JP2002284853A - Wax-containing melt mixture, epoxy resin composition, and semiconductor device - Google Patents

Wax-containing melt mixture, epoxy resin composition, and semiconductor device

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Publication number
JP2002284853A
JP2002284853A JP2001084915A JP2001084915A JP2002284853A JP 2002284853 A JP2002284853 A JP 2002284853A JP 2001084915 A JP2001084915 A JP 2001084915A JP 2001084915 A JP2001084915 A JP 2001084915A JP 2002284853 A JP2002284853 A JP 2002284853A
Authority
JP
Japan
Prior art keywords
wax
epoxy resin
resin composition
semiconductor device
containing melt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001084915A
Other languages
Japanese (ja)
Inventor
Shigehisa Ueda
茂久 上田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP2001084915A priority Critical patent/JP2002284853A/en
Publication of JP2002284853A publication Critical patent/JP2002284853A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a semiconductor device-sealing epoxy resin composition excellent in adhesiveness and releasability. SOLUTION: The composition is characterized in that it comprises (A) an inorganic filler, (B) a wax-containing melt mixture, and (C) a hardening accelerator.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、離型性に優れた半
導体封止用エポキシ樹脂組成物及び密着性に優れた半導
体装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for semiconductor encapsulation having excellent releasability and a semiconductor device having excellent adhesion.

【0002】[0002]

【従来の技術】従来、ダイオ−ド、トランジスタ、集積
回路等の電子部品は、主にエポキシ樹脂組成物で封止さ
れている。この樹脂組成物中には、連続成形性や製品外
観を良くするためにワックスが配合されており、このワ
ックスは成形時に樹脂から滲みだして金型からの離型を
助ける作用をする。しかし、前記エポキシ樹脂組成物中
のワックスは、金型からの離型を助ける反面、半導体装
置内の半導体素子やリードフレームなどの部材との剥離
などの原因となり、腐食などの耐湿性悪化の問題を起こ
すことがある。この様な問題に対して、離型性と密着性
のバランスの良いワックスの選択や、硬化性の良いエポ
キシ樹脂、フェノール樹脂の選択や、硬化促進剤の増量
などが実用化されている。
2. Description of the Related Art Conventionally, electronic components such as diodes, transistors, and integrated circuits are mainly sealed with an epoxy resin composition. A wax is blended in the resin composition to improve the continuous moldability and the appearance of the product, and the wax oozes out of the resin at the time of molding to help release from the mold. However, while the wax in the epoxy resin composition aids in releasing from a mold, it causes peeling off of a semiconductor element or a lead frame or other members in a semiconductor device, thereby deteriorating moisture resistance such as corrosion. May cause. In response to such problems, selection of a wax having a good balance between releasability and adhesion, selection of an epoxy resin and a phenol resin having a good curability, and an increase in the amount of a curing accelerator have been put to practical use.

【0003】しかし、近年電子部品の表面実装化、小型
薄型化が進み、回路基板への実装時の耐半田クラック性
向上への要求が厳しく、更に鉛を含まない半田対応の要
求があり、更に厳しくなってきており、吸水性の低い特
性を有するエポキシ樹脂組成物が求められている。低吸
水化には、無機充填剤量を増やす方法或いはエポキシ樹
脂、フェノール樹脂の吸水率を低減する方法があるが、
前者は樹脂量減少により離型性と密着性のバランスが崩
れ、後者は官能基の減少を伴うため硬化性が低下し離型
性が悪化する。このため離型性と密着性の両立したエポ
キシ樹脂組成物が求められている。
However, in recent years, the surface mounting and miniaturization of electronic components have been advanced, and there has been a strict demand for improved solder crack resistance when mounted on a circuit board. Further, there has been a demand for a lead-free solder. It is becoming stricter, and there is a demand for an epoxy resin composition having low water absorbing properties. To reduce water absorption, there is a method of increasing the amount of inorganic filler or a method of reducing the water absorption of epoxy resin and phenol resin.
In the former, the balance between the releasability and the adhesiveness is lost due to the decrease in the amount of resin, and in the latter, the curability is reduced and the releasability is deteriorated due to the decrease in the number of functional groups. For this reason, there is a demand for an epoxy resin composition having both releasability and adhesion.

