JP2002255566A - Die for forming glass and method for manufacturing product of formed glass - Google Patents
Die for forming glass and method for manufacturing product of formed glassInfo
- Publication number
- JP2002255566A JP2002255566A JP2001050637A JP2001050637A JP2002255566A JP 2002255566 A JP2002255566 A JP 2002255566A JP 2001050637 A JP2001050637 A JP 2001050637A JP 2001050637 A JP2001050637 A JP 2001050637A JP 2002255566 A JP2002255566 A JP 2002255566A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- mold
- die
- molding
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/082—Construction of plunger or mould for making solid articles, e.g. lenses having profiled, patterned or microstructured surfaces
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/05—Press-mould die materials
- C03B2215/07—Ceramic or cermets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/24—Carbon, e.g. diamond, graphite, amorphous carbon
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/40—Product characteristics
- C03B2215/41—Profiled surfaces
- C03B2215/412—Profiled surfaces fine structured, e.g. fresnel lenses, prismatic reflectors, other sharp-edged surface profiles
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、例えば非球面レン
ズなどの高精度な光学素子や、その表面に微細な凹凸か
らなる平面的なパターンが形成されたガラス基板など
を、プレス成形によって製造する際に使用される成形型
に係る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention manufactures a high-precision optical element such as an aspherical lens, and a glass substrate having a planar pattern of fine irregularities formed on its surface by press molding. It relates to a molding die used at the time.
【０００２】[0002]
【従来の技術】近年、レンズやプリズムなどの光学素子
を製造する際、加熱して軟化させたガラス素材を成形型
を用いてプレス成形する方法が広く使用されている。こ
のような成形型を使用して高精度の光学部品を製造する
場合、その型表面（成形面）を高い形状精度で加工する
こと、及び型表面に鏡面加工を施す必要がある。このた
め、成形型の母材部分には、従来、超硬合金またはセラ
ミックスが使用されていた。更に、型表面へのガラスの
融着防止や酸化防止などの目的で、型表面を保護するた
め、一般的に、型表面には種々のコーティングが施され
る。2. Description of the Related Art In recent years, when an optical element such as a lens or a prism is manufactured, a method of press-molding a heated and softened glass material using a molding die has been widely used. When manufacturing a high-precision optical component using such a mold, it is necessary to process the mold surface (molding surface) with high shape accuracy and to perform mirror finishing on the mold surface. For this reason, conventionally, a cemented carbide or ceramic has been used for the base material portion of the mold. Further, in order to protect the surface of the mold for the purpose of preventing fusion of the glass to the surface of the mold and preventing oxidation, generally, various coatings are applied to the surface of the mold.
【０００３】（従来技術の問題点）従来、成形型の母材
部分に使用されている材料は、非常に硬く脆い材料であ
るので、その加工は、研削及び研磨によって行われてい
る。(Problems of the prior art) Conventionally, a material used for a base material of a molding die is a very hard and brittle material, and therefore, its processing is performed by grinding and polishing.
【０００４】母材部分に従来の材料を使用した場合、非
球面、円筒面、トーリック面などを一様に加工すること
は、比較的容易である。しかし、例えば、回折格子、ハ
ードディスク、ＭＯディスクなどで用いられる微細な凹
凸からなるパターンは、加工用のダイヤモンド砥石が無
いので、研削によって加工することが不可能であり、ま
た、フォトリソグラフィを用いたエッチングでも、母材
の特性から、微細な溝を要求される寸法精度で加工する
ことは困難である。When a conventional material is used for the base material, it is relatively easy to uniformly process an aspherical surface, a cylindrical surface, a toric surface, and the like. However, for example, diffraction gratings, hard disks, patterns composed of fine irregularities used in MO disks, etc., cannot be processed by grinding because there is no diamond whetstone for processing, and photolithography is used. Even in etching, it is difficult to process fine grooves with required dimensional accuracy due to the characteristics of the base material.
