JP2002280628A - Terminal structure for cryogenic equipment - Google Patents
Terminal structure for cryogenic equipmentInfo
- Publication number
- JP2002280628A JP2002280628A JP2001076951A JP2001076951A JP2002280628A JP 2002280628 A JP2002280628 A JP 2002280628A JP 2001076951 A JP2001076951 A JP 2001076951A JP 2001076951 A JP2001076951 A JP 2001076951A JP 2002280628 A JP2002280628 A JP 2002280628A
- Authority
- JP
- Japan
- Prior art keywords
- bushing
- cryogenic
- space
- conductor
- terminal structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、極低温機器の導体
を極低温から常温に引き出す端末構造に関するものであ
る。特に、絶縁性能とにすぐれた端末構造に関するもの
である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a terminal structure for drawing a conductor of a cryogenic device from a cryogenic temperature to a normal temperature. In particular, the present invention relates to a terminal structure having excellent insulation performance.
【０００２】[0002]
【従来の技術】図5は従来の極低温機器用端末構造を示
す概略図である。2. Description of the Related Art FIG. 5 is a schematic view showing a conventional terminal structure for cryogenic equipment.
【０００３】この端末構造は、極低温機器100（図示せ
ず）の端末と、その端末が収納される冷媒槽10と、極低
温機器の導体から常温部へ電気的導通をとるブッシング
30と、冷媒槽10の外側を覆う真空槽20と、真空槽20の上
部に突設される碍子40とを具える。[0003] This terminal structure comprises a terminal of a cryogenic device 100 (not shown), a refrigerant tank 10 in which the terminal is stored, and a bushing for establishing electrical continuity from a conductor of the cryogenic device to a room temperature portion.
30, a vacuum tank 20 covering the outside of the refrigerant tank 10, and an insulator 40 protruding above the vacuum tank 20.
【０００４】極低温機器100の超電導導体につながる接
続導体80はほぼ直角方向にブッシング30が接続されてい
る。ブッシング30は、例えばステンレス管の中心に銅な
どの導体を挿入し、ステンレス管の外周にエチレンプロ
ピレンゴムなどの固体絶縁を被覆したものである。ブッ
シングの一端は冷媒中に浸漬され、他端は真空槽20と碍
子40との接合面を貫通して碍子40内に収納されている。
碍子40の内部には絶縁油やSF6などの絶縁流体60が充填
されており、絶縁油を充填した場合は、上部に空気溜り
を形成する場合もある。ステンレス管の内部には極低温
から常温につながる空間が存在し、この空間が前記空気
溜りに連通している場合としていない場合がある。A bushing 30 is connected to a connection conductor 80 connected to the superconducting conductor of the cryogenic device 100 in a direction substantially perpendicular to the connection conductor 80. The bushing 30 is, for example, a conductor in which a conductor such as copper is inserted into the center of a stainless steel tube and the outer periphery of the stainless steel tube is coated with a solid insulation such as ethylene propylene rubber. One end of the bushing is immersed in the refrigerant, and the other end is housed in the insulator 40 through the joint surface between the vacuum chamber 20 and the insulator 40.
Inside the insulator 40 is filled with dielectric fluid 60, such as an insulating oil or SF 6, when filled with insulating oil, it may form an air reservoir at the top. There is a space inside the stainless steel tube from extremely low temperature to normal temperature, and this space may or may not communicate with the air reservoir.
【０００５】冷媒槽内には供給管70より補給される液体
窒素11が蓄えられると共に、上部は窒素ガス溜まり部13
となっている。この窒素ガスの排出はガス排出口73から
行える。[0005] Liquid nitrogen 11 replenished from a supply pipe 70 is stored in the refrigerant tank, and a nitrogen gas storage 13
It has become. This nitrogen gas can be discharged from the gas discharge port 73.
【０００６】従って、このような端末構造では、極低温
機器100から碍子40に至る導通部はケーブル側から順に
液体窒素11に浸漬された極低温部、窒素ガス溜まり部1
3、碍子内の常温部を通ることになる。Accordingly, in such a terminal structure, the conduction portion from the cryogenic device 100 to the insulator 40 is arranged such that the cryogenic portion immersed in the liquid nitrogen 11 and the nitrogen gas reservoir 1 in this order from the cable side.
3. Pass through the room temperature part of the insulator.
【０００７】[0007]
【発明が解決しようとする課題】しかし、上記の端末構
造では次のような問題があった。However, the above terminal structure has the following problems.
【０００８】ブッシング内部の空間と碍子内の空気溜
りが連通している場合、絶縁性能の低下を招くことがあ
る。ブッシング内に極低温から常温につながる空間が存
在するため、その内部に空気が存在すると、極低温温度
により空気の液化・凍結が発生し、容積が大幅に減じ
る。その結果、碍子内が負圧になり絶縁性能の低下につ
ながる。When the space inside the bushing communicates with the air pocket inside the insulator, the insulation performance may be deteriorated. Since there is a space in the bushing from a very low temperature to a normal temperature, if air exists inside the bushing, liquefaction and freezing of the air occur due to the very low temperature, and the volume is greatly reduced. As a result, the inside of the insulator becomes negative pressure, leading to a decrease in insulation performance.
【０００９】ブッシングの空間内ガスの体積変化に追従
できるようにガス供給装置を接続することも考えられる
が、ガス注入口が高電圧部となるため、課電停止・配管
着脱が必要となり、現実的でない。It is conceivable to connect a gas supply device so as to be able to follow the change in the volume of gas in the space of the bushing. Not a target.