【0004】[0004]

【発明が解決しようとする課題】本発明は、この様な問
題に対して特定の特性を有するワックスの溶融混合物を
用いることにより、成形時の離型性に優れたエポキシ樹
脂組成物及び半導体装置内の部材との密着性が優れてい
る半導体装置を提供するところにある。
An object of the present invention is to provide an epoxy resin composition and a semiconductor device having excellent mold releasability at the time of molding by using a molten mixture of wax having specific properties for solving such problems. It is an object of the present invention to provide a semiconductor device having excellent adhesion to members inside the semiconductor device.

【0005】[0005]

【課題を解決するための手段】本発明は、[1]ワック
ス、エポキシ樹脂、フェノール樹脂及び硬化促進剤の混
合物の硬化物から相分離を起こすワックスであって、前
記ワックスとエポキシ樹脂及びフェノール樹脂からなる
溶融混合物であることを特徴とするワックス含有溶融混
合物、[2]ワックス含有溶融混合物中のワックス粒径
が、0.1〜10μmである第[1]項記載のワックス
含有溶融混合物、[3](A)無機充填剤、(B)ワッ
クス含有溶融混合物及び(C)硬化促進剤からなること
を特徴とする半導体封止用エポキシ樹脂組成物、[4]
無機充填剤が、平均粒径10〜30μmの溶融球状シリ
カで、全エポキシ樹脂組成物中に85〜93重量%含有
する第[3]項記載の半導体封止用エポキシ樹脂組成
物。[5]第[3]項又は[4]項記載のエポキシ樹脂
組成物を用いて半導体素子を封止してなることを特徴と
する半導体装置、である。
The present invention relates to [1] a wax which causes phase separation from a cured product of a mixture of a wax, an epoxy resin, a phenol resin and a curing accelerator, wherein the wax, the epoxy resin and the phenol resin are used. [2] The wax-containing melt mixture according to [1], wherein the wax-containing melt mixture has a wax particle size of 0.1 to 10 µm. 3] An epoxy resin composition for semiconductor encapsulation comprising (A) an inorganic filler, (B) a molten mixture containing a wax and (C) a curing accelerator, [4]
The epoxy resin composition for semiconductor encapsulation according to item [3], wherein the inorganic filler is a fused spherical silica having an average particle diameter of 10 to 30 µm and contained 85 to 93% by weight of the total epoxy resin composition. [5] A semiconductor device comprising a semiconductor element encapsulated with the epoxy resin composition according to the item [3] or [4].

【0006】[0006]

【発明の実施の形態】以下に本発明を詳細に説明する。
本発明に用いられるエポキシ樹脂は、1分子中にエポキ
シ基を2個以上有するモノマー、オリゴマー、ポリマー
全般を言い、例えばビフェニル型エポキシ樹脂、ビスフ
ェノール型エポキシ樹脂、フェノールノボラック型エポ
キシ樹脂、クレゾールノボラック型エポキシ樹脂、トリ
フェノールメタン型エポキシ化合物、ジシクロペンタジ
エン変性エポキシ樹脂などが挙げられ、単独でも混合し
ても差し支えない。本発明に用いられるフェノール樹脂
は、フェノールノボラック樹脂、フェノールアラルキル
(フェニレン及び/又はジフェニレン骨格を含む)樹
脂、テルペン変性フェノール樹脂、トリフェノールメタ
ン型樹脂などが挙げられ、これらは単独でも混合して用
いてもよい。これらのフェノール樹脂の配合量は、エポ
キシ樹脂のエポキシ基数とフェノール樹脂の水酸基数の
比が0.8〜1.2が好ましい。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail.
The epoxy resin used in the present invention refers to all monomers, oligomers and polymers having two or more epoxy groups in one molecule, such as biphenyl type epoxy resin, bisphenol type epoxy resin, phenol novolak type epoxy resin and cresol novolak type epoxy resin. Resins, triphenolmethane-type epoxy compounds, dicyclopentadiene-modified epoxy resins and the like can be mentioned, and they may be used alone or in combination. Examples of the phenol resin used in the present invention include a phenol novolak resin, a phenol aralkyl (including a phenylene and / or diphenylene skeleton) resin, a terpene-modified phenol resin, and a triphenolmethane-type resin. You may. The ratio of the number of epoxy groups in the epoxy resin to the number of hydroxyl groups in the phenol resin is preferably 0.8 to 1.2.

