency and the powder trapping efficiency can be improved, and a large amount of harmful gas can be treated.

[Brief description of the drawings]

FIG. 1 is a diagram showing a first embodiment of the present invention.

FIG. 2 is an enlarged view of a main part of FIG.

FIG. 3 is an enlarged perspective view of a gas-liquid mixing / stirring member.

FIG. 4 is a perspective view showing a second embodiment of the present invention and corresponds to FIG.

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4D002 AA00 AC10 BA02 BA16 CA03 DA35 EA05 GA02 GA03 GB09 GB20 4D020 BA23 BB03 CB32 CB40 CC03 DA02 DA03 DB08 DB15 4D032 AA22 BA06 BB16

Claims (5)

[Claims] A perforated plate partitioning the inside of a liquid tank up and down; a gas chamber formed on a lower surface side of the perforated plate and having a gas inlet; a water supply chamber provided on an upper surface side of the perforated plate; A gas-liquid mixing / stirring member which is erected on the perforated plate in the water supply chamber via a flowing water gap and faces the communication hole of the perforated plate, and a harmful gas is introduced into the gas chamber from the gas inlet, and the communication hole is And a supply / discharge means for exhausting air from an exhaust port via a gas-liquid mixing / stirring member. 2. The abatement apparatus according to claim 1, wherein a plurality of gas-liquid mixing / stirring members are provided. 3. The abatement apparatus according to claim 1, wherein a storage chamber is provided below the gas chamber, and the storage chamber is connected to a water supply chamber via a circulation path. 4. The abatement apparatus according to claim 3, wherein a PH meter is provided in the storage room. 5. The abatement apparatus according to claim 1, wherein a cleaning device is provided upstream of the gas inlet.