JP2002280346A - Substrate processor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a processor preventing components of a processing part from being corroded by liquid chemicals at carrying of a substrate processed with the liquid chemical to the next processing part, such as a rinsing/drying processing part, while suppressing the processor cost. SOLUTION: Below a substrate-carrying path for carrying the substrate W from a liquid chemical processing part 10 to the rinsing/drying processing part 12, a liquid-recovering vat 28 whose upper surface is opened from the side end part of the liquid chemical processing part to the side end part of the rinsing/drying processing part facing the side end part for recovering processing liquid flowing down from the substrate which is carried is disposed. A liquid-receiving vat 30 for receiving the processing liquid flowing down from the substrate, being carried from the side end part of the rinsing/drying processing part to a position facing the upper opening surface of a rinsing/drying processing vessel 14, is provided capable of being withdrawn.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a substrate processing apparatus for processing various substrates such as a semiconductor substrate, a glass substrate for a flat panel display such as a liquid crystal display device, a glass substrate for a photomask, and a substrate for an optical disk.

[0002]

2. Description of the Related Art As a device for performing a rinsing process after a substrate such as a semiconductor substrate is subjected to a chemical treatment, and a drying treatment after the rinsing treatment, a chemical treatment tank, a rinsing treatment tank, and a drying treatment tank are sequentially connected to each other. After immersing the substrate in the stored chemical solution and performing the chemical processing, the substrate is transferred from the chemical processing tank to the rinsing processing tank, and the substrate is immersed in the rinsing liquid stored in the rinsing processing tank to perform a rinsing process. 2. Description of the Related Art A substrate processing apparatus that transports a substrate from a rinsing processing tank to a drying processing tank after a rinsing processing and dry-processes the substrate in the drying processing tank is generally known.
Further, the drying treatment tank is a rinsing / drying treatment tank also having a function of rinsing the substrate after the chemical treatment with a rinsing liquid, and the substrate subjected to the chemical treatment in the chemical treatment tank is rinsed and dried from the chemical treatment tank. The substrate may be conveyed to a rinsing / drying treatment tank, followed by rinsing the substrate, followed by a drying treatment.

[0003]

However, in an apparatus configuration in which a rinsing / drying processing tank is provided with a rinsing function in addition to a drying function, a substrate to which a chemical is adhered after the chemical processing is transferred to a substrate transfer device. As a result, it is carried into the rinsing / drying tank. For this reason, when the substrate is carried in, the chemical solution drips from the substrate held by the substrate transfer device onto components and the like around the rinsing / drying processing tank, and the chemical solution adheres to the surface of the component and the like, and the component And the like is corroded.

[0004] Such a problem can be solved by forming all the components around the rinsing / drying processing tank from a material having corrosion resistance to a chemical solution. However, such a material is expensive and increases the cost of the apparatus, and thus cannot be said to be a practical solution.

[0005] The present invention has been made in view of the above circumstances, and when transporting a substrate that has been treated with a chemical solution to a next processing unit such as a rinsing / drying processing unit, the components of that processing unit are used. It is an object of the present invention to provide a substrate processing apparatus capable of preventing the substrate from being corroded by a chemical solution and keeping the apparatus cost low.

[0006]

According to the first aspect of the present invention,
A first processing unit having a first processing tank in which a substrate is processed using a processing liquid; a second processing unit having a second processing tank disposed adjacent to the first processing unit; A substrate transfer means for transferring the substrate with the processing liquid attached thereto from the first processing tank to the second processing tank; and
A liquid recovery member that has an upper surface open over a range from a side end of the first processing unit to a side end of the second processing unit opposed to the side end, and collects a processing liquid flowing down from the substrate being transported. And a substrate receiving apparatus for receiving a processing liquid flowing down from the substrate being transported in a range from the side end of the second processing unit to a position facing the upper opening surface of the second processing tank. The member is provided so as to be retractable.