【0007】本発明に用いられる硬化促進剤は、エポキ
シ基とフェノール性水酸基との硬化反応を促進させるも
のであればよく、一般に封止材料に使用されているもの
を広く使用することができる。例えば1,8−ジアザビ
シクロ(5,4,0)ウンデセン−7、トリフェニルホ
スフィンや2−メチルイミダゾールなどが挙げられ、単
独でも混合しても差し支えない。本発明に用いられる無
機充填材は、溶融シリカ、結晶シリカ、アルミナ、窒化
珪素などが挙げられるが、これらの内では低熱膨張の溶
融シリカが好ましく、溶融シリカを高充填化するには、
粒度分布が広く、かつ球状のものが好ましい。溶融シリ
カの特性を損なわない範囲で結晶シリカ、アルミナ、窒
化珪素などを配合してもよい。配合量については、成形
性と信頼性のバランスから、全エポキシ樹脂組成物中に
85〜93重量%が好ましい。
The curing accelerator used in the present invention may be any one that promotes the curing reaction between the epoxy group and the phenolic hydroxyl group, and those generally used for a sealing material can be widely used. For example, 1,8-diazabicyclo (5,4,0) undecene-7, triphenylphosphine, 2-methylimidazole and the like can be mentioned, and they may be used alone or in combination. The inorganic filler used in the present invention, fused silica, crystalline silica, alumina, silicon nitride and the like, among them, low thermal expansion fused silica is preferable, in order to highly fill the fused silica,
Those having a wide particle size distribution and a spherical shape are preferred. Crystalline silica, alumina, silicon nitride, and the like may be blended as long as the properties of the fused silica are not impaired. The blending amount is preferably from 85 to 93% by weight in the total epoxy resin composition from the balance between moldability and reliability.

【0008】本発明に用いられるワックスは、ワックス
とエポキシ樹脂、フェノール樹脂及び硬化促進剤の混合
物の硬化物から相分離を起こす特性を有するものであれ
ば良く、更に成形時に表面に滲みだして離型を補助する
ものであって、かつ成形品表面の外観が悪くならないも
のが好ましい。相溶するとワックスが滲み出さないため
離型不良を起こし、又ワックスが全てブリードし樹脂中
に分散できないと油浮きやフローマークの外観不良とな
る。ワックス含有溶融混合物中のワックスの粒径は、
0.1〜10μmが好ましく、0.1μm未満だと成形
時に表面への滲み出しが少なく離型不良を起こし、10
μmを越えると滲み出しによりむらを生じ外観不良や半
導体素子などとの剥離の原因となり好ましくない。ワッ
クスとエポキシ樹脂、フェノール樹脂及び硬化促進剤の
混合物の硬化物からブリードせず相分離を起こすような
特性を有するワックスは、各エポキシ樹脂組成物に用い
るワックスとエポキシ樹脂、フェノール樹脂及び硬化促
進剤ごとに、以下の方法で評価して選択すればよい。選
択されるワックスとしては、天然又は合成ワックスのど
ちらでも良く、通常脂肪酸、ポリオレフィン、脂肪酸エ
ステル、脂肪酸アマイド、脂肪酸金属塩などが好まし
い。
The wax used in the present invention may be any wax having a property of causing phase separation from a cured product of a mixture of the wax and an epoxy resin, a phenol resin and a curing accelerator. Those which assist the mold and which do not deteriorate the appearance of the surface of the molded product are preferred. If compatible, the wax does not exude, causing poor mold release. If the wax bleeds completely and cannot be dispersed in the resin, oil floating and poor appearance of the flow mark occur. The particle size of the wax in the wax-containing molten mixture is:
0.1 to 10 μm is preferred.
If the thickness exceeds μm, unevenness due to bleeding occurs, causing poor appearance and peeling from semiconductor elements, etc., which is not preferable. The wax having the property of causing phase separation without bleeding from the cured product of the mixture of the wax and the epoxy resin, the phenol resin and the curing accelerator is used for each epoxy resin composition and the epoxy resin, the phenol resin and the curing accelerator. In each case, evaluation and selection may be made by the following method. As the wax selected, either a natural or synthetic wax may be used, and usually, fatty acids, polyolefins, fatty acid esters, fatty acid amides, fatty acid metal salts and the like are preferable.

