JP5715547B2 - Substrate processing apparatus, substrate processing method, and computer-readable storage medium storing substrate processing program - Google Patents

Description

  The present invention relates to a substrate processing apparatus, a substrate processing method, and a computer-readable storage medium that stores a substrate processing program, in which a substrate is subjected to liquid processing in a liquid processing tank and then dried in a drying processing tank.

  Conventionally, when manufacturing a semiconductor component, a flat panel display, or the like, a substrate such as a semiconductor wafer or a liquid crystal substrate is subjected to a process such as a cleaning process using various substrate processing apparatuses.

  For example, in the substrate processing apparatus disclosed in Patent Document 1, a liquid processing tank for processing a substrate with a processing liquid is provided, and a drying processing tank for drying the substrate is provided above the liquid processing tank. A substrate transfer device for transferring a plurality of substrates to and from the drying treatment tank is provided.

  In the substrate processing apparatus, a plurality of substrates are vertically held by the substrate transfer device, and the substrate is subjected to liquid processing by immersing the substrate in a processing solution such as hydrofluoric acid stored in a liquid processing tank. Are transported to an upper drying tank, and the substrate is dried using IPA (isopropyl alcohol) vapor or the like in the drying tank.

JP-A-10-209110

  In the conventional substrate processing apparatus, during the drying process, the processing liquid adhering to the surface of the substrate flows down from the surface of the substrate and drops from the outer peripheral edge of the substrate.

  For this reason, in the conventional substrate processing apparatus, it takes time for the processing liquid to drip from the outer peripheral edge of the substrate, the processing time becomes long, and the throughput may be reduced.

  In addition, all the processing liquid does not drip from the substrate, and some processing liquid remains attached to the outer peripheral edge of the substrate due to surface tension, and dust adheres to the outer peripheral edge of the substrate to form a watermark. As a result, the substrate may not be dried well.

  Therefore, in the present invention, in the substrate processing apparatus, a liquid processing tank that performs liquid processing of the substrate with a processing liquid, a drying processing tank that is provided above the liquid processing tank and that performs the drying processing of the substrate, and the liquid processing A shielding door which is provided between the tank and the drying processing tank and can shield the liquid processing tank and the drying processing tank; and a substrate transfer means for transferring the substrate between the liquid processing tank and the drying processing tank. And a droplet removing member provided so as to be relatively close to and away from the outer peripheral edge of the substrate in order to remove droplets from the substrate subjected to the liquid treatment.

  Further, the droplet removing member is provided so as to be retractable at a position where it does not interfere with the substrate when the substrate transporting means transports the substrate between the liquid processing tank and the drying processing tank.

  Further, the droplet removing member is provided on the shielding door.

  Further, the droplet removing member is provided so as to be able to contact and separate from the outer peripheral edge of the substrate by moving the substrate up and down by the substrate transporting means.

  Further, in the present invention, in the substrate processing method, a liquid processing step of liquid processing the substrate in the liquid processing tank, and a substrate transfer for transferring the substrate to a drying processing tank provided above the liquid processing tank by the substrate transfer means. After the step, the drying treatment step of drying the substrate in the drying treatment tank, and the liquid treatment step, the droplet removing member is brought into contact with and separated from the outer peripheral edge of the substrate. And a droplet removing step for removing the droplet from the liquid crystal.

  In the substrate transfer step, the droplet removing member is retracted to a position where it does not interfere with the substrate.

  Further, the droplet removing member is brought into contact with and separated from the outer peripheral edge of the substrate by moving the substrate up and down by the substrate transfer means.

According to the present invention, in a computer-readable storage medium storing a substrate processing program, a liquid processing step in which a substrate is liquid processed in a liquid processing tank, and a substrate transport unit, the substrate is placed above the liquid processing tank. After the substrate transporting process for transporting to the drying processing tank, the drying processing process for drying the substrate to the drying processing tank, and the liquid processing process, the droplet removing member is relative to the outer peripheral edge of the substrate. thereby to contact away, it possesses a droplet removing step of removing liquid droplets from the substrate, in the substrate transfer step, and to retract the droplet removing member in a position that does not interfere with the substrate.