According to a second aspect of the present invention, in the substrate processing apparatus according to the first aspect, the liquid recovery member is fixed, and the liquid receiving member is positioned at a height between the liquid recovery member and the substrate transport path. The liquid receiving member is movably supported between a liquid receiving position for receiving the processing liquid flowing down from the substrate being transported and a retreat position, and guides the processing liquid received by the liquid receiving member to the liquid collecting member. A liquid passage is provided, and a liquid receiving member moving means for moving the liquid receiving member is provided.

According to a third aspect of the present invention, in the substrate processing apparatus of the second aspect, the liquid receiving member is supported so as to be reciprocally movable in a horizontal direction between a liquid receiving position and a retracted position. I do.

According to a fourth aspect of the present invention, in the substrate processing apparatus of the second aspect, the liquid receiving member is rotatably supported in a horizontal plane between a liquid receiving position and a retracted position. I do.

According to a fifth aspect of the present invention, in the substrate processing apparatus of the second aspect, the liquid receiving member is rotatably supported in a vertical plane between a liquid receiving position and a retracted position. And

According to a sixth aspect of the present invention, in the substrate processing apparatus of the first aspect, the liquid collecting member is provided with a liquid collecting position for collecting a processing liquid flowing down from the substrate being transported and the liquid collecting member. In a range from the side end to a position facing the upper opening surface of the second processing tank, the liquid collecting member supports the liquid collecting member so as to be reciprocally movable between a liquid receiving position for receiving the processing liquid flowing down from the substrate being transported. The liquid receiving member is also used so that the liquid collecting position is set to the retracted position, and a liquid collecting member moving means for moving the liquid collecting member is provided.

According to a seventh aspect of the present invention, in the substrate processing apparatus according to any one of the first to sixth aspects, the substrate transfer means is capable of moving up and down with respect to the second processing tank, and The evacuation position of the receiving member is a position where the substrate transfer means does not interfere with the liquid receiving member when the substrate transfer means moves up and down with respect to the second processing tank.

According to an eighth aspect of the present invention, in the substrate processing apparatus according to any one of the first to seventh aspects, the second processing tank has an upper opening for loading and unloading the substrate. The retreat position of the liquid receiving member is disposed inside a processing chamber having an opening / closing lid that opens and closes, and the opening / closing lid and the liquid receiving member interfere when the opening / closing lid opens and closes the upper opening of the processing chamber. It is characterized in that it is a position where it does not.

In the substrate processing apparatus according to the first aspect of the present invention, when the substrate processed in the first processing section is transferred from the first processing tank to the second processing tank by the substrate transfer means, In the range from the side end of the second processing unit to the side end of the second processing unit facing the side end, the processing liquid flowing down from the substrate being transported is collected by the liquid collecting member. Then, in a range from the side end of the second processing unit to a position facing the upper opening surface of the second processing tank, the processing liquid flowing down from the substrate being transported is received by the liquid receiving member. The liquid receiving member is retracted when it is not necessary, so that the operation of the components in the second processing unit and the operation of the inter-tank shutter and the like are not hindered.

In the substrate processing apparatus according to the second aspect of the present invention,
The processing liquid flowing down from the substrate being transported from the position above the side end of the first processing section to the position above the side end of the second processing section facing the side end is recovered by the fixed liquid recovery member. Is done. When the substrate is transported,
The liquid receiving member is moved to the liquid receiving position by the liquid receiving member moving means, and flows down from the substrate being transported from a position above the side end of the second processing unit to a position facing the upper opening surface of the second processing tank. The processing liquid to be processed is received by the liquid receiving member, guided to the liquid collecting member through the liquid guide path of the liquid receiving member,
The liquid is collected by the liquid collecting member. The liquid receiving member is moved from the liquid receiving position to the retracted position by the liquid receiving member moving means when it is not necessary, so that the operation of the components in the second processing unit and the operation of the inter-tank shutter and the like are not hindered. To be.

In the substrate processing apparatus according to the third aspect of the present invention,
The liquid receiving member reciprocates in the horizontal direction and moves between the liquid receiving position and the retracted position.

According to a fourth aspect of the present invention, in the substrate processing apparatus,
The liquid receiving member rotates in a horizontal plane and moves between the liquid receiving position and the retracted position.