【０００５】また、導波路のコアを成形するための成形
型でも、数μｍ角の溝加工が必要となる。この溝は複雑
な平面的なパターンで形成されるので、従来の加工法で
は溝加工が困難である。[0005] Further, a mold for molding a core of a waveguide also requires a groove of several μm square. Since these grooves are formed in a complicated planar pattern, it is difficult to form grooves by a conventional processing method.
【０００６】なお、成形型の母材の上に機械加工が比較
的容易なメッキ層を設け、このメッキ層に微細加工を行
って回折格子などのパターンを形成した後、その表面に
ガラスの融着防止用の離型膜をコーティングする方法が
提案されている。しかし、この方法でも、溝の加工をダ
イヤモンドバイトを用いて行っているので、加工可能な
溝の幅や深さ、形成可能なパターンの種類、及び型表面
の表面粗さに限界がある。例えば、幅数μｍ程度の溝加
工は可能であるが、パターンは単純なものに限られる。[0006] A plating layer that is relatively easy to machine is provided on the base material of the mold, and a fine pattern is formed on the plating layer to form a pattern such as a diffraction grating. A method of coating a release film for preventing adhesion has been proposed. However, even in this method, since the groove is processed using a diamond tool, there are limitations on the width and depth of the groove that can be processed, the type of pattern that can be formed, and the surface roughness of the mold surface. For example, a groove having a width of about several μm can be formed, but the pattern is limited to a simple one.
【０００７】更に、成形型の母材部分を石英ガラスによ
って構成し、その表面にフォトリソグラフィを用いて微
細な凹凸によるパターンを形成することも提案されてい
る。しかし、この場合、成形対象のガラスの溶着を防止
するため、母材である石英ガラスの表面に離型膜をコー
ティングする必要がある。ここで、離型膜の膜厚とし
て、少なくとも数百ｎｍは必要となるので、幅が１μｍ
以下の溝を形成しようとする場合には、溝の中が離型膜
で埋まってしまうと言う問題がある。Further, it has been proposed that a base material portion of a molding die is made of quartz glass and a pattern of fine irregularities is formed on the surface of the molding material by photolithography. However, in this case, it is necessary to coat the surface of the quartz glass as a base material with a release film in order to prevent the glass to be formed from being fused. Here, since the thickness of the release film is required to be at least several hundred nm, the width is 1 μm.
When the following grooves are to be formed, there is a problem that the inside of the grooves is filled with a release film.
【０００８】[0008]
【発明が解決しようとする課題】本発明は、以上のよう
な従来の成形型についての問題点に鑑み成されたもの
で、本発明の目的は、非球面レンズなどの高精度な光学
素子や、その表面に微細な凹凸によって平面的なパター
ンが形成されたガラス基板などを、プレス成形法によっ
て製造することを可能にする成形型を提供することにあ
る。SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems with the conventional molds, and an object of the present invention is to provide a high-precision optical element such as an aspherical lens. Another object of the present invention is to provide a molding die capable of manufacturing, by a press molding method, a glass substrate or the like having a planar pattern formed by fine irregularities on the surface thereof.
【０００９】[0009]
【課題を解決するための手段】本発明のガラス用成形型
は、加熱して軟化させたガラス素材をプレス成形して成
形製品を製造する際に使用されるガラス用成形型であっ
て、ガラス状カーボンで構成され、型表面に微細な凹凸
からなるパターンがフォトリソグラフィによって形成さ
れていることを特徴とする。SUMMARY OF THE INVENTION A glass mold according to the present invention is a glass mold used for producing a molded product by press-molding a glass material which has been heated and softened. And a pattern formed of fine irregularities on the mold surface by photolithography.
【００１０】また、本発明のガラス成形製品の製造方法
は、加熱して軟化させたガラス素材を成形型を用いてプ
レス成形して成形製品を製造する方法であって、前記成
形型として、ガラス状カーボンで構成され、型表面に微
細な凹凸からなるパターンがフォトリソグラフィによっ
て形成された成形型を用いることを特徴とする。The method for producing a glass molded product according to the present invention is a method for producing a molded product by press-molding a heated and softened glass material using a molding die. The present invention is characterized in that a mold is used, which is formed of carbon-like carbon and has a pattern of fine irregularities formed on the mold surface by photolithography.