【００１０】ブッシングの空間にガス供給は行わず、予
めブッシング内の空間および碍子内の空気溜りを高圧力
にしておき、冷却による圧力低下によっても絶縁性能に
影響しないようにすることも考えられる。しかし、絶縁
性能に影響しない程度の圧力を冷却後に確保しようとす
れば冷却前の圧力が過大となり、現実的でない。[0010] It is conceivable that the gas is not supplied to the space of the bushing, but the space in the bushing and the air pool in the insulator are previously set to a high pressure so that the insulation performance is not affected even by a pressure decrease due to cooling. However, if it is attempted to secure a pressure that does not affect the insulation performance after cooling, the pressure before cooling becomes excessive, which is not practical.
【００１１】ブッシング内の空間と碍子内の空気溜り
とが連通していない場合、ブッシング内の過大な圧力変
化に伴って機械的破損を招くことがある。ブッシング内
の空間と碍子内の空気溜りとが連通していない構成で
は、一般にブッシング内部の空間は封止されており、上
述の負圧に伴う絶縁性能の低下は問題にならない。しか
し、ブッシング内部の空間の封止が完全でないことも予
想され、その場合は僅かながらも空間と空気溜りとの連
通が生じる可能性がある。長期的に見れば、ブッシング
の空間内のガスが液化して負圧になり、その状態で徐々
に空気溜りの空気がブッシング内部に吸い込まれること
が考えられる。そして、空気溜りからブッシング内の空
間に吸い込まれた空気が液化してしまうと、常温に復帰
する際に非常に大きな圧力となり、ブッシングを機械的
に破損してしまう原因となる。When the space in the bushing is not communicated with the air reservoir in the insulator, mechanical damage may be caused by an excessive change in pressure in the bushing. In a configuration in which the space in the bushing and the air reservoir in the insulator do not communicate with each other, the space in the bushing is generally sealed, and the above-described decrease in insulation performance due to the negative pressure does not pose a problem. However, it is also anticipated that the space inside the bushing may not be completely sealed, in which case communication between the space and the air reservoir may occur to a small extent. In the long term, it is conceivable that the gas in the space of the bushing is liquefied and becomes a negative pressure, and in this state, the air in the air reservoir is gradually sucked into the bushing. Then, if the air sucked into the space inside the bushing from the air reservoir is liquefied, a very large pressure is applied when the air returns to room temperature, which causes the bushing to be mechanically damaged.
【００１２】従って、本発明の主目的は、ブッシングな
どの導体部内部に液化物が発生することを防止し、それ
に伴う絶縁性能の低下および導体部内部の過大な圧力変
化を抑制できる極低温機器の端末構造を提供することに
ある。Accordingly, it is a primary object of the present invention to provide a cryogenic device capable of preventing generation of liquefied material inside a conductor portion such as a bushing, thereby suppressing a decrease in insulation performance and an excessive pressure change inside the conductor portion. To provide a terminal structure.
【００１３】[0013]
【課題を解決するための手段】本発明は、導体部内部の
空間に充填する気体を限定したり、その空間を真空にす
ることで上記の目的を達成する。According to the present invention, the above object is achieved by limiting the gas to be filled in the space inside the conductor portion or by evacuating the space.
【００１４】すなわち、本発明は極低温部から常温部に
引き出される導体部を有する極低温機器の端末構造であ
って、前記導体部は極低温部から常温部につながる空間
を有し、この空間に、極低温で液化しない気体が充填さ
れていることを特徴とする。That is, the present invention relates to a terminal structure of a cryogenic device having a conductor portion drawn from a cryogenic portion to a normal temperature portion, wherein the conductor portion has a space extending from the cryogenic portion to the normal temperature portion. And a gas which is not liquefied at an extremely low temperature.
【００１５】この場合に用いる気体の具体例としてはヘ
リウムが挙げられる。Helium is a specific example of the gas used in this case.
【００１６】また、本発明は、極低温部から常温部に引
き出される導体部を有する極低温機器の端末構造であっ
て、前記導体部は極低温部から常温部につながる空間を
有し、この空間が真空に保持されていることも特徴とす
る。Further, the present invention is a terminal structure of a cryogenic device having a conductor portion drawn out from a cryogenic portion to a room temperature portion, wherein the conductor portion has a space extending from the cryogenic portion to the room temperature portion. It is also characterized in that the space is kept in a vacuum.
【００１７】極低温部から常温部につながる空間内を極
低温で液化しない気体で充填するか真空とすることで、
極低温温度によっても空間内に液化物が発生することを
抑制し、導体部内の減圧に伴う絶縁性能の低下や導体部
内の過大な圧力変化を防止することができる。By filling the space connected from the cryogenic portion to the room temperature portion with a gas that does not liquefy at a cryogenic temperature or by applying a vacuum,
It is possible to suppress the generation of liquefied matter in the space even at a cryogenic temperature, and to prevent the insulation performance from deteriorating due to the pressure reduction in the conductor and the excessive pressure change in the conductor.
【００１８】本発明端末構造のより具体的な各部の構成
を説明する。A more specific configuration of each part of the terminal structure of the present invention will be described.