  According to the present invention, the processing liquid can be smoothly dropped from the outer peripheral edge of the substrate, the throughput of the substrate processing apparatus can be improved, and the substrate can be dried well.

Cross-sectional explanatory drawing which shows a substrate processing apparatus. FIG. 6 is an explanatory perspective view showing a droplet removing member. The flowchart which shows a substrate processing program. Cross-sectional explanatory drawing (substrate carrying-in process) which shows a substrate processing method typically. Cross-sectional explanatory drawing (liquid processing process) which shows a substrate processing method typically. Cross-sectional explanatory drawing (substrate conveyance process) which shows a substrate processing method typically. Cross-sectional explanatory drawing (shielding process) schematically showing a substrate processing method. Cross-sectional explanatory drawing (drying process step) schematically showing a substrate processing method. Cross-sectional explanatory drawing (droplet removal process) schematically showing a substrate processing method. Cross-sectional explanatory drawing (droplet removal process) schematically showing a substrate processing method. Cross-sectional explanatory drawing which shows a droplet removal means. Cross-sectional explanatory drawing which shows a droplet removal means. Cross-sectional explanatory drawing which shows a droplet removal means. Cross-sectional explanatory drawing which shows a droplet removal means.

  A specific configuration of a substrate processing apparatus, a substrate processing method, and a substrate processing program according to the present invention will be described below with reference to the drawings.

  As shown in FIG. 1, the substrate processing apparatus 1 is provided with a drying processing unit 3 above the liquid processing unit 2, a shielding unit 4 between the liquid processing unit 2 and the drying processing unit 3, and a liquid processing unit. 2 and a drying processing means 3 are provided with a substrate transport means 5. Here, the liquid processing means 2 performs liquid processing on the substrate 6. The drying processing unit 3 performs a drying process on the substrate 6. The shielding unit 4 shields the liquid processing unit 2 and the drying processing unit 3. The substrate transport unit 5 carries the substrate 6 into the liquid processing unit 2, transports the substrate 6 between the liquid processing unit 2 and the drying processing unit 3, and unloads the substrate 6 from the drying processing unit 3.

  The liquid processing means 2 connects a processing liquid supply mechanism 8 and a processing liquid discharge mechanism 9 to the liquid processing tank 7.

  The liquid treatment tank 7 is formed with an overflow tank 11 having an upper end opened at an upper end outer periphery of a storage tank 10 having an upper end opened, and a seal tank 12 having an upper end opened at an upper end outer periphery of the overflow tank 11. Forming. The storage tank 10 stores the processing liquid and immerses the substrate 6 in the stored processing liquid to perform liquid processing on the substrate 6. The overflow tank 11 stores the processing liquid that has overflowed from the storage tank 10. The processing liquid stored in the overflow tank 11 is circulated in the storage tank 10 or discharged outside. The seal tank 12 shuts off the inside and the outside of the liquid processing tank 7 with stored pure water or the like.

  The processing liquid supply mechanism 8 has a pair of left and right processing liquid discharge nozzles 13 and 13 disposed at the inner bottom of the storage tank 10, and the cleaning liquid supply source 14 and the rinse liquid supply source 15 are flowed through the processing liquid discharge nozzles 13 and 13, respectively. They are connected via regulators 16 and 17. The cleaning liquid supply source 14 supplies a cleaning liquid such as hydrofluoric acid for cleaning the substrate 6. The rinse liquid supply source 15 supplies a rinse liquid such as pure water for rinsing the substrate 6. The flow rate regulators 16 and 17 are connected to the control means 18, and the control means 18 performs open / close control and flow rate control. The control means 18 controls the entire substrate processing apparatus 1.