【0009】ワックスの相分離の評価:エポキシ樹脂の
エポキシ基数とフェノール樹脂の水酸基数の比が1とな
る割合で配合し、エポキシ樹脂とフェノール樹脂の合計
100重量部に対してワックスを1重量部とし、この割
合のエポキシ樹脂、フェノール樹脂、ワックスを150
℃で溶融混合した後、硬化促進剤を配合して速やかに混
合し、150℃のオーブンで硬化させる。この硬化物を
光学顕微鏡で観察し、ワックスの分散相の有無で評価し
た。エポキシ樹脂やフェノール樹脂の分子構造とワック
スの分子構造によって相分離の挙動が異なるため、エポ
キシ樹脂、フェノール樹脂、ワックスのいずれかの分子
構造が異なれば、その組合せ毎に評価を実施する必要が
ある。。ワックスの分散粒径測定:エポキシ樹脂、硬化
剤、ワックスの混合物をプレパラート上に置き150℃
の熱板上で溶融させ、2分間放置後、光学顕微鏡により
ワックスの粒径を測定した。
Evaluation of phase separation of wax: The ratio of the number of epoxy groups in the epoxy resin to the number of hydroxyl groups in the phenol resin was 1 and 1 part by weight of the wax was added to 100 parts by weight of the total of the epoxy resin and the phenol resin. And the epoxy resin, phenol resin and wax in this ratio
After melt-mixing at a temperature of ° C, a curing accelerator is blended and mixed quickly, and cured in a 150 ° C oven. The cured product was observed with an optical microscope, and evaluated based on the presence or absence of a wax dispersed phase. Since the behavior of phase separation differs depending on the molecular structure of the epoxy resin or phenolic resin and the molecular structure of the wax, if the molecular structure of any of the epoxy resin, phenolic resin, or wax is different, it is necessary to evaluate each combination. . . Measurement of wax particle size: Place a mixture of epoxy resin, hardener, and wax on a slide at 150 ° C
Was melted on a hot plate and left for 2 minutes, and then the particle size of the wax was measured with an optical microscope.