【００１９】導体部は、中空パイプを具えるものや、中
空パイプの内部に銅などの良導性の電流リードを挿入し
たもののいずれでも構わない。導体部の内部に極低温部
から常温部につながる空間が形成されたものとする。通
常、中空パイプの外周にゴム、エポキシ樹脂などの固体
絶縁が施される。絶縁電流リードの形態は、棒、パイ
プ、撚り線などが挙げられる。The conductor may be either one having a hollow pipe or one having a good current lead made of copper or the like inserted inside the hollow pipe. It is assumed that a space is formed inside the conductor from the extremely low temperature part to the normal temperature part. Usually, solid insulation such as rubber or epoxy resin is applied to the outer periphery of the hollow pipe. Examples of the form of the insulated current lead include a rod, a pipe, and a stranded wire.
【００２０】極低温部は、液体窒素などの冷媒により極
低温状態に保持される構造であれば特に限定されない。
代表的な構成としては、冷媒を貯える冷媒槽と、その外
周を真空に保持する真空槽を具えるものが挙げられる。The cryogenic portion is not particularly limited as long as it has a structure that is kept at a cryogenic state by a refrigerant such as liquid nitrogen.
A typical configuration includes a refrigerant tank that stores a refrigerant and a vacuum tank that holds the outer periphery of the refrigerant tank in a vacuum.
【００２１】常温部は、碍子やエポキシ套管などの絶縁
外被のほぼ中心に導体部が貫通され、絶縁外被と導体部
との間の空間に絶縁流体が充填された構成が挙げられ
る。絶縁流体には、絶縁油などの液体やSF6などのガス
が利用できる。絶縁油を用いた場合、一般に絶縁外被内
に絶縁油溜まりと、その上部に形成される空隙部とを具
える。The room temperature portion has a configuration in which a conductor is penetrated substantially at the center of an insulating jacket such as an insulator or an epoxy sleeve, and a space between the insulating jacket and the conductor is filled with an insulating fluid. The dielectric fluid, available gas, such as liquid or SF 6, such as an insulating oil. When the insulating oil is used, the insulating oil generally includes an insulating oil reservoir inside the insulating jacket and a gap formed above the insulating oil reservoir.
【００２２】この空隙部と導体部内の空間とが連通して
いる場合、導体部内の空間および前記空隙部を極低温で
液化しない気体で充填する。それにより、導体部内に極
低温で液化物が発生することを防止し、導体部内および
空隙部内が負圧となることに伴って絶縁性能が低下する
ことを防止する。When the space and the space in the conductor are in communication with each other, the space in the conductor and the space are filled with a gas that is not liquefied at a very low temperature. This prevents a liquefied substance from being generated at an extremely low temperature in the conductor, and prevents the insulation performance from being reduced due to negative pressure in the conductor and the gap.
【００２３】絶縁油溜まりの上部に形成される空隙部と
導体部内の空間とが連通しない場合、導体部内の空間を
真空にするか極低温で液化しない気体で充填すれば良
い。この構成は、導体部内の空間を溶接などにより密封
することで実現すれば良い。それにより、導体部内に極
低温で液化物が発生することを防止し、ブッシング内の
過大な圧力変化を抑制して、ブッシングの機械的破損を
防止する。When the gap formed in the upper part of the insulating oil reservoir does not communicate with the space in the conductor, the space in the conductor may be filled with a vacuum or a gas which does not liquefy at cryogenic temperature. This configuration may be realized by sealing the space in the conductor portion by welding or the like. This prevents liquefied matter from being generated at extremely low temperatures in the conductor, suppresses an excessive change in pressure in the bushing, and prevents mechanical damage to the bushing.
【００２４】本発明端末構造を適用する極低温機器とし
ては、超電導ケーブル、超電導磁気エネルギー貯蔵（SM
ES：Superconducting magnetic energy storage sy
stem）、超電導限流器などが挙げられる。特に、本発明
端末構造は、長距離の冷却を行うためにクローズドシス
テムによる循環冷却が必要とされる超電導ケーブルの端
末構造に最適である。The cryogenic equipment to which the terminal structure of the present invention is applied includes a superconducting cable and a superconducting magnetic energy storage (SM).
ES: Superconducting magnetic energy storage sy
stem) and a superconducting current limiter. In particular, the terminal structure of the present invention is most suitable for a terminal structure of a superconducting cable that requires circulating cooling by a closed system in order to perform long-distance cooling.
【００２５】[0025]
【発明の実施の形態】以下、本発明の実施の形態を説明
する。 （実施例１）ここでは、超電導ケーブルの端末構造を例
として説明する。図１は本発明端末構造の概略図であ
る。この端末構造は、冷媒槽10内の液体窒素11に浸漬さ
れた極低温部と、碍子40に収納された常温部と、極低温
部と常温部の間に形成された真空断熱部とを具える。Embodiments of the present invention will be described below. (Embodiment 1) Here, a terminal structure of a superconducting cable will be described as an example. FIG. 1 is a schematic diagram of the terminal structure of the present invention. This terminal structure includes a cryogenic part immersed in liquid nitrogen 11 in a refrigerant tank 10, a normal temperature part housed in an insulator 40, and a vacuum heat insulating part formed between the cryogenic part and the normal temperature part. I can.
【００２６】極低温部を構成する冷媒槽10には、図示し
ない超電導ケーブルの導体につながる接続導体が真空槽
20を経て導入される。冷媒槽10は、内部に液体窒素11が
密閉される円筒管である。前記の接続導体は冷媒槽内で
ブッシング30（導体部）に接続される。A connecting conductor connected to a conductor of a superconducting cable (not shown) is provided in
Introduced after 20. The refrigerant tank 10 is a cylindrical tube in which the liquid nitrogen 11 is sealed. The connection conductor is connected to the bushing 30 (conductor portion) in the coolant tank.