  The processing liquid supply mechanism 8 includes a processing liquid discharge nozzle 13, while adjusting the flow rate of the cleaning liquid or the rinsing liquid supplied from the cleaning liquid supply source 14 or the rinsing liquid supply source 15 with the flow rate adjusters 16, 17. Supply from 13 to the inside of the storage tank 10.

  The treatment liquid discharge mechanism 9 forms a discharge port 19 at the center of the inner bottom of the storage tank 10, and is connected to the external drain 21 through the open / close valve 20 at the discharge port 19. The on-off valve 20 is connected to the control means 18 and is controlled to be opened and closed by the control means 18.

  The processing liquid discharge mechanism 9 discharges the processing liquid stored in the storage tank 10 from the discharge port 19 to the external drain 21 by opening the on-off valve 20.

  In the drying processing means 3, a drying fluid supply mechanism 23 and a lid opening / closing mechanism 24 are connected to the drying processing tank 22.

  The drying treatment tank 22 is provided with a lid 26 that can be opened and closed at an upper end opening of a tank body 25 having an upper end and a lower end opened.

  The drying fluid supply mechanism 23 includes a pair of left and right drying fluid discharge nozzles 27 and 27 arranged above the tank body 25 of the drying treatment tank 22, and an IPA supply source 28 and an inert gas supply source are connected to the drying fluid discharge nozzles 27 and 27. 29 are connected to each other through flow regulators 30 and 31, respectively. The flow rate adjusters 30 and 31 are connected to the control means 18, and the control means 18 performs open / close control and flow rate control.

  The dry fluid supply mechanism 23 adjusts the flow rate of the IPA vapor supplied from the IPA supply source 28 or the inert gas supplied from the inert gas supply source 29 by the flow rate adjusters 30 and 31 to provide isopropyl alcohol (IPA). A dry fluid composed of a mixed fluid of steam and inert gas, a heated inert gas, or the like is generated, and the dry fluid is supplied from the dry fluid discharge nozzles 27 and 27 to the inside of the drying treatment tank 22.

  The lid opening / closing mechanism 24 is connected to the lid body 26 of the drying treatment tank 22, and opens and closes the lid body 26 by moving the lid body 26 up and down. The lid opening / closing mechanism 24 is connected to the control means 18 and is controlled to be opened and closed by the control means 18.

  The shielding means 4 accommodates the shielding door 33 in a hollow box-shaped casing 32 so as to be movable (openable / closable), and connects the shielding door opening / closing mechanism 34 and the drainage mechanism 35 to the shielding door 33. The shielding door 33 is provided with droplet removing means 36 for removing droplets such as processing liquid from the substrate 6 after the liquid processing.

  The casing 32 is interposed between the liquid treatment tank 7 and the drying treatment tank 22 to communicate the upper end opening of the liquid treatment tank 7 and the lower end opening of the drying treatment tank 22, and the shielding door 33. A shielding door housing casing 38 that houses the shielding door 33 when opened is configured. The casing 32 has a rectangular frame-shaped sealing piece 39 formed on the lower end surface. The seal piece 39 is immersed in pure water stored in the seal tank 12.

  The shielding door 33 has a rectangular flat plate shape, and the seal member 40 is attached to the outer peripheral edge of the upper surface, and the upper surface is concaved by inclining downward from the outer peripheral edge of the upper surface toward the central portion (upper surface A concave portion 41) is formed. The upper surface concave portion 41 only needs to be formed in a concave shape on the upper surface of the shielding door 33, and can be formed with four inclined surfaces on the front, rear, left and right sides, and with one curved surface convex downward. It can also be formed.

  The shielding door opening / closing mechanism 34 is connected to the shielding door 33, and opens and closes the shielding door 33 by moving the shielding door 33 left and right and up and down. The shielding door opening / closing mechanism 34 is connected to the control means 18 and is controlled to be opened and closed by the control means 18.