【0010】ワックス含有溶融混合物は、ワックス、エ
ポキシ樹脂及びフェノール樹脂を溶融混合機を用いて分
散させることに得ることができる。溶融混合機にはホモ
ジナイザー、ナノマイザー(ナノマイザー製)、クレア
ミックス(エム・テクニック製)などがある。このワッ
クス含有溶融混合物を用いたエポキシ樹脂組成物は、成
形時の離型性に優れ、かつ得られた半導体装置内の半導
体素子やリードフレームとの密着性に優れており、半導
体装置の外観も問題なく、かつ無機充填剤を高充填化し
樹脂量が大幅に減少しても問題なく成形することができ
ると同時に耐半田クラック性に優れている。ワックス含
有溶融混合物を用いずに、エポキシ樹脂、フェノール樹
脂、硬化促進剤、無機充填剤及び相分離を起こすワック
スからなるエポキシ樹脂組成物を作成し成形した場合、
離型性と密着性のバランスが悪くなり無機充填剤を高充
填化すると離型不良や半導体装置内の半導体素子やリー
ドフレーム等の部材との剥離が発生し好ましくない。
[0010] The wax-containing melt mixture can be obtained by dispersing a wax, an epoxy resin and a phenol resin using a melt mixer. Examples of the melt mixer include a homogenizer, a Nanomizer (manufactured by Nanomizer), and a CLEARMIX (manufactured by M Technique). The epoxy resin composition using this wax-containing molten mixture has excellent mold release properties during molding, and excellent adhesion to a semiconductor element or a lead frame in the obtained semiconductor device, and also has an appearance of the semiconductor device. Even if there is no problem and the amount of resin is significantly reduced by highly filling the inorganic filler, molding can be performed without any problem, and at the same time, the solder crack resistance is excellent. Without using a wax-containing molten mixture, when an epoxy resin composition consisting of an epoxy resin, a phenolic resin, a curing accelerator, an inorganic filler and a wax that causes phase separation is formed and molded,
If the balance between the releasability and the adhesion is deteriorated and the inorganic filler is highly filled, unsatisfactory release and separation from members such as a semiconductor element and a lead frame in a semiconductor device occur, which is not preferable.

【0011】本発明のエポキシ樹脂組成物は、ワックス
含有溶融混合物、無機充填剤及び硬化促進剤以外にも必
要に応じて、臭素化エポキシ樹脂、三酸化アンチモン等
の難燃剤、カップリング剤、シリコーンオイル、ゴム等
の低応力成分が適宜配合可能である。本発明のエポキシ
樹脂組成物は、粉砕したワックス含有溶融混合物、無機
充填剤、硬化促進剤及び残余の成分を混合後、加熱ニー
ダーや熱ロールにより加熱混練し、続いて冷却、粉砕す
ることにより得ることができる。本発明のエポキシ樹脂
組成物を用いて半導体素子を封止し、半導体装置を製造
するには、トランスファーモールド、コンプレッション
モールド、インジェクションモールド等の従来からの成
形方法で硬化成形すればよい。
The epoxy resin composition of the present invention may contain, if necessary, a flame retardant such as a brominated epoxy resin, antimony trioxide, a coupling agent, a silicone, in addition to a wax-containing melt mixture, an inorganic filler and a curing accelerator. Low stress components such as oil and rubber can be appropriately compounded. The epoxy resin composition of the present invention is obtained by mixing the ground wax-containing molten mixture, the inorganic filler, the curing accelerator and the remaining components, kneading with a heating kneader or a hot roll, and subsequently cooling and grinding. be able to. In order to manufacture a semiconductor device by encapsulating a semiconductor element using the epoxy resin composition of the present invention, a conventional molding method such as transfer molding, compression molding, and injection molding may be used.

【0012】[0012]