【００１１】本発明によるガラス用成形型の特徴につい
て説明する。The features of the glass mold according to the present invention will be described.
【００１２】ガラス状カーボンは、フルフリールアルコ
ール、フェノール樹脂、フラン樹脂などの熱硬化性樹脂
を、所定の粗形状に成形した後、加圧下で徐々に加熱す
ることによって、硬化させ更に炭素化させて作られる。
ガラス状カーボンは、無配向組織を有し、高い耐熱性及
び耐食性を備えるとともに、高い強度及び硬度を備えて
いる。更に、ガラス状カーボンは、一般的に使用されて
いる他の型材料とは異なり、ガラスとの間の離型性に優
れているので、型の表面に離型膜をコーティングする必
要が無い。The glassy carbon is formed by molding a thermosetting resin such as full free alcohol, phenolic resin or furan resin into a predetermined coarse shape, and then gradually heating it under pressure to harden it and further carbonize it. Made by letting.
Glassy carbon has a non-oriented structure, high heat resistance and corrosion resistance, and high strength and hardness. Further, unlike other commonly used mold materials, glassy carbon has excellent mold releasability from glass, so that it is not necessary to coat the mold surface with a mold release film.
【００１３】なお、レンズ成形用の型を製作する場合に
は、従来から行われている研削及び研磨加工で型表面の
加工を精度良く行うことができる。更に、型表面に微細
な凹凸によってパターンを形成する場合には、フォトリ
ソグラフィの技術によって、比較的容易に多種多様なパ
ターンを高い精度で形成することが可能である。When a mold for molding a lens is manufactured, the surface of the mold can be processed with high precision by conventional grinding and polishing. Further, when a pattern is formed on the surface of a mold by fine irregularities, it is possible to relatively easily form a variety of patterns with high precision by photolithography technology.
【００１４】従って、ガラス用成形型をガラス状カーボ
ンで構成することによって、光学素子や、表面にサブミ
クロン〜数ミクロン程度の幅及び深さまたは高さの凹凸
によってパターンが形成されたガラス基板を成形するた
めの成形型を、高い形状精度で製作することが可能にな
る。Therefore, by forming the glass mold from glassy carbon, an optical element or a glass substrate having a pattern formed on its surface with irregularities of submicron to several microns in width and depth or height can be obtained. A molding die for molding can be manufactured with high shape accuracy.
【００１５】[0015]
【発明の実施の形態】以下、本発明に基づくガラス用成
形型の例を図面を用いて説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an example of a glass mold according to the present invention will be described with reference to the drawings.
【００１６】（例１）図１に、リブ状の微細な突起によ
ってパターンが形成されたガラス基板を成形する際に使
用される成形型の製作工程を示す。(Example 1) FIG. 1 shows a manufacturing process of a molding die used for molding a glass substrate on which a pattern is formed by rib-like fine projections.
【００１７】ａ．ガラス状カーボン基板３１を準備し、
その上に、ＰＶＤ法によって、エッチング用マスクとし
てのＡｕ（金）薄膜３２を堆積する（図１（ａ））。A. Prepare a glassy carbon substrate 31,
An Au (gold) thin film 32 as an etching mask is deposited thereon by the PVD method (FIG. 1A).
【００１８】ｂ．Ａｕ薄膜３２の上に、スピンコータを
用いてフォトレジスト膜３３を塗布する（図１
（ｂ））。B. A photoresist film 33 is applied on the Au thin film 32 using a spin coater (FIG. 1).
(B)).