  When the shielding door 33 is opened, the shielding door opening / closing mechanism 34 moves the shielding door 33 into the shielding door housing casing 38 so that the liquid treatment tank 7 and the drying treatment tank 22 communicate with each other. When the door is closed, the shielding door 33 is moved laterally from the shielding door housing casing 38 to the communication casing 37 and is moved upward in the communication casing 37 so that the shielding door 33 and the communication casing 37 are connected via the seal member 40. By adhering to each other, the liquid processing tank 7 and the drying processing tank 22 are shielded, and the drying processing tank 22 is sealed.

  The drainage mechanism 35 forms a drainage port 42 at the lowermost end portion of the upper surface concave portion 41 of the shielding door 33, and forms a communication path 43 communicating with the drainage port 42 inside the shielding door 33. An external drain 44 is connected to the passage 43 via an on-off valve 45. The on-off valve 45 is connected to the control means 18 and is controlled to be opened and closed by the control means 18. The external drain 44 may be the same as the drain 21 connected to the processing liquid discharge mechanism 9.

  The drainage mechanism 35 collects the liquid flowing down from the substrate 6 when the substrate 6 is dried by the upper surface concave portion 41 of the shielding door 33 and discharges it to the external drain 44.

  As shown in FIGS. 1 and 2, the droplet removing means 36 has a sharp droplet removing member 46 having a diamond-shaped cross section above the concave portion 41 on the upper surface of the shielding door 33. The droplet removing member 46 extends between the front and rear end portions of the upper surface concave portion 41 of the shielding door 33 in a state of being extended along the arrangement direction of the plurality of substrates 6 held by the substrate transport means 5.

  The droplet removing means 36 removes droplets from the lower peripheral edge of the outer periphery of the substrate 6 by bringing the droplet removing member 46 into and out of contact with the lower peripheral edge of the outer periphery of the substrate 6 (approaching and separating). To do. That is, the droplet removing means 36 brings the droplet removing member 46 into contact with the droplet by bringing the droplet removing member 46 close to the lower edge of the outer periphery of the substrate 6, so that the droplet becomes the droplet removing member 46. The droplets are continuously dropped along and the droplet removing member 46 is separated from the lower peripheral edge of the outer periphery of the substrate 6, so that the droplet is dropped from the lower peripheral edge of the outer periphery of the substrate 6 onto the droplet removing member 46 by surface tension. As a result, the droplets are quickly and satisfactorily removed from the outer peripheral lower end edge of the substrate 6.

  Therefore, the droplet removing means 36 requires moving means for moving the droplet removing member 46 relative to and away from the outer peripheral end of the substrate 6. Here, the substrate transport means 5 is used as a moving means for moving the droplet removing member 46 relative to the substrate 6. As described above, the droplet removing unit 36 may be configured to partially use another mechanism such as the substrate transport unit 5 or may be configured to be a separate and independent mechanism.

  In the substrate transfer means 5, a lift arm 48 is connected to a holding body 47 that holds the substrate 6, and a substrate transfer mechanism 49 is connected to the lift arm 48. The holding body 47 holds the plurality of substrates 6 from below in parallel with a gap in the front-rear direction. The substrate transport mechanism 49 transports the substrate 6 up and down by moving the holding body 47 up and down via the lifting arm 48. The substrate transport mechanism 49 is connected to the control means 18 and is transported (elevated / lowered) by the control means 18.

  The substrate processing apparatus 1 is configured as described above, and processes the substrate 6 according to a substrate processing program stored in a storage medium 50 readable by the control means 18 (computer). The storage medium 50 may be any medium that can store various programs such as a substrate processing program. Even if it is a semiconductor memory type storage medium such as a ROM or a RAM, a disk type storage medium such as a hard disk or a CD-ROM. It may be.