According to a fifth aspect of the present invention, in the substrate processing apparatus,
The liquid receiving member rotates in the vertical plane and moves between the liquid receiving position and the retracted position.

In the substrate processing apparatus of the invention according to claim 6,
While the substrate is transported from the position above the side end of the first processing unit to the position above the side end of the second processing unit facing the side end, the liquid is collected at the liquid collecting position below the substrate transfer path. The member is disposed, and the processing liquid flowing down from the substrate is collected by the liquid collecting member. Then, while the substrate is transported from a position above the side end of the second processing section to a position facing the upper opening surface of the second processing tank, the liquid recovery member moving means moves the liquid recovery member from the liquid recovery position to the liquid receiving position. The processing liquid moved to the position and flowing down from the substrate is received and recovered by a liquid recovery member serving as a liquid receiving member. The liquid recovery member is moved from the liquid receiving position to the liquid recovery position, which is also the retracted position, by the liquid recovery member moving means when it is not necessary, and is used for the operation of the components in the second processing unit and the operation of the inter-tank shutter, etc. No hindrance will occur.

[0020] In the substrate processing apparatus of the invention according to claim 7,
When the liquid receiving member moves to the retreat position, the liquid receiving member does not interfere with the substrate transport means when the substrate transport means moves up and down with respect to the second processing tank.

In the substrate processing apparatus of the invention according to claim 8,
When the liquid receiving member moves to the retracted position, the liquid receiving member does not interfere with the open / close lid when the open / close lid opens / closes the upper opening of the processing chamber.

[0022]

Preferred embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 shows an example of an embodiment of the present invention, and is a diagram showing a schematic configuration of a substrate processing apparatus, and is a front view partially showing a cross section. Although not shown in detail, the substrate processing apparatus stores a chemical solution, a chemical solution processing unit (first processing unit) 10 having a chemical solution processing tank in which a substrate is immersed and processed in the chemical solution, and a rinsing solution. A rinsing / drying processing section (second processing section) having a rinsing / drying processing tank 14 in which the substrate is stored and immersed in the rinsing liquid to be rinsed and the substrate is dried following the rinsing processing.
12 and a pair of openable and closable chucks 18 and 18 for supporting a plurality of substrates W. The substrate W is transferred from the chemical processing bath of the chemical processing unit 10 to the rinsing / drying processing bath 14 of the rinsing / drying processing unit 12. It has a substrate transfer device 16 for transferring. The chemical processing section 10 and the rinsing / drying section 12 are disposed adjacent to each other with a slight distance therebetween. The arrow A in the figure indicates the direction in which the substrate W is transported.

The rinsing / drying processing section 12 is constituted by surrounding a rinsing / drying processing tank 14 by a processing chamber 20. The upper portion of the processing chamber 20 is opened for loading and unloading the substrate W, and an opening / closing lid 22 for opening and closing the upper opening is attached. Lid 22
Pivots rearward to open the upper opening of the processing chamber 20. On the upper surface of the flange portion 24 at the upper part of the processing chamber 20 which is in contact with the opening / closing lid 22,
An annular packing 26 is mounted so that the lower surface 2 and the upper surface of the flange portion 24 are air-tightly joined.

Chemical treatment section 10 and rinsing / drying section 12
A liquid recovery vat 28 is disposed between the two. The liquid recovery vat 28 is fixed below the substrate transfer path where the substrate W is transferred by the substrate transfer device 16. Then, the upper surface of the liquid recovery vat 28 is connected to the side end of the rinsing / drying processing section 12 from the side end of the rinsing / drying processing section 12 facing the rinsing / drying processing section 12, that is, the processing chamber The opening extends over the range up to the side end of the flange 24.

A liquid receiving vat 30 is arranged at a height between the liquid collecting vat 28 and the substrate transfer path. The liquid receiving vat 30 is reciprocally movable in the horizontal direction between a retracted position indicated by a two-dot chain line immediately above the liquid recovery vat 28 and a liquid receiving position protruded above the processing chamber 20 and indicated by a solid line. It is supported and moved between these two positions by a moving mechanism (not shown). Liquid receiving vat 3
0 is located at the liquid receiving position such that the front end thereof faces the upper opening surface of the rinsing / drying processing tank 14, that is, the front end is located on the upper extension line of one side of the rinsing / drying processing tank 14, and The planar shape and size are determined so that the end is located above the opening surface of the liquid recovery vat 28.