【００１９】ｃ．所定のパターンが形成されたフォトマ
スク３５を使用し、フォトマスク３５の上からフォトレ
ジスト膜３３に感光用光線としての紫外線を照射し、フ
ォトレジスト膜３３を感光させる（図１（ｃ））。C. Using a photomask 35 on which a predetermined pattern is formed, the photoresist film 33 is irradiated with ultraviolet light as a light beam for exposure from above the photomask 35 to expose the photoresist film 33 (FIG. 1C).
【００２０】ｄ．フォトレジスト膜３３の感光部分を溶
剤で取り除く（図１（ｄ））。D. The photosensitive portion of the photoresist film 33 is removed with a solvent (FIG. 1D).
【００２１】ｅ．フォトレジスト膜３３の上から、選択
的にエッチング用マスクを除去するための媒体としての
アルゴンイオンを用いてイオンスパッタリングを行い、
先にフォトレジスト膜３３が取り除かれた部分におい
て、Ａｕ薄膜３２を除去する（図１（ｅ））。E. From the photoresist film 33, ion sputtering is performed using argon ions as a medium for selectively removing the etching mask,
The Au thin film 32 is removed at the portion where the photoresist film 33 has been removed first (FIG. 1E).
【００２２】ｆ．残っているフォトレジスト膜３３を、
溶媒を用いて除去する（図１（ｆ））。F. The remaining photoresist film 33 is
It is removed using a solvent (FIG. 1 (f)).
【００２３】ｇ．このようにしてパターニングされたＡ
ｕ薄膜３２をマスクにして、Ｏ２を用いて反応性イオン
エッチング（ＲＩＥ）を行い、ガラス状カーボン基板３
１の表面をエッチングする（図１（ｇ））。このとき、
エッチングの時間を調節することにより、形成される溝
の深さを制御することができる。G. A thus patterned
Using the u thin film 32 as a mask, reactive ion etching (RIE) is performed using O 2 to form a glassy carbon substrate 3.
1 is etched (FIG. 1 (g)). At this time,
By adjusting the etching time, the depth of the groove to be formed can be controlled.
【００２４】ｈ．アルゴンイオンを用いてイオンスパッ
タリングを行い、残っているＡｕ薄膜３２を除去する
（図１（ｈ））。これによって、ガラス状カーボン基板
３１の表面に、微細な溝によるパターンが形成される。H. Ion sputtering is performed using argon ions to remove the remaining Au thin film 32 (FIG. 1 (h)). Thus, a pattern with fine grooves is formed on the surface of the glassy carbon substrate 31.
【００２５】上記の方法を用いて、表面に、深さ０．１
μｍ、幅０．５μｍの溝によって所定のパターンが形成
された成形型を製作した。この成形型を、図２に示すプ
レス成形機に取り付け、次の条件によって、幅１０ｍｍ
×１０ｍｍ、厚さ１ｍｍ程度のガラス基板を製作した。Using the method described above, a depth of 0.1
A mold having a predetermined pattern formed by grooves having a width of 0.5 μm and a width of 0.5 μm was manufactured. This molding die was attached to the press molding machine shown in FIG.
A glass substrate having a size of about 10 mm and a thickness of about 1 mm was manufactured.
【００２６】成形素材として低融点ガラス（Ｌ−ＢＡＬ
４２；オハラ（株）製）を使用し、成形温度５７０℃、
プレス力８００ｋｇｆでプレス成形を行った。５００個
のガラス基板を連続して成形し、その表面に形成された
リブ状の突起の高さを測定したところ、その高さは、ほ
ぼ０．１μｍとなり十分な転写性が確認された。また、
５００個のガラス基板を成形した後でも、型表面に特に
変化は認められず、十分な耐久性を備えていることが確
認された。As a molding material, low melting point glass (L-BAL)
42; manufactured by Ohara Corporation) at a molding temperature of 570 ° C.
Press molding was performed with a pressing force of 800 kgf. When 500 glass substrates were continuously formed and the height of the rib-like projections formed on the surface thereof was measured, the height was approximately 0.1 μm, and sufficient transferability was confirmed. Also,
Even after molding 500 glass substrates, no particular change was observed on the mold surface, and it was confirmed that the mold had sufficient durability.
【００２７】[0027]
【発明の効果】本発明のガラス用成形型によれば、成形
型をガラス状カーボンによって構成した結果、光学素子
や表面に幅がサブミクロン〜数ミクロン程度の微細な凹
凸からなるパターンを備えたガラス基板を、高い形状精
度で、且つ低いコストで製造することが可能になる。According to the molding die for glass of the present invention, as a result of forming the molding die from glassy carbon, the optical element and the surface are provided with a pattern composed of fine irregularities having a width of submicron to several microns. A glass substrate can be manufactured with high shape accuracy and at low cost.
【図１】本発明に基づくガラス用成形型の製作工程の一
例を示す図、（ａ）〜（ｈ）は各工程における処理内容
について説明する図。FIG. 1 is a diagram showing an example of a manufacturing process of a glass mold according to the present invention, and FIGS.
【図２】ガラス用成形型が使用されるプレス成形機の概
要を示す図。FIG. 2 is a diagram showing an outline of a press molding machine in which a molding die for glass is used.
１０・・・成形型、 ２１・・・固定軸、 ２２・・・移動軸、 ２３・・・上型ユニット、 ２４・・・下型ユニット、 ２５・・・透明石英管、 ２６・・・ランプユニット、 ３１・・・ガラス状カーボン基板、 ３２・・・Ａｕ薄膜、 ３３・・・フォトレジスト膜、 ３５・・・フォトマスク。 DESCRIPTION OF SYMBOLS 10 ... Mold, 21 ... Fixed axis, 22 ... Moving axis, 23 ... Upper mold unit, 24 ... Lower mold unit, 25 ... Transparent quartz tube, 26 ... Lamp Unit, 31: glassy carbon substrate, 32: Au thin film, 33: photoresist film, 35: photomask.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｇ０２Ｂ 5/18 Ｇ０２Ｂ 5/18 Ｇ１１Ｂ 7/24 ５２６ Ｇ１１Ｂ 7/24 ５２６Ｖ ５３１ ５３１Ａ ５３１Ｂ 7/26 ５１１ 7/26 ５１１ ５２１ ５２１ (72)発明者 松月 功 静岡県沼津市大岡2068の３ 東芝機械株式 会社内 (72)発明者 村越 洋 静岡県沼津市大岡2068の３ 東芝機械株式 会社内 Ｆターム(参考） 2H049 AA03 AA13 AA37 AA39 AA41 AA45 AA55 5D029 KA24 KB02 KB03 5D121 AA02 CA07 DD06 EE26 EE28 GG10 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) G02B 5/18 G02B 5/18 G11B 7/24 526 G11B 7/24 526V 531 531A 531B 7/26 511 7 / 26 511 521 521 (72) Inventor Isao Matsuzuki 2068-3, Ooka, Numazu-shi, Shizuoka Pref. Toshiba Machine Co., Ltd. (72) Inventor Hiroshi Murakoshi 3rd, Ooka, Ooka, Numazu-shi, Shizuoka Pref. AA03 AA13 AA37 AA39 AA41 AA45 AA55 5D029 KA24 KB02 KB03 5D121 AA02 CA07 DD06 EE26 EE28 GG10
Claims (2)
成形して成形製品を製造する際に使用されるガラス用成
形型であって、ガラス状カーボンで構成され、型表面に
微細な凹凸からなるパターンがフォトリソグラフィによ
って形成されていることを特徴とするガラス用成形型。1. A molding die for glass used when a molded product is produced by press-molding a glass material which has been softened by heating. The molding die is made of vitreous carbon and has fine irregularities on its surface. A molding die for glass, wherein a pattern is formed by photolithography.