【００２７】このような冷媒槽10は、真空槽20内に収納
されている。真空槽20はその内部を所定の真空状態に維
持できるよう構成され、図示しない真空槽20の下端部は
超電導ケーブルの断熱管（図示せず）と接続されてい
る。真空槽と断熱管との接続個所および断熱管の内部も
真空に保持される。The refrigerant tank 10 is housed in a vacuum tank 20. The vacuum chamber 20 is configured so that the inside thereof can be maintained in a predetermined vacuum state, and the lower end of the vacuum chamber 20 (not shown) is connected to a heat insulating tube (not shown) of a superconducting cable. The connection point between the vacuum tank and the heat insulating pipe and the inside of the heat insulating pipe are also kept in vacuum.
【００２８】一方、真空槽20の上部には碍子40が固定さ
れて常温部を構成している。碍子40は内部に後述するブ
ッシング30が収納されると共に、碍子内とブッシング30
との間に絶縁油が充填された絶縁油溜まり41と、その上
部に形成される空隙部42と具えている。On the other hand, an insulator 40 is fixed on the upper part of the vacuum chamber 20 to form a normal temperature part. The insulator 40 accommodates a bushing 30 to be described later inside, and the inside of the insulator and the bushing 30.
And an insulating oil reservoir 41 filled with insulating oil, and a void portion 42 formed in an upper portion thereof.
【００２９】ブッシング30は、ステンレスパイプ31の外
周に繊維強化プラスチック（FRP）と箔電極とを積層し
た固体絶縁層32を具える両端部がテーパー状の棒状体で
ある。ブッシングの一端は液体窒素11中に浸漬され、他
端は碍子40内に導入されている。FRPと箔電極との積層
はいわゆるコンデンサー方式の電界緩和手段である。ス
テンレスパイプ31の内部には、電流リード33となる銅パ
イプが挿入されている。テーパー構造、コンデンサー方
式の電界緩和手段はブッシングの一例であり、本発明の
構成を限定するものではない。直管構造のブッシングで
も良いし、ストレスコーン方式の電界緩和手段を用いて
もよい。The bushing 30 is a rod-like body having a solid insulating layer 32 in which a fiber reinforced plastic (FRP) and a foil electrode are laminated on the outer periphery of a stainless steel pipe 31 and having both ends tapered. One end of the bushing is immersed in liquid nitrogen 11, and the other end is introduced into insulator 40. The lamination of the FRP and the foil electrode is a so-called capacitor type electric field relaxation means. Inside the stainless steel pipe 31, a copper pipe serving as a current lead 33 is inserted. The taper structure and the capacitor type electric field relaxation means are examples of the bushing, and do not limit the configuration of the present invention. A bushing having a straight pipe structure may be used, or an electric field relaxation means of a stress cone type may be used.
【００３０】ステンレスパイプ31内には極低温部から常
温部につながる空間34が形成されている。この空間34は
絶縁油溜まり上部の空隙部42に連通されており、内部に
極低温温度で液化しないヘリウムガスを充填する。極低
温温度は、通常は用いる冷媒の温度のことである。一般
に冷媒は、ヘリウムよりも沸点の高いもの、例えば液体
窒素が好ましい。大気圧でN2の沸点は77.3Kである。こ
の構成により、ブッシング内部に極低温で液化物が発生
することを防止し、空間内および空隙部内が負圧となる
ことに伴って絶縁性能が低下することを防止する。A space 34 is formed in the stainless steel pipe 31 from the extremely low temperature part to the normal temperature part. The space 34 is communicated with a space 42 above the insulating oil reservoir, and is filled with a helium gas that does not liquefy at a cryogenic temperature. Cryogenic temperature usually refers to the temperature of the refrigerant used. Generally, the refrigerant is preferably one having a higher boiling point than helium, for example, liquid nitrogen. The boiling point of N 2 is a 77.3K at atmospheric pressure. With this configuration, it is possible to prevent liquefied matter from being generated at an extremely low temperature inside the bushing, and to prevent insulation performance from being reduced due to negative pressure in the space and the gap.
【００３１】一方、ブッシング30の外周には、一対のフ
ランジ35、36を一体化した。下方のフランジが極低温側
フランジ35で、上方のフランジが常温側フランジ36であ
る。On the other hand, a pair of flanges 35 and 36 are integrated with the outer periphery of the bushing 30. The lower flange is a cryogenic flange 35 and the upper flange is a normal temperature flange 36.
【００３２】フランジ35、36は固体絶縁層32にねじ嵌合
して接着で一体化するため、固体絶縁層外周の材料と接
着しやすいものを選択する。ここでは、極低温側フラン
ジ35をFRP製に、常温側フランジ36をステンレス製とし
た。Since the flanges 35 and 36 are screw-fitted to the solid insulating layer 32 and integrated by bonding, a material that easily adheres to the material around the solid insulating layer is selected. Here, the extremely low temperature side flange 35 was made of FRP, and the normal temperature side flange 36 was made of stainless steel.