As shown in the sectional view of FIG. 2, the inner bottom surface of the liquid receiving butt 30 is formed as a tapered surface 32 with the liquid collecting butt 28 side lowered.
The liquid inside flows on the tapered surface 32 and flows into the liquid collecting vat 28. Alternatively, as shown in FIG. 3, an outflow hole 36 through which the liquid flows out is formed at the bottom of the end of the liquid receiving vat 34 on the side of the liquid collecting vat 28 so that the liquid in the liquid receiving vat 34 can have an outflow hole. It is also possible to adopt a configuration in which the liquid flows into the liquid collecting vat 28 through the liquid collecting vat 36.

In the substrate processing apparatus configured as described above, when the chemical processing of the substrate is completed in the chemical processing section 10, the substrate W is supported by the pair of chucks 18, 18 while the chemical is attached to the surface. Then, the substrate is transferred from the chemical processing tank of the chemical processing unit 10 to the rinsing / drying processing tank 14 of the rinsing / drying processing unit 12 by the substrate transfer device 16. When the transfer of the substrate W is started, the opening / closing lid 22 of the processing chamber 20 of the rinsing / drying processing unit 12 is opened, and the upper opening of the processing chamber 20 is opened. Prior to the transfer of the substrate W, or at the same time as or immediately after the transfer of the substrate W is started, the liquid receiving bat 30 is moved by the moving mechanism from the retracted position indicated by the two-dot chain line to the liquid receiving position indicated by the solid line. Moved to

In the process of transporting the substrate W from the chemical processing tank to the rinsing / drying processing tank 14, as shown by a two-dot chain line, from the side end of the chemical processing section 10 to the side end of the rinsing / drying processing section 12. During the movement of the substrate W in the range of the above, when the chemical liquid drops from the surface of the substrate W, the chemical liquid flows down into the liquid collecting vat 28 and is collected. Further, when the chemical liquid dripping from the surface of the substrate W while the substrate W is moving in the range from the side end of the rinsing / drying processing unit 12 to the position facing the upper opening surface of the rinsing / drying processing tank 14, the chemical liquid Flows down into the liquid receiving vat 30 and flows from the liquid receiving vat 30 into the liquid collecting vat 28 to be collected. For this reason, the chemical solution dripped from the surface of the substrate W is deposited on parts such as the packing 26 and the flange portion 24 of the processing chamber 20 of the rinsing / drying processing unit 12 and the inner surface of the processing chamber 20 and the rinsing / drying processing tank 14. The components and the processing chamber 20 flow down to the outer surface, etc.
Is prevented from being corroded.

After the substrate W has passed above the liquid receiving vat 30, even if a chemical solution drips from the surface of the substrate W, the chemical solution flows down into the rinsing / drying treatment tank 14, so that there is no problem. When the substrate W is transported to a position above the rinsing / drying treatment tank 14 shown by the solid line, the liquid receiving bat 30 is moved by the moving mechanism from the liquid receiving position shown by the solid line to the retracted position shown by the two-dot chain line. Thereafter, the substrate W is lowered while being supported by the chuck 18, and the processing chamber 2
After passing through the opening on the top surface of the rinsing / drying treatment tank 14, it is inserted into the rinsing / drying treatment tank 14. Then, the chuck 18 of the substrate transfer device is
After transferring the substrate W to a substrate holding holder (not shown) installed in the rinsing / drying processing tank 14, the substrate W is raised and retreated from the processing chamber 20. Thereafter, the processing chamber 20
Is closed, the upper opening of the processing chamber 20 is closed, and the substrate is rinsed and dried. In the above operation process, when the chuck 18 moves up and down or when the opening / closing lid 22 opens and closes, the liquid receiving member 30
Has moved to the retracted position shown by the two-dot chain line. The retracted position is a position where the liquid receiving member 30 does not interfere with the elevating operation of the chuck 18 and the opening and closing operation of the opening / closing lid 22. Does not hinder the processing operation.