【実施例】以下、本発明を実施例で具体的に説明する。
配合割合は重量部とする。 実施例1 ビフェニル型エポキシ樹脂[油化シェルエポキシ(株)・製、YX−4000H 、融点105℃、エポキシ当量195] 4.0重量部 フェノールアラルキル樹脂[三井化学(株)・製、XL−225、軟化点75℃ 、水酸基当量175] 3.6重量部 1,8−ジアザビシクロ(5,4,0)ウンデセン−7(以下,DBUという ) 0.1重量部 球状溶融シリカ(平均粒径25μm) 92.0重量部 カルナバワックス 0.3重量部 表1に示すエポキシ樹脂、フェノールアラルキル樹脂と
カルナバワックスを前記した相分離の評価方法に従い相
分離を観察した。その結果、この組み合わせでは相分離
が発生した。上記のエポキシ樹脂、フェノールアラルキ
ル樹脂、カルナバワックスの成分を110℃に加熱し、
溶融状態でクレアミックスを用いて15000rpmで
3分間混合、冷却・粉砕し(処理1という)、残余の球
状溶融シリカ、DBUとを混合した後、表面温度が90
℃と45℃の2本ロールを用いて30回混練し、得られ
た混練物シートを冷却後粉砕して樹脂組成物とした。得
られた樹脂組成物の特性を以下の方法で評価をした。評
価結果を表1に示す。
The present invention will be specifically described below with reference to examples.
The mixing ratio is by weight. Example 1 Biphenyl-type epoxy resin [YX-4000H, melting point 105 ° C, epoxy equivalent 195, manufactured by Yuka Shell Epoxy Co., Ltd.] 4.0 parts by weight Phenol aralkyl resin [XL-225 manufactured by Mitsui Chemicals, Inc.] Softening point 75 ° C, hydroxyl equivalent 175] 3.6 parts by weight 1,8-diazabicyclo (5,4,0) undecene-7 (hereinafter referred to as DBU) 0.1 part by weight Spherical fused silica (average particle size 25 μm) 92.0 parts by weight Carnauba wax 0.3 parts by weight The phase separation of the epoxy resin, phenol aralkyl resin and carnauba wax shown in Table 1 was observed in accordance with the above-described evaluation method of phase separation. As a result, phase separation occurred in this combination. Heat the above epoxy resin, phenol aralkyl resin, carnauba wax components to 110 ° C.,
In the molten state, the mixture was mixed at 15000 rpm for 3 minutes using a clear mix, cooled and pulverized (referred to as treatment 1), and the remaining spherical fused silica and DBU were mixed.
The mixture was kneaded 30 times using two rolls at a temperature of 45 ° C. and a temperature of 45 ° C. The resulting kneaded material sheet was cooled and pulverized to obtain a resin composition. The properties of the obtained resin composition were evaluated by the following methods. Table 1 shows the evaluation results.

【0013】評価方法 ワックスの相分離の評価及びワックスの分散粒径測定は
前記した方法による。得られた樹脂組成物をタブレット
化し、低圧トランスファー成形機にて175℃、6.9
MPa、120秒の条件で、耐半田クラック性試験用の
6mm×6mmのテスト用素子を80pQFPに封止し
た。このときの成形不具合の有無で成形性を判断した。
封止したテスト用素子について、下記の耐半田クラック
試験、外観検査を行った。 耐半田クラック性試験:封止したテスト用素子(パッケ
ージ10個)を85℃、相対湿度85%の雰囲気に、7
2時間放置後、半田(260℃)に浸漬しパッケージ内
のチップ上の剥離の有無を観察した。
Evaluation Method Evaluation of the phase separation of the wax and measurement of the dispersed particle diameter of the wax are performed by the above-described methods. The obtained resin composition was tableted, and was then 175 ° C., 6.9 with a low-pressure transfer molding machine.
Under the conditions of MPa and 120 seconds, a 6 mm × 6 mm test element for solder crack resistance test was sealed in 80 pQFP. Moldability was determined based on the presence or absence of molding defects at this time.
The sealed test element was subjected to the following solder crack resistance test and appearance inspection. Solder crack resistance test: Sealed test elements (10 packages) were placed in an atmosphere of 85 ° C. and 85% relative humidity for 7 days.
After leaving it for 2 hours, it was immersed in solder (260 ° C.) and the presence or absence of peeling on the chip in the package was observed.