  First, the substrate processing program executes a substrate carry-in process as shown in FIGS. 3 and 4. In this substrate loading process, the substrate processing apparatus 1 controls the lid opening / closing mechanism 24 and the substrate transport mechanism 49 by the control means 18 and loads the substrate 6 held by the holding body 47 into the drying processing tank 22.

  Next, as shown in FIGS. 3 and 5, the substrate processing program executes a liquid processing step. In this liquid processing step, the substrate processing apparatus 1 controls the substrate transport mechanism 49 by the control means 18, transports the substrate 6 to the liquid processing tank 7 in which the processing liquid is stored in advance, and immerses the substrate 6 in the processing liquid. . Thereby, the substrate 6 is liquid-treated with the treatment liquid. In this liquid treatment process, the shielding door 33 is accommodated inside the shielding door accommodating casing 38. However, the processing liquid may adhere to the surface of the shielding door 33 due to evaporation or diffusion of the processing liquid.

  Next, the substrate processing program executes a substrate transfer process as shown in FIGS. In this substrate transfer process, the substrate processing apparatus 1 controls the substrate transfer mechanism 49 by the control means 18 to transfer the substrate 6 from the liquid processing tank 7 into the upper drying process tank 22.

  Next, the substrate processing program executes a shielding process as shown in FIGS. In this shielding step, the substrate processing apparatus 1 controls the shielding door opening / closing mechanism 34 by the control means 18 to move the shielding door 33 laterally from the shielding door housing casing 38 to the communication casing 37. The liquid treatment tank 7 and the drying treatment tank 22 are shielded while moving upward in the interior and sealing the drying treatment tank 22.

  Next, the substrate processing program executes a drying process as shown in FIGS. In this drying processing step, the substrate processing apparatus 1 controls the drying fluid supply mechanism 23 by the control means 18 and opens the flow rate adjusters 30 and 31 at a predetermined flow rate. Thereby, the drying fluid supplied from the IPA supply source 28 and the inert gas supply source 29 is supplied from the drying fluid discharge nozzles 27 and 27 to the inside of the drying processing tank 22, and the substrate 6 is dried by the drying fluid.

  At that time, the substrate processing apparatus 1 controls the drainage mechanism 35 by the control means 18 and opens the drain 44 by the opening / closing valve 45. As a result, the liquid flowing down from the substrate 6 when the substrate 6 is dried is collected by the upper surface concave portion 41 of the shielding door 33 and discharged to the external drain 44 through the communication path 43.

  Next, the substrate processing program executes a droplet removing process as shown in FIGS. 3, 9, and 10. In this droplet removing step, the substrate processing apparatus 1 controls the substrate transport mechanism 49 by the control means 18 to lower the holding body 47 and move the substrate 6 downward as shown in FIG. The lower end edge of the outer periphery of the droplet is brought close to the sharp tip of the droplet removing member 46. As a result, the tip sharpened portion of the droplet removing member 46 comes into contact with the droplet at the lower end edge of the outer periphery of the substrate 6, and the droplet continuously reaches the concave portion 41 on the upper surface of the shielding door 33 along the droplet removing member 46. Dripping.

  Thereafter, as shown in FIG. 10, the substrate processing apparatus 1 controls the substrate transport mechanism 49 by the control means 18 to raise the holding body 47 and move the substrate 6 upward. Is separated from the tip of the droplet removing member 46. As a result, a droplet drops from the lower edge of the outer periphery of the substrate 6 to the droplet removing member 46 due to surface tension and drops along the droplet removing member 46 to the upper surface concave portion 41 of the shielding door 33.

  As described above, in the droplet removing step, the droplet removing member 46 is moved toward and away from the lower end edge of the outer periphery of the substrate 6, thereby quickly and satisfactorily removing the droplet from the lower end edge of the outer periphery of the substrate 6. .

  Also in this droplet removing step, the drainage mechanism 35 is controlled by the control means 18, the drain 44 is opened by the opening / closing valve 45, and the droplet dropped from the substrate 6 is allowed to drop on the upper surface of the shielding door 33. Drain from 41 to external drain 44.

  This droplet removal step may be performed after the liquid treatment step, and is not limited to the case that it is performed after the drying treatment step, and may be performed simultaneously with the start of the drying treatment step, or from the middle of the drying treatment step. May be. Further, the position where the droplet removing member 46 is brought close is not limited to the outer peripheral lower end edge of the substrate 6, but may be the outer peripheral edge of the substrate 6. Furthermore, the number of times that the droplet removing member 46 is brought into contact with and separated from is not limited to once, and may be a plurality of times.

  Next, the substrate processing program executes a substrate unloading step as shown in FIG. In this substrate unloading process, the substrate processing apparatus 1 controls the lid opening / closing mechanism 24 and the substrate transport mechanism 49 by the control means 18 and unloads the substrate 6 held by the holding body 47 from the inside of the drying processing tank 22.

  As described above, in the substrate processing apparatus 1, the substrate 6 is processed in accordance with the substrate processing program, and droplets are removed from the substrate 6 after the substrate 6 is subjected to liquid processing.

  As described above, in the substrate processing apparatus 1, the outer peripheral edge portion of the substrate 6 is removed by removing the liquid droplets from the substrate 6 that has been subjected to the liquid treatment by bringing the droplet removing member 46 into and out of contact with the outer peripheral edge portion of the substrate 6. The droplets can be smoothly dropped from the substrate, the throughput of the substrate processing apparatus 1 can be improved, and the substrate 6 can be dried well.

  In particular, in the substrate processing apparatus 1, the droplet removing member 46 is provided on the shielding door 33, and the droplet removing member 46 is brought into contact with and separated from the outer peripheral edge of the substrate 6 by the substrate transport means 5. Therefore, in the substrate processing apparatus 1, it is not necessary to provide a dedicated moving unit for the droplet removing unit 36, the configuration of the droplet removing unit 36 can be simplified, and the droplet removing unit 36 is provided. An increase in cost can be suppressed. Further, when the substrate transporting unit 5 transports the substrate 6 between the liquid processing tank 7 and the drying processing tank 22, the droplet removing member 46 can be retracted to a position where it does not interfere with the substrate 6.

  The droplet removing means 36 is not limited to the above configuration, and may be configured to be able to come into contact with and separate from the outer peripheral edge of the substrate 6.

  For example, in the droplet removing means 51 shown in FIG. 11, a droplet removing member 52 is mounted above the upper surface concave portion 41 of the shielding door 33 so as to be pivotable up and down via a rotating shaft 53. In this droplet removing means 51, when the control means 18 controls the substrate transport mechanism 49 to lower the holding body 47, the lower end portion of the holding body 47 comes into contact with the droplet removing member 52, and the droplet removing member 52 The tip portion rotates upward and approaches the outer peripheral edge of the substrate 6. Thereafter, when the holding body 47 is raised, the tip of the droplet removing member 52 rotates downward and separates from the outer peripheral edge of the substrate 6.

  In the droplet removing means 54 shown in FIG. 12, the droplet removing member 55 is provided not on the shielding door 33 but on the substrate transport means 5 (holding body 47). That is, in this droplet removing means 54, the droplet removing member 55 is attached to the holding body 47 so as to be movable in an inclined manner, and a pressing surface 56 is formed at the lower end portion of the droplet removing member 55. In the droplet removing unit 54, when the control unit 18 controls the substrate transport mechanism 49 to lower the holding body 47, the pressing surface 56 of the droplet removing member 55 comes into contact with the shielding door 33, and the droplet removing member 55 The tip end of the substrate rises in an inclined manner along the holding body 47 and approaches the outer peripheral edge of the substrate 6. Thereafter, when the holding body 47 is raised, the tip end portion of the droplet removing member 55 descends along the holding body 47 so as to be separated from the outer peripheral edge portion of the substrate 6.

  Further, in the droplet removing means 57 shown in FIG. 13, the droplet removing member 58 is provided not on the shielding door 33 but on the substrate transfer means 5 (lifting arm 48), and a dedicated moving means 59 different from the substrate transfer means 5. Is provided. That is, in the droplet removing means 57, the droplet removing member 58 is attached to the elevating arm 48 via the moving means 59. In this droplet removing means 57, the control means 18 controls the moving means 59 to raise the droplet removing member 58 to approach the outer peripheral edge of the substrate 6, and then lower the droplet removing member 58 to lower the substrate. 6 away from the outer peripheral edge.

Further, in the droplet removing means 60 shown in FIG. 14, the droplet removing member 61 is provided independently in the drying treatment tank 22 and the like instead of the shielding door 33 and the substrate transport means 5, and a dedicated moving means 62 is provided. . In this droplet removing means 60, the moving means 62 is controlled by the control means 18, and the droplet removing member 61 is moved left and right, up and down, or rotated to bring the droplet removing member 61 close to and away from the outer peripheral edge of the substrate 6. .
As described above, even in the configuration shown in FIGS. 11 to 14, the droplet removing members 52, 55, 58, 61 can be moved closer to and away from the outer peripheral edge of the substrate 6. The droplets can be satisfactorily removed from.

DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 5 Substrate conveyance means 6 Substrate 7 Liquid processing tank
22 Drying tank
33 Shield door
46 Droplet removal member

Claims (6)

A liquid processing tank for performing liquid processing of the substrate with the processing liquid;
A drying treatment tank provided above the liquid treatment tank and performing a drying treatment of the substrate;
A shielding door provided between the liquid treatment tank and the drying treatment tank, and capable of shielding the liquid treatment tank and the drying treatment tank;
Substrate transport means for transporting the substrate between the liquid treatment tank and the drying treatment tank;
A droplet removing member provided so as to be able to contact and separate relative to the outer peripheral edge of the substrate in order to remove droplets from the substrate subjected to the liquid treatment;
I have a,
The substrate processing characterized in that the droplet removing member is provided so as to be retractable at a position that does not interfere with the substrate when the substrate transporting means transports the substrate between the liquid processing tank and the drying processing tank. apparatus. The substrate processing apparatus according to claim 1 , wherein the droplet removing member is provided on the shielding door. 3. The substrate processing apparatus according to claim 1, wherein the droplet removing member is provided so as to be able to contact and separate from an outer peripheral edge of the substrate by moving the substrate up and down by the substrate transport unit. . A liquid processing step of liquid processing a substrate in a liquid processing tank;
A substrate transfer step of transferring the substrate to a drying treatment tank provided above the liquid treatment tank by a substrate transfer means;
A drying process for drying the substrate in the drying tank;
A droplet removing step of removing the droplet from the substrate by bringing the droplet removing member into contact with and separating from the outer peripheral edge of the substrate after the liquid treatment step;
I have a,
In the substrate transporting step, the droplet removing member is retracted to a position where it does not interfere with the substrate. The substrate processing method according to claim 4 , wherein the droplet removing member is brought into contact with or separated from an outer peripheral edge portion of the substrate by moving the substrate up and down by the substrate transport unit. A liquid processing step of liquid processing the substrate in the liquid processing tank;
A substrate transporting step for transporting the substrate from the liquid processing tank to an upper drying processing tank on a substrate transporting means;
A drying process for drying the substrate in the drying tank;
A droplet removing step of removing the droplet from the substrate by bringing the droplet removing member into contact with and separating from the outer peripheral edge of the substrate after the liquid treatment step;
I have a,
A computer-readable storage medium storing a substrate processing program, wherein in the substrate transporting step, the droplet removing member is retracted to a position where it does not interfere with the substrate.

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