【００３３】このような常温側フランジ36で真空槽20の
上端を封止し、さらに極低温側フランジ35で冷媒槽10の
上端を封止することで、極低温側フランジ35と常温側フ
ランジ36との間に形成される空間を真空断熱部とする。By sealing the upper end of the vacuum chamber 20 with such a normal temperature side flange 36 and further sealing the upper end of the refrigerant tank 10 with the cryogenic side flange 35, the cryogenic side flange 35 and the normal temperature side flange 36 are sealed. And the space formed between them is a vacuum heat insulating part.
【００３４】ここで、常温側フランジ36を波付け加工し
たフレキシブル管50を用いて可動式に構成し、ブッシン
グ30の熱伸縮に対応して常温側フランジ36を可動とし、
極低温側フランジ35に過大な応力がかかることを防止す
る。Here, the normal temperature side flange 36 is configured to be movable using a corrugated flexible tube 50, and the normal temperature side flange 36 is movable according to the thermal expansion and contraction of the bushing 30.
This prevents excessive stress from being applied to the cryogenic side flange 35.
【００３５】例えば、冷媒槽10の上端に極低温側フラン
ジ35を固定する。フレキシブル管50の上端は常温側フラ
ンジ36に固定され、さらにフレキシブル管50の下端が真
空槽30の上端に連結される。For example, the cryogenic flange 35 is fixed to the upper end of the refrigerant tank 10. The upper end of the flexible tube 50 is fixed to the room temperature side flange 36, and the lower end of the flexible tube 50 is connected to the upper end of the vacuum chamber 30.
【００３６】このような真空断熱部を設けることで、極
低温部と常温部との間の断熱性を高め、非常に断熱性に
優れた極低温機器の端末構造を実現できる。また、冷媒
槽を密閉して冷媒を非補給・循環させて冷却するクロー
ズドシステムの端末構造を構成できる。By providing such a vacuum heat insulating portion, the heat insulating property between the cryogenic portion and the normal temperature portion is enhanced, and a terminal structure of a cryogenic device having extremely excellent heat insulating properties can be realized. Further, the terminal structure of the closed system in which the refrigerant tank is closed and the refrigerant is not supplied / circulated and cooled by cooling can be configured.
【００３７】（実施例２）次に、常温部の構成が異なる
実施例を図２に示す。実施例２は、常温部の端部の構成
が異なるだけで、他の構成は実施例１と同様であるた
め、主に相違点について説明する。(Embodiment 2) Next, FIG. 2 shows an embodiment in which the structure of the room temperature part is different. The second embodiment is different from the first embodiment only in the configuration of the end portion of the normal temperature part, and the other configuration is the same as that of the first embodiment.
【００３８】この常温部は、碍子内にブッシング30が収
納されているが、ブッシング内部に形成された空間34が
絶縁油溜まり上部に形成された空隙部42と連通していな
い構成である。この場合、ブッシング内部の空間を真空
にするか極低温温度で液化しないヘリウムガスを充填す
る。ブッシング内の空間はステンレスパイプ31の端部を
溶接することなどにより封止する。この構成により、ブ
ッシング内部に液化物が生じることを抑制し、ブッシン
グ内の過大な圧力変化を抑制して、ブッシングの機械的
破損を防止する。This room temperature portion has a configuration in which the bushing 30 is housed in the insulator, but the space 34 formed inside the bushing is not in communication with the void portion 42 formed above the insulating oil reservoir. In this case, the space inside the bushing is evacuated or filled with helium gas that does not liquefy at a cryogenic temperature. The space in the bushing is sealed by welding the end of the stainless steel pipe 31 or the like. With this configuration, the generation of liquefied matter inside the bushing is suppressed, the excessive pressure change in the bushing is suppressed, and the mechanical damage of the bushing is prevented.
【００３９】（実施例３）次に、常温部の絶縁流体をSF
6ガス43とした実施例を図３に示す。実施例３は、常温
部の端部の構成が異なるだけで、他の構成は実施例１と
同様であるため、主に相違点について説明する。(Embodiment 3) Next, the insulating fluid at room temperature was replaced with SF.
FIG. 3 shows an embodiment in which six gases 43 are used. The third embodiment is different from the first embodiment only in the configuration of the end portion of the normal temperature part, and the other configuration is the same as that of the first embodiment.
【００４０】この常温部も、碍子内にブッシング30が収
納されているが、ブッシング内部に形成された空間34が
SF6ガス43の充填空間と連通していない構成である。実
施例２では絶縁流体に絶縁油を用いたが、本例では絶縁
油の代わりにSF6ガス43を用いている。この場合でもブ
ッシング内部の空間を真空にするか極低温温度で液化し
ないヘリウムガスを充填する。ブッシング内の空間はス
テンレスパイプ31の端部を溶接することなどにより封止
する。この構成により、ブッシング内部に液化物が生じ
ることを抑制し、ブッシング内の過大な圧力変化を抑制
して、ブッシングの機械的破損を防止する。In this normal temperature part, the bushing 30 is housed in the insulator, but the space 34 formed inside the bushing is
This is a configuration that does not communicate with the space filled with SF 6 gas 43. In the second embodiment, the insulating oil is used as the insulating fluid. However, in the present embodiment, the SF 6 gas 43 is used instead of the insulating oil. Even in this case, the space inside the bushing is evacuated or filled with a helium gas that does not liquefy at an extremely low temperature. The space in the bushing is sealed by welding the end of the stainless steel pipe 31 or the like. With this configuration, the generation of liquefied matter inside the bushing is suppressed, the excessive pressure change in the bushing is suppressed, and the mechanical damage of the bushing is prevented.