【0014】実施例2、3、比較例1〜3 表1に従って配合し、実施例1と同様にして相分離の観
察を行い、樹脂組成物を得、同様に評価した。なお比較
例1のワックス成分はポリエチレン粉末、比較例3のワ
ックス成分はステアリン酸である。比較例2では、通常
の方法で樹脂組成物を製造した。 処理2:エポキシ樹脂、フェノールアラルキル樹脂、ワ
ックスの成分を110℃に加熱し、溶融状態でクレアミ
ックスを用いて10000rpmで1分間混合し、冷却
・粉砕した。処理2のものを、表の残余の成分と配合
し、実施例1と同様にして樹脂組成物とした。これらの
評価結果を表1に示す。
Examples 2 and 3, Comparative Examples 1 to 3 The components were blended according to Table 1, and the phase separation was observed in the same manner as in Example 1 to obtain a resin composition, which was similarly evaluated. The wax component of Comparative Example 1 was polyethylene powder, and the wax component of Comparative Example 3 was stearic acid. In Comparative Example 2, a resin composition was manufactured by an ordinary method. Treatment 2: The components of the epoxy resin, the phenol aralkyl resin and the wax were heated to 110 ° C., mixed in a molten state with Clearmix at 10,000 rpm for 1 minute, cooled and pulverized. Treatment 2 was blended with the remaining components in the table to give a resin composition in the same manner as in Example 1. Table 1 shows the evaluation results.

【0015】[0015]

【表1】 [Table 1]

【0016】[0016]

【発明の効果】本発明に従うと、成形時の離型性に優れ
たエポキシ樹脂組成物及び半導体装置内の部材との密着
性が優れている半導体装置を得ることができる。
According to the present invention, it is possible to obtain an epoxy resin composition having excellent releasability at the time of molding and a semiconductor device having excellent adhesion to members in the semiconductor device.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01L 23/29 H01L 23/30 R 23/31 Fターム(参考) 4J002 AE033 AE043 CC02X CD04W CD05W CD06W DE146 DF016 DJ016 EQ007 EU117 EU137 EW007 EW137 GQ05 4J036 AA02 AC01 AC02 AC05 AC08 AD01 AD08 DC40 DC46 DD07 FA01 FA02 FA04 FA05 FB07 FB20 JA07 4M109 EA02 EB03 EB04 EB09 EB12 EC09 EC20 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H01L 23/29 H01L 23/30 R 23/31 F-term (Reference) 4J002 AE033 AE043 CC02X CD04W CD05W CD06W DE146 DF016 DJ016 EQ007 EU117 EU137 EW007 EW137 GQ05 4J036 AA02 AC01 AC02 AC05 AC08 AD01 AD08 DC40 DC46 DD07 FA01 FA02 FA04 FA05 FB07 FB20 JA07 4M109 EA02 EB03 EB04 EB09 EB12 EC09 EC20

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 ワックス、エポキシ樹脂、フェノール樹
脂及び硬化促進剤の混合物の硬化物から相分離を起こす
ワックスであって、前記ワックスとエポキシ樹脂及びフ
ェノール樹脂からなる溶融混合物であることを特徴とす
るワックス含有溶融混合物。
1. A wax which causes a phase separation from a cured product of a mixture of a wax, an epoxy resin, a phenol resin and a curing accelerator, wherein the wax is a molten mixture comprising the wax, an epoxy resin and a phenol resin. Wax-containing melt mixture.
【請求項2】 ワックス含有溶融混合物中のワックス粒
径が、0.1〜10μmである請求項1記載のワックス
含有溶融混合物。
2. The wax-containing melt mixture according to claim 1, wherein the wax particle diameter in the wax-containing melt mixture is 0.1 to 10 μm.
【請求項3】 (A)無機充填剤、(B)ワックス含有
溶融混合物及び(C)硬化促進剤からなることを特徴と
する半導体封止用エポキシ樹脂組成物。
3. An epoxy resin composition for semiconductor encapsulation comprising (A) an inorganic filler, (B) a wax-containing melt mixture, and (C) a curing accelerator.
【請求項4】 無機充填剤が、平均粒径10〜30μm
の溶融球状シリカで、全エポキシ樹脂組成物中に85〜
93重量%含有する請求項3記載の半導体封止用エポキ
シ樹脂組成物。
4. An inorganic filler having an average particle size of 10 to 30 μm.
Of fused spherical silica in the total epoxy resin composition
The epoxy resin composition for semiconductor encapsulation according to claim 3, which contains 93% by weight.
【請求項5】 請求項3又は4記載のエポキシ樹脂組成
物を用いて半導体素子を封止してなることを特徴とする
半導体装置。
5. A semiconductor device comprising a semiconductor element encapsulated with the epoxy resin composition according to claim 3 or 4.
JP2001084915A 2001-03-23 2001-03-23 Wax-containing melt mixture, epoxy resin composition, and semiconductor device Pending JP2002284853A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
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Publications (1)

Publication Number Publication Date
JP2002284853A true JP2002284853A (en) 2002-10-03

Family

ID=18940516

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Country Status (1)

Country Link
JP (1) JP2002284853A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004065486A1 (en) * 2003-01-17 2004-08-05 Sumitomo Bakelite Co., Ltd. Epoxy resin composition and semiconductor device made with the same
JP2004300239A (en) * 2003-03-31 2004-10-28 Sumitomo Bakelite Co Ltd Resin-sealed semiconductor device and epoxy resin composition for sealing semiconductor
JP2005314565A (en) * 2004-04-28 2005-11-10 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device

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JPS63277225A (en) * 1987-05-08 1988-11-15 Fujitsu Ltd Method for kneading resin composition
JPH05152465A (en) * 1991-12-02 1993-06-18 Hitachi Ltd Resin composition for sealing semiconductor
JPH0834858A (en) * 1994-07-22 1996-02-06 Shin Etsu Chem Co Ltd Production of epoxy resin composition, and epoxy resin composition for sealing semiconductor
JPH0940746A (en) * 1995-08-01 1997-02-10 Shin Etsu Chem Co Ltd Epoxy resin composition for restoring mold release characteristics
JP2000281750A (en) * 1999-03-31 2000-10-10 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59191715A (en) * 1983-04-15 1984-10-30 Matsushita Electric Works Ltd Production of epoxy resin composition
JPS63277225A (en) * 1987-05-08 1988-11-15 Fujitsu Ltd Method for kneading resin composition
JPH05152465A (en) * 1991-12-02 1993-06-18 Hitachi Ltd Resin composition for sealing semiconductor
JPH0834858A (en) * 1994-07-22 1996-02-06 Shin Etsu Chem Co Ltd Production of epoxy resin composition, and epoxy resin composition for sealing semiconductor
JPH0940746A (en) * 1995-08-01 1997-02-10 Shin Etsu Chem Co Ltd Epoxy resin composition for restoring mold release characteristics
JP2000281750A (en) * 1999-03-31 2000-10-10 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004065486A1 (en) * 2003-01-17 2004-08-05 Sumitomo Bakelite Co., Ltd. Epoxy resin composition and semiconductor device made with the same
JPWO2004065486A1 (en) * 2003-01-17 2006-05-18 住友ベークライト株式会社 Epoxy resin composition and semiconductor device using the same
US7157313B2 (en) 2003-01-17 2007-01-02 Sumitomo Bakelite Co., Ltd. Epoxy resin composition and semiconductor device using thereof
KR101004880B1 (en) 2003-01-17 2010-12-28 스미토모 베이클라이트 가부시키가이샤 Epoxy resin composition and semiconductor device made with the same
JP4654912B2 (en) * 2003-01-17 2011-03-23 住友ベークライト株式会社 Epoxy resin composition and semiconductor device using the same
JP2004300239A (en) * 2003-03-31 2004-10-28 Sumitomo Bakelite Co Ltd Resin-sealed semiconductor device and epoxy resin composition for sealing semiconductor
JP2005314565A (en) * 2004-04-28 2005-11-10 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP4586405B2 (en) * 2004-04-28 2010-11-24 住友ベークライト株式会社 Epoxy resin composition and semiconductor device

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