In the above embodiment, the liquid receiving vat 30
Is supported so as to be reciprocally movable in a horizontal direction between a retreat position just above the liquid collecting vat 28 and a liquid receiving position above the processing chamber 20 and is moved between these positions by a moving mechanism. As shown in a schematic plan view in FIG. 4, the liquid receiving bat 30 is supported so as to be reciprocally movable in the front-rear horizontal direction between a liquid receiving position above the processing chamber 20 and a retracted position on the rear side of the processing chamber 20. Alternatively, the moving mechanism may be used to move between these two positions. As shown in a schematic plan view in FIG. 5, the liquid receiving bat 30 is rotatably supported in a horizontal plane, and the liquid receiving bat 30 is rotated 90 ° or 180 ° in the horizontal plane from the liquid receiving position by a horizontal plane rotating mechanism. You may comprise so that it may be rotated and retracted. Further, as shown in a schematic front view in FIG. 6, the liquid receiving bat 30 is rotatably supported in a vertical plane, and the liquid receiving butt 30 is rotated by a vertical plane rotating mechanism.
Can be rotated 90 ° or 180 ° within the vertical plane from the liquid receiving position to retract.

In the above embodiment, the liquid recovery vat 2
8 is fixed, and the liquid receiving vat 30 is reciprocated between the retracted position and the liquid receiving position. The liquid collecting vat is supported so as to be able to be moved to the liquid receiving position, and the liquid receiving vat is supported. The liquid collecting bat is reciprocated between the liquid collecting position and the liquid receiving position by the moving mechanism without providing the bat, and the liquid collecting bat functions as the original liquid collecting bat at the liquid collecting position, The position may serve as a liquid receiving member, and the liquid collecting position may be configured as a retracted position. In this case, the liquid recovery bat is moved in synchronization with the transport of the substrate, and control is performed so that the liquid recovery bat is located immediately below the substrate.

In the above-described embodiment, the liquid receiving position of the liquid receiving vat 30 is such that the front end of the liquid receiving vat 30 faces the upper opening surface of the rinsing / drying processing tank 14. May be set to protrude, for example, to a position above the rinsing / drying processing tank 14. In such a case, it is ensured that the chemical solution drips between the processing chamber 20 and the rinsing / drying processing tank 14. Can be prevented. Further, in the above embodiment, the liquid receiving bat 30 is moved from the retracted position to the liquid receiving position before and after the start of the transfer of the substrate. However, the liquid collecting bat 30 is moved in synchronization with the transfer of the substrate W. It may be controlled to move to

[0034]

According to the substrate processing apparatus of the first aspect of the present invention, when a substrate subjected to a chemical treatment is transported to a next processing unit such as a rinsing / drying processing unit, the components of the processing unit are converted to a chemical solution. Corrosion can be prevented, and the cost of the apparatus can be reduced.

In the substrate processing apparatus according to the second aspect of the present invention,
The processing liquid flowing down from the substrate being transported can be collected and received by the fixed liquid recovery member and the movable liquid receiving member.

In the substrate processing apparatus according to any one of the third to fifth aspects of the invention, the liquid receiving member moves between the liquid receiving position and the retracted position, so that the above-described effect of the second aspect of the invention is exhibited. You.

In the substrate processing apparatus of the invention according to claim 6,
The single movable liquid recovery member can collect and receive the processing liquid flowing down from the substrate being transported.

According to a seventh aspect of the present invention, in the substrate processing apparatus,
The interference between the substrate transfer means and the liquid receiving member can be avoided while the above effects are obtained.

In the substrate processing apparatus of the invention according to claim 8,
While the above effects are obtained, interference between the opening / closing lid and the liquid receiving member can be avoided.

[Brief description of the drawings]

FIG. 1 is a front view showing an example of an embodiment of the present invention and showing a schematic configuration of a substrate processing apparatus, a part of which is shown in a cross section.

FIG. 2 is a cross-sectional view illustrating a configuration example of a liquid receiving bat.

FIG. 3 is a sectional view showing another configuration example of the liquid receiving bat.

FIG. 4 is a schematic plan view showing an example of an operation method when the liquid receiving bat moves between a liquid receiving position and a retracted position.

FIG. 5 is a schematic plan view showing another example of an operation method when the liquid receiving bat moves between a liquid receiving position and a retracted position.

FIG. 6 is a schematic front view showing still another example of the operation method when the liquid receiving bat moves between the liquid receiving position and the retracted position.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 Chemical liquid processing part (1st processing part) 12 Rinse and drying processing part (2nd processing part) 14 Rinse and drying processing tank 16 Substrate transfer apparatus 18 Chuck of a substrate transfer apparatus 20 Processing chamber 22 Opening / closing lid 24 Flange part 26 Packing 28 Liquid recovery vat 30, 34 Liquid receiving vat 32 Tapered surface forming the inner bottom surface of liquid receiving vat 36 Outflow hole of liquid receiving vat W Substrate A Substrate transport direction

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) H01L 21/306 H01L 21/306 J

Claims (8)

[Claims] 1. A first processing unit having a first processing tank for processing a substrate using a processing liquid, and a second processing unit having a second processing tank disposed adjacent to the first processing unit. And a substrate transfer means for transferring the substrate with the processing liquid attached thereto from the first processing tank to the second processing tank; and a side end of the first processing unit disposed below the substrate transfer path. And a liquid recovery member for recovering a processing liquid flowing down from the substrate being transported, the upper surface being open over a range from the portion to the side end of the second processing portion opposed to the side end thereof. In the above, a liquid receiving member for receiving a processing liquid flowing down from the substrate being transported in a range from the side end of the second processing unit to a position facing an upper opening surface of the second processing tank is provided so as to be retractable. A substrate processing apparatus characterized by the above-mentioned. 2. The substrate processing apparatus according to claim 1, wherein the liquid collecting member is fixed, and the liquid receiving member is at a height position between the liquid collecting member and the substrate conveying path and is being transferred. The liquid receiving member is movably supported between a liquid receiving position for receiving the processing liquid flowing down from the substrate and a retracted position, and the liquid receiving member is provided with a liquid guide path for guiding the processing liquid received by the liquid collecting member to the liquid collecting member. A substrate processing apparatus comprising a liquid receiving member moving means for moving the liquid receiving member. 3. The substrate processing apparatus according to claim 2, wherein the liquid receiving member is supported so as to be reciprocally movable in a horizontal direction between a liquid receiving position and a retracted position. 4. The substrate processing apparatus according to claim 2, wherein the liquid receiving member is rotatably supported in a horizontal plane between a liquid receiving position and a retracted position. 5. The substrate processing apparatus according to claim 2, wherein the liquid receiving member is rotatably supported in a vertical plane between a liquid receiving position and a retracted position. . 6. The substrate processing apparatus according to claim 1, wherein the liquid collecting member is configured to collect a processing liquid flowing down from the substrate being transported and a liquid collecting position from the side end of the second processing unit. (2) The liquid collecting member is also reciprocally supported between a liquid receiving position for receiving the processing liquid flowing down from the substrate being transported in a range up to a position facing the upper opening surface of the processing tank, and the liquid collecting member also serves as the liquid receiving member. And a liquid recovery member moving means for moving the liquid recovery member, wherein the liquid recovery position is a retreat position. 7. The substrate processing apparatus according to claim 1, wherein the substrate transfer means is capable of moving up and down with respect to the second processing tank, and wherein a retreat position of the liquid receiving member is set. A substrate processing apparatus, wherein the substrate transfer means and the liquid receiving member do not interfere with each other when the substrate transfer means moves up and down with respect to the second processing tank. 8. The substrate processing apparatus according to claim 1, wherein the second processing tank has an opening for loading and unloading the substrate at an upper portion, and an opening / closing lid for opening and closing the opening. The retreat position of the liquid receiving member is disposed inside the processing chamber provided, and the retreat position of the liquid receiving member is a position where the open / close lid and the liquid receiving member do not interfere with each other when the open / close lid opens and closes the upper opening of the processing chamber. Characteristic substrate processing equipment.