【００４１】（実施例４）さらに、真空断熱部を有しな
い端末構成を図４に示す。実施例１では２つのフランジ
を用いて真空断熱部を形成したが、本例ではブッシング
外周のフランジ37を一つとし、冷媒層内に液体窒素部12
と窒素ガス溜まり部13とを有する構成とした。フランジ
37を境界として、その上部は直ちに常温部につながって
いる。(Embodiment 4) FIG. 4 shows a terminal structure having no vacuum heat insulating part. In the first embodiment, the vacuum heat insulating portion is formed by using two flanges. However, in the present embodiment, one flange 37 on the outer periphery of the bushing is used, and the liquid nitrogen portion 12 is formed in the refrigerant layer.
And a nitrogen gas reservoir 13. Flange
The upper part is immediately connected to the room temperature part with the boundary at 37.
【００４２】この端末構造でも、実施例１に示したよう
に、ブッシング内部に形成された空間34が絶縁油溜まり
上部に形成された空隙部42と連通している場合、ブッシ
ング内部の空間に極低温温度で液化しないヘリウムガス
を充填する。この構成により、ブッシング内部に液化物
が生じることを抑制して、絶縁性能の低下を防止する。Also in this terminal structure, as shown in the first embodiment, when the space 34 formed inside the bushing communicates with the gap 42 formed above the insulating oil reservoir, the space inside the bushing is extremely small. Fill with helium gas that does not liquefy at low temperature. With this configuration, the generation of liquefied material inside the bushing is suppressed, and a decrease in insulation performance is prevented.
【００４３】これら空間34と空隙部42とが連通していな
い場合、実施例2、3に示したように、ブッシング内部の
空間を真空にするか極低温温度で液化しないヘリウムガ
スを充填する。この構成により、ブッシング内部に液化
物が生じることを抑制し、ブッシング内の過大な圧力変
化を抑制して、ブッシングの機械的破損を防止する。When the space 34 and the gap 42 are not communicated with each other, as shown in Embodiments 2 and 3, the space inside the bushing is evacuated or filled with helium gas which is not liquefied at a cryogenic temperature. With this configuration, the generation of liquefied matter inside the bushing is suppressed, the excessive pressure change in the bushing is suppressed, and the mechanical damage of the bushing is prevented.
【００４４】[0044]
【発明の効果】以上説明したように、本発明端末構造に
よれば、極低温部から常温部につながる空間内を極低温
で液化しない気体で充填するか真空とすることで、極低
温温度によっても空間内に液化物が発生することを抑制
する。それに伴って、導体部内の減圧に伴う絶縁性能の
低下または導体内部の過大な圧力変化を防止することが
できる。As described above, according to the terminal structure of the present invention, the space connected from the cryogenic portion to the room temperature portion is filled with a gas that does not liquefy at a cryogenic temperature or is evacuated, so that the cryogenic temperature can be controlled. This also suppresses the generation of liquefied matter in the space. Along with this, it is possible to prevent a decrease in insulation performance due to a reduced pressure in the conductor portion or an excessive change in pressure inside the conductor.
【図１】本発明実施例１の概略断面図である。FIG. 1 is a schematic sectional view of a first embodiment of the present invention.
【図２】本発明実施例２における常温部の部分断面図で
ある。FIG. 2 is a partial cross-sectional view of a room temperature part in Embodiment 2 of the present invention.
【図３】本発明実施例３における常温部の部分断面図で
ある。FIG. 3 is a partial cross-sectional view of a room temperature part in Embodiment 3 of the present invention.
【図４】本発明実施例４の概略断面図である。FIG. 4 is a schematic sectional view of Embodiment 4 of the present invention.
【図５】従来の端末構造の概略断面図である。FIG. 5 is a schematic sectional view of a conventional terminal structure.