を用いてプレス成形して成形製品を製造する方法であっ
て、前記成形型として、ガラス状カーボンで構成され、
型表面に微細な凹凸からなるパターンがフォトリソグラ
フィによって形成された成形型を用いることを特徴とす
るガラス成形製品の製造方法。2. A method for producing a molded product by press-molding a heated and softened glass material using a molding die, wherein the molding die is made of glassy carbon,
A method for producing a glass molded product, comprising using a molding die in which a pattern having fine irregularities is formed on a mold surface by photolithography.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001050637A JP2002255566A (en) | 2001-02-26 | 2001-02-26 | Die for forming glass and method for manufacturing product of formed glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001050637A JP2002255566A (en) | 2001-02-26 | 2001-02-26 | Die for forming glass and method for manufacturing product of formed glass |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002255566A true JP2002255566A (en) | 2002-09-11 |
Family
ID=18911566
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001050637A Pending JP2002255566A (en) | 2001-02-26 | 2001-02-26 | Die for forming glass and method for manufacturing product of formed glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002255566A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005025822A (en) * | 2003-06-30 | 2005-01-27 | Sony Corp | Recording medium substrate, recording medium, and these manufacturing methods and formation device of recording medium substrate |
| US6928838B2 (en) * | 2001-09-27 | 2005-08-16 | Toshiba Machine Co., Ltd. | Apparatus and method for forming silica glass elements |
| JP2007191327A (en) * | 2006-01-17 | 2007-08-02 | Toshiba Ceramics Co Ltd | Fine-processing method for glassy carbon, glassy carbon-processed article, and finely-processed article |
| JP2008290284A (en) * | 2007-05-23 | 2008-12-04 | Nano Craft Technologies Co | Minute process technique |
| JP2009113252A (en) * | 2007-11-02 | 2009-05-28 | Tokyo Metropolitan Industrial Technology Research Institute | Minute molding die material consisting of vitreous carbon material, method for manufacturing the same and minute molding die made with the same |
| JP2009285938A (en) * | 2008-05-28 | 2009-12-10 | Tokyo Metropolitan Industrial Technology Research Institute | Forming mold and method for producing the same |
| CN105511002A (en) * | 2014-09-23 | 2016-04-20 | 中芯国际集成电路制造(上海)有限公司 | Grating and manufacturing method thereof, and electronic device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10337734A (en) * | 1997-06-06 | 1998-12-22 | Hoya Corp | Mold and its manufacture |
-
2001
- 2001-02-26 JP JP2001050637A patent/JP2002255566A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10337734A (en) * | 1997-06-06 | 1998-12-22 | Hoya Corp | Mold and its manufacture |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6928838B2 (en) * | 2001-09-27 | 2005-08-16 | Toshiba Machine Co., Ltd. | Apparatus and method for forming silica glass elements |
| KR100765868B1 (en) * | 2001-09-27 | 2007-10-11 | 도시바 기카이 가부시키가이샤 | Apparatus and method for forming silica glass element |
| JP2005025822A (en) * | 2003-06-30 | 2005-01-27 | Sony Corp | Recording medium substrate, recording medium, and these manufacturing methods and formation device of recording medium substrate |
| JP2007191327A (en) * | 2006-01-17 | 2007-08-02 | Toshiba Ceramics Co Ltd | Fine-processing method for glassy carbon, glassy carbon-processed article, and finely-processed article |
| JP2008290284A (en) * | 2007-05-23 | 2008-12-04 | Nano Craft Technologies Co | Minute process technique |
| JP2009113252A (en) * | 2007-11-02 | 2009-05-28 | Tokyo Metropolitan Industrial Technology Research Institute | Minute molding die material consisting of vitreous carbon material, method for manufacturing the same and minute molding die made with the same |
| JP2009285938A (en) * | 2008-05-28 | 2009-12-10 | Tokyo Metropolitan Industrial Technology Research Institute | Forming mold and method for producing the same |
| CN105511002A (en) * | 2014-09-23 | 2016-04-20 | 中芯国际集成电路制造(上海)有限公司 | Grating and manufacturing method thereof, and electronic device |
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