10 冷媒槽 11 液体窒素 12 液体窒素部 13 窒素ガス溜まり部 20 真空槽 30 ブッシング 31 ステンレスパイプ 32 固体絶縁層 33 電流リード 34 空間 35 極低温側フランジ 36 常温側フランジ 37 フランジ 40 碍子 41 絶縁油たまり 42 空隙部 43 SF6ガス 50 フレキシブル管 60 絶縁流体 70、71 供給管 73 排出口 80 接続導体 100 極低温機器10 Refrigerant tank 11 Liquid nitrogen 12 Liquid nitrogen section 13 Nitrogen gas storage section 20 Vacuum tank 30 Bushing 31 Stainless steel pipe 32 Solid insulating layer 33 Current lead 34 Space 35 Cryogenic side flange 36 Room temperature side flange 37 Flange 40 Insulator 41 Insulating oil pool 42 Void 43 SF 6 gas 50 Flexible pipe 60 Insulating fluid 70, 71 Supply pipe 73 Outlet 80 Connection conductor 100 Cryogenic equipment
フロントページの続き (72)発明者 芦辺 祐一 大阪市此花区島屋一丁目１番３号 住友電 気工業株式会社大阪製作所内 (72)発明者 古川 晃平 大阪市此花区島屋一丁目１番３号 住友電 気工業株式会社大阪製作所内 (72)発明者 高橋 芳久 神奈川県横浜市鶴見区江ヶ崎町４番１号 東京電力株式会社電力技術研究所内 (72)発明者 松尾 公義 神奈川県横浜市鶴見区江ヶ崎町４番１号 東京電力株式会社電力技術研究所内 (72)発明者 本庄 昇一 神奈川県横浜市鶴見区江ヶ崎町４番１号 東京電力株式会社電力技術研究所内 (72)発明者 三村 智男 神奈川県横浜市鶴見区江ヶ崎町４番１号 東京電力株式会社電力技術研究所内 (72)発明者 相場 輝光 神奈川県横浜市鶴見区江ヶ崎町４番１号 東京電力株式会社電力技術研究所内 Ｆターム(参考） 4M114 AA14 AA20 BB09 BB10 CC02 CC05 CC11 CC15 CC18 DA02 DA52 DA53 Continued on the front page. (72) Inventor Yuichi Ashbe 1-3-1 Shimaya, Konohana-ku, Osaka-shi Sumitomo Electric Industries, Ltd. Osaka Works (72) Inventor Kohei Furukawa 1-3-1 Shimaya, Konohana-ku, Osaka-Sumitomo (72) Inventor Yoshihisa Takahashi 4-1 Egasaki-cho, Tsurumi-ku, Yokohama-shi, Kanagawa Prefecture Inside the Electric Power Research Laboratory, Tokyo Electric Power Company (72) Inventor Kimiyoshi Matsuo, Tsurumi-ku, Yokohama-shi, Kanagawa Prefecture 4-1 Egasaki-cho, Tokyo Electric Power Co., Inc. (72) Inventor Shoichi Honjo 4-1 Egasaki-cho, Tsurumi-ku, Yokohama, Kanagawa Prefecture Tokyo Electric Power Co., Inc. (72) Inventor Tomio Mimura 4-1 Egasaki-cho, Tsurumi-ku, Yokohama-shi, Kanagawa Prefecture Inside the Electric Power Research Laboratory, Tokyo Electric Power Company (72) Inventor Terumitsu Akira 4-1 Egasaki-cho, Tsurumi-ku, Yokohama-shi, Kanagawa Prefecture F-term in Technical Research Institute (reference) 4M114 AA14 AA20 BB09 BB10 CC02 CC05 C C11 CC15 CC18 DA02 DA52 DA53
Claims (3)
部を有する極低温機器の端末構造であって、 前記導体部は極低温部から常温部につながる空間を有
し、 この空間に、極低温で液化しない気体が充填されている
ことを特徴とする極低温機器の端末構造。1. A terminal structure of a cryogenic device having a conductor portion drawn from a cryogenic portion to a room temperature portion, wherein the conductor portion has a space extending from the cryogenic portion to the room temperature portion. A terminal structure of a cryogenic device characterized by being filled with a gas that does not liquefy at a low temperature.
請求項１に記載の極低温機器の端末構造。2. The terminal structure for a cryogenic device according to claim 1, wherein the gas is helium.
部を有する極低温機器の端末構造であって、 前記導体部は極低温部から常温部につながる空間を有
し、 この空間が真空に保持されていることを特徴とする極低
温機器の端末構造。3. A terminal structure of a cryogenic device having a conductor portion drawn from a cryogenic portion to a room temperature portion, wherein the conductor portion has a space extending from the cryogenic portion to the room temperature portion, and the space is evacuated. A terminal structure of a cryogenic device characterized by being held.
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001076951A JP3779168B2 (en) | 2001-03-16 | 2001-03-16 | Terminal structure of cryogenic equipment |
| KR1020027013479A KR100642538B1 (en) | 2001-02-13 | 2002-02-13 | Terminal structure of extreme-low temperature equipment |
| PCT/JP2002/001177 WO2002065605A1 (en) | 2001-02-13 | 2002-02-13 | Terminal structure of extreme-low temperature equipment |
| CNB028002997A CN100356646C (en) | 2001-02-13 | 2002-02-13 | Terminal structure of extreme-low temperature equipment |
| EP02700574.3A EP1283576B1 (en) | 2001-02-13 | 2002-02-13 | Terminal structure of extreme-low temperature equipment |
| US10/257,570 US6888060B2 (en) | 2001-02-13 | 2002-02-13 | Terminal structure of extreme-low temperature equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001076951A JP3779168B2 (en) | 2001-03-16 | 2001-03-16 | Terminal structure of cryogenic equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002280628A true JP2002280628A (en) | 2002-09-27 |
| JP3779168B2 JP3779168B2 (en) | 2006-05-24 |
Family
ID=18933793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001076951A Expired - Fee Related JP3779168B2 (en) | 2001-02-13 | 2001-03-16 | Terminal structure of cryogenic equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3779168B2 (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100473565B1 (en) * | 2002-10-10 | 2005-03-10 | 엘지전선 주식회사 | Termination for a high temperature superconducting power cable |
| JP2006261122A (en) * | 2005-03-17 | 2006-09-28 | Nexans | Electrical connection structure for superconduction material |
| EP1837970A1 (en) * | 2005-01-12 | 2007-09-26 | Sumitomo Electric Industries, Ltd. | Superconducting cable terminal structure |
| JP2009542187A (en) * | 2006-06-29 | 2009-11-26 | ネクサン | Electric bushing structure for superconducting elements |
| US7849704B2 (en) * | 2005-01-12 | 2010-12-14 | Sumitomo Electric Industries, Ltd. | Cryogenic apparatus of superconducting equipment |
| WO2011096348A1 (en) * | 2010-02-04 | 2011-08-11 | 古河電気工業株式会社 | Cryogenic cable termination connector |
| WO2015146220A1 (en) * | 2014-03-28 | 2015-10-01 | 住友電気工業株式会社 | Terminal structure for superconducting cable |
| JP2018137846A (en) * | 2017-02-20 | 2018-08-30 | 住友電気工業株式会社 | Terminal structure of superconducting apparatus |
| EP3370317A1 (en) * | 2017-03-03 | 2018-09-05 | Nexans | Superconducting cable end |
| KR20180113929A (en) * | 2017-04-07 | 2018-10-17 | 넥쌍 | Termination for a superconducting cable |
-
2001
- 2001-03-16 JP JP2001076951A patent/JP3779168B2/en not_active Expired - Fee Related
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100473565B1 (en) * | 2002-10-10 | 2005-03-10 | 엘지전선 주식회사 | Termination for a high temperature superconducting power cable |
| EP1837970A1 (en) * | 2005-01-12 | 2007-09-26 | Sumitomo Electric Industries, Ltd. | Superconducting cable terminal structure |
| US7849704B2 (en) * | 2005-01-12 | 2010-12-14 | Sumitomo Electric Industries, Ltd. | Cryogenic apparatus of superconducting equipment |
| EP1837970A4 (en) * | 2005-01-12 | 2011-03-16 | Sumitomo Electric Industries | Superconducting cable terminal structure |
| US7989702B2 (en) | 2005-01-12 | 2011-08-02 | Sumitomo Electric, Ltd. | Sealing-end structure for superconducting cable |
| JP2006261122A (en) * | 2005-03-17 | 2006-09-28 | Nexans | Electrical connection structure for superconduction material |
| JP4658839B2 (en) * | 2005-03-17 | 2011-03-23 | ネクサン | Electrical connection structure for superconducting members |
| JP2009542187A (en) * | 2006-06-29 | 2009-11-26 | ネクサン | Electric bushing structure for superconducting elements |
| WO2011096348A1 (en) * | 2010-02-04 | 2011-08-11 | 古河電気工業株式会社 | Cryogenic cable termination connector |
| JP2011160641A (en) * | 2010-02-04 | 2011-08-18 | Furukawa Electric Co Ltd:The | Cryogenic cable termination connector |
| US9728950B2 (en) | 2010-02-04 | 2017-08-08 | Furukawa Electric Co., Ltd. | Cryogenic cable termination connector |
| WO2015146220A1 (en) * | 2014-03-28 | 2015-10-01 | 住友電気工業株式会社 | Terminal structure for superconducting cable |
| JP2015192552A (en) * | 2014-03-28 | 2015-11-02 | 住友電気工業株式会社 | Terminal structure of superconducting cable |
| JP2018137846A (en) * | 2017-02-20 | 2018-08-30 | 住友電気工業株式会社 | Terminal structure of superconducting apparatus |
| EP3370317A1 (en) * | 2017-03-03 | 2018-09-05 | Nexans | Superconducting cable end |
| KR20180113929A (en) * | 2017-04-07 | 2018-10-17 | 넥쌍 | Termination for a superconducting cable |
| KR102533134B1 (en) | 2017-04-07 | 2023-05-17 | 넥쌍 | Termination for a superconducting cable |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3779168B2 (en) | 2006-05-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6888060B2 (en) | Terminal structure of extreme-low temperature equipment | |
| US7849704B2 (en) | Cryogenic apparatus of superconducting equipment | |
| JP5118815B2 (en) | Electric bushings for superconducting members | |
| WO2006087761A1 (en) | End structure of superconducting cable | |
| JP3563355B2 (en) | Terminal structure of cryogenic equipment | |
| JP2002280628A (en) | Terminal structure for cryogenic equipment | |
| JP6169030B2 (en) | Superconducting cable terminal structure | |
| JP6791782B2 (en) | Terminal structure of superconducting equipment | |
| JP5742021B2 (en) | Connection unit and connection structure | |
| JP2005341767A (en) | Terminal structure of superconducting cable | |
| US20140162882A1 (en) | Cable termination for high voltage power cables cooled by a gaseous cryogen | |
| JP4045441B2 (en) | Superconducting cable terminal structure | |
| JP4273525B2 (en) | Terminal structure of superconducting equipment | |
| KR100508710B1 (en) | termination structure of super conducting cable | |
| JPH08196030A (en) | End connecting device for cryoresistive cable | |
| JP3181513B2 (en) | Terminal structure of cryogenic cable | |
| JP4096360B2 (en) | Superconducting cable terminal structure and superconducting cable line | |
| JP5742006B2 (en) | End structure of room temperature insulated superconducting cable | |
| JP2000340274A (en) | Superconductive cable connection box | |
| JPH05114754A (en) | Current lead insulating support structure of superconductive equipment | |
| JP5754160B2 (en) | Insulating joint and refrigerant drawing structure at the end of room temperature insulated superconducting cable | |
| JP2000340420A (en) | Superconducting current-limiting device | |
| JP4432006B2 (en) | Current leads for terminals in the termination connection of superconducting cables | |
| JPH06303758A (en) | Rotor of superconducting rotary electric machine | |
| JP2020028132A (en) | Terminal structure of superconducting apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20050628 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050819 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20060215 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20060301 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090310 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100310 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100310 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110310 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110310 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120310 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120310 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130310 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140310 Year of fee payment: 